| Patent application number | Description | Published |
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| 20080223786 | Methods and devices using a shrinkable support for porous monolithic materials - Articles of manufacture and devices and methods of forming and using the same are provided, wherein the article comprises a porous inorganic substrate contained in or bounded by a support made from an inorganic material are provided, wherein said porous substrate and support are heated to a temperature effective to shrink the support onto the porous substrate such that liquid tight contact is formed between the porous substrate and the support. In a preferred aspect, the porous inorganic substrate has a porosity of at least 5%, and is a porous monolith formed using a sol-gel method. The articles thus formed provide a confined fluid flow through the porous substrate, providing superior performance in separations, catalysis, filtration, and the like. | 09-18-2008 |
| 20090008327 | ULTRAPOROUS SOL GEL MONOLITHS - Ultraporous sol gel monoliths and methods for preparing the same are provided, having superior flow characteristics for chromatography and analytical chemistry applications. The methods for forming an ultra porous sol-gel monolith include (a) forming a solution comprising a porogen, a matrix dissolving catalyst and a sol gel precursor; (b) allowing the solution to form a gel; and (c) drying the gel at an elevated temperature. The ultraporous sol gel monoliths are characterized by a porosity of up to about 97%, a BET surface area of at least about 50 m | 01-08-2009 |
| 20140127804 | METHODS FOR TREATING BIOPROSTHETIC TISSUE USING A NUCLEOPHILE/ELECTROPHILE IN A CATALYTIC SYSTEM - Methods for treating a bioprosthetic tissue are described herein. The methods comprise contacting the bioprosthetic tissue with at least one nucleophile and/or at least one electrophile in the presence of a catalytic system comprising at least one or a combination of a fluoride-based salt, a cesium-based salt, a potassium-based salt, a rubidium-based salt, or a carbonate-based salt. The methods may be used to alter functional groups on biological tissue which represent actual and potential calcium binding sites and also processes for cross-linking bioprosthetic tissue. Both processes may be used in conjunction with known fixative techniques, such as glutaraldehyde fixation, or may be used to replace known fixative techniques. | 05-08-2014 |
| Patent application number | Description | Published |
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| 20100187917 | MICRO STAGE WITH 6 DEGREES OF FREEDOM - A micro stage with 6 degrees of freedom used in super-precise processing and sensing equipment filed is disclosed. The micro stage has three sets of electromagnetic driving units arranged in a horizontal plane for driving the micro stage to obtain movements within the horizontal plane with 3 degrees of freedom in X, Y and θ | 07-29-2010 |
| 20100208227 | DUAL-STAGE SWITCHING SYSTEM FOR LITHOGRAPHIC MACHINE - A dual-stage switching system for lithographic machine includes a wafer stage to be operated in an exposure station and another wafer stage to be operated in a pre-processing station. The two wafer stages are provided on a base, with four 2-DOF driving units capable of moving along X direction and Y direction being provided along the edge of the base, and the wafer stages being disposed in a space surrounded by the four 2-DOF driving units and suspended on an upper surface of the base by air bearings. Each of the 2-DOF driving units includes upper and lower linear guides and a guiding sleeve, with the upper and lower linear guides being installed vertical to each other in their corresponding guiding sleeve. Two adjacent 2-DOF driving units cooperatively drive the wafer stage) to move in the X direction and Y direction. | 08-19-2010 |
| 20120099094 | DUAL-STAGE EXCHANGE SYSTEM FOR LITHOGRAPHIC APPARATUS - A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage ( | 04-26-2012 |
| 20120099095 | DUAL-STAGE EXCHANGE SYSTEM FOR LITHOGRAPHIC APPARATUS - A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage ( | 04-26-2012 |
| 20120127448 | DUAL WAFER STAGE EXCHANGING SYSTEM FOR LITHOGRAPHIC DEVICE - A dual wafer stage exchanging system for a lithographic device is disclosed, said system comprises two wafer stages running between an exposure workstation and a pre-processing workstation, and said two stages are set on a base and suspended above the upper surface of the base by air bearings. Each wafer stages is passed through by a Y-direction guide rail respectively, wherein one end of said guide rail is connected with a main driving unit and another end of said guide rail is detachably coupled with one of the two X-direction auxiliary driving units with single degree of freedom, and said two wafer stages are capable of moving in Y-direction along the guide rails and moving in X-direction under the drive of the auxiliary driving units with single degree of freedom. The position exchange of said two wafer stages can be enabled by the detachment and connection of the Y-direction guide rails and the auxiliary units with single degree of freedom. | 05-24-2012 |
| 20130024157 | TWO-DIMENSIONAL LOCATING METHOD OF MOTION PLATFORM BASED ON MAGNETIC STEEL ARRAY - A two-dimensional locating method of a motion platform based on a magnetic steel array involves the following steps: placing more than four linear Hall sensors at any different positions within one or more polar distances of the magnetic steel array on the surface of the motion platform in a motion system; determining a magnetic flux density distribution model according to the magnetic steel array; determining the mounting positions of the above-mentioned linear Hall sensors, which are converted into phases with respect to the mass center of the motion platform; recording the magnetic flux density measured values of the linear Hall sensors as the motion proceeds; solving the phases of the mass center of the motion platform in a plane, with the measured values being served as observed quantities and the magnetic flux density distribution model being served as a computation model; and determining the position of the mass center of the motion platform with respect to an initial phase according to the phase, so as to realize the planar location of the motion platform. The present invention provides a simple, fast and robust method for computing mass center positions for a motion system containing a magnetic steel array. | 01-24-2013 |
| 20140071422 | DUAL WAFER STAGE SWITCHING SYSTEM FOR A LITHOGRAPHY MACHINE - Disclosed is a dual wafer stage switching system for a lithography machine. The system comprises a base stage ( | 03-13-2014 |
| 20140160495 | TWO-DIMENSIONAL, POSITION-SENSITIVE SENSOR-BASED SYSTEM FOR POSITIONING OBJECT HAVING SIX DEGREES OF FREEDOM IN SPACE - A two-dimensional, position-sensitive sensor-based system for positioning an object having six degrees of freedom in space, used for positioning of a silicon table and mask table of a lithography machine. The system comprises mainly a semiconductor laser | 06-12-2014 |
| 20150077032 | SINGLE DEGREE OF FREEDOM VIBRATION ISOLATING DEVICE OF LINEAR MOTOR AND MOTION CONTROL METHOD THEREOF - A single degree of freedom vibration isolating device of a linear motor and a motion control method thereof. The vibration isolating device comprises a balance block, an anti-drifting driving unit, and a control unit. An upper surface of the balance block is connected to a stator of the linear motor, and a lower surface of the balance block is connected to a base. The anti-drifting driving unit is connected to the balance block for controlling the position of the balance block. Provided two motion control methods; inputting a second grating ruler signal to the control unit as feedback to perform variable stiffness and nonlinear control on the balance block; inputting a first and a second grating ruler signal to the control unit as feedback to obtain resultant centroid displacement signals of the rotor and the balance block to perform nonlinear anti-drifting control on the balance block. | 03-19-2015 |
| 20150085302 | METHOD FOR MEASURING DISPLACEMENT OF LARGE-RANGE MOVING PLATFORM - A method for measuring displacement of a large-range moving platform, comprising: arranging multiple beams of first measuring light parallel to one another and generated by an optical path distribution device and a position sensitive detector array in a certain manner, to ensure that at least one beam of first measuring light is detected by the position sensitive detector array when a moving platform is at any position of a moving area; a detection head array capable of determining whether a light beam is shaded being used for auxiliary measurement of a position of the moving platform; and determining a position of the moving platform that corresponds to the first measuring light measured by the position sensitive detector array, to calculate displacement of the moving platform. The method effectively enlarges a measurement range of the position sensitive detector array, and implements measurement of long range displacement of the moving platform. | 03-26-2015 |
| 20150097508 | METHOD FOR MEASURING DISPLACEMENT OF PLANAR MOTOR ROTOR - A method for measuring the displacement of a planar motor rotor. The measuring method comprises: four magnetic induction intensity sensors are distributed on the planar motor rotor; sampled signals of the four distributed sensors are processed to obtain signals B | 04-09-2015 |
| 20150268031 | DUAL-FREQUENCY GRATING INTERFEROMETER DISPLACEMENT MEASUREMENT SYSTEM - A dual-frequency grating interferometer displacement measurement system, comprises a dual-frequency laser, an interferometer, a measurement grating and an electronic signal processing component. The measurement system realizes displacement measurement based on grating diffraction, optical Doppler effect and optical beat frequency theory. Dual-frequency laser light is emitted from the dual-frequency laser and split into reference light and measurement light via a polarization spectroscope. The measurement light is incident to the measurement grating to generate positive and negative first-order diffraction. The diffraction light and the reference light form a beat frequency signal containing displacement information about two directions at a photo-detection unit, and linear displacement output is realized after signal processing. The measurement system can realize sub-nanometer and even higher resolution and accuracy, and is able to measure long horizontal displacement and vertical displacement at the same time. | 09-24-2015 |
