| Patent application number | Description | Published |
|---|
| 20090140128 | Methods, systems and apparatus for light concentrating mechanisms - An embodiment relates generally to resonant structure. The resonant structure includes a substrate and a nano-bowtie antenna deposited over the substrate. The resonant structure also includes an enclosure deposited over the substrate and surrounding the nano-bowtie antenna, where the enclosure is configured to raise an enhancement level in the nano-bowtie antenna. | 06-04-2009 |
| 20100086927 | DEPOSITION OF METAL OXIDES ONTO SURFACES AS AN IMMOBILIZATION VEHICLE FOR CARBOXYLATED OR PHOPHATED PARTICLES OR POLYMERS - Intermediates and methods for forming activated metal complexes bound to surfaces on oxide layers, immobilizing beads to the modified surface and articles produced thereby are described. Hydroxyl groups on the oxide surfaces are reacted with a metal reagent complex of the formula Y(L-Pol) | 04-08-2010 |
| 20110159305 | Intermediates And Methods For Forming Passivated Surfaces On Oxide Layers And Articles Produced Thereby - Intermediates and methods for forming passivated surfaces on oxide layers and articles produced thereby are described. Hydroxyl or hydroxide groups on the oxide surfaces are reacted with a metal reagent of the formula Y(L-Pol) | 06-30-2011 |
| 20110200989 | SINGLE MOLECULE NUCLEIC ACID SEQUENCING USING MULTIPHOTON FLUORESCENCE EXCITATION - A system for detection of nucleic acids can include an excitation source configured to transmit excitation energy to a reaction site including a single molecule of nucleic acid reacted with a two-photon absorption moiety. The system also can include an optical system configured to focus the excitation energy transmitted from the excitation source to a focal region containing the reaction site, wherein said excitation energy within the focal region is sufficient to cause two-photon absorption by the two-photon absorption moiety. The system can further include a detector configured to detect emissions generated at the reaction site resulting from two-photon absorption of the excitation energy by the two-photon absorption moiety. | 08-18-2011 |
| 20130331276 | METHODS OF BEAD MANIPULATION AND FORMING BEAD ARRAYS - According to various embodiments, a method is provided that comprises washing an array of DNA-coated beads on a substrate, with a wash solution to remove stacked beads from the substrate. The wash solution can include inert solid beads in a carrier. The DNA-coated beads can have an average diameter and the solid beads in the wash solution can have an average diameter that is at least twice the diameter of the DNA-coated beads. The washing can form dislodged DNA-coated beads and a monolayer of DNA-coated beads. In some embodiments, first beads for forming an array are contacted with a poly(ethylene glycol) (PEG) solution comprising a PEG having a molecular weight of about 350 Da or less. In some embodiments, slides for forming bead arrays are provided as are systems for imaging the same. | 12-12-2013 |
| 20150065356 | METHODS OF BEAD MANIPULATION AND FORMING BEAD ARRAYS - According to various embodiments, a method is provided that comprises washing an array of DNA-coated beads on a substrate, with a wash solution to remove stacked beads from the substrate. The wash solution can include inert solid beads in a carrier. The DNA-coated beads can have an average diameter and the solid beads in the wash solution can have an average diameter that is at least twice the diameter of the DNA-coated beads. The washing can form dislodged DNA-coated beads and a monolayer of DNA-coated beads. In some embodiments, first beads for forming an array are contacted with a poly(ethylene glycol) (PEG) solution comprising a PEG having a molecular weight of about 350 Da or less. In some embodiments, slides for forming bead arrays are provided as are systems for imaging the same. | 03-05-2015 |
| 20150206762 | METHODS AND SYSTEMS FOR POINT OF USE REMOVAL OF SACRIFICIAL MATERIAL - A method of manufacturing a sensor, the method including forming an array of chemically-sensitive field effect transistors (chemFETs), depositing a dielectric layer over the chemFETs in the array, depositing a protective layer over the dielectric layer, etching the dielectric layer and the protective layer to form cavities corresponding to sensing surfaces of the chemFETs, and removing the protective layer. The method further includes, etching the dielectric layer and the protective layer together to form cavities corresponding to sensing surfaces of the chemFETs. The protective layer is at least one of a polymer, photoresist material, noble metal, copper oxide, and zinc oxide. The protective protective layer is removed using at least one of sodium hydroxide, organic solvent, aqua regia, ammonium carbonate, hydrochloric acid, acetic acid, and phosphoric acid. | 07-23-2015 |
| 20160003768 | SURFACE TREATMENT OF SEMICONDUCTOR SENSORS - A sensor component includes a sensor including a sensor surface and a reaction site in cooperation with the sensor and exposing the sensor surface. The reaction site including a reaction site surface. A surface agent is bound to the reaction site surface or the sensor surface. The surface agent includes a surface active functional group reactive with Bronsted base or Lewis acid functionality on the reaction site surface or the sensor surface and including distal functionality that does not have a donor electron pair. | 01-07-2016 |
