Chin-Piao
Chin Piao Chen, Taichung City TW
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20150035661 | TWO-WAY INTERACTIVE LIGHT CONTROL DEVICE - A two-way interactive light control device includes a plurality of lamps. Each lamp includes a microcomputer processer, a controlling code setting unit, a controlled code setting unit, a signal transmitting and receiving unit, a light drive unit and light emitting diodes. When the device is started, it can receive a wireless signal automatically and decode to identify whether the lamp is the same product. If there is no same lamp around, the device will set itself as the controller to keep searching the same lamps and to drive the light emitting diodes to twinkle. When the device receives a signal from the same lamps, the same lamps will be the controlled with their light emitting diodes to twinkle synchronously. Thus, when many same lamps meet, they can provide safe and warning effects. | 02-05-2015 |
Chin Piao Huang, Miauli Hsien TW
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20140075910 | METHOD FOR HARVESTING CROP MATERIALS - A method for harvesting crop materials each having a grains carrying stalk, includes erecting the stalk, cutting the stalk of the crop materials with two or more cutting blades or elements into a lower base segment carrying no grain and an upper straw segment that carries grains, discarding the lower base segment which carries no grain, threshing the upper straw segment which carries the grains for separating the grains from the upper straw segment, and collecting the grains. A blowing process is used for blowing the upper straw segment away from the grains before collecting device the grains. A determining process is used for determining a length of the lower base segment to be cut before erecting the stalk. | 03-20-2014 |
20140075911 | HARVESTING MACHINE FOR CROP MATERIALS - A harvesting machine for threshing crop materials includes a platform supported in front of a chassis, an erecting device having a number pairs of guiding bars attached to the platform and having a channel formed between two bar members of each pair of guiding bars, a guiding element disposed between every two adjacent pairs of guiding bars for guiding a stalk of the crop materials into the channel of the guiding bars, a number of pawls extended into the channel for sending the stalk of the crop materials into the channel, and a cutting device having two or more cutting elements for cutting the stalk into a lower base segment that carries no grain and an upper straw segment that carries grains. | 03-20-2014 |
Chin Piao Huang US
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20140075911 | HARVESTING MACHINE FOR CROP MATERIALS - A harvesting machine for threshing crop materials includes a platform supported in front of a chassis, an erecting device having a number pairs of guiding bars attached to the platform and having a channel formed between two bar members of each pair of guiding bars, a guiding element disposed between every two adjacent pairs of guiding bars for guiding a stalk of the crop materials into the channel of the guiding bars, a number of pawls extended into the channel for sending the stalk of the crop materials into the channel, and a cutting device having two or more cutting elements for cutting the stalk into a lower base segment that carries no grain and an upper straw segment that carries grains. | 03-20-2014 |
Chin-Piao Chang, Taipei TW
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20080199978 | System and method for film stress and curvature gradient mapping for screening problematic wafers - A method of testing a wafer after a current top layer is formed over the wafer. Stress data is collected for the wafer after forming the current top layer. The stress data is derived from changes in wafer curvature. The stress data includes: stress-xx in an x direction and stress-yy in a y direction for each area of a set of finite areas on the wafer, the stress-xx and stress-yy both being derived from wafer-curvature-change-xx in the x direction for each area of the set of finite areas and from wafer-curvature-change-yy in the y direction for each area of the set of finite areas; and the stress-xy being derived from wafer-curvature-change-xy, wherein wafer-curvature-change-xy is a change in wafer twist in the x-y plane for each area of the set of finite areas. A stress gradient vector (and/or its norm) is calculated and used to evaluate the investigating single or multiple accumulated layer. | 08-21-2008 |
Chin-Piao Chang, New Taipei City TW
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20140070359 | SEMICONDUCTOR MEMORY ARRAY STRUCTURE - A memory array includes a rhomboid-shaped AA region surrounded by a first and second STI structures. The first STI structure extends along a first direction on the longer sides of the rhomboid-shaped AA region and has a depth d1. The second STI structure extends along the second direction on the shorter sides of the rhomboid-shaped AA region and has two depths: d2 and d3, wherein d1 and d2 are shallower than d3. | 03-13-2014 |
20140252459 | METHOD FOR FABRICATING SEMICONDUCTOR DEVICE - Provided is a method for fabricating a semiconductor device, which includes the following steps. A substrate having a plurality of pillars is provided, wherein a plurality of trenches are formed around each pillar, and a doped region is disposed at a bottom of each pillar. An insulation layer is formed below each doped region. | 09-11-2014 |
20140342567 | METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTURE - A method of manufacturing a semiconductor structure. A patterned first hard mask is formed on a substrate. The patterned first hard mask includes first trench patterns extending along a first direction. A second hard mask is then formed on the patterned first hard mask. A patterned photoresist layer is formed on the second hard mask. The patterned photoresist layer includes second trench patterns extending along a second direction. The second trench patterns intersect first trench patterns. Using the patterned photoresist layer as an etch mask, a first etch process is performed to transfer the second trench patterns into the patterned first hard mask and the second hard mask. Subsequently, using the patterned first hard mask as an etch mask, a second etch process is performed to transfer the first trench patterns and the second trench patterns into the substrate. | 11-20-2014 |
Chin-Piao Chen, Taipei City TW
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20150203430 | COMPOUNDS FROM ANTRODIA CAMPHORATE AND THEIR USE IN TREATMENT OF DIABETES MELLITUS - The present invention relates to a method or composition for treating diabetes mellitus, comprising administering a subject with a pharmaceutical composition comprising a therapeutically effective amount of an active compound from | 07-23-2015 |
Chin-Piao Chen, Hsinchu TW
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20110008447 | CARRIER COMPRISING NANODIAMOND - The present invention provides a carrier including a nanodiamond (ND) particle and a linker covalently bound to the ND particle, in which the linker is presented by the formula: —R | 01-13-2011 |
Chin-Piao Chen, Hualien TW
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20150133371 | METHOD AND COMPOSITION FOR TREATING DIABETES MELLITUS - The present invention relates to a method or composition for glycemic control in a subject, which is effective for treating diabetes mellitus, comprising administering the subject with a pharmaceutical composition comprising a therapeutically effective amount of an aliphatic alcohol having a general formula of CH | 05-14-2015 |
Chin-Piao Kuo, Pao Shan Hsiang TW
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20140347880 | LIGHT-EMITTING-DIODE LIGHT BAR AND RELATED PLANAR LIGHT SOURCE - A LED light bar, a related planar light source and a method of manufacturing such light bar is provided. The light source includes a light guide plate having a first surface and a second surface; at least one light bar, on which a plurality of LEDs is disposed, wherein the light bar is disposed on a lateral side of the light guide plate, and the LEDs are disposed inside the light guide plate to output light; a reflector, which is disposed outside the second surface and reflects light; and a diffuser, which is disposed outside the first surface and scatters reflected light of the reflector. Because LEDs are pre-disposed in a mold when the light guide plate is manufactured, the LEDs and the light guide plate are integrally formed, the loss of light can be avoided, and the efficiency of the planar light source can be enhanced. | 11-27-2014 |