Patent application number | Description | Published |
20100219504 | Four-Terminal Gate-Controlled LVBJTs - An integrated circuit structure includes a well region of a first conductivity type, an emitter of a second conductivity type opposite the first conductivity type over the well region, a collector of the second conductivity type over the well region and substantially encircling the emitter, and a base contact of the first conductivity type over the well region. The base contact is horizontally spaced apart from the emitter by the collector. At least one conductive strip horizontally spaces the emitter, the collector, and the base contact apart from each other. A dielectric layer is directly under, and contacting, the at least one conductive strip. | 09-02-2010 |
20110193658 | FILTER USING A WAVEGUIDE STRUCTURE - A representative filter comprises a silicon-on-insulator substrate having a top surface, a metal shielding positioned above the top surface of the silicon-on-insulator substrate, and a band-pass filter device positioned above the metal shielding. The band-pass filter device includes a first port, a second port, and a coupling metal positioned between the first and second ports. | 08-11-2011 |
20110204969 | GATED-VARACTORS - Various embodiments of the invention provide a varactor structure that, depends on configurations, can provide a C-V characteristic based on one or a combination of a reverse bias junction capacitor, a channel capacitor, and an oxide capacitor. The junction capacitor is formed by reverse biasing the P+ source region and the N-well. The channel capacitance is formed between the P+ source region and the N+ drain region, and the oxide capacitor is formed in the gate oxide area. Depending on biasing one or a combination of the gate voltage VG, the source voltage VS, and the drain voltage VD, embodiments can utilize one or a combination of the above capacitors. Other embodiments using the varactors in a Voltage-Controlled Oscillator (VCO) are also disclosed. | 08-25-2011 |
20120043590 | Linear-Cap Varactor Structures for High-Linearity Applications - A device includes a well region over a substrate, and a heavily doped well region over the well region, wherein the well region and the heavily doped well region are of a same conductivity type. A gate dielectric is formed on a top surface of the heavily doped well region. A gate electrode is formed over the gate dielectric. A source region and a drain region are formed on opposite sides of the heavily doped well region. The source region and the drain region have bottom surfaces contacting the well region, and wherein the source region and the drain region are of opposite conductivity types. | 02-23-2012 |
20120074515 | Noise Decoupling Structure with Through-Substrate Vias - A device includes a substrate having a front surface and a back surface; an integrated circuit device at the front surface of the substrate; and a metal plate on the back surface of the substrate, wherein the metal plate overlaps substantially an entirety of the integrated circuit device. A guard ring extends into the substrate and encircles the integrated circuit device. The guard ring is formed of a conductive material. A through substrate via (TSV) penetrates through the substrate and electrically couples to the metal plate. | 03-29-2012 |
20120104387 | Four-Terminal Metal-Over-Metal Capacitor Design Kit - A device includes a first MOM capacitor; a second MOM capacitor directly over and vertically overlapping the first MOM capacitor, wherein each of the first and the second MOM capacitors includes a plurality of parallel capacitor fingers; a first and a second port electrically coupled to the first MOM capacitor; and a third and a fourth port electrically coupled to the second MOM capacitor. The first, the second, the third, and the fourth ports are disposed at a surface of a respective wafer. | 05-03-2012 |
20120187494 | MOS Varactor Structure and Methods - Apparatus and methods for a MOS varactor structure are disclosed An apparatus is provided, comprising an active area defined in a portion of a semiconductor substrate; a doped well region in the active area extending into the semiconductor substrate; at least two gate structures disposed in parallel over the doped well region; source and drain regions disposed in the well region formed on opposing sides of the gate structures; a gate connector formed in a first metal layer overlying the at least two gate structures and electrically coupling the at least two gate structures; source and drain connectors formed in a second metal layer and electrically coupled to the source and drain regions; and interlevel dielectric material separating the source and drain connectors in the second metal layer from the gate connector formed in the first metal layer. Methods for forming the structure are disclosed. | 07-26-2012 |
20120293191 | HVMOS Reliability Evaluation using Bulk Resistances as Indices - A method of determining the reliability of a high-voltage PMOS (HVPMOS) device includes determining a bulk resistance of the HVPMOS device, and evaluating the reliability of the HVPMOS device based on the bulk resistance. | 11-22-2012 |
20120319176 | GATED-VARACTORS - In at least one embodiment, a method of manufacturing a varactor includes forming a well over a substrate. The well has a first type doping. A first source region and a second source region are formed in the well, and the first source region and the second source region have a second type doping. A drain region is formed in the well, and the drain region has the first type doping. A first gate region is formed over the well between the drain region and the first source region. Moreover, a second gate region is formed over the well between the drain region and the second source region. | 12-20-2012 |
20130175655 | DUAL DNW ISOLATION STRUCTURE FOR REDUCING RF NOISE ON HIGH VOLTAGE SEMICONDUCTOR DEVICES - An isolation structure in a semiconductor device absorbs electronic noise and prevents substrate leakage currents from reaching other devices and signals. The isolation structure provides a duality of deep N-well (“DNW”) isolation structures surrounding an RF device or other source of electronic noise. The DNW isolation structures extend into the substrate at a depth of at least about 2.5 μm and may be coupled to V | 07-11-2013 |
20130200489 | CAPACITOR ARRAYS FOR MINIMIZING GRADIENT EFFECTS AND METHODS OF FORMING THE SAME - Semiconductor devices having capacitor arrays and methods of forming the same. A semiconductor device is formed including a capacitor array. The capacitor array includes a plurality of operational capacitors formed along a diagonal of the capacitor array. The capacitor array also includes a plurality of dummy capacitors formed substantially symmetrically about the plurality of operational capacitors in the capacitor array. A first operational capacitor is formed at a first edge of the capacitor array. Each one of the plurality of operational capacitors is electrically coupled to a non-adjacent other one of the plurality of operational capacitors. | 08-08-2013 |
20130260486 | MOS Varactor Structure and Methods - Apparatus and methods for a MOS varactor structure are disclosed. An apparatus is provided, comprising an active area defined in a portion of a semiconductor substrate; a doped well region in the active area extending into the semiconductor substrate; at least two gate structures disposed in parallel over the doped well region; source and drain regions disposed in the well region formed on opposing sides of the gate structures; a gate connector formed in a first metal layer overlying the at least two gate structures and electrically coupling the at least two gate structures; source and drain connectors formed in a second metal layer and electrically coupled to the source and drain regions; and interlevel dielectric material separating the source and drain connectors in the second metal layer from the gate connector formed in the first metal layer. Methods for forming the structure are disclosed. | 10-03-2013 |
20130299919 | MOS Devices with Mask Layers and Methods for Forming the Same - A device includes a substrate, a gate dielectric over the substrate, and a gate electrode over the gate dielectric. A drain region and a source region are disposed on opposite sides of the gate electrode. Insulation regions are disposed in the substrate, wherein edges of the insulation regions are in contact with edges of the drain region and the source region. A dielectric mask includes a portion overlapping a first interface between the drain region and an adjoining portion of the insulation regions. A drain silicide region is disposed over the drain region, wherein an edge of the silicide region is substantially aligned to an edge of the first portion of the dielectric mask. | 11-14-2013 |
20140001518 | Integrated Circuit Devices with Well Regions and Methods for Forming the Same | 01-02-2014 |
20140183660 | POWER CELL AND POWER CELL CIRCUIT FOR A POWER AMPLIFIER - A power cell includes a fin over a substrate, the fin extending in a direction substantially perpendicular to a bottom surface of the substrate. The fin includes a first dopant type. The power cell further includes at least one isolation region over the substrate between the fin and an adjacent fin. The power cell further includes a gate structure in contact with the fin and the at least one isolation region, wherein the gate structure comprises a doped region in the fin, wherein the doped region has a second dopant type different from the first dopant type and the doped region defines a channel region in the fin. | 07-03-2014 |
20140239364 | MOS Varactor Optimized Layout and Methods - Apparatus and methods for a MOS varactor structure are disclosed. An apparatus is provided, comprising an active area defined in a portion of a semiconductor substrate; a doped well region in the active area extending into the semiconductor substrate; at least two gate structures disposed in parallel over the doped well region; source and drain regions disposed in the well region formed on opposing sides of the gate structures; a gate connector formed in a first metal layer overlying the at least two gate structures and electrically coupling the at least two gate structures; source and drain connectors formed in a second metal layer and electrically coupled to the source and drain regions; and interlevel dielectric material separating the source and drain connectors in the second metal layer from the gate connector formed in the first metal layer. Methods for forming the structure are disclosed. | 08-28-2014 |
20140264635 | RF Switch on High Resistive Substrate - A device includes a semiconductor substrate of a first conductivity type, and a deep well region in the semiconductor substrate, wherein the deep well region is of a second conductivity type opposite to the first conductivity type. The device further includes a well region of the first conductivity type over the deep well region. The semiconductor substrate has a top portion overlying the well region, and a bottom portion underlying the deep well region, wherein the top portion and the bottom portion are of the first conductivity type, and have a high resistivity. A gate dielectric is over the semiconductor substrate. A gate electrode is over the gate dielectric. A source region and a drain region extend into the top portion of the semiconductor substrate. The source region, the drain region, the gate dielectric, and the gate electrode form a Radio Frequency (RF) switch. | 09-18-2014 |
20140291806 | CAPACITOR ARRAYS FOR MINIMIZING GRADIENT EFFECTS AND METHODS OF FORMING THE SAME - Semiconductor devices having capacitor arrays. A semiconductor device is formed including a capacitor array formed in a plurality of cells in a two-dimensional grid. The capacitor array includes a plurality of operational capacitors formed in a first subset of the plurality of cells along a diagonal of the capacitor array. A first operational capacitor is formed in a cell at a first edge of the capacitor array and at a first edge of the diagonal of the capacitor array. The capacitor array also includes a plurality of dummy patterns formed about the plurality of operational capacitors in the capacitor array in a second subset of the plurality of cells to achieve symmetry in the grid about the diagonal. Each one of the plurality of operational capacitors is electrically coupled to another one of the plurality of operational capacitors. | 10-02-2014 |
20140295640 | CAPACITOR ARRAYS FOR MINIMIZING GRADIENT EFFECTS AND METHODS OF FORMING THE SAME - Methods of forming semiconductor devices. The method includes forming a capacitor array comprising a plurality of cells in a two-dimensional grid. The step of forming includes forming a plurality of operational capacitors in a first subset of the plurality of cells along a diagonal of the array, the plurality of operational capacitors comprising a first operational capacitor formed in a cell at a first edge of the capacitor array and at a first edge of the diagonal of the capacitor array. The step of forming also includes forming a plurality of dummy patterns about the plurality of operational capacitors in the capacitor array in a second subset of the plurality of cells to achieve symmetry in the grid about the diagonal. The method also includes electrically coupling each one of the plurality of operational capacitors to another one of the plurality of operational capacitors. | 10-02-2014 |
20140332857 | JUNCTION GATE FIELD-EFFECT TRANSISTOR (JFET), SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING - A junction gate field-effect transistor (JFET) includes a substrate, a source region formed in the substrate, a drain region formed in the substrate, a channel region formed in the substrate, and at least one gate region formed in the substrate. The channel region connects the source and drain regions. The at least one gate region contacts one of the source and drain regions at an interface, and the at least one gate region is isolated from the other of the source and drain regions. A dielectric layer covers the interface while exposing portions of the gate region and the one of the source and drain regions. | 11-13-2014 |
20140332858 | JUNCTION GATE FIELD-EFFECT TRANSISTOR (JFET), SEMICONDUCTOR DEVICE HAVING JFET AND METHOD OF MANUFACTURING - A junction gate field-effect transistor (JFET) includes a substrate, a source region formed in the substrate, a drain region formed in the substrate, a channel region formed in the substrate, and at least one gate region formed in the substrate. The channel region connects the source and drain regions. The at least one gate region is configured to cause a depletion region in one of the source and drain regions. | 11-13-2014 |
20150015336 | CMOS CASCODE POWER CELLS - A circuit includes a first CMOS device forming a gain stage of a power amplifier and a second CMOS device forming a voltage buffer stage of the power amplifier. The first CMOS device includes a first doped well formed in a substrate, a first drain region and a first source region spaced laterally from one another in the first doped well, and a first gate structure formed over a first channel region in the first doped well. The second CMOS device includes a second doped well formed in the semiconductor substrate such that the first doped well and the second is disposed adjacent to the second doped well. A second drain region and a second source region are spaced laterally from one another in the second doped well, and a second gate structure formed over a second channel region in the second doped well. | 01-15-2015 |
20150021676 | HIGH VOLTAGE METAL-OXIDE-METAL (HV-MOM) DEVICE, HV-MOM LAYOUT AND METHOD OF MAKING THE HV-MOM DEVICE - A high voltage metal-oxide-metal (HV-MOM) device includes a substrate, a deep well in the substrate and at least one high voltage well in the substrate over the deep well. The HV-MOM device further includes a dielectric layer over each high voltage well of the at least one high voltage well and a gate structure over the dielectric layer. The HV-MOM device further includes an inter-layer dielectric (ILD) layer over the substrate, the ILD layer surrounding the gate structure. The HV-MOM device further includes a first inter-metal dielectric (IMD) layer over the ILD layer and a first metal feature in the first IMD layer, wherein the first metal feature is part of a MOM capacitor. | 01-22-2015 |