Patent application number | Description | Published |
20080199083 | Image filling methods - Image filling methods. A plurality of images corresponding to a target object or a scene are captured at various angles. An epipolar geometry relationship between a filling source image and a specific image within the images is calculated. The filling source image and the specific image are rectified according to the epipolar geometry relationship. At least one filling target area in the rectified specific image is patched according to the rectified filling source image. | 08-21-2008 |
20090012640 | 3D object fabrication methods and systems - A 3D object fabrication method implemented in a fabrication system includes the following steps. A digital object model is retrieved. Sections of the digital object model are respectively printed on plural pieces of plane material. The pieces of plane material are combined to form a physical 3D object of the digital object model. | 01-08-2009 |
20090168045 | THREE-DIMENSIONAL SURROUND SCANNING DEVICE AND METHOD THEREOF - A three-dimensional surround scanning device and a method thereof are described, which are adopted to perform surround scanning on a scene area, so as to construct a three-dimensional model. The device includes an image acquisition element, a first moving mechanism, a range acquisition element, and a controller. The controller controls the image acquisition element, the range acquisition element, and the first moving mechanism to perform three-dimensional image acquisition, so as to obtain a two-dimensional image covering the scene area, depth information with three-dimensional coordinates, and corresponding position signals. The controller rearranges and combines the two-dimensional image, position signals, and depth information, so as to construct the three-dimensional model. | 07-02-2009 |
20090267919 | MULTI-TOUCH POSITION TRACKING APPARATUS AND INTERACTIVE SYSTEM AND IMAGE PROCESSING METHOD USING THE SAME - The present invention provides a multi-touch position tracking technique and an interactive system and a multi-touch interactive image processing method using the same. In the present invention, a light guide element is designed to comprise frustrating structures to frustrate total internal reflection (TIR) so that the light beam therein can be dispersed to form a dispersed optical field distribution. The dispersed optical field is used to respond a physical relation between an object and the light guide element. | 10-29-2009 |
20100194679 | GESTURE RECOGNITION SYSTEM AND METHOD THEREOF - A gesture recognition system includes an image pick-up device, a processor, an operation engine, an optimal template selection means, and a display terminal. The image pick-up device is for capturing an image containing a natural gesture. The processor is for finding out a skin edge of a skin part from the image, and then classifying the skin edge into multiple edge parts at different angles. The operation engine has multiple parallel operation units and multiple gesture template libraries of different angle classes. These parallel operation units respectively find out gesture templates most resembling the edge parts in the gesture template libraries of different angle classes. The optimal template selection means selects an optimal gesture template from the resembling gesture templates found out by the parallel operation units. The display terminal is for displaying an image of the optimal gesture template. Thereby, marker-less and real-time gesture recognition is achieved. | 08-05-2010 |
20110161061 | COLLISION SIMULATION METHOD OF THREE DIMENSIONAL OBJECT - A collision simulation method of a three dimensional (3D) object is provided, wherein the 3D object is composed of a plurality of polygonal meshes. First, a collision between the polygonal meshes and an object is detected. When one of the polygonal meshes is collided by the object, at least one virtual vertex is generated at a first position where the polygonal mesh is collided by the object, wherein the polygonal mesh includes a plurality of vertexes. Then, the virtual vertex is connected to the vertexes to form a plurality of sub meshes. Next, a force between the object and the virtual vertex is calculated to update the first position of the virtual vertex into a second position. After that, forces between the virtual vertex and the vertexes are calculated according to the second position of the virtual vertex so as to update the positions of the vertexes. | 06-30-2011 |
20120170804 | Method and apparatus for tracking target object - A method and apparatus for tracking a target object are provided. A plurality of images is received, and one of the images is selected as a current image. A specific color of the current image is extracted. And the current image is compared with a template image to search a target object in the current image. If the target object is not found in the current image, a previous image with the target object is searched in the images received before the current image. And the target object is searched in the current image according to an object feature of the previous image. The object feature and an object location are updated into a storage unit when the target object is found. | 07-05-2012 |
20120262553 | DEPTH IMAGE ACQUIRING DEVICE, SYSTEM AND METHOD - A depth image acquiring device is provided, which includes at least one projecting device and at least one image sensing device. The projecting device projects a projection pattern to an object. The image sensing device senses a real image. In addition, the projecting device also serves as a virtual image sensing device. The depth image acquiring device generates a disparity image by matching three sets of dual-images formed by two real images and one virtual image, and generates a depth image according to the disparity image. In addition, the depth image acquiring device also generates a depth image by matching two real images, or a virtual image and a real image without verification. | 10-18-2012 |
20130169595 | RANGING APPARATUS, RANGING METHOD, AND INTERACTIVE DISPLAY SYSTEM - A ranging apparatus including an image sensor, an imaging lens, and a processor is provided. The imaging lens is configured to image an object on the image sensor to produce an image signal having at least one image parameter, wherein the at least one image parameter changes with a change of an object distance of the object. The processor is configured to determine the change of the object distance according to a change of the at least one image parameter. A ranging method and an interactive display system are also provided. | 07-04-2013 |
20140061655 | METHOD FOR EXTREME ULTRAVIOLET ELECTROSTATIC CHUCK WITH REDUCED CLAMPING EFFECT - The present disclosure provides one embodiment of a semiconductor structure. The semiconductor structure includes a semiconductor substrate having a front surface and a backside surface; integrated circuit features formed on the front surface of the semiconductor substrate; and a polycrystalline silicon layer disposed on the backside surface of the semiconductor substrate. | 03-06-2014 |
20140111781 | METHOD AND APPARATUS FOR ULTRAVIOLET (UV) PATTERNING WITH REDUCED OUTGASSING - A method and apparatus for ultraviolet (UV) and extreme ultraviolet (EUV) lithography patterning is provided. A UV or EUV light beam is generated and directed to the surface of a substrate disposed on a stage and coated with photoresist. A laminar flow of a layer of inert gas is directed across and in close proximity to the substrate surface coated with photoresist during the exposure, i.e. lithography operation. The inert gas is exhausted quickly and includes a short resonance time at the exposure location. The inert gas flow prevents flue gasses and other contaminants produced by outgassing of the photoresist, to precipitate on and contaminate other features of the lithography apparatus. | 04-24-2014 |
20140127836 | SYSTEMS AND METHODS OF LOCAL FOCUS ERROR COMPENSATION FOR SEMICONDUCTOR PROCESSES - A system and method of compensating for local focus errors in a semiconductor process. The method includes providing a reticle and applying, at a first portion of the reticle, a step height based on an estimated local focus error for a first portion of a wafer corresponding to the first portion of the reticle. A multilayer coating is formed over the reticle and an absorber layer is formed over the multilayer coating. A photoresist is formed over the absorber layer. The photoresist is patterned, an etch is performed of the absorber layer and residual photoresist is removed. | 05-08-2014 |
20140139453 | OPTICAL-SEE-THROUGH HEAD MOUNTED DISPLAY SYSTEM AND INTERACTIVE OPERATION - An optical-see-through head mounted display (HMD) system is provided. The optical-see-through HMD system has a camera for generating image frames, a display device and a processor. The processor proceeds an interactive operation on each image frame. In the interactive operation, an image analysis is performed on the image frame to obtain positioning information of a marker and 3-dimensional information of an input device. According to the positioning information, the 3-dimensional information and eye position of an user, an image shielding process is performed to correct a portion of the frame to be displayed which is corresponding to the input device and a collision test is performed according to the positioning information and the 3-dimensional information of an input device to determine whether the input device touches the virtual image displayed by HMD. Then, an event corresponding to the touch position of the virtual image is executed. | 05-22-2014 |
20140176676 | IMAGE INTERACTION SYSTEM, METHOD FOR DETECTING FINGER POSITION, STEREO DISPLAY SYSTEM AND CONTROL METHOD OF STEREO DISPLAY - The disclosure provides a stereo display system including a stereo display, a depth detector, and a computing processor. The stereo display displays a left eye image and a right eye image, such that a left eye and a right eye of a viewer generate a parallax to view a stereo image. The depth detector captures a depth data of a three-dimensional space. The computing processor controls image display of the stereo display. The computing processor analyzes an eyes position of the viewer according to the depth data, and when the viewer moves horizontally, vertically, or obliquely in the three-dimensional space relative to the stereo display, the computing processor adjusts the left eye image and the right eye image based on variations of the eyes position. Furthermore, an image interaction system, a method for detecting finger position, and a control method of stereo display are also provided. | 06-26-2014 |
20140177063 | VIRTUAL IMAGE DISPLAY APPARATUS - A virtual image display apparatus configured to be in front of at least one eye of a user includes an image display unit, a first beam splitting unit, and a reflection-refraction unit. The image display unit provides an image beam. The first beam splitting unit disposed on transmission paths of the image beam and an object beam causes at least one portion of the object beam to propagate to the eye and causes at least one portion of the image beam to propagate to the reflection-refraction unit. The reflection-refraction unit includes a lens portion and a reflecting portion on a first curved surface of the lens portion. At least part of the image beam travels through the lens portion, is reflected by the reflecting portion, travels trough the lens portion again, and is propagated to the eye by the first beam splitting unit in sequence. | 06-26-2014 |
20140177942 | THREE DIMENSIONAL SENSING METHOD AND THREE DIMENSIONAL SENSING APPARATUS - A three dimensional (3D) sensing method and an apparatus thereof are provided. The 3D sensing method includes the following steps. A resolution scaling process is performed on a first pending image and a second pending image so as to produce a first scaled image and a second scaled image. A full-scene 3D measurement is performed on the first and second scaled images so as to obtain a full-scene depth image. The full-scene depth image is analyzed to set a first region of interest (ROI) and a second ROI. A first ROI image and a second ROI image is obtained according to the first and second ROI. Then, a partial-scene 3D measurement is performed on the first and second ROI images accordingly, such that a partial-scene depth image is produced. | 06-26-2014 |
20140184751 | DEVICE FOR ACQUIRING DEPTH IMAGE, CALIBRATING METHOD AND MEASURING METHOD THEREFOR - A device for acquiring depth image, a calibrating method and a measuring method therefore are provided. The device includes at least one projecting device, at least one image sensing device, a mechanism device and a processing unit. The projecting device projects a projection pattern to a measured object. The image sensing device is controlled to adjust a focal length and focus position, and therefore sense real images. The mechanism device adjusts a location and/or a convergence angle of the image sensing device. The processing unit calibrates the at least one image sensing device and generates a three dimension (3D) measuring parameter set at a model focal length according to a plurality of image setting parameter reference sets corresponding to a model focal length and a plurality of default node distances, respectively, and then estimates a depth map or depth information of the measured object. | 07-03-2014 |
20140218714 | SYSTEM, METHOD AND RETICLE FOR IMPROVED PATTERN QUALITY IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY AND METHOD FOR FORMING THE RETICLE - A reticle for use in an extreme ultraviolet (euv) lithography tool includes a trench formed in the opaque border formed around the image field of the reticle. The trench is coated with an absorber material. The reticle is used in an euv lithography tool in conjunction with a reticle mask and the positioning of the reticle mask and the presence of the trench combine to prevent any divergent beams of radiation from reaching any undesired areas on the substrate being patterned. In this manner, only the exposure field of the substrate is exposed to the euv radiation. Pattern integrity in neighboring fields is maintained. | 08-07-2014 |
20140268074 | Lithography System with an Embedded Cleaning Module - The present disclosure provides a lithography system. The lithography system includes an exposing module configured to perform a lithography exposing process using a mask secured on a mask stage; and a cleaning module integrated in the exposing module and designed to clean at least one of the mask and the mask stage using an attraction mechanism. | 09-18-2014 |
20140272678 | Structure and Method for Reflective-Type Mask - The present disclosure provides an embodiment of a reflective mask that includes a substrate; a reflective multilayer formed on the substrate; a capping layer formed on the reflective multilayer and having a hardness greater than about 8; and an absorber layer formed on the capping layer and patterned according to an integrated circuit layout. | 09-18-2014 |
20140347644 | SYSTEM AND METHOD FOR PERFORMING LITHOGRAPHY PROCESS IN SEMICONDUCTOR DEVICE FABRICATION - Systems and methods that include providing for measuring a first topographical height of a substrate at a first coordinate on the substrate and measuring a second topographical height of the substrate at a second coordinate on the substrate are provided. The measured first and second topographical heights may be provided as a wafer map. An exposure process is then performed on the substrate using the wafer map. The exposure process can include using a first focal point when exposing the first coordinate on the substrate and using a second focal plane when exposing the second coordinate on the substrate. The first focal point is determined using the first topographical height and the second focal point is determined using the second topographical height. | 11-27-2014 |
20150069253 | WAVEFRONT ADJUSTMENT IN EXTREME ULTRA-VIOLET (EUV) LITHOGRAPHY - Some embodiments of the present disclosure related to a method to form and operate the reflective surface to compensate for aberration effects on pattern uniformity. In some embodiments, the reflective surface comprises a mirror of within reduction optics of an EUV illumination tool. In some embodiments, the reflective surface comprises a reflective reticle. An EUV reflective surface topography comprising a reflective surface is disposed on a surface of a substrate, and is manipulated by mechanical force or thermal deformation. The substrate includes a plurality of cavities, where each cavity is coupled to a deformation element configured to expand a volume of the cavity and consequently deform a portion of the reflective surface above each cavity, for local control of the reflective surface through thermal deformation of a resistive material subject to an electric current, or mechanical deformation due to pressurized gas within the cavity or a piezoelectric effect. | 03-12-2015 |
20150077733 | Method of Overlay In Extreme Ultra-Violet (EUV) Lithography - Some embodiments of the present disclosure relate to a method of overlay control which utilizes a deformable electrostatic chuck. The method comprises exposing a substrate to radiation which is reflected off of a reticle. The reticle is mounted to a deformable electrostatic chuck by a plurality of raised contacts, where each raised contact is configured to independently vary in height from a surface of the deformable electrostatic chuck. After exposure of the substrate to radiation which is reflected off of the reticle, a displacement between a first alignment shape formed on a first layer disposed on a surface of the substrate and a second alignment shape formed by the exposure is measured. The height of one or more of the plurality of raised contact is changed based upon the displacement to alter a surface topology of the reticle, which negates some effects of clamping topology. Other embodiments are also disclosed. | 03-19-2015 |
20150085264 | ROTARY EUV COLLECTOR - An EUV collector is rotated between or during operations of an EUV photolithography system. Rotating the EUV collector causes contamination to distribute more evenly over the collector's surface. This reduces the rate at which the EUV photolithography system loses image fidelity with increasing contamination and thereby increases the collector lifetime. Rotating the collector during operation of the EUV photolithography system can induce convection and reduce the contamination rate. By rotating the collector at sufficient speed, some contaminating debris can be removed through the action of centrifugal force. | 03-26-2015 |