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| 20090256608 | Low leakage data retention flip flop - A disclosed embodiment is a low leakage data retention flip flop comprising a master circuit for retaining data during sleep mode, wherein the master circuit is configured to receive a reduced supply voltage during the sleep mode. The flip flop includes a slave circuit having low threshold voltage transistors, where the slave circuit is turned off during the sleep mode. In various embodiments, the master circuit might utilize high threshold voltage, standard threshold voltage, or low threshold voltage transistors. Similarly, the slave circuit might utilize high threshold voltage, standard threshold voltage, or low threshold voltage transistors. To begin the sleep mode, the master circuit receives a reduced supply voltage and the slave circuit is coupled to ground and is thus turned off. During the sleep mode, the slave circuit experiences virtually no leakage current, and the master circuit experiences a reduced leakage current. | 10-15-2009 |
| 20100001774 | Data retention flip flop for low power applications - A disclosed embodiment is a data retention flip flop comprising master and slave circuits that are configured to be turned off when a single sleep mode signal is activated. The disclosed embodiment also comprises an always-on balloon circuit coupled to the master circuit, where the always-on balloon circuit includes a common sub-circuit shared with the master circuit. The master circuit writes into the always-on balloon circuit when the single sleep mode signal is activated, and the master circuit reads from the always-on balloon circuit when the single sleep mode signal is deactivated. The always-on balloon circuits comprises high threshold voltage transistors, while the slave circuit comprises low threshold voltage transistors. The master and slave circuits have no leakage current, or substantially no leakage current, after the single sleep mode signal is activated. | 01-07-2010 |
| 20120299756 | Single Stage and Scalable Serializer - According to an exemplary embodiment, a serializer includes upper and lower shift registers configured to perform a load function where parallel input data is loaded from a parallel input bus and a shift function where the parallel input data is shifted to an output register. The upper shift register is configured to perform the load function while the lower shift register performs the shift function, and the lower shift register is configured to perform the load function while the upper shift register performs the shift function. An output register is configured to alternately receive the parallel input data from the upper shift register and the parallel input data from the lower shift register. The upper and lower shift registers and the output register can comprise scan flip-flops. | 11-29-2012 |
| 20130328704 | Scalable Serializer - According to an exemplary embodiment, a serializer includes upper and lower shift registers configured to perform a load function where parallel input data is loaded from a parallel input bus and a shift function where the parallel input data is shifted to an output register. The upper shift register is configured to perform the load function while the lower shift register performs the shift function, and the lower shift register is configured to perform the load function while the upper shift register performs the shift function. An output register is configured to alternately receive the parallel input data from the upper shift register and the parallel input data from the lower shift register. The upper and lower shift registers and the output register can comprise scan flip-flops. | 12-12-2013 |
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| 20130080514 | SYSTEM AND METHOD FOR AUTO-TAB COMPLETION OF CONTEXT SENSITIVE REMOTE MANAGED OBJECTS IN A TRAFFIC DIRECTOR ENVIRONMENT - Described herein are systems and methods for providing software administration tools, for use in administering server configurations, such as in a traffic director or other type of server environment. In accordance with an embodiment, the system comprises a command-line interface and/or command-line shell which provides an autocompletion feature for remote objects including wherein, in response to an instruction from an administrator to invoke the feature, the system determines configurable remote back-end objects based on the context of the command-line at the time of invocation, and uses the information to one of autocomplete the command-line input or provide a list of remote back-end objects. | 03-28-2013 |
| 20130081128 | SYSTEM AND METHOD FOR PROVIDING A REST-BASED MANAGEMENT SERVICE IN A TRAFFIC DIRECTOR ENVIRONMENT - Described herein are systems and methods for providing software administration tools, for use in administering server configurations, such as in a traffic director or other type of server environment. In accordance with an embodiment, the system comprises a traffic director having one or more traffic director instances, which is configured to receive and communicate requests, from clients, to origin servers having one or more pools of servers. An administration server can be used to manage the traffic director, including a REpresentational State Transfer (REST) infrastructure and management service which maps REST calls to mbeans or other management components registered on the administration server, for use in managing the traffic director. | 03-28-2013 |
| 20140289838 | SYSTEM AND METHOD FOR PROVIDING A REST-BASED MANAGEMENT SERVICE IN A TRAFFIC DIRECTOR ENVIRONMENT - Described herein are systems and methods for providing software administration tools, for use in administering server configurations, such as in a traffic director or other type of server environment. In accordance with an embodiment, the system comprises a traffic director having one or more traffic director instances, which is configured to receive and communicate requests, from clients, to origin servers having one or more pools of servers. An administration server can be used to manage the traffic director, including a REpresentational State Transfer (REST) infrastructure and management service which maps REST calls to mbeans or other management components registered on the administration server, for use in managing the traffic director. | 09-25-2014 |
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| 20110256724 | GAS AND LIQUID INJECTION METHODS AND APPARATUS - A liquid injection system for a processing chamber includes a liquid injector that receives a liquid from a liquid supply and that selectively pulses the liquid into a conduit. A control module selects a number of pulses and a pulse width of the liquid injector. A gas supply supplies gas into the conduit. A sensor senses at least one of a first temperature and a first pressure in the conduit and that generates at least one of a first temperature signal and a first pressure signal, respectively. The control module confirms that the selected number of pulses occur based on the at least one of the first temperature signal and the first pressure signal. | 10-20-2011 |
| 20110256726 | PLASMA ACTIVATED CONFORMAL FILM DEPOSITION - Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by the following operations: (a) exposing the substrate surface to a first reactant in vapor phase under conditions allowing the first reactant to adsorb onto the substrate surface; (b) exposing the substrate surface to a second reactant in vapor phase while the first reactant is adsorbed on the substrate surface; and (c) exposing the substrate surface to plasma to drive a reaction between the first and second reactants adsorbed on the substrate surface to form the film. | 10-20-2011 |
| 20130237063 | SPLIT PUMPING METHOD, APPARATUS, AND SYSTEM - A split-pumping system and method for semiconductor fabrication process chambers is provided. The split pumping method may provide two separate exhaust paths, each configured to evacuate a different process gas. The exhaust paths may be configured to not evacuate process gases other than the process gas that the exhaust path is configured to evacuate. | 09-12-2013 |
| 20130316094 | RF-POWERED, TEMPERATURE-CONTROLLED GAS DIFFUSER - A gas diffusing device includes a first portion defining a gas supply conduit having a first inlet and a first outlet and including a second inlet, a second outlet and passages connecting the second inlet to the second outlet. The passages receive non-conductive fluid to cool the first portion. A second portion is connected to the first portion, includes a diffuser face with spaced holes and defines a cavity that is in fluid communication with the first outlet of the gas supply conduit and the diffuser face. A heater is in contact with the second portion to heat the second portion. | 11-28-2013 |
| 20130333768 | POINT OF USE VALVE MANIFOLD FOR SEMICONDUCTOR FABRICATION EQUIPMENT - A point-of-use valve (POU valve) manifold is provided that allows for multiple precursors to be delivered to a semiconductor processing chamber through a common outlet. The manifold may have a plurality of precursor inlets and a purge gas inlet. The manifold may be configured such that there are zero dead legs in the manifold when the purge gas is routed through the manifold, and may provide mounting location for the POU valves that alternate sides. One or more internal flow path volumes may include elbow features. | 12-19-2013 |
| 20130344245 | SUPPRESSION OF PARASITIC DEPOSITION IN A SUBSTRATE PROCESSING SYSTEM BY SUPPRESSING PRECURSOR FLOW AND PLASMA OUTSIDE OF SUBSTRATE REGION - A substrate processing system includes a showerhead that comprises a base portion and a stem portion and that delivers precursor gas to a chamber. A collar connects the showerhead to an upper surface of the chamber. The collar includes a plurality of slots, is arranged around the stem portion of the showerhead, and directs purge gas through the plurality of slots into a region between the base portion of the showerhead and the upper surface of the chamber. | 12-26-2013 |
| 20140209562 | PLASMA ACTIVATED CONFORMAL FILM DEPOSITION - Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by the following operations: (a) exposing the substrate surface to a first reactant in vapor phase under conditions allowing the first reactant to adsorb onto the substrate surface; (b) exposing the substrate surface to a second reactant in vapor phase while the first reactant is adsorbed on the substrate surface; and (c) exposing the substrate surface to plasma to drive a reaction between the first and second reactants adsorbed on the substrate surface to form the film. | 07-31-2014 |
| 20150099372 | SEQUENTIAL PRECURSOR DOSING IN AN ALD MULTI-STATION/BATCH REACTOR - Disclosed herein are methods of depositing layers of material on multiple semiconductor substrates at multiple processing stations within one or more reaction chambers. The methods may include dosing a first substrate with film precursor at a first processing station and dosing a second substrate with film precursor at a second processing station with precursor flowing from a common source, wherein the timing of said dosing is staggered such that the first substrate is dosed during a first dosing phase during which the second substrate is not substantially dosed, and the second substrate is dosed during a second dosing phase during which the first substrate is not substantially dosed. Also disclosed herein are apparatuses having a plurality of processing stations contained within one or more reaction chambers and a controller with machine-readable instructions for staggering the dosing of first and second substrates at first and second processing stations. | 04-09-2015 |
| 20150145154 | MULTI-TRAY BALLAST VAPOR DRAW SYSTEMS - A system for supplying vaporized precursor includes an enclosure including an output. A plurality of trays is arranged in a stacked, spaced configuration inside the enclosure. The plurality of trays is configured to hold liquid precursor. A first conduit fluidly connects a carrier gas supply to the enclosure and includes a plurality of openings. A first valve is arranged along the first conduit and is configured to selectively control delivery of the carrier gas from the carrier gas supply through the first conduit to the plurality of openings in the first conduit. The plurality of openings is configured to direct the carrier gas across the liquid precursor in the plurality of trays, respectively. The output of the enclosure provides a mixture of the carrier gas and the vaporized precursor. | 05-28-2015 |
| 20150315706 | LOW VOLUME SHOWERHEAD WITH POROUS BAFFLE - A low volume showerhead in a semiconductor processing apparatus can include a porous baffle to improve the flow uniformity and purge time during atomic layer deposition. The showerhead can include a plenum volume, one or more gas inlets in fluid communication with the plenum volume, a faceplate including a plurality of first through-holes for distributing gas onto a substrate in the semiconductor processing apparatus, and a porous baffle positioned in a region between the plenum volume and the one or more gas inlets. The one or more gas inlets can include a stem having a small volume to improve purge time. The baffle can be porous and positioned between the stem and the plenum volume to improve flow uniformity and avoid jetting. | 11-05-2015 |
| 20160032453 | SYSTEMS AND METHODS FOR VAPOR DELIVERY - A vapor delivery system includes an ampoule to store liquid precursor and a heater to partially vaporize the liquid precursor. A first valve communicates with a push gas source and the ampoule. A second valve supplies vaporized precursor to a heated injection manifold. A valve manifold includes a first node in fluid communication with an outlet of the heated injection manifold, a third valve having an inlet in fluid communication with the first node and an outlet in fluid communication with vacuum, a fourth valve having an inlet in fluid communication with the first node and an outlet in fluid communication with a second node, a fifth valve having an outlet in fluid communication with the second node, and a sixth valve having an outlet in fluid communication with the second node. A gas distribution device is in fluid communication with the second node. | 02-04-2016 |
| 20160052655 | FILL ON DEMAND AMPOULE REFILL - Methods and apparatus for use of a fill on demand ampoule are disclosed. The fill on demand ampoule may refill an ampoule with precursor concurrent with the performance of other deposition processes. The fill on demand may keep the level of precursor within the ampoule at a relatively constant level. The level may be calculated to result in an optimum head volume. The fill on demand may also keep the precursor at a temperature near that of an optimum precursor temperature. The fill on demand may occur during parts of the deposition process where the agitation of the precursor due to the filling of the ampoule with the precursor minimally effects the substrate deposition. Substrate throughput may be increased through the use of fill on demand. | 02-25-2016 |
| 20160056032 | METHODS AND APPARATUSES FOR STABLE DEPOSITION RATE CONTROL IN LOW TEMPERATURE ALD SYSTEMS BY SHOWERHEAD ACTIVE HEATING AND/OR PEDESTAL COOLING - Disclosed are methods of depositing films of material on semiconductor substrates. The methods may include flowing a film precursor into a processing chamber through a showerhead substantially maintained at a first temperature, and adsorbing the film precursor onto a substrate held on a substrate holder such that the precursor forms an adsorption-limited layer while the substrate holder is substantially maintained at a second temperature. The first temperature may be at least about 10° C. above the second temperature, or the first temperature may be at or below the second temperature. The methods may further include removing at least some unadsorbed film precursor from the volume surrounding the adsorbed film precursor, and thereafter reacting adsorbed film precursor to form a film layer. Also disclosed herein are apparatuses having a processing chamber, a substrate holder, a showerhead, and one or more controllers for operating the apparatus to employ the foregoing film deposition techniques. | 02-25-2016 |
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| 20150295796 | ADJUSTING NETWORK DATA STORAGE BASED ON EVENT STREAM STATISTICS - The disclosed embodiments provide a system that facilitates the processing of network data. During operation, the system causes for display a graphical user interface (GUI) for configuring the generation of time-series event data from network packets captured by one or more remote capture agents. Next, the system causes for display, in the GUI, a first set of user-interface elements for managing one or more event streams containing the time-series event data, wherein managing the one or more event streams includes enabling the generation of a set of statistics from an event stream without subsequently storing and processing at least a first portion of the event stream by one or more components on a network. The GUI then updates the configuration information based on input received through the first set of user-interface elements. | 10-15-2015 |
| 20150341212 | VISUALIZATIONS OF STATISTICS ASSOCIATED WITH CAPTURED NETWORK DATA - The disclosed embodiments provide a system that facilitates the processing of network data. During operation, the system causes for display a graphical user interface (GUI) for configuring the generation of time-series event data from network packets captured by one or more remote capture agents. Next, the system causes for display, in the GUI, a first set of user-interface elements containing a set of statistics associated with one or more event streams that comprise the time-series event data. The system then causes for display, in the GUI, one or more graphs comprising one or more values from the set of statistics. Finally, the system causes for display, in the GUI, a value of a statistic from the set of statistics based on a position of a cursor over the one or more graphs. | 11-26-2015 |
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| 20130204578 | Method for Obtaining Information about a Radiation Source or a Material Interacting with a Radiation Source and a Measurement Setup for Performing the Method - A method for obtaining information about an unknown neutron source or an unknown material interacting with a known neutron source comprises the steps of: (a) providing a radiation detector capable of delivering a neutron energy information allowing the production of response histogram(s) as a function of neutron energy, (b) measuring with said radiation detector neutrons being emitted from said unknown neutron source or from said unknown material, (c) deriving from said measured neutrons a neutron energy spectrum, especially in form of a histogram, (d) normalizing said energy spectrum or histogram relative to a parameter or set of parameters derived from the measurement of a different variable, (e) comparing said normalized energy spectrum or histogram with known energy spectra or histograms, and (f) drawing conclusions on the basis of said comparison about the nature of the unknown neutron source or unknown material. | 08-08-2013 |
| 20140264058 | Method for Obtaining Information Signatures from Nuclear Material or About the Presence, the Nature and/or the Shielding of a Nuclear Material and Measurement Setup for Performing Such Method - The invention relates to a method for obtaining information or signatures about the presence or the nature of a nuclear radiation source, especially in a homeland security application, said nuclear radiation source emitting in a time or angle correlated manner at least a first radiation and a second radiation. The method includes the steps of detecting said first radiation with at least one first radiation detector and detecting said second radiation with at least one second radiation detector. The detection of said second radiation is triggered by said detection of said first radiation in a manner that is adapted to the radiation's correlation structure, thereby increasing the signal-to-background ratio for the detection of said second radiation. | 09-18-2014 |
| 20140361186 | Method for Detecting and Identifying Nuclear Material in a Container and Radiation Monitoring Arrangement for Conducting the Method - The invention relates to an improved method for detecting and possibly identifying and/or characterizing nuclear and/or radiological material in a container, vehicle, or on a person, comprising the steps of: a. providing at least one detector, which is capable of detecting radiation events being interrelated to nuclear or radiological material; b. bringing the at least one detector in the vicinity of the container, vehicle or person to be monitored; c. detecting radiation events being interrelated to the container, vehicle or person to be monitored; d. assigning each detected radiation event an individual time stamp in order to generate a time pattern of the detected radiation events; and e. analyzing the time pattern with respect to time correlation structures in order to identify a presence and/or characteristics of the nuclear or radiological material. | 12-11-2014 |
| 20140374606 | Detector Arrangement for the Detection of Ionizing Radiation and Method for Operating Such a Detector Arrangement - A detector arrangement ( | 12-25-2014 |
