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| 20130198982 | WAFER MANUFACTURING CLEANING APPARATUS, PROCESS AND METHOD OF USE - A cleaning wafer or substrate for use in cleaning, or in combination with, components of, for example, integrated chip manufacturing apparatus. The cleaning substrate can include a substrate having varying predetermined surface features, such as one ore more predetermined adhesive, non-tacky, electrostatic, projection, depression, or other physical sections. The predetermined features can provide for more effective cleaning of the components with which they are used, such as an integrated chip manufacturing apparatus in the place of the integrated chip wafer. The cleaning substrate can be urged into cleaning or other position by vacuum, mechanical, electrostatic, or other forces. The cleaning substrate can adapted to accomplish a variety of functions, including abrading or polishing. The cleaning substrate may be made by a novel method of making, and it may then be used in a novel method of use I combination with chip manufacturing apparatus. | 08-08-2013 |
| 20130333128 | WAFER MANUFACTURING CLEANING APPARATUS, PROCESS AND METHOD OF USE - A cleaning wafer or substrate for use in cleaning, or in combination with, components of, for example, integrated chip manufacturing apparatus. The cleaning substrate can include a substrate having varying predetermined surface features, such as one or more predetermined adhesive, non-tacky, electrostatic, projection, depression, or other physical sections. The predetermined features can provide for more effective cleaning of the components with which they are used, such as an integrated chip manufacturing apparatus in the place of the integrated chip wafer. The cleaning substrate can be urged into cleaning or other position by vacuum, mechanical, electrostatic, or other forces. The cleaning substrate can adapted to accomplish a variety of functions, including abrading or polishing. The cleaning substrate may be made by a novel method of making, and it may then be used in a novel method of use I combination with chip manufacturing apparatus. | 12-19-2013 |
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| 20100132736 | Test Cell Conditioner (TCC) Surrogate Cleaning Device - A test cell conditioner (TCC) surrogate cleaning device for cleaning the pin elements in a socket or electrical interface receptacle of a load board includes a main testing frame, a plurality of trays, testing chip receptacles and one or more pick up devices. Chips to be tested (electronic elements) are entrained on a tray, and a plurality of adhesive cleaning chips are entrained on another tray. The adhesive cleaning chip contains a solid layer and an adhesive layer, and an abrasive material is mingled in the adhesive layer. The pick up device removes the adhesive cleaning chip to a position above the testing chip receptacle and cleans up the oxides and other foreign materials sticking on the receptacle by absorption or abrasion. Interrupting the operation of the apparatus to clean the test probe by etching can be excluded so as to improve the working efficiency. | 06-03-2010 |
| 20100258144 | WAFER MANUFACTURING CLEANING APPARATUS, PROCESS AND METHOD OF USE - A cleaning wafer or substrate for use in cleaning, or in combination with, components of, for example, integrated chip manufacturing equipment. The cleaning substrate can include a substrate having varying predetermined surface features, such as one or more predetermined adhesive, non-tacky, electrostatic, or projection, depression, or other physical sections. The predetermined features can provide for more effective cleaning of the components with which they are used, such as in an integrated chip manufacturing apparatus in the place of the integrated chip wafer. The cleaning substrate can be urged into cleaning or other position by vacuum, mechanical, electrostatic, or other forces. The cleaning substrate can be adapted to accomplish a variety of functions, including abrading or polishing. The cleaning substrate may made by a novel method of making, and it may then be used in a novel method of use in combination with chip manufacturing apparatus. | 10-14-2010 |
| 20110132396 | APPARATUSES, DEVICE, AND METHODS FOR CLEANING TESTER INTERFACE CONTACT ELEMENTS AND SUPPORT HARDWARE - A medium for predictably cleaning the contact elements and support hardware of a tester interface, such as a probe card and a test socket, while it is still in manual, semi-automated, and automated handling device and the electrical test equipment is disclosed so that the functionality and performance of the individual die or IC package may be electrically evaluated. | 06-09-2011 |
| 20120042463 | APPARATUSES, DEVICE, AND METHODS FOR CLEANING TESTER INTERFACE CONTACT ELEMENTS AND SUPPORT HARDWARE - A medium for predictably cleaning the contact elements and support hardware of a tester interface, such as a probe card and a test socket, while it is still in manual, semi-automated, and automated handling device and the electrical test equipment is disclosed so that the functionality and performance of the individual die or IC package may be electrically evaluated. | 02-23-2012 |
| 20140331421 | APPARATUSES, DEVICE, AND METHODS FOR CLEANING TESTER INTERFACE CONTACT ELEMENTS AND SUPPORT HARDWARE - A medium for predictably cleaning the contact elements and support hardware of a tester interface, such as a probe card and a test socket, while it is still in manual, semi-automated, and automated handling device and the electrical test equipment is disclosed so that the functionality and performance of the individual die or IC package may be electrically evaluated. | 11-13-2014 |
| 20140338698 | WORKING SURFACE CLEANING SYSTEM AND METHOD - A cleaning film designed to remove foreign matter and particulates from working surfaces of cleaning wafers used in semiconductor processes. These processes include wafer sort test for cleaning of probe card pins and FEOL tooling for cleaning during wafer handling equipment and wafer chucks. The debris collected on the cleaning wafer working surfaces is removed by the particle removal film allowing the debris and foreign matter to be discarded. The use of the cleaning film allows the operator to refresh the cleaning wafer without use of an outside vendor and eliminates wet washing and the use of solvents in the cleaning process. | 11-20-2014 |
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| 20140149521 | USING EXTENSIONS TO ROUTE COMMUNICATIONS IN A VIRTUAL ENVIRONMENT - Routing incoming communications in a data processing system is provided. In response to receiving a current incoming communication to a communication address associated with the data processing system, it is determined whether an extension is associated with the current incoming communication. In response to determining that an extension is associated with the current incoming communication, the extension associated with the current incoming communication is determined to match an extension in a list of extensions corresponding to a plurality of profiles in the data processing system. Then, the current incoming communication is routed to a profile in the plurality of profiles that corresponds to the extension associated with the current incoming communication. | 05-29-2014 |
| 20140344351 | DISPLAYING USER'S DESIRED CONTENT BASED ON PRIORITY DURING LOADING PROCESS - There are provided a method, a system and a computer program product for customizing a loading message to be displayed during a loading process. The system receives, from a client device used by a user, an event message that indicates a start of the loading process. The system receives, from the client device, one or more content sources. The system selects a content source among the one or more content sources. The system displays content from the selected content source to the user during the loading process. | 11-20-2014 |
| 20140344353 | Relevant Commentary for Media Content - Methods, products, apparatuses, and systems may provide and/or receive relevant commentary for media content. Additionally, the relevant commentary may be provided and/or received in response to rendering a section of the media content. In addition, the relevant commentary may be provided and/or received based on one or more of a preference for a temporal perspective, a preference for a viewpoint, and/or a preference for a state of a social network. Moreover, the relevant commentary may be provided and/or received based on a topic related to the section of the media content. The relevant commentary may be provided and/or received based on an authorship independent of a media content access event by an author of the relevant commentary. In addition, an ambiguous section of the media content may be clarified, and/or an interactive commentary session may be simulated. | 11-20-2014 |
| 20140344359 | RELEVANT COMMENTARY FOR MEDIA CONTENT - Methods, products, apparatuses, and systems may provide and/or receive relevant commentary for media content. Additionally, the relevant commentary may be provided and/or received in response to rendering a section of the media content. In addition, the relevant commentary may be provided and/or received based on one or more of a preference for a temporal perspective, a preference for a viewpoint, and/or a preference for a state of a social network. Moreover, the relevant commentary may be provided and/or received based on a topic related to the section of the media content. The relevant commentary may be provided and/or received based on an authorship independent of a media content access event by an author of the relevant commentary. In addition, an ambiguous section of the media content may be clarified, and/or an interactive commentary session may be simulated. | 11-20-2014 |
