Patent application number | Description | Published |
20090068409 | Skin cleansing and/or care article having a raised pattern at its surface and method of manufacturing said article - The invention relates to a skin cleansing and/or care article, such as a makeup remover pad based on hydrophilic cotton fibres, intended to apply and/or remove liquid or semi-solid substances to/from the skin, comprising at least two outer layers ( | 03-12-2009 |
20100297191 | METHOD FOR MANUFACTURING A CLEANSING AND/OR CARE ARTICLE - The invention relates to the use of a cleansing and/or care composition for impregnating a pile of absorbent supports. | 11-25-2010 |
20110302734 | ITEM FOR CLEANING THE SKIN - A skin-cleansing article that is activated by moistening with water, followed by a mechanical action so as to obtain a cleansing foam, includes a fibrous substrate and a cleansing composition. The substrate is a pad based on water-jet-entangled cotton fibres with a basis weight of between 100 and 300 g/m | 12-15-2011 |
20140135245 | CLEANING COMPOSITION - A composition for cleaning, in particular for cleansing of the skin and/or mucous membranes, in particular a personal care cleansing composition, to be applied onto tissue paper, in particular toilet paper, and uses thereof. The composition including at least 70% by weight of water, 0.1 to 1% by weight of at least one gelling agent, and 0.1 to 10% by weight of at least one surfactant including at least one foaming surfactant, relative to the total weight of the composition. | 05-15-2014 |
Patent application number | Description | Published |
20100282596 | METHODS AND SYSTEMS FOR REMOVING A MATERIAL FROM A SAMPLE - The present method relates to processes for the removal of a material from a sample by a gas chemical reaction activated by a charged particle beam. The method is a multiple step process wherein in a first step a gas is supplied which, when a chemical reaction between the gas and the material is activated, forms a non-volatile material component such as a metal salt or a metaloxide. In a second consecutive step the reaction product of the first chemical reaction is removed from the sample. | 11-11-2010 |
20100297362 | METHOD FOR PROCESSING AN OBJECT WITH MINIATURIZED STRUCTURES - A method for processing an object with miniaturized structures is provided. The method includes feeding a reaction gas onto a surface of the object. The method also includes processing the object by directing an energetic beam onto a processing site in a region, which is to be processed, on the surface of the object, in order to deposit material on the object or to remove material from the object. The method further includes detecting interaction products of the beam with the object, and deciding whether the processing of the object is to be continued or can be terminated with the aid of information which is obtained from the detected interaction products of the beam with the object. The region to be processed is subdivided into a number of surface segments, and the interaction products detected upon the beam striking regions of the same surface segment are integrated to form a total signal in order to determine whether processing of the object must be continued or can be terminated. | 11-25-2010 |
20120273458 | METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE WITH A FOCUSED PARTICLE BEAM - The invention relates to a method for processing a substrate with a focussed particle beam which incidents on the substrate, the method comprising the steps of: (a) generating at least one reference mark on the substrate using the focused particle beam and at least one processing gas, (b) determining a reference position of the at least one reference mark, (c) processing the substrate using the reference position of the reference mark, and (d) removing the at least one reference mark from the substrate. | 11-01-2012 |
20130156939 | METHOD AND APPARATUS FOR ANALYZING AND/OR REPAIRING OF AN EUV MASK DEFECT - The invention relates to a method for analyzing a defect of a photolithographic mask for an extreme ultraviolet (EUV) wavelength range (EUV mask) comprising the steps of: (a) generating at least one focus stack relating to the defect using an EUV mask inspection tool, (b) determining a surface configuration of the EUV mask at a position of the defect, (c) providing model structures having the determined surface configuration which have different phase errors and generating the respective focus stacks, and (d) determining a three dimensional error structure of the EUV mask defect by comparing the at least one generated focus stack of the defect and the generated focus stacks of the model structures. | 06-20-2013 |
20140165236 | METHOD AND APPARATUS FOR ANALYZING AND FOR REMOVING A DEFECT OF AN EUV PHOTOMASK - The invention refers to a method for analyzing a defect of an optical element for the extreme ultra-violet wavelength range comprising at least one substrate and at least one multi-layer structure, the method comprising the steps: (a) determining first data by exposing the defect to ultra-violet radiation, (b) determining second data by scanning the defect with a scanning probe microscope, (c) determining third data by scanning the defect with a scanning particle microscope, and (d) com-bining the first, the second and the third data. | 06-12-2014 |
20140255831 | METHOD AND APPARATUS FOR PROTECTING A SUBSTRATE DURING PROCESSING BY A PARTICLE BEAM - The invention refers to a method and apparatus for protecting a substrate during a processing by at least one particle beam. The method comprises the following steps: (a) applying a locally restrict limited protection layer on the substrate; (b) etching the substrate and/or a layer arranged on the substrate by use of the at least one particle beam and at least one gas; and/or (c) depositing material onto the substrate by use of the at least one particle beam and at least one precursor gas; and (d) removing the locally limited protection layer from the substrate. | 09-11-2014 |