Patent application number | Description | Published |
20080297276 | Nano-resonator including beam with composite structure - A nano-resonator including a beam having a composite structure may include a silicon carbide beam and/or a metal conductor. The metal conductor may be vapor-deposited on the silicon carbide beam. The metal conductor may have a density lower than a density of the silicon carbide beam. | 12-04-2008 |
20090029118 | METHOD OF MULTI-STAGE SUBSTRATE ETCHING AND TERAHERTZ OSCILLATOR MANUFACTURED USING THE SAME METHOD - A method of multi-stage substrate etching and a terahertz oscillator manufactured by using the method are provided. The method comprises the steps of forming a first mask pattern on any one surface of a first substrate, forming a hole by etching the first substrate using the first mask pattern as an etching mask, bonding, to the first substrate, a second substrate having the same thickness as a depth to be etched, forming a second mask pattern on the second substrate bonded, forming a hole by etching the second substrate using the second mask pattern as an etching mask, and removing an oxide layer having the etching selectivity between the first substrate and the second substrate, whereby the etched bottom is made uniformly even in a deep step, the edge curvature is minimized, and a T-shape is prevented from being formed on the etched wall face to thereby improve the etching quality. Further, the etching depth is previously controlled by lapping or polishing, the upper and lower substrates are precisely boned to each other using the alignment key, and a multi-layer processing is possibly performed thereto, so that the precision and the uniformity in structure of the oscillator or amplifier is obtained. | 01-29-2009 |
20090120903 | Method of multi-stage substrate etching and terahertz oscillator manufactured using the same method - A method of multi-stage substrate etching is provided. The method comprises the steps of: forming a first mask pattern on one surface of a first substrate; forming a hole by etching the first substrate using the first mask pattern as an etching mask; forming a second mask pattern on one surface of a second substrate; forming a hole by etching the second substrate to a predetermined depth using the second mask pattern as an etching mask; bonding the first and second substrates together such that an etched surface of the first substrate faces an etched surface of the second substrate; forming a third mask pattern on the second substrate; and forming a hole passing through the second substrate by etching the second substrate using the third mask pattern as an etching mask, whereby it is prevented the occurrence of a radius of curvature in the bottom surface and the overhang structure occurring on a step surface, so that etching quality is improved, a precise bonding between the substrates is obtained using the alignment key positioned on each substrate, and a multi-layer process is carried out. | 05-14-2009 |
20090233240 | Method of fabricating Triode-Structure field-emission device - Example embodiments provide a method of fabricating a triode-structure field-emission device. A cathode, an insulating layer, and a gate metal layer may be sequentially formed on a substrate. A first resist pattern having a first opening and a second resist pattern having a second opening smaller than the first opening may be formed to be sequentially laminated on the gate metal layer. Then, the gate metal layer and the insulating layer may be etched using the first resist pattern to form a gate electrode and an insulating layer having a first hole and a second hole corresponding to the first opening. A catalyst layer may be formed on the cathode exposed through the first and second holes using the second resist pattern. After the first resist pattern, second resist pattern, and the catalyst layer on the second resist pattern are removed, an emitter may be formed on the catalyst layer in the second hole. | 09-17-2009 |
20090252938 | Substrate structure and method of forming the same - Provided are a substrate structure and method of forming the same. The method of forming the substrate structure may include etching a substrate to form an etched portion having a vertical surface, forming a diffusion material layer on the whole substrate or in part of the substrate; annealing the diffusion material layer to form a seed layer diffused downward toward the surface of the etched portion, and forming a metal layer on the seed layer. Accordingly, surface characteristics of the etched portion of the substrate may be enhanced by the seed layer, and therefore, a metal layer with improved adhesion and a uniform thickness may be formed on the vertical surface of the etched portion. | 10-08-2009 |
20090289542 | Electron beam focusing electrode and electron gun using the same - An electron beam focusing electrode and an electron gun using the same may include a plate having a polygonal through-hole; at least a projecting portion formed on at least one side of the through-hole. By using the electron beam focusing electrode, a spreading phenomenon of an electron beam having a rectangular cross section may be reduced. Further, the output of the electron gun may be increased, and electron beams may be easily focused. | 11-26-2009 |
20100188315 | Electronic mirror and method for displaying image using the same - An electronic mirror and a method for displaying an image using the electronic mirror are provided. The electronic mirror may include a display unit, a detecting unit and a control unit. The detecting unit may receive a signal transmitted from the outside. The control unit may control the detecting unit and the display unit to display the signal received at the detecting unit on the display unit as an image. The image displayed on the display unit may be output from the electronic mirror through the detecting unit. The electronic mirror may further include a reflecting unit. A light from the outside may pass through the detecting unit and the display unit and then be reflected on the reflecting unit. The reflected light may be output from the electronic mirror through the display unit and the detecting unit. | 07-29-2010 |
20120133450 | METHOD OF MULTI-STAGE SUBSTRATE ETCHING AND TERAHERTZ OSCILLATOR MANUFACTURED USING THE SAME METHOD - A method of multi-stage substrate etching and a terahertz oscillator manufactured by using the method are provided. The method comprises the steps of forming a first mask pattern on any one surface of a first substrate, forming a hole by etching the first substrate using the first mask pattern as an etching mask, bonding, to the first substrate, a second substrate having the same thickness as a depth to be etched, forming a second mask pattern on the second substrate bonded, forming a hole by etching the second substrate using the second mask pattern as an etching mask, and removing an oxide layer having the etching selectivity between the first substrate and the second substrate. | 05-31-2012 |
20130069731 | METHOD OF MULTI-STAGE SUBSTRATE ETCHING AND TERAHERTZ OSCILLATOR MANUFACTURED USING THE SAME METHOD - A method of multi-stage substrate etching, includes forming a first mask pattern on one surface of a first substrate; forming a hole by etching the first substrate using the first mask pattern as an etching mask; forming a second mask pattern on one surface of a second substrate; forming a hole by etching the second substrate to a predetermined depth using the second mask pattern as an etching mask; bonding the first and second substrates together such that an etched surface of the first substrate faces an etched surface of the second substrate; forming a third mask pattern on the second substrate; and forming a hole passing through the second substrate by etching the second substrate using the third mask pattern as an etching mask, whereby it is prevented the occurrence of a radius of curvature in the bottom surface and the overhang structure occurring on a step surface. | 03-21-2013 |
20130193340 | ELECTRON BEAM FOCUSING ELECTRODE AND ELECTRON GUN USING THE SAME - An electron beam focusing electrode and an electron gun using the same may include a plate having a polygonal through-hole; at least a projecting portion formed on at least one side of the through-hole. By using the electron beam focusing electrode, a spreading phenomenon of an electron beam having a rectangular cross section may be reduced. Further, the output of the electron gun may be increased, and electron beams may be easily focused. | 08-01-2013 |
Patent application number | Description | Published |
20090049281 | MULTIMEDIA DECODING METHOD AND MULTIMEDIA DECODING APPARATUS BASED ON MULTI-CORE PROCESSOR - Provided are a multimedia decoding method and multimedia decoding apparatus based on a multi-core platform including a central processor and a plurality of operation processors. The multimedia decoding method includes performing a queue generation operation on input multimedia data to generate queues of one or more operations of the multimedia data which are to be performed by the central processor and the operation processors, wherein the queue generation operation is performed by the central processor; performing motion compensation operations on partitioned data regions of the multimedia data by one or more motion compensation processors among the operation processors; and performing a deblocking operation on the multimedia data by a deblocking processor among the operation processors. | 02-19-2009 |
20090154572 | METHOD AND APPARATUS FOR VIDEO DECODING BASED ON A MULTI-CORE PROCESSOR - A multi-core processor device and a video decoding method using a multi-core processor, which can efficiently use system resources in a multi-core processor environment that requires a considerable amount of computation. The multi-core processor device includes a video decoder module which includes a plurality of function modules for performing video decoding; a memory which stores an input bitstream and loads the function modules; and a multi-core processor which includes a plurality of cores that perform a video decoding operation on the input bitstream by using the function modules, the cores including a first core and a second core, wherein, if the first core becomes idle during the video decoding operation, the second core allocates part of a remaining task of the second core to the first core and thus reduces an idle time of the first core. | 06-18-2009 |
20100083273 | METHOD AND MEMORY MANAGER FOR MANAGING MEMORY - A memory managing method and memory manager for a multi processing environment are provided. The memory manager adjusts the number of processors assigned to a consumer process and/or an assignment unit size of data to be consumed by the consumer process based on a condition of a shared queue which is shared by a producer process producing data and the consumer process consuming the data. | 04-01-2010 |
20110191782 | APPARATUS AND METHOD FOR PROCESSING DATA - A data processing apparatus and method for allocating data to processors, allowing the processors to process the data efficiently. The data processing apparatus may predict a result of processing data, based on a workload for the data, according to a number of processors, and may determine the number of processors to be allocated with the data, using the predicted processing result. | 08-04-2011 |
20120060161 | UI FRAMEWORK DISPLAY SYSTEM AND METHOD - A technique of efficiently improving the processing speed and response time of a user interface (UI) framework in a multi-core environment is provided. According to the technique, it is possible to improve both the throughput and response time of a UI by causing a plurality of workers to process a frame display command. | 03-08-2012 |
20120131588 | APPARATUS AND METHOD FOR DATA PROCESSING IN HETEROGENEOUS MULTI-PROCESSOR ENVIRONMENT - An apparatus for data processing in a heterogeneous multi-processor environment are provided. The apparatus including an analysis unit configured to analyze 1) operations to be run in connection with data processing and 2) types and a number of processors available for the data processing, a partition unit configured to dynamically partition data into a plurality of data regions having different sizes based on the analyzed operations and operation-specific processor priority information, which is stored in advance of running the operations, and a scheduling unit configured to perform scheduling by allocating operations to be run in the data regions between the available processors. | 05-24-2012 |
20120154410 | APPARATUS AND METHOD FOR PROCESSING A FRAME IN CONSIDERATION OF THE PROCESSING CAPABILITY AND POWER CONSUMPTION OF EACH CORE IN A MULTICORE ENVIRONMENT - An apparatus and method for processing a frame in consideration of processing capability and power consumption for each core in a multi-core system are provided. To perform a user interface drawing in a multi-core environment, an optimum combination of hardware components capable of operating with the minimum of power consumption while satisfying a requirement of a user may be obtained and a parallel user interface drawing may be performed by use of the optimum combination of hardware components. | 06-21-2012 |