Patent application number | Description | Published |
20080240461 | PORTABLE ELECTRONIC APPARATUS AND SOUND OUTPUT-CONTROLLING PROGRAM - Information on a use situation of a portable electronic apparatus possessed by a user is acquired from an illuminance sensor, a contact sensor, and a GPS portion as use situation-acquiring portions, and a volume of a sound outputted either to a speaker provided as an internal sound-outputting unit in the portable electronic apparatus or to an external sound-outputting unit such as a headphone is controlled in accordance with the acquired information. Thus, even when a plug of the headphone falls off from the portable electronic apparatus despite an intention of the user, an unpleasant sound is prevented from being outputted from the speaker to a circumference. | 10-02-2008 |
20090014988 | Pedestrian Airbag Apparatus - A pedestrian airbag apparatus is provided that has a portion, when inflated, extending along a vehicle body's outer surface so as to spread into the surroundings of a case, and connected to the case by means of a tether, and the occurrence of a deformation such as warpage or the like on an airbag is suppressed, the deformation being due to the tension of the tether. Each of both end sides of a cowl masking portion | 01-15-2009 |
20090046891 | HAIR STYLE SIMULATION IMAGE CREATING METHOD - A hairstyle simulation image is formed by combining a face image and a hair image such that a hair image of any hairstyle can be simply combined with the face image without impairing the naturalness of the fitted face and hair images, irrespective of whether or not a part of the face is covered with the hair. The hairstyle simulation image formed by combining the face and hair images is formed as follows. First, two eyes in the face image are detected, and a semi-oval shaped curve L | 02-19-2009 |
20090053649 | Lactone copolymer and radiation-sensitive resin composition - A radiation-sensitive resin composition excelling in basic properties as a resist such as sensitivity, resolution, and the like, having a wide depth of focus (DOF) to both a line-and-space pattern and an isolated space pattern, and exhibiting a minimal line width change due to fluctuation of a bake temperature, and having a small line width limit in which the line pattern destroying phenomenon does not occur, and a lactone-containing copolymer useful as a resin component of the composition are provided. | 02-26-2009 |
20090151006 | GROUP REGISTRATION DEVICE, GROUP REGISTRATION RELEASE DEVICE, GROUP REGISTRATION METHOD, LICENSE ACQUISITION DEVICE, LICENSE ACQUISITION METHOD, TIME SETTING DEVICE, AND TIME SETTING METHOD - There is provided a group registration device or the like which is capable of simplifying registration processing to readily perform group registration while retaining secure registration processing. | 06-11-2009 |
20090206951 | ELECTRONIC DEVICE - An electronic device comprising: a wiring substrate having a first power-supply wiring to which a first power-supply potential is applied and a second power-supply wiring to which a second power-supply potential lower than the first power-supply potential is applied; a microcomputer having first and second power-supply terminals in which the first power-supply terminal is connected to the first power-supply wiring and the second power-supply terminal is connected to the second power-supply wiring; and a connector connected to the first and second power-supply wirings, wherein an inductor element for correcting an impedance error of the first and second wirings is connected in series to either one of the first and second power-supply wirings. According to such configuration, unnecessary electromagnetic radiation posed by a common current can be suppressed. | 08-20-2009 |
20090305161 | LIQUID IMMERSION LITHOGRAPHY - A radiation-sensitive resin composition for liquid immersion lithography which produces an excellent pattern profile, exhibits excellent resolution, provides sufficient focal depth allowance, and elutes only the minimal amount in the liquid when brought in contact with the liquid during exposure to radiation. The radiation-sensitive resin composition forms a photoresist film in liquid immersion lithography, in which radiation is emitted through a liquid for use in liquid immersion lithography having a refractive index larger than 1.44 and smaller than 1.85 at a wavelength of 193 nm, existing between a lens and a photoresist, the composition comprising a resin having a recurring unit with a lactone structure, which is insoluble or scarcely soluble in alkali, but becomes soluble in alkali by the action of an acid, and a radiation-sensitive acid generator. | 12-10-2009 |
20100003615 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD - An upper layer-forming composition formed on a photoresist while causing almost no intermixing with the photoresist film and a photoresist patterning method are provided. The upper layer-forming composition is stably maintained without being eluted in a medium such as water during liquid immersion lithography and is easily dissolved in an alkaline developer. The upper layer-forming composition covers a photoresist film for forming a pattern by exposure to radiation. The composition comprises a resin dissolvable in a developer for the photoresist film and a solvent in which the resin is dissolved. The solvent has a viscosity of less than 5.2×10 | 01-07-2010 |
20100009292 | RESIN COMPOSITION FOR MICROPATTERN FORMATION AND METHOD OF MICROPATTERN FORMATION - A resin composition which can increase the pattern shrink rate while maintaining the advantages of capability of effectually and precisely micronizing the resist pattern gaps irrespective of the surface conditions of the substrate and forming resist patterns exceeding the wavelength limit economically at low cost in a good condition having only small defects, and a method of efficiently forming a micropattern using the resin composition are disclosed. The resin composition for forming a micropattern includes a hydroxyl group-containing resin, a crosslinking component, and an alcohol solvent which contains an alcohol and not more than 10 mass % of water relative to the total solvent. The crosslinking component includes a compound having two or more acryloyloxy groups in the molecule. | 01-14-2010 |
20100068650 | POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION - A method of patterning using double exposure patterning in a liquid immersion lithographic process is provided. The patterning method comprises a step of forming a first pattern on a substrate using a first resist layer forming composition, a step of making the first pattern inactive, a step of forming a second pattern on a substrate on which a pattern has been formed using a second resist layer forming composition and exposing the second resist layer to radiation, and a step of developing the exposed resist layer to form a second pattern in the space area of the first pattern. The first resist layer forming composition contains a cross-linking agent which accelerates conversion of the first layer from positive-working to negative-working. | 03-18-2010 |
20100139681 | HAIR COSMETIC COMPOSITION - A hair cosmetic composition containing the following components (A) and (B): (A) is/are one or more copolymers selected from the following components (A1) and (A2):
| 06-10-2010 |
20100190104 | METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE METHOD - A pattern forming method includes (1) selectively exposing a first resist layer, and developing the exposed first resist layer to form a first pattern, (2) applying a resin composition containing a hydroxyl group-containing resin and a solvent to the first pattern, baking the applied resin composition, and developing the baked resin composition to form a second pattern, the hydroxyl group-containing resin becoming insoluble or scarcely soluble in a developer when baked, and (3) totally or selectively exposing the second pattern to make the second pattern partly soluble in the developer, and developing the exposed second pattern to form a third pattern in which at least a hole or a groove is formed in the second pattern. | 07-29-2010 |
20100205677 | CONTENT INFORMATION PROVIDING SYSTEM, CONTENT INFORMATION PROVIDING SERVER, CONTENT REPRODUCTION APPARATUS, CONTENT INFORMATION PROVIDING METHOD, CONTENT REPRODUCTION METHOD AND COMPUTER PROGRAM - A content information providing system is disclosed which can protect the copyrights of contents while permitting users who do not purchase the contents to utilize the contents. A content information providing server includes a user information storage section for storing a user key unique to each user, a content key storage section for storing content keys unique to individual contents, a recommendation section for selecting a content to be recommended to the user, a content key encryption section for encrypting the selected content key with a user key of the user of a target of the recommendation, and a content information sender section for transmitting the encrypted content key to a content reproduction apparatus used by the user. The content reproduction apparatus includes a content information receiver section for receiving the content key, and a content key decryption section for decrypting the encrypted content key. | 08-12-2010 |
20100301466 | SEMICONDUCTOR DEVICE - The reliability of a semiconductor device is to be improved. A microcomputer chip (semiconductor chip) having a plurality of pads formed on a main surface thereof is mounted over an upper surface of a wiring substrate in an opposed state of the chip main surface to the substrate upper surface. Pads coupled to a plurality of terminals (bonding leads) formed over the substrate upper surface comprise a plurality of first pads in which a unique electric current different from the electric current flowing through other pads flows and a plurality of second pads in which an electric current common to the pads flows or does not flow. Another first pad of the first pads or one of the second pads are arranged next to the first pad. The first pads are electrically coupled to a plurality of bonding leads respectively via a plurality of bumps (first conductive members), while the second pads are bonded to the terminals via a plurality of bumps (second conductive members). | 12-02-2010 |
20100310988 | RESIST PATTERN-FORMING METHOD AND RESIST PATTERN MINIATURIZING RESIN COMPOSITION - A resist pattern-forming method includes forming a first resist pattern using a first positive-tone radiation-sensitive resin composition. A resist pattern-miniaturizing resin composition is applied to the first resist pattern. The resist pattern-miniaturizing resin composition applied to the first resist pattern is baked and developed to form a second resist pattern that is miniaturized from the first resist pattern. A resist pattern-insolubilizing resin composition is applied to the second resist pattern. The resist pattern-insolubilizing resin composition applied to the second resist pattern is baked and washed to form a third resist pattern that is insoluble in a developer and a second positive-tone radiation-sensitive resin composition. A second resist layer is formed on the third resist pattern using the second positive-tone radiation-sensitive resin composition. The second resist layer is exposed and developed to form a fourth resist pattern. | 12-09-2010 |
20100323292 | RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN - A resist pattern formation method includes (1) a step of forming a first resist pattern which includes forming a first resist layer on a substrate, selectively exposing the first resist layer to radiation through a mask, and developing the exposed first resist layer, (2) a step of insolubilizing the first resist pattern by coating the first resist pattern with a resist pattern insolubilizing resin composition, baking or curing with UV, and developing the resist pattern insolubilizing resin composition, (3) a step of forming a second resist layer on the insolubilized resist pattern and selectively exposing the second resist layer to radiation through a mask, and (4) a step of developing the exposed second resist layer to form a second resist pattern. | 12-23-2010 |
20110126030 | ELECTRONIC DEVICE - An electronic device comprising: a wiring substrate having a first power-supply wiring to which a first power-supply potential is applied and a second power-supply wiring to which a second power-supply potential lower than the first power-supply potential is applied; a microcomputer having first and second power-supply terminals in which the first power-supply terminal is connected to the first power-supply wiring and the second power-supply terminal is connected to the second power-supply wiring; and a connector connected to the first and second power-supply wirings, wherein an inductor element for correcting an impedance error of the first and second wirings is connected in series to either one of the first and second power-supply wirings. According to such configuration, unnecessary electromagnetic radiation posed by a common current can be suppressed. | 05-26-2011 |
20120028198 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD - An upper layer-forming composition includes a resin, and a solvent. The resin is dissolvable in a developer for a photoresist film which is to be covered by the upper layer-forming composition to form a pattern by exposure to radiation. The solvent dissolves the resin in the solvent. The solvent includes a compound shown by a formula (1). Each of R | 02-02-2012 |
20120041275 | DERIVATION METHOD OF DISCRIMINATION THRESHOLD OF NAIL APPARATUS MELANOMA - An derivation method of a nail apparatus melanoma discrimination threshold includes a first step of assuming a color image of longitudinal melanonychia as three-dimensional vectors each composed of RGB parameter values of each pixel and finding an angle between each of the three-dimensional vectors and a reference vector, a second step of finding a probability of occurrence according to a frequency distribution of the angles found in the first step, and a third step of finding, according to the probability of occurrence found in the second step, a threshold for a parameter to discriminate whether the longitudinal melanonychia is malignant or benign. | 02-16-2012 |
20120156621 | RADIATION-SENSITIVE RESIN COMPOSITION - A radiation-sensitive resin composition includes a resin including a repeating unit shown by a following general formula (1), a photoacid generator and a photodisintegrating base shown by a following general formula (8). R | 06-21-2012 |
20120244478 | RESIST PATTERN FORMATION METHOD - A resist pattern formation method includes providing a first positive-tone radiation-sensitive resin composition on a substrate to form a first resist layer. The first resist layer is selectively exposed and developed to form a first resist pattern. The first resist pattern is coated with a resist pattern insolubilizing resin composition which comprises a resin and an alcohol solvent, the resin having a hydroxyl group. The resist pattern insolubilizing resin composition is baked or cured with UV to insolubilize the first resist pattern in a developer and in a second positive-tone radiation-sensitive resin composition. The resist pattern insolubilizing resin composition is developed to form an insolubilized resist pattern. The second positive-tone radiation-sensitive resin composition is provided on the insolubilized resist pattern to form a second resist layer. The second resist layer is selectively exposed and developed to form a second resist pattern. | 09-27-2012 |
20120282553 | IMMERSION UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN - An immersion upper layer film composition includes a resin and a solvent. The resin forms a water-stable film during irradiation and is dissolved in a subsequent developer. The solvent contains a monovalent alcohol having 6 or less carbon atoms. The composition is to be applied to form a coat on a photoresist film in an immersion exposure process in which the photoresist film is irradiated through water provided between a lens and the photoresist film. | 11-08-2012 |
20130108965 | RADIATION-SENSITIVE COMPOSITION | 05-02-2013 |
20130147991 | SEMICONDUCTOR DEVICE AND IMAGE PROCESSING METHOD - An image processing apparatus includes an image processing unit that calculates two types of image data from one image data and outputs the calculated image data, a data combination unit that combines the two type of data supplied from the image processing unit and outputs the combined data to one terminal, an output buffer that adjusts an output timing of the combined data according to an instruction supplied from bus arbitration means for arbitrating a bus, and a data distribution unit that outputs the combined data output from the output buffer to the bus in a form of the combined data, or distributes the combined data and outputs the distributed data to the bus according to an external combination distribution instruction. | 06-13-2013 |
20130164695 | METHOD FOR FORMING PATTERN - A method for forming a pattern includes providing a first positive-working radiation-sensitive resin composition on a substrate to form a first resist layer. The first positive-working radiation-sensitive resin composition includes a crosslinking agent, a polymer containing an acid-unstable group and not containing a crosslinking group, a radiation-sensitive acid generator, and a solvent. The first resist layer is exposed selectively to radiation, and developed to form a first resist pattern. The first resist pattern is made inactive to radiation, or insolubilized in an alkaline developer or in a second positive-working radiation-sensitive resin composition. The second positive-working radiation-sensitive resin composition is provided on the substrate to form a second resist layer. The second resist layer is exposed selectively to radiation, and developed to form a second resist pattern in the space area of the first resist pattern. | 06-27-2013 |
20130187977 | PRINTING PAPER AND METHOD FOR FORMING PRINTED IMAGES - The present invention provides plain printing paper comprising
| 07-25-2013 |
20140193954 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - The reliability of a semiconductor device is to be improved. A microcomputer chip (semiconductor chip) having a plurality of pads formed on a main surface thereof is mounted over an upper surface of a wiring substrate in an opposed state of the chip main surface to the substrate upper surface. Pads coupled to a plurality of terminals (bonding leads) formed over the substrate upper surface comprise a plurality of first pads in which a unique electric current different from the electric current flowing through other pads flows and a plurality of second pads in which an electric current common to the pads flows or does not flow. Another first pad of the first pads or one of the second pads are arranged next to the first pad. The first pads are electrically coupled to a plurality of bonding leads respectively via a plurality of bumps (first conductive members), while the second pads are bonded to the terminals via a plurality of bumps (second conductive members). | 07-10-2014 |
20140217712 | AIRBAG DEVICE - An airbag device that can limit the movement of a strap outside an airbag even when the other end of the strap is released is provided. An airbag device includes an airbag | 08-07-2014 |
20140218382 | SEMICONDUCTOR APPARATUS AND DATA PROCESSING METHOD OF THE SAME - A semiconductor apparatus pertaining to one embodiment has: a first processor that operates by a first program and reads pixel data from a storage unit; a second processor that operates by a second program, performs processing to the pixel data, and writes the processed pixel data back to the storage unit; and a buffer circuit that transfers the pixel data from the first processor to the second processor. | 08-07-2014 |
20140363773 | PATTERN-FORMING METHOD - A radiation-sensitive resin composition includes a resin including a repeating unit shown by a following general formula (1), a photoacid generator and a photodisintegrating base shown by a following general formula (8). R | 12-11-2014 |
20150049219 | SEMICONDUCTOR DEVICE AND IMAGE PROCESSING METHOD - An image processing apparatus includes an image processing unit that calculates two types of image data from one image data and outputs the calculated image data, a data combination unit that combines the two type of data supplied from the image processing unit and outputs the combined data to one terminal, an output buffer that adjusts an output timing of the combined data according to an instruction supplied from bus arbitration means for arbitrating a bus, and a data distribution unit that outputs the combined data output from the output buffer to the bus in a form of the combined data, or distributes the combined data and outputs the distributed data to the bus according to an external combination distribution instruction. | 02-19-2015 |