Antsiferov
Pavel Antsiferov, Moscow RU
Patent application number | Description | Published |
---|---|---|
20110253539 | ELECTROSTATIC COALESCER WITH RESONANCE TRACKING CIRCUIT - An electrostatic coalescer includes an outer wall defining a flow path for receiving a process fluid. A plurality of electrode plates is disposed within the flow path. A controller includes an inductor and a signal generator. The inductor is coupled in parallel with the plurality of electrode plates. The inductor and the plurality of electrode plates define a resonant circuit. The signal generator is coupled to the plurality of electrode plates and operable to apply an alternating current signal to the plurality of electrode plates at a frequency corresponding to a resonant frequency of the resonant circuit in the presence of the process fluid. The signal generator varies the frequency of the alternating current signal based on a positive feedback signal received from the resonant circuit to maintain resonance. | 10-20-2011 |
20120085230 | GAS ELECTROSTATIC COALESCER - An electrostatic coalescer includes an outer wall defining a flow path for receiving a process fluid comprising primarily a gas, a power source, and a plurality of electrode plates coupled to the power source to generate an electrical field across the flow path. | 04-12-2012 |
Pavel Stanislavoich Antsiferov, Troitsk RU
Patent application number | Description | Published |
---|---|---|
20110037960 | LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, CLEANING SYSTEM AND METHOD FOR CLEANING A PATTERNING DEVICE - A lithographic apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device is configured to impart a pattern to the beam of radiation. The apparatus includes a patterning device cleaning system configured to provide an electrostatic force to contaminant particles that are on the patterning device and that are electrically charged by the beam of radiation, in order to remove the contaminant particles from the patterning device. | 02-17-2011 |
Pavel Stanislavovich Antsiferov, Troitsk RU
Patent application number | Description | Published |
---|---|---|
20090040492 | Lithographic apparatus and device manufacturing method - A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode. | 02-12-2009 |
20130070218 | SYSTEM FOR REMOVING CONTAMINANT PARTICLES, LITHOGRAPHIC APPARATUS, METHOD FOR REMOVING CONTAMINANT PARTICLES AND METHOD FOR MANUFACTURING A DEVICE - A system for removing contaminant particles from the path of the beam of EUV radiation is provided in which at least a first AC voltage is provided to a pair of electrodes on opposite sides of the path of the beam of EUV radiation as a first stage of a regime of voltages and, as a second stage of the regime of voltages, a DC voltage is provided to the electrodes. | 03-21-2013 |
20130329204 | Photon Source, Metrology Apparatus, Lithographic System and Device Manufacturing Method - A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma. | 12-12-2013 |
Pavel Stanislavovich Antsiferov, Moscow RU
Patent application number | Description | Published |
---|---|---|
20150108373 | Photon Source, Metrology Apparatus, Lithographic System and Device Manufacturing Method - A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma. | 04-23-2015 |
Pavel Stanislavovich Antsiferov, Troitsk, Moscow RU
Patent application number | Description | Published |
---|---|---|
20150311058 | LIGHT SOURCE WITH LASER PUMPING AND METHOD FOR GENERATING RADIATION - The invention relates to light sources with laser pumping and to methods for generating radiation with a high luminance in the ultraviolet (UV) and visible spectral ranges. The technical result of the invention includes extending the functional possibilities of a light source with laser pumping by virtue of increasing the luminance, increasing the coefficient of absorption of the laser radiation by a plasma, and significantly reducing the numerical aperture of a divergent laser beam which is to be occluded and which is passing through the plasma. The device comprises a chamber containing a gas, a laser producing a laser beam, an optical element, a region of radiating plasma produced in the chamber by the focused laser beam, an occluder, which is mounted on the axis of the divergent laser beam on the second side of the chamber and an optical system for collecting plasma radiation. | 10-29-2015 |