| Patent application number | Description | Published |
|---|
| 20110005922 | Methods and Apparatus for Protecting Plasma Chamber Surfaces - A method for creating a protective layer over a surface of an object comprising aluminum and magnesium for use in a semiconductor processing system, which includes oxidizing the surface of the object using a plasma electrolytic oxidation process. The method also includes generating a halogen-comprising plasma by exciting a gas comprising a halogen. The method also includes exposing the oxidized surface to the halogen-comprising plasma or excited gas. | 01-13-2011 |
| 20120031876 | SYSTEMS, METHODS AND APPARATUS FOR SEPARATE PLASMA SOURCE CONTROL - A plasma source includes multiple ring plasma chambers, multiple primary windings, multiple ferrites and a control system. Each one of the primary windings is wrapped around an exterior one of the ring plasma chambers. Each one of the plurality of the ring plasma chamber passes through a respective portion of the plurality of ferrites. The control system is coupled to each of the ring plasma chambers. A system and method for generating and using a plasma are also described. | 02-09-2012 |
| 20120034394 | DISTRIBUTED MULTI-ZONE PLASMA SOURCE SYSTEMS, METHODS AND APPARATUS - A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber and multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites. A system and method for generating a plasma are also described. | 02-09-2012 |
| 20120035766 | SYSTEMS, METHODS AND APPARATUS FOR CHOKED FLOW ELEMENT EXTRACTION - A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber, multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites and multiple plasma chamber outlets coupling the plasma chamber to a process chamber. Each one of the plasma chamber outlets having a respective plasma restriction. A system and method for generating a plasma are also described. | 02-09-2012 |
| 20120146508 | MEASURING AND CONTROLLING PARAMETERS OF A PLASMA GENERATOR - Methods, systems, and computer program products are described for measuring and controlling parameters of a plasma generator. A current in a primary winding of a transformer or inductive element that generates a plasma is measured. A voltage across a secondary winding of the transformer or inductive element is measured. Based on the current of the primary winding and the voltage across the secondary winding, a parameter of the plasma is determined. The parameter includes a resistance value associated with the plasma, a power value associated with the plasma, or both. | 06-14-2012 |
| 20130025788 | Distributed, Non-Concentric Multi-Zone Plasma Source Systems, Methods and Apparatus - A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described. | 01-31-2013 |
| 20140096908 | DISTRIBUTED MULTI-ZONE PLASMA SOURCE SYSTEMS, METHODS AND APPARATUS - A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described. | 04-10-2014 |
| 20140151344 | Movable microchamber system with gas curtain - A movable microchamber system with a gas curtain is disclosed. The microchamber system has a top member with a light-access feature and a stage assembly that supports a substrate to be processed. The stage assembly is disposed relative to the top member to define a microchamber and a peripheral microchamber gap. An inert gas is flowed into the peripheral microchamber gap to form the gas curtain just outside of the microchamber. The gas curtain substantially prevents reactive gas in the ambient environment from entering the microchamber when the stage assembly moves relative to the top member. | 06-05-2014 |
| 20140216560 | FLUID FLOW MEASUREMENT AND CONTROL - In accordance with one embodiment, a controller in a fluid delivery system controls magnitudes of pressure in a first volume and a second volume. The first volume is of a known magnitude. The second volume is of an unknown magnitude and varies. The controller estimates a temperature of gas in the first volume and a temperature of gas in the second volume based on measurements of pressure in the first volume and measurements of pressure in the second volume. The controller then calculates a magnitude of the second volume based on measured pressures of the gases and estimated temperatures of gases in the first volume and the second volume. | 08-07-2014 |
| 20140309617 | FLUID FLOW MEASUREMENT AND CONTROL - In accordance with another embodiment, a controller in a fluid delivery system initiates drawing fluid into a chamber of a diaphragm pump. During a delivery phase of pumping the fluid in the chamber to a target recipient, the controller applies pressure to the chamber. At multiple different times during the delivery phase, the controller temporarily discontinues application of the pressure to the chamber to calculate how much of the fluid in the chamber has been pumped to the target recipient. | 10-16-2014 |
