Patent application number | Description | Published |
20100181461 | VEHICLE SEAT TRACK - A track system for adjusting the position of a vehicle component is provided. The track system comprises a first lower track member ( | 07-22-2010 |
20120181839 | VEHICLE SEAT BACK REST STRUCTURE - The present invention relates to a back rest structure ( | 07-19-2012 |
20120193954 | SEAT ASSEMBLY HAVING AN IMPACT LOAD TRANSFER STRUCTURE - A seat back frame for use in a vehicle seat assembly including a first side member, a second side member, an upper cross member, and a lower cross member. The seat back frame also includes a load transfer member that transfers impact loads from a collision through the seat assembly. | 08-02-2012 |
20120305734 | SEAT TRACK SYSTEM - A seat track system for use in a vehicle seat assembly having a seat base frame. The seat track system includes a lower track assembly having a first lower track and a second lower track and an upper track assembly having a first upper track slidably disposed within the first lower track and a second upper track slidably disposed within the second lower track. The first upper track has a portion extending upwards that forms a first side member of the seat base frame and the second upper track has a portion extending upwards that forms a second side member of the seat base frame. The first upper track and the first side member are formed integrally to form a one-piece unitary member and the second upper track and the second side member are formed integrally to form a one-piece unitary member. | 12-06-2012 |
20130161992 | ONE-PIECE SEAT BACK STRUCTURE - A seat back structure includes a web extending about a central opening, and an inner flange extending about an inner perimeter of the web adjacent to the central opening. The seat back structure also includes an outer flange extending about an outer perimeter of the web. The inner flange, the outer flange and the web form a channel extending about the seat back structure, and the seat back structure is formed from a single piece of material. | 06-27-2013 |
20140221550 | Foam Reinforced Structural Member - A composite material for reinforcing closed structural members as a tube or any closed profile section. More specifically, a composite material for filling metal tubes or any closed profile section forming the frame of vehicle seats to increase or maintain the strength of the seat frame while reducing the mass of the seat tubes or sealed profile section. | 08-07-2014 |
20150020643 | POSITION ADJUSTMENT ASSEMBLY FOR VEHICLE SEATING - A vehicle seating system includes a latch having multiple teeth configured to engage respective windows within a rail to selectively block movement of a vehicle seat relative to the rail. The latch includes a first tooth and a second tooth longitudinally separated from one another. The first tooth includes an inner surface configured to contact a longitudinal end of a first window while the first tooth is engaged with the first window to block movement of the latch relative to the rail along a first longitudinal direction, and the second tooth includes an inner surface configured to contact a longitudinal end of a second window while the second tooth is engaged with the second window to block movement of the latch relative to the rail along a second longitudinal direction, opposite the first longitudinal direction. | 01-22-2015 |
20150076309 | SEAT ADJUSTMENT DEVICE FOR VERTICAL ADJUSTMENT OF A VEHICLE SEAT - Seat height adjustment having vertical slots ( | 03-19-2015 |
20150091345 | VEHICLE SEAT WITH A LUMBAR SUPPORT - Vehicle seat ( | 04-02-2015 |
20150102199 | LONGITUDINAL ADJUSTER FOR A VEHICLE SEAT - Longitudinal, adjuster ( | 04-16-2015 |
20150130245 | VEHICLE SEAT - The present invention relate to a vehicle seat ( | 05-14-2015 |
20150321584 | INCLINATION ADJUSTING APPARATUS - The present invention relates to an inclination adjusting apparatus for adjusting a backrest ( | 11-12-2015 |
Patent application number | Description | Published |
20090017190 | Movable injectors in rotating disc gas reactors - A system and method for uniform deposition of material layers on wafers in a rotating disk chemical vapor deposition reaction system is provided, wherein one or more substrates are rotated on a carrier about an axis while maintaining surfaces of the one or more substrates substantially perpendicular to the axis of rotation and facing in an upstream direction along the axis of rotation. During rotating a first gas is discharged in the downstream direction towards the one or more substrates from a first set of gas inlets. A second gas is discharged in the downstream direction towards the one or more substrates from at least one movable gas injector, and the at least one movable gas inlet is moved with a component of motion in a radial direction towards or away from the axis of rotation. | 01-15-2009 |
20090155028 | Wafer carrier with hub - A wafer carrier for a rotating disc CVD reactor includes a unitary plate of a ceramic such as silicon carbide defining wafer-holding features such as pockets on its upstream surface and also includes a hub removably mounted to the plate in a central region of the plate. The hub provides a secure connection to the spindle of the reactor without imposing concentrated stresses on the ceramic plate. The hub can be removed during cleaning of the plate. | 06-18-2009 |
20110114022 | WAFER CARRIER WITH HUB - A wafer carrier for a rotating disc CVD reactor includes a unitary plate of a ceramic such as silicon carbide defining wafer-holding features such as pockets on its upstream surface and also includes a hub removably mounted to the plate in a central region of the plate. The hub provides a secure connection to the spindle of the reactor without imposing concentrated stresses on the ceramic plate. The hub can be removed during cleaning of the plate. The wafer carrier also preferably includes a gas flow facilitating element on the upstream surface of the plate in the central region of the plate. The gas flow facilitating element helps redirect the flow of incident gases along the upstream surface and away from a flow discontinuity in the central region. | 05-19-2011 |
20110287635 | WAFER CARRIER WITH HUB - A wafer carrier for a rotating disc CVD reactor includes a unitary plate of a ceramic such as silicon carbide defining wafer-holding features such as pockets on its upstream surface and also includes a hub removably mounted to the plate in a central region of the plate. The hub provides a secure connection to the spindle of the reactor without imposing concentrated stresses on the ceramic plate. The hub can be removed during cleaning of the plate. | 11-24-2011 |
20120070916 | MOVABLE INJECTORS IN ROTATING DISC GAS REACTORS - A system and method for uniform deposition of material layers on wafers in a rotating disk chemical vapor deposition reaction system is provided, wherein one or more substrates are rotated on a carrier about an axis while maintaining surfaces of the one or more substrates substantially perpendicular to the axis of rotation and facing in an upstream direction along the axis of rotation. During rotating a first gas is discharged in the downstream direction towards the one or more substrates from a first set of gas inlets. A second gas is discharged in the downstream direction towards the one or more substrates from at least one movable gas injector, and the at least one movable gas inlet is moved with a component of motion in a radial direction towards or away from the axis of rotation. | 03-22-2012 |
20120156374 | SECTIONAL WAFER CARRIER - A structure for a chemical vapor deposition reactor includes a support element defining oppositely-facing substantially planar upper and lower surfaces and a vertical rotational axis substantially perpendicular to the upper and lower surfaces, and a plurality of carrier sections releasably engaged with the support element. Each carrier section can include oppositely-facing substantially planar top and bottom surfaces and at least one aperture extending between the top and bottom surfaces. The carrier sections can be disposed on the support element with the bottom surfaces of the carrier sections facing toward the upper surface of the support element, so that wafers can be held in the apertures of the carrier sections with one surface of each wafer confronting the support element and an opposite surface exposed at the top surface of the carrier sections. | 06-21-2012 |
20120170609 | METHODS AND SYSTEMS FOR IN-SITU PYROMETER CALIBRATION - A method of in-situ pyrometer calibration for a wafer treatment reactor such as a chemical vapor deposition reactor desirably includes the steps of positioning a calibrating pyrometer at a first calibrating position and heating the reactor until the reactor reaches a pyrometer calibration temperature. The method desirably further includes rotating the support element about the rotational axis, and while the support element is rotating about the rotational axis, obtaining first operating temperature measurements from a first operating pyrometer installed at a first operating position, and obtaining first calibrating temperature measurements from the calibration pyrometer. Both the calibrating pyrometer and the first operating pyrometer desirably are adapted to receive radiation from a first portion of a wafer support element at a first radial distance from a rotational axis of the wafer support element. | 07-05-2012 |
20120304926 | HEATED WAFER CARRIER PROFILING - An apparatus includes a carrier rotatable about an axis of rotation where the carrier has a top surface adapted to hold at least one semiconductor wafer and a surface characterization tool which is operative to move over a plurality of positions relative to the top surface of the carrier and/or the wafer transverse to the axis of rotation. The surface characterization tool is operative to move over a plurality of positions relative to the top surface of the carrier and/or the wafer transverse to the axis of rotation and is further adapted to produce characterization signals over the plurality of positions on at least a portion of the carrier and/or on at least a portion of said major surface of the wafer as the carrier rotates. | 12-06-2012 |
20120307233 | HEATED WAFER CARRIER PROFILING - A method for characterizing a surface comprises rotating a carrier about an axis of rotation where the carrier has a top surface adapted to hold at least one semiconductor wafer with a major surface of the wafer extending generally transverse to the axis of rotation. A surface characterization tool is moved over a plurality of positions relative to the top surface of the carrier, where a measurement location over the top surface of the carrier is changed while said top surface of the carrier is heated to a predetermined temperature. Characterization signals over the plurality of positions with the surface characterization tool are produced and contain information about the heated top surface of the carrier, or when semiconductor wafers are held on the carrier, information about the semiconductor wafer can also be obtained. | 12-06-2012 |
20130252404 | KEYED WAFER CARRIER - A structure for a chemical vapor deposition reactor desirably includes a reaction chamber having an interior, a spindle mounted in the reaction chamber, and a wafer carrier releasably mounted onto the spindle for rotation therewith. The spindle desirably has a shaft extending along a vertical rotational axis and a key projecting outwardly from the shaft. The wafer carrier preferably has a body defining oppositely-facing top and bottom surfaces and at least one wafer-holding feature configured so that a wafer can be held therein with a surface of the wafer exposed at the top surface of the body. The wafer carrier desirably further has a recess extending into the body from the bottom surface of the body and a keyway projecting outwardly from a periphery of the recess along a first transverse axis. The shaft preferably is engaged in the recess and the key preferably is engaged into the keyway. | 09-26-2013 |
20130343426 | TEMPERATURE CONTROL FOR GaN BASED MATERIALS - A method of in-situ temperature measurement for a wafer treatment reactor such as a chemical vapor deposition reactor desirably includes the steps of heating the reactor until the reactor reaches a wafer treatment temperature and rotating a wafer support element within the reactor about a rotational axis. The method desirably further includes, while the wafer support element is rotating about the rotational axis, obtaining first operating temperature measurements using a first operating pyrometer that receives radiation from a first portion of the wafer support element, and obtaining first wafer temperature measurements using a wafer temperature measurement device that receives radiation from at least one wafer, the wafer temperature measurement device located at a first position. | 12-26-2013 |
20140042147 | TERMINAL FOR MECHANICAL SUPPORT OF A HEATING ELEMENT - A terminal for mechanical support of a heating element, includes a base device, a mounting device, the mounting device adapted to support the heating element, and a support device connecting the base device to the mounting device, the support device allowing displacement of the heating element about a radial axis and less than about 10% displacement of the heating element about a tangential and/or axial axis. | 02-13-2014 |
20140190405 | SELF-CLEANING SHUTTER FOR CVD REACTOR - A chemical vapor deposition reactor and a method of wafer processing are provided. The reactor can include a reaction chamber having an interior and an entry port for insertion and removal of substrates, a gas inlet manifold communicating with the interior of the chamber for admitting process gasses to form a deposit on substrates held within the interior, a shutter mounted to the chamber, and one or more cleaning elements mounted within the chamber. The shutter can be movable between (i) a run position in which the cleaning elements are remote from the exhaust channel and (ii) a cleaning position in which the one or more cleaning elements engage with the shutter so that the cleaning elements remove deposited particles from the shutter upon movement of the shutter to the cleaning position. | 07-10-2014 |
20140261698 | WAFER CARRIER WITH TEMPERATURE DISTRIBUTION CONTROL - Wafer carrier arranged to hold a plurality wafers and to inject a fill gas into gaps between the wafers and the wafer carrier for enhanced heat transfer and to promote uniform temperature of the wafers. The apparatus is arranged to vary the composition, flow rate, or both of the fill gas so as to counteract undesired patterns of temperature non-uniformity of the wafers. In various embodiments, the wafer carrier utilizes at least one plenum structure contained within the wafer carrier to source a plurality of weep holes for passing a fill gas into the wafer retention pockets of the wafer carrier. The plenum(s) promote the uniformity of the flow, thus providing efficient heat transfer and enhanced uniformity of wafer temperatures. | 09-18-2014 |
20140352619 | CHEMICAL VAPOR DEPOSITION WITH ELEVATED TEMPERATURE GAS INJECTION - A chemical vapor deposition reactor and method. Reactive gases, such as gases including a Group III metal source and a Group V metal source, are introduced into a rotating-disc reactor and directed downwardly onto a wafer carrier and substrates which are maintained at an elevated substrate temperature, typically above about 400° C. and normally about 700-1100° C. to deposit a compound such as a III-V semiconductor. The gases are introduced into the reactor at an inlet temperature desirably above about 75° C. and most preferably about 100°-250° C. The walls of the reactor may be at a temperature close to the inlet temperature. Use of an elevated inlet temperature allows the use of a lower rate of rotation of the wafer carrier, a higher operating pressure, lower flow rate, or some combination of these. | 12-04-2014 |
20150056790 | CHEMICAL VAPOR DEPOSITION WITH ELEVATED TEMPERATURE GAS INJECTION - A chemical vapor deposition reactor and method. Reactive gases, such as gases including a Group III metal source and a Group V metal source, are introduced into the chamber ( | 02-26-2015 |
20150075431 | Rotating Disk Reactor With Ferrofluid Seal For Chemical Vapor Deposition - A rotating disk reactor for chemical vapor deposition includes a vacuum chamber and a ferrofluid feedthrough comprising an upper and a lower ferrofluid seal that passes a motor shaft into the vacuum chamber. A motor is coupled to the motor shaft and is positioned in an atmospheric region between the upper and the lower ferrofluid seal. A turntable is positioned in the vacuum chamber and is coupled to the motor shaft so that the motor rotates the turntable at a desired rotation rate. A dielectric support is coupled to the turntable so that the turntable rotates the dielectric support when driven by the shaft. A substrate carrier is positioned on the dielectric support in the vacuum chamber for chemical vapor deposition processing. A heater is positioned proximate to the substrate carrier that controls the temperature of the substrate carrier to a desired temperature for chemical vapor deposition. | 03-19-2015 |
20150187620 | Water Carrier Having Thermal Cover for Chemical Vapor Deposition Systems - The invention relates generally to semiconductor fabrication technology and, more particularly, to chemical vapor deposition (CVD) processing and associated apparatus for addressing temperature non-uniformities on semiconductor wafer surfaces. Embodiments include a wafer carrier for use in a system for growing epitaxial layers on one or more wafers by CVD, the wafer carrier comprising a top plate and base plate which function coordinately to reduce temperature variability caused during CVD processing. | 07-02-2015 |
20150225875 | DENSITY-MATCHING ALKYL PUSH FLOW FOR VERTICAL FLOW ROTATING DISK REACTORS - In a rotating disk reactor for growing epitaxial layers on substrate or other CVD reactor system, gas directed toward the substrates at gas inlets at different radial distances from the axis of rotation of the disk has both substantially the same gas flow rate/velocity and substantially the same gas density at each inlet. The gas directed toward portions of the disk remote from the axis may include a higher concentration of a reactant gas than the gas directed toward portions of the disk close to the axis, so that portions of the substrate surfaces at different distances from the axis receive substantially the same amount of reactant gas per unit area, and a combination of carrier gases with different relative molecular weights at different radial distances from the axis of rotation are employed to substantially make equal the gas density in each region of the reactor. The system may be applied with a combination or carrier gases at multiple gas inlets, a combination of carrier and reactant gases at multiple inlets, and may be used with an arbitrarily large number of gases, when at least two gases of different molecular weights are provided. A linear flow pattern is achieved within the reactor, avoiding laminar recirculation areas, and permitting uniform deposition and growth of epitaxial layers on the substrate. | 08-13-2015 |
20160041037 | TEMPERATURE CONTROL FOR GaN BASED MATERIALS - A method of in-situ temperature measurement for a wafer treatment reactor such as a chemical vapor deposition reactor desirably includes the steps of heating the reactor until the reactor reaches a wafer treatment temperature and rotating a wafer support element within the reactor about a rotational axis. The method desirably further includes, while the wafer support element is rotating about the rotational axis, obtaining first operating temperature measurements using a first operating pyrometer that receives radiation from a first portion of the wafer support element, and obtaining first wafer temperature measurements using a wafer temperature measurement device that receives radiation from at least one wafer, the wafer temperature measurement device located at a first position. | 02-11-2016 |
Patent application number | Description | Published |
20150269497 | SYSTEMS AND METHODS FOR CREATING AND TRACKING STATES OF ENCRYPTION DEVICES - Systems and methods for creating and tracking states of encryption devices are disclosed herein. In various embodiments, systems and methods herein are configured for changing the state of a particular encryption device based upon receiving information from an operator that the particular encryption device is in storage, in transit, deployed, etc. According to particular embodiments, systems and methods herein are configured for changing the state of the particular encryption device based on the format of a payload received from the encryption device, a number of failed decryptions of a particular payload received from the encryption device, etc. | 09-24-2015 |
20150269568 | SYSTEMS AND METHODS FOR FACILITATING DECRYPTION OF PAYLOADS RECEIVED FROM ENCRYPTION DEVICES - Systems and methods for facilitating decryption of encrypted payloads are described herein. In various embodiments, the system includes an encryption device operatively connected to a device management system. According to particular embodiments, the device management system receives payloads from the encryption device and facilitates decryption of the encryption device payloads based at least in part on a serial number associated with the encryption device included in the encryption device payload. | 09-24-2015 |
20150270961 | SYSTEMS AND METHODS FOR CREATING FINGERPRINTS OF ENCRYPTION DEVICES - Systems and methods for creating fingerprints for encryption devices are described herein. In various embodiments, the system includes an encryption device operatively connected to a device management system. According to particular embodiments, the device management system: 1) receives a first payload from the encryption device, the first payload including data in a particular format; 2) creates a fingerprint for the encryption device, the fingerprint including a section format for each of one or more distinct sections of the particular format; 3) storing a record of the fingerprint for the encryption device and the unique identifier at the at least one database; and 4) comparing a format of each subsequent payload received from the encryption device to the fingerprint for the device to determine whether the device has been compromised. | 09-24-2015 |
20150271150 | SYSTEMS AND METHODS FOR DECRYPTION AS A SERVICE - Systems and methods for decryption of payloads are disclosed herein. In various embodiments, systems and methods herein are configured for decrypting thousands of transactions per second. Further, in particular embodiments, the systems and methods herein are scalable, such that many thousands of transactions can be processed per second upon replicating particular architectural components. | 09-24-2015 |
Patent application number | Description | Published |
20080234979 | Process and system for multi-objective global optimization of maintenance schedules - A process for optimizing maintenance work schedules for at least one engine includes the steps of retrieving at least one set of data for an engine from a computer readable storage medium; selecting at least one scheduling parameter for the engine; selecting a set of maintenance rules for the engine; selecting at least one maintenance work decision; selecting at least one objective for the engine; optimizing the at least one objective to generate at least one optimal maintenance work decision; and generating at least one optimal maintenance work schedule for the engine. | 09-25-2008 |
20090112519 | Foreign object/domestic object damage assessment - A foreign-object/domestic-object damage assessment system for a gas turbine engine comprises a multiplicity of sensors, manifold feature extraction modules, a multiform analysis module, a hybrid operational data store and an operator/maintenance interface. The sensors characterize a multiplicity of engine parameters relating to the gas turbine engine. The feature extraction modules extract manifold features from the multiplicity of engine parameters. The analysis module performs a multiform analysis on the manifold features. The operational data store correlates the manifold features with maintenance actions via a hybrid engine model. The operator/maintenance interface transmits maintenance requests as a function of the multiform analysis, as compared to the hybrid engine model. | 04-30-2009 |
20100313639 | GAS TURBINE ENGINE DEBRIS MONITORING ARRANGEMENT - An example method of controlling gas turbine engine debris monitoring sensors includes detecting debris carried by air moving through an engine using at least first and second debris sensors, and processing signals from both the first and second debris sensors using a common signal conditioning unit. Another example method of monitoring gas turbine engine debris includes configuring at least one first debris sensor to detect debris carried by airflow moving through a first portion of an engine and configuring at least one second debris sensor to detect debris carried by airflow moving though a second portion of the engine. The method alternates between using the first debris sensor to detect debris and using the second debris sensor to detect debris. | 12-16-2010 |
20120324987 | IDMS SIGNAL PROCESSING TO DISTINGUISH INLET PARTICULATES - A method for operating a debris monitoring system comprises continuously sensing the passage of particulates through a gas turbine engine to produce a time-domain sensor signal. The time-domain sensor signal is Fourier transformed to produce a frequency domain sensor signal. The frequency domain sensor signal is partitioned into bins corresponding to particulate composition categories. At least one feature is identified within each bin, and is used to determine the amount of particulate flow in each particulate composition category. | 12-27-2012 |
20130025348 | AIRCRAFT DEBRIS MONITORING SENSOR ASSEMBLY - An example aircraft debris monitoring sensor assembly includes an aircraft conduit defining a hollow core passage extending axially from an inlet opening to an outlet opening. A sensor arrangement detects debris carried by a fluid within the hollow core passage. | 01-31-2013 |
20130275059 | HYBRID VIRTUAL LOAD MONITORING SYSTEM AND METHOD - Virtual sensors can be used to monitor the loads on the system in determining damage accumulation, remaining useful life or retirement time of the components. A virtual sensor is a mathematical construct to infer a desired system measurement (e.g. a structural load) from readily available system state parameters (e.g. speed, weight, load factors, control settings, etc.). The accuracy of the virtual sensor depends upon the mapping between the desired measurement and the state parameters. A hybrid load monitoring system and method includes one or more direct or physical sensor measurements in addition to the plurality of virtual sensors. Signals from the physical sensors are included as an input (as opposed to an output) to the mapping between system state parameters and the various target sensor feature amplitudes. | 10-17-2013 |
20140007591 | ADVANCED TIP-TIMING MEASUREMENT BLADE MODE IDENTIFICATION - A disclosed airfoil health monitoring system and method obtains a signal comprising a waveform indicative of an airfoil path with a sensor. Features of the waveform are determined and compared waveform characteristics indicative of a vibrational mode. A vibrational mode of the airfoil may then be determined based on the comparison between the predetermined waveform characteristics and the obtained waveform indicative of the airfoil path. | 01-09-2014 |
20150345325 | ROTATING MACHINERY MONITORING SYSTEM - A method for monitoring rotating component includes receiving a continuous waveform sensor signal from a sensor apparatus, retaining the continuous waveform in a memory, and isolating at least one characteristic and/or at least one period of the waveform. The isolated characteristic and/or period is analyzed thereby determining the presence of a waveform anomaly. | 12-03-2015 |
Patent application number | Description | Published |
20120092598 | SURFACE MODIFIED ORGANIC BLACK PIGMENTS, SURFACE MODIFIED CARBON BLACKS, PIGMENT MIXTURES USING THEM, AND LOW DIELECTRIC BLACK DISPERSIONS, COATINGS, FILMS, BLACK MATRICES, AND DEBVICES CONTAINING SAME - The present invention relates to surface modified organic black pigments, surface modified carbon blacks, pigment mixtures and dispersions formed with these pigments, curable compositions, black matrices, and products incorporating them. The surface modified organic black pigment can have attached at least one organic group having the formula —X—Z, wherein X, which is directly attached to the pigment, represents an arylene group, a heteroarylene group, an alkylene group, an aralkylene group, or an alkarylene group, and Z represents at least one ionic group, at least one ionizable group, at least one nonionic group, at least one polymeric group, or any combinations thereof. Also disclosed are carbon black pigment combinations with the surface modified organic black pigments, low dielectric black dispersions, films, and black matrices containing them. Methods of preparing and making these various materials also are provided. | 04-19-2012 |
20120105559 | Metallic Dispersions for Inkjet Printing - A dispersion of silver particles and a method of making the dispersion and ink are described. The dispersion or ink may be an aqueous dispersion or ink and may produce silver images having improved properties such as an improvement in gloss. | 05-03-2012 |
20130061773 | MODIFIED PIGMENTS - Modified pigments including an organic group containing a 5-membered heteroaromatic ring, as well as related compositions, articles, and methods, are disclosed. The diazonium salts containing a 5-membered heteroaromat is ring exhibit enhanced activity in modifying pigments, thereby resulting in modified pigments with a higher treatment level and improved dispersibility in an ink composition. | 03-14-2013 |
Patent application number | Description | Published |
20090018258 | Inkjet ink compositions comprising polymer modified pigments and methods of preparing the same - The present invention relates to an inkjet ink composition comprising a liquid vehicle and at least one polymer modified pigment. In one embodiment, the polymer modified pigment comprises the combination product of a pigment, a polymer, and a base, wherein the polymer is a styrene-maleic anhydride polymer or an alternating copolymer comprising at least one segment having the formula —[HB-A] | 01-15-2009 |
20100251930 | Inkjet ink compositions comprising azo pigments - Inkjet ink compositions comprising a liquid vehicle, an azo pigment, and a synergist are described. The colorant of the azo pigment and the synergist have specific structural features that, in combination, can be used to form an inkjet ink composition having long term stability in a variety of ink vehicles. | 10-07-2010 |
20110011307 | Method of preparing modified colored pigments - The present invention relates to a method of preparing a modified colored pigment comprising a pigment having attached at least one organic group. The method comprises the step of combining, in any order, a) a solution of an organic colorant in a solvent, b) at least one aromatic amine comprising the organic group, c) at least one diazotizing agent, d) an aqueous medium, e) optionally at least one acid, and f), optionally at least one second solvent, to form the modified colored pigment. | 01-20-2011 |
20110207860 | Inkjet Ink Compositions Comprising Polymeric Dispersants Having Attached Chromophore Groups - The present invention relates to an inkjet ink composition comprising a liquid vehicle, a pigment, and a polymeric dispersant. In one embodiment, the pigment comprises a colorant having the formula A-(B) | 08-25-2011 |
Patent application number | Description | Published |
20090154091 | COOLING SYSTEMS AND HEAT EXCHANGERS FOR COOLING COMPUTER COMPONENTS - Computer systems having heat exchangers for cooling computer components are disclosed herein. The computer systems include a computer cabinet having an air inlet, an air outlet spaced apart from the air inlet, and a plurality of computer module compartments positioned between the air inlet and the air outlet. The air inlet, the air outlet, and the computer module compartments define an air flow path through the computer cabinet. The computer systems also include a heat exchanger positioned between two adjacent computer module compartments. The heat exchanger includes a plurality of heat exchange elements canted relative to the air flow path. | 06-18-2009 |
20090201644 | SYSTEMS AND ASSOCIATED METHODS FOR COOLING COMPUTER COMPONENTS - Computer systems and associated methods for cooling computer components are disclosed herein. One embodiment of a computer system includes a computer cabinet having an air inlet spaced apart from an air outlet. The computer system also includes heat exchangers positioned in the computer cabinet, and a heat removal system in fluid communication with the heat exchangers. The computer system additionally includes at least one sensor for monitoring heat transfer between the computer cabinet and the room. The computer system further includes a control system operatively coupled to the at least one sensor, the control system including a computer-readable medium holding instructions for determining whether heat transfer between the computer cabinet and the room is balanced based on information from the sensor, and if not, adjusting a parameter to balance the heat transfer. | 08-13-2009 |
20100317279 | COOLING SYSTEMS AND HEAT EXCHANGERS FOR COOLING COMPUTER COMPONENTS - Computer systems having heat exchangers for cooling computer components are disclosed herein. The computer systems include a computer cabinet having an air inlet, an air outlet spaced apart from the air inlet, and a plurality of computer module compartments positioned between the air inlet and the air outlet. The air inlet, the air outlet, and the computer module compartments define an air flow path through the computer cabinet. The computer systems also include a heat exchanger positioned between two adjacent computer module compartments. The heat exchanger includes a plurality of heat exchange elements canted relative to the air flow path. | 12-16-2010 |
20120188706 | SYSTEMS AND ASSOCIATED METHODS FOR CONTROLLABLY COOLING COMPUTER COMPONENTS - Computer systems and associated methods for cooling computer components are disclosed herein. One embodiment of a computer system includes a computer cabinet having an air inlet spaced apart from an air outlet. The computer system also includes heat exchangers positioned in the computer cabinet, and a heat removal system in fluid communication with the heat exchangers. The computer system additionally includes at least one sensor for monitoring heat transfer between the computer cabinet and the room. The computer system further includes a control system operatively coupled to the at least one sensor, the control system including a computer-readable medium holding instructions for determining whether heat transfer between the computer cabinet and the room is balanced based on information from the sensor, and if not, adjusting a parameter to balance the heat transfer. | 07-26-2012 |
20140251574 | COOLING SYSTEMS AND HEAT EXCHANGERS FOR COOLING COMPUTER COMPONENTS - Computer systems having heat exchangers for cooling computer components are disclosed herein. The computer systems include a computer cabinet having an air inlet, an air outlet spaced apart from the air inlet, and a plurality of computer module compartments positioned between the air inlet and the air outlet. The air inlet, the air outlet, and the computer module compartments define an air flow path through the computer cabinet. The computer systems also include a heat exchanger positioned between two adjacent computer module compartments. The heat exchanger includes a plurality of heat exchange elements canted relative to the air flow path. | 09-11-2014 |
20140333187 | COOLING SYSTEMS AND HEAT EXCHANGERS FOR COOLING COMPUTER COMPONENTS - Computer systems having heat exchangers for cooling computer components are disclosed herein. The computer systems include a computer cabinet having an air inlet, an air outlet spaced apart from the air inlet, and a plurality of computer module compartments positioned between the air inlet and the air outlet. The air inlet, the air outlet, and the computer module compartments define an air flow path through the computer cabinet. The computer systems also include a heat exchanger positioned between two adjacent computer module compartments. The heat exchanger includes a plurality of heat exchange elements canted relative to the air flow path. | 11-13-2014 |