Patent application number | Description | Published |
20100182583 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus | 07-22-2010 |
20120171622 | FILTER, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - A filter reflects first light having a first wavelength, and transmits second light having a second wavelength shorter than the first wavelength. The filter includes a plurality of plate members positioned parallel to each other with gaps therebetween in a first direction. An enveloping surface formed by end surfaces of the plurality of plate members forms a flat surface, which is nonparallel to the first direction. The filter transmits the second light to the second direction. | 07-05-2012 |
20130077747 | X-RAY IMAGING APPARATUS AND METHOD OF CAPTURING IMAGES WITH SAME - An image capturing apparatus includes a diffraction grating that diffracts radiation from an X-ray source to form an interference pattern, a detector that detects the radiation having passed through the diffraction grating, a shutter configured to be removably disposed between the X-ray source and an object to block the radiation from the X-ray source, and an adjustment mechanism that performs alignment of at least one of the X-ray source, the diffraction grating and the detector. When the shutter is disposed between the X-ray source and the object, the shutter defines a first space shielded from the radiation from the X-ray source and a second space not shielded from the radiation. The adjustment mechanism performs the alignment in accordance with at least part of an intensity distribution of the radiation having traveled through the second space and detected by the detector. | 03-28-2013 |
20130216959 | CHARGED PARTICLE BEAM APPARATUS, AND ARTICLE MANUFACTURING METHOD - A charged particle beam apparatus for processing an object using a charged particle beam includes a charged particle lens in which an array of apertures, through each of which a charged particle beam passes, is formed; a vacuum container which contains the charged particle lens; and a radiation source configured to generate an ionizing radiation; wherein the apparatus is configured to cause the radiation source to pass the ionizing radiation through the array of apertures in a state in which a pressure in the vacuum container is changing. | 08-22-2013 |
20130235980 | X-RAY OPTICAL APPARATUS - The present invention provides an X-ray optical apparatus including an X-ray reflective structure in which at least three reflective substrates are arranged with an interval and an X-ray which is incident into a plurality of X-ray passages whose both sides are put between the reflective substrates is reflected from the reflective substrate at both sides of the X-ray passage to be parallelized and emitted from the X-ray passage. When an edge of the X-ray reflective structure is an inlet of the X-ray and the other edge is an outlet of the X-ray, a pitch of the reflective substrates at the outlet is larger than a pitch at the inlet. Therefore, it is possible to efficiently parallelize the incident X-ray to be emitted with a simple structure. | 09-12-2013 |
20130243156 | RADIATION IMAGING APPARATUS - A radiation imaging apparatus according to the present invention includes a radiation source, a reflective structure where at least three reflective substrates are arranged with an interval and radiations being incident into a plurality of passages whose both sides are put between the reflective substrate are reflected and parallelized by the reflective substrate at both sides of the passage to be emitted from the passage, a radiation detector, and an image construction unit that constructs an image of an object based on an intensity of the radiation which is emitted from each of the passages, transmits the object and is detected by the radiation detector. When one edge of the reflective structure is an inlet of the radiation and the other edge is an outlet of the radiation, a pitch of the reflective substrates at the outlet is larger than a pitch at the inlet. | 09-19-2013 |
20130243163 | X-RAY APPARATUS AND ITS ADJUSTING METHOD - An adjusting method of an X-ray apparatus has a reflection structure, wherein assuming that one end plane of the reflection structure is an inlet port of the X-ray and the other end plane is an outlet port of the X-ray, a pitch of the reflection substrates at the outlet port is wider than that at the inlet port. When the X-ray source exists at a position where a glancing angle at the time when the X-ray enters the inlet port exceeds a critical angle, an intensity of the X-ray emitted from each passage is detected. On the basis of the detected X-ray intensity, a relative position of the X-ray source and the reflection structure is adjusted. | 09-19-2013 |
20130243164 | X-RAY OPTICAL APPARATUS AND ADJUSTING METHOD THEREOF - The present invention provides a method of adjusting an X-ray optical apparatus which includes: an X-ray source; and a reflective structure where at least three reflective substrate arranged with an interval and X-rays which are incident into a plurality of passages whose both sides are put between the reflective substrates are reflected and parallelized by the reflective substrate at both sides of each passage to be emitted from the passage. When one edge of the reflective structure is an inlet of the X-ray and the other edge is an outlet of the X-ray, a pitch of the reflective substrates at the outlet side is larger than a pitch at the inlet side. The method comprises adjusting the relative positions of the X-ray source and the reflective structure so as to reduce a penumbra amount formed by the X-ray emitted from each of the passages. | 09-19-2013 |
20130273478 | CHARGED PARTICLE OPTICAL SYSTEM, DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a charged particle optical system which emits a charged particle beam, the system including an electrostatic lens, and a grid electrode opposed to the electrostatic lens along an optical axis of the electrostatic lens, and configured to form an electrostatic field in cooperation with the electrostatic lens, wherein the grid electrode is configured such that an electrode surface, opposed to the electrostatic lens, of the grid electrode has a distance, from the electrostatic lens in a direction of the optical axis, which varies with a position in the electrode surface. | 10-17-2013 |
20130286469 | FILTER, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - A filter reflects first light having a first wavelength, and transmits second light having a second wavelength shorter than the first wavelength. The filter includes a plurality of plate members positioned parallel to each other with gaps therebetween in a first direction. An enveloping surface formed by end surfaces of the plurality of plate members forms a flat surface, which is nonparallel to the first direction. The filter transmits the second light to the second direction. | 10-31-2013 |
20140055765 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides an exposure apparatus for exposing a shot on a substrate to first pulsed light, the apparatus including an optical element for guiding the first pulsed light to the substrate, an irradiation device configured to irradiate the optical element with second pulsed light having an infrared wavelength which the first pulsed light has less than the second pulsed light has, and a controller configured to control the irradiation device in a process of exposing the shot to the first pulsed light plural times, such that the irradiation device irradiates the optical element with the second pulsed light during at least one period of non-irradiation periods in which the shot is not irradiated with the first pulsed light. | 02-27-2014 |
20150017573 | REFLECTIVE ORIGINAL, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - A reflective original includes: a reflection layer which has a multilayer film configured to reflect extreme ultraviolet light; a base material configured to support the reflection layer; and a thermal diffusion layer interposed between the reflection layer and the base material, and configured to diffuse heat of the reflection layer. A heat capacity, per unit area, of a structure constituted by both the reflection layer and the thermal diffusion layer is not lower than 1.1 (J/(K·m | 01-15-2015 |