Patent application number | Description | Published |
20110096526 | Light Emitting Device and Illumination Device - A light emitting device includes a base, a sub-mount substrate, and a frame member. The light emitting device further includes a light emitting element and a wavelength converting member. The sub-mount substrate is disposed on the base, and has an upper surface made of a ceramic sintered body. The frame member has a light reflecting portion made of porous ceramics, is disposed on the base, and surrounds the sub-mount substrate. The light emitting element is mounted on the sub-mount substrate. The wavelength converting member covers the light emitting element and the light reflecting portion of the frame member. | 04-28-2011 |
20120161186 | LIGHT-EMITTING DEVICE - A light-emitting device includes a substrate mounted with a light-emitting element, and a frame disposed on the substrate. The frame includes a first frame portion disposed on the substrate and surrounding the light-emitting element, and having an inner wall surface substantially perpendicular to an upper surface of the substrate, an upper end of the inner wall surface being positioned at a level higher than that of an upper surface of the light-emitting element, and a second frame portion surrounding the inner wall surface of the first frame portion when viewed in a plan view, and having an inner periphery which is so shaped as to extend at an outward incline from a lower end of the inner periphery to an upper thereof. The light-emitting device includes a wavelength converter supported on the frame and opposed to the substrate with a gap. | 06-28-2012 |
20120212124 | LIGHT-EMITTING DEVICE - A light-emitting device includes a substrate, a pair of electrode layers disposed on the substrate, a light-emitting element disposed between the pair of electrode layers to keep a first space with each of the pair of electrode layers while electrically connecting with each of the pair of electrode layers, and a pair of reflection layers, each extending in overlapping relation from one to the other one of the pair of electrode layers as seen in a transparent plan view. The light-emitting element is disposed between the pair of reflection layers to keep a second space with each of the pair of reflection layers. | 08-23-2012 |
20130200784 | LIGHT-EMITTING DEVICE - To improve the luminance of light emitted by a light-emitting device, the light-emitting device includes a base ( | 08-08-2013 |
Patent application number | Description | Published |
20100182583 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus | 07-22-2010 |
20120171622 | FILTER, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - A filter reflects first light having a first wavelength, and transmits second light having a second wavelength shorter than the first wavelength. The filter includes a plurality of plate members positioned parallel to each other with gaps therebetween in a first direction. An enveloping surface formed by end surfaces of the plurality of plate members forms a flat surface, which is nonparallel to the first direction. The filter transmits the second light to the second direction. | 07-05-2012 |
20130077747 | X-RAY IMAGING APPARATUS AND METHOD OF CAPTURING IMAGES WITH SAME - An image capturing apparatus includes a diffraction grating that diffracts radiation from an X-ray source to form an interference pattern, a detector that detects the radiation having passed through the diffraction grating, a shutter configured to be removably disposed between the X-ray source and an object to block the radiation from the X-ray source, and an adjustment mechanism that performs alignment of at least one of the X-ray source, the diffraction grating and the detector. When the shutter is disposed between the X-ray source and the object, the shutter defines a first space shielded from the radiation from the X-ray source and a second space not shielded from the radiation. The adjustment mechanism performs the alignment in accordance with at least part of an intensity distribution of the radiation having traveled through the second space and detected by the detector. | 03-28-2013 |
20130216959 | CHARGED PARTICLE BEAM APPARATUS, AND ARTICLE MANUFACTURING METHOD - A charged particle beam apparatus for processing an object using a charged particle beam includes a charged particle lens in which an array of apertures, through each of which a charged particle beam passes, is formed; a vacuum container which contains the charged particle lens; and a radiation source configured to generate an ionizing radiation; wherein the apparatus is configured to cause the radiation source to pass the ionizing radiation through the array of apertures in a state in which a pressure in the vacuum container is changing. | 08-22-2013 |
20130235980 | X-RAY OPTICAL APPARATUS - The present invention provides an X-ray optical apparatus including an X-ray reflective structure in which at least three reflective substrates are arranged with an interval and an X-ray which is incident into a plurality of X-ray passages whose both sides are put between the reflective substrates is reflected from the reflective substrate at both sides of the X-ray passage to be parallelized and emitted from the X-ray passage. When an edge of the X-ray reflective structure is an inlet of the X-ray and the other edge is an outlet of the X-ray, a pitch of the reflective substrates at the outlet is larger than a pitch at the inlet. Therefore, it is possible to efficiently parallelize the incident X-ray to be emitted with a simple structure. | 09-12-2013 |
20130243156 | RADIATION IMAGING APPARATUS - A radiation imaging apparatus according to the present invention includes a radiation source, a reflective structure where at least three reflective substrates are arranged with an interval and radiations being incident into a plurality of passages whose both sides are put between the reflective substrate are reflected and parallelized by the reflective substrate at both sides of the passage to be emitted from the passage, a radiation detector, and an image construction unit that constructs an image of an object based on an intensity of the radiation which is emitted from each of the passages, transmits the object and is detected by the radiation detector. When one edge of the reflective structure is an inlet of the radiation and the other edge is an outlet of the radiation, a pitch of the reflective substrates at the outlet is larger than a pitch at the inlet. | 09-19-2013 |
20130243163 | X-RAY APPARATUS AND ITS ADJUSTING METHOD - An adjusting method of an X-ray apparatus has a reflection structure, wherein assuming that one end plane of the reflection structure is an inlet port of the X-ray and the other end plane is an outlet port of the X-ray, a pitch of the reflection substrates at the outlet port is wider than that at the inlet port. When the X-ray source exists at a position where a glancing angle at the time when the X-ray enters the inlet port exceeds a critical angle, an intensity of the X-ray emitted from each passage is detected. On the basis of the detected X-ray intensity, a relative position of the X-ray source and the reflection structure is adjusted. | 09-19-2013 |
20130243164 | X-RAY OPTICAL APPARATUS AND ADJUSTING METHOD THEREOF - The present invention provides a method of adjusting an X-ray optical apparatus which includes: an X-ray source; and a reflective structure where at least three reflective substrate arranged with an interval and X-rays which are incident into a plurality of passages whose both sides are put between the reflective substrates are reflected and parallelized by the reflective substrate at both sides of each passage to be emitted from the passage. When one edge of the reflective structure is an inlet of the X-ray and the other edge is an outlet of the X-ray, a pitch of the reflective substrates at the outlet side is larger than a pitch at the inlet side. The method comprises adjusting the relative positions of the X-ray source and the reflective structure so as to reduce a penumbra amount formed by the X-ray emitted from each of the passages. | 09-19-2013 |
20130273478 | CHARGED PARTICLE OPTICAL SYSTEM, DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a charged particle optical system which emits a charged particle beam, the system including an electrostatic lens, and a grid electrode opposed to the electrostatic lens along an optical axis of the electrostatic lens, and configured to form an electrostatic field in cooperation with the electrostatic lens, wherein the grid electrode is configured such that an electrode surface, opposed to the electrostatic lens, of the grid electrode has a distance, from the electrostatic lens in a direction of the optical axis, which varies with a position in the electrode surface. | 10-17-2013 |
20130286469 | FILTER, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - A filter reflects first light having a first wavelength, and transmits second light having a second wavelength shorter than the first wavelength. The filter includes a plurality of plate members positioned parallel to each other with gaps therebetween in a first direction. An enveloping surface formed by end surfaces of the plurality of plate members forms a flat surface, which is nonparallel to the first direction. The filter transmits the second light to the second direction. | 10-31-2013 |
20140055765 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides an exposure apparatus for exposing a shot on a substrate to first pulsed light, the apparatus including an optical element for guiding the first pulsed light to the substrate, an irradiation device configured to irradiate the optical element with second pulsed light having an infrared wavelength which the first pulsed light has less than the second pulsed light has, and a controller configured to control the irradiation device in a process of exposing the shot to the first pulsed light plural times, such that the irradiation device irradiates the optical element with the second pulsed light during at least one period of non-irradiation periods in which the shot is not irradiated with the first pulsed light. | 02-27-2014 |
20150017573 | REFLECTIVE ORIGINAL, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - A reflective original includes: a reflection layer which has a multilayer film configured to reflect extreme ultraviolet light; a base material configured to support the reflection layer; and a thermal diffusion layer interposed between the reflection layer and the base material, and configured to diffuse heat of the reflection layer. A heat capacity, per unit area, of a structure constituted by both the reflection layer and the thermal diffusion layer is not lower than 1.1 (J/(K·m | 01-15-2015 |
Patent application number | Description | Published |
20090147364 | EXPOSURE MIRROR AND EXPOSURE APPARATUS HAVING SAME - An exposure mirror includes a substrate and an effective region for EUV light including an aperiodic multilayer film formed on the substrate. The exposure mirror is provided with a first evaluation region composed of a periodic multilayer film formed in a region different from the effective region on the substrate. | 06-11-2009 |
20110222042 | OPTICAL DEVICE AND DEVICE MANUFACTURING METHOD - An optical device includes a wavelength separation filter configured to separate incident light into light having a first wavelength and light having a second wavelength, the wavelength separation filter including a blazed grating whose cross-sectional shape is a saw-tooth shape formed by one-dimensionally arranging a plurality of grating elements, wherein the blazed grating is configured to exert a first power on the light having the first wavelength, of the light having the first wavelength and the light having the second wavelength, by gradually changing angles surfaces of the plurality of grating elements make with a base plane, and to exert a second power on the light having the second wavelength, of the light having the first wavelength and the light having the second wavelength, by gradually changing lengths of the plurality of grating elements along a direction in which the plurality of grating elements are arranged. | 09-15-2011 |
20120170012 | MIRROR, METHOD OF MANUFACTURING THE SAME, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier layer which is arranged between the first layer and the second layer, and prevents a diffusion of a material of the first layer and a material of the second layer, and a third step of bringing a shape of the reflection layer close to a target shape by changing a layer thickness profile of the shape adjusting layer after the second step, the third step including a process of partially annealing the shape adjusting layer. | 07-05-2012 |
20120178025 | CHARGED PARTICLE BEAM DRAWING APPARATUS AND ARTICLE MANUFACTURING METHOD - The charged particle beam drawing apparatus of the present invention performs drawing to a substrate with a plurality of charged particle beams. The drawing apparatus includes an electron lens positioned at a location facing opposite to the substrate and including a plurality of holes through which the charged particle beams pass; and a cleaning unit configured to release active species to a decomposition product that has adhered to the electron lens and reduce the decomposition product by the reaction of the active species and the decomposition product to thereby change the decomposition product to a volatile gas. Here, the cleaning unit has a plurality of openings formed such that the active species are released toward the plurality of holes of the electron lens. | 07-12-2012 |
20120288799 | CHARGED-PARTICLE BEAM LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING DEVICE - A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case. | 11-15-2012 |