| 52nd week of 2021 patent applcation highlights part 47 |
| Patent application number | Title | Published |
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| 20210405473 | DISPLAY SUBSTRATE AND DISPLAY PANEL - A display substrate and a display panel are provided. The display substrate includes: a display region; a frame region at least partially surrounding the display region; a black matrix including a first part in the display region and a second part in the frame region; and an alignment mark which is in the frame region and at a side of the second part of the black matrix away from the display region, and is spaced apart from the black matrix. A planar shape of the second part of the black matrix has a corner part, the alignment mark is opposite to the corner part, and an outer contour of the corner part opposite to the alignment mark includes a concave part which is concave towards the display region. | 2021-12-30 |
| 20210405474 | ELECTRO-OPTICAL DEVICE AND ELECTRONIC DEVICE - An electro-optical device includes a scanning line extending along a first direction and having a light shielding property, a transistor having a semiconductor layer extending along the first direction so as to overlap with the scanning line, a contact hole electrically coupled to the scanning line at a side of a channel region of the semiconductor layer, and an opening provided at a side of a first LDD region and a second LDD region of the semiconductor layer. | 2021-12-30 |
| 20210405475 | DISPLAY PANEL AND MANUFACTURING METHOD THEREOF - The present invention provides a display panel and a manufacturing method Thereof. The display panel includes a plurality of sub-pixel regions distributed in an array. Each of the sub-pixel regions includes a primary pixel region and a secondary pixel region arranged adjacently. Each of the sub-pixel regions is provided with a color resist. The color resist disposed in the secondary pixel region is provided with a first hollowed-out portion, so that a thickness of the color resist disposed in the secondary pixel region is less than a thickness of the color resist disposed in the corresponding primary pixel region, and brightness of the secondary pixel region is less than brightness of the corresponding primary pixel region. | 2021-12-30 |
| 20210405476 | ARRAY SUBSTRATE AND METHOD FOR FABRICATING SAME, AND METHOD FOR DETECTING ALIGNMENT ACCURACY - The present disclosure provides an array substrate and a method for fabricating the same, a method for detecting alignment accuracy, and a liquid crystal display panel, wherein a dummy color resist unit is disposed on a periphery of a display area of a substrate, and a side or a center point of the dummy color resist unit is designed to be at a predetermined distance from an adjacent signal line. Therefore, it is only necessary to measure a distance between the side or the center point of the dummy color resist unit and a signal line adjacent to it, and compare the measured distance with the predetermined distance to estimate alignment accuracy of color resist units. It is not necessary to dispose detection units in a non-display area of the array substrate so that an area of the non-display area can be reduced to achieve ultra-narrow frame design. | 2021-12-30 |
| 20210405477 | ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF, AND DISPLAY PANEL - The present application provides an array substrate, a manufacturing method thereof, and a display panel. The array substrate includes a substrate, a driving circuit layer located on the substrate, and a pixel electrode layer located on the driving circuit layer, wherein the pixel electrode layer is electrically connected to the driving circuit layer through a first via hole; and wherein the pixel electrode layer further includes at least one second via hole located in the first via hole, and the second via hole exposes a part of the driving circuit layer. | 2021-12-30 |
| 20210405478 | ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND DISPLAY PANEL - An array substrate and a method of manufacturing the same, and a display panel are disclosed. The array substrate includes a substrate, a first metal layer, a first insulating layer, an electrically conductive layer, and a second metal layer. The first metal layer and the second metal layer are electrically connected through a through hole on the first insulating layer and a second conductive portion of the electrically conductive layer, so that a contact resistance between the first. metal layer and the second metal layer can be reduced, a problem of gradient lines likely to occur in a display panel can be overcome, and display quality of the display panel can be improved. | 2021-12-30 |
| 20210405479 | DISPLAY PANEL MOTHERBOARD, MANUFACTURING METHOD THEREOF, AND DISPLAY PANEL - The present invention provides a display panel motherboard, a manufacturing method thereof, and a display panel. The manufacturing method of the display panel motherboard includes: forming a first type through-hole in a central region of a substrate motherboard, forming a second type through-hole in an edge region of the substrate motherboard, and comparing a ratio of a contact resistance of the first type through-hole to a contact resistance of the second type through-hole to a default threshold value for designing a display panel motherboard that meets requirements. | 2021-12-30 |
| 20210405480 | LIQUID CRYSTAL DISPLAY PANEL AND DISPLAY DEVICE - The present application provides a liquid crystal display panel and a display device. Invalid pixels of the liquid crystal display panel include a test pixel. In this structure, when no tests are required, the test pixel is in an off state, and there is no voltage difference between a pixel electrode and a common electrode to cause rotation of liquid crystals. When a test is required, the test pixel is in an on state, and the pixel electrode is disconnected from the common electrode to cause a voltage difference, so that the liquid crystals are normally rotated. | 2021-12-30 |
| 20210405481 | DISPLAY PANEL AND DISPLAY DEVICE - Embodiments of the present disclosure provide a display panel comprising an array substrate, wherein the array substrate comprises a common electrode with a low-level voltage, pixel circuit units and photosensitive transistors. The pixel circuit units are electrically connected to gate lines, data lines and the common electrode. And the photosensitive transistors are electrically connected with the pixel circuit units and the common electrode. | 2021-12-30 |
| 20210405482 | DISPLAY PANEL AND LIQUID CRYSTAL DISPLAY DEVICE - The present disclosure provides a display panel and a liquid crystal display device. The display panel includes an array substrate and a flexible thin film. The array substrate has a first surface, a second surface disposed opposite to and in parallel with the first surface, and a first side surface connected to the first surface and the second surface. The first surface of the array substrate is on a same side as a light-emitting surface of the array substrate, and the flexible thin film is disposed on a side of the second surface of the array substrate. The display panel and the liquid crystal display device have narrow frames. | 2021-12-30 |
| 20210405483 | DISPLAY PANEL AND DISPLAY DEVICE - Embodiments of the present disclosure refer to a display panel and a display device utilizing the same. In the embodiments of the present disclosure, a plurality of common lines are parallelly located at sides of the plurality of data lines in a display area and the plurality of common lines are connected with a common electrode layer through a plurality of vias, thus making the common voltage in the display area become even, diminishing the difference between the best Vcom on the edge of the display panel and the best Vcom in the center of the display panel, and improving flicker in the periphery of the display panel. | 2021-12-30 |
| 20210405484 | ARRAY SUBSTRATE AND DISPLAY PANEL - An array substrate is provided. The array substrate includes: a substrate; a plurality of scan lines; a plurality of data lines; and a plurality of pixel units disposed in a matrix. In two adjacent ones of the pixel units in two adjacent rows, a second pixel electrode in an auxiliary area of one of the two adjacent ones of the pixel units extends to a main display area of the other of the two adjacent ones of the pixel units. A second pixel electrode extending part is disposed between a first pixel electrode and a corresponding one of the data lines. A metal electrode plate for light shielding is not disposed in an area in which the second pixel electrode extending part is disposed, and thus a transmittance is increased. | 2021-12-30 |
| 20210405485 | DISPLAY PANEL AND DISPLAY DEVICE - A display panel and a display device are disclosed. The display panel includes a substrate, a plurality of data line groups located on the substrate and adjacently arranged in order, a plurality of gate line groups located on the substrate and adjacently arranged in order, and a plurality of pixel electrode array units. The pixel electrode array units include a first pixel electrode, a second pixel electrode, and a third pixel electrode. The display panel improves arrangement of the pixel electrode array units, which effectively reduces graininess on a display screen and improves viewing angles of the display screen. | 2021-12-30 |
| 20210405486 | PIXEL STRUCTURE, PIXEL CIRCUIT, AND DISPLAY PANEL - The present application provides a pixel structure, a pixel circuit, and a display panel. The pixel structure includes: a first metal layer including gates of thin film transistors and a gate common electrode line; a second metal layer including sources and drains of the thin film transistors; wherein a drain of a shared thin film transistor is connected to the common electrode line. The pixel structure prevents a series of problems such as existence of a shared electrode line in a conventional pixel structure affecting an aperture ratio, white fog, a short circuit to a data line easily to occur, not easy to overhaul, etc. | 2021-12-30 |
| 20210405487 | ARRAY SUBSTRATE AND DISPLAY PANEL - The present invention provides an array substrate and a display panel, wherein the first protrusion and the second protrusion are provided in the filter unit of the color filter layer, and the second gap between the data line and the drain is covered with the first protrusion and/or the second protrusion, to solve the problem that a residue of the ITO exists in the second gap, which causes short circuit between the pixel electrode and the DBS electrode, such that the product yield is elevated, and the display effect is improved, thus enhancing customer experience. | 2021-12-30 |
| 20210405488 | Display Substrate and Liquid Crystal Panel - The present disclosure provides a display substrate and a liquid crystal panel. The display substrate includes: a substrate; and a common electrode and a pixel electrode array layer which are located on a side of the substrate and are spaced by insulation, wherein the common electrode includes a transparent conductive layer; the pixel electrode array layer includes a plurality of pixel electrode groups arranged in a column direction, wherein each of the pixel electrode groups includes two rows of pixel electrodes, two gate lines extending along a row direction and arranged in the column direction is provided between two adjacent pixel electrode groups, and each of the gate lines is connected to a plurality of thin film transistors, each of the pixel electrodes is connected to one of the thin film transistors; an orthographic projection of a gap, which is between two pixel electrodes adjacent in the column direction of the pixel electrode group, on the substrate falls within an orthographic projection of the common electrode on the substrate. | 2021-12-30 |
| 20210405489 | DISPLAY SUBSTRATE AND DISPLAY DEVICE - The present disclosure provides a display substrate and a display device. The display substrate includes a base substrate, and a transistor, an anti-static wire, a first anti-static resistor and a first ground bonding pad on the base substrate, wherein a first terminal of the first anti-static resistor is electrically connected to a first end of the anti-static wire, a second terminal of the first anti-static resistor is electrically connected to the first ground bonding pad, and the first anti-static resistor is at a different layer from a layer at which the anti-static wire is located and a layer at which the first ground bonding pad is located, and is at a same layer as an active layer of the resistor. | 2021-12-30 |
| 20210405490 | ARRAY SUBSTRATE, LIGHT CONTROL PANEL, AND DISPLAY DEVICE - An array substrate, a light control panel and a display device are provided. The array substrate includes a plurality of gate lines respectively extending along a first direction, a plurality of data lines respectively extending along a second direction intersected with the first direction, and a plurality of light control pixel units. Each of the plurality of gate lines includes a plurality of grid parts arranged side by side along the first direction and connected in sequence, and each of the plurality of grid parts includes a grid line and an opening area surrounded by the grid line. | 2021-12-30 |
| 20210405491 | DISPLAY DEVICE AND METHOD OF INSPECTION - A display device includes wires that are coupled to driver terminals that are able to be coupled to a driver integrated circuit (IC) and that are provided along a first direction and extending so as to spread toward outsides in the first direction as the wires are directed toward a second direction orthogonal to the first direction; and dummy wires that are provided along the wires on one outside and another outside in the first direction of the wires and that are not coupled to the driver terminals and the wires, wherein a number of the dummy wires on the one outside and a number of the dummy wires on the other outside are respectively three or more, the dummy wires extend in parallel with the wires, and a width of the dummy wire is equal to a width of the wire. | 2021-12-30 |
| 20210405492 | LIQUID CRYSTAL DISPLAY DEVICE - A liquid crystal display device includes: a liquid crystal display panel having gate bus lines extending along a row direction and source bus lines extending along a column direction; and a gate bus line driving circuit and a source bus line driving circuit. The pixels are disposed in a pixel array region, which includes: a first region where arbitrary displaying takes place; and a second region where exclusively black displaying takes place, the second region adjoining the first region along the column direction. The gate bus lines include a first group of gate bus lines disposed in the first region and a second group of gate bus lines disposed in the second region. The second group of gate bus lines include a first gate bus line connected to the gate bus line driving circuit and second gate bus lines connected to the first gate bus line via an interconnect. | 2021-12-30 |
| 20210405493 | SOLAR POWER DYNAMIC GLASS FOR HEATING AND COOLING BUILDINGS - Various embodiments herein relate to systems for powering electrochromic windows in a building. Systems may include photovoltaic panels configured to generate electrical power, energy storage device(s) configured for storing generated power, and one or more controllers on a network of electrochromic windows that are configured to receive power from the energy storage device(s) and power tint transitions in one or more electrochromic windows. Systems may include various additional circuit components described herein for regulating and/or controlling the generation, storage, and application of electric power. The systems and techniques described herein can be used to design networks of electrochromic windows that are hybrid-solar or off-the-grid (“OTG”). | 2021-12-30 |
| 20210405494 | Optical Panel, Image Collection Device and Image Collection Method - An optical panel includes a first transparent substrate, a second transparent substrate, an electrochromic assembly, a first transparent electrode layer, and a second transparent electrode layer. The second transparent substrate is arranged opposite the first transparent substrate. The electrochromic assembly is located between the first transparent substrate and the second transparent substrate and includes a plurality of electrochromic pixel-units that are arranged in an array. A shielding and spacing wall is arranged between two adjacent of the plurality of electrochromic pixel-units. The first transparent electrode layer is arranged between the electrochromic assembly and the first transparent substrate. The second transparent electrode layer is arranged between the electrochromic assembly and the second transparent substrate. The first transparent electrode layer and the second transparent electrode layer are configured to provide a driving voltage to the plurality of electrochromic pixel-units to adjust an optical parameter of the plurality of electrochromic pixel-units. | 2021-12-30 |
| 20210405495 | DISPLAY PANEL - An embodiment of the present application provides a display panel including a first substrate, a second substrate, barrier walls, and an electrophoretic material. The second substrate is disposed opposite to the first substrate, and the second substrate includes a substrate layer, a metal layer, a first protective layer, a nanoparticle layer, and a second protective layer arranged in a stack. The second protective layer is disposed on a side of the second substrate facing the first substrate. The barrier walls are disposed between the first substrate and the second substrate, a plurality of receiving spaces are defined by the barrier walls, the first substrate, and the second substrate, and the electrophoretic material is contained in each of the receiving spaces. | 2021-12-30 |
| 20210405496 | DISPLAY PANEL, CONTROL METHODS THEREOF, AND DISPLAY DEVICE - A display panel and control methods thereof are provided. In one example, the display panel includes, a first substrate and a second substrate opposite to each other, and a solution encapsulated between the first substrate and the second substrate. In some examples, the solution includes opaque charged particles. In some examples, the first substrate includes a first electrode, the first electrode including a plurality of discrete sub-electrodes, and the second substrate includes a second electrode. Further, the control method may include adjusting an electric field between each of the plurality of discrete sub-electrodes and the second electrode, causing the opaque charged particles to undergo a gathering motion or a scattering motion. | 2021-12-30 |
| 20210405497 | PRIVACY FILM, DISPLAY APPARATUS, AND METHOD OF DISPLAYING IMAGE IN DISPLAY APPARATUS - A privacy film includes a first conductive layer; an emitting angle limiting spacer layer on the first conductive layer; a second conductive layer on a side of the emitting angle limiting spacer layer away from the first conductive layer; and a plurality of light diffuser particles in a space between the first conductive layer and the second conductive layer. The emitting angle limiting spacer layer includes a plurality of spacers defining a plurality of light emitting regions, The second conductive layer is spaced apart from the first conductive layer by a first distance. A maximum height of the plurality of spacers relative to a surface of the first conductive layer facing the second conductive layer is less than the first distance. The second conductive layer is spaced apart from a surface of a respective one of the plurality of spacers facing the second conductive layer by a second distance. | 2021-12-30 |
| 20210405498 | MULTILAYER THIN-FILM STRUCTURE AND PHASE SHIFTING DEVICE USING THE SAME - Provided are a multilayer thin-film structure and a phase shifting device using the same. The multilayer thin-film structure includes at least one crystallization preventing layer and at least one dielectric layer that are alternately stacked. The at least one crystallization preventing layer includes an amorphous material, and a thickness of the at least one crystallization preventing layer is less than a thickness of the at least one dielectric layer. | 2021-12-30 |
| 20210405499 | LOW DRIVE VOLTAGE MULTI-WAVELENGTH TRANSMITTER - Examples herein relate to optical systems. In particular, implementations herein relate to an optical system including an optical transmitter configured to transmit optical signals. The optical transmitter includes a first optical source coupled to an input waveguide and configured to emit light having different wavelengths through the input waveguide. The optical transmitter includes a Mach-Zehnder interferometer that includes a first arm and a second arm. The MZI further includes a first optical coupler configured to couple the emitted light from the input waveguide to the first and second arms and an array of two or more second optical sources coupled to the first arm. Each of the two or more second optical sources are configured to be injection locked to a different respective wavelength of the emitted light transmitted from the first optical source. The MZI further includes a second optical coupler configured to combine the emitted light from the first and second arms after propagating therethrough. | 2021-12-30 |
| 20210405500 | OPTICAL MODULATING DEVICE AND OPTICAL APPARATUS EMPLOYING THE SAME - Provided is an optical modulating device including an incidence optical system, an optical modulating assembly including a plurality of nano-antennas that form a meta-grating based on a driving signal, the optical modulating assembly being configured to change a traveling direction of incidence light incident at an incidence angle from the incidence optical system based on an effective displacement of the meta-grating according to the driving signal, and an emission optical system configured to emit light steered by the optical modulating assembly, wherein the emission optical system is further configured to emit first-order diffraction light of the incidence light based on the meta-grating. | 2021-12-30 |
| 20210405501 | METHODS AND APPARATUS FOR DETECTING NITRIC OXIDE - Embodiments of the present invention relate to methods and apparatus for detecting atmospheric NO at signal levels capable of distinguishing the NO isotopologues. More particularly, embodiments of the present invention relate to methods and apparatus for a single photon LIF sensor that pumps a vibronic transition near 215 nm and observes the resulting red shifted fluorescence from about 255 to about 267 nm. Embodiments of the present system uses a NO-LIF measurement fiber-amplified laser apparatus capable of: generating laser linewidth that is sufficiently narrow to resolve the Doppler broadened NO spectrum at room temperature and thereby achieve high signal levels and distinguish the NO isotopologues; generating laser repetition rate sufficient to enable single-photon counting of the fluorescence signal; and having size, weight and environmental robustness allowing for integration onto airborne platforms. | 2021-12-30 |
| 20210405502 | Wavelength Conversion Apparatus - A wavelength conversion apparatus using a nonlinear optical medium having a periodically poled structure is operated at an optimal temperature in a stable manner. The wavelength conversion apparatus includes a wavelength converter using a nonlinear optical medium and a controller for controlling temperature of the wavelength converter. The wavelength conversion apparatus further includes a first optical branch coupler for branching part of output light from the wavelength converter, and first and second wavelength separation filters for separating and outputting, from part of the output light, each of two light components generated by parametric fluorescence in the wavelength converter. The controller controls the temperature of the wavelength converter on the basis of difference in light intensity of the two light components. | 2021-12-30 |
| 20210405503 | TRUNCATED NON-LINEAR INTERFEROMETER-BASED SENSOR SYSTEM - A truncated non-linear interferometer-based sensor system includes an input that receives an optical beam and a non-linear amplifier that generates a probe beam and a conjugate beam from the optical beam. The system's local oscillators are related to the probe beam and the conjugate beam. The system includes a sensor that transduces an input with the probe beam and the conjugate beam. The transduction detects changes in the phase of each of the probe beam and the conjugate beam. The system's phase sensitive detectors detect phase modulations between the respective local oscillators, the probe beam, and the conjugate beam and outputs phase signals based on detected phase modulations. The system measures phase signals indicative of the sensor's input resulting from a sum or difference of the phase signals. The measurement exhibits a quantum noise reduction in an intensity difference, a phase sum, or an amplitude difference quadrature. | 2021-12-30 |
| 20210405504 | Nonlinear Optical Chromophores Having a Diamondoid Group Attached Thereto, Methods of Preparing the Same, and Uses Thereof - Nonlinear optical chromophores having one or more diamondoid groups covalently attached to the chromophore, methods of making nonlinear optical chromophores, their use in thin films and electro-optical devices containing such nonlinear optical chromophores and thin films comprising the same. | 2021-12-30 |
| 20210405505 | CAMERA MODULE AND ELECTRONIC DEVICE - A camera module includes: a plurality of lens modules disposed in a first direction and a second direction intersecting an optical axis; a first light blocking member configured to move in the first direction to selectively expose the plurality of lens modules; a second light blocking member configured to move in the second direction to selectively expose the plurality of lens modules; and a driving assembly configured to drive the first light blocking member and the second light blocking member. | 2021-12-30 |
| 20210405506 | Multiple Stop Orientation Follow Focus - A follow focus enabling a user to move quickly move into and out of a hard stop operation. A soft stop orientation provides haptic feedback at manually calibrated focusing settings. | 2021-12-30 |
| 20210405507 | ELECTRONIC APPARATUS - An electronic viewfinder unit includes a finder unit and a base member. The finder unit includes a display unit, an eyepiece portion, and a lens holding member holding a lens that guides a light flux emitted from the display unit to the eyepiece portion. The base member includes a guide member configured to guide the electronic viewfinder unit to a housed state and a protruding state. The base member includes a holding portion and a turning member. The holding portion is provided with a first holding member and a second holding member that face each other with an optical axis of the lens in between. The turning member has one end held by the first holding member and another end held by the second holding member, and is turnable about an axis orthogonal to the optical axis of the lens. | 2021-12-30 |
| 20210405508 | DUAL LENS DRIVING APPARATUS AND CAMERA MODULE - An embodiment relates to a dual lens driving apparatus including: a housing; a first bobbin disposed inside the housing; a second bobbin disposed inside the housing and positioned away from the first bobbin; a first coil disposed on the first bobbin; a second coil disposed on the second bobbin; a magnet disposed in the housing and positioned opposite from the first coil and second coil; a base disposed below the housing; a board disposed between the housing and the base and opposite from the magnet and including a circuit member having a third coil; and a supporting member movably supporting the housing with respect to the board. The third coil includes a first axial coil which is disposed in a first direction and a second axial coil which is disposed in a second direction different from the first direction. The first axial coil includes four first axial coil units which are positioned away from one another. The four first axial coil units are connected to one another. The second axial coil includes four second axial coil units which are positioned away from one another. The four second axial coil units are connected to one another. | 2021-12-30 |
| 20210405509 | CAMERA MODULE AND ELECTRONIC DEVICE HAVING IMAGE-CAPTURING FUNCTION - Provided is a camera module, including: a lens group including a lens barrel and a camera lens; and a driver assembly configured to drive the camera lens to move and including a magnetic portion. The camera lens includes a magnetic matching portion. The magnetic portion and the magnetic matching portion are respectively located at two ends of a side wall of the lens barrel in a thickness direction, and are connectable to each other through magnetic attraction, in such a manner that the camera lens is driven by the driver assembly to move along the optical axis of the camera lens. In this way, the side wall of the lens barrel is free of a through hole, so that light is prevented from entering the lens barrel via the through hole, thereby prolonging the lifetime of the camera module and improving the image-capturing effect. | 2021-12-30 |
| 20210405510 | PHOTOGRAPHING DEVICE AND UNMANNED AERIAL VEHICLE - A photographing device includes a camera module assembly, a glass disposed external to the camera module assembly to protect the camera module assembly, a heating element disposed on the glass and a controller configured to control the heating element to heat the glass. | 2021-12-30 |
| 20210405511 | Step Release Stand - An adjustable base configured to allow a user to release the ball joint without using their hands. On the stand member is a foot activated release member which is swivelly secured to the stand member utilizing a spring to keep the foot activated release member in a relaxed state. At one end of the foot member is a ball joint which is released when foot pressure is applied against the foot activated release member. | 2021-12-30 |
| 20210405512 | MOUNTING SYSTEMS FOR IMAGE CAPTURE DEVICES - A mounting system for an image capture device that includes three pivotably connected arms is disclosed. The first arm includes a first fastener that is lockable and unlockable to allow for connection and disconnection of the image capture device, and a second fastener that is lockable and unlockable to regulate the position of the image capture device relative to the first arm. The mounting system further includes a third fastener that is lockable and unlockable to regulate the relative positioning between the first arm and the second arm, and a fourth fastener that is lockable and unlockable to regulate the relative positioning between the second arm and the third arm. Whereas the first fastener is removable, each of the second, third, and fourth fasteners is captive to (nonremovable from) the mounting system. | 2021-12-30 |
| 20210405513 | ACCESSORY SHOE APPARATUS, ELECTRONIC APPARATUS, SHOE APPARATUS AND ACCESSORY APPARATUS - An accessory shoe apparatus on an electronic apparatus includes an engagement member and a communication. A shoe apparatus on an accessory apparatus is detachably attachable to the accessory shoe apparatus. The engagement member engages with the shoe apparatus and including an opening portion that faces the engaged shoe apparatus. The communication element performs wireless communication with the shoe apparatus via an inside of the opening portion. | 2021-12-30 |
| 20210405514 | Systems and Methods for Multiplying the Image Resolution of a Pixelated Display - Systems integrating display resolution-multiplication solutions can be implemented in a variety of different ways. In many embodiments, the system includes an image projector for projecting image light, an image processor for computing a native image and at least one image shifted in a predefined direction, and at least one switchable grating capable of being switched between diffracting and non-diffracting states. In some embodiments, the switchable grating is optically coupled to the image projector. In a number of embodiments, the switchable gratings have a first configuration for propagating the native image light and at least one other configuration for propagating shifted image light having an angular displacement corresponding to the image shift in a predefined direction. By displaying the native and shifted images sequentially within a human eye integration period, the display resolution can be multiplied. | 2021-12-30 |
| 20210405515 | ILLUMINATION SYSTEM AND PROJECTION DEVICE - An illumination system, configured to provide an illumination beam, is provided. The illumination system includes a first excitation light source, a wavelength conversion element, and a controller. The first excitation light source is configured to provide a first excitation beam. The wavelength conversion element is located on a transmission path of the first excitation beam. The wavelength conversion element includes multiple wavelength conversion regions and multiple non-wavelength conversion regions. The controller controls whether the first excitation light source emits light. During a first time interval, the controller turns off the first excitation light source. During a second time interval, the controller controls the first excitation light source to emit light. The first excitation beam is transmitted to one of the wavelength conversion regions to form a converted beam. The illumination beam includes the converted beam. Another illumination system and multiple projection devices are also provided. | 2021-12-30 |
| 20210405516 | LIGHT SOURCE DEVICE AND PROJECTION DISPLAY SYSTEM THEREOF - A light source device and a projection display system are provided. The light source device includes a first light source configured to emit first light, a wavelength conversion unit having at least one region, a second light source configured to emit second light, and a light combining element. The at least one region is configured to receive the first light and be excited to generate excited light. The light combining element is configured to converge excited light emitted from the wavelength conversion device and the second light. | 2021-12-30 |
| 20210405517 | LIGHT SOURCE DEVICE AND PROJECTION DISPLAY APPARATUS - A light source device includes: a plurality of first laser light sources, a second laser light source, and a plurality of third laser light sources; a first polarization mirror that combines light from the plurality of first laser light sources and transmits light from the second laser light source; a dichroic mirror that combines the light from the plurality of first laser light sources and the light from the second laser light source; a second polarization mirror that combines light from the plurality of third laser light sources and transmits the light from the plurality of first laser light sources and the light from the second laser light source; a retardation plate that converts polarization of light from the second polarization mirror into circular polarization; and a filter element that reflects light from the retardation plate. | 2021-12-30 |
| 20210405518 | Camera system with a plurality of image sensors - Active areas of image sensors are determined by one or more parameters defining a mergeline or memory addresses where image data is stored. Image data generated by active areas of different image sensors are combined to create a panoramic image. Image distortion is detected in image data generated by an active area of an image sensor. Distortion in image data is addressed by configured image processing instructions. A group of one or more processors is assigned to at least each image sensor. At least one set of instructions assures that image data generated by different image sensors creates a combined image of a video with a substantially seamless transition between areas. Curved image sensors limit distortion. Cameras are fixedly held in a calibrated body. | 2021-12-30 |
| 20210405519 | EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF - In a method of manufacturing a reflective mask, a photo resist layer is formed over a mask blank. The mask blank includes a substrate, a reflective multilayer on the substrate, a capping layer on the reflective multilayer, an absorber layer on the capping layer and a hard mask layer, and the absorber layer is made of Cr, CrO or CrON. The photo resist layer is patterned, the hard mask layer is patterned by using the patterned photo resist layer, the absorber layer is patterned by using the patterned hard mask layer, and an additional element is introduced into the patterned absorber layer to form a converted absorber layer. | 2021-12-30 |
| 20210405520 | PHOTOMASK BLANK, AND MANUFACTURING METHOD THEREOF - In a photomask blank including a transparent substrate and a first inorganic film containing either or both of a transition metal and silicon, and optional a second inorganic film containing either or both of a transition metal and silicon, when an intensity of secondary ions is measured in the thickness direction of the transparent substrate and the inorganic films by TOF-SIMS with using a primary ion source of Bi and a sputtering ion source of Cs, an intensity of secondary ions containing carbon detected at the interface of the transparent substrate and the inorganic film or the inorganic films is higher than both intensities of the secondary ions containing carbon detected, respectively, at the sides remote from the interface. | 2021-12-30 |
| 20210405521 | PROXIMITY CORRECTION METHODS FOR SEMICONDUCTOR MANUFACTURING PROCESSES - A proximity correction method for a semiconductor manufacturing process includes: generating a plurality of pieces of original image data from a plurality of sample regions, with the sample regions selected from layout data used in the semiconductor manufacturing process; removing some pieces of original image data that overlap with each other from the plurality of pieces of original image data, resulting in a plurality of pieces of input image data; inputting the plurality of pieces of input image data to a machine learning model; obtaining a prediction value of critical dimensions of target patterns included in the plurality of pieces of input image data from the machine learning model; measuring a result value for critical dimensions of actual patterns corresponding to the target patterns on a semiconductor substrate on which the semiconductor manufacturing process is performed; and performing learning of the machine learning model using the prediction value and the result value. | 2021-12-30 |
| 20210405522 | MASK SYNTHESIS USING DESIGN GUIDED OFFSETS - Aspects described herein relate to mask synthesis using design guided offsets. A target shape on an image surface to be fabricated using a mask based on a design of an integrated circuit is obtained. Rays are generated emanating from respective anchor points. The anchor points are on a boundary of the target shape or a boundary of a mask shape of the mask. For each ray of the rays, a distance is defined between a first intersection of the respective ray and the boundary of the target shape and a second intersection of the respective ray and the boundary of the mask shape. An analysis is performed by one or more processors, where the analysis is configured to modify the distances based on an error between the target shape and a resulting shape simulated to be on the image surface resulting from the mask shape. | 2021-12-30 |
| 20210405523 | INHIBITING BACTERIA COLONIZATION WITHOUT ANTIBIOTICS - A device such as a medical device and a method for making same provides a device surfaces modified by beam irradiation, such as a gas cluster ion beams or a neutral beam, to inhibit or delay attachment or activation or clotting of platelets or to match surface energy of the device to that of a protein with the property of inhibition of bacterial colonization that can coat the all or part of the device surface to effect such inhibition. | 2021-12-30 |
| 20210405524 | NANOFABRICATION METHOD WITH CORRECTION OF DISTORTION WITHIN AN IMPRINT SYSTEM - A nanofabrication method comprises receiving information regarding a distortion within an imprint system, generating a first drop pattern that is not based on the received information, generating a second drop pattern and a third drop pattern, each based on the received information, modifying the first drop pattern to generate a fourth drop pattern. The modifying includes adding a first plurality of drop positions to the first drop pattern or removing a second plurality of drop positions from the first drop pattern, thereby forming an intermediate drop pattern, and either removing the second plurality of drop positions from the intermediate drop pattern or adding the first plurality of drops to the intermediate pattern. The first plurality of drop positions corresponds to drop positions defined by the second drop pattern and the second plurality of drop positions corresponds to drop positions defined by the third drop pattern. | 2021-12-30 |
| 20210405525 | PI SUBSTRATE AND MANUFACTURING METHOD THEREOF - The disclosure provides a polyimide (PI) substrate and a manufacturing method thereof. The PI substrate includes a first area and a plurality of second areas, wherein the second areas are spaced apart from each other in the first area, and the PI substrate includes a glass substrate and a plurality of PI layers disposed on the glass substrate. | 2021-12-30 |
| 20210405526 | COLORING COMPOSITION, CURED FILM, STRUCTURE BODY, COLOR FILTER, AND DISPLAY DEVICE - Provided are a coloring composition including a colorant, a polymerizable compound, and a photopolymerization initiator, in which the colorant includes at least one selected from C. I. Pigment Blue 15:3 or C. I. Pigment Blue 15:4, and C. I. Pigment Yellow 150, and contains 35 to 55 parts by mass of C. I. Pigment Blue 15:3 and C. I. Pigment Blue 15:4 in total with respect to 100 parts by mass of C. I. Pigment Yellow 150, and the coloring composition has a minimum absorbance in a wavelength range of 495 to 525 nm among absorbances to light having a wavelength of 400 to 700 nm; a cured film formed of the coloring composition; a structure body; a color filter; and a display device. | 2021-12-30 |
| 20210405527 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition that contains a base material component (A), a first acid generator, and a second acid generator, the first acid generator is a compound represented by General Formula (b1), the second acid generator is a compound (B2) having an anion moiety having a molar volume of 250 cm | 2021-12-30 |
| 20210405528 | RESIST COMPOSITION AND PATTERNING PROCESS - A resist composition is provided comprising a base polymer and a quencher comprising a salt compound obtained from a nitrogen-containing compound having an iodine or bromine-substituted hydrocarbyl group (exclusive of iodine or bromine-substituted aromatic ring) bonded to the nitrogen atom via an ester bond-containing group and a compound having a 1,1,1,3,3,3-hexafluoro-2-propanol group. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone. | 2021-12-30 |
| 20210405529 | FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN - The present invention has an object to provide a film forming material for lithography that is applicable to a wet process, has excellent heat resistance and film flatness in a supporting material having difference in level, and has excellent solubility in a solvent and long term storage stability in a solution form; and the like. The above object can be achieved by a film forming material for lithography comprising:
| 2021-12-30 |
| 20210405530 | PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE - A photosensitive composition for EUV light includes a resin X of which a polarity is increased by an action of an acid so that a solubility in an alkali developer is increased and a solubility in an organic solvent is decreased, and a photoacid generator; or a resin Y which includes a repeating unit having a photoacid generating group and of which a polarity is increased by an action of an acid so that a solubility in an alkali developer is increased and a solubility in an organic solvent is decreased, in which the photosensitive composition for EUV light satisfies both Requirement 1 and Requirement 2. | 2021-12-30 |
| 20210405531 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition containing a resin component (A1) having a constitutional unit (a01) and a constitutional unit (a02) derived from compounds each represented by General Formulae (a01-1) and (a02-1), a compound (B1) represented by General Formula (b1), and a compound represented by General Formula (d1-1) or a compound represented by General Formula (d1-2), in the formulae, C | 2021-12-30 |
| 20210405532 | METHOD OF FORMING A PATTERNED STRUCTURE AND DEVICE THEREOF - There is provided a method of forming a patterned structure on a substrate. The method includes: forming a resist layer on the substrate, the resist layer being a negative tone resist; exposing a first portion of the resist layer to a focused electron beam to form a modified first portion, the modified first portion defining a boundary of a second portion of the resist layer; performing a plasma treatment on a surface of the resist layer, including on a surface of the second portion of the resist layer to form a modified surface portion of the second portion of the resist layer, resulting in a plasma treated resist layer; and performing development of the plasma treated resist layer to form the patterned structure on the substrate corresponding the second portion of the resist layer. | 2021-12-30 |
| 20210405533 | Nanoscale Etching of Light Absorbing Materials using Light and an Electron Donor Solvent - A method for etching a light absorbing material permits directly writing a pattern of etching of silicon nitride and other light absorbing materials, without the need of a lithographic mask, and allows the creation of etched features of less than one micron in size. The method can be used for etching deposited silicon nitride films, freestanding silicon nitride membranes, and other light absorbing materials, with control over the thickness achieved by optical feedback. The etching is promoted by solvents including electron donor species, such as chloride ions. The method provides the ability to etch silicon nitride and other light absorbing materials, with fine spatial and etch rate control, in mild conditions, including in a biocompatible environment. The method can be used to create nanopores and nanopore arrays. | 2021-12-30 |
| 20210405534 | Dummy Insertion for Improving Throughput of Electron Beam Lithography - An electron beam lithography system and an electron beam lithography process are disclosed herein for improving throughput. An exemplary method for increasing throughput achieved by an electron beam lithography system includes receiving an integrated circuit (IC) design layout that includes a target pattern, wherein the electron beam lithography system implements a first exposure dose to form the target pattern on a workpiece based on the IC design layout. The method further includes inserting a dummy pattern into the IC design layout to increase a pattern density of the IC design layout to greater than or equal to a threshold pattern density, thereby generating a modified IC design layout. The electron beam lithography system implements a second exposure dose that is less than the first exposure dose to form the target pattern on the workpiece based on the modified IC design layout. | 2021-12-30 |
| 20210405535 | RESIST PATTERN FORMING METHOD AND SEMICONDUCTOR CHIP MANUFACTURING METHOD - An object of the present invention is to provide a resist pattern forming method that has excellent pattern forming properties and generates few residues and a semiconductor chip manufacturing method. The resist pattern forming method according to an embodiment of the present invention has a step A of forming a film on a substrate by using an actinic ray-sensitive or radiation-sensitive resin composition containing a photoacid generator and a resin whose polarity is increased by the action of an acid, a step B of exposing the film, step C of developing the exposed film by using an alkali developer, a step D of washing the developed film by using water, and a step E of washing the film washed in the step D by using a chemical liquid containing an alcohol-based solvent, in which the alkali developer contains a quaternary ammonium salt. | 2021-12-30 |
| 20210405536 | Non-Telecentric Light Guide Elements - The present disclosure relates to systems and methods relating to the fabrication of light guide elements. An example system includes an optical component configured to direct light emitted by a light source to illuminate a photoresist material at one or more desired angles so as to expose an angled structure in the photoresist material. The photoresist material overlays at least a portion of a first surface of a substrate. The optical component includes a container containing a light-coupling material that is selected based in part on the one or more desired angles. The system also includes a reflective surface arranged to reflect at least a first portion of the emitted light to illuminate the photoresist material at the one or more desired angles. | 2021-12-30 |
| 20210405537 | METHOD AND DEVICE FOR LITHOGRAPHICALLY PRODUCING A TARGET STRUCTURE ON A NON-PLANAR INITIAL STRUCTURE - Disclosed is a method for lithographically producing a target structure on a non-planar initial structure by exposing a photoresist by means of a lithography beam. In the inventive method, the topography of a surface of the non-planar initial structure is detected. A test parameter for the lithography beam is used and an interaction of the lithography beam with the initial structure and the resultant change in the lithography beam and/or the target structure to be produced are determined. A correction parameter for the lithography beam is determined such that the change in the lithography beam and/or the target structure to be produced that is caused by the interaction of the lithography beam with the initial structure is reduced. The desired target structure on the initial structure is produced by exposing the photoresist by means of the lithography beam using the correction parameter. | 2021-12-30 |
| 20210405538 | MODEL FOR CALCULATING A STOCHASTIC VARIATION IN AN ARBITRARY PATTERN - A method of determining a relationship between a stochastic variation of a characteristic of an aerial image or a resist image and one or more design variables, the method including: measuring values of the characteristic from a plurality of aerial images and/or resist images for each of a plurality of sets of values of the design variables; determining a value of the stochastic variation, for each of the plurality of sets of values of the design variables, from a distribution of the values of the characteristic for that set of values of the design variables; and determining the relationship by fitting one or more parameters from the values of the stochastic variation and the plurality of sets of values of the design variables. | 2021-12-30 |
| 20210405539 | A METHOD TO MANUFACTURE NANO RIDGES IN HARD CERAMIC COATINGS - A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed. | 2021-12-30 |
| 20210405540 | Performance Optimized Scanning Sequence for eBeam Metrology and Inspection - A metrology system may include a characterization tool configured to generate metrology data for a sample based on the interaction of an illumination beam with the sample, and may also include one or more adjustable measurement parameters to control the generation of metrology data. The metrology system may include one or more processors that may receive design data associated with a plurality of regions of interest for measurement, select individualized measurement parameters of the characterization tool for the plurality of regions of interest, and direct the characterization tool to characterize the plurality of regions of interest based on the individualized measurement parameters. | 2021-12-30 |
| 20210405541 | FORMATION OF THREE-DIMENSIONAL STRUCTURES USING GREY-SCALE PHOTOLITHOGRAPHY - Forming a three-dimensional structure includes applying photoresist on a layer and using a photolithography system to expose the photoresist. The photolithography system includes a photomask having a pattern thereon, where the pattern provides varying pattern density across a surface of the photomask and has a pitch that is less than a resolution of the photolithography system. The method includes subsequently developing the photoresist such that photoresist remaining on the layer has a three-dimensional profile defined by the photomask An isotropic etchant is used to etch the layer such that the three-dimensional profile of the photoresist is transferred to the layer. | 2021-12-30 |
| 20210405542 | COMPENSATION OF CREEP EFFECTS IN AN IMAGING DEVICE - An arrangement of a microlithographic optical imaging device includes first and second supporting structures. The first supporting structure supports at least one optical element of the imaging device via an active relative situation control device of a control device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another. Each supporting spring device defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device of the control device. The measuring device is connected to the relative situation control device. The measuring device outputs to the relative situation control device measurement information representative for the position and/or the orientation of the at least one optical element in relation to a reference in at least one degree of freedom in space. | 2021-12-30 |
| 20210405543 | COMPENSATION OF CREEP EFFECTS IN AN IMAGING DEVICE - An arrangement of a microlithographic optical imaging device includes first and second supporting structures. The first supporting structure supports an optical element of the imaging device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another between the first and second supporting structures. Each of the supporting spring devices defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device which measures the position and/or orientation of the at least one optical element in relation to a reference in at least one degree of freedom up to all six degrees of freedom in space. A reduction device reduces a change in a static relative situation between the first and second supporting structures in at least one correction degree of freedom. | 2021-12-30 |
| 20210405544 | METHOD FOR OBTAINING TRAINING DATA FOR TRAINING A MODEL OF A SEMICONDUCTOR MANUFACTURING PROCESS - A method for obtaining a training data set including synthetic metrology data, the training data set being configured for training of a model relating to a manufacturing process for manufacturing an integrated circuit. The method includes obtaining behavioral property data describing a behavior of a process parameter resultant from the manufacturing process and/or a related tool or effect. Additionally, or alternatively metrology data performed on a structure formed by the manufacturing process and/or a similar manufacturing process may be obtained. Using the behavioral property data and/or metrology data, synthetic metrology data is determined, which describes the effect of variations in the manufacturing process, and/or a related tool or effect on the process parameter. The model is trained using the training data set including the synthetic metrology data. | 2021-12-30 |
| 20210405545 | YIELD ESTIMATION AND CONTROL - A defect prediction method for a device manufacturing process involving production substrates processed by a lithographic apparatus, the method including training a classification model using a training set including measured or determined values of a process parameter associated with the production substrates processed by the device manufacturing process and an indication regarding existence of defects associated with the production substrates processed in the device manufacturing process under the values of the process parameter, and producing an output from the classification model that indicates a prediction of a defect for a substrate. | 2021-12-30 |
| 20210405546 | EXPOSURE APPARATUS AND METHOD OF MANUFACTURING ARTICLE - The present invention provides an exposure apparatus that exposes a substrate, comprising: an optical system configured to emit, in a first direction, light for exposing the substrate; a first supplier configured to supply a gas into a chamber where the optical system is arranged; and a second supplier configured to supply a gas to an optical path space where the light from the optical system passes through, wherein the second supplier includes a gas blower including a blowing port from which a gas is blown out in a second direction, and the guide member configured to guide the gas blown out from the blowing port to the optical path space, and the guide member includes a plate member extended on a side of the first direction of the blowing port so as to be arranged along the second direction. | 2021-12-30 |
| 20210405547 | SYSTEMS AND METHODS FOR GENERATING DROP PATTERNS - Devices, systems, and methods (a) receive a field material map that represents of a spatial distribution of a volume of a material over a rectangular region; (b) divide the rectangular region into two rectangular child regions along a division axis; (c) determine if the material volume in each rectangular child region is within a range of a specific volume; (d) for each rectangular child region that is not within the range of the specific volume, perform (b) for each rectangular child region as the rectangular region along a division axis that has been rotated by 90 degrees relative to the division axis that was used to generate the rectangular child region; (e) repeat (b)-(d) until all rectangular child regions meet the criteria in (c); and (f) output a drop pattern that includes one or more drop locations inside each rectangular child region that meets the criteria in (c). | 2021-12-30 |
| 20210405548 | ELECTROPHOTOGRAPHIC PHOTOCONDUCTOR, PROCESS CARTRIDGE, AND IMAGE FORMING APPARATUS - An electrophotographic photoconductor includes: a conductive substrate; and a single-layer-type photoconductive layer that is provided on the conductive substrate and contains a binder resin, a charge generating material, a hole transporting material, and an electron transporting material, in which a volume resistivity of the photoconductive layer after wear is 5.0×10 | 2021-12-30 |
| 20210405549 | TONER - A toner comprising a toner particle comprising a resin A, and an external additive A, wherein the resin A is a resin represented by formula (1) below, the resin A is present at the surface of the toner particle, the external additive A is a fine particle containing silicon, the average value of the shape factor SF-1 of the external additive A is from 105 to 120, the average value of the shape factor SF-2 of the external additive A is from 100 to 130. | 2021-12-30 |
| 20210405550 | Developing Cartridge Having Electrode - A developing cartridge includes a casing, a rotating member, and an electrode member. The casing may be configured to accommodate therein developer. The rotating member has a rotational shaft extending in an axial direction. The rotating member is configured to rotate about the rotational shaft and carries the developer thereon. The electrode member is configured to be electrically connected to the rotating member. The electrode member covers at least part of the rotational shaft from an orthogonal direction orthogonal to the axial direction and is arranged to confront the casing in the axial direction. The electrode member is configured to move in the orthogonal direction in accordance with a movement in the axial direction. | 2021-12-30 |
| 20210405551 | DEVELOPING CARTRIDGE INCLUDING COUPLING AND CLUTCH FOR ALLOWING ROTATION OF COUPLING IN FIRST DIRECTION AND STOPPING ROTATION OF COUPLING IN SECOND DIRECTION - A developing cartridge includes: a developing roller; a coupling for rotating the developing roller; a shaft; and a clutch. The developing roller is rotatable about a first axis extending in an axial direction. The coupling is rotatable about a second axis extending in the axial direction. The shaft rotatably supports the coupling. The clutch is rotatable together with the coupling about the shaft in a case where the coupling rotates in a first rotational direction. In a case where the coupling rotates in a second rotational direction opposite to the first rotational direction, the clutch engages with a portion of the shaft and the clutch and the coupling do not rotate. | 2021-12-30 |
| 20210405552 | IMAGE FORMING APPARATUS AND IMAGE FORMING SYSTEM - An apparatus includes an image bearing member, a developer container having a replenishment port, a developer bearing member, a detection portion configured to output remainder amount information corresponding to the amount of developer accommodated in the developer container, a notification portion capable of notifying a first state, and a second state, and a control portion, wherein the maximum amount of the developer that the developer container is capable of accommodating is larger than a value obtained by adding the amount of the developer accommodated in a replenishment container containing the developer for replenishment to the first amount, and wherein notification of the second state corresponds to notification of a case where the amount of the developer remaining in the developer container is larger than a case where the amount of the developer remaining in the developer container is the smallest. | 2021-12-30 |
| 20210405553 | NOZZLE RECEIVER FOR USE WITH A TONER CONTAINER - A powder conveying device includes: a conveying nozzle, provided with a powder receiving opening; an open/close member to open/close the powder receiving opening; a flange provided to the open/close member; a biasing member to bias the open/close member; and a container setting section to which a part of a powder container is to be fit. The powder container includes: a conveyor to convey the powder from a second end of the powder container to a first end; a container opening protruding from the first end; a nozzle receiving opening into which the conveying nozzle is to be inserted; and a butting portion provided in the container opening, to butt against the flange. When the powder container is attached to the powder conveying device, the container opening is fitted to the container setting section, and the flange and the biasing member are housed in an inner space of the container opening. | 2021-12-30 |
| 20210405554 | IMAGE FORMING APPARATUS INCLUDING DRUM CARTRIDGE HAVING CUSHION MEMBER POSITIONED BETWEEN DEVELOPING CASING AND DEVELOPING SHUTTER - An image forming apparatus includes: a main casing; a toner cartridge including a toner casing having a toner outlet for discharging toner in the toner cartridge and a toner shutter for opening and closing the toner outlet; a drum cartridge including a photosensitive drum and a developing unit including a developing casing having a toner inlet for receiving the toner from the toner cartridge, a developing shutter for opening and closing the toner inlet, and a cushion member positioned between the developing casing and the developing shutter. When the developing casing is moved relative to the photosensitive drum while the drum cartridge and the toner cartridge are attached to the main casing, the developing shutter opens the toner inlet, and the toner shutter opens the toner outlet, the cushion member allows movement of the developing casing relative to the developing shutter while the developing shutter engages with the toner cartridge. | 2021-12-30 |
| 20210405555 | IMAGE FORMING APPARATUS - An image forming apparatus includes a developer container to and from which the replenishment container is attachable and detachable and which includes an accommodating portion that accommodates developer and a replenishment port, an agitation, an opening/closing member configured to be movable between a closed position and an open position, a drive source for driving the agitation member, and a control portion configured to control the drive source, wherein the apparatus is configured such that image formation is not possible when the opening/closing member is at the open position, and the agitation member is capable of driving in a case where the opening/closing member is at the open position. | 2021-12-30 |
| 20210405556 | IMAGE FORMING APPARATUS - A cancellation operation of a fixing nip and movement of a transfer roller are interlocked with each other. In the image forming apparatus, at least a first state in which the relative position is arranged at a fixing position and the transfer roller is arranged at a transfer position, a second state in which the relative position is arranged at a transfer nip cancellation position and the transfer roller is arranged at a transfer nip cancellation position, and a third state in which the relative position is arranged at a fixing nip cancellation position and the transfer roller is arranged at one of an intermediate position between the transfer position and the transfer nip cancellation position and the transfer position may be taken as a combination state of the relative position between the fixing roller and the facing member and the position of the transfer roller. | 2021-12-30 |
| 20210405557 | IMAGE FORMING APPARATUS - An image forming apparatus includes an image bearing member that bears a toner image, a transfer unit having an endless belt, a positioning unit that positions the transfer unit, and a secondary transfer member. The secondary transfer member is in touch with the endless belt to form a secondary transfer portion. When the toner image is transferred to the endless belt from the image bearing member, the secondary transfer member transfers the toner image from the endless belt at the secondary transfer portion to a transfer material. The positioning unit includes a first abutting face to position the transfer unit in a conveyance direction and a second abutting face to position the transfer unit in a direction opposite to the conveyance direction. An attaching/detaching direction of the transfer unit is a direction intersecting with a surface of the transfer material to which the toner image is transferred. | 2021-12-30 |
| 20210405558 | FIXING UNIT AND IMAGE FORMING APPARATUS - A fixing unit includes a film including a tubular shape and configured to rotate, a heater arranged inside the film and including a heating resistor configured to generate heat by passing alternating current therethrough and an insulator configured to cover the heating resistor, a sliding member arranged between the heater and the film and configured to be in sliding contact with an inner surface of the film, the sliding member having electric conductivity, a pressing member configured to be in pressure contact with the sliding member across the film to form a nip portion between the sliding member and the pressing member, and a conductive member electrically connected to a ground potential via at least one impedance element. The sliding member is electrically connected to the conductive member. | 2021-12-30 |
| 20210405559 | FIXING APPARATUS - A fixing apparatus included a rotatable belt, a rotatable pressurizing member, a steering roller, a contact portion, a detected portion, a sensor, and a guiding portion. The contact portion comes into contact with an end portion, in the width direction, of the belt. A position of the detected portion is changed on a basis of a position of the contact portion. The sensor detects the position of the detected portion. An inclination of the steering roller is controlled on a basis of a detection result of the sensor. The guiding portion is provided by connecting with the contact portion. The lubricant is guided from the contact portion to the guiding portion. The guiding portion is provided in a region below the contact portion in a vertical direction, inside of the belt, and overlapped with the belt in the width direction. | 2021-12-30 |
| 20210405560 | FIXING BELT AND FIXING DEVICE - A fixing belt and a fixing device suppress charging of the fixing belt and permit securing of a withstand voltage of secondary parts of the fixing belt are provided in addition to a heater. The fixing belt is formed of a tubular endless fixing film including, in order from an inner peripheral side of the film, abase layer, an elastic layer, and a release layer. A surface resistivity of the fixing belt measured from the base layer side is 7 [LOG Ω/sq.] or more and 10 [LOG Ω/sq.] or less. | 2021-12-30 |
| 20210405561 | HEATING UNIT, FIXING UNIT, AND IMAGE FORMING APPARATUS - A heating unit includes a board including metal, an insulating layer including insulating material and formed on a surface of the board, a heating element disposed on the insulating layer to generate heat by passing an electric current through the heating element, and a conductive portion electrically connecting the heating element and the board to each other. The heating unit further includes a first power supplying electrode electrically connected to the heating element and a second power supplying electrode electrically connected to the board. The heating element, the conductive portion and the board constitute an electric circuit between the first power supplying electrode and the second power supplying electrode. The heating element generates the heat in a case where the first power supplying electrode and the second power supplying electrode are electrically connected to a power source and the electric current is passed through the electric circuit. | 2021-12-30 |
| 20210405562 | IMAGE FORMING APPARATUS AND METHOD OF DETECTING RISE OF RECORDING MEDIUM - An image forming apparatus includes a reading table, an image reading device, an image forming device with an exposure device, and circuitry. The reading device reads a pattern on a recording medium on the table, and generates image data of the pattern. The exposure device includes a light emitting element to form an electrostatic latent image, based on which the image forming device forms the pattern. Based on first and second correction values, the circuitry calculates a third correction value to correct a light amount of the light emitting element. The exposure device includes a driving device that drives the light emitting element based on the third correction value. The circuitry sets at least two or more determination areas in each of a white area and a pattern area of the medium, and determines whether the medium has a rise based on density data in the determination areas. | 2021-12-30 |
| 20210405563 | POWER SUPPLY DEVICE AND IMAGE FORMING APPARATUS - A power supply device includes a first circuit and a second circuit. The first circuit includes an adjustment unit, a detection unit, a processing unit including a conversion unit, a first communication unit, and a power storage unit. The second circuit includes a second communication unit performing wireless communication with the first communication unit, and a control unit outputting a carrier wave used in the wireless communication. After outputting the carrier wave during a first period, the control unit stops output of the carrier wave during a second period. During the second period, the conversion unit operates on the power stored in the power storage unit. The control unit outputs the carrier wave during a third period after the second period. During the third period, the processing unit transmits information about a conversion result. The control unit controls the adjustment unit based on the transmitted information. | 2021-12-30 |
| 20210405564 | Image Forming Apparatus, Image Forming Method, and Image Forming Program - There is provided an image forming apparatus in which an image carrier and an elastic body may be in pressure contact with each other, and in which a toner remover may be in contact with the image carrier to remove toner remaining on the image carrier. The image forming apparatus may include: a first hardware processor that forms an image pattern in a region including at least a part of a pressure contact part of the image carrier that is in pressure contact with the elastic body when operation of the image carrier is stopped; a second hardware processor that acquires density of the image pattern formed on the image carrier; a third hardware processor that adjusts driving time of the image carrier based on the density of the image pattern; and a fourth hardware processor that drives the image carrier for the driving time. | 2021-12-30 |
| 20210405565 | IMAGE FORMATION APPARATUS AND CONTROL METHOD THEREFOR - An image formation apparatus includes: an image former that forms an image on a recording medium delivered along a predetermined delivery path and outputs the recording medium; a first hardware processor that judges whether or not the recording medium is an envelope; a second hardware processor that acquires a basis weight of the recording medium; a third hardware processor that determines control for when an image is formed on the recording medium on the basis of a judgment result from the first hardware processor and a basis weight acquired by the second hardware processor; and a fourth hardware processor that controls operation of the image former on the basis of a determination result from the third hardware processor. | 2021-12-30 |
| 20210405566 | RECORDING MATERIAL DETERMINATION DEVICE THAT DETERMINES TYPE OF RECORDING MATERIAL, AND IMAGE FORMING APPARATUS - A recording material determination device includes a transmission unit, a drive unit, a reception unit, and a control unit. The drive unit outputs a drive signal for transmitting an ultrasonic wave from the transmission unit to the reception unit. The control unit determines a type of a recording material, based on a first value of the ultrasonic wave through the recording material received by the reception unit in a first mode for outputting a first number of drive signals from the drive unit in a first period, and a second value of the ultrasonic wave through the recording material received by the reception unit in a second mode for outputting a second number of drive signals from the drive unit in a second period. The second number of drive signals is greater than the first number of drive signals. | 2021-12-30 |
| 20210405567 | IMAGE FORMING APPARATUS - An image forming apparatus includes a control unit configured to perform a first mode, a second mode, and a third mode. The first mode is a mode in which a sheet conveyance unit is controlled so that an arrival time from a passage of a trailing edge of a preceding sheet through a nip portion to an arrival of a leading edge of a succeeding sheet succeeding to the preceding sheet at the nip portion becomes a first time. The second mode is a mode in which the sheet conveyance unit is controlled so that the arrival time becomes a second time. The third mode is a mode in which the sheet conveyance unit is controlled so that the arrival time becomes a third time. The second time is longer than the first time, and The third time is longer than the second time. | 2021-12-30 |
| 20210405568 | Operation Status Prediction System, Defect Occurrence Prediction System, Image Forming System, and Operation Status Prediction Method - An operation status prediction system includes a hardware processor. The hardware processor acquires data, which is relevant to an operation status at each timing of an operation device to be monitored, so as to be associated with information of the timing. The hardware processor predicts a future operation status according to the acquired operation status for each of a plurality of periods having different lengths from the present. | 2021-12-30 |
| 20210405569 | SHEET PROCESSING APPARATUS AND IMAGE FORMING APPARATUS HAVING THE SAME - A sheet binding processing apparatus includes a conveying portion, a conveying path for sheets, a stacking portion on which sheets from the conveying path are stacked, a first regulating portion for regulating a sheet bundle on the stacking portion in a crossing direction, a second regulating portion for regulating a sheet bundle in the conveying direction, a manual setting portion for setting sheets from an outside of the apparatus, and a binding device which binds a sheet bundle by a staple and moves in the crossing direction. An angular posture of the binding device located at a third position is different from an angular posture located at a first position. An angular posture of the binding device located at the third position is different from an angular posture located at a second position. The second position is located at a second side of the first position. | 2021-12-30 |
| 20210405570 | Image Forming Apparatus - An image forming apparatus forms an image on a recording material by using toner containing a release agent, and includes: a fixer that fixes, on the recording material, a toner image formed on the recording material; a reverse transport path that is arranged on a downstream side of the fixer in a recording material transport direction and reverses and transports the recording material after fixing; a reverse roller that is provided on the reverse transport path and reverses and sends out the recording material by reversely transporting the recording material; a transporter that is provided between the fixer and the reverse roller on the reverse transport path; and a release agent remover that removes the release agent adhering to the reverse roller, wherein the transporter includes a release agent adhesion preventer that prevents the release agent from adhering to the transporter. | 2021-12-30 |
| 20210405571 | SHEET LAMINATOR, IMAGE FORMING APPARATUS, AND IMAGE FORMING SYSTEM - A sheet laminator includes a sheet separation device, a sheet insertion device, and circuitry. The sheet separation device is configured to perform a sheet separating operation to separate a non-bonding portion of a two-ply sheet in which two sheets are overlapped and bonded together at a bonding portion of the two-ply sheet, and a sheet inserting operation to insert an inner sheet between the two sheets. The sheet lamination device is configured to perform a sheet laminating operation on the two-ply sheet after the sheet separating operation and the sheet inserting operation. The circuitry is configured to cause the sheet lamination device to perform the sheet laminating operation on the two-ply sheet while causing the sheet separation device to perform the sheet separating operation on another two-ply sheet subsequent to the two-ply sheet or the sheet separating operation and the sheet inserting operation on said another two-ply sheet. | 2021-12-30 |
| 20210405572 | IMAGE FORMING APPARATUS - An image forming apparatus according to the present invention includes an optical box, a housing having a discharge opening, a cover provided downstream of the optical box in a discharge direction in which a recording material is discharged through the discharge opening and forming a part of the housing, and a circuit board, wherein the circuit board includes a plurality of electronic components and a wiring board configured to electrically connect the plurality of electronic components, the circuit board is disposed in such a direction that a surface of the wiring board on which the plurality of electronic components is mounted intersects the discharge direction, and the wiring board is provided between the cover and the optical box in the discharge direction, and wherein, when viewed in a vertical direction, the optical box and the plurality of electronic components partially overlap each other. | 2021-12-30 |
