52nd week of 2020 patent applcation highlights part 61 |
Patent application number | Title | Published |
20200402902 | CONNECTION OF SEVERAL CIRCUITS OF AN ELECTRONIC CHIP - An electronic chip disclosed herein includes a plurality of IP core circuits, with a shared strip that is at least partially conductive and is linked to a node for applying a fixed potential. A plurality of tracks electrically links the plurality of IP core circuits to the shared strip. Each individual track of the plurality of tracks solely links a single one of said IP core circuits to the shared strip. | 2020-12-24 |
20200402903 | CIRCUIT ASSEMBLY - A circuit assembly includes an integrated circuit (IC) die and a first capacitor die. The IC die provides an IC and includes a plurality of first conductive pads. The first capacitor die provides a plurality of capacitors, and includes a plurality of second conductive pads at the first side and a plurality of conductive vias at the second side. At least one of the second conductive pads electrically connects to the capacitors. The conductive vias is adapted to form a plurality of external signal connections of the IC die and the first capacitor die. The IC die is stacked with the first capacitor die in such a way that the first conductive pads electrically connect to the second conductive pads, and surfaces of the IC die and the first capacitor die attaching to each other are substantially of the same size. | 2020-12-24 |
20200402904 | ENERGY STORING INTERPOSER DEVICE AND MANUFACTURING METHOD - An interposer device comprising a first conductor pattern on a first side defining a portion of the interposer device to be covered by a first electrical circuit element; and a second conductor pattern on a second side to be connected to a second electrical circuit element. The second conductor pattern is electrically coupled to the first conductor pattern. The interposer device further comprises a plurality of nanostructure energy storage devices arranged within the portion of the interposer device to be covered by the first electrical circuit element. Each of the nanostructure energy storage devices comprises at least a first plurality of conductive nanostructures; a conduction controlling material embedding the nanostructures; a first electrode connected to each nanostructure in the first plurality of nanostructures; and a second electrode separated from each nanostructure in the first plurality of nanostructures by the conduction controlling material. | 2020-12-24 |
20200402905 | THREE-DIMENSIONAL MEMORY DEVICE CONTAINING THROUGH-ARRAY CONTACT VIA STRUCTURES BETWEEN DIELECTRIC BARRIER WALLS AND METHODS OF MAKING THE SAME - An alternating layer stack of insulating layers and sacrificial material layers is formed over a semiconductor substrate, and memory stack structures are formed through the vertically-alternating layer stack. A pair of unconnected barrier trenches or a moat trench is formed through the alternating stack concurrently with formation of backside trenches. Backside recesses are formed by isotropically etching the sacrificial material layers selective to the insulating layers while a dielectric liner covers the barrier trenches or the moat trench. A vertically alternating sequence of the insulating plates and the dielectric spacer plates is provided between the pair of barrier trenches or inside the moat trench. Electrically conductive layers are formed in the backside recesses. A first conductive via structure is formed through the vertically alternating sequence concurrently with formation of a second conductive via structure through a dielectric material portion adjacent to the alternating stack. | 2020-12-24 |
20200402906 | SEMICONDUCTOR DEVICE HAVING A STACKED STRUCTURE - A semiconductor device includes a substrate having a cell array region and a pad region, a stack structure including gate electrodes and mold insulating layers alternately stacked on the substrate and having a staircase shape in the pad region, first separation regions penetrating the stack structure in the pad region, extending in a first direction, and including first and second dummy insulating layers, the first dummy insulating layers covering side walls of the first separation regions and including horizontal portions covering portions of the gate electrodes, and the second dummy insulating layers disposed between the first dummy insulating layers, extending portions extending towards the mold insulating layers from the first dummy insulating layers in a second direction perpendicular to the first direction, second separation regions dividing the stack structure and extending in the first direction, and cell contact plugs penetrating the horizontal portions and connected to the gate electrodes. | 2020-12-24 |
20200402907 | BEOL ELECTRICAL FUSE AND METHOD OF FORMING THE SAME - An electrode structure is located at least partially in a via opening having a small feature size and containing a fuse element which is composed of a fuse element-containing seed layer that is subjected to a reflow anneal. The electrode structure is composed of a material having a higher electromigration (EM) resistance than the material that provides the fuse element. Prior to programming, the fuse element is present along sidewalls and a bottom wall of the electrode structure. After programming, a void is formed in the fuse element along at least one sidewall of the electrode structure and the resistance of the device will increase sharply. | 2020-12-24 |
20200402908 | ELECTRICALLY PROGRAMMABLE FUSE STRUCTURE AND SEMICONDUCTOR DEVICE - An electrically programmable fuse structure and a semiconductor device are disclosed. The electrically programmable fuse structure comprises a cathode, a fuse link and an anode, the fuse link connecting the cathode to the anode, the cathode connected to the fuse link at a junction, wherein the cathode comprises a plurality of conductive branches arranged to form a converging side and a diverging side, and the converging side of the cathode is connected to the junction so as to be connected to the fuse link. | 2020-12-24 |
20200402909 | INTEGRATED CIRCUIT WITH BURIED POWER RAIL AND METHODS OF MANUFACTURING THE SAME - A method of manufacturing an integrated circuit having buried power rails includes forming a first dielectric layer on an upper surface of a first semiconductor substrate, forming a series of power rail trenches in an upper surface of the first dielectric layer, forming the buried power rails in the series of power rail trenches, forming a second dielectric layer on the upper surface of the first dielectric layer and upper surfaces of the buried power rails, forming a third dielectric layer on a donor wafer, bonding the third dielectric layer to the second dielectric layer, and forming a series of semiconductor devices, vias, and metal interconnects on or in the donor wafer. The buried power rails are encapsulated by the first dielectric layer and the second dielectric layer, and the buried power rails are below the plurality of semiconductor devices. | 2020-12-24 |
20200402910 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A semiconductor device that is miniaturized and highly integrated is provided. One embodiment of the present invention is a semiconductor device including a first insulator, a second insulator, a first conductor, a second conductor, and a semiconductor layer; the first insulator includes an opening exposing the semiconductor layer; the first conductor is provided in contact with the semiconductor layer at a bottom of the opening; the second insulator is provided in contact with a top surface of the first conductor and a side surface in the opening; the second conductor is provided in contact with the top surface of the first conductor and in the opening with the second insulator therebetween; and the second insulator has a barrier property against oxygen. | 2020-12-24 |
20200402911 | SEMICONDUCTOR DEVICE PACKAGE - A semiconductor device package includes a first substrate, a second substrate disposed over the first substrate, and a surface mount device (SMD) component disposed between the first substrate and the second substrate. The SMD component includes a plurality of connection electrodes electrically connecting the first substrate to the second substrate, and the plurality of connection electrodes are electrically disconnected from each other. | 2020-12-24 |
20200402912 | FINS FOR ENHANCED DIE COMMUNICATION - Semiconductor structures are provided in which a first chip on a substrate has at least one first protruding section, the first protruding section including first interconnect locations, a second chip on the substrate having at least one second protruding section, the second protruding section including second interconnect locations and the first chip and the second chip are arranged such that the first protruding section is interdigitated with the second protruding section. | 2020-12-24 |
20200402913 | CONNECTING MULTIPLE CHIPS USING AN INTERCONNECT DEVICE - Techniques are disclosed herein for connecting multiple chips using an interconnect device. In some configurations, one or more interconnect areas on a chip can be located adjacent to each other such that at least a portion of an edge of a first interconnect area is located adjacent to an edge of a second interconnect area. For example, an interconnect area can be located at a corner of a chip such that one or more edges of the interconnect area lines up with one or more edges of an interconnect area of another chip. The chip including at least one interconnect area can also be positioned and directly bonded to the interconnect device using other layouts, such as but not limited to a pinwheel layout. In some configurations more than one interconnect area can be included on a chip. | 2020-12-24 |
20200402914 | METHOD FOR FORMING SEMICONDUCTOR DEVICE STRUCTURE WITH CONDUCTIVE LINE - A method for forming a semiconductor device structure is provided. The method includes forming a first mask layer over a dielectric layer. The first mask layer has a first trench, and the first trench has a first inner wall and a bottom surface. The method includes forming an anti-bombardment layer over a first top surface of the first mask layer. The method includes forming a second mask layer over the first inner wall of the first trench. The method includes removing the first portion, the first mask layer, the anti-bombardment layer, and the second mask layer to form a third trench in the dielectric layer. The method includes forming a conductive structure in the third trench. | 2020-12-24 |
20200402915 | SEMICONDUCTOR PACKAGE - A semiconductor package includes: a substrate; a semiconductor chip disposed on a first surface of the substrate; solder bumps disposed between a first surface of the semiconductor chip and the substrate; and a redistribution layer provided on a second surface, opposite to the first surface, of the semiconductor chip. The substrate includes substrate patterns, and the substrate patterns cover a second surface of the substrate. The substrate patterns cover 60% to 100% of a total area of the second surface of the substrate. | 2020-12-24 |
20200402916 | SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME - A method of forming a semiconductor device, comprising: forming a first conductive layer on an active device of a substrate; forming a dielectric layer on the first conductive layer; forming a through hole passing through the dielectric layer to expose a portion of the first conductive layer; conformally depositing a glue layer in the through hole to cover the portion of the first conductive layer comprising: forming a plurality of isolated lattices in an amorphous region at which the isolated lattices are uniformly distributed and extend from a top surface of the glue layer and terminate prior to reach a bottom of the glue layer, wherein the glue layer has a predetermined thickness; depositing a conductive material on the glue layer within the through hole, thereby forming a contact via; and forming a second conductive layer on the contact via over the first conductive layer. | 2020-12-24 |
20200402917 | INTEGRATED CIRCUIT STRUCTURE - Disclosed herein are IC structures, packages, and devices that include recesses processed via selective growth. An example integrated circuit (IC) structure, includes a first dielectric material, a second dielectric material on the first dielectric material, and a recess in the second dielectric material, wherein the recess includes a bottom, a top, and sidewalls. The IC further includes a first material within the recess and at a bottom of the recess, wherein the first material includes a metal and oxygen, a self-assembled monolayer (SAM) material, or an organic material, and a second material within the recess and between the first material and the top of the recess, wherein the second material is in contact with the sidewalls of the recess. | 2020-12-24 |
20200402918 | Integrated Circuit Saw Bow Break Point - A saw bow is provided and designed such that the conductors of the saw bow will break at a predictable location when using modern dicing techniques. This results in a break in the circuit provided by the saw bow, with any exposed conductors not being on the die side. Further, by providing a known breaking point in the saw bow, modern dicing techniques such as plasma dicing can be used, thereby allowing for the saw lane to be made narrower, which will in turn increase the number of wafers that can be included on a wafer. | 2020-12-24 |
20200402919 | SEMICONDUCTOR DEVICES WITH SHIELD - A semiconductor device includes a lead frame, an electronic device, a package body, and a first shield plate. The lead frame includes a die mount structure, signal leads, a first shield lead, a second shield lead, and a first shield mount that spans the first and second shield leads. The electronic device can be mounted to the die mount structure and can be coupled to the signal leads. The package body encapsulates the electronic device and the lead frame such that (i) each of the first shield lead, the second shield lead, and the signal leads includes an external portion that extends beyond the exterior surface of the package body, and (ii) the first shield mount extends beyond the exterior surface of the package body. The first shield plate can be coupled to the first shield mount. | 2020-12-24 |
20200402920 | MULTI-PACKAGE ASSEMBLIES HAVING FOAM STRUCTURES FOR WARPAGE CONTROL - An integrated circuit package may be formed comprising a substrate that includes a mold material layer and a signal routing layer, wherein the mold material layer comprises at least one bridge and at least one foam structure embedded in a mold material. In one embodiment, the substrate may include the mold material of the mold material layer filling at least a portion of cells within the foam structure. In a further embodiment, at least two integrated circuit devices may be attached to the substrate, such that the bridge provides device-to-device interconnection between the at least two integrated circuit devices. In a further embodiment, the integrated circuit package may be electrically attached to an electronic board. | 2020-12-24 |
20200402921 | METHODS OF FORMING SUBSTRATE INTERCONNECT STRUCTURES FOR ENHANCED THIN SEED CONDUCTION - Methods/structures of forming substrate tap structures are described. Those methods/structures may include forming a plurality of conductive interconnect structures on an epitaxial layer disposed on a substrate, wherein individual ones of the plurality of conductive interconnect structures are adjacent each other, forming a portion of a seed layer on at least one of the plurality of conductive interconnect structures, and forming a conductive trace on the seed layer. | 2020-12-24 |
20200402922 | COMPOUND SEMICONDUCTOR SUBSTRATE - A compound semiconductor substrate in which the warpage can easily be controlled is provided. The compound semiconductor substrate comprises a SiC (silicon carbide) layer, an AlN (aluminum nitride) buffer layer formed on the SiC layer, and a lower composite layer formed on the AlN buffer layer, and an upper composite layer formed on the lower composite layer. The lower composite layer includes a plurality of lower Al (aluminum) nitride semiconductor layers vertically stacked and a lower GaN (gallium nitride) layer formed between the plurality of lower Al nitride semiconductor layers. The upper composite layer includes a plurality of upper GaN layers stacked vertically and an Al nitride semiconductor layer formed between the plurality of upper GaN layers. | 2020-12-24 |
20200402923 | VERTICAL MEMORY DEVICES - A vertical memory device including: a circuit pattern on a first substrate; an insulating interlayer on the first substrate, the insulating interlayer covering the circuit pattern; a bending prevention layer on the insulating interlayer, the bending prevention layer extending in a first direction substantially parallel to an upper surface of the first substrate; a second substrate on the bending prevention layer; gate electrodes spaced apart from each other in a second direction on the second substrate, the second direction being substantially perpendicular to the upper surface of the first substrate; and a channel extending through the gate electrodes in the second direction. | 2020-12-24 |
20200402924 | SEMICONDUCTOR STRUCTURE - A semiconductor structure includes a substrate, a MIM capacitor disposed over the substrate, a first insulating layer disposed over the MIM capacitor, an ONON stack disposed over the first insulating layer, a connecting via disposed in the first insulating layer, and a connecting pad disposed in the ONON stack and in contact with the connecting via. The ONON stack covers sidewalls of the connecting pad and a portion of a top surface of the connecting pad. The ONON stack includes a first silicon oxide layer, a first silicon nitride layer, a second silicon oxide layer and a second silicon nitride layer upwardly disposed over the first insulating layer. A thickness of the second silicon nitride layer is greater than a thickness of the second silicon oxide layer and greater than a thickness of the first silicon nitride layer. | 2020-12-24 |
20200402925 | SEMICONDUCTOR DEVICES HAVING CRACK-INHIBITING STRUCTURES - Semiconductor devices having metallization structures including crack-inhibiting structures, and associated systems and methods, are disclosed herein. In one embodiment, a semiconductor device includes a metallization structure formed over a semiconductor substrate. The metallization structure can include a bond pad electrically coupled to the semiconductor substrate via one or more layers of conductive material, and an insulating material—such as a low-κ dielectric material—at least partially around the conductive material. The metallization structure can further include a crack-inhibiting structure positioned beneath the bond pad between the bond pad and the semiconductor substrate. The crack-inhibiting structure can include a barrier member extending vertically from the bond pad toward the semiconductor substrate and configured to inhibit crack propagation through the insulating material. | 2020-12-24 |
20200402926 | Thermal Interface Material Having Different Thicknesses in Packages - A package includes a package component, a device die over and bonded to the package component, a metal cap having a top portion over the device die, and a thermal interface material between and contacting the device die and the metal cap. The thermal interface material includes a first portion directly over an inner portion of the device die, and a second portion extending directly over a corner region of the device die. The first portion has a first thickness. The second portion has a second thickness greater than the first thickness. | 2020-12-24 |
20200402927 | SEMICONDUCTOR PACKAGE AND MANUFACTURING METHOD THEREOF - A manufacturing method of a semiconductor package includes at least the following steps. A rear surface of a semiconductor die is attached to a patterned dielectric layer of a first redistribution structure through a die attach material, where a thickness of a portion of the die attach material filling a gap between the rear surface of the semiconductor die and a recessed area of the patterned dielectric layer is greater than a thickness of another portion of the die attach material interposed between the rear surface of the semiconductor die and a non-recessed area of the patterned dielectric layer. An insulating encapsulant is formed on the patterned dielectric layer of the first redistribution structure to cover the semiconductor die and the die attach material. Other methods for forming a semiconductor package are also provided. | 2020-12-24 |
20200402928 | INTEGRATED CIRCUIT CONTAINING A DECOY STRUCTURE - An integrated circuit includes a substrate, an interconnection part, and an isolating region located between the substrate and the interconnection part. A decoy structure is located within the isolating region and includes a silicided sector which is electrically isolated from the substrate. | 2020-12-24 |
20200402929 | Fully Digital Glitch Detection Mechanism with Process and Temperature Compensation - A fully digital method and apparatus are provided for detecting glitches on a monitored line by providing a toggle signal to an initial delay circuit and a plurality of delay elements formed with standard logic cells so that logic values from the delay elements are captured in a corresponding plurality of clocked capture flops to provide a digitized representation of a delay value during a sampling period which is converted to a numerical measurement result which is evaluated against a reference value to generate an output error signal if a difference between the numerical measurement result and reference value exceeds a programmable margin, where the initial delay circuit is configured with a trim setting to impose an initial delay to compensate for process variations and where the reference value is adapted over a plurality of sampling periods to compensate for temperature effects on the numerical measurement result. | 2020-12-24 |
20200402930 | INTEGRATED CIRCUIT - An integrated circuit having a node that is supplied by a first supply potential and is connected to a second supply potential in such a way that a leakage current flows between the node and the second supply potential, a detection circuit that is configured to detect a signal injected between the node and the second supply potential, the temporal variation of which is fast compared to a temporal variation of the leakage current, and a compensation circuit that is configured to compensate for a deviation in the potential of the node from the first supply potential with a delay which is large compared to the temporal variation of the signal. | 2020-12-24 |
20200402931 | SEMICONDUCTOR PACKAGE - A semiconductor package includes a substrate, an electronic component, a dielectric layer a transmitting antenna, a receiving antenna and a FSS (Frequency selective surface) antenna. The electronic component is disposed on and electrically connected with the substrate. The dielectric layer has a dielectric upper surface. The transmitting antenna and the receiving antenna are formed adjacent to the substrate. The FSS antenna is formed adjacent to the dielectric upper surface of the dielectric layer. The FSS antenna is separated from the substrate by the dielectric layer in a wireless signal emitting direction. | 2020-12-24 |
20200402932 | SEMICONDUCTOR ELEMENT AND POWER AMPLIFICATION DEVICE - A semiconductor element includes a semiconductor substrate, first and second amplifiers provided on the semiconductor substrate and adjacently provided in a first direction, a first reference potential bump provided on a main surface of the semiconductor substrate, and connecting the first amplifier and a reference potential, a second reference potential bump provided on the main surface, being adjacent to the first reference potential bump in the first direction, and connecting the second amplifier and a reference potential, and a rectangular bump provided on the main surface, provided between the first and second reference potential bumps in a plan view, and formed such that a second width in a second direction orthogonal to the first direction is larger than a first width in the first direction. The second width is larger than a width of at least one of the first and second reference potential bumps in the second direction. | 2020-12-24 |
20200402933 | PACKAGED TRANSISTOR DEVICES WITH INPUT-OUTPUT ISOLATION AND METHODS OF FORMING PACKAGED TRANSISTOR DEVICES WITH INPUT-OUTPUT ISOLATION - Packaged transistor devices are provided that include a transistor on a base of the packaged transistor device, the transistor comprising a control terminal and an output terminal, a first bond wire electrically coupled between an input lead and the control terminal of the transistor, a second bond wire electrically coupled between an output lead and the output terminal of the transistor, and an isolation material that is and physically between the first bond wire and the second bond wire, wherein the isolation material is configured to reduce a coupling between the first bond wire and the second bond wire. | 2020-12-24 |
20200402934 | EMBEDDED THIN-FILM MAGNETIC INDUCTOR DESIGN FOR INTEGRATED VOLTAGE REGULATOR (IVR) APPLICATIONS - A package including a package substrate; an interposer electrically coupled to the package substrate and including a metal layer; a die including an integrated voltage regulator and electrically coupled to the interposer by solder features; and an inductor formed by a magnetic material disposed between two of the solder features electrically coupled to each other by a portion of the metal layer of the interposer, the inductor electrically coupled to the integrated voltage regulator. | 2020-12-24 |
20200402935 | SEMICONDUCTOR DEVICES AND SEMICONDUCTOR PACKAGES INCLUDING THE SAME - Semiconductor devices are provided. A semiconductor device includes an insulating layer and a conductive element in the insulating layer. The semiconductor device includes a first barrier pattern in contact with a surface of the conductive element and a surface of the insulating layer. The semiconductor device includes a second barrier pattern on the first barrier pattern. Moreover, the semiconductor device includes a metal pattern on the second barrier pattern. Related semiconductor packages are also provided. | 2020-12-24 |
20200402936 | SEMICONDUCTOR PACKAGE - A semiconductor package includes a first substrate having a first surface and including a first electrode, a first bump pad located on the first surface of the first substrate and connected to the first electrode, a second substrate having a second surface facing the first surface of the first substrate and including a second electrode, a second bump pad and neighboring second bump pads on the second surface of the second substrate, and a bump structure. The second bump pad has a recess structure. That is recessed from a side surface of the second bump pad toward a center thereof. The second bump pad may be connected to the second electrode. A bump structure may contact the first bump pad and the second bump pad. The bump structure may have a portion protruding through the recess structure. The neighboring second bump pads may neighbor the second bump pad and include recess structures oriented in different directions. | 2020-12-24 |
20200402937 | CONNECTIVITY BETWEEN INTEGRATED CIRCUIT DICE IN A MULTI-CHIP PACKAGE - An integrated circuit package may be formed comprising an interposer with a center die and a plurality of identical integrated circuit dice positioned around the center die and attached to the interposer, wherein the center die is the switch/router for the plurality of identical integrated circuit dice. The interposer comprises a substrate, a central pattern of bond pads formed in or on the substrate for attaching the center die, and substantially identical satellite patterns formed in or on the substrate for attaching identical integrated circuit dice. The central pattern of bond pads has repeating sets of a specific geometric pattern and wherein the identical satellite patterns of bond pads are positioned to form the same geometric pattern as the specific geometric pattern of the central pattern of bond pads. Thus, substantially identical conductive routes may be formed between the center die and each of the identical integrated circuit dice. | 2020-12-24 |
20200402938 | BUMP BOND STRUCTURE FOR ENHANCED ELECTROMIGRATION PERFORMANCE - A microelectronic device has a pillar connected to an external terminal by an intermetallic joint. Either the pillar or the external terminal, or both, include copper in direct contact with the intermetallic joint. The intermetallic joint includes at least 90 weight percent of at least one copper-tin intermetallic compound. The intermetallic joint is free of voids having a combined volume greater than 10 percent of a volume of the intermetallic joint; and free of a void having a volume greater than 5 percent of the volume of the intermetallic joint. The microelectronic device may be formed using solder which includes at least 93 weight percent tin, 0.5 weight percent to 5.0 weight percent silver, and 0.4 weight percent to 1.0 weight percent copper, to form a solder joint between the pillar and the external terminal, followed by thermal aging to convert the solder joint to the intermetallic joint. | 2020-12-24 |
20200402939 | SEMICONDUCTOR DEVICE - A semiconductor device includes at least one transistor disposed on or in a substrate. The transistor is a bipolar transistor including an emitter, a base, and a collector, or a field-effect transistor including a source, a gate, and a drain. At least one first bump connected to the emitter or the source is disposed on the substrate. Furthermore, at least three second bumps connected to the collector or the drain are disposed on the substrate. In plan view, a geometric center of the at least one first bump is located inside a polygon whose vertices correspond to geometric centers of the at least three second bumps. | 2020-12-24 |
20200402940 | ROUNDED METAL TRACE CORNER FOR STRESS REDUCTION - An integrated circuit package is disclosed. The integrated circuit package comprises a first integrated circuit die and a second integrated circuit die. The integrated circuit package further includes a substrate, wherein both the first integrated circuit die and the second integrated circuit die are connected to the substrate. The substrate includes an interconnect bridge embedded within the substrate, wherein the interconnect bridge includes at least one metal trace component, wherein the metal trace component includes rounded corners on a bottom portion of the metal trace component. | 2020-12-24 |
20200402941 | STACKABLE FULLY MOLDED SEMICONDUCTOR STRUCTURE WITH VERTICAL INTERCONNECTS - A method of making a semiconductor device may include providing a carrier and forming a first photoresist over the carrier with first openings through the first photoresist. A non-planar conductive seed layer may be formed over the first photoresist and conformally extend into the first openings through the first photoresist. A second photoresist may be formed over the first photoresist and over the non-planar conductive seed layer. The second photoresist layer may be patterned to form second openings through the second photoresist that extend to the non-planar conductive seed layer. Conductive posts may be plated over the non-planar conductive seed layer and within the second openings. The second photoresist may be removed while leaving in place the first photoresist. A semiconductor die may be coupled to the carrier. The semiconductor die, the conductive posts, and the first photoresist may be encapsulated with mold compound. | 2020-12-24 |
20200402942 | SEMICONDUCTOR STRUCTURE AND METHOD MANUFACTURING THE SAME - A semiconductor structure includes a first semiconductor device, a second semiconductor device, a connection device and a redistribution circuit structure. The first semiconductor device is bonded on the second semiconductor device. The connection device is bonded on the second semiconductor device and arranged aside of the first semiconductor device, wherein the connection device includes a first substrate and conductive vias penetrating through the first substrate and electrically connected to the second semiconductor device. The redistribution circuit structure is located over the second semiconductor device, wherein the first semiconductor device and the connection device are located between the redistribution circuit structure and the second semiconductor device. The redistribution circuit structure and the first semiconductor device are electrically connected to the second semiconductor device through the conductive vias of the connection device. | 2020-12-24 |
20200402943 | Optoelectronic Semiconductor Device and Method for Producing Optoelectronic Semiconductor Devices - In one embodiment, an optoelectronic semiconductor device includes at least two lead frame parts and an optoelectronic semiconductor chip which is mounted in a mounting region on one of the lead frame parts. The lead frame parts are mechanically connected to one another via a casting body. The semiconductor chip is embedded in the cast body. In the mounting region the respective lead frame part has a reduced thickness. An electrical line is led over the cast body from the semiconductor chip to a connection region of the other of the lead frame parts. In the connection region, the respective lead frame part has the full thickness. From the connection region to the semiconductor chip the electrical line does not overcome any significant difference in height. | 2020-12-24 |
20200402944 | SINTER SHEET, SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A sintered member is provided between a semiconductor chip and a terminal. The sintered member is made of a sinter sheet by heating and pressing the same. The semiconductor chip is connected to the terminal via the sintered member. Convex portions are formed at a front-side surface of the semiconductor chip. Concave portions, each of which has such a shape corresponding to that of each convex portion of the semiconductor chip, are formed at a surface of the sintered member facing to the semiconductor chip. | 2020-12-24 |
20200402945 | Bonding Structure And Method For Manufacturing The Same - A bonding structure and a method for manufacturing the same. First edge trimming is performed from the bonding surface of an n-th wafer in bonding the n-th wafer and an (n−1)th wafer, and a width of the first edge trimming is W | 2020-12-24 |
20200402946 | SEMICONDUCTOR DEVICE - A semiconductor device includes a first lead portion and a second lead portion spaced from each other in a first direction. A semiconductor chip is mounted to the first lead portion. A first connector has a first portion contacting a second electrode on the chip and a second portion connected to the second lead portion. A second connector has third portion that contacts the second electrode, but at a position further away than the first portion, and a fourth portion connected to the second portion. At least a part of the second connector overlaps a part of the first connector between the first lead portion and the second lead portion. | 2020-12-24 |
20200402947 | PACKAGE STRUCTURE - A package structure and method of forming the same are provided. The package structure includes a die, a first dielectric layer, a second dielectric layer and a conductive terminal. The first dielectric layer covers a bottom surface of the die and includes a first edge portion and a first center portion in contact with the bottom surface of the die. The first edge portion is thicker than the first center portion. The second dielectric layer is disposed on the first dielectric layer and laterally surrounding the die. The second dielectric layer includes a second edge portion on the first edge portion and a second center portion in contact with a sidewall of the die. The second edge portion is thinner than the second center portion. The conductive terminal is disposed over the die and the second dielectric layer and electrically connected to the die. | 2020-12-24 |
20200402948 | ELECTRONIC PACKAGE STRUCTURE AND CHIP THEREOF - An electronic package structure and a chip thereof are provided. The electronic package structure includes a substrate, a chip, a plurality of signal wires, and a core ground wire. The chip disposed on and electrically connected to the substrate has a core wiring region and an input and output pad region located at a top surface thereof. The input and output pad region is located between the core wiring region and an edge of the chip. The chip includes a plurality of signal pads in the input and output region and a core ground pad adjacent to one of the signal pads. The core ground pad located in the core wiring region. The signal wires are respectively connected to the signal pads. The core ground wire connected to the core ground pad is adjacent to and shields one of the signal wires. | 2020-12-24 |
20200402949 | WIRING STRUCTURE, SEMICONDUCTOR DEVICE STRUCTURE AND METHOD FOR MANUFACTURING THE SAME - A wiring structure includes a redistribution layer and an electrical pad. The redistribution layer includes a passivation layer and a metal layer. The metal layer is embedded in the passivation layer, and the passivation layer defines an opening to expose a portion of the metal layer. The electrical pad is disposed in the opening of the passivation layer and on the metal layer. The electrical pad includes a seed layer, a conductive layer, a barrier layer and an anti-oxidation layer. | 2020-12-24 |
20200402950 | METHOD FOR THE ELECTRICAL BONDING OF SEMICONDUCTOR COMPONENTS - A method is disclosed for electrically bonding a first semiconductor component to a second semiconductor component, both components including arrays of contact areas. In one aspect, prior to bonding, layers of an intermetallic compound are formed on the contact areas of the second component. The roughness of the intermetallic layers is such that the intermetallic layers include cavities suitable for insertion of a solder material in the cavities, under the application of a bonding pressure, when the solder is at a temperature below its melting temperature. The components are aligned and bonded, while the solder material is applied between the two. Bonding takes place at a temperature below the melting temperature of the solder. The bond can be established only by the insertion of the solder into the cavities of the intermetallic layers, and without the formation of a second intermetallic layer. | 2020-12-24 |
20200402951 | METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE - A method for manufacturing a semiconductor structures is provided. The method includes forming a first hybrid bonding layer over a first wafer having a logic structure, forming a second hybrid bonding layer over a second wafer having a first capacitor structure, bonding the first wafer and the second wafer through a hybrid bonding operation to connect the first hybrid bonding layer and the second hybrid bonding layer, thereby obtaining a first bonded wafer, and the first capacitor structure is electrically connected to the logic structure through the first hybrid bonding layer and the second hybrid bonding layer, and singulating the first bonded wafer to obtain a plurality of semiconductor structures. | 2020-12-24 |
20200402952 | SEMICONDUCTOR PACKAGES HAVING IMPROVED THERMAL DISCHARGE AND ELECTROMAGNETIC SHIELDING CHARACTERISTICS - A semiconductor package may include a first semiconductor chip on and electrically connected to a wiring substrate, an intermediate layer on the first semiconductor chip and covering an entire surface of the first semiconductor chip, a second semiconductor chip on the intermediate layer and electrically connected to the wiring substrate, a mold layer on the wiring substrate and covering the first semiconductor chip and the second semiconductor chip, the mold layer including one or more inner surfaces defining a mold via hole that exposes a portion of a surface of the intermediate layer, an electromagnetic shielding layer on the one or more inner surfaces of the mold layer and further on one or more outer surfaces of the mold layer, and a thermal discharge layer on the electromagnetic shielding layer in the mold via hole, such that the thermal discharge layer fills the mold via hole. | 2020-12-24 |
20200402953 | SEMICONDUCTOR DEVICE ASSEMBLIES INCLUDING MULTIPLE STACKS OF DIFFERENT SEMICONDUCTOR DIES - A semiconductor device assembly is provided. The assembly comprises a package substrate, a first stack of semiconductor dies having a first set of planform dimensions disposed over a first location on the substrate, a second stack of semiconductor dies having a second set of planform dimensions different from the first set disposed over a second location on the substrate, and an encapsulant at least partially encapsulating the substrate, the first stack and the second stack. The first stack of semiconductor dies has a first planform area, the second stack of semiconductor dies has a second planform area, and a sum of the first and second planform areas can be at least 50%, 67%, 75%, or even more of an area of the package substrate. | 2020-12-24 |
20200402954 | SEMICONDUCTOR DEVICE STRUCTURE - The present disclosure relates to a method of forming a semiconductor device structure. The method may be performed by forming a gate structure along a first side of a semiconductor substrate. The semiconductor substrate is thinned. Thinning the semiconductor substrate causes defects to form along a second side of the semiconductor substrate opposing the first side of the semiconductor substrate. Dopants are implanted into the second side of the semiconductor substrate after thinning the semiconductor substrate. The semiconductor substrate is annealed to form a doped layer after implanting the dopants. The doped layer is formed along the second side of the semiconductor substrate. | 2020-12-24 |
20200402955 | System-in-Package with Double-Sided Molding - A semiconductor device includes a substrate with an opening formed through the substrate. A first electronic component is disposed over the substrate outside a footprint of the first opening. A second electronic component is disposed over the substrate opposite the first electrical component. A third electronic component is disposed over the substrate adjacent to the first electronic component. The substrate is disposed in a mold including a second opening of the mold over a first side of the substrate. The mold contacts the substrate between the first electronic component and the third electronic component. An encapsulant is deposited into the second opening. The encapsulant flows through the first opening to cover a second side of the substrate. In some embodiments, a mold film is disposed in the mold, and an interconnect structure on the substrate is embedded in the mold film. | 2020-12-24 |
20200402956 | METHOD FOR MANUFACTURING A SEMICONDUCTOR PACKAGE HAVING FIVE-SIDE PROTECTION - The present disclosure provides a method for manufacturing a semiconductor package. The method includes steps of providing semiconductor wafer having a plurality of device chips disposed thereon, wherein each of the plurality of device chips has an active area and an inactive area arranged around the active area; forming a plurality of the openings, wherein each of the plurality of openings is formed in a back surface of the semiconductor wafer and forms an opening into the inactive area; and disposing a protecting material within the openings and over the back surface of the semiconductor wafer. | 2020-12-24 |
20200402957 | SYSTEMS AND METHODS FOR POWERING AN INTEGRATED CIRCUIT HAVING MULTIPLE INTERCONNECTED DIE - The power on wafer assembly can include: a compliant connector, an integrated circuit, a printed circuit board (PCB), a power component, and a set of compliant connectors. The power on wafer assembly can optionally include: a compression element, a cooling system, a set of mechanical clamping components, and a power source. However, the power on wafer assembly can additionally or alternately include any other suitable components. | 2020-12-24 |
20200402958 | SEMICONDUCTOR DEVICE PACKAGES AND METHODS OF MANUFACTURING THE SAME - A semiconductor device package includes a redistribution layer, a first semiconductor device, a second semiconductor device, a first insulation body, and a second insulation body. The first semiconductor device can be disposed on the redistribution layer. The second semiconductor device can be stacked on the first semiconductor device. The first insulation body can be disposed between the first semiconductor device and the second semiconductor device. The first insulation body may have a number of first particles. The second insulation body can encapsulate the first insulation body and have a number of second particles. One of the number of first particles can have a flat surface. | 2020-12-24 |
20200402959 | STACKED SEMICONDUCTOR PACKAGE HAVING AN INTERPOSER - A semiconductor package according to an aspect of the present disclosure includes a package substrate, a lower chip, an interposer, and an upper chip sequentially stacked on the package substrate, and bonding wires electrically connecting the package substrate and the interposer. The interposer includes lower chip connection pads electrically connected to the lower chip on a lower surface of the interposer, first upper chip connection pads and second upper chip connection pads electrically connected to the upper chip, respectively, on an upper surface of the interposer, wire bonding pads disposed on the upper surface of the interposer and bonded to the bonding wires, first redistribution lines disposed on the upper surface of the interposer and electrically connecting the second upper chip connection pads to the wire bonding pads, and through via electrodes electrically connecting the lower chip connection pads and the first upper chip connection pads. | 2020-12-24 |
20200402960 | SEMICONDUCTOR STRUCTURE AND METHOD MANUFACTURING THE SAME - A semiconductor structure includes a stacked structure. The stacked structure includes a first semiconductor die and a second semiconductor die. The first semiconductor die includes a first semiconductor substrate having a first active surface and a first back surface opposite to the first active surface. The second semiconductor die is over the first semiconductor die, and includes a second semiconductor substrate having a second active surface and a second back surface opposite to the second active surface. The second semiconductor die is bonded to the first semiconductor die through joining the second active surface to the first back surface at a first hybrid bonding interface along a vertical direction. Along a lateral direction, a first dimension of the first semiconductor die is greater than a second dimension of the second semiconductor die. | 2020-12-24 |
20200402961 | STAIR-STACKED DICE DEVICE IN A SYSTEM IN PACKAGE, AND METHODS OF MAKING SAME - A system in package includes a stair-stacked memory module that is stacked vertically with respect to a processor die. A spacer is used adjacent to the processor die to create a bridge for the stair-stacked memory module. Each memory die in the stair-stacked memory module includes a vertical bond wire that emerges from a matrix for connection. The matrix encloses the stair-stacked memory module and at least a portion of the processor die. | 2020-12-24 |
20200402962 | METHOD OF MANUFACTURING DISPLAY DEVICE - A method of manufacturing a display apparatus including steps of forming a plurality of light emitting diode chips spaced apart from one another at a predetermined interval on a first manufacturing substrate and transferring the light emitting diode chips to a second manufacturing substrate by laser irradiation, in which the light emitting diode chips include a light emitting structure including a first-type semiconductor layer and a second-type semiconductor layer, a first-type electrode disposed on the first-type semiconductor layer, and a second-type electrode disposed on the second-type semiconductor layer. | 2020-12-24 |
20200402963 | Electronic device - An electronic device having an active region and a non-active region includes a first substrate, a second substrate, and a sealing layer. The first substrate includes a plurality of light-emitting units in the active region. The second substrate includes a plurality of light conversion units in the active region. The sealing layer is disposed between the first substrate and the second substrate, on the active region and the non-active region. | 2020-12-24 |
20200402964 | MULTI-JUNCTION LED WITH EUTECTIC BONDING AND METHOD OF MANUFACTURING THE SAME - Disclosed are multi-junction light emitting diode (LED) formed by using eutectic bonding and method of manufacturing the multi-junction LED. The multi-junction LED is formed by stacking a separately formed light emitting structure on another light emitting structure by using eutectic bonding. Since separately grown light emitting structure is stacked on the light emitting structure using the eutectic metal alloy bonding, it is possible to prevent crystal defects occurring between the light emitting structures when sequentially grown. Further, since the eutectic metal alloy can be formed in various patterns, it is possible to control and optimize adhesive strength, transmittance of the light generated in the upper light emitting structure, and resistance. | 2020-12-24 |
20200402965 | ELECTRONIC PACKAGE AND METHOD FOR FABRICATING THE SAME - An electronic package is provided, including: an encapsulation layer embedded with a first electronic component and conductive pillars; a circuit structure disposed on one surface of the encapsulation layer; a second electronic component disposed on the circuit structure; an insulation layer formed on the other surface of the encapsulation layer; and a circuit portion disposed on the insulation layer. Since the first and second electronic components are disposed on two sides of the circuit structure, respectively, the electronic package has various functions and high performance. A method for fabricating the electronic package is also provided. | 2020-12-24 |
20200402966 | DISPLAY PANEL, MANUFACTURING METHOD THEREOF, AND DISPLAY APPARATUS - A display panel includes an array substrate and light-emitting diodes including display light-emitting diodes. A display area includes sub-pixel regions including display sub-pixel regions and backup sub-pixel regions. In each of first and second directions, the display sub-pixel regions and the backup sub-pixel regions are arranged alternately. Display anode and cathode are provided in each display sub-pixel region. Backup anode and cathode are provided in at least one backup sub-pixel region. The display anode located in one display sub-pixel region is connected to the backup anodes of at least two backup sub-pixel region, and/or, at least two backup anodes provided in one backup sub-pixel region are electrically connected to the display anodes of at least two display sub-pixel regions, respectively. A positive pin of the display light-emitting diode is bonded to the display anode, and a negative pin thereof is bonded to the display cathode. | 2020-12-24 |
20200402967 | DISPLAY DEVICE - A display device includes: an array substrate including a display area, of an image, including a plurality of pixels arranged in an array; a first circuit that is disposed at the array substrate to face an end of the display area, and controls drive of the plurality of pixels; and a second circuit that controls drive of the first circuit. The first circuit includes a plurality of first terminals arranged on the array substrate. The first circuit includes a plurality of second terminals each connected by at least one wire bond to a corresponding one of a plurality of terminals included in the second circuit. | 2020-12-24 |
20200402968 | SEMICONDUCTOR LAYOUT WITH DIFFERENT ROW HEIGHTS - A semiconductor device includes first cell rows and second cell rows. The first cell rows extend in a first direction. Each of the first cell rows has a first row height. The second cell rows extend in the first direction. Each of the second cell rows has a second row height. The first row height is greater than the second row height. The first cell rows and the second cell rows are interlaced in a periodic sequence. A first row quantity of the first cell rows in the periodic sequence is greater than a second row quantity of the second cell rows in the periodic sequence. | 2020-12-24 |
20200402969 | INTEGRATED CIRCUITS INCLUDING STANDARD CELLS AND METHOD OF MANUFACTURING THE INTEGRATED CIRCUITS - Provided are integrated circuits including a plurality of standard cells aligned along a plurality of rows. The integrated circuit includes first standard cells aligned on the first row and including first conductive patterns to which a first supply voltage is applied in a conductive layer and second standard cells aligned on the second row which is adjacent to the first row in the conductive layer and including second conductive patterns to which the first supply voltage is applied in the conductive layer. A pitch between the first conductive patterns and the second conductive patterns may be less than a pitch provided by single-patterning. | 2020-12-24 |
20200402970 | Integrated Standard Cell Structure - An integrated circuit includes a first standard cell having a first pFET and a first nFET integrated, and having a first dielectric gate on a first standard cell boundary. The integrated circuit further includes a second standard cell being adjacent to the first standard cell, having a second pFET and a second nFET integrated, and having a second dielectric gate on a second standard cell boundary. The integrated circuit also includes a first filler cell configured between the first and second standard cells, and spanning from the first dielectric gate to the second dielectric gate. The first pFET and the second pFET are formed on a first continuous active region. The first nFET and the second nFET are formed on a second continuous active region. | 2020-12-24 |
20200402971 | METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES - A method of manufacturing a semiconductor device includes forming a first masking layer and second masking layer over a substrate. The first masking layer includes an opening over an active area and a spacer in the substrate, and the second masking layer having a block blocks a portion of the opening in the first masking layer. The block in the second masking layer has boundaries located completely within the boundary of the opening in the first masking layer. The method includes performing an etching process, using the first masking layer and the second masking layer as an etching mask, to form a contact opening which exposes a portion of the active area and a portion of the spacer, and forming a contact plug in the contact opening and over the exposed portion of the active area and the exposed portion of the spacer. | 2020-12-24 |
20200402972 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device with an insulated-gate field-effect transistor and its manufacturing method. The cell region EFR defined in the first region of one main surface side of semiconductor substrate (SUB), an insulated gate-type field-effect transistor (MFET) is formed, the gate pad region GPR defined in the first region, snubber circuit SNC is formed snubber region SNR is defined. Within the first and second regions, first and second deep trenches spaced apart from each other are formed, and at least one width of the plurality of second deep trenches formed in the second region is smaller than that of the first deep trench formed in the first region. | 2020-12-24 |
20200402973 | WIRELESS COMMUNICATION SYSTEM WITH IMPROVED THERMAL PERFORMANCE - Aspects of wireless communication are described, including a radiofrequency (RF) amplifier chip, configured for transmitting or receiving data, comprising a first substrate comprising a first material and a second substrate comprising a second material that is different from the first material. The first substrate and the second substrate may be lattice-matched such that an interface region between the first substrate and the second substrate exhibits an sp3 carbon peak at about 1332 cm | 2020-12-24 |
20200402974 | APPARATUS FOR EFFICIENT HIGH-FREQUENCY COMMUNICATIONS - Aspects of wireless communication are described, including a radiofrequency (RF) amplifier chip, configured for transmitting or receiving data, comprising a first substrate comprising a first material and a second substrate comprising a second material that is different from the first material. The first substrate and the second substrate may be lattice-matched such that an interface region between the first substrate and the second substrate exhibits an sp3 carbon peak at about 1332 cm⋅ | 2020-12-24 |
20200402975 | MONOLITHIC COMPONENT COMPRISING A GALLIUM NITRIDE POWER TRANSISTOR - A monolithic component includes a field-effect power transistor and at least one first Schottky diode inside and on top of a gallium nitride substrate. | 2020-12-24 |
20200402976 | METHODS, APPARATUS AND SYSTEM FOR FORMING ON-CHIP METAL-INSULATOR-MEAL (MIM) CAPACITOR - We report a semiconductor device, containing a semiconductor substrate; an isolation feature on the substrate; a plurality of gates on the isolation feature, wherein each gate comprises a gate electrode and a high-k dielectric layer disposed between the gate electrode and the isolation feature and disposed on and in contact with at least one side of the gate electrode; and a fill metal between the plurality of gates on the isolation feature. We also report methods of forming such a device, and a system for manufacturing such a device. | 2020-12-24 |
20200402977 | SEMICONDUCTOR DEVICE AND ELECTRONIC DEVICE - A semiconductor device in which a circuit and a power storage element are efficiently placed is provided. The semiconductor device includes a first transistor, a second transistor, and an electric double-layer capacitor. The first transistor, the second transistor, and the electric double-layer capacitor are provided over one substrate. A band gap of a semiconductor constituting a channel region of the second transistor is wider than a band gap of a semiconductor constituting a channel region of the first transistor. The electric double-layer capacitor includes a solid electrolyte. | 2020-12-24 |
20200402978 | HIGH VOLTAGE INTEGRATION FOR HKMG TECHNOLOGY - The present disclosure relates to an integrated circuit (IC) and a method of formation. In some embodiments, a low voltage region and a high voltage region are integrated in a substrate. A low voltage transistor device is disposed in the low voltage region and comprises a low voltage gate electrode and a low voltage gate dielectric separating the low voltage gate electrode from the substrate. A first interlayer dielectric layer is disposed over the substrate surrounding the low voltage gate electrode and the low voltage gate dielectric. A high voltage transistor device is disposed in the high voltage region and comprises a high voltage gate electrode disposed on the first interlayer dielectric layer. | 2020-12-24 |
20200402979 | TIE OFF DEVICE - An integrated circuit device includes a first power rail, a first active area extending in a first direction, and a plurality of gates contacting the first active area and extending in a second direction perpendicular to the first direction. A first transistor includes the first active area and a first one of the gates. The first transistor has a first threshold voltage (VT). A second transistor includes the first active area and a second one of the gates. The second transistor has a second VT different than the first VT. A tie-off transistor is positioned between the first transistor and the second transistor, and includes the first active area and a third one of the gates, wherein the third gate is connected to the first power rail. | 2020-12-24 |
20200402980 | SEMICONDUCTOR DEVICE - A semiconductor device includes a substrate including a first region and a second region, fin type active areas extending in a first direction away from the substrate in each of the first and second regions, a plurality of nanosheets extending parallel to an upper surface of the fin type active areas and being spaced apart from the upper surface of the fin type active areas, a gate extending over the fin type active areas in a second direction crossing the first direction, a gate dielectric layer interposed between the gate and each of the nanosheets, first source and drain regions included in the first region and second source and drain regions included in the second region, and insulating spacers interposed between the fin type active areas and the nanosheets, wherein air spacers are interposed between the insulating spacers and the first source and drain regions. | 2020-12-24 |
20200402981 | SEMICONDUCTOR DEVICES - A semiconductor device includes a bit line structure, first and second capping patterns, first and second contact plug structures, and a capacitor. The bit line structure extends on a cell region and a dummy region. The first capping pattern is adjacent the bit line structure on the cell region. The second capping pattern is adjacent the bit line structure on the dummy region. The first contact plug structure is adjacent the bit line structure and the first capping pattern on the cell region, and includes a lower contact plug and a first upper contact plug sequentially stacked. The second contact plug structure is adjacent the bit line structure and the second capping pattern on the dummy region, and includes a dummy lower contact plug and a second upper contact plug sequentially stacked. The capacitor contacts an upper surface of the first contact plug structure on the cell region. | 2020-12-24 |
20200402982 | SEMICONDUCTOR DEVICE AND A FABRICATION METHOD THEREOF - A semiconductor device including a substrate having a cell region and a peripheral region; a cell gate structure disposed on the cell region; a first impurity region and a second impurity region, arranged on first and second sides of the cell gate structure in the cell region; a bit line structure disposed on the cell gate structure and connected to the first impurity region; a peripheral gate structure disposed on the peripheral region; a peripheral capping layer disposed on the peripheral region, covering the peripheral gate structure, and having an upper surface at substantially the same level as an upper end of the bit line structure; and a cell contact structure disposed on the second impurity region, and having a conductive barrier and a contact material layer on the conductive barrier, wherein the conductive barrier covers the upper end of the bit line structure. | 2020-12-24 |
20200402983 | THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE - A three-dimensional semiconductor memory device including a substrate including a cell array region and a first connection region arranged in a first direction; and a first block structure on the substrate, the first block structure including a lower stack including a plurality of lower electrodes vertically stacked on the substrate; and intermediate stacks exposing the lower stack, the intermediate stacks including a plurality of intermediate electrodes vertically stacked on the lower stack, wherein, on the cell array region, the first block structure has a first width in a second direction crossing the first direction, and wherein, on the first connection region, the first block structure has a second width, which is larger than the first width, in the second direction. | 2020-12-24 |
20200402984 | STACKED-NANOSHEET SEMICONDUCTOR STRUCTURES - Semiconductor structures and methods of making the same. The semiconductor structures including at least two vertically stacked nanosheet devices. In one embodiment, an integrated circuit includes a plurality of horizontal nanosheet devices (HNS devices) that are stacked vertically, on top of each other, relative to a top surface of a substrate. The plurality of HNS devices including a first HNS device and a second HNS device that each have source and drain structures. | 2020-12-24 |
20200402985 | ANTI-FUSE CELL AND CHIP HAVING ANTI-FUSE CELLS - An anti-fuse cell includes a control device and an anti-fuse element is introduced. The control device includes a source node, a drain node and a gate node, wherein the gate node is electrically coupled to a word line and the drain node is electrically coupled to a bit line. The anti-fuse element includes a first conductive layer, a second conductive layer and a dielectric layer, wherein the dielectric layer is disposed between the first conductive layer and the second conductive layer. The second conductive layer of the anti-fuse element physically stacks upon and directly contacts a metal layer that is electrically connected to the source node of the control device, and first conductive layer is electrically coupled to a program line through a via. An anti-fuse cell having multiple anti-fuse elements and a chip having a plurality of anti-fuse cells are also introduced. | 2020-12-24 |
20200402986 | FERROELECTRIC MEMORY DEVICES - Embodiments of ferroelectric memory devices and methods for forming the ferroelectric memory devices are disclosed. In an example, a ferroelectric memory cell includes a first electrode, a second electrode, a doped ferroelectric layer disposed between the first electrode and the second electrode. The doped ferroelectric layer includes oxygen and one or more ferroelectric metals. The doped ferroelectric layer further includes a plurality of dopants including at least one dopant from one of Group II elements, Group III elements, or Lanthanide elements. The plurality of dopants are different from the one or more ferroelectric metals. | 2020-12-24 |
20200402987 | Flash and Method for Manufacturing the Same - The present invention discloses a flash. A channel region comprises a first shallow trench formed in the surface area of a semiconductor substrate. A tunneling dielectric layer and a polysilicon floating gate are formed in the first shallow trench and extended to the outside of the first shallow trench. A control dielectric layer and a polysilicon control gate are sequentially formed on the two side surfaces in the width direction and the top surface of the polysilicon floating gate. A source region and a drain region are formed in a self-aligned manner in active regions on the two sides in the length direction of the polysilicon floating gate. The present invention further discloses a method for manufacturing a flash. The present invention can break through the limitation of the length of the channel on the size of the memory cell, thus reducing the area of the memory cell. | 2020-12-24 |
20200402988 | MEMORY ARRAYS AND METHODS USED IN FORMING A MEMORY ARRAY - A method used in forming a memory array comprises forming a substrate comprising a conductor tier comprising upper conductor material, lower metal material, and intervening metal material vertically between the upper conductor material and the lower metal material. The intervening metal material, the upper conductor material, and the lower metal material are of different compositions relative one another. The intervening metal material has a reduction potential that is less than 0.7V away from the reduction potential of the upper conductor material. A stack comprising vertically-alternating insulative tiers and conductive tiers is formed above the conductor tier. Channel material is formed through the insulative tiers and the conductive tiers. Horizontally-elongated trenches are formed through the stack to the conductor tier. Elevationally-extending strings of memory cells are formed in the stack. Individual of the memory cells comprise the channel material, a gate region that is part of a conductive line in individual of the conductive tiers, and a memory structure laterally between the gate region and the channel material in the individual conductive tiers. Other methods and structure independent of method are disclosed. | 2020-12-24 |
20200402989 | SEMICONDUCTOR DEVICE - Fins lined up in a Y direction, a control gate electrode and a memory gate electrode each extending in the Y direction so as to straddle the fins, a plurality of first plugs electrically connected with a drain region formed in each of the fins, and a plurality of second plugs electrically connected with a source region formed in each of the fins are formed. Here, a N-th plug of the plurality of first plugs lined up in the Y direction is coupled with each of (2N−1)-th and 2N-th fins in the Y direction. Also, a N-th plug of the plurality of second plugs lined up in the Y direction is coupled with each of 2N-th and (2N+1)-th fins in the Y direction. | 2020-12-24 |
20200402990 | BONDED DIE ASSEMBLY USING A FACE-TO-BACK OXIDE BONDING AND METHODS FOR MAKING THE SAME - A first semiconductor die includes a first substrate, first semiconductor devices, first dielectric material layers having a first silicon oxide surface as an uppermost surface and forming first metal interconnect structures. A second semiconductor die includes a second substrate, second semiconductor devices, and second dielectric material layers forming second metal interconnect structures. A handle substrate is attached to a topmost surface of the second semiconductor die. The second substrate is thinned, and a second silicon oxide surface is provided as a bottommost surface of the second semiconductor die. The second semiconductor die is bonded to the first semiconductor die by inducing oxide-to-oxide bonding between the second silicon oxide surface and the first silicon oxide surface. The handle substrate is detached, and inter-die connection via structures are formed through the second substrate and the bonding interface to contact the first metal interconnect structures. External bonding pads may be subsequently formed. | 2020-12-24 |
20200402991 | THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICES AND METHODS OF FABRICATING THE SAME - Three-dimensional semiconductor memory devices and methods of fabricating the same are provided. A memory device may include a semiconductor layer including first and second regions, first vertical structures on the first region and extending in a first direction perpendicular to a top surface of the semiconductor layer, and second vertical structures on the second region and extending in the first direction. The first vertical structure may include a vertical semiconductor pattern extending in the first direction and in contact with the semiconductor layer, and a first data storage pattern surrounding the vertical semiconductor pattern. The second vertical structure may include an insulation structure extending in the first direction and in contact with the semiconductor layer, and a second data storage pattern surrounding the insulation structure. | 2020-12-24 |
20200402992 | THREE-DIMENSIONAL MEMORY DEVICE CONTAINING THROUGH-ARRAY CONTACT VIA STRUCTURES BETWEEN DIELECTRIC BARRIER WALLS AND METHODS OF MAKING THE SAME - An alternating layer stack of insulating layers and sacrificial material layers is formed over a semiconductor substrate, and memory stack structures are formed through the vertically-alternating layer stack. A pair of unconnected barrier trenches or a moat trench is formed through the alternating stack concurrently with formation of backside trenches. Backside recesses are formed by isotropically etching the sacrificial material layers selective to the insulating layers while a dielectric liner covers the barrier trenches or the moat trench. A vertically alternating sequence of the insulating plates and the dielectric spacer plates is provided between the pair of barrier trenches or inside the moat trench. Electrically conductive layers are formed in the backside recesses. A first conductive via structure is formed through the vertically alternating sequence concurrently with formation of a second conductive via structure through a dielectric material portion adjacent to the alternating stack. | 2020-12-24 |
20200402993 | Integrated Assemblies Having Metal-Containing Liners Along Bottoms of Trenches, and Methods of Forming Integrated Assemblies - Some embodiments include methods of forming integrated assemblies. A conductive structure is formed to include a semiconductor-containing material over a metal-containing material. An opening is formed to extend into the conductive structure. A conductive material is formed along a bottom of the opening. A stack of alternating first and second materials is formed over the conductive structure either before or after forming the conductive material. Insulative material and/or channel material is formed to extend through the stack to contact the conductive material. Some embodiments include integrated assemblies. | 2020-12-24 |
20200402994 | THREE-DIMENSIONAL FLASH MEMORY DEVICE INCLUDING CELL GATE PATTERNS HAVING BLOCKING BARRIER PATTERNS AND A METHOD FOR MANUFACTURING THE SAME - A three-dimensional flash memory device is described that may include a substrate, a plurality of cell gate patterns and a plurality of mold insulating layers alternately stacked on the substrate, and a vertical channel structure in contact with side surfaces of the plurality of cell gate patterns and side surfaces of the plurality of mold insulating layers. Each of the plurality of cell gate patterns may include a cell gate electrode and a blocking barrier pattern adjacently disposed on one side surface of the cell gate electrode. An inner side surface of the blocking barrier pattern may include an upper inner side surface, a middle inner side surface, and a lower inner side surface. The middle inner side surface of the blocking barrier pattern may face the one side surface of the cell gate electrode. The blocking barrier pattern may have a portion protruding toward the cell gate electrode at a connection point between the upper inner side surface of the blocking barrier pattern and the middle inner side surface of the blocking barrier pattern. | 2020-12-24 |
20200402995 | THREE-DIMENSIONAL FLASH MEMORY DEVICE INCLUDING CHANNEL STRUCTURES HAVING ENLARGED PORTIONS - A three-dimensional flash memory device including a lower and upper word line stack; a cell channel structure; and a dummy channel structure, wherein the cell channel structure includes a lower cell channel structure; an upper cell channel structure; and a cell channel enlarged portion between the lower and upper cell channel structures and having a width greater than that of the lower cell channel structure, wherein the dummy channel structure includes a lower dummy channel structure; an upper dummy channel structure; and a dummy channel enlarged portion between the lower and upper dummy channel structures, the dummy channel enlarged portion having a width greater than that of the lower dummy channel structure, wherein a difference between the width of the dummy channel enlarged portion and the lower dummy channel structure is greater than a difference between the width of the cell channel enlarged portion and the lower cell channel structure. | 2020-12-24 |
20200402996 | VERTICAL MEMORY DEVICES - A vertical memory device is provided including a first structure on a substrate. The first structure includes gate patterns spaced apart from each other in a vertical direction perpendicular to an upper surface of the substrate to form a plurality of layers. A second structure is connected to the first structure. The second structure includes pad patterns electrically connected to the gate patterns of a respective one of the layers. A channel structure passes through the gate patterns. A first contact plug passes through the second structure and electrically connects with a pad pattern of one of the layers. The first contact plug is electrically insulated from gate patterns of other layers. At least one bent portion is included at each of a sidewall of the channel structure and a sidewall of the first contact plug. | 2020-12-24 |
20200402997 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME - A semiconductor device includes a channel structure arranged on a substrate and extending in a first direction perpendicular to a top surface of the substrate, the channel structure including a channel layer and a gate insulating layer; a plurality of insulating layers arranged on the substrate and surrounding the channel structure, the plurality of insulating layers spaced apart from each other in the first direction; a plurality of first gate electrodes surrounding the channel structure; and a plurality of second gate electrodes surrounding the channel structure. Between adjacent insulating layers from among the plurality of insulating layers are arranged a first gate electrode from among the plurality of first gate electrodes spaced apart along the first direction from a second gate electrode from among the plurality of second gate electrodes. | 2020-12-24 |
20200402998 | VERTICAL MEMORY DEVICES - A vertical memory device includes gate electrodes disposed on a substrate and spaced apart from each other in a vertical direction. A channel extends in the vertical direction and is positioned adjacent to the gate electrodes. A tunnel insulation pattern is disposed on a portion of an outer sidewall of the channel that is adjacent to each of the gate electrodes. Charge trapping pattern structures are disposed between the tunnel insulation pattern and each of the gate electrodes. Each of the charge trapping pattern structures includes upper and lower charge trapping patterns spaced apart from each other in the vertical direction. Blocking pattern structures are between the charge trapping patterns and each of the gate electrodes. A first portion of the channel that is adjacent to the tunnel insulation pattern has a thickness in a horizontal direction that is smaller than a thickness of other portions of the channel. | 2020-12-24 |
20200402999 | SEMICONDUCTOR STORAGE DEVICE AND MANUFACTURING METHOD THEREOF - According to one embodiment, storage device comprises first wiring layers stacked along a first direction and a memory pillar extending through the first wiring layers. A second wiring layer is above an upper end of the memory pillar. A second semiconductor layer has a first portion between the first semiconductor layer and the second wiring layer and a second portion extending away from the first semiconductor layer. A first insulating layer is between the first portion and the second wiring layer in first direction, and also between the second portion and the second wiring layer in a second direction intersecting the first direction. | 2020-12-24 |
20200403000 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - According to one embodiment, the stacked body includes a first stacked portion including a plurality of electrode layers, a second stacked portion including a plurality of electrode layers, and being disposed separately from the first stacked portion in the first direction, and a connection portion including a high dielectric layer provided between the first stacked portion and the second stacked portion and having a dielectric constant higher than a dielectric constant of the insulator. The column-shaped portion includes a first portion provided in the first stacked portion and extending in the first direction of the stacked body, a second portion provided in the second stacked portion and extending in the first direction, and an intermediate portion provided in the connection portion and connected the first portion to the second portion. | 2020-12-24 |
20200403001 | THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE - According to one embodiment, a semiconductor memory device includes a substrate; an insulating layer provided on the substrate; a conductive layer provided on the insulating layer; a stacked body provided on the conductive layer and including a plurality of electrode layers and a plurality of insulating layers respectively provided among the plurality of electrode layers; a columnar section piercing through the stacked body to reach the conductive layer and extending in a first direction in which the stacked body is stacked; and a source layer. The columnar section includes a channel body and a charge storage film provided between the channel body and the respective electrode layers. The conductive layer includes a first film having electric conductivity and in contact with the lower end portion of the channel body; and an air gap provided to be covered by the first film. | 2020-12-24 |