44th week of 2009 patent applcation highlights part 14 |
Patent application number | Title | Published |
20090267129 | DIELECTRIC MULTILAYER STRUCTURES OF MICROELECTRONIC DEVICES AND METHODS FOR FABRICATING THE SAME - A dielectric multilayer structure of a microelectronic device, in which a leakage current characteristic and a dielectric constant are improved, is provided in an embodiment. The dielectric multilayer structure includes a lower dielectric layer, which is made of amorphous silicate (M | 2009-10-29 |
20090267130 | STRUCTURE AND PROCESS INTEGRATION FOR FLASH STORAGE ELEMENT AND DUAL CONDUCTOR COMPLEMENTARY MOSFETS - A method is provided for simultaneously fabricating a flash storage element, an NFET and a PFET having metal gates with different workfunctions. A first gate metal layer of the NFET having a first workfunction is deposited simultaneously with a first metal layer for forming the floating gate of the flash storage element. A second gate metal layer of the PFET having a second workfunction different from the first workfunction is deposited simultaneously with a second metal layer for forming the control gate of the flash storage element. A semiconductor layer is deposited over the first and second metal layers and gate metal layers and patterned to form first, second and third gates. Source and drain regions of the flash storage element, the NFET and the PFET are formed adjacent to the first, second and third gates, respectively. | 2009-10-29 |
20090267131 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME - To reduce capacitance between each adjacent two word lines in a semiconductor memory device, a first insulating film is formed, with a first gate insulating film thereunder, in an interstice between gates respectively of each adjacent two memory transistors, and in an interstice between a gate of a selective transistor and a gate of a memory transistor adjacent thereto. Additionally, a second insulating film is formed on the first insulating film, sides of the gate of each memory transistor, and a side, facing the memory transistor, of the gate of the selective transistor. A third insulating film is formed parallel to a semiconductor substrate so as to cover a metal silicide film, the first and second insulating films and fourth and fifth insulating films. A void part is provided in the interstice between each adjacent two gates of the memory transistors, and in the interstice between the gate of the selective transistor and the gate of the memory transistor adjacent thereto. A bottom and two sides of each void part are shielded by the second insulating film, and a top of each void part is shielded by the third insulating film. | 2009-10-29 |
20090267132 | GATE STRUCTURES IN SEMICONDUCTOR DEVICES - A gate structure includes an insulation layer on a substrate, a first conductive layer pattern on the insulation layer, a metal ohmic layer pattern on the first conductive layer pattern, a diffusion preventing layer pattern on the metal ohmic layer pattern, an amorphous layer pattern on the diffusion preventing layer pattern, and a second conductive layer pattern on the amorphous layer pattern. The gate structure may have a low sheet resistance and desired thermal stability. | 2009-10-29 |
20090267133 | Flash memory device and method for fabricating the same - A flash memory device includes a source region formed in an active region of a semiconductor substrate; a recessed region formed in the active region on either side of the source region, the recessed region including a recess surface having sidewalls; floating gates formed at the sidewalls of the recess surface by interposing a tunnel insulating film; a source line formed on the source region across the active region; and control gate electrodes formed at sidewalls of the source line across a portion of the active region where the floating gates are formed. The floating gates and the control gate electrodes are formed by anisotropically etching a conformal conductive film to have a spacer structure. Cell transistor size can be reduced by forming a deposition gate structure at both sides of the source line, and short channel effects can be minimized by forming the channel between the sidewalls of a recess surface. | 2009-10-29 |
20090267134 | NONVOLATILE SEMICONDUCTOR MEMORY APPARATUS - A nonvolatile semiconductor memory apparatus includes: a memory element including: a semiconductor substrate; a source region and a drain region formed at a distance from each other in the semiconductor substrate; a first insulating film formed on a portion of the semiconductor substrate located between the source region and the drain region, having sites that perform electron trapping and releasing and are formed by adding an element different from a base material, and including insulating layers having different dielectric constants, the sites having a higher level than a Fermi level of a material forming the semiconductor substrate; a charge storage film formed on the first insulating film; a second insulating film formed on the charge storage film; and a control gate electrode formed on the second insulating film. | 2009-10-29 |
20090267135 | NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME - A non-volatile semiconductor storage device includes a first layer and a second layer. The first layer includes: a plurality of first conductive layers extending in parallel to a substrate and laminated in a direction perpendicular to the substrate; a first insulation layer formed on an upper layer of the plurality of first conductive layers; a first semiconductor layer formed to penetrate the plurality of first conductive layers; and a charge accumulation layer formed between the first conductive layers and the first semiconductor layer. Respective ends of the first conductive layers are formed in a stepwise manner in relation to each other in a first direction. The second layer includes: a plurality of second conductive layers extending in parallel to the substrate and laminated in a direction perpendicular to the substrate, the second conductive layers being formed in the same layer as the plurality of first conductive layers; and a second insulation layer formed on an upper layer of the plurality of second conductive layers. Respective ends of the second conductive layers are formed to align along a straight line extending in a direction substantially perpendicular to the substrate at a predetermined area. | 2009-10-29 |
20090267136 | SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor memory device having a memory cell region and a peripheral circuit region, and a method of manufacturing such a semiconductor memory device, are proposed, in which trench grooves are formed to be shallow in the memory cell region in order to improve the yield, and trench grooves are formed to be deep in the high voltage transistor region of the peripheral circuit region, in particular in a high voltage transistor region thereof, in order to improve the element isolation withstand voltage. A plurality of memory cell transistors having an ONO layer | 2009-10-29 |
20090267137 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE HAVING NOTCHED GATE MOSFET - Provided is a method of manufacturing a semiconductor device, by which a cell transistor formed on a cell array area of a semiconductor substrate employs a structure in which an electrode in the shape of spacers is used to form a gate and a multi-bit operation is possible using localized bits, and transistors having structures optimized to satisfy different requirements depending upon functions of the transistors can be formed on a peripheral circuit area which is the residual area of the semiconductor substrate. In this method, a cell transistor is formed on the cell array area. The cell transistor includes a notch gate structure, a first channel region formed on a semiconductor substrate under the notch gate structure, a source region and a drain region formed on both sides of the first channel region, a first gate insulation film formed between the first channel region and the notch gate structure, and a memory layer locally formed on areas adjacent to the source and drain regions between the first channel region and the notch gate structure. At the same time that the cell transistor is formed, a plurality of peripheral circuit transistors including at least one transistor having a different structure from the cell transistor are formed on the peripheral circuit area. | 2009-10-29 |
20090267138 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A charge trap type non-volatile memory device has memory cells formed on a silicon substrate at a predetermined interval via an element isolation trench along a first direction in which word lines extend. Each of the memory cells has a tunnel insulating film formed on the silicon substrate, a charge film formed on the tunnel insulating film, and a common block film formed on the charge film. The common block film is formed in common with the memory cells along first direction. An element isolation insulating film buried in the element isolation trench has an upper portion of a side wall of the element isolation insulating film which contacts with a side wall of the charge film in each of the memory cells and a top portion of the element isolation insulating film which contacts with the common block film. A control electrode film is formed on the common block film. | 2009-10-29 |
20090267139 | THREE DIMENSIONAL STACKED NONVOLATILE SEMICONDUCTOR MEMORY - A three dimensional stacked nonvolatile semiconductor memory according to examples of the present invention includes a memory cell array comprised of first and second blocks disposed side by side and a driver disposed between the first and second blocks. At least two conductive layers having the same structure as that of the at least two conductive layers in the first and second blocks are disposed on the driver, and select gate lines in the first and second blocks are connected to the driver through the at least two conductive layers on the driver. | 2009-10-29 |
20090267140 | MOSFET STRUCTURE WITH GUARD RING - A trench Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET) structure with guard ling, includes: a substrate including an epi layer region on the top thereof a plurality of source and body regions formed in the epi layer; a metal layer including a plurality of metal layer regions which are connected to respective source and body regions forming metal connections of the MOSFET; a plurality of contact metal plugs connected to respective metal layer regions; a plurality of gate structure filled with polysilicon to be formed on top of the epi layer; an insulating layer deposited on the epi layer formed underneath the metal layer with a plurality of metal contact holes therein for contacting respective source and body regions; and a guard ring wrapping around the trench gates with contact metal plug underneath the gate metal layer | 2009-10-29 |
20090267141 | METHOD FOR FABRICATING SILICON CARBIDE VERTICAL MOSFET DEVICES - A method of forming a vertical MOSFET device includes forming a trench within a drift layer substrate, the drift layer comprising a first polarity type, the trench generally defining a well region of a second polarity type opposite the first polarity type. An ohmic contact layer is formed within a bottom surface of the trench, the ohmic contact layer comprising a material of the second polarity type. A layer of the second polarity type is epitaxially grown over the drift layer, sidewall surfaces of the trench, and the ohmic contact layer. A layer of the first polarity type is epitaxially grown over the epitaxially grown layer of the second polarity type so as to refill the trench, and the epitaxially grown layers of the first and second polarity type are planarized so as to expose an upper surface of the drift layer substrate. | 2009-10-29 |
20090267142 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME - A semiconductor device according to the present invention includes a plurality of trenches, a plurality of gate electrodes, a plurality of diffusion Layers, an insulating film, an electrode layer, a plurality of first concave portions and a plurality second concave portions formed in the electrode layer, a solder layer, and an electrically conducting board. The gate electrode is located in each of the plurality of trenches. The plurality of diffusion layers is adjacent to the respective trenches. The insulating films are selectively formed on the respective gate electrodes. The first concave portions are located above spaces between the gate electrodes. The second concave portions are located between the first concave portions. The electrically conducting board is connected to the electrode layer through the solder layers. | 2009-10-29 |
20090267143 | TRENCHED MOSFET WITH GUARD RING AND CHANNEL STOP - A trenched MOSFET (Metal-Oxide-Semiconductor Field Effect Transistor) with a guard ring and a channel stop, including: a substrate including an epi layer region on the top thereof; a plurality of source and body regions formed in the epi layer; a metal layer including a plurality of metal layer regions which are connected to respective source and body, and gate regions forming metal connections of the MOSFET; a plurality of metal contact plugs connected to respective metal layer regions; a plurality of gate structure filled with polysilicon to form a plurality of trenched gates on top of epi layer; an insulating layer deposited on the epi layer formed underneath the metal layer with a plurality of metal contact holes therein for contacting respective source and body regions; a guard ring wrapping around the metal layer corresponding to the gate region at the termination; and a channel stop which is a heavier N-type doping region aside the guard ring at the termination; Wherein the contact plugs connecting to the top metal layer are corresponding to the source and the body regions. | 2009-10-29 |
20090267144 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device includes: an n-type first well diffusion layer; an n-type second well diffusion layer; a p-type source diffusion layer; a p-type third well diffusion layer; a p-type drain diffusion layer; a gate insulating film; a gate electrode; a device isolation insulating film; and a buffer layer. The buffer layer is formed between the first well diffusion layer and the third well diffusion layer to be in contact with an end of the third well diffusion layer opposing the source diffusion layer, and extends from immediately below the gate insulating film to a position deeper than a peak of curvature of impurity concentration distribution of the third well diffusion layer. The buffer layer has an impurity concentration lower than an impurity concentration in the third well diffusion layer. | 2009-10-29 |
20090267145 | MOSFET DEVICE HAVING DUAL INTERLEVEL DIELECTRIC THICKNESS AND METHOD OF MAKING SAME - A method of forming a metal-oxide-semiconductor (MOS) device includes the following steps: forming a semiconductor layer of a first conductivity type having source and drain regions of a second conductivity type, a channel region and a lightly-doped drain region formed therein; forming a gate over the channel region proximate an upper surface of the semiconductor layer; after the forming steps, depositing a first dielectric layer having a first thickness over an upper surface of the semiconductor layer; etching the first dielectric layer in a region over the lightly-doped drain proximate to the gate to reduce its thickness; conformably depositing a second dielectric layer having a second thickness over the first dielectric layer, including in the etched region, the second thickness being less than the first thickness; and forming a shielding electrode over the second dielectric layer. | 2009-10-29 |
20090267146 | STRUCTURE AND METHOD FOR SEMICONDUCTOR POWER DEVICES - A semiconductor device includes a semiconductor-on-insulator region on a substrate. The semiconductor-on-insulator region includes a first semiconductor region overlying a dielectric region. The device includes an MOS transistor and a bipolar transistor. The MOS transistor has a drain region, a body region, and a source region in the first semiconductor region. The MOS transistor also includes a gate. The device also includes a second semiconductor region overlying the substrate and adjacent to the drain region, and a third semiconductor region overlying the substrate and adjacent to the second semiconductor region. The bipolar transistor includes has the drain region of the MOS transistor as an emitter, the second semiconductor region as a base, and the third semiconductor region as a collector. Accordingly, the drain of the MOS transistor also functions as the emitter of the bipolar transistor. Additionally, the gate and the base are coupled by a resistive element. | 2009-10-29 |
20090267147 | ESD PROTECTED RF TRANSISTOR - The electronic device comprising a RF transistor ( | 2009-10-29 |
20090267148 | Semiconductor integrated circuit devices - A semiconductor integrated circuit device may include: a substrate that includes a high-voltage device region and a low-voltage device region defined on the substrate; a first buried impurity layer formed in at least a portion of the high-voltage device region and coupled to a first voltage; a second buried impurity layer formed in at least a portion of the low-voltage device region and coupled to a second voltage less than the first voltage; and a well formed on the second buried impurity layer in the low-voltage device region and coupled to a third voltage less than the second voltage. | 2009-10-29 |
20090267149 | SOURCE/DRAIN JUNCTION FOR HIGH PERFORMANCE MOSFET FORMED BY SELECTIVE EPI PROCESS - In a field effect transistor (FET), halo features may be formed by etching into the surface of a silicon layer followed by a step of growing a first epitaxial silicon (epi-Si) layer on the etched silicon layer. Source (S) and drain (D), as well as S/D extension features may similarly be formed by etching an epitaxial silicon layer, then filling with another epitaxial layer. Source and Drain, and extensions, and halo, which are normally formed by diffusion, may be formed as discrete elements by etching and filling (epi-Si). This may provide a shallow, highly activated, abrupt S/D extension, an optimally formed halo and deep S/D diffusion doping, and maximized improvement of channel mobility from the compressive or tensile stress from e-SiGe or e-SiC. | 2009-10-29 |
20090267150 | Semiconductor Device and Method for Fabricating the Same - A method for fabricating a semiconductor device comprises: forming a gate pattern over a silicon active region and an insulating layer, which form a semiconductor substrate; removing the silicon active region exposed between the gate patterns; and filling a space between the gate patterns to form a plug. | 2009-10-29 |
20090267151 | SEMICONDUCTOR DEVICE, ELECTRONIC DEVICE, AND MANUFACTURING METHOD THEREOF - To provide a semiconductor device in which resistance of a source region and a drain region of a thin film transistor is reduced and a short channel effect is suppressed, and a manufacturing method thereof. The semiconductor device includes a gate electrode which is formed over a first semiconductor layer with a gate insulating film interposed therebetween; sidewalls which are formed on side surfaces of the gate electrode; and second semiconductor layers which are in contact with and stacked over end portions of the sidewalls and the first semiconductor layer, wherein the second semiconductor layers cover at least a part of the end portions of the sidewalls. | 2009-10-29 |
20090267152 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - A semiconductor device is disclosed having a conductive gate structure overlying a semiconductor layer having a major surface. An isolation material is recessed within a trench region below the major surface of the semiconductor layer. An epitaxial layer is formed overlying a portion of the major surface and on an active region forming a sidewall of the trench. | 2009-10-29 |
20090267153 | Localized Spacer For A Multi-Gate Transistor - In one embodiment, the present invention includes a double gate transistor having a silicon fin formed on a buried oxide layer and first and second insulation layers formed on a portion of the silicon fin, where at least the second insulation layer has a pair of portions extending onto respective first and second portions of the silicon fin to each act as a self-aligned spacer structure. Other embodiments are described and claimed. | 2009-10-29 |
20090267154 | MOS COMPRISING SUBSTRATE POTENTIAL ELEVATING CIRCUITRY FOR ESD PROTECTION - An integrated circuit ( | 2009-10-29 |
20090267155 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device has a semiconductor substrate, a semiconductor fin which is formed on the semiconductor substrate, which has a long side direction and a short side direction, and which has a carbon-containing silicon film including an impurity and a silicon film formed on the carbon-containing silicon film, a gate electrode which is formed to face both side surfaces of the semiconductor fin in the short side direction, source and drain regions which are respectively formed in the semiconductor fin located in the direction of both sides in the long side direction of the semiconductor fin so as to sandwich the gate electrode, and an element isolation insulating film which is formed on the side surface of the semiconductor fin and between the gate electrode and the semiconductor substrate. | 2009-10-29 |
20090267156 | DEVICE STRUCTURES INCLUDING DUAL-DEPTH TRENCH ISOLATION REGIONS AND DESIGN STRUCTURES FOR A STATIC RANDOM ACCESS MEMORY - Device structures and design structures for a static random access memory. The device structure includes a well of a first conductivity type in a semiconductor layer, first and second deep trench isolation regions in the semiconductor layer that laterally bound a device region in the well, and first and second pluralities of doped regions of a second conductivity type in the first device region. A shallow trench isolation region extends laterally across in the device region to connect the first and second deep trench isolation regions, and is disposed in the device region between the first and second pluralities of doped regions. The shallow trench isolation region extends from the top surface into the semiconductor layer to a first depth such that the well is continuous beneath the shallow trench isolation region. A gate stack controls carrier flow between a pair of the first plurality of doped regions. | 2009-10-29 |
20090267157 | METHOD OR MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE OBTAINED BY USING SUCH A METHOD - The invention relates to a method of manufacturing a semiconductor device ( | 2009-10-29 |
20090267158 | SEMICONDUCTOR DEVICE AND MANUFACTURING PROCESS THEREFOR - There is provided a semiconductor device in which deviation in a work function is prevented by a gate electrode having a uniform composition and which has excellent operation properties by effectively controlling a V | 2009-10-29 |
20090267159 | SEMICONDUCTOR DEVICE - A semiconductor device includes a semiconductor substrate, a p-channel MIS transistor formed on the substrate, the p-channel transistor having a first gate dielectric formed on the substrate and a first gate electrode layer formed on the first dielectric, and an n-channel MIS transistor formed on the substrate, the n-channel transistor having a second gate dielectric formed on the substrate and a second gate electrode layer formed on the second dielectric. A bottom layer of the first gate electrode layer in contact with the first gate dielectric and a bottom layer of the second gate electrode layer in contact with the second gate dielectric have the same orientation and the same composition including Ta and C, and a mole ratio of Ta to a total of C and Ta, (Ta/(Ta+C)), is larger than 0.5. | 2009-10-29 |
20090267160 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device comprises an anti-fuse element. The anti-fuse element includes a semiconductor substrate, a first gate insulating film, a first gate electrode, a high-concentration impurity region formed in the semiconductor substrate under the first gate electrode, and first source/drain regions provided in the semiconductor substrate on both sides of the high-concentration impurity region. The first source/drain regions contain an impurity having the same conduction type as conduction type of the high-concentration impurity region. | 2009-10-29 |
20090267161 | INCREASING BODY DOPANT UNIFORMITY IN MULTI-GATE TRANSISTOR DEVICES - Techniques and structures for increasing body dopant uniformity in multi-gate transistor devices are generally described. In one example, an electronic device includes a semiconductor substrate, a multi-gate fin coupled with the semiconductor substrate, the multi-gate fin comprising a source region, a drain region, and a gate region wherein the gate region is disposed between the source region and the drain region, the gate region being body-doped after a sacrificial gate structure is removed from the multi-gate fin and before a subsequent gate structure is formed, a dielectric material coupled with the source region and the drain region of the multi-gate fin, and the subsequent gate structure coupled to the gate region of the multi-gate fin. | 2009-10-29 |
20090267162 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device comprises: forming a gate insulator on a substrate, the gate insulator including a high-dielectric film in whole or part; forming a first metal film on the gate insulator; forming a second metal film on the first metal film; and forming a reaction film between the gate insulator and the first metal film by letting the high-dielectric film and the first metal film react with each other through a thermal treatment. | 2009-10-29 |
20090267163 | Semiconductor Device - According to the present invention, a semiconductor device having a field effect transistor is provided. The field effect transistor comprises a gate insulating film | 2009-10-29 |
20090267164 | METHOD OF MANUFACTURING A SEMICONDUCTOR SENSOR DEVICE AND SEMICONDUCTOR SENSOR DEVICE - The invention relates to a method of manufacturing a semiconductor sensor device ( | 2009-10-29 |
20090267165 | WAFER LEVEL PACKAGE STRUCTURE, AND SENSOR DEVICE OBTAINED FROM THE SAME PACKAGE STRUCTURE - A wafer level package structure with a plurality of compact sensors such as acceleration sensors and gyro sensors is provided. This package structure is composed of a semiconductor wafer with plural sensor units, and a pair of package wafers bonded to both surfaces of the semiconductor wafer. Each of the sensor units has a frame having an opening, a movable portion held in the opening to be movable relative to the frame, and a detecting portion for outputting an electric signal according to a positional displacement of the movable portion. Since the semiconductor wafer is bonded to each of the package wafers by a solid-phase direct bonding without diffusion between a surface-activated region formed on the frame and a surface-activated region formed on the package wafer, it is possible to prevent that variations in sensor characteristics occur due to residual stress at the bonding interface. | 2009-10-29 |
20090267166 | METHOD OF MANUFACTURING A DEVICE WITH A CAVITY - The invention relates to a micro-device with a cavity ( | 2009-10-29 |
20090267167 | DUAL-FACE FLUID COMPONENTS - A fluid component includes at least one substrate of a material that can be etched and an etch stop layer for said material means for detecting the properties of a fluid and/or for activating said fluid and provided on a first side of said etch stop layer and means for receiving said fluid, formed in the substrate and provided on the second side of the etch stop layer. | 2009-10-29 |
20090267168 | ELECTRET CAPACITOR TYPE COMPOSITE SENSOR - To provide a small, thin and light-weighted composite sensor which can also detect light together with sound, vibration, pressure or acceleration by a single sensor. | 2009-10-29 |
20090267169 | SEMICONDUCTOR PHOTODETECTOR - A semiconductor photodetector includes a semiconductor substrate of a first conductivity type, a light absorption layer of the first conductivity type on the semiconductor substrate and absorbing light, a diffraction grating layer on the light absorption layer and including a diffraction grating diffracting light, a first light transmissive layer of a second conductivity type on the diffraction grating layer and transmitting light, and a second light transmissive layer of the first conductivity type on the diffraction grating layer and surrounding the first light transmissive layer, the second light transmissive layer transmitting light. The diffraction grating surrounds a region of the diffraction grating layer that is directly below the first light transmissive layer. | 2009-10-29 |
20090267170 | Apparatus and Method For Using Spacer Paste to Package an Image Sensor - A packaged image sensor assembly utilizes a spacer paste to control the height of a transparent window above an image sensor die to provide safe wire bond clearance. A dam structure is used to control the height of the transparent window. The dam may be formed either entirely from spacer paste or by depositing the spacer paste on an underlying patterned mesa. An additional encapsulant is provided outside of the dam to encapsulate wirebonds and provide additional protection from moisture permeation. | 2009-10-29 |
20090267171 | PRE-ENCAPSULATED CAVITY INTERPOSER - A pre-encapsulated cavity interposer, a pre-encapsulated frame, for a semiconductor device. | 2009-10-29 |
20090267172 | METHOD OF MANUFACTURING AN IMAGE SENSING MICROMODULE - A method of manufacturing a micromodule including the steps of: producing an integrated circuit on an active face of a chip made of a semi-conductive material, making a via passing through the chip, electrically linked to the integrated circuit, and inserting the chip into a box comprising a cavity and an electrically conductive element, the active face of the chip being disposed towards the bottom of the cavity, forming on at least one part of a lateral face of the chip a conductive lateral layer made of an electrically conductive material, electrically linked to a conductive element of the rear face of the chip, and producing a connection between the conductive lateral layer and the conductive element by depositing an electrically conductive material in the cavity. | 2009-10-29 |
20090267173 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A semiconductor device includes a plurality of semiconductor integrated circuits bonded to a structure body in which a fibrous body is impregnated with an organic resin. The plurality of semiconductor integrated circuits are provided at openings formed in the structure body and each include a photoelectric conversion element, a light-transmitting substrate which has stepped sides and in which the width of the projected section on a first surface side is smaller than that of a second surface, a semiconductor integrated circuit portion provided on the second surface of the light-transmitting substrate, and a chromatic color light-transmitting resin layer which covers the first surface and part of side surfaces of the light-transmitting substrate. The plurality of semiconductor integrated circuits include the chromatic color light-transmitting resin layers of different colors. | 2009-10-29 |
20090267174 | SEMICONDUCTOR DEVICE WITH A CHARGE CARRIER COMPENSATION STRUCTURE IN A SEMICONDUCTOR BODY AND METHOD FOR ITS PRODUCTION - A semiconductor device with a charge carrier compensation structure in a semiconductor body and to a method for its production. The semiconductor body includes drift zones of a first conduction type and charge compensation zones of a second conduction type complementing the first conduction type. The drift zones include a semiconductor material applied in epitaxial growth zones, wherein the epitaxial growth zones include an epitaxially grown semiconductor material which is non-doped to lightly doped. Towards the substrate, the epitaxial growth zones are provided with a first conduction type incorporated by ion implantation over the entire surface and with selectively introduced doping material zones of a second, complementary conduction type. Towards the front side, the epitaxial growth zones are provided with a second, complementary conduction type incorporated by ion implantation over the entire surface and with selectively introduced doping material zones of the first conduction type. | 2009-10-29 |
20090267175 | DOUBLE PATTERNING TECHNIQUES AND STRUCTURES - Double patterning techniques and structures are generally described. In one example, a method includes depositing a first photoresist to a semiconductor substrate, forming a first integrated circuit (IC) pattern in the first photoresist, the first IC pattern comprising one or more trench structures, protecting the first IC pattern in the first photoresist from actions that form a second IC pattern in a second photoresist, depositing the second photoresist to the first IC pattern, and forming the second IC pattern in the second photoresist, the second IC pattern comprising one or more structures that are sufficiently close to the one or more trench structures of the first IC pattern to cause scumming of the second photoresist in the one or more trench structures of the first IC pattern. | 2009-10-29 |
20090267176 | A METHOD FOR FORMING A MULTI-LAYER SHALLOW TRENCH ISOLATION STRUCTURE IN A SEMICONDUCTOR DEVICE - The disclosure describes a multi-layer shallow trench isolation structure in a semiconductor device. The shallow trench isolation structure may include a first void-free, doped oxide layer in the shallow trench, and a second void-free layer above the first doped oxide layer. The first layer may be formed by vapor deposition of precursors of a source of silicon, a source of oxygen and sources of doping materials and making the layer void-free by reflowing the initial layer by an annealing process. The second layer may be formed by vapor deposition of precursors of silicon and doping materials and making the layer void-free by reflowing the initial layer by an annealing process. Alternatively, the second layer may be a silicon oxide layer that may be formed by an atomic layer deposition method. The processing conditions for forming the two layers are different. | 2009-10-29 |
20090267177 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME - A semiconductor device includes a semiconductor substrate including a semiconductor region surrounded with an element isolation region, a first insulating film formed on the semiconductor region, a pair of resistance elements located at the semiconductor region, each resistance element including a first conductive film formed on the first insulating film, a second insulating film formed on the first conductive film and a second conductive film formed on the second insulating film, a pair of first contact plugs formed on one of the resistance elements and arranged along a first direction relative to the semiconductor region, and a pair of second contact plugs formed on the other resistance element and arranged along the first direction. A first width of the resistance element is a second direction which is perpendicular to the first direction is smaller than half of a second width of the semiconductor region in the second direction. | 2009-10-29 |
20090267178 | DEVICE STRUCTURES FOR ACTIVE DEVICES FABRICATED USING A SEMICONDUCTOR-ON-INSULATOR SUBSTRATE AND DESIGN STRUCTURES FOR A RADIOFREQUENCY INTEGRATED CIRCUIT - Device structure for active devices fabricated in a semiconductor-on-insulator (SOI) substrate and design structures for a radiofrequency integrated circuit. The device structure includes a first isolation region in the semiconductor layer that extends from a top surface of a semiconductor layer to a first depth, a second isolation region in the semiconductor layer that extends from the top surface of the semiconductor layer to a second depth greater than the first depth, and a first doped region in the semiconductor layer. The first doped region is disposed vertically between the first isolation region and an insulating layer disposed between the semiconductor layer and a handle wafer of the SOI substrate. The device structure may be included in a design structure embodied in a machine readable medium for designing, manufacturing, or testing an integrated circuit. | 2009-10-29 |
20090267179 | SYSTEM FOR POWER PERFORMANCE OPTIMIZATION OF MULTICORE PROCESSOR CHIP - A system in one embodiment includes a multiprocessor chip comprising a plurality of cores; a plurality of power circuits, each power circuit being coupled to one of the cores; and an electrically programmable fuse in each power circuit. Each electrically programmable fuse further comprises a first electrode coupled to the associated power circuit; a second electrode coupled to the associated power circuit; a first pad coupled to the first electrode; a second pad coupled to the second electrode; and an electrically conductive material extending between the first and second electrodes and forming part of the associated power circuit, the electrically conductive material being characterized as tending to electromigrate from one of the electrodes to the other electrode under an applied electrical current passing between the electrodes, wherein the electromigration increases an overall resistance of the power circuit. | 2009-10-29 |
20090267180 | SEMICONDUCTOR DEVICE HAVING A REDUCED FUSE THICKNESS AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device that has a reduced fuse thickness without compromising the bondability of an associated pad and a method for manufacturing the same is described. The semiconductor device includes a pad and a fuse formed on a planar level. The pad and fuse are formed using a metal according to the metal used for the planar level on which the pad and fuse are formed. The pad is formed such that the center portion of the pad is positioned lower than that of the fuse. During the opening of the pad, the thickness of the fuse is reduced without reducing the thickness of the pad. A subsequent repair process can then be easily performed on the fuse having the reduced thickness without degrading the bondability of the pad. | 2009-10-29 |
20090267181 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device with a fuse | 2009-10-29 |
20090267182 | METHOD OF INCREASING THE QUALITY FACTOR OF AN INDUCTOR IN A SEIMICONDUCTOR DEVICE - A method of fabricating an inductor ( | 2009-10-29 |
20090267183 | Through-substrate power-conducting via with embedded capacitance - When integrated circuits are mounted on a substrate, little space is often available for the required large number of bypass capacitors. A novel substrate structure therefore includes many closely spaced through-holes that extend from a first surface of the substrate to a second surface of the substrate. Each through-hole includes a first conducting layer, a dielectric layer, and a second conducting layer. The first and second conducting layers and the intervening dielectric layer constitute a via having a substantial capacitance (one picofarad). Some of the many vias provide bypass capacitance directly under the integrated circuits. A first set of vias supplies power from a power bus bar on one side of the substrate to the integrated circuits on the other side. A second set of vias sinks current from the integrated circuits on the other side, through the substrate, and to a ground bus bar on the one side. | 2009-10-29 |
20090267184 | METAL-INSULATOR-METAL (MIM) CAPACITOR STRUCTURE AND METHODS OF FABRICATING SAME - A Metal-Insulator-Metal (MIM) capacitor structure and method of fabricating the same in an integrated circuit improve capacitance density in a MIM capacitor structure by utilizing a sidewall spacer extending along a channel defined between a pair of legs that define portions of the MIM capacitor structure. Each of the legs includes top and bottom electrodes and an insulator layer interposed therebetween, as well as a sidewall that faces the channel. The sidewall spacer incorporates a conductive layer and an insulator layer interposed between the conductive layer and the sidewall of one of the legs, and the conductive layer of the sidewall spacer is physically separated from the top electrode of the MIM capacitor structure. In addition, the bottom electrode of a MIM capacitor structure may be ammonia plasma treated prior to deposition of an insulator layer thereover to reduce oxidation of the electrode. Furthermore, a multi-rate etching process may be used to etch the top electrode and insulator layer of an MIM structure, using a first, higher rate to perform an anisotropic etch up to a point proximate an interface between the conductive and dielectric materials respectively defining the top electrode and insulator layer of the MIM structure, and then using a second, lower rate to perform an anisotropic etch to a point proximate an etch stop layer defined on the bottom electrode of the MIM structure. | 2009-10-29 |
20090267185 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device includes forming a wiring layer in a first insulating layer, forming a second insulating layer over the first insulating layer, forming a first conductive layer over the second insulating layer, forming a dielectric layer on the first conductive layer, forming a second conductive layer on the dielectric layer, selectively removing the second conductive layer to form an upper electrode on the dielectric layer, forming a first layer over the upper electrode and the dielectric layer, selectively removing the first layer, the dielectric layer, and the first conductive layer to form a lower electrode over which the dielectric layer and the first layer is entirely left, the upper electrode remaining partially over the lower electrode. | 2009-10-29 |
20090267186 | SEMICONDUCTOR STRUCTURE INCLUDING TRENCH CAPACITOR AND TRENCH RESISTOR - A structure and a method for fabrication of the structure use a capacitor trench for a trench capacitor and a resistor trench for a trench resistor. The structure is typically a semiconductor structure. In a first instance, the capacitor trench has a linewidth dimension narrower than the resistor trench. The trench linewidth difference provides an efficient method for fabricating the trench capacitor and the trench resistor. In a second instance, the trench resistor comprises a conductor material at a periphery of the resistor trench and a resistor material at a central portion of the resistor trench. | 2009-10-29 |
20090267187 | METHOD FOR MANUFACTURING AN ENERGY STORAGE DEVICE AND STRUCTURE THEREFOR - An energy storage device such as a metal-insulator-metal capacitor and a method for manufacturing the energy storage device. The metal-insulator-metal capacitor includes an insulating material positioned between a bottom electrode or bottom plate and a top electrode or top plate. The surface area of the bottom electrode is greater than the surface area of the insulating material and the surface area of the insulating material is greater than the surface area of the top electrode. The top electrode and the insulating layer have edges that are laterally within and spaced apart from edges of the bottom electrode. A protective layer covers the top electrode, the edges of the top electrode, and the portions of the insulating layer that are uncovered by the top electrode. The protective layer serves as an etch mask during the formation of the bottom electrode. | 2009-10-29 |
20090267188 | GALLIUM NITRIDE MATERIAL PROCESSING AND RELATED DEVICE STRUCTURES - Gallium nitride material devices and related processes are described. In some embodiments, an N-face of the gallium nitride material region is exposed by removing an underlying region. | 2009-10-29 |
20090267189 | PHOTO-PATTERNED CARBON ELECTRONICS - A system is provided for the manufacture of carbon based electrical components including, an ultraviolet light source; a substrate receiving unit whereby a substrate bearing a first layer of carbon based semiconductor is received and disposed beneath the ultraviolet light source; a mask disposed between the ultraviolet light source and the carbon based semiconductor layer; a doping agent precursor source; and environmental chemical controls, configured such that light from the ultraviolet light source irradiates a doping agent precursor and the first carbon layer. | 2009-10-29 |
20090267190 | Freestanding III-Nitride Single-Crystal Substrate and Method of Manufacturing Semiconductor Device Utilizing the Substrate - Freestanding III-nitride single-crystal substrates whose average dislocation density is not greater than 5×10 | 2009-10-29 |
20090267191 | SEMICONDUCTOR DEVICE AND PROCESS FOR PRODUCING THE SAME - A device and a device manufacturing process. First, a gettering layer is formed on the bottom surface of a silicon substrate. Gates having a MOS structure are then formed on the principal surface of the silicon substrate, and the gettering layer is removed. According to this manufacturing method, the formation of the gates having a MOS structure is performed such that the gettering layer getters dissolved oxygen present in the silicon substrate. This reduces the concentration of dissolved oxygen in the silicon substrate, resulting in improved device characteristics. | 2009-10-29 |
20090267192 | CMP METHODS AVOIDING EDGE EROSION AND RELATED WAFER - Methods of avoiding chemical mechanical polish (CMP) edge erosion and a related wafer are disclosed. In one embodiment, the method includes providing a wafer; forming a first material across the wafer; forming a second material at an outer edge region of the wafer, leaving a central region of the wafer devoid of the second material; and performing chemical mechanical polishing (CMP) on the wafer. The second material diminishes CMP edge erosion. | 2009-10-29 |
20090267193 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device includes a semiconductor substrate, a circuit region on the semiconductor substrate, a plurality of metal wires formed in the circuit region on the semiconductor device and a seal ring region surrounding the circuit region. A distance L between an outer periphery of the circuit region and an inner periphery of the seal ring region and a minimum interval W | 2009-10-29 |
20090267194 | SEMICONDUCTOR CHIP HAVING TSV (THROUGH SILICON VIA) AND STACKED ASSEMBLY INCLUDING THE CHIPS - A semiconductor chip having through silicon vias (TSV) and a stacked assembly including the chip are revealed. The chip has a plurality of first and second bonding pads disposed on two opposing surfaces of a semiconductor substrate respectively. Through hole vertically penetrate through the semiconductor substrate and the first and second bonding pads. By forming first extruded ring, the first bonding pad has a first contact surface located between the first extruded ring and the through hole. By forming second extruded ring, the second bonding pad has a second contact surface located outside and adjacent to the second extruded rings to encircle the second extruded ring. The second extruded ring has a proper dimension to fit in the first extruded ring. Accordingly, a plurality of semiconductor chip can be stacked each other with accurate alignment without shifting to effectively reduce the stacked assembly height, moreover, chip stacking processes are accomplished by vertically stacking a plurality of chips first then filling conductive material into the through holes without electrical short between the adjacent bonding pads due to overflow of conductive material to meet the fine-pitch requirements of TSV. The process flow for the stacked assembly is simplified with higher production yields. | 2009-10-29 |
20090267195 | SEMICONDUCTOR ELEMENT AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT - A semiconductor device of present invention comprises a layered structure including a cladding layer with a first conductivity, an active layer, and a cladding layer with a second conductivity which are successively grown on a semiconductor substrate of (001) orientation, and an embedding layer covering both side surfaces of the layered structure in a widthwise direction across a longitudinal direction of the layered structure in a plane parallel to a surface of the semiconductor substrate. A portion of side surfaces of the active layer in the widthwise direction lies parallel to at least (010) or (100) surface. | 2009-10-29 |
20090267196 | HIGH PERFORMANCE 3D FET STRUCTURES, AND METHODS FOR FORMING THE SAME USING PREFERENTIAL CRYSTALLOGRAPHIC ETCHING - The present invention relates to high performance three-dimensional (3D) field effect transistors (FETs). Specifically, a 3D semiconductor structure having a bottom surface oriented along one of a first set of equivalent crystal planes and multiple additional surfaces oriented along a second, different set of equivalent crystal planes can be used to form a high performance 3D FET with carrier channels oriented along the second, different set of equivalent crystal planes. More importantly, such a 3D semiconductor structure can be readily formed over the same substrate with an additional 3D semiconductor structure having a bottom surface and multiple additional surfaces all oriented along the first set of equivalent crystal planes. The additional 3D semiconductor structure can be used to form an additional 3D FET, which is complementary to the above-described 3D FET and has carrier channels oriented along the first set of equivalent crystal planes. | 2009-10-29 |
20090267197 | SEMICONDUCTOR DEVICE FOR PREVENTING THE LEANING OF STORAGE NODES AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device for preventing the leaning of storage nodes and a method of manufacturing the same is described. The semiconductor device includes support patterns that are formed to support a plurality of cylinder type storage nodes. The support patterns are formed of a BN layer and have a hexagonal structure. The BN layer forming the support patterns has compressive stress as opposed to tensile stress and can therefore withstand cracking in the support patterns. | 2009-10-29 |
20090267198 | SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR - The present invention provides a multilayer wiring technology by which high adhesiveness and high insulation reliability between wirings are obtained, while maintaining effective low capacitance between wirings. A semiconductor device is characterized in that a first insulating film is an insulating film formed of at least one layer which contains a siloxane structure containing silicon, oxygen and carbon; the siloxane structure in the inner part of the first insulating film contains a larger number of carbon atoms than the number of silicon atoms; and a modified layer which containing a smaller number of carbon atoms and a larger number of oxygen atoms per unit volume than the inner part of the first insulating film is formed on at least one of an interface between the first insulating film and the metal and an interface between the first insulating film and a second insulating film. | 2009-10-29 |
20090267199 | ISOLATION LAYER HAVING A BILAYER STRUCTURE FOR A SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME - An isolation layer of a semiconductor device and a process for forming the same is described herein. The isolation layer includes a trench that is defined and formed in a semiconductor substrate. A first liner nitride layer is formed on the surface of the trench and a flowable insulation layer is formed in the trench including the first liner nitride layer. The flowable insulation layer is formed such to define a recess in the trench. A second liner nitride layer is formed on the recess including the flowable insulation layer and the first liner nitride layer. Finally, an insulation layer is formed in the recess on the second liner nitride layer to completely fill the trench. | 2009-10-29 |
20090267200 | METHOD FOR MANUFACTURING A SEMICONDUCTOR SUBSTRATE INCLUDING LASER ANNEALING - A method for manufacturing a semiconductor device by laser annealing. One embodiment provides a semiconductor substrate having a first surface and a second surface. The second surface is arranged opposite to the first surface. A first dopant is introduced into the semiconductor substrate at the second surface such that its peak doping concentration in the semiconductor substrate is located at a first depth with respect to the second surface. A second dopant is introduced into the semiconductor surface at the second surface such that its peak doping concentration in the semiconductor substrate is located at a second depth with respect to the second surface, wherein the first depth is larger than the second depth. At least a first laser anneal is performed by directing at least one laser beam pulse onto the second surface to melt the semiconductor substrate, at least in sections, at the second surface. | 2009-10-29 |
20090267201 | Vertical Transmission Structure - A vertical transmission structure for high frequency transmission lines includes a conductive axial core and a conductive structure surrounding the conductive axial core. The vertical transmission structure is applied to a high-frequency flip chip package for reducing the possibility of underfill from coming in contact with the conductive axial core. | 2009-10-29 |
20090267202 | SEMICONDUCTOR PACKAGE - A semiconductor package includes a semiconductor chip, a number of pads, a number of lead bars and an encapsulation material. The semiconductor chip has an upper surface and an opposite bottom surface. Area of the upper surface exceeds that of the bottom surface. The pads are mounted on the upper surface of the semiconductor chip. The lead bars are located around the semiconductor chip and electrically connected with corresponding pads. The encapsulation material covers the semiconductor chip, the pads, the lead bars and the bonding wires. | 2009-10-29 |
20090267203 | MULTI-CHIP PACKAGE FOR REDUCING TEST TIME - A multi-chip package is provided. The multi-chip package includes semiconductor chips. The multi-chip package receives selection signals for selecting two or more chips in response to the selection signals. Any number of chips may be simultaneously selected for a test and the test time can be reduced. | 2009-10-29 |
20090267204 | EDGE SEAL FOR A SEMICONDUCTOR DEVICE AND METHOD THEREFOR - In one embodiment, an edge seal region of a semiconductor die is formed by forming a first dielectric layer on a surface of a semiconductor substrate near an edge of the semiconductor die and extending across into a scribe grid region of the semiconductor substrate. Another dielectric layer is formed overlying the first dielectric layer. An opening is formed through the first and second dielectric layers. The second dielectric layer is used as a mask for forming a doped region on the semiconductor substrate through the opening. A metal is formed that electrically contacts the doped region and an exterior edge of the first dielectric layer within the opening. | 2009-10-29 |
20090267205 | Zero-reflow TSOP stacking - The present invention mechanically integrates a flexible printed circuit pre-disposed with solder and flux and two or more leaded integrated circuit packages into an assembly that does not require a solder reflow process prior to the reflow cycle to attach the assembly to a printed circuit module. Each IC device includes: (1) a package having a top, a bottom and sides; and (2) external leads that extend out from one or more sides for electrical connectivity to a printed circuit module. Each flexible circuit includes: (1) a multi-segment pattern for each IC connection where there is a segment for: (a) attaching a package lead to the flexible printed circuit; (b) a segment for attaching a preformed piece of solder and flux; (c) a bridge for the solder to flow when heated to the package lead attach segment; (2) solder and flux and (3) adhesive to bond the flexible printed circuit to the packages and bond the packages together. | 2009-10-29 |
20090267206 | STACKED SEMICONDUCTOR PACKAGE - A stacked semiconductor package includes a circuit board with a number of pads disposed thereon, and a number of package units stacked on the circuit board. Each of the package units includes a substrate, a chip, an anisotropic conductive layer, and a number of conductive elements. The substrate has a first surface facing to the circuit board and a second surface opposite to the first surface, both of the first surface and the second surface have a number of pads disposed thereon. The chip is disposed on the substrate and electrically connected with the substrate. The anisotropic conductive layer is disposed between the substrate and the chip, and is capable of fixing the chip on the substrate. The conductive elements electrically connect the pads on the first surface of the substrate with the pads on the second surface of an adjacent substrate and the pads on the circuit board. | 2009-10-29 |
20090267207 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor package having a molding unit that seals bonding wires connected to electrode pads of a semiconductor chip is provided with through electrode units comprising bonding wires embedded therein and penetrating the molding unit. A leading end of the respective through electrode units is exposed from an upper surface of the molding unit and a lower surface of the molding unit. | 2009-10-29 |
20090267208 | SEMICONDUCTOR PACKAGE HAVING CHIP SELECTION THROUGH ELECTRODES AND STACKED SEMICONDUCTOR PACKAGE HAVING THE SAME - A stacked semiconductor package includes a plurality of stacked semiconductor chips each having a circuit unit, a data pad, and a chip selection pad. The plurality of stacked semiconductor chips also includes a plurality of chip selection through electrodes. The chip selection through electrodes penetrate the chip selection pads and the semiconductor chips, and the chip selection through electrodes receive chip selection signals. The chip selection pad of a semiconductor chip is electrically connected to the chip selection through electrode that receives the chip selection signal for selecting the semiconductor chip. The chip selection pad is electrically insulated from the chip selection through electrodes for receiving the chip selection signal for selecting a different semiconductor chip. | 2009-10-29 |
20090267209 | Semiconductor device - At a semiconductor device, an integrated circuit including an optoelectronic conversion device is formed on a front face of a sensor chip. A rewiring layer, which leads from pad electrodes, and post electrodes, on the rewiring layer, are formed on the sensor chip. At least a portion of surroundings of the rewiring layer and the post electrodes is sealed with sealing resin, so as to be open above the integrated circuit face. A light-transmissive substrate is disposed over the sealed sensor chip. Penetrating electrodes, corresponding with positions of the post electrodes disposed on the sensor chip, are formed in the light-transmissive substrate, and external terminals such as solder balls or the like are formed so as to electrically connect with the penetrating electrodes. | 2009-10-29 |
20090267210 | INTEGRATED CIRCUIT PACKAGE AND MANUFACTURING METHOD THEREOF - An integrated circuit package and a manufacturing method thereof are provided. The package includes a die pad, a plurality of first and second contact pads, a first die, a second die and a molding compound. The contact pads adjacent to at least one side of the die pad are arranged along an inner row and an outer row with respect to the die pad. The first die is fixed on the first die and electrically connected to the first contact pads by wire-bonding. The second die is fixed on the first die and electrically connected to the second contact pads by wire-bonding. The molding compound covers the second die, the first die, the die pad, the first contact pads and the second contact pads. The bottoms of the die pad, the first contact pads and the second contact pads are exposed at the bottom surface of the molding compound. | 2009-10-29 |
20090267211 | WAFER LEVEL PACKAGE AND METHOD OF FABRICATING THE SAME - Wafer level packages and methods of fabricating the same are provided. In one embodiment, one of the methods comprises forming semiconductor chips having a connection pad on a wafer, patterning a bottom surface of the wafer to form a trench under the connection pad, patterning a bottom surface of the trench to form a via hole exposing the bottom surface of the connection pad, and forming a connecting device connected to the connection pad through the via hole. The invention provides a wafer level package having reduced thickness, lower fabrication costs, and increased reliability compared to conventional packages. | 2009-10-29 |
20090267212 | Semiconductor Device - The invention offers technology for suppressing damage to semiconductor devices due to temperature changes. When flip-chip mounting a silicon chip on a buildup type multilayer substrate having a structure with a thinned core, a core having a small coefficient of thermal expansion is used in the multilayer substrate, and the coefficient of thermal expansion and glass transition point of the underfill are appropriately designed in accordance with the thickness and coefficient of thermal expansion of the core. By doing so, it is possible to relieve stresses inside the semiconductor package caused by deformation of the multilayer substrate due to temperature changes, and thereby to suppress damage to the semiconductor package due to temperature changes. | 2009-10-29 |
20090267213 | Structure and manufacturing method of a chip scale package with low fabrication cost, fine pitch and high reliability solder bump - A new method and package is provided for the mounting of semiconductor devices that have been provided with small-pitch Input/Output interconnect bumps. Fine pitch solder bumps, consisting of pillar metal and a solder bump, are applied directly to the I/O pads of the semiconductor device, the device is then flip-chip bonded to a substrate. Dummy bumps may be provided for cases where the I/O pads of the device are arranged such that additional mechanical support for the device is required. | 2009-10-29 |
20090267214 | ELECTRONIC CIRCUIT DEVICE AND METHOD FOR MANUFACTURING SAME - The electronic circuit device of the present invention includes at least one semiconductor element, a plurality of external connection terminals, a connecting conductor for electrically connecting semiconductor element and external connection terminals, and an insulating resin for covering the semiconductor element and supporting the connecting conductor integrally, in which the semiconductor element is buried in the insulating resin, and the terminal surface of the external connection terminals is exposed from the insulating resin. | 2009-10-29 |
20090267215 | POWER MODULE SUBSTRATE, METHOD FOR MANUFACTURING POWER MODULE SUBSTRATE, AND POWER MODULE - Disclosed is a power module having improved joint reliability. Specifically disclosed is a power module including a power module substrate wherein a circuit layer is brazed on the front surface of a ceramic substrate, a metal layer is brazed on the rear surface of the ceramic substrate and a semiconductor chip is soldered to the circuit layer. The metal layer is composed of an Al alloy having an average purity of not less than 98.0 wt. % but not more than 99.9 wt. % as a whole. In this metal layer, the Fe concentration in the side of a surface brazed with the ceramic substrate is set at less than 0.1 wt. %, and the Fe concentration in the side of a surface opposite to the brazed surface is set at not less than 0.1 wt. %. | 2009-10-29 |
20090267216 | INKJET PRINTED LEADFRAMES - Apparatuses and methods for inkjet printing electrical interconnect patterns such as leadframes for integrated circuit devices are disclosed. An apparatus for packaging includes a thin substrate adapted for high temperature processing, and an attach pad and contact regions that are inkjet printed to the thin substrate using a metallic nanoink. The nanoink is then cured to remove liquid content. The residual metallic leadframe or electrical interconnect pattern has a substantially consistent thickness of about 10 to 50 microns or less. An associated panel assembly includes a conductive substrate panel having multiple separate device arrays comprising numerous electrical interconnect patterns each, a plurality of integrated circuit devices mounted on the conductive substrate panel, and a molded cap that encapsulates the integrated circuit devices and associated electrical interconnect patterns. The molded cap is of substantially uniform thickness over each separate device array, and extends into the space between separate device arrays. | 2009-10-29 |
20090267217 | Semiconductor device - A semiconductor device ( | 2009-10-29 |
20090267218 | Heat Extraction from Packaged Semiconductor Chips, Scalable with Chip Area - A semiconductor device ( | 2009-10-29 |
20090267219 | ULTRA-THIN CHIP PACKAGING - A packaging method involves attaching a first chip to a stable base, forming contact pads at locations on the stable base, applying a medium onto the stable base such that it electrically insulates sides of the first chip, forming electrical paths on the medium, attaching a second chip to the first chip to form an assembly, and removing the stable base. A package has at least two chips electrically connected to each other, at least one contact pad, an electrically conductive path extending from the contact pad to a contact point on at least one of the chips, a planarizing medium, and a coating material on top of the planarizing medium. | 2009-10-29 |
20090267220 | 3-D STACKING OF ACTIVE DEVICES OVER PASSIVE DEVICES - Single-die or multi-die packaged modules that incorporate three-dimensional integration of active devices with discrete passive devices to create a package structure that allows active devices (such as, silicon or gallium-arsenide devices) to share the same footprint area as an array of passive surface mount components. In one example, a module includes at least one active device stacked on top of an array of passive surface mount components on a substrate. A conductive or non-conductive adhesive can be used to adhere the active device to the array of passive devices. | 2009-10-29 |
20090267221 | SEMICONDUCTOR DEVICE - An antenna formed on one surface side of a silicon substrate and a semiconductor element provided on the other surface side of the silicon substrate are electrically connected to each other by means of a through via penetrating the silicon substrate. A wiring board is formed separately from the silicon substrate. A passive element is provided on one surface side of the wiring board. A copper core solder ball is provided between the one surface side of the wiring board and the other surface side of the silicon substrate and electrically connects the silicon substrate and the wiring board to each other. | 2009-10-29 |
20090267222 | Low Voltage Drop and High Thermal Performance Ball Grid Array Package - An integrated circuit (IC) package is provided. The IC package includes a substantially planar substrate having a plurality of contact pads on a first surface electrically connected through the substrate to a plurality of solder ball pads on a second surface of the substrate, an IC die having a first surface mounted to the first surface of the substrate, and a heat sink assembly coupled to a second surface of the IC die and to a first contact pad on the first surface of the substrate to provide a thermal path from the IC die to the first surface of the substrate. The IC die has a plurality of I/O pads electrically connected to the plurality of contact pads on the first surface of the substrate. The IC die is mounted to the first surface of the substrate in a flip chip orientation. | 2009-10-29 |
20090267223 | MEMS Package Having Formed Metal Lid - A hermetic MEMS device ( | 2009-10-29 |
20090267224 | CIRCUIT DEVICE INCLUDING ROTATED STACKED DIE - In a particular embodiment, a circuit device includes a first die coupled to a circuit substrate and having a substantially planar surface. The first die includes electrical contacts distributed on the substantially planar surface adjacent to at least three edges of the first die. The circuit device further includes a second die attached to the substantially planar surface of the first die. The second die is rotated by an offset angle about an axis relative to the first die. The offset angle is selected to allow horizontal and vertical access to the electrical contacts. | 2009-10-29 |
20090267225 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - In a semiconductor integrated circuit sandwiched between a pair of a first impact resistance layer and a second impact resistance layer, an impact diffusion layer is provided between the semiconductor integrated circuit and the second impact resistance layer. By provision of the impact resistance layer against the external stress and the impact diffusion layer for diffusing the impact, force applied to the semiconductor integrated circuit per unit area is reduced, so that the semiconductor integrated circuit is protected. The impact diffusion layer preferably has a low modulus of elasticity and high breaking modulus. | 2009-10-29 |
20090267226 | HIGH-CONTRAST LASER MARK ON SUBSTRATE SURFACES - As part of a first configured laser operation, a smooth, more reflective marking area is formed at a surface of a substrate (e.g., integral heat spreader, or IHS). In a second configured laser operation, a mark is formed at the surface of the substrate within the marking area. The mark contrasts strongly with the reflective surface of the substrate in the marking area. As a result, the mark may be read with an optoelectronic imaging system with a higher rate of reliability than marks disposed at a substrate surface having a microtopographical profile with greater variation from a nominal surface plane. An IHS with a mark so disposed provides benefits when include as a portion of an integrated circuit package, which in turn provides benefits when included as a portion of an electronic system. | 2009-10-29 |
20090267227 | PLASTIC BALL GRID ARRAY RUGGEDIZATION - A method and product which provides a thin metal or ceramic plate to the top of a plastic grid array (PGA) as a stiffener to maintain its flatness over temperature during a column attach process, and the columns are used for attachment to circuit boards or other circuit devices. These may be constructed in this manner initially or may be retrofitted plastic ball grid arrays from which the solder balls are removed and, the stiffener is attached to the top, and the solder columns have been added to replace the solder balls. The stiffener is a bonded thin metal or ceramic plate attached to the top of the PGA to maintain its flatness over temperature during the column attach process. An aluminum plate bonded to the top of a PGA results in a significant reduction in warping during a temperature cycle. This allows attachment of solder columns to the PBGA. The high melt solder columns are attached to an area array pattern on the PBGA substrate. This array is typically either a solid or perimeter grid. It is critical that the ends of the solder columns opposite the ends attached to the substrate align precisely with the matching grid of solder pads on the printed wiring board. The purpose of the stiffening plate is to maintain the flatness of the PBGA during the process of attaching the columns to the substrate as well as attaching the component to the printed wiring board such that the columns maintain their alignment over this temperature range. | 2009-10-29 |
20090267228 | INTERMETALLIC DIFFUSION BLOCK DEVICE AND METHOD OF MANUFACTURE - One embodiment of the present invention is directed to an under bump metallurgy material. The under bump metallurgy material of this embodiment includes an adhesion layer and a conduction layer formed on top of the adhesion layer. The under bump metallurgy material of this embodiment also includes a barrier layer plated on top of the conduction layer and a sacrificial layer plated on top of the barrier layer. The conduction layer of this embodiment includes a trench formed therein, the trench contacting a portion of the barrier layer and blocking a path of intermetallic formation between the conduction layer and the sacrificial layer. | 2009-10-29 |