Patents - stay tuned to the technology

Inventors list

Assignees list

Classification tree browser

Top 100 Inventors

Top 100 Assignees


39th week of 2021 patent applcation highlights part 32
Patent application numberTitlePublished
20210301321METHODS AND DEVICES RELATED TO TOEHOLD-BASED STRAND DISPLACEMENT WITH LOOP-MEDIATED ISOTHERMAL AMPLIFICATION - Disclosed are methods for isothermal nucleic acid amplification and detection.2021-09-30
20210301322Analytical Toilet for Detecting Viruses in Urine - The invention is an analytical toilet and a method. The toilet, includes a bowl adapted to receive urine. A passage is provided for transferring a sample of the urine to a detection system. The detection system is configured to receive the sample and detect a virus. When the sample is brought into contact with the detection system, the detection system indicates the presence of a virus by generating a distinct signal. Preferably, the detection system makes use of a nucleic acid amplification test (NAAT), such as a quantitative PCR instrument. The method makes use of the analytical toilet and is designed to detect the presence or absence of targeted genetic material, preferably genetic material from a virus, such as SARS-CoV-2.2021-09-30
20210301323Method for Carrying Out Real-Time PCR - A method for carrying out a process for an amplification of nucleic acids with sample nucleic acids and reference nucleic acids being amplified in separate reaction batches. Signals of the amplification are observed in real time. A number of amplification cycles and/or a duration of the amplification process are dynamically adjusted depending on the observed signals of the amplification.2021-09-30
20210301324METHOD FOR ANALYZING FUNCTIONAL SUBUNIT PAIR GENE OF T CELL RECEPTOR AND B CELL RECEPTOR - The present disclosure provides a method for analyzing a functional subunit pair gene of a T cell receptor (TCR) or a B cell receptor (BCR). The present disclosure provides a method comprising: (1) a step for providing a nucleic acid sample containing a nucleic acid of a TCR or BCR from a cell expressing an activated TCR or BCR; (2) a step for determining the nucleic acid sequence of the functional pair gene of the TCR or the BCR; and (3) a step for calculating the frequency of appearance of each gene and combinations thereof on the basis of the determined nucleic sequences, and identifying a functional subunit pair gene of the TCR or the BCR.2021-09-30
20210301325POLYNUCLEOTIDES FOR THE AMPLIFICATION AND DETECTION OF CHLAMYDIA TRACHOMATIS - The invention provides methods and compositions for the detection of 2021-09-30
20210301326ANTIBIOTIC SUSCEPTIBILITY OF MICROORGANISMS AND RELATED METHODS AND SYSTEMS - Provided herein is an antibiotic susceptibility test and related compositions, methods and systems based on detection of a nucleic acid from a target microorganism in a sample in the presence or absence of a lysis treatment of the sample.2021-09-30
20210301327METHOD FOR THE DETECTION OF MICROORGANISMS, CORRESPONDING USE AND SAMPLE CARRIER - What is proposed is to provide a method for detecting microorganisms, for example of the Enterobacteriaceae family of bacteria, in a sample by means of delivery of identity-determining nucleic acid probes into the individual cell bodies, wherein the nucleic acid probes hybridize to the nucleic acids of the microorganisms, and subsequent optical detection of the hybridizations generated in the individual cell bodies, wherein a mixture of at least a first nucleic acid probe and a second nucleic acid probe is used, and wherein the first nucleic acid probe and the second nucleic acid probe respectively bind in one of two nonoverlapping regions of the target nucleic acid.2021-09-30
20210301328COMPOSITIONS AND METHODS FOR DIGITAL POLYMERASE CHAIN REACTION - In some aspects, the present disclosure provides methods for identifying sequence variants in a nucleic acid sample. In some embodiments, a method comprises distinguishing between a true mutation in a polynucleotide and a random error introduced during an amplification step. In some embodiments, the methods reduce the number of false positives reported by a digital PCR assay. In some embodiments, the methods improve the accuracy of a digital PCR assay.2021-09-30
20210301329Single Cell Genetic Analysis - Single cell genetic analysis methods are provided. Aspects of the methods include: (a) producing a plurality of partitioned cell/barcoded bead complexes from a cellular sample and a plurality of distinct barcoded beads that include a plurality of barcoded reverse gene-specific primers; (b) hybridizing gene-specific template binding domains of the barcoded reverse gene-specific primers to template nucleic acids of the cells to produce primed template nucleic acids; and (c) subjecting the primed template nucleic acids to primer extension reaction conditions sufficient to produce barcoded nucleic acids, e.g., for subsequent amplification and analysis, such as by Next Generation Sequencing (NGS) protocols. Also provided are compositions that find use in practicing embodiments of the methods.2021-09-30
20210301330METHOD AND KIT FOR DETECTING AND/OR QUANTIFYING A TARGET NUCLEOTIDE SEQUENCE - The present invention concerns a method for detecting and/or quantifying a target nucleotide sequence (2021-09-30
20210301331BIOCHIP AND MANUFACTURING METHOD THEREFOR - A chip and a manufacturing method for the chip, comprising a weak passivation treatment following a fixing treatment. The weak passivation treatment comprises putting a weak passivation reaction solution containing a catalyst into contact with a chip for the fixing treatment, so as to promote a DNA or protein to bond with a substrate surface, thus allowing the DNA or protein to be fully fixed on the substrate surface. Moreover, on such basis, a small molecule or protein is added for manufacturing the chip. The utilization of the manufacturing method, with the step of weak passivation treatment added after the fixing treatment, allows the DNA or protein to be fully fixed on the substrate surface, not only increases the quality and efficiency of the fixing of the DNA or protein, but also reduces nucleotide and protein non-specific adsorption, thus allowing the volume of the DNA or protein being fixed to be highly controllable and to have good repeatability; moreover, when the chip is utilized for sequencing, the interference of a non-specific signal is reduced, thus laying the foundation for manufacturing a high-quality available DNA or protein chip.2021-09-30
20210301332METHOD FOR DETERMINING SUCCESS OR FAILURE OF NUCLEIC ACID AMPLIFICATION, DEVICE FOR DETERMINING SUCCESS OR FAILURE OF NUCLEIC ACID AMPLIFICATION, AND NUCLEIC ACID AMPLIFICATION ANALYSIS SYSTEM - Disclosed is a method for determining a success or failure of a nucleic acid amplification comprising obtaining a measurement value corresponding to the amount of a nucleic acid amplified by a nucleic acid amplification reaction of a measurement sample containing the nucleic acid in a state in which the nucleic acid amplification reaction has reached a saturation state; and determining the success or failure of a nucleic acid amplification reaction based on the acquired measurement value.2021-09-30
20210301333METHODS AND KITS FOR HIGHLY MULTIPLEX SINGLE PRIMER EXTENSION - The present disclosure provides methods and kits for highly multiplex single primer extensions using a MutS protein and Mg2021-09-30
20210301334MEMBRANE BOUND NUCLEIC ACID NANOPORES - A membrane-spanning nanopore is provided, the nanopore comprising: a. one or more polynucleotide strands that provide a scaffold coma) ponent; and b. a plurality of polynucleotide strands that provide a plurality of staple components; wherein each of the plurality of staple components hybridise to the scaffold component; wherein the orientation of a major portion 7 nm of at least one polynucleotide strand comprised within the scaffold component is substantially parallel to a planar surface of a membrane as well as embedded within and substantially coplanar with the membrane; wherein the nanopore defines a channel that is suitable for perforating the membrane; the channel b) having a longitudinal axis extending along the centre thereof and a minimum internal dimension perpendicular to the longitudinal axis of at least about 3 nm. A membrane comprising the nanopore, biological sensors comprising the membrane and a method for molecular sensing using the membrane are also disclosed2021-09-30
20210301335FLOW CELLS WITH STABLE POLYMER COATING AND THEIR USES FOR GENE SEQUENCING - A flow cell article is provided where the flow cell article includes a substrate having one or more layers; a fluidic channel disposed in the substrate wherein the fluidic channel includes at least one reactive surface comprising: a coupling agent having a first functional group covalently attached to the substrate of the fluidic channel and a second imide functional group covalently attached to a polymer of formula (I), where R2021-09-30
20210301336METHOD FOR LABEL-FREE SINGLE-MOLECULE DNA SEQUENCING AND DEVICE FOR IMPLEMENTING SAME - A method and a device for determining a nucleotide sequence are proposed. The method comprises immobilizing circularized fragments of a nucleic acid and a polymerase on a sensor surface and adding a mixture of unlabeled nucleotides onto the sensor surface. Moreover, in the mixture added, the nucleotides of each type are present in their own concentration, which differs from the concentrations of the other three types of nucleotides. The time intervals between each of the charge separation events are determined and the registration steps for each nucleotide are repeated, regardless of the type of nucleotides. The nucleotide sequence of a nucleic acid molecule is determined by the analysis of the time intervals between each of the charge separation events registered, which result from the insertion, facilitated by the polymerase, of said unlabeled nucleotides into the growing nucleic acid chain. The device comprises a matrix having a plurality of sensor cells, and a digital-analog circuit, a microfluidic apparatus for feeding working solutions to the sensors, and data processing and display means.2021-09-30
20210301337METHODS FOR REDUCING GUANINE AND CYTOSINE (GC) BIAS IN NUCLEOTIDE SEQUENCE READ COUNTS - The invention generally relates to methods for analyzing nucleic acid sequence information. In some aspects, a sample is sequenced to obtain nucleic acid sequence information. In some aspects, an amount of GC bias in sequence information is determined. In some aspects, sequence information is corrected to account for the GC bias. In some aspects, corrected sequence information is analyzed.2021-09-30
20210301338METHODS FOR ANALYZING NUCLEIC ACIDS - Aspects of the present invention include analyzing nucleic acids from single cells using methods that include using tagged polynucleotides containing multiplex identifier sequences.2021-09-30
20210301339METHOD FOR ANALYZING NUCLEIC ACID DERIVED FROM SPECIMEN IN A PLURALITY OF REGIONS - Provided is a method for analyzing nucleic acids derived from specimens in a plurality of regions, wherein the method makes it possible to identify a region from which the base sequence information of a nucleic acid is derived, the nucleic acid being obtained from specimens (for example, single cells) present in the plurality of regions.2021-09-30
20210301340METHOD OF EVALUATING QUALITY OF BODY FLUID SPECIMEN - Reference miRNAs whose abundances are altered depending on quality change of a body fluid sample were identified to provide a method of evaluating the quality of a body fluid sample using as indices the abundances of the reference miRNAs in the sample.2021-09-30
20210301341METHODS FOR MEASURING RIBOSOMAL METHYLATION AGE - Described herein are methods for identifying the methylation age of a subject. Additionally, included herein are methods for identifying the age (e.g., the subjects chronological age minus the subjects methylation age) of a subject.2021-09-30
20210301342METHODS, AND SYSTEMS TO DETECT TRANSPLANT REJECTION - This application provides methods and systems for determining transplant status. In some embodiments, the method comprises obtaining a biological sample from an organ transplant recipient who has received an organ; isolating cell-free nucleic acids from the biological sample; measuring the amount of each allele of one or more polymorphic nucleic acid targets in the biological sample; identifying the donor specific allele using a computer algorithm based on the measurements of the one or more polymorphic nucleic acid targets, whereby detecting one or more donor-specific circulating cell-free nucleic acids, detecting tissue injury based on the presence or amount of said one or more donor-specific nucleic acids, thereby determining transplant status.2021-09-30
20210301343METHOD AND SYSTEM FOR ESTIMATING WHETHER A FEMALE IS PREGNANT BASED ON A BLOOD SAMPLE - A method for estimating whether a female is pregnant, said method comprising measuring allele presences (D) for a plurality of genetic markers of at least one chromosome, different from the X and Y chromosome, in a sample of cell-free DNA from a potentially pregnant female; each allele presence representing the presence at a genetic marker of at least one of: a reference allele of maternal or foetal origin, and an alternative allele of maternal or foetal origin; based on said measured allele presences, determining a homozygous fraction (F2021-09-30
20210301344METHOD FOR STRATIFYING THE RISK OF BK VIRUS NEPHROPATHY AFTER A KIDNEY TRANSPLANT - The present application describes and claims a novel method for identifying and stratifying the risk of developing a BK virus nephropathy (“Nx BK-v” below) in patients having undergone a kidney transplant. This method uses an index combining at least three bio-markers: i) the intensity of the anti-BK-v memory T lymphocyte response (memory T lymphocytes which are specific to v, hereinafter “LTm anti-BK-v”), ii) the number of occurrences of incompatibility in the HLA alleles of class I and class II between the donor and the recipient of the graft, taking into account iii) the viral charge of the BK-v virus in the whole blood of the patient. The present method allows a very precise evaluation of the risk of developing an Nx BK-v during the months following the test with the aim of optimising the immuno-suppressive treatment in order to better preserve the transplanted kidney. 2021-09-30
20210301345METHOD OF DIAGNOSING ASTHMA SUBTYPES - Methods of diagnosing an asthma subtype in a patient using a combinatory asthma endotyping assay are described. In various embodiments, a kit and a marker panel may be used in these methods.2021-09-30
20210301347BIOMARKERS FOR EARLY EMBRYONIC VIABILITY AND METHODS THEREOF - A method for determining early embryonic mortality (EM) in a female bovine includes determining an extracellular vesicle derived micro-ribonucleic acid expression profile of a serum (serum EV miRNA) obtained at from about 15 to about 30 days of gestation. The serum EV miRNA expression profile is compared to at least one reference serum EV miRNA expression profile to determine a serum EV miRNA expression profile indicative of early EM (EM EV miRNA expression profile). The EM EV miRNA expression profile may consist of an increased amount of at least one of miR-25, miR-16a/b, or miR-3596 compared to the at least one reference serum EV miRNA expression profile. Representative EM EV miRNA expression profiles and kits for determining EM EV miRNA expression profiles are provided.2021-09-30
20210301348EPIGENOMIC PROFILING REVEALS THE SOMATIC PROMOTER LANDSCAPE OF PRIMARY GASTRIC ADENOCARCINOMA - The present invention relates to a method for determining the presence or absence of at least one promoter in a cancerous biological sample relative to a non-cancerous biological sample. The present invention also relates to a method for determining the prognosis of cancer in a subject, a method for modulating the activity of at least one cancer-associated promoter in a cell, a method for modulating the immune response of a subject to cancer, a method for determining the presence of at least one cancer-associated promoter in a cancerous biological sample relative to a non-cancerous biological sample and a biomarker for detecting cancer in a subject.2021-09-30
20210301349COMPOSITIONS AND METHODS FOR TREATING A TUMOR SUPPRESSOR DEFICIENT CANCER - As described below, the present invention features compositions and methods of treating cancers characterized by the loss of Pten, Zbtb7a/Pokemon, p53, Pml and other tumor suppressors by inhibiting the expression or activity of CXCL5; and methods for identifying therapeutics using a murine platform.2021-09-30
20210301350LUNG CANCER DETERMINATIONS USING MIRNA - The present invention provides a method of determining the presence of a pulmonary tumor in a subject is provided. Also provided is a method of determining the presence of an aggressive pulmonary tumor in a subject. Additionally, a method of determining the risk of manifesting a pulmonary tumor in a subject is provided. Further provided is a method of determining the risk of manifesting an aggressive pulmonary tumor in a subject. A method for predicting the risk of developing or having a pulmonary tumor in a subject is also provided. A method of establishing lung cancer treatment options is additionally provided.2021-09-30
20210301351BIOMARKER COMPOSITION FOR PREDICTING CANCER MALIGNANT PROGNOSIS INDUCED BY MICROPLASTIC EXPOSURE - The present invention relates to a biomarker composition for predicting the prognosis of cancer malignancy induced by exposure to microplastics and use thereof, and more particularly, it was confirmed that the expression level of CD44, E-cadherin, N-cadherin, PD-L1, NPAS2, NR1D1, DNMT1, SLC7A2, PCDH7 and CLDN7 was changed in cancer cell lines and animal models treated with polystyrene microspheres which are the one type of microplastic for 4 weeks, and malignancy was induced due to an increase in proliferation, migration and invasion of cancer cells by the change in the expression level of the gene, and 5-year overall survival rates in gastric cancer patients decreased and thus the genes may be provided as a biomarker composition for predicting the prognosis of cancer malignancies by exposure to microplastics.2021-09-30
20210301352RESPONSE TO EGFR BLOCKADE - Recent large-scale analyses have demonstrated that the genomic landscape of human cancer is complex and variable among individuals of the same tumor type. Such underlying genetic differences may in part be responsible for the varying therapeutic responses observed in cancer patients. To examine the effect of somatic genetic changes in colorectal cancer on sensitivity to a common targeted therapy, we performed complete exome sequence and copy number analyses of 129 tumors that were KRAS wild-type and analyzed their response to anti-EGFR antibody blockade in patient-derived tumorgraft models. In addition to previously identified genes, we detected mutations in ERBB2, EGFR, FGFR1, PDGFRA, and MAP2K1 as potential mechanisms of primary resistance to this therapy. Alterations in the ectodomain of EGFR were identified in patients with acquired resistance to EGFR blockade. Amplifications and sequence changes in the tyrosine kinase receptor adaptor gene IRS2 were identified in tumors with increased sensitivity to anti-EGFR therapy. Therapeutic resistance to EGFR blockade could be overcome in tumorgraft models through combinatorial therapies targeting actionable genes. These analyses provide a systematic approach to evaluate response to targeted therapies in human cancer, highlight additional mechanisms of responsiveness to anti-EGFR therapies, and provide additional avenues for intervention in the management of colorectal cancer.2021-09-30
20210301353GENE SIGNATURES FOR PREDICTING METASTASIS OF MELANOMA AND PATIENT PROGNOSIS - The disclosure provides gene signatures of classifying an individual afflicted with cutaneous melanoma. The “SLN gene signatures” provided herein classify an individual based on prognosis and/or classify an individual as having a metastasis-positive or -negative sentinel lymph node (SLN). The “N-SLN gene signatures” provided herein classify an individual as having a metastasis-positive or -negative non-sentinel lymph node (N-SLN).2021-09-30
20210301354VIRAL DETECTION USING TEMPLATE EMULSIFICATION - The disclosure provides methods and systems for multiplex viral detection using monodisperse emulsion droplets and template particles.2021-09-30
20210301355ASSAY FOR DETECTING PALMER AMARANTH DNA IN INDIVIDUAL AND MIXED SAMPLES - The present invention provides methods and kits for identifying 2021-09-30
20210301356CELL-FREE NUCLEIC ACIDS FOR THE ANALYSIS OF THE HUMAN MICROBIOME AND COMPONENTS THEREOF - Methods, devices, compositions and kits are provided for analysis of the microbiome or individual components thereof in an individual. The methods find use in a determination of infection, in analysis of the microbiome structure, in determining the immunocompetence of an individual, and the like. In some embodiments of the invention, the individual is treated with an therapeutic regimen, e.g. drugs, diet, radiation therapy, and the like.2021-09-30
20210301357COMPREHENSIVE AND COMPARATIVE FLOW CYTOMETRY-BASED METHODS FOR IDENTIFYING THE STATE OF A BIOLOGICAL SYSTEM - The invention provides comprehensive and comparative flow cytometry-based methods for characterizing the state of a biological system by determining cell phenotypes and associated gene expression profiles.2021-09-30
20210301358METHODS AND SYSTEMS FOR INCREASING THE CARBON CONTENT OF DIRECT REDUCED IRON IN A REDUCTION FURNACE - A method for producing direct reduced iron having increased carbon content, comprises: providing a carbon monoxide-rich gas stream, and separating the carbon monoxide-rich gas stream into at least two separate carbon monoxide-rich gas streams; providing a hydrocarbon-rich gas stream and separating the hydrocarbon-rich gas stream into at least two separate hydrocarbon-rich gas streams; blending one of the carbon monoxide-rich gas streams with one of the hydrocarbon-rich gas streams to form a mixed carburizing gas stream; blending another carbon monoxide-rich gas stream of the at least two separate carbon monoxide-rich gas streams with another hydrocarbon-rich gas stream of the at least two separate hydrocarbon-rich gas streams to form a distinct mixed carburizing gas stream; delivering each of the mixed carburizing gas streams, which are of different composition, to a transition zone of a direct reduction furnace, and exposing partially or completely reduced iron oxide to the mixed carburizing gas streams to increase the carbon content of resulting direct reduced iron to greater than 4.5 wt. %.2021-09-30
20210301359INTEGRATION OF DR PLANT AND ELECTRIC DRI MELTING FURNACE FOR PRODUCING HIGH PERFORMANCE IRON - A direct reduction process comprises providing a shaft furnace of a direct reduction plant to reduce iron oxide with reducing gas; providing a direct reduced iron melting furnace; and coupling a discharge chute between a discharge exit of the direct reduced shaft furnace and an inlet of the direct reduced iron melting furnace; wherein direct reduced iron and the reducing gas from the shaft furnace flow through the discharge chute and the reducing gas controls the melting furnace atmosphere to reducing environment.2021-09-30
20210301360METHOD AND SYSTEM FOR HEATING DIRECT REDUCED IRON (DRI) BETWEEN A DRI SOURCE AND PROCESSING EQUIPMENT FOR THE DRI - A method of heating direct reduced iron between a direct reduced iron source and processing equipment for the direct reduced iron, comprises providing a conduit heater assembly between the direct reduced iron source and the processing equipment, wherein the conduit heater assembly receives a flow of the direct reduced iron from the direct reduced iron source and heats the direct reduced iron as the direct reduced iron flows through the conduit heater assembly and to the processing equipment.2021-09-30
20210301361TOOL FOR A HYDRAULIC HAMMER - A tool for a machine implement is disclosed. The tool may include a hardened portion of a material and a softened portion of the material. The hardened portion may extend along and encompass a longitudinal axis of the tool between a base end and a tip end of the tool. The softened portion may extend along and be offset from the longitudinal axis of the tool between the base end and the tip end of the tool.2021-09-30
202103013623D PRINTABLE HARD FERROUS METALLIC ALLOYS FOR POWDER BED FUSION - Alloy compositions for 3D metal printing procedures which provide metallic parts with high hardness, tensile strengths, yield strengths, and elongation. The alloys include Fe, Cr and Mo and at least three or more elements selected from C, Ni, Cu, Nb, Si and N. As built parts indicate a tensile strength of at least 1000 MPa, yield strength of at least 640 MPa, elongation of at least 3.0% and hardness (HV) of at least 375.2021-09-30
20210301363NON-ORIENTED ELECTRICAL STEEL SHEET - This non-oriented electrical steel sheet includes a base metal having a predetermined chemical composition satisfying the expression [Si+0.5×Mn≥4.3], and an average grain size of the base metal is more than 40 μm and 120 μm or less.2021-09-30
20210301364PRODUCING A HARDENED STEEL PRODUCT - Producing a hardened steel product can comprise providing a steel substrate of a hardenable steel; coating the steel substrate with an aluminum precoating, wherein the precoating is applied to the steel substrate with a thickness of at least 34 μm; flexible rolling the pre-coated steel substrate to produce a variable thickness along the length of the precoated steel substrate, wherein the precoating is rolled out to a reduced first thickness of less than 33 μm in thinner first portions and to a reduced second thickness thicker than the reduced first thickness in thicker second portions; working out a blank from the flexibly rolled steel substrate; heating the blank to austenitizing temperature, wherein diffusion processes take place between the base material and the precoating; and hot forming the heated blank, wherein the heated blank is formed and rapidly cooled such that a hardened steel product with coating is produced.2021-09-30
20210301365STEEL FOR PRESSURE VESSEL HAVING EXCELLENT SURFACE QUALITY AND IMPACT TOUGHNESS, AND METHOD FOR MANUFACTURING SAME - An aspect of the present invention provides: a steel for a pressure vessel, the steel having excellent surface quality while having excellent strength and toughness even after a long-term post-weld heat treatment (PWHT); and a method for manufacturing same.2021-09-30
20210301366METHOD FOR INCREASING THE STRAIGHTNESS OF A THIN WIRE - A method for producing a further wire, wherein the method includes, providing a first wire and feeding the first wire through a furnace to obtain the further wire. A further cast of the further wire is larger than a first cast of the first wire.2021-09-30
20210301367Laser Shock Peening Apparatus - A system for performing a laser peening application on a workpiece. A purge system is included with the system to provide a compartment housing combustion sources with compressed air so that the compartment has an increased air pressure. Also, a method of operating the system in which power is provided to the system, but only the purge system operates initially. Only after the purge system has bene operating, are the other subsystems and components of the systems, like the laser, provided with operational power.2021-09-30
20210301368LASER SHOCK PEENING APPARATUS - A laser shock peening device and components thereof. The optical system of the laser peening device includes sapphire optical elements, such as a lens or a prism. A water channel is provided in a pen for the laser shock peening device that has a curved flow path to direct the water. An air conduit in the pen provides a stream of air to the surface receiving the laser shock peening treatment.2021-09-30
20210301369Laser Shock Peening Apparatus - A system and device for laser shock peening device and components thereof. The system includes umbilical cords with flexible outer sheaths surrounding the fiber optic cable within the umbilical. The umbilical may include two different sections with different outer sheathes. The applicator device may have a laser peening pen that has a longitudinal axis that is spaced from the longitudinal axis of the applicator device. In a method of operating the device, a first step includes a vertical movement, followed by a second step of rotation movement, and then another step of vertical movement opposite the first step.2021-09-30
20210301370Binder Formulation - A binder formulation for iron ore pellets, the formulation comprising one or more silicates and a processing aid, a pellet comprising this binder formulation and a process for producing iron ore pellets comprising mixing a binder formulation as described with particulate iron ore and forming pellets.2021-09-30
20210301371METHOD OF IMPROVING GOLD RECOVERY IN A CYANIDE LEACHING CIRCUIT - This disclosure provides a method of improving gold recovery in a cyanide leaching circuit comprising a gold ore slurry. The method includes the step of providing a gold recovery additive chosen from polyacrylic acid, copolymers of acrylic acid and a sulfonated co-monomer, and combinations thereof, wherein the additive has a weight average molecular weight of from about 500 to about 10,000 g/mol. The method also includes the step of combining the gold recovery additive with the gold ore slurry in the cyanide leaching circuit, wherein the gold recovery additive is present in an amount of from about 10 to about 1000 g per ton of dry gold ore to improve the recovery of gold from the gold ore slurry.2021-09-30
20210301372NICKEL-BASED ALLOY POWDER - A nickel-based alloy powder for additive manufacturing having in weight %:C:0.09 to 0.17, Ti:3.8 to 4.5, Zr:>0.06, W:1.8 to 2.6, and Al:3.0 to 3.8 is disclosed.2021-09-30
20210301373WROUGHT MAGNESIUM ALLOY HAVING IMPROVED PROPERTIES, METHOD OF MANUFACTURING SAME, AND HIGH-SPEED EXTRUSION METHOD USING SAME - This application relates to a wrought magnesium alloy and a method of manufacturing the same, and a high-speed extrusion method for manufacturing an extrudate using the same. In one aspect, the magnesium alloy includes 2.0 wt % to 8.0 wt % of bismuth (Bi), 0.5 wt % to 6.5 wt % aluminum (Al), the balance of magnesium (Mg), and inevitable impurities. Using a magnesium alloy for high-speed extrusion according to the present disclosure, it is possible to manufacture a magnesium alloy extrudate having a good surface quality without hot cracking even under high-temperature (extrusion temperature: 300° C. to 450° C.) and high-speed (die-exit speed: 40 m/min to 80 m/min) extrusion conditions. Furthermore, the extrudate manufactured from the magnesium alloy exhibits greatly improved strength and elongation compared to existing magnesium extrudates even when the alloy does not contain a rare-earth metal.2021-09-30
20210301374TANTALUM BASED ALLOY THAT IS RESISTANT TO AQUEOUS CORROSION - A tantalum or tantalum alloy which contains pure or substantially pure tantalum and at least one metal element selected from the group consisting of Ru, Rh, Pd, Os, Ir, Pt, Mo, W and Re to form a tantalum alloy that is resistant to aqueous corrosion. The invention also relates to the process of preparing the tantalum alloy.2021-09-30
20210301375BCC DUAL PHASE REFRACTORY SUPERALLOY WITH HIGH PHASE STABILITY AND MANUFACTURING METHOD THEREFORE - Disclosed are a BCC dual phase refractory superalloy with high phase stability and a manufacturing method therefor, the alloy comprising one or more of Ti, Zr, and Hf as Group 4 transition metals, one or more of Na and Ta as Group 5 transition metals, and Al, and having a structure of a BCC phase, wherein the BCC phase is composed of a disordered BCC phase and an ordered BCC phase, and wherein the ordered BCC phase is formed by allowing Al, which is a BCC phase forming element, to be soluted in an area of the BCC phase where the contents of the Group 5 transition metals are more than those of the Group 4 transition metals, so that the present disclosure provides a BCC dual phase refractory superalloy with high phase stability, characterized in that when a BCC dual phase with the ordered BCC phase and the disordered BCC phase separated from each other is formed by aging, the aging condition is precisely controlled through the apex temperature (T2021-09-30
20210301376HIGH-TENSILE STEEL CONTAINING MANGANESE, USE OF SAID STEEL FOR FLEXIBLY-ROLLED SHEET-PRODUCTS, AND PRODUCTION METHOD AND ASSOCIATED STEEL SHEET-PRODUCT - A high-strength, manganese-containing steel, in particular for producing a flexibly rolled flat steel product in the form of a hot or cold strip, includes the following chemical composition (in wt. %): C: 0.005 to 0.6; Mn: 4 to 10; Al: 0.005 to 4; Si: 0.005 to 2; P: 0.001 to 0.2; S: up to 0.05; N: 0.001 to 0.3; with the remainder being iron including unavoidable steel-associated elements, with optional alloying of one or more of the following elements (in wt. %): Sn: 0 to 0.5; Ni: 0 to 2; Cu: 0.005 to 3; Cr: 0.1 to 4; V: 0.005 to 0.9; Nb: 0.005 to 0.9; Ti: 0.005 to 0.9; Mo: 0.01 to 3; W: 0.1 to 3; Co: 0.1 to 3; B: 0.0001 to 0.05; Zr: 0.005 to 0.5; Ca: 0.0002 to 0.1 which has a good combination of strength, expansion and deformation properties.2021-09-30
20210301377SOFT MAGNETIC ALLOY, MAGNETIC CORE, MAGNETIC COMPONENT, AND ELECTRONIC DEVICE - The present invention provides a soft magnetic alloy having good soft magnetic properties. The soft magnetic alloy includes nanocrystals having an average Heywood diameter value of 5.0 nm or more and 25.0 nm or less, in which an average circularity of the nanocrystals is 0.50 or more and 0.90 or less.2021-09-30
20210301378HIGH-Mn STEEL AND METHOD OF PRODUCING SAME - Provided is a high-Mn steel having excellent low-temperature toughness and excellent surface characteristics. A high-Mn steel comprises: a chemical composition containing, in mass %, C: 0.100 to 0.700%, Si: 0.05 to 1.00%, Mn: 20.0 to 35.0%, P: ≤0.030%, S: ≤0.0070%, Al: 0.010 to 0.070%, Cr: 0.50 to 5.00%, N: 0.0050 to 0.0500%, O: ≤0.0050%, Ti: ≤0.005%, and Nb: ≤0.005%, with a balance consisting of Fe and inevitable impurities; and a microstructure having austenite as a matrix, wherein in the microstructure, a Mn concentration of a Mn-concentrated portion is 38.0% or less, and an average KAM value is 0.3 or more, yield stress is 400 MPa or more, absorbed energy vE2021-09-30
20210301379AUSTENITIC STAINLESS STEEL ALLOYS AND TURBOCHARGER COMPONENTS FORMED FROM THE STAINLESS STEEL ALLOYS - Disclosed is an austenitic stainless steel alloy that includes or consists of, by weight, about 24.0% to about 26.0% chromium, about 13.0% to about 20.0% nickel, about 4.5% to about 5.5% manganese, about 1.2 to about 1.5% niobium, about 1.0% to about 2.0% silicon, about 0.4% to about 0.5% carbon, about 0.2% to about 0.3% nitrogen, and a balance of iron with inevitable/unavoidable impurities. The elements tungsten and molybdenum are excluded beyond impurity levels. Turbocharger turbine housings made of the stainless steel alloy are also disclosed. The stainless steel alloy is suitable for use in turbocharger turbine applications for temperatures beyond about 1050° C., such as up to about 1070° C.2021-09-30
20210301380ALLOY RIBBON AND LAMINATED CORE - An alloy ribbon that is an alloy ribbon containing a metal as a main component, and has a recess on at least one principal surface, in which a depth of the recess is 5% or more and 75% or less of an average thickness.2021-09-30
20210301381PROCESS OF MAKING COMPONENTS FOR ELECTRONIC AND OPTICAL DEVICES USING LASER PROCESSING INCLUDING ABLATION - The present invention relates to processes of making components for electronic and optical devices using laser processing and devices comprising such components. Such process uses a laser to introduce chemical and/or structural changes in substrates and films that are the raw materials from which components for electronic and optical devices are made. Such process yields components that can have one or more electronic and/or optical functionalities that are integrated on the same substrate or film. In addition, such process does not require large-scale clean rooms and is easily configurable. Thus, rapid device prototyping, design change and evolution in the lab and on the production side is realized.2021-09-30
20210301382Composite Aluminum Alloy Plate and Method of Making the Same for Case of Electronic Product - A composite aluminum alloy plate for a case of an electronic product contains: a first aluminum alloy plate and a second aluminum alloy plate. The first aluminum alloy plate is made of first aluminum alloy material, and the second aluminum alloy plate is made of second aluminum alloy material. The first aluminum alloy material is selected from any one of 6XXX series aluminum alloy to 8XXX series aluminum alloy, and the second aluminum alloy material is selected from any one of 1XXX series aluminum alloy to 5XXX series aluminum alloy. The first and second aluminum alloy plates are stacked and compounded in a hot rolling manner so as to produce the composite aluminum alloy plate having an external layer, an intermediate layer, and an internal layer. Thereafter, the composite aluminum alloy plate is laminated in a cold rolling manner and is stabilized in a refining manner.2021-09-30
20210301383PRODUCTION METHOD OF Al-Mg-Si SERIES ALUMIUNUM ALLOY FORGED PRODUCT - A method of producing an Al—Mg—Si-based aluminum alloy forged product, includes a solution heat treatment step of performing a solution heat treatment for heating the forged product obtained in the forging step at a temperature rising rate of 5.0° C./min or more from 20° C. to 500° C. and holding the forged product at 530° C. to 560° C. for 0.3 hours to 3 hours, a quench treatment step of quenching the forged product in a water tank by bringing an entire surface of the forged product into contact with quenching water within 5 seconds to 60 seconds after the solution heat treatment step for more than 5 minutes and not more than 40 minutes, and an aging treatment step of performing an aging treatment by heating the forged product after the quench treatment step at a temperature of 180° C. to 220° C. for 0.5 hours to 1.5 hours.2021-09-30
20210301384BERYLLIUM COPPER ALLOY RING AND METHOD FOR PRODUCING SAME - Provided is a method for producing a beryllium copper alloy ring including: providing a columnar forged material made of a beryllium copper alloy, opening a hole from a center of an upper surface of the columnar forged material in a direction parallel to a central axis of the columnar forged material to make a ring intermediate product, performing ring forging on the ring intermediate product, thereby expanding the hole such that a reduction ratio of 63% or more is achieved to make a ring-forged product, wherein the reduction ratio is specified by the following expression: P=100×(T−t)/T, wherein P represents the reduction ratio (%), T represents a thickness (mm) of the ring intermediate product, and t represents a thickness (mm) of the ring-forged product, and performing a solution annealing and a precipitation hardening on the ring-forged product to make the beryllium copper alloy ring.2021-09-30
20210301385METHOD OF PATTERNING QUANTUM DOTS, DEVICE USING SAME, AND SYSTEM THEREOF - A method of patterning quantum dots, a device using same, and a system thereof are provided. By providing a base between a plurality of upper electrodes and a plurality of lower electrodes, coating a quantum dot solution on an upper surface of the base, and powering the upper electrodes and the lower electrodes to form an electric field between the upper electrodes and the lower electrodes, the quantum dot solution is gathered between the upper electrodes and the lower electrodes according to an electric field distribution. Subsequently, the quantum dot solution can be deposited into a film by evaporation of a solvent, thereby obtaining a patterned quantum dot thin film on the base.2021-09-30
20210301386MASK PLATE AND MANUFACTURING METHOD THEREOF - The disclosure provides a mask plate and a manufacturing method thereof, which belong to the field of display technology and can at least partially solve a problem that it is difficult to accurately control a shape and a position of a pattern opening when an existing mask plate, which is divided into a first opening region and a second opening region, is stretched. The mask plate includes at least one pattern region, each pattern region includes a first opening region and a second opening region which are adjacent to each other along a lengthwise direction of the mask plate, each of the first opening region and the second opening region has a plurality of pattern openings penetrating through the mask plate along a thickness direction of the mask plate, wherein, a ratio of a sum of areas of the pattern openings in the second opening region to a total area of the second opening region is greater than a ratio of a sum of areas of the pattern openings in the first opening region to a total area of the first opening region, and the first opening region has grooves not penetrating through the mask plate in the thickness direction of the mask plate therein.2021-09-30
20210301387SYSTEMS AND METHODS FOR VAPORIZATION AND VAPOR DISTRIBUTION - Distributor assemblies for vapor transport deposition systems, and methods of conducting vapor transport deposition, are described. 2021-09-30
20210301388GAS CONTAINER AND DEPOSITION SYSTEM INCLUDING THE SAME - A deposition system and a gas storage device, the deposition system including a process chamber; and a gas supply outside of the process chamber, the gas supply being configured to provide monochlorosilane, wherein the gas supply includes a cabinet; and a gas container inside the cabinet, and the gas container includes aluminum (Al).2021-09-30
20210301389Sputtering Target And Method For Manufacturing A Sputtering Target - Provided a sputtering target and a method for manufacturing the sputtering target, in which a penetration of impurities into the target material during bonding is suppressed A sputtering target, wherein an intensity ratio (B/A) of a minimum reflection intensity B to a maximum reflection intensity A of a back surface wave of a target material as measured by a water immersion ultrasonic flaw detection inspection after bonding the target material is 0.70 or more, and wherein a water absorption rate of the target material determined by a relationship of a weight change rate (100×(a−b)/b) is 0.01% to 1.0%, where (a) is a weight after immersion as measured after immersing the target material in water for 10 hours and removing the water on a surface, and (b) is a dry weight of the target material before the immersion.2021-09-30
20210301390Cooling Device and Process for Cooling Double-Sided SiP Devices During Sputtering - A semiconductor manufacturing device has a cooling pad with a plurality of movable pins. The cooling pad includes a fluid pathway and a plurality of springs disposed in the fluid pathway. Each of the plurality of springs is disposed under a respective movable pin. A substrate includes an electrical component disposed over a surface of the substrate. The substrate is disposed over the cooling pad with the electrical component oriented toward the cooling pad. A force is applied to the substrate to compress the springs. At least one of the movable pins contacts the substrate. A cooling fluid is disposed through the fluid pathway.2021-09-30
20210301391SIMULTANEOUS SELECTIVE DEPOSITION OF TWO DIFFERENT MATERIALS ON TWO DIFFERENT SURFACES - In some embodiments, methods are provided for simultaneously and selectively depositing a first material on a first surface of a substrate and a second, different material on a second, different surface of the same substrate using the same reaction chemistries. For example, a first material may be selectively deposited on a metal surface while a second material is simultaneously and selectively deposited on an adjacent dielectric surface. The first material and the second material have different material properties, such as different etch rates.2021-09-30
20210301392SELECTIVE DEPOSITION OF SILICON OXIDE ON DIELECTRIC SURFACES RELATIVE TO METAL SURFACES - Methods for selective deposition of silicon oxide films on dielectric surfaces relative to metal surfaces are provided. A metal surface of a substrate may be selectively passivated relative to the dielectric surface, such as with a polyimide layer or thiol SAM. Silicon oxide is selectively deposited on the dielectric surface relative to the passivated metal surface by contacting the dielectric surface with a metal catalyst and a silicon precursor comprising a silanol.2021-09-30
20210301393PROCESS FOR PRODUCING CARBON-NANOTUBE GRAFTED SUBSTRATE - The present invention relates to a process for producing a carbon nanotube-grafted substrate, the process comprising: providing a substrate having catalytic material deposited thereon; and synthesising carbon nanotubes on the substrate by a chemical vapour deposition process in a reaction chamber; characterised in that the process comprises providing a counter electrode, applying a potential difference to the substrate in relation to the counter electrode and maintaining the potential difference of the substrate in relation to the counter electrode during the chemical vapour deposition process.2021-09-30
20210301394SELECTIVE DEPOSITION OF SILICON OXIDE ON METAL SURFACES - Methods for selective deposition of silicon oxide films on metal or metallic surfaces relative to dielectric surfaces are provided. A dielectric surface of a substrate may be selectively passivated relative to a metal or metallic surface, such as by exposing the substrate to a silylating agent. Silicon oxide is then selectively deposited on the metal or metallic surface relative to the passivated oxide surface by contacting the metal surface with a metal catalyst and a silicon precursor comprising a silanol.2021-09-30
20210301395PLASMA RESISTANT PROCESS CHAMBER LID - A lid or other chamber component for a process chamber comprises a) at least one surface comprising a first ceramic material, wherein the first ceramic material comprises Y2021-09-30
20210301396METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM - There is included (a) supplying a fluorine-containing gas to an interior of a process vessel; (b) exhausting the fluorine-containing gas from the interior of the process vessel while maintaining a state in which fluorine is adhered to the interior of the process vessel; and (c) forming a film on a substrate by supplying a film-forming gas to the substrate accommodated in the interior of the process vessel to which the fluorine is adhered.2021-09-30
20210301397Substrate Processing Apparatus - Described herein is a technique capable of suppressing generation of particles by removing by-products in a groove of a high aspect ratio. According to one aspect of the technique, there is provided a substrate processing apparatus including: a process chamber in which a substrate is processed; and a substrate support provided in the process chamber and including a plurality of supports where the substrate is placed, wherein the process chamber includes a process region where a process gas is supplied to the substrate and a purge region where the process gas above the substrate is purged, and the purge region includes a first pressure purge region to be purged at a first pressure and a second pressure purge region to be purged at a second pressure higher than the first pressure.2021-09-30
20210301398FILM FORMING APPARATUS - A film forming apparatus includes: a stage on which a workpiece on which a film is to be formed is placed; a gas supply part provided so as to face the stage, including a heater provided to be controlled to a predetermined temperature, and configured to supply a carrier gas; and a vaporization part provided between the stage and the gas supply part, and configured to be heated by heat generated from the gas supply part to vaporize a film-formation material supplied in a liquid state.2021-09-30
20210301399Quantum Printing Methods - The invention includes apparatus and methods for instantiating and quantum printing materials, such as elemental metals, in a nanoporous carbon powder.2021-09-30
20210301400PRECURSORS AND METHODS FOR PREPARING SILICON-CONTAINING FILMS - Provided are certain liquid silicon precursors useful for the deposition of silicon-containing films, such as films comprising silicon, silicon nitride, silicon oxynitride, silicon dioxide, silicon carbide, carbon-doped silicon nitride, or carbon-doped silicon oxynitride. Also provided are methods for forming such films utilizing vapor deposition techniques.2021-09-30
20210301401PRECURSOR SOLUTION FOR THIN FILM DEPOSITION AND THIN FILM FORMING METHOD USING SAME - A precursor solution for thin-film deposition including a functional solvent selected from among liquid alkene and liquid alkyne capable of dissolving a metal halide at room temperature and a metal halide dissolved in the functional solvent and existing as a liquid at room temperature, thereby solving problems caused by halogen gas generated in a chamber during a deposition process and improving the uniformity of the thickness of a thin film.2021-09-30
20210301402FILM FORMING APPARATUS AND FILM FORMING METHOD - A film forming apparatus includes: a processing container; a support mechanism configured to support a substrate to be capable of being raised and lowered; a first gas supplier configured to supply a first gas to a front surface of the substrate supported on the support mechanism; a second gas supplier configured to supply a second gas to a rear surface of the substrate supported on the support mechanism; and a third gas supplier configured to supply a third gas to at least one of the front surface and the rear surface of the substrate supported on the support mechanism.2021-09-30
20210301403REDUCED VISIBILITY CONDUCTIVE MICRO MESH TOUCH SENSOR - A method for fabricating a metallic wire mesh touch sensor with reduced visibility. A metallic wire mesh is formed on a transparent substrate such that the surface of the metallic wires is roughened or textured, so as to cause high scattering of incident light, thereby minimizing specularly reflected light towards the user. The metal lines are formed over patterned catalytic photoresist. The rough or textured surface of the metallic wires is achieved by roughening or texturing the catalytic photoresist, by selecting parameters of electronless plating of copper, or both. An RMS surface roughness of about 50 nm would scatter approximately 70% of incident cyan light incident at 30°.2021-09-30
20210301404METHOD OF MANUFACTURING LAMINATE - A method of manufacturing a laminate includes: forming a preprocessing coating on a surface of a substrate having insulating properties by accelerating the powdered material together with gas and spraying the powdered material in a solid phase onto the surface of the substrate, the powdered material including aluminum or an aluminum alloy as a main component; and forming a heat-treated coating having a surface with irregular asperities by heating a preprocessing laminate including the substrate and the preprocessing coating formed on the surface of the substrate.2021-09-30
20210301405Barrier Chemical Mechanical Planarization Slurries For Cobalt Films - Cobalt barrier Chemical Mechanical Planarization (CMP) compositions, systems and methods are provided for the removal of cobalt or a cobalt alloy from the surface of a semiconductor device during its manufacture. The compositions use suitable chemical additives selected from the group consisting of an aliphatic organic carboxylic acid , an aromatic organic carboxylic acid, and combinations thereof; abrasives; an oxidizing agent; and an corrosion inhibitor; to provide tunable cobalt film removal rates, tunable selectivity between cobalt and dielectric or other barrier films, and maintain very low static etching rates on cobalt film.2021-09-30
20210301406METHOD AND APPARATUS FOR WATER ELECTROLYSIS, AND METHOD FOR DETERMINING DRIVE POTENTIAL OF WATER ELECTROLYSIS - The present invention provides a water electrolysis method comprising: supplying at least water into an electrolysis cell which includes a solid polymer electrolyte membrane, and an anode and a cathode disposed sandwiching the solid polymer electrolyte membrane therebetween; and providing a potential P between the anode and the cathode to generate oxygen from the anode, wherein an oxidation catalyst containing at least one of first transition metals is present on at least a part of a surface of the anode, and the potential P satisfies P2021-09-30
20210301407Process for preparing sodium alkoxides - A process for electrochemical preparation of sodium alkoxide is performed in an electrolysis cell having three chambers, wherein the middle chamber is separated from the cathode chamber by a solid-state electrolyte permeable to sodium ions, and from the anode chamber by a diffusion barrier. The geometry of the electrolysis cell protects the solid-state electrolyte permeable to sodium ions from acidic destruction by the pH of the anolyte that falls in the course of electrolysis. The anolyte used in the process is a brine also comprising carbonates and/or hydrogencarbonates, as well as NaCl. The process solves the problem that CO2021-09-30
20210301408A Method for the Electrochemical Synthesis of Ammonia from Nitrates and Water - A method of ammonia production is provided that includes holding a nitrate source in an electrolyte solution, using a reaction chamber, reducing the nitrate into ammonia or ammonium, whereby producing water or hydroxide ions, using a cathode in the reaction chamber, oxidizing the water or hydroxide ions into protons and oxygen or water and oxygen, using an anode in the reaction chamber, and separating the ammonia and the ammonium from the reaction chamber, using an ammonia and ammonium output.2021-09-30
20210301409Process for preparing alkali metal alkoxides in a three-chamber electrolysis cell - A process for electrochemical preparation of an alkali metal alkoxide solution is performed in an electrolysis cell having three chambers. The middle chamber is separated from the cathode chamber by a solid-state electrolyte permeable to cations, for example NaSICON, and from the anode chamber by a diffusion barrier, for example a membrane selective for cations or anions.2021-09-30
20210301410ELECTROLYSIS ARRANGEMENT - Provided is an electrolysis arrangement including a plurality of electrolytic units, wherein each electrolytic unit includes an electrolytic cell and an AC-DC power converter configured to provide DC power for that electrolytic cell; a plurality of electrolytic assemblies, wherein each electrolytic assembly includes a number of electrolytic units; at least one wind turbine including an electrical generator with a number of armature windings, wherein each armature winding provides AC power to one electrolytic assembly; and a converter unit controller configured to regulate the AC-DC power converters of the electrolytic units on the basis of the power output of an electrical generator. A method of operating such an electrolysis arrangement is also provided.2021-09-30
20210301411METALLIC MESH-BASED GAS DIFFUSION ELECTRODES FOR UTILIZATION OF SPARINGLY SOLUBLE GASES IN ELECTROCHEMICAL REACTIONS WITH NONAQUEOUS ELECTROLYTES - A system and method for supplying a gas to an electrochemical system is described.2021-09-30
20210301412Cu1 81S CATALYST FOR SYNTHESIZING NH3 AND METHOD FOR SYNTHESIZING NH3 USING THE SAME - The present disclosure provides a Cu2021-09-30
20210301413METHODS AND SYSTEMS FOR ELECTROCHEMICAL ADDITIVE MANUFACTURING - Methods and systems for producing a three-dimensional structure using electrochemical additive manufacturing are described herein. The methods can comprise injecting a growth control solution into an electrolyte comprising a metal salt to form a growth control region and applying an electric potential to a working electrode to thereby form a layer of metal at a location defined by the growth control region. The injecting and applying steps of the methods can be repeated for form the three-dimensional structure on a layer-by-layer basis.2021-09-30
20210301414ELECTROCHEMICAL LAYER DEPOSITION - An apparatus and method for electrochemically depositing a unitary layer structure using a reactor configured to contain an electrolyte solution with an anode array containing a plurality of independently electrically controllable anodes arranged in a two-dimensional array, a cathode, an addressing circuit for receiving a signal containing anode address data and for outputting a signal causing an anode array pattern; and, a controller. in communication with the addressing circuit and the anode array, configured to electrically control each anode in the anode array to cause an electrochemical reaction at the cathode that deposits a unitary layer structure according to the anode array pattern signal.2021-09-30
20210301415METHOD OF FACILITATING MITIGATION OF COSMETIC IMPERFECTIONS ASSOCIATED WITH FINGERPRINT IMPRESSIONS ON ANODIZED MATERIALS AND ANODIZED MATERIALS TREATED FOR PROVIDING SAME - Disclosed herein are methods specifically tailored for facilitating the mitigation of cosmetic impressions associated with fingerprint impressions on surface(s) of articles of manufacture made from anodized substrates. To this end, such methods provide for removal of fingerprints by enzymatically functionalizing the surface(s) of the article of manufacture (e.g., a cosmetic coating thereof) to generate an enzymatically active surface and activating such enzymatically functionalized surface(s) to promote such fingerprint removal. Thus methods and articles of manufacture made in accordance with such methods provide improved end-use utility and functionality of many products for consumer electronic applications, automotive applications, building materials applications, and the like.2021-09-30
20210301416ELECTROPLATING APPARATUS AND ELECTROPLATING METHOD - Embodiments of the present invention provide an electroplating apparatus for electroplating on a surface of a wafer, the electroplating apparatus comprising a plurality of electrodes, the plurality of electrodes forming electric fields on the surface of the wafer, wherein an independent electric field is formed in a designated area, the intensity of the independent electric field is independently controlled, when a notch of the wafer is positioned within the designated area, a total amount of power received by the notch within the designated area is reduced. Embodiments of the present invention also provide an electroplating method for electroplating on a surface of a wafer by using a plurality of electrodes, the method controlling the plurality of electrodes to form electric fields on the surface of the wafer, wherein an independent electric field is formed in a designated area, the intensity of the independent electric field is independently controlled, when a notch of the wafer is positioned within the designated area, a total amount of power received by the notch within the designated area is reduced. The electroplating apparatus and the electroplating method of the present invention control the electroplating height of the notch of the wafer by directly controlling the intensity of the electric field. Compared with a conventional control method which only changing the rotation speed of the wafer, the present invention is more accurate and reliable, the electroplating efficiency is also increased.2021-09-30
20210301417CRYSTAL MATERIAL LOADING DEVICE AND CRYSTAL GROWTH DEVICE - A crystal raw material loading device and a crystal growth device includes a plurality of bearing units which are arranged adjacent to each other horizontally in turn, and the multiple bearing units include a first bearing unit arranged at one end of a small plane far away from the seed crystal bearing device. Along the direction from one end of the small plane far away from the seed crystal to one end of the small plane close to the seed crystal, from the first bearing unit to the bearing unit on the side of the small plane close to the seed crystal, the height of the raw material that can be carried by each bearing unit is reduced in turn.2021-09-30
20210301418SIC CRYSTAL GROWTH DEVICE AND METHOD - A SiC crystal growth device and method has a pie crucible and a heating mechanism. The pie crucible comprises a hollow inner cavity, and the center of the inner cavity is provided with a SiC crystal rod. The two ends of the SiC crystal rod are respectively abutting against the upper end face and the lower end face of the inner cavity. A SiC raw material is arranged in the circumferential direction of the inner cavity, and a gap exists between the SiC raw material and the SiC crystal rod. The heating mechanism is arranged outside the pie crucible, and is used for establishing a temperature field with gradually decreasing temperature from SiC raw materials to SiC crystal rods.2021-09-30
20210301419METHOD FOR PRODUCING GaN LAMINATE SUBSTRATE - The present invention includes: transferring a C-plane sapphire thin film 2021-09-30
20210301420PRODUCTION METHOD OF SILICON CARBIDE WAFER, PRODUCTION METHOD OF SEMICONDUCTOR SUBSTRATE, AND PRODUCTION METHOD OF SILICON CARBIDE SEMICONDUCTOR DEVICE - Provided is a production method of a SiC wafer which can increase the yield of a SiC wafer which can be prepared from a produced SiC single crystal ingot and the product yield of a semiconductor chip.2021-09-30
20210301421SiC WAFER AND MANUFACTURING METHOD FOR SiC WAFER - An object is to provide a SiC wafer in which a detection rate of an optical sensor can improved and a SiC wafer manufacturing method.2021-09-30
Website © 2022 Advameg, Inc.