37th week of 2021 patent applcation highlights part 56 |
Patent application number | Title | Published |
20210287815 | VALVE ASSEMBLY WITH ISOLATION VALVE VESSEL - Apparatuses for reducing or eliminating Type 1 LOCAs in a nuclear reactor vessel. A nuclear reactor including a nuclear reactor core comprising a fissile material, a pressure vessel containing the nuclear reactor core immersed in primary coolant disposed in the pressure vessel, and an isolation valve assembly including, an isolation valve vessel having a single open end with a flange, a spool piece having a first flange secured to a wall of the pressure vessel and a second flange secured to the flange of the isolation valve vessel, a fluid flow line passing through the spool piece to conduct fluid flow into or out of the first flange wherein a portion of the fluid flow line is disposed in the isolation valve vessel, and at least one valve disposed in the isolation valve vessel and operatively connected with the fluid flow line. | 2021-09-16 |
20210287816 | APPARATUS FOR TREATING WASTE OF NUCLEAR REACTOR PRESSURE VESSEL, AND METHOD FOR TREATING WASTE OF NUCLEAR REACTOR PRESSURE VESSEL - An apparatus for treating waste of a nuclear reactor pressure vessel includes: a suction unit inserted into the nuclear reactor pressure vessel through a plurality of through-pipes passing through a lower portion of the nuclear reactor pressure vessel to suck waste inside the nuclear reactor pressure vessel; a waste treatment part connected to the suction unit to treat the waste; and a lower collection part connected to the waste treatment part to be positioned under the nuclear reactor pressure vessel with the suction unit therebetween. | 2021-09-16 |
20210287817 | APPARATUS FOR DECOMMISSIONING HEAVY-WATER REACTOR FACILITIES AND METHOD FOR DECOMMISSIONING HEAVY-WATER REACTOR FACILITIES - An apparatus for decommissioning heavy-water reactor facilities includes a shielding device including a drawing-out space that is mounted on the reactivity mechanism deck and communicates with one through-hole among the plurality of through-holes, a separating device that is inserted into the inside of one of the plurality of guide tubes through the drawing-out space and the one through-hole and cuts an end portion of the one guide tube connected to the calandria, and a drawing-out device that is inserted into the inside of the one guide tube through the drawing-out space and the one through-hole and supports the end portion of the one guide tube to draw out the one guide tube into the inside of the drawing-out space through the one through-hole. | 2021-09-16 |
20210287818 | WIND-SOLAR REACTOR SYSTEM AND WORKING METHOD THEREOF - The present disclosure discloses a wind-solar reactor system and a working method thereof. The wind-solar reactor system comprises a nuclear reactor system, a wind power generation system, a solar power storage system and a balance energy system, wherein the nuclear reactor system uses an integrated small modular reactor design, the solar power storage system uses a tower-type solar power storage system design, and a hydrogen production system uses a copper-chlorine cycle hydrogen production technology. A reactor keeps rated full-power operation, generated electricity is adjusted and distributed through a power controller, most of the electricity is used for smoothing the fluctuation of wind power generation, and the excess electricity is used for hydrogen storage of the hydrogen system. Solar power is used for heating saturated steam generated by the reactor into superheated steam through a heater, and then the superheated steam enters a high-pressure cylinder to do work by expansion. | 2021-09-16 |
20210287819 | COMBINATION OF CONTAINERS AND METHOD FOR ELIMINATING RADIOACTIVE SUBSTANCES - The invention relates to a combination of containers intended to discharge radioactive substances into the earth's magma by pouring them into lava lakes, and to a method for using these containers. The radioactive substances are preferably placed in ovoid waste containers that are loaded into a transport container and discharged therewith into a lava lake. The transport container decomposes by melting following a first immersion at a given depth and releases the waste containers, which continue to move downwards. | 2021-09-16 |
20210287820 | HAZARDOUS MATERIAL REPOSITORY SYSTEMS AND METHODS - A hazardous material storage system includes a drillhole extending into the Earth and including an entry at least proximate a terranean surface. The drillhole includes a substantially vertical portion, a curved portion, and a horizontal portion that includes a hazardous waste repository formed within a first portion of the horizontal portion of the drillhole, the hazardous waste repository vertically isolated, by a rock formation, from a subterranean zone that includes mobile water, and a safety runway formed within a second portion of the horizontal portion exclusive of the hazardous waste repository and adjacent the curved portion, the safety runway defined by a particular length. | 2021-09-16 |
20210287821 | MANAGING VOLATILES IN NUCLEAR WASTE VITRIFICATION - Dangerous, toxic, and/or radioactive volatiles are produced from nuclear fission, nuclear decay, and/or as a byproduct from vitrification of radioactive wastes. Such volatiles are treated during and after vitrification of the radioactive waste, to be converted into fixed-chemicals, that are retained in, on, and/or proximate to a cold-cap located vertically above vitrified melt. The cold-cap may have one or more volatile fixing additives (VFAs) for retaining the fixed-chemicals. The VFAs are located in and/or the cold-cap. The vitrification may occur within at least one human-made cavern. The human-made cavern may be located within a deep geologic rock formation. The deep geologic rock formation may be located at least 2,000 feet below a terrestrial surface of the Earth. The human-made cavern may be formed by first drilling a wellbore from the terrestrial surface to the deep geologic rock formation and then underreaming the wellbore into the deep geologic rock formation. | 2021-09-16 |
20210287822 | METHODS OF ISOLATING RADIOACTIVE MERCURY AND USES THEREOF - Provided herein are methods of isolating and using radioactive mercury. In particular, provided herein are methods of isolating radioactive mercury including the use of a thiacrown ether, and using the isolated radioactive mercury in therapeutic and/or imaging applications. | 2021-09-16 |
20210287823 | PRODUCTIONS OF RADIOISOTOPES - The present disclosure generally relates to methods and structures for the production of radioisotopes from the thermal neutron irradiation of selected natural isotopes. The methods, structures and operations are applicable to the production of any radioisotope that may be produced from neutron irradiation. | 2021-09-16 |
20210287824 | IRRADIATION TARGET HANDLING DEVICE FOR MOVING A TARGET INTO A NUCLEAR REACTOR - A device that will enable material to be irradiated as needed to produce a desired transmutation product inside the core of a nuclear reactor. The device provides a means for monitoring neutron flux in the vicinity of the material being irradiated to allow determination of the amount of transmutation product being produced. The device enables the irradiated material to be inserted into the reactor and held in place at desired axial positions and to be withdrawn from the reactor when desired without shutting down the reactor. The majority of the device may be re-used for subsequent irradiations. The device also enables the simple and rapid attachment of unirradiated target material to the portion of the device that transmits the motive force to insert and withdraw the target material into and out of the reactor and the rapid detachment or the irradiated material from the device for processing. | 2021-09-16 |
20210287825 | DEVICE FOR CONCENTRATING IONISING RADIATION FLUENCE, WHICH FOCUSES ELECTRONS AND X-RAY PHOTONS AND IS ADAPTABLE - A device for concentrating ionizing radiation fluence is disclosed having a coupling structure linking the external radiotherapy device with linear accelerator to an external structure, whose central axis is hollow with an input window through which electrons enter attaching to the rotation device; a rotation system linking the coupling structure with a coupling flange rotating an inner structure; a deflection system in the inner structure, wherein the deflection system has first and second magnetic deflection devices; a system for controlling the focal point, which is in the electron deflection system, having an electronic control system controlling a set of motors that produce coordinated movements of the second magnetic deflection device, a correction element and a collimator, which change the position of the focal point; and at least two laser diodes on the edge of the collimator ( | 2021-09-16 |
20210287826 | LIQUID METAL ENCAPSULATES HAVING NON-NATIVE SHELLS - The present invention relates to core shell liquid metal encapsulates comprising and processes of making and using such encapsulates and networks. The shell(s) of such encapsulates employ a palette of materials having widely varied band structures and/or the desired spin pairing and/or bond polarization. Such encapsulates can be designed to respond to one or more stimuli of choice, including but not limited to electromagnetic, thermal, mechanical, photonic, and/or magnetic and are environmentally robust. | 2021-09-16 |
20210287827 | Securing Sleeve With Positive Locking Elements - A securing sleeve for securing a shield of an electric conductor to a shielding contact includes a securing section having a bottom disposed between a pair of wings. The bottom supporting the electric conductor. The wings are spaced apart at a free end of each of the wings distal from the bottom by a slot extending in an axial direction in an open state of the securing sleeve. The wings have a plurality of complementary positive locking element at the free ends that secure the securing sleeve in a circumferential direction in a closed state. | 2021-09-16 |
20210287828 | CABLE - A cable includes: a core wire; and an insulating outer layer covering the core wire; where in the core wire including an inner conductor, an inner insulating layer covering the inner conductor, and an outer insulating layer covering the inner insulating layer, the inner insulating layer being made of a material having dielectric constant and loss factor not higher than those of the material of the outer insulating layer, the outer insulating layer being made of a flame-retardant material. | 2021-09-16 |
20210287829 | THIN-FILM RESISTORS WITH FLEXIBLE TERMINAL PLACEMENT FOR AREA SAVING - An apparatus including a dielectric layer; and a set of thin-film resistors arranged in a row extending in a first direction on the dielectric layer, wherein lengths of the set of thin-film resistors in a second direction substantially orthogonal to the first direction are substantially the same, wherein the set of thin-film resistors includes a first subset of one or more thin-film resistors with respective terminals spaced apart by a first distance, and wherein the set of thin-film resistors includes a second subset of one or more thin-film resistors with respective terminals spaced apart by a second distance, the first distance being different than the second distance. | 2021-09-16 |
20210287830 | SURGE ARRESTER, AND MANUFACTURING PROCESS FOR A SURGE ARRESTER - A surge arrester includes a fluid-tight housing and a pressure relief assembly constructed to provide a fluid-conducting connection to the outside of the housing if a gas pressure inside the housing exceeds a threshold value. The pressure relief assembly is secured to the housing by at least one twist lock or lockable rotary closure. A corresponding manufacturing process for a surge arrester is also provided. | 2021-09-16 |
20210287831 | MAGNETIC CALORIFIC COMPOSITE MATERIAL AND METHOD FOR MANUFACTURING THEREOF - Provided is a magnetic calorific composite material including a magnetic calorific material and an alloy-coated carbon material including an alloy coat having a melting point of 150° C. or lower, in which a content of the alloy-coated carbon material is 7.5 wt % to 22.5 wt %. | 2021-09-16 |
20210287832 | COMPOSITE COMPONENT COMPRISING RING-SHAPED BONDED MAGNET AND METHOD OF MANUFACTURING THE SAME - The present invention relates to a composite component including a metal component having a substantially cylindrical shape or a substantially annular shape, and a ring-shaped bonded magnet disposed on the outer periphery of the metal component, the ring-shaped bonded magnet containing a thermoplastic resin, magnetic particles, and rubber particles. | 2021-09-16 |
20210287833 | CO-BASED AMORPHOUS MAGNETIC THIN STRIP FOR MAGNETIC SENSOR, MAGNETIC SENSOR USING THE SAME, AND MANAGEMENT SYSTEM - A Co-based amorphous magnetic thin strip for a magnetic sensor is disclosed. The Co-based amorphous magnetic thin strip has a width W equal to or smaller than 1 mm, a length L between 6 mm and 100 mm inclusive, a ratio L/W between 20 and 1000 inclusive, a strip thickness t between 10 μm and 28 μm inclusive, and a cross section of a rectangle or a trapezoid. | 2021-09-16 |
20210287834 | GRAIN-ORIENTED MAGNETIC STEEL SHEETS HAVING CHROMIUM-FREE INSULATING TENSION COATING, AND METHODS FOR PRODUCING SUCH STEEL SHEETS - A grain-oriented magnetic steel sheet with chromium-free insulating tension coating includes a grain-oriented magnetic steel sheet and an insulating tension coating containing a phosphate salt and silica on a surface of the grain-oriented magnetic steel sheet, the coating further including a crystalline compound represented by the general formula (1): M | 2021-09-16 |
20210287835 | OPTIMIZER, OPTIMIZATION METHOD, AND COMPUTER-READABLE RECORDING MEDIUM RECORDING OPTIMIZATION PROGRAM - An optimizer includes a processor configured to: optimize a change amount of a interlinkage magnetic flux in a coil by using an objective function formula that maximizes a sum of Δφ | 2021-09-16 |
20210287836 | A PLANAR POP-UP ACTUATOR DEVICE WITH EMBEDDED ELECTRO-MAGNETIC ACTUATION - A planar actuator device, including a base plate including a first, second, and third pair of planar coils, each pair of planar coils having an inner coil and an outer coil, each pair of planar coils arranged along a first, second, and third linear motion axis, respectively, the first, second, and third linear motion axis arranged in a star configuration, and an actuation mechanism including a first, second, and third planar legs and a centerpiece, the first, second and third planar legs pivotably connected to the centerpiece, the planar legs including a first, second, and third sliding element and a first, second, and third middle section, respectively, a sliding element and middle section of a respective leg pivotably connected to each other, each sliding element including a permanent magnet. | 2021-09-16 |
20210287837 | WINDING CORE WITH ELECTRODES AND COIL COMPONENT - A winding core includes a plurality of terminal electrodes on each flange portion, with a plurality of end surface electrode portions arranged at an interval on an outer end surface of the flange portion. To secure a predetermined interval between each of the plurality of end surface electrode portions, it is desirable for the dimension of each end surface electrode portion in a width direction to be as narrow as possible. Thus, a mask for forming an end surface base electrode layer, which is a base of an end surface electrode portion in a patterned state by sputtering, is improved to narrow a penetration passage through which particles of a film forming material pass. Thus, the dimension of the end surface base electrode layers, which are arranged at an interval in the width direction, in the width direction is less than 0.1 mm at the maximum value. | 2021-09-16 |
20210287838 | INDUCTOR COMPONENT - A coil component according to the present disclosure comprises a ring-shaped core; an insulating member which covers a portion of the ring-shaped core; and a coil which is wound around the core and the insulating member. The coil comprises a plurality of pin members in which end portions of adjacent pin members share a welded portion at which the end portions are welded to each other, and the insulating member is located between the welded portion and the core. Thus, an inductance value of an inductor component can be improved. | 2021-09-16 |
20210287839 | Transformer With Transparent Terminal Block - A power transformer assembly is described that includes a light positioned and configured to illuminate a terminal block that is at least partially composed of transparent or translucent materials. Illuminating the terminal block provides additional light in this area to facilitate making or removing wire connections. | 2021-09-16 |
20210287840 | WINDING CORE AND COIL COMPONENT - A winding core includes a winding core portion extending in a length direction; and first and second flange portions respectively provided at first and second end portions of the winding core portion in the length direction, and each having a bottom surface, a top surface on a side opposite to the bottom surface, an inner end surface facing the winding core portion side, and an outer end surface on a side opposite to the inner end surface, with a convex step portion on the top surface side of the outer end surface. The winding core portion has an upper surface facing substantially the same direction as a direction in which the top surface faces. A first straight line passing through the top surface and a second straight line passing through the upper surface intersect outside the outer end surface at an angle of from 0.3 degrees to 5 degrees. | 2021-09-16 |
20210287841 | LAYERED PROCESS-CONSTRUCTED DOUBLE-WINDING EMBEDDED SOLENOID INDUCTOR - A method for constructing a solenoid inductor includes positioning an inner winding substantially around a magnetic core, positioning an outer winding substantially around the inner winding, and using a layered process to perform said positioning the inner and outer windings. The layered process includes processing a first conducting layer as a bottom layer of the outer winding, above processing a first dielectric layer, above processing a second conducting layer as a bottom layer of the inner winding, above processing a second dielectric layer, above processing a magnetic core layer, above processing a third dielectric layer, above processing a third conducting layer as a top layer of the inner winding, above processing a fourth dielectric layer, above processing a fourth conducting layer as a top layer of the outer winding, above processing a fifth dielectric layer, and the inner and outer windings are electrically connected. | 2021-09-16 |
20210287842 | MULTILAYER COIL COMPONENT - A multilayer coil component includes a multilayer body that includes insulating layers that are stacked; a coil disposed in the multilayer body; and outer electrodes disposed on surfaces of the multilayer body and electrically connected to the coil. The coil includes at least two coil conductor groups that each include at least two coil conductors connected to each other in parallel through two coupling conductors. The at least two coil conductor groups are connected to each other in series through a connecting conductor. The connecting conductor connects the coil conductor between the two coupling conductors in one of the at least two coil conductor groups to the coil conductor between the two coupling conductors in another one of the at least two coil conductor groups. | 2021-09-16 |
20210287843 | COIL ASSEMBLY, CIRCUIT ASSEMBLY, AND ELECTRICAL JUNCTION BOX - A coil assembly including a magnetic core; and a coil including a winding portion formed by winding a flat wire edgewise, wherein opposite end portions of the flat wire extend from the winding portion in the same direction, and the opposite end portions serve as connector connection portions that are to be connected to receiving-side connectors. Such a coil assembly is conductively connected to a circuit board including the receiving-side connector, and is accommodated in an outer case. | 2021-09-16 |
20210287844 | TRANSFORMER WITH INTEGRATED COOLING - A transformer with integrated cooling is disclosed. The transformer comprises a primary winding and a secondary winding, and a coolant line partly or completely embedded in at least one of the primary or secondary windings. The coolant line is supplied with coolant from a supply device. The coolant line has a plurality of exit holes that are arranged to lead in a direction of at least one of the primary or secondary winding, so as to supply it with coolant. | 2021-09-16 |
20210287845 | INDUCTOR - An inductor that includes a body having a magnetic portion containing a magnetic powder and a first resin; a coil that is encapsulated in the body and includes a winding portion formed by winding a conductor and a pair of lead-out portions that extend from the winding portion; and a pair of outer electrodes to which at least end portions of the lead-out portions are connected at surfaces of the body. The outer electrodes each includes an electrically conductive resin layer and a first cover layer arranged on the electrically conductive resin layer. The electrically conductive resin layers each contain an electrically conductive powder and a second resin and a plurality of electrically conductive metal portions composed of the same material as the first cover layers are contained inside the electrically conductive resin layers. | 2021-09-16 |
20210287846 | INDUCTOR COMPONENT AND METHOD FOR MANUFACTURING SAME - An inductor component comprises a ring-shaped core; and a coil wound around the core and comprising wire members each constituting a single turn. Each of the wire members has a first side portion facing an inner peripheral surface of the core, a second side portion facing a first end surface that is one end surface of the core and is located in a direction of a center axis of the core, a third side portion facing an outer peripheral surface of the core, and a fourth side portion facing a second end surface that is the other end surface of the core and is located in the direction of the center axis of the core. At least one of the second and third side portions has a bent portion protruding on the core side, and the first and fourth side portions of adjacent wire members are connected. | 2021-09-16 |
20210287847 | LEAKAGE TRANSFORMER - A leakage transformer is provided. The leakage transformer includes a first plate, a second plate, a plurality of winding pillars, a primary winding, a secondary winding and a plurality of magnetic shunt elements. Each magnetic shunt element is disposed between the two corresponding winding pillars, and there is a gap between every two neighboring magnetic shunt elements. Alternatively, the magnetic shunt element is disposed on the first plate and aligned with the corresponding winding pillar, and there is a gap between the magnetic shunt element and the second plate. A leakage inductance of the leakage transformer is determined by the gap. | 2021-09-16 |
20210287848 | COUPLED INDUCTOR AND POWER MODULE - The present disclosure provides a coupled inductor and a power module. The coupled inductor includes a magnetic core, a first winding, a second winding, and an adjustment structure located in the magnetic core. At least part of the first winding and at least part of the second winding are in the magnetic core, a stacked portion of the first winding and a stacked portion of the second winding are stacked in a height direction, a non-stacked portion of the first winding and the second winding are not stacked in the height direction, and a non-stacked portion of the second winding and the first winding are not stacked in the height direction. The adjustment structure which is adjoining the non-stacked portion of the first winding and the non-stacked portion of the second winding and has a lower magnetic permeability than that of the magnetic core may adjusts leakage inductance. | 2021-09-16 |
20210287849 | Transformer and Electric Power Converter - In order to provide a transformer and an electric power converter which are less likely to become deteriorated with time and which have stable insulation performance, the transformer according to the present invention is provided with: a core; a bobbin in which a low-voltage-side primary winding and a high-voltage-side secondary winding are disposed along the central magnetic leg of the core; and a bobbin support part that supports the bobbin at an end of the bobbin on the primary winding side, such that an air gap is provided between the central magnetic leg of the core and a surface of the bobbin corresponding to the secondary winding. | 2021-09-16 |
20210287850 | IGNITION COIL - An ignition coil includes: a center core; a primary coil wound around the center core; a secondary coil wound around the primary coil; a plurality of side cores, which are arranged around the secondary coil, and are coupled to the center core to form a closed magnetic path; a magnet inserted between the plurality of side cores; an igniter configured to control supply and interruption of a current to the primary coil; a case configured to accommodate the center core, the primary coil, the secondary coil, the plurality of side cores, the magnet, and the igniter; and insulating resin filled in the case. The side cores include a wide portion and a narrow portion. The magnet is inserted into the wide portion. The igniter is arranged between the narrow portion and the case | 2021-09-16 |
20210287851 | TABLET COMPUTER STAND WITH NEAR FIELD COUPLING ENHANCEMENT - A tablet stand is disclosed which incorporates a near field antenna configuration which couples to a near field antenna in the back of a tablet and provides a near field antenna coupling region for near field communication at the front of the tablet. The stand may be completely passive and use conductive antenna elements and passive resonance matching circuit elements to provide efficient coupling. In another aspect a thin profile passive keyboard adapted for use with a near field enabled tablet is provided. In another aspect a mounting bracket or holder, embedded antenna, and passive keyboard combination is provided adapted for converting a tablet into a notebook type configuration. | 2021-09-16 |
20210287852 | HEAT SEALING-TYPE ROTATIONAL LAMINATED CORE MANUFACTURING APPARATUS - An apparatus for manufacturing a heat sealing-type rotational laminated core, includes an upper mold and a lower mold, and forming and stacking individual laminar members, the individual laminar members being formed by having a strip which is sequentially transferred on the upper portion of the lower mold undergone a piercing process and a blanking process by punches mounted on the upper mold. | 2021-09-16 |
20210287853 | MULTILAYER CERAMIC CAPACITOR - An Mn/Ti peak intensity ratio in a dielectric ceramic layer in an end surface outer layer portion is within two times to fifteen times of the Mn/Ti peak intensity ratio in a central portion, a rare earth element/Ti peak intensity ratio in the dielectric ceramic layer in the end surface outer layer portion is within two times to seven times the rare earth element/Ti peak intensity ratio in the central portion, an Si/Ti peak intensity ratio in the dielectric ceramic layer in a side surface outer layer portion is within two times to five times the Si/Ti peak intensity ratio in the central portion, and the rare earth element/Ti peak intensity ratio in the dielectric ceramic layer in the side surface outer layer portion is within two times to seven times the rare earth element/Ti peak intensity ratio. | 2021-09-16 |
20210287854 | MULTILAYER CERAMIC CAPACITOR - An end surface outer layer Mn/Ti peak intensity ratio, which is a ratio of a peak intensity of Mn found by laser ICP to a peak intensity of Ti found by laser ICP in a dielectric ceramic layer in an end surface outer layer portion, is higher than a central portion Mn/Ti peak intensity ratio, which is a ratio of a peak intensity of Mn found by laser ICP to a peak intensity of Ti found by laser ICP in the dielectric ceramic layer in a central portion in a width direction, a length direction, and a layering direction in an effective portion, and a peak intensity of Ni found by TEM-EDX is in a portion of the dielectric ceramic layers in the end surface outer layer portion. | 2021-09-16 |
20210287855 | CAPACITOR - A capacitor configured to be surface-mounted on a predetermined mounting surface, and includes a capacitor element including an electrode at each of both end faces of the capacitor element and a bus bar connected to the electrode. The bus bar includes a plurality of connection terminal portions that are arranged in a comb-teeth shape. At least one of the plurality of connection terminal portions is disposed on a connection portion disposed in the predetermined mounting surface and is electrically connected to the connection portion. | 2021-09-16 |
20210287856 | CAPACITOR ELEMENT AND METHOD FOR MANUFACTURING THE SAME - A capacitor element and a method for manufacturing the same are provided. The method for manufacturing the capacitor element includes steps of: providing a metal foil having an oxide layer formed on an outer surface of the metal foil; forming a surrounding barrier layer surroundingly on the oxide layer with the surrounding barrier layer surroundingly formed on an outer surface of the oxide layer; forming a priming layer onto the oxide layer; immersing the priming layer into a chemical synthesis solution for undergoing a chemical synthesis reaction; drying the priming layer so as to form a repaired layer on the priming layer; forming a conductive polymer layer on the repaired layer; and forming a conductive paste layer on the conductive polymer layer with the conductive paste layer including a silver paste layer. | 2021-09-16 |
20210287857 | CAPACITOR ELEMENT AND METHOD FOR MANUFACTURING THE SAME - A capacitor element and a method of manufacturing the same are provided. The method includes steps of: providing a metal foil having an oxide layer formed on an outer surface of the metal foil; forming a surrounding barrier layer onto the oxide layer so as to divide the outer surface of the oxide layer into a first part outer surface and a second part outer surface separated from each other; forming a base layer onto the oxide layer so as to partially encapsulate the oxide layer; cleaning the base layer by a cleaning solution and then drying the base layer; forming a conductive polymer layer onto the base layer; and forming a conductive paste layer onto the conductive polymer layer. | 2021-09-16 |
20210287858 | POWER SOURCE FOR A VOLTAGE REGULATION DEVICE - A voltage regulation device includes: a plurality of taps; a first electrical contact configured to connect to one of the plurality of taps; a second electrical contact configured to connect to one of the plurality of taps; and a network electrically connected to the first electrical contact and to the second electrical contact. The network is configured to control a voltage differential between the first electrical contact and the second electrical contact or an amount of current that flows in the first electrical contact and the second electrical contact. | 2021-09-16 |
20210287859 | SYSTEMS AND METHODS FOR A DISCONNECT SWITCH ASSEMBLY HAVING A REVERSIBLE FUSE SUPPORT BLOCK - A reversible fuse support block includes a molding, a terminal, and a fuser interface. The molding may be installed within a housing in a first position and a second position, wherein the second position is rotated 180 degrees relative to the first position. The terminal couples to the molding and includes a plurality of apertures disposed in a pattern. The fuse interface receives a first end of a fuse. The fuse interface couples to the terminal in a first arrangement and a second arrangement such that when the fuse interface is installed in the first arrangement and the molding is installed in the first position, the fuse interface is disposed in substantially the same position relative to a corresponding fuse interface on a fuse support block as when the fuse interface is installed in the second arrangement and the molding is installed in the second position. | 2021-09-16 |
20210287860 | SWITCHGEAR HAVING A MOUNTING BASE WITH AN INTERNAL ARC PATHWAY - A mounting base or a riser base for a switchgear is provided with side interior openings to provide an internal arc pathway through which arc gasses or plasma are safely discharged to an outside air. The mounting base includes a front wall having a first end and a second end, a rear wall having a first end and a second end, a first side channel connecting the first end of the front wall to the first end of the rear wall, a second side channel connecting the second end of the front wall to the second end of the rear wall, and forming the mounting base having a central open area in a first section of a switchgear that is adjacent a second section of the switchgear. The mounting base further includes at least one opening in the first side channel for the passage of an arc from the first section of the switchgear to the second section of the switchgear, and thereby forming the mounting base with the internal arc pathway. | 2021-09-16 |
20210287861 | KEYBOARD MODULE AND KEYBOARD DEVICE - The invention provides a keyboard module and a keyboard device. The keyboard module includes a circuit assembly, a plurality of key assemblies, and at least one microphone. The circuit assembly has a signal output interface. The key assemblies are configured on the circuit assembly, and each key assembly is adapted to be pressed to drive the circuit assembly to generate a tapping signal. The microphone is electrically connected to the circuit assembly. The tapping signal and a sound signal generated by the microphone are respectively transmitted out of the keyboard module through the signal output interface. | 2021-09-16 |
20210287862 | INPUT DEVICE, AND OPERATION UNIT - An input device includes an manipulating part, a movable member fixed to the manipulating part and having a rotating shaft, a fixing member configured to rotatably support the rotating shaft so that the movable member is rotatable, a flex sensor disposed on the manipulating part and configured to detect flexing of the manipulating part, a switch disposed on the movable member or the fixing member, pressed by a rotating operation of the movable member, and configured to switch between an on state and an off state when a flexing amount of the manipulating part reaches a predetermined amount, and a signal processor configured to output a control signal, based on a first output signal of the flex sensor, and a second output signal of the switch. | 2021-09-16 |
20210287863 | SAFETY-RELATED SWITCHING DEVICE - The invention relates to a safety-related switching device ( | 2021-09-16 |
20210287864 | Switching Device - In an embodiment a switching device includes at least one stationary contact, a movable contact, an armature, a first permanent magnet, a second permanent magnet and a magnetic switch, wherein the movable contact is movable by the armature, wherein the first permanent magnet is attached to the armature, and wherein the second permanent magnet is arranged in a fixed position relative to the magnetic switch. | 2021-09-16 |
20210287865 | Electrical Switching Device, Especially a Contactor or a Relay, with a Contacting Element and a Fastening Element - An electrical switching device includes a connection section for fastening and contacting an electrical conductor. The connection section has a fastening element for fastening the electrical conductor, a current-carrying element spaced apart from the fastening element and including a contact point, and an electrically conductive contacting element extending from the fastening element to the contact point of the current-carrying element and into an inner section of the electrical switching device. | 2021-09-16 |
20210287866 | LOW-VOLTAGE SWITCHING DEVICE INCLUDING AN ELECTROMAGNETIC CONTACT LOAD SUPPORT - The invention relates to a low-voltage switching device comprising an electromagnetic drive having a coil ( | 2021-09-16 |
20210287867 | PROTECTION DEVICE FOR AN ELECTRICAL APPARATUS - A protection device for an electrical apparatus to realize a degree of protection includes: a front part, which has a cutout, through which a partially insulated cable or bar is insertable; and a rear part, from which the non-insulated part of the cable or bar is extendable into an interior of the electrical apparatus. A channel passes through the front part and the rear part. A stop is arranged within the channel, on which the insulation jacket of the insulated part of a cable or bar may abut. | 2021-09-16 |
20210287868 | USE OF A FUSE FOR A DIRECT CURRENT TRANSMISSION - The invention relates to a use of a high-voltage high-power fuse for securing direct current transmission, wherein the direct voltage of the direct current and/or the rated voltage of the high voltage fuse ( | 2021-09-16 |
20210287869 | Coating Apparatus and Coating Method - A coating apparatus includes a chamber body having a reaction chamber, a supporting rack, a monomer discharge source, and a plasma generation source. The monomer discharge source has a discharge inlet for introducing a coating forming material into the reaction chamber of the chamber body. The plasma generation source is disposed in the reaction chamber of the chamber body for exciting the coating forming material. The supporting rack is arranged for supporting a substrate, wherein the supporting rack is operable to move in the reaction chamber to guide the substrate to alternately move close to the monomer discharge source and the plasma generation source, so as to avoid the excessive decomposition of the coating forming material. | 2021-09-16 |
20210287870 | Coating Apparatus and Coating Method - A coating apparatus for coating a plurality of substrates includes a chamber body having a reaction chamber, a monomer discharge source having a discharge inlet for introducing a coating forming material into the reaction chamber of the chamber body, and a plasma generation source disposed at a central area of the reaction chamber of the chamber body for exciting the coating forming material, wherein the plurality of substrates is adapted for being arranged around the plasma generation source within the chamber body, so that the uniformity of the coatings formed on the surfaces of the substrates is enhanced, and the deposition velocity is increased. | 2021-09-16 |
20210287871 | ION MILLING APPARATUS - To provide an ion milling apparatus adapted to suppress the contamination of a beam forming electrode. The ion milling apparatus includes: an ion gun containing therein a beam forming electrode for forming an ion beam; a specimen holder for fixing a specimen to be processed by irradiation of an ion beam; a mask for shielding a part of the specimen from the ion beam; and an ion gun controller for controlling the ion gun. | 2021-09-16 |
20210287872 | ION SOURCE WITH SINGLE-SLOT TUBULAR CATHODE - An ion source including a chamber housing defining an ion source chamber and including an extraction plate on a front side thereof, the extraction plate having an extraction aperture formed therein, and a tubular cathode disposed within the ion source chamber and having a slot formed in a front-facing semi-cylindrical portion thereof disposed in a confronting relationship with the extraction aperture, wherein a rear-facing semi-cylindrical portion of the tubular cathode directed away from the extraction aperture is closed. | 2021-09-16 |
20210287873 | CHARGED PARTICLE BEAM DEFLECTION DEVICE - A charged particle beam deflection device includes a substrate; a plurality of apertures provided in the substrate; a plurality of electrodes deflecting charged particle beams passing through the apertures; a plurality of light-receiving elements controlling voltages applied to the plurality of electrodes; a first optical coupler coupling continuous light to the substrate; a light distributor distributing light coupled by the first optical coupler into a two-dimensional plane; a plurality of modulators performing intensity modulation of light distributed by the light distributor; and a plurality of second optical couplers coupling the modulated light to the light-receiving elements. | 2021-09-16 |
20210287874 | MULTI-DEGREE-OF-FREEDOM SAMPLE HOLDER - A multi-degree-of-freedom sample holder, comprising a housing and a rotating shaft, is disclosed. A frame is provided between the housing and the rotating shaft, and the frame is coaxial with the housing and rotating shaft. The present invention has multiple degrees of freedom such as high-precision translational freedom of the sample along the X-axis, Y-axis and Z-axis, and 360° rotation of the sample around the axis, etc. The sample is always aligned with the sample holder shaft during the rotation, and the static electricity accumulated on the sample can be led out. | 2021-09-16 |
20210287875 | INSPECTION DEVICE - According to one embodiment, an inspection device includes: a lens barrel that irradiates a substrate having a first main surface on which a pattern is formed with a charged particle; a terminal that comes into contact with the substrate at a first site on a second main surface of the substrate or on a side surface of the substrate and applies a predetermined potential to the substrate; and at least one light source that irradiates a predetermined area of the substrate including the first site with light. | 2021-09-16 |
20210287876 | LIGHT INTERFERENCE SYSTEM AND SUBSTRATE PROCESSING APPARATUS - A light interference system is provided. The light interference system includes a light source configured to generate a measurement light; a fiber configured to propagate therethrough the measurement light; and a measurement device. The fiber includes a single-mode fiber, a multimode fiber and a connector connecting the single-mode fiber and the multimode fiber. A tip end of the fiber is formed of the multimode fiber, and an end surface of the tip end of the fiber is configured to emit the measurement light to a measurement target object and receive a reflection light from the measurement target object. The measurement device is configured to measure physical property of the measurement target object based on the reflection light. | 2021-09-16 |
20210287877 | APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE - An apparatus for treating a substrate includes a process chamber having an inner space, a support unit supporting a substrate in the inner space, a processing gas supply unit for supplying a processing gas to the inner space, and a plasma source that excites the processing gas in a plasma state in the inner space. The processing gas supply unit includes a heater that heats the processing gas. | 2021-09-16 |
20210287878 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus capable of removing signal interference between reactors includes: a first reactor, a second reactor adjacent to the first reactor, and a power generator configured to supply first power to the first reactor and supply second power to the second reactor, wherein the power generator is further configured to synchronize phases of the first power and the second power. | 2021-09-16 |
20210287879 | PLASMA PROCESSING APPARATUS - A plasma processing apparatus includes a chamber; a first electrode facing an inside of the chamber; a radio-frequency power supply configured to supply a radio-frequency power to the first electrode; a feeding rod configured to feed the radio-frequency power to a center of a surface of the first electrode opposite to a surface facing the inside of the chamber; a conductive plate provided in parallel to the surface of the first electrode opposite to the surface facing the inside of the chamber, the plate being grounded; and a dielectric plate connecting the first electrode and the conductive plate, and having a shape that is rotationally symmetric with respect to a center of the first electrode. | 2021-09-16 |
20210287880 | INTER-PERIOD CONTROL SYSTEM FOR PLASMA POWER DELIVERY SYSTEM AND METHOD OF OPERATING THE SAME - A generator produces output such as delivered power, voltage, current, forward power etc. that follows a prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling sections of the pattern based on measurements taken one or more repetition periods in the past. A variable impedance match network may control the impedance presented to a radio frequency generator while the generator produces the output that follows the prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling variable impedance elements in the match during sections of the pattern based on measurements taken one or more repetition periods in the past. | 2021-09-16 |
20210287881 | METHODS AND APPARATUS FOR TUNING SEMICONDUCTOR PROCESSES - An apparatus for processing substrates that includes a process chamber with a process volume located above a substrate support assembly surrounded by an edge ring, an upper electrode located above the process volume and a conductive tuning ring surrounding the upper electrode and in electrical contact with the upper electrode. The conductive tuning ring has at least one gas port on a lower surface above the edge ring. The conductive tuning may also have at least one stepped portion on the lower surface that forms an extended bottom surface. In some embodiments, the extended bottom surface may slant radially inwardly or radially outwardly. In some embodiments, the extended bottom surface may have one or more radiused edges. | 2021-09-16 |
20210287882 | MODULAR MICROWAVE SOURCE WITH LOCAL LORENTZ FORCE - Embodiments include methods and apparatuses that include a plasma processing tool that includes a plurality of magnets. In one embodiment, a plasma processing tool may comprise a processing chamber and a plurality of modular microwave sources coupled to the processing chamber. In an embodiment, the plurality of modular microwave sources includes an array of applicators positioned over a dielectric plate that forms a portion of an outer wall of the processing chamber, and an array of microwave amplification modules. In an embodiment, each microwave amplification module is coupled to one or more of the applicators in the array of applicators. In an embodiment, the plasma processing tool may include a plurality of magnets. In an embodiment, the magnets are positioned around one or more of the applicators. | 2021-09-16 |
20210287883 | HOLDING METHOD OF EDGE RING, PLASMA PROCESSING APPARATUS, AND SUBSTRATE PROCESSING SYSTEM - A first electrostatic chuck of a substrate support of the disclosed plasma processing apparatus has first and second electrodes and holds an edge ring. A second electrostatic chuck of the substrate support holds a substrate. The first electrode extends closer to the second electrostatic chuck than the second electrode. During plasma processing, a first voltage having a positive polarity is applied to the first and second electrodes. In a first period after the plasma processing, a second voltage having a negative polarity is applied to the first and second electrodes. In a second period after the first period, a third voltage having a positive polarity is applied to the first electrode, and a fourth voltage having a negative polarity is applied to the second electrode. The absolute value of the third voltage is smaller than the absolute value of the first voltage and the absolute value of the second voltage. | 2021-09-16 |
20210287884 | SYSTEMS FOR WORKPIECE PROCESSING WITH PLASMA - Systems, methods, and apparatuses for workpiece processing with plasma, including thermal isolation of a workpiece holder assembly, are described. An apparatus includes a chamber that at least partially defines a processing space for generating plasma. The apparatus includes a base assembly that at least partially defines a lower end of the chamber and has an inner perimeter that defines an opening in the base assembly. The apparatus further includes a workpiece holder assembly positioned, at least in part, within the opening. The workpiece holder assembly includes heating element(s) and a body with an upper surface configured to receive a workpiece. A gap is defined between the inner perimeter of the base assembly and an outer perimeter of the body. The gap is configured to thermally isolate the base assembly from the body. | 2021-09-16 |
20210287885 | CERAMIC HEATER - A ceramic heater includes a ceramic plate, a planar electrode, and a resistive heating element. A first via, a second via, a coupler, and a reinforcement portion are embedded in the ceramic plate. The first via is conductive and extends from the resistive heating element toward a via through-hole. The second via is conductive and extends from the via through-hole in a direction opposite a direction toward the resistive heating element. The coupler is conductive and electrically couples the first via and the second via with each other. The reinforcement portion is disposed inside the via through-hole | 2021-09-16 |
20210287886 | TEMPERATURE CONTROL METHOD AND PLASMA PROCESSING APPARATUS - A temperature control method includes a switchover process, an ignition process, a slope calculation process, a first and a second control processes. In the switchover process, a heat medium to be supplied into a flow path is switched from a heat medium of a first temperature supplied from a first temperature controller to a heat medium of a second temperature supplied from a second temperature controller. In the slope calculation process, a slope of temperature change of the heat medium is calculated based on a temperature of the heat medium at an outlet side of the flow path. In the first control process, the second temperature controller is controlled until the temperature of the heat medium is stabilized to a temperature lower than a set value. In the second control process, the second temperature controller is controlled such that the temperature of the heat medium reaches the set value. | 2021-09-16 |
20210287887 | PLASMA MEASURING APPARATUS AND PLASMA MEASURING METHOD - A plasma measuring apparatus includes: a chamber; a stage provided inside the chamber; a plasma generation source configured to generate plasma in the chamber; an inorganic electroluminescence (EL) substrate placed on the stage and configured to emit light when an electric field is applied; a transmission window provided in the chamber and configured to transmit light; a spectroscope disposed outside the chamber and configured to measure a light emission of the inorganic EL substrate through the transmission window; and a controller configured to measure an ion energy from a result of the measurement by the spectroscope. | 2021-09-16 |
20210287888 | Dual Reverse Pulse Sputtering System - A pulsed power system and a pulsed power sputtering system are disclosed. The pulsed power system includes a first power source that is configured to apply a first voltage at a first power lead that alternates between positive and negative relative to a second power lead during each of multiple cycles. A second power source is coupled to a third power lead and the second power lead, and the second power source is configured to apply a second voltage to the third power lead that alternates between positive and negative relative to the second power lead during each of the multiple cycles. A controller is configured to control the first power source and the second power source to phase-synchronize the first voltage with the second voltage, so both, the first voltage and the second voltage, are simultaneously negative during a portion of each cycle and simultaneously positive relative to the second power lead during another portion of each cycle. | 2021-09-16 |
20210287889 | TIME-OF-FLIGHT MASS SPECTROMETER AND TIME-OF-FLIGHT MASS SPECTROMETRY METHOD - A time-of-flight mass spectrometer includes a beam irradiation unit that generates an ionized particle by emitting an ion beam in a pulse form to a sample, a mass spectrometry unit that causes the ionized particle to fly, an MCP disposed in the mass spectrometry unit to measure a mass by amplifying the ionized particle, an MCP power source that applies a voltage to the MCP, and an MCP gain adjustment unit that adjusts a gain of the voltage. The MCP gain adjustment unit adjusts the gain of the voltage until a subsequent pulse is emitted after the beam irradiation unit emits a first pulse of the ion beam. | 2021-09-16 |
20210287890 | MASS SPECTROMETRY SYSTEM - A mass spectrometer system ( | 2021-09-16 |
20210287891 | METHOD OF OPERATING A SECONDARY-ELECTRON MULTIPLIER IN THE ION DETECTOR OF A MASS SPECTROMETER - The disclosure relates to a method of operating a secondary-electron multiplier in the ion detector of a mass spectrometer so as to prolong the service life, wherein the secondary-electron multiplier is supplied with an operating voltage in such a way that an amplification of less than 10 | 2021-09-16 |
20210287892 | DYNAMIC ION FILTERING FOR REDUCING HIGHLY ABUNDANT IONS - The present disclosure includes a computer-implemented method for filtering out at least one selected ion from an ion beam by the following steps: determining the selected ion with a selected ion mass, selected charge and/or selected mass to charge ratio; determining at least one predefinable region with predefinable ions, whose ion masses, charges and/or mass to charge ratios are greater than or smaller than the selected ion mass, the selected charge and/or the selected mass to charge ratio of the selected ion; isolating the predefinable region of the ion beam along a trajectory of the ion beam, and detecting the predefinable ions within the predefinable region. In addition, the present disclosure includes to a computer program which is configured to perform a method according to the present disclosure and to a computer program product having the computer program. | 2021-09-16 |
20210287893 | CONTROLLING ION TEMPERATURE IN AN ION GUIDE - There is provided a method of guiding ions, comprising providing an ion guide comprising a plurality of electrodes, confining ions radially within said ion guide by applying one or more voltages to said plurality of electrodes, applying an orthogonal DC field along at least a portion of said ion guide in order to control the temperature of ions as they travel through said ion guide, and applying an electrostatic driving potential to said plurality of electrodes to urge ions along the axial length of the ion guide, wherein said electrostatic driving potential is applied in the form of a DC travelling wave potential or other transient DC potential. | 2021-09-16 |
20210287894 | BIOMARKERS AND USES THEREOF - The present invention relates to methods of assessing whether an individual has Parkinson's Disease (PD) and/or is no longer responding to treatment, the method comprising the identification of one or more volatile compounds in the sebum of the individual. The present invention also relates to methods of extracting and detecting analytes from sebum. | 2021-09-16 |
20210287895 | DYNAMIC ION FILTER FOR REDUCING HIGHLY ABUNDANT IONS - The present disclosure relates to a device for filtering at least one selected ion from an ion beam includes a unit for creating an electric field for accelerating the ions of the ion beam along a flight path of predefinable length, and a controllable ion optical system, which delimits the flight path in one direction, and which is used to deflect the selected ion from a flight path of the ion beam. The device is further designed to control the ion optical system subject to a flight time of the selected ion along the flight path. The present disclosure also relates to a mass spectrometer having a device according to the present disclosure, and to a method for filtering at least one selected ion from an ion beam. | 2021-09-16 |
20210287896 | MASS SPECTROMETER - A mass spectrometer adopting a configuration of a multi-stage differential evacuation system appropriately performs optimization of a direct-current voltage applied to a plurality of ion optical elements for transporting ions. An auto-tuning controller acquires intensity data of ions derived from a predetermined component while changing a direct-current voltage applied to ion guides and the like, and searches for a direct-current voltage at which the intensity is maximized. When the direct-current voltage applied to a certain ion optical element is changed at the time of automatic adjustment, the direct-current voltage applied to all the ion optical elements thereafter is also changed by the same amount. Since the direct-current voltage difference between two adjacent ion optical elements always changes at only one point, the direct-current potential difference can be determined so as to optimize the ion passage efficiency. | 2021-09-16 |
20210287897 | Method for Determining a Parameter to Perform a Mass Analysis of Sample Ions with an Ion Trapping Mass Analyser - A method for determining a compensation factor parameter, c, for controlling an amount of ions ionised that are injected from an ion storage unit into mass analyser, where c is an adjustment factor that is applied to optimized injection times that are based on an optimized visible charge of a reference sample, the method comprising: detecting at least one mass spectrum for at least one amount of injected ions; determining from the at least one detected mass spectrum, a slope, s(sample), of a linear correlation of a relative m/z shift with visible total charge Q | 2021-09-16 |
20210287898 | SELECTIVE OXIDATION AND SIMPLIFIED PRE-CLEAN - Method for selectively oxidizing the dielectric surface of a substrate surface comprising a dielectric surface and a metal surface are discussed. Method for cleaning a substrate surface comprising a dielectric surface and a metal surface are also discussed. The disclosed methods oxidize the dielectric surface and/or clean the substrate surface using a plasma generated from hydrogen gas and oxygen gas. The disclosed method may be performed in a single step without the use of separate competing oxidation and reduction reactions. The disclosed methods may be performed at a constant temperature and/or within a single processing chamber. | 2021-09-16 |
20210287899 | TEMPLATE, METHOD FOR PRODUCING TEMPLATE, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE - According to one embodiment, a template for nanoimprint lithography includes a substrate having a main surface and a mesa structure on the main surface. The mesa structure has an upper surface that can be patterned with recesses or the like. A film containing a quantum dot or quantum dots is on the main surface other than the upper surface of the mesa structure. The quantum dot can absorb ultraviolet light and emit visible light. | 2021-09-16 |
20210287900 | METHODS FOR GAPFILL IN SUBSTRATES - The present disclosure provides methods for treating film layers in a substrate including positioning the substrate in a processing volume of a processing chamber. The substrate can have high aspect ratio features extending a depth from a substrate surface to a bottom surface. The feature can have a width defined by a first sidewall and a second sidewall. A film with a composition that includes metal is formed on the substrate surface and the first sidewall, the second sidewall, and the bottom surface of each feature. The film in the feature can have a seam extending substantially parallel to the first and second sidewalls. The film is annealed and exposed to an oxygen radical while converting the metal of the film to a metal oxide. The metal oxide is exposed to a hydrogen radical while converting the metal oxide to a metal fill layer. | 2021-09-16 |
20210287901 | METHOD & APPARATUS FOR HIGH PRESSURE CURE OF FLOWABLE DIELECTRIC FILMS - A high-pressure dielectric film curing apparatus, such as a high-pressure batch furnace, is controlled to an elevated cure temperature and super-atmospheric pressure for the duration of the film curing time with the cure pressure achieved at least partially with a vapor of aqueous ammonia in fluid communication with the chamber. The cure temperature may vary, for example between 175° C., and 400° C., or more. The cure pressure may also vary as limited by the saturated water vapor pressure, for example between 100 PSIA and 300 PSIA, or more. The aqueous ammonia may be injected into the chamber or vaporized upstream of the chamber. One or more carrier and/or diluent gas (vapor) may be introduced into the chamber to adjust the partial pressure of ammonia vapor, water vapor, and the diluent. | 2021-09-16 |
20210287902 | SEMICONDUCTOR STRUCTURE WITH SEMICONDUCTOR-ON-INSULATOR REGION AND METHOD - Disclosed are semiconductor structure embodiments of a semiconductor-on-insulator region on a bulk substrate. The semiconductor-on-insulator region includes an upper semiconductor layer above and physically separated from the substrate by insulator-containing cavities (e.g., by dielectric layer and/or a pocket of trapped air, of trapped gas, or under vacuum) and, optionally, by a lower semiconductor layer. Disclosed method embodiments include forming openings that extend vertically through the upper semiconductor layer, through a sacrificial semiconductor layer and, optionally, through a lower semiconductor layer to the substrate. Then, a selective isotropic etch process is performed to form cavities, which extend laterally off the sides of the openings into the sacrificial semiconductor layer. Depending upon the embodiments, different process steps are further performed to form plugs in at least the upper portions of the openings and insulators (including dielectric layers and/or a pocket of trapped air, of trapped gas or under vacuum) in the cavities. | 2021-09-16 |
20210287903 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A method for manufacturing a semiconductor device includes: forming a first film on a substrate; forming a second film containing at least carbon on the first film; forming a hole in the second film; and forming a recess, which communicates with the hole, in the first film by etching using the second film as a mask. In this method, the second film includes a first layer formed on the first film, and a second layer formed on the first layer. The first layer having a higher oxygen concentration than the second layer. | 2021-09-16 |
20210287904 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF - A method includes forming a gate structure and an interlayer dielectric (ILD) layer over a substrate; selectively forming an inhibitor over the gate structure; performing an atomic layer deposition (ALD) process to form a dielectric layer over the ILD layer, wherein in the ALD process the dielectric layer has greater growing rate on the ILD than on the inhibitor; and performing an atomic layer etching (ALE) process to etch the dielectric layer until a top surface of the inhibitor is exposed, in which a portion of the dielectric layer remains on the ILD layer after the ALE process is complete. | 2021-09-16 |
20210287905 | Gate Structure Passivating Species Drive-In Method and Structure Formed Thereby - Generally, the present disclosure provides example embodiments relating to formation of a gate structure of a device, such as in a replacement gate process, and the device formed thereby. In an example method, a gate dielectric layer is formed over an active area on a substrate. A dummy layer that contains a passivating species (such as fluorine) is formed over the gate dielectric layer. A thermal process is performed to drive the passivating species from the dummy layer into the gate dielectric layer. The dummy layer is removed. A metal gate electrode is formed over the gate dielectric layer. The gate dielectric layer includes the passivating species before the metal gate electrode is formed. | 2021-09-16 |
20210287906 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS - A method for processing a substrate on which silicon layers and silicon germanium layers are alternately disposed, includes: forming an oxide layer on a surface layer of a spacer layer based on an oxygen-containing gas radicalized using remote plasma, wherein the spacer layer having a low dielectric constant is formed at least on side surfaces of the silicon layers and the silicon germanium layers; and removing the formed oxide layer by etchir | 2021-09-16 |
20210287907 | METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE - Methods and apparatus for processing a substrate are provided herein. For example, a method for processing a substrate includes applying at least one of low frequency RF power or DC power to an upper electrode formed from a high secondary electron emission coefficient material disposed adjacent to a process volume; generating a plasma comprising ions in the process volume; bombarding the upper electrode with the ions to cause the upper electrode to emit electrons and form an electron beam; and applying a bias power comprising at least one of low frequency RF power or high frequency RF power to a lower electrode disposed in the process volume to accelerate electrons of the electron beam toward the lower electrode. | 2021-09-16 |
20210287908 | Sidewall Protection Layer formation for Substrate Processing - Substrate processing techniques are described in which an etch protection layer that is formed as part of an etch process forms in a self-limiting nature. Thus, over deposition effects are minimized, particularly in the corners of etched polygonal holes. In one embodiment, the layer being etched contains silicon and the protective layer comprises a silicon oxide (SixOy). The process may include the use of a cyclical series of etch and protective layer formation steps. In the case of a silicon oxide based protective layer, a thin protective layer of silicon oxide may be formed in a limiting and controllable manner due to the nature of the oxygen atom interaction with silicon and newly formed silicon oxide protective layers. In this manner, a polygonal hole may be formed without detrimental over deposition of a protective layer in corners of the hole. | 2021-09-16 |
20210287909 | INTEGRATED ATOMIC LAYER PASSIVATION IN TCP ETCH CHAMBER AND IN-SITU ETCH-ALP METHOD - A plasma processing system includes a chamber having a coil disposed above a dielectric window for providing radio frequency power to the processing region. An etch gas delivery system is coupled to gas sources used for a first etch of a material. A liquid delivery system includes a source of liquid precursor, a liquid flow controller, and a vaporizer. A controller activates the etch gas delivery system to perform the first etch and activates the liquid delivery system to perform an atomic layer passivation (ALP) process after the first etch to coat features with a conformal film of passivation. Each time the ALP process is completed a single atomic monolayer of the conformal film of passivation is formed. The controller activates the etch gas delivery system to perform a second etch, with the conformal film of passivation protecting the mask and sidewalls of the features during the second etch. | 2021-09-16 |
20210287910 | BONDING SURFACES FOR MICROELECTRONICS - Improved bonding surfaces for microelectronics are provided. An example method of protecting a dielectric surface for direct bonding during a microelectronics fabrication process includes overfilling cavities and trenches in the dielectric surface with a temporary filler that has an approximately equal chemical and mechanical resistance to a chemical-mechanical planarization (CMP) process as the dielectric bonding surface. The CMP process is applied to the temporary filler to flatten the temporary filler down to the dielectric bonding surface. The temporary filler is then removed with an etchant that is selective to the temporary filler, but nonreactive toward the dielectric surface and toward inner surfaces of the cavities and trenches in the dielectric bonding surface. Edges of the cavities remain sharp, which minimizes oxide artifacts, strengthens the direct bond, and reduces the bonding seam. | 2021-09-16 |
20210287911 | ATOMIC LAYER ETCHING USING ACID HALIDE - A method of atomic layer etching a silicon oxide film or a silicon nitride film is provided. Atomic layer etching (ALE) is performed by repeating three steps of (1) hydrogenation step of hydrogenating a surface by irradiating a silicon oxide film or a silicon nitride film with a plasma containing H, (2) acid halide adsorption step of causing chemisorption of an acid halide represented by a formula of Rf—COX (Rf is H, F, a substituent consisting of C and F or consisting of C, H, and F, or —COX; each X is independently any halogen atom of F, Cl, Br and I) on the surface by reacting the acid halide with the hydrogenated surface through exposure to the acid halide, and (3) etching step of etching a single atomic layer by inducing chemical reactions on the surface of the acid halide-adsorbed silicon oxide film or silicon nitride film through irradiation with a plasma containing a noble gas (at least any one of He, Ar, Ne, Kr, and Xe). | 2021-09-16 |
20210287912 | METHOD FOR FABRICATING LAYER STRUCTURE HAVING TARGET TOPOLOGICAL PROFILE - A method for fabricating a layer structure having a target topology profile in a step which has a side face and a lateral face, includes processes of: (a) depositing a dielectric layer on a preselected area of the substrate under first deposition conditions, wherein the dielectric layer has a portion whose resistance to fluorine and/or chlorine radicals under first dry-etching conditions is tuned; and (b) exposing the dielectric layer obtained in process (a) to the fluorine and/or chlorine radicals under the first dry-etching conditions, thereby removing at least a part of the portion of the dielectric layer, thereby forming a layer structure having the target topology profile on the substrate. | 2021-09-16 |
20210287913 | ETCHING METHOD AND ELEMENT CHIP MANUFACTURING METHOD - An etching method including: a preparation step of preparing a resin layer and an electronic component supported thereby; and a resin etching step of etching the resin layer. The electronic component has a first surface covered with a protective film, a second surface opposite thereto, and a sidewall therebetween. The second surface is facing the resin layer. The resin layer is larger than the electronic component when seen from the first surface side. The resin etching step includes: a deposition step of depositing a first film, using a first plasma, on a surface of the protective film and a surface of the resin layer; and a removal step of removing, using a second plasma, the first film deposited on the resin layer and at least part of the resin layer. The deposition and removal steps are alternately repeated, with the protective film allowed to continue to exist. | 2021-09-16 |
20210287914 | ETCHING PROCESS WITH IN-SITU FORMATION OF PROTECTIVE LAYER - In a method, a mask is formed on a microstructure over a substrate. The mask includes a first pattern over a first region of the microstructure and a second pattern over a second region of the microstructure. A first etching process is performed to etch the microstructure by providing an etching gas and applying a first bias voltage to the substrate according to the first and second patterns of the mask. A protective layer is subsequently formed by providing a deposition gas and applying a second bias voltage to the substrate to cover the first pattern of the mask. A second etching process is performed to transfer the second pattern of the mask further into the second region of the microstructure. The deposition gas has a higher carbon to fluorine ratio than the etching gas, and the second bias voltage is smaller than the first bias voltage. | 2021-09-16 |