| 32nd week of 2012 patent applcation highlights part 14 |
| Patent application number | Title | Published |
|---|
| 20120199896 | NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE FOR SUPPRESSING DETERIORATION IN JUNCTION BREAKDOWN VOLTAGE AND SURFACE BREAKDOWN VOLTAGE OF TRANSISTOR - According to one embodiment, a non-volatile semiconductor memory device includes a plurality of memory cells and a transistor. The transistor includes a gate insulating film, a gate electrode on the gate insulating film, a sidewall insulating film on both side surfaces of the gate electrode, a source diffusion layer corresponding to the sidewall insulating film, a first hollow formed in a position at a height less than a bottom surface of the gate insulating film directly below an outer side surface of the sidewall insulating film of another side of the gate electrode, a second hollow formed in the first hollow at a position at a height less than the first hollow, and a drain diffusion layer corresponding to another side of the gate electrode and including a low-concentration drain region formed on a bottom surface of the second hollow and a high-concentration drain region. | 2012-08-09 |
| 20120199897 | THREE-DIMENSIONAL SEMICONDUCTOR DEVICES - Three-dimensional semiconductor devices are provided. The three-dimensional semiconductor device includes a substrate, a buffer layer on the substrate. The buffer layer includes a material having an etching selectivity relative to that of the substrate. A multi-layer stack including alternating insulation patterns and conductive patterns is provided on the buffer layer opposite the substrate. One or more active patterns respectively extend through the alternating insulation patterns and conductive patterns of the multi-layer stack and into the buffer layer. Related fabrication methods are also discussed. | 2012-08-09 |
| 20120199898 | ULTRAHIGH DENSITY VERTICAL NAND MEMORY DEVICE AND METHOD OF MAKING THEREOF - Monolithic, three dimensional NAND strings include a semiconductor channel, at least one end portion of the semiconductor channel extending substantially perpendicular to a major surface of a substrate, a plurality of control gate electrodes having a strip shape extending substantially parallel to the major surface of the substrate, the blocking dielectric comprising a plurality of blocking dielectric segments, a plurality of discrete charge storage segments, and a tunnel dielectric located between each one of the plurality of the discrete charge storage segments and the semiconductor channel. | 2012-08-09 |
| 20120199899 | SEMICONDUCTOR DEVICE HAVING FIELD PLATE ELECTRODE AND METHOD FOR MANUFACTURING THE SAME - According to one embodiment, in a semiconductor device, a first semiconductor layer of a first conductivity type has a first impurity concentration. A second semiconductor layer of the first conductivity type is formed on the first semiconductor layer and has a second impurity concentration lower than the first impurity concentration. A field plate electrode is formed in a lower portion of a trench formed in the second semiconductor layer through a first insulating film so as to bury the lower portion of the trench. A second insulating film is formed in the upper portion of the trench so as to be in contact with the top surface of the field plate electrode. A gate electrode is formed in the upper portion of the trench through a gate insulating film so as to bury the upper portion of the trench to sandwich the second insulating film. | 2012-08-09 |
| 20120199900 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device includes: a semiconductor substrate; an interlayer film on the substrate; a surface electrode on the interlayer film; a surface pad on the surface electrode; a backside electrode on the substrate; an element area including a cell portion having a vertical semiconductor element and a removal portion having multiple contact regions; and an outer periphery area. The surface electrode in the removal portion is electrically coupled with each contact region through a first contact hole in the interlayer film. The surface electrode in the cell portion is electrically coupled with the substrate through a second contact hole in the interlayer film. A part of the surface electrode in the removal portion facing each contact region is defined as a contact portion. The surface electrode includes multiple notches on a shortest distance line segment between each contact portion and the surface pad. | 2012-08-09 |
| 20120199901 | SEMICONDUCTOR DEVICE - A semiconductor device includes an active region, a gate conductor and a source electrode. The active region includes a drain region, a channel region stacked on the drain region, and a source region stacked on the channel region. The active region is formed of a silicon semiconductor layer. The gate conductor is embedded within a trench, which is formed from the source region to the drain region penetrating through the channel region. The source electrode is formed to come in contact with the source region and includes an adhesion layer. The source electrode is formed of a metal layer having a film thickness of 150 Å or smaller. The interface between the source electrode and the source region is silicidized. | 2012-08-09 |
| 20120199902 | TRENCH MOS BARRIER SCHOTTKY (TMBS) HAVING MULTIPLE FLOATING GATES - A semiconductor rectifier is provided which includes a semiconductor substrate having a first type of conductivity. An epitaxial layer is formed on the substrate. The epitaxial layer has the first type of conductivity and is more lightly doped than the substrate. A plurality of floating gates is formed in the epitaxial layer and a metal layer is disposed over the epitaxial layer to form a Schottky contact therebetween. A first electrode is formed over the metal layer and a second electrode is formed on a backside of the substrate. | 2012-08-09 |
| 20120199903 | SEMICONDUCTOR DEVICE HAVING A SUPER JUNCTION - A semiconductor device having a super junction includes: a substrate having a first electrical type; a main body including a base part that has the first electrical type, and a modified part that has a second electrical type opposite to the first electrical type; a source zone contacting the modified part oppositely of the substrate, and having the first electrical type; and a gate structure having a dielectric layer that contacts the source zone, and a conductive layer formed on the dielectric layer oppositely of the main body. | 2012-08-09 |
| 20120199904 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A field drain insulating part has a first insulating film and a high dielectric constant insulating film. The first insulating film is positioned at least in the center of the field drain insulating part in a plan view. The high dielectric constant insulating film is positioned at a part close to a drain region in the edge of the bottom surface of the field drain insulating part, and has a higher dielectric constant than the first insulating film. The high dielectric constant insulating film is not positioned in the center of the field drain insulating part in a plan view. | 2012-08-09 |
| 20120199905 | SEMICONDUCTOR DEVICE - A semiconductor device with improved characteristics is provided. The semiconductor device includes a LDMOS, a source plug electrically coupled to a source region of the LDMOS, a source wiring disposed over the source plug, a drain plug electrically coupled to a drain region of the LDMOS, and a drain wiring disposed over the drain plug. The structure of the source plug of the semiconductor device is devised. The semiconductor device is structured such that the drain plug is linearly disposed to extend in a direction Y, and the source plug includes a plurality of separated source plugs arranged at predetermined intervals in the direction Y. In this way, the separation of the source plug decreases an opposed area between the source plug and the drain plug, and can thus decrease the parasitic capacitance therebetween. | 2012-08-09 |
| 20120199906 | SEMICONDUCTOR DEVICE INCLUDING HIGH FIELD REGIONS AND RELATED METHOD - A semiconductor device is disclosed. In an embodiment, a semiconductor device includes a N-well within a P-well in a silicon layer, the silicon layer positioned atop a buried oxide layer of a silicon-on-insulator (SOI) substrate; a first source region and a second source region within a portion of the P-well; a first drain region and a second drain region within a portion of the P-well and within a portion of the N-well; and a gate positioned atop the N-well, wherein a lateral high field region is generated between the N-well and the P-well and a vertical high field region is generated between the gate and the N-well. A related method is disclosed. | 2012-08-09 |
| 20120199907 | LATERAL HYPERABRUPT JUNCTION VARACTOR DIODE IN AN SOI SUBSTRATE - A varactor diode includes a portion of a top semiconductor layer of a semiconductor-on-insulator (SOI) substrate and a gate electrode located thereupon. A first electrode having a doping of a first conductivity type laterally abuts a doped semiconductor region having the first conductivity type, which laterally abuts a second electrode having a doping of a second conductivity type, which is the opposite of the first conductivity type. A hyperabrupt junction is formed between the second doped semiconductor region and the second electrode. The gate electrode controls the depletion of the first and second doped semiconductor regions, thereby varying the capacitance of the varactor diode. A design structure for the varactor diode is also provided. | 2012-08-09 |
| 20120199908 | CAPACITORLESS DRAM ON BULK SILICON - A method of forming capacitorless DRAM over localized silicon-on-insulator comprises the following steps: A silicon substrate is provided, and an array of silicon studs is defined within the silicon substrate. An insulator layer is defined atop at least a portion of the silicon substrate, and between the silicon studs. A silicon-over-insulator layer is defined surrounding the silicon studs atop the insulator layer, and a capacitorless DRAM is formed within and above the silicon-over-insulator layer. | 2012-08-09 |
| 20120199909 | Semiconductor Devices and Methods of Manufacture Thereof - Semiconductor devices and methods of manufacture thereof are disclosed. A complimentary metal oxide semiconductor (CMOS) device includes a PMOS transistor having at least two first gate electrodes comprising a first parameter, and an NMOS transistor having at least two second gate electrodes comprising a second parameter, wherein the second parameter is different than the first parameter. The first parameter and the second parameter may comprise the thickness or the dopant profile of the gate electrode materials of the PMOS and NMOS transistors. The first and second parameter of the at least two first gate electrodes and the at least two second gate electrodes establish the work function of the PMOS and NMOS transistors, respectively. | 2012-08-09 |
| 20120199910 | CMOS STRUCTURE INCLUDING NON-PLANAR HYBRID ORIENTATION SUBSTRATE WITH PLANAR GATE ELECTRODES & METHOD FOR FABRICATION - A semiconductor structure and a method for fabricating the semiconductor structure include a hybrid orientation substrate having a first active region having a first crystallographic orientation that is vertically separated from a second active region having a second crystallographic orientation different than the first crystallographic orientation. A first field effect device having a first gate electrode is located and formed within and upon the first active region and a second field effect device having a second gate electrode is located and formed within and upon the second active region. Upper surfaces of the first gate electrode and the second gate electrode are coplanar. The structure and method allow for avoidance of epitaxial defects generally encountered when using hybrid orientation technology substrates that include coplanar active regions. | 2012-08-09 |
| 20120199911 | VERTICAL DISCRETE DEVICE WITH DRAIN AND GATE ELECTRODES ON THE SAME SURFACE AND METHOD FOR MAKING THE SAME - The present technology discloses a vertical discrete device with gate and drain electrodes on the same surface and method for making the same. The vertical discrete device comprises a deep gate contact that couples the buried gate to a gate electrode which is formed on the same surface as the drain electrode. The discrete device according to the present technology can be used in co-packaging power management applications and the source electrode of the discrete device may be attached to the leadframe of the package. | 2012-08-09 |
| 20120199912 | COMPLEMENTARY STRESS LINER TO IMPROVE DGO/AVT DEVICES AND POLY AND DIFFUSION RESISTORS - Electron mobility and hole mobility is improved in long channel semiconductor devices and resistors by employing complementary stress liners. Embodiments include forming a long channel semiconductor device on a substrate, and forming a complementary stress liner on the semiconductor device. Embodiments include forming a resistor on a substrate, and tuning the resistance of the resistor by forming a complementary stress liner on the resistor. Compressive stress liners are employed for improving electron mobility in n-type devices, and tensile stress liners are employed for improving hole mobility in p-type devices. | 2012-08-09 |
| 20120199913 | Semiconductor Device Having Insulating Film With Increased Tensile Stress and Manufacturing Method Thereof - Over a semiconductor substrate, a silicon nitride film is formed so as to cover n-channel MISFETs. The silicon nitride film is a laminate film which may be made of first, second, and third silicon nitride films. The total film thickness of the first and second silicon nitride films is smaller than half a spacing between a first sidewall spacer and a second sidewall spacer. After being deposited, the first and second silicon nitride films are subjected to treatments to have increased tensile stresses. The total film thickness of the first, second, and third silicon nitride films is not less than half the spacing between the first and second sidewall spacers. The third silicon nitride film is not subjected to any tensile-stress-increasing treatment, or may be subjected to a lesser amount of such treatment. | 2012-08-09 |
| 20120199914 | CMOS Transistor With Dual High-k Gate Dielectric - A CMOS device with transistors having different gate dielectric materials and a method of manufacture thereof. A CMOS device is formed on a workpiece having a first region and a second region. A first gate dielectric material is deposited over the second region. A first gate material is deposited over the first gate dielectric material. A second gate dielectric material comprising a different material than the first gate dielectric material is deposited over the first region of the workpiece. A second gate material is deposited over the second gate dielectric material. The first gate material, the first gate dielectric material, the second gate material, and the second gate dielectric material are then patterned to form a CMOS device having a symmetric V | 2012-08-09 |
| 20120199915 | Patterning Embedded Control Lines for Vertically Stacked Semiconductor Elements - The present invention is generally directed to an apparatus with embedded (bottom side) control lines for vertically stacked semiconductor elements. In accordance with various embodiments, a first semiconductor wafer is provided with a first facing surface on which a first conductive layer is formed. The first semiconductor wafer is attached to a second semiconductor wafer to form a multi-wafer structure, the second semiconductor wafer having a second facing surface on which a second conductive wafer is formed. The first conductive layer is contactingly bonded to the second conductive layer to form an embedded combined conductive layer within said structure. Portions of the combined conductive layer are removed to form a plurality of spaced apart control lines that extend in a selected length or width dimension through said structure. | 2012-08-09 |
| 20120199916 | SEMICONDUCTOR DEVICE - A semiconductor device comprises a semiconductor substrate; an element-forming region that includes semiconductor elements formed on the semiconductor substrate; a buried electrode plug formed so as to penetrate through the semiconductor substrate; and a trench-type electrode that is buried in a trench within the semiconductor substrate positioned between the element-forming region and the buried electrode plug. | 2012-08-09 |
| 20120199917 | SEMICONDUCTOR DEVICE - In one embodiment, a semiconductor device includes a substrate including a step which includes a first upper surface, a second upper surface having a height lower than a height of the first upper surface, and a step side surface located between the first and second upper surfaces. The device further includes a gate insulator provided continuously on the step side surface and the second upper surface of the substrate, and a gate electrode provided on the second upper surface of the substrate via the gate insulator to contact the gate insulator provided on the step side surface of the substrate. The device further includes a source region of a first conductivity type under the first upper surface, a drain region of a second conductivity type under the second upper surface, and a side diffusion region of the second conductivity type between the step side surface and the source region, | 2012-08-09 |
| 20120199918 | FINFET STRUCTURES AND METHODS FOR FABRICATING THE SAME - A method for fabricating a FinFET structure includes fabricating a plurality of parallel fins overlying a semiconductor substrate, each of the plurality of parallel fins having sidewalls and forming an electrode over the semiconductor substrate and between the parallel fins. The electrode is configured to direct an electrical field into the fins, thereby affecting the threshold voltage of the FinFET structure. | 2012-08-09 |
| 20120199919 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A gate electrode achieves a desired work function in a semiconductor device including a field-effect transistor equipped with a gate electrode composed of a metal nitride layer. | 2012-08-09 |
| 20120199920 | STRUCTURED GLASS WAFER FOR PACKAGING A MICROELECTROMECHANICAL-SYSTEM (MEMS) WAFER - A structured glass wafer for packaging a microelectromechanical-system (MEMS) wafer. The structured glass wafer includes a sheet of glass, and an access hole. The sheet of glass has a first side and a second side, and is configured to provide a protective covering for MEMS devices. The access hole extends through the sheet of glass from the first side to the second side of the sheet of glass, and is configured to provide access to a group of electrical contacts of a group of MEMS devices. A packaged MEMS wafer including the structured glass wafer, and a method for fabricating a packaged MEMS wafer are also provided. | 2012-08-09 |
| 20120199921 | SENSOR DEVICE AND METHOD FOR PRODUCING SENSOR DEVICE - Provided is a technique for packaging a sensor structure having a contact sensing surface and a signal processing LSI that processes a sensor signal. The sensor structure has the contact sensing surface and sensor electrodes. The signal processing integrated circuit is embedded in a semiconductor substrate. The sensor structure and the semiconductor substrate are bonded by a bonding layer, forming a sensor device as a single chip. The sensor electrodes and the integrated circuit are sealed inside the sensor device, and the sensor electrodes and external terminals of the integrated circuit are led out to the back surface of the semiconductor substrate through a side surface of the semiconductor substrate. | 2012-08-09 |
| 20120199922 | STORAGE ELEMENT AND MEMORY DEVICE - A storage element includes: a storage layer that has magnetization perpendicular to a film face, the direction of the magnetization being changed corresponding to information; a magnetization fixed layer that has magnetization perpendicular to a film face that is a reference of the information stored in the storage layer; and an insulating layer that is formed of a nonmagnetic body provided between the storage layer and the magnetization fixed layer. The magnetization fixed layer has a structure in which the nonmagnetic layer is interposed between upper and lower ferromagnetic layers which have a laminated ferri-pinned structure of magnetically anti-parallel coupling. The direction of the magnetization of the storage layer is changed by injecting spin-polarized electrons in a lamination direction of a layer structure having the storage layer, the insulating layer, and the magnetization fixed layer, and recording of the information is performed on the storage layer. | 2012-08-09 |
| 20120199923 | METHOD AND APPARATUS FOR CONTROLLING TOPOGRAPHICAL VARIATION ON A MILLED CROSS-SECTION OF A STRUCTURE - An improved method of controlling topographical variations when milling a cross-section of a structure, which can be used to reduce topographical variation on a cross-section of a write-head in order to improve the accuracy of metrology applications. Topographical variation is reduced by using a protective layer that comprises a material having mill rates at higher incidence angles that closely approximate the mill rates of the structure at those higher incidence angles. Topographical variation can be intentionally introduced by using a protective layer that comprises a material having mill rates at higher incidence angles that do not closely approximate the mill rates of the structure at those higher incidence angles. | 2012-08-09 |
| 20120199924 | BSI IMAGE SENSOR PACKAGE WITH VARIABLE LIGHT TRANSMISSION FOR EVEN RECEPTION OF DIFFERENT WAVELENGTHS - A microelectronic image sensor assembly for backside illumination and method of making same are provided. The assembly includes a microelectronic element having contacts exposed at a front face and light sensing elements arranged to receive light of different wavelengths through a semiconductor region adjacent a rear face. The semiconductor region has a first region of material overlying the first light sensing element and a second region of material overlying the second light sensing element such that the first and second wavelengths are able to pass through the first and second regions, respectively, and reach the first and second light sensing elements with substantially the same intensity. | 2012-08-09 |
| 20120199925 | BSI IMAGE SENSOR PACKAGE WITH EMBEDDED ABSORBER FOR EVEN RECEPTION OF DIFFERENT WAVELENGTHS - A microelectronic image sensor assembly for backside illumination and method of making same are provided. The assembly includes a microelectronic element having contacts exposed at a front face and light sensing elements arranged to receive light of different wavelengths through a rear face. A semiconductor region has an opening overlying at least one of first and second light sensing elements, the semiconductor region having a first thickness between the first light sensing element and the rear face and a second thickness between the second light sensing element and the rear face. A light-absorbing material overlies the semiconductor region within the opening above at least one of the light sensing elements such that the first and second light sensing elements receive light of substantially the same intensity. | 2012-08-09 |
| 20120199926 | BSI IMAGE SENSOR PACKAGE WITH VARIABLE-HEIGHT SILICON FOR EVEN RECEPTION OF DIFFERENT WAVELENGTHS - A microelectronic image sensor assembly for backside illumination and method of making same are provided. The assembly includes a microelectronic element having contacts exposed at a front face and light sensing elements arranged to receive light of different wavelengths through a rear face. A semiconductor region has a first thickness between the first light sensing element and the rear face and a second thickness between the second light sensing element and the rear face such that the first and second light sensing elements receive light of substantially the same intensity. A dielectric region is provided at least substantially filling a space of the semiconductor region adjacent at least one of the light sensing elements. The dielectric region may include at least one light guide. | 2012-08-09 |
| 20120199927 | SOLID-STATE IMAGE PICKUP DEVICE AND METHOD OF MAKING THE SAME - A solid-state image pickup device includes a semiconductor substrate in which photoelectric conversion units are arranged. An insulator is disposed on the semiconductor substrate. The insulator has holes associated with the respective photoelectric conversion units. Members are arranged in the respective holes. A light-shielding member is disposed on the opposite side of one of the members from the semiconductor substrate, such that only the associated photoelectric conversion unit is shielded from light. In the solid-state image pickup device, the holes are simultaneously formed and the members are simultaneously formed. | 2012-08-09 |
| 20120199928 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - There are provided a first waveguide member in an imaging region and a peripheral region of a semiconductor substrate and a via plug penetrating the first waveguide member. | 2012-08-09 |
| 20120199929 | NEAR INFRARED CUTOFF FILTER - To provide a near infrared cutoff filter at low costs, which is useful as cover glass for a solid state imaging sensor package, by providing a thin film attenuation layer for effectively shielding α rays emitted from substrate glass in a form not to influence the optical characteristics. A near infrared cutoff filter comprising substrate glass made of fluorophosphate glass containing CuO or phosphate glass containing CuO, and a thin film attenuation layer formed on at least one light-permeable surface of the substrate glass to attenuate α rays emitted from the substrate glass. | 2012-08-09 |
| 20120199930 | SOLID-STATE IMAGING DEVICE, MANUFACTURING METHOD THEREOF, AND ELECTRONIC APPARATUS - Disclosed herein is a solid-state imaging device including: a laminated semiconductor chip configured to be obtained by bonding two or more semiconductor chip sections to each other and be obtained by bonding at least a first semiconductor chip section in which a pixel array and a multilayer wiring layer are formed and a second semiconductor chip section in which a logic circuit and a multilayer wiring layer are formed to each other in such a manner that the multilayer wiring layers are opposed to each other and are electrically connected to each other; and a light blocking layer configured to be formed by an electrically-conductive film of the same layer as a layer of a connected interconnect of one or both of the first and second semiconductor chip sections near bonding between the first and second semiconductor chip sections. The solid-state imaging device is a back-illuminated solid-state imaging device. | 2012-08-09 |
| 20120199931 | SOLID-STATE IMAGING DEVICE, ELECTRONIC APPARATUS, AND METHOD FOR MANUFACTURING THE SAME - A solid-state imaging device includes photoelectric conversion elements on an imaging surface of a substrate, receiving light incident on a light receiving surface and performing photoelectric conversion to produce a signal charge. Electrodes are interposed between the photoelectric conversion elements and light blocking portions are provided above the electrodes and interposed between the photoelectric conversion elements. The light blocking portions include an electrode light blocking portion formed to cover the corresponding electrode, and a pixel isolation and light blocking portion protruding convexly from the upper surface of the electrode light blocking portion. The photoelectric conversion elements are arranged at first pitches on the imaging surface. The electrode light blocking portions and the pixel isolation and light blocking portions are arranged at second and third pitches on the imaging surface. At least the third pitch increases with distance from the center toward the periphery of the imaging surface. | 2012-08-09 |
| 20120199932 | LOW NOISE, STABLE AVALANCHE PHOTODIODE - Quantum avalanche photodiodes are disclosed. An avalanche photodiode in accordance with one or more embodiments of the present invention comprises an absorption region having a first dopant type, a collection region, having a second dopant type, and a multiplication region, coupled between the absorption region and the collection region, wherein a distance of the multiplication region between the absorption region and the collection region is a plurality of avalanche lengths. | 2012-08-09 |
| 20120199933 | SOLID-STATE IMAGE PICKUP DEVICE - A solid-state image pickup device includes a plurality of pixels, each of the pixels including a photoelectric conversion portion, a charge holding portion, a floating diffusion, and a transfer portion. The pixel also includes a beneath-holding-portion isolation layer and a pixel isolation layer. An end portion on a photoelectric conversion portion side of the pixel isolation layer is away from the photoelectric conversion portion compared to an end portion on a photoelectric conversion portion side of the beneath-holding-portion isolation layer, and an N-type semi-conductor region constituting part of the photoelectric conversion portion is disposed under at least part of the beneath-holding-portion isolation layer. | 2012-08-09 |
| 20120199934 | SOLID-STATE IMAGE PICKUP DEVICE AND METHOD FOR MANUFACTURING THE SAME - A solid-state image pickup device includes a photoelectric conversion portion, a charge holding portion configured to include a first-conductivity-type first semiconductor region, and a transfer portion configured to include a transfer gate electrode that controls a potential between the charge holding portion and a sense node. The charge holding portion includes a control electrode. A second-conductivity-type second semiconductor region is disposed on a surface of a semiconductor region between the control electrode and the transfer gate electrode. A first-conductivity-type third semiconductor region is disposed under the second semiconductor region. The third semiconductor region is disposed at a deeper position than the first semiconductor region. | 2012-08-09 |
| 20120199935 | OPTOELECTRONIC DEVICE AND METHOD OF FABRICATING THE SAME - The invention discloses an optoelectronic device and method of fabricating the same. The optoelectronic device according to the invention includes a semiconductor structure combination, a first surface passivation layer formed on an upper surface of the semiconductor structure combination, and a second surface passivation layer formed on the first surface passivation layer. The semiconductor structure combination includes at least one P-N junction. In particular, the interfacial state density of the first surface passivation layer is lower than that of the second surface passivation layer, and the fixed oxide charge density of the second surface passivation layer is higher than that of the first surface passivation layer. | 2012-08-09 |
| 20120199936 | SCHOTTKY DIODE SWITCH AND MEMORY UNITS CONTAINING THE SAME - A switching element that includes a first semiconductor layer, the first semiconductor layer having a first portion and a second portion; a second semiconductor layer, the second semiconductor layer having a first portion and a second portion; an insulating layer disposed between the first semiconductor layer and the second semiconductor layer; a first metal contact in contact with the first portion of the first semiconductor layer forming a first junction and in contact with the first portion of the second semiconductor layer forming a second junction; a second metal contact in contact with the second portion of the first semiconductor layer forming a third junction and in contact with the second portion of the second semiconductor layer forming a fourth junction, wherein the first junction and the fourth junction are Schottky contacts, and the second junction and the third junction are ohmic contacts. | 2012-08-09 |
| 20120199937 | INTEGRATED CIRCUIT - An integrated circuit including a Schottky diode, and a method of making the same. The diode includes an active region bordered by an isolation region in a semiconductor substrate of the integrated circuits, a first electrode having a metal contact provided on a surface of the active region, and a second electrode having a silicide contact also provided on the surface of the active region. | 2012-08-09 |
| 20120199938 | Semiconductor Memory Device and Method of Manufacturing the same - A semiconductor memory device includes a semiconductor substrate defining active regions partitioned by an isolation region, conductive lines spaced apart from each other and crossing the active regions over the semiconductor substrate, a thin film pattern formed on a top portion of the conductive lines having opening portions exposing part of the conductive lines in a width wider than a width of the conductive lines, an insulating layer filling the opening portions and formed over the thin film pattern, and an air gap formed between the conductive lines below the insulating layer and the thin film pattern. | 2012-08-09 |
| 20120199939 | LOCALIZED BIASING FOR SILICON ON INSULATOR STRUCTURES - A silicon-on-insulator device has a localized biasing structure formed in the insulator layer of the SOI. The localized biasing structure includes a patterned conductor that provides a biasing signal to distinct regions of the silicon layer of the SOI. The conductor is recessed into the insulator layer to provide a substantially planar interface with the silicon layer. The conductor is connected to a bias voltage source. In an embodiment, a plurality of conductor is provided that respectively connected to a plurality of voltage sources. Thus, different regions of the silicon layer are biased by different bias signals. | 2012-08-09 |
| 20120199940 | SILICON CARBIDE AND RELATED WIDE-BANDGAP TRANSISTORS ON SEMI INSULATING EPITAXY - A method of making a semi-insulating epitaxial layer includes implanting a substrate or a first epitaxial layer formed on the substrate with boron ions to form a boron implanted region on a surface of the substrate or on a surface of the first epitaxial layer, and growing a second epitaxial layer on the boron implanted region of the substrate or on the boron implanted region of the first epitaxial layer to form a semi-insulating epitaxial layer. | 2012-08-09 |
| 20120199941 | SEMICONDUCTOR DEVICE HAVING SILICON ON STRESSED LINER (SOL) - A method of fabricating an integrated circuit and an integrated circuit having silicon on a stress liner are disclosed. In one embodiment, the method comprises providing a semiconductor substrate comprising an embedded disposable layer, and removing at least a portion of the disposable layer to form a void within the substrate. This method further comprises depositing a material in that void to form a stress liner, and forming a transistor on an outside semiconductor layer of the substrate. This semiconductor layer separates the transistor from the stress liner. In one embodiment, the substrate includes isolation regions; and the removing includes forming recesses in the isolation regions, and removing at least a portion of the disposable layer via these recesses. In one embodiment, the depositing includes depositing a material in the void via the recesses. End caps may be formed in the recesses at ends of the stress liner. | 2012-08-09 |
| 20120199942 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF - A semiconductor device includes a lower wiring layer made of a conductive material; an upper wiring layer formed in an upper layer than the lower wiring layer; and a fuse film, at least a portion of the fuse film being formed in a plug formation layer in which a plug for connecting the lower wiring layer and the upper wiring layer is formed, and made of a conductive material including a metallic material other than copper. | 2012-08-09 |
| 20120199943 | SEMICONDUCTOR DEVICE INCLUDING ANTIFUSE ELEMENT - An element isolation region exists at a side opposite to a diffusion layer region as seen from a channel region, without another electrode to which the same potential as one applied to the diffusion layer region is applied interposed between the channel region and the element isolation region. The electric field applied to the gate insulating film is not uniform and the magnitude of the electric field is increased when approaching closer to the diffusion layer region. Therefore, breakdown is likely to occur at parts closer to the diffusion layer region. | 2012-08-09 |
| 20120199944 | CAPACITORS INCLUDING A RUTILE TITANIUM DIOXIDE MATERIAL, SEMICONDUCTOR DEVICES INCORPORATING SAME AND RELATED METHODS - Methods of forming a capacitor including forming at least one aperture in a support material, forming a titanium nitride material within the at least one aperture, forming a ruthenium material within the at least one aperture over the titanium nitride material, and forming a first conductive material over the ruthenium material within the at least one aperture. The support material may then be removed and the titanium nitride material may be oxidized to form a titanium dioxide material. A second conductive material may then be formed over an outer surface of the titanium dioxide material. Capacitors, semiconductor devices and methods of forming a semiconductor device including the capacitors are also disclosed. | 2012-08-09 |
| 20120199945 | METHOD OF FORMING DEEP TRENCH CAPACITOR - Aspects of the invention provide for methods of forming a deep trench capacitor structure. In one embodiment, aspects of the invention include a method of forming a deep trench capacitor structure, including: forming a deep trench within a semiconductor substrate; depositing a first liner within the deep trench; filling a lower portion of the deep trench with a filler material; depositing a second liner within an upper portion of the deep trench; removing the filler material, such that the lower portion of the deep trench includes only the first liner and the upper portion of the deep trench includes the first liner and the second liner; forming a high doped region around the lower portion of the deep trench; and removing the first liner within the lower portion of the deep trench and the second liner within the upper portion of the deep trench. | 2012-08-09 |
| 20120199946 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE - A semiconductor device manufacturing method includes forming a first capacitance film formed on the lower electrode; forming an intermediate electrode in a first region on the first capacitance film, wherein the first capacitance is interposed between the intermediate electrode and the lower electrode; forming a second capacitance film on the intermediate electrode to be interposed between the first capacitance film and the second capacitance film; and forming an upper electrode, wherein at least a portion of the second capacitance film is interposed between the upper electrode and the intermediate electrode; the upper electrode extending to a second region outside the first region, and having at least the first capacitance film interposed between the upper electrode and the lower electrode in the second region. | 2012-08-09 |
| 20120199947 | METHOD FOR MANUFACTURING AND REOXIDIZING A TIN/TA2O5/TIN CAPACITOR - A method for manufacturing a TiN/Ta2O5/TiN capacitor, including the steps of forming a Ta | 2012-08-09 |
| 20120199948 | SEMICONDUCTOR CHIP COMPRISING PROTECTION MEANS AGAINST A PHYSICAL ATTACK - A semiconductor chip includes a semiconductor substrate, an integrated circuit region having an integrated circuit, and conductive lines extending above the integrated circuit region. To protect the semiconductor chip against a physical attack, the semiconductor chip includes an array of protection capacitors extending above the conductive lines, at least first and second interconnection conductive lines, arranged to interconnect the protection capacitors in parallel, and a cprotection circuit configured to prevent at least some data from circulating on at least some conductive lines, when a short occurs in at least one protection capacitor. | 2012-08-09 |
| 20120199949 | High Density Metal-Insulator-Metal Trench Capacitor - Higher capacitance density is achieved by increasing a surface area of a capacitor. A larger surface area may be obtained by forming isotropic ball shapes (a concave surface) in the trenches on the semiconductor die. The concave surfaces are fabricated by depositing bilayers of amorphous-silicon and silicon oxide. Openings are patterned in the silicon oxide hard mask for trenches. The openings are transferred to the amorphous-silicon layers through isotropic etching to form concave surfaces. Conducting, insulating, and conducting layers are deposited on the concave surfaces of the trenches by atomic layer deposition. | 2012-08-09 |
| 20120199950 | INTEGRATED CIRCUITS HAVING PLACE-EFFICIENT CAPACITORS AND METHODS FOR FABRICATING THE SAME - Integrated circuits having place-efficient capacitors and methods for fabricating the same are provided. A dielectric layer is formed overlying a conductive feature on a semiconductor substrate. A via opening is formed into the dielectric layer to expose a portion of the conductive feature. A partial opening is etched into the dielectric layer and positioned over the conductive feature. Etch resistant particles are deposited overlying the dielectric layer and in the partial opening. The dielectric layer is further etched using the etch resistant particles as an etch mask to extend the partial opening. A first conductive layer is formed overlying the extended partial opening and electrically contacting the conductive feature. A capacitor insulating layer is formed overlying the first conductive layer. A second conductive layer is formed overlying the insulating layer. | 2012-08-09 |
| 20120199951 | INTEGRATED SHUNT RESISTOR WITH EXTERNAL CONTACT IN A SEMICONDUCTOR PACKAGE - An integrated circuit package that comprises a lead frame | 2012-08-09 |
| 20120199952 | Method for Growth of Indium-Containing Nitride Films - A method for growth of indium-containing nitride films is described, particularly a method for fabricating a gallium, indium, and nitrogen containing material. On a substrate having a surface region a material having a first indium-rich concentration is formed, followed by a second thickness of material having a first indium-poor concentration. Then a third thickness of material having a second indium-rich concentration is added to form a sandwiched structure which is thermally processed to cause formation of well-crystallized, relaxed material within a vicinity of a surface region of the sandwich structure. | 2012-08-09 |
| 20120199953 | SEMICONDUCTOR STRUCTURE WITH SMOOTHED SURFACE AND PROCESS FOR OBTAINING SUCH A STRUCTURE - The present invention relates to a process for smoothing the surface of a semiconductor wafer by fusion. The process includes defining a reference length which dimensions wafer surface roughness that is to be reduced or removed, and scanning the surface with a fusion beam while adjusting parameters of the fusion beam so as to fuse, during the scanning of the surface, a local surface zone of the wafer whose length is greater than or equal to the reference length, with the scanning continued to smooth the entire surface of the wafer by eliminating surface roughnesses of period lower than the reference length. The present invention also relates to a semiconductor wafer having a surface layer made of a semiconducting material that is smoothed by the process and that does not exhibit any roughness of period lower than the reference length. | 2012-08-09 |
| 20120199954 | SEMICONDUCTOR DEVICE - A semiconductor device which provides a small and simple design with efficient cooling. A first electrically conducting cooling element is in contact with first electrodes of semiconductor elements for forwarding a heat load from the semiconductor elements and for electrically connecting the first electrodes of the semiconductor elements to an external apparatus. A second electrically conducting cooling element is in contact with second electrodes of the semiconductor elements for forwarding a heat load from the semiconductor elements and for electrically connecting the second electrodes of the semiconductor elements to an external apparatus. The semiconductor device includes an interface which is electrically connected to gates of the semiconductor elements for external control of respective states of the semiconductor elements. | 2012-08-09 |
| 20120199955 | PACKAGE CARRIER AND MANUFACTURING METHOD THEREOF - A manufacturing method of a package carrier is provided. A first opening communicating an upper surface and a lower surface of a substrate is formed. A heat-conducting element having a top surface and a bottom surface is configured in the first opening and fixed into the first opening via an insulation material. A first insulation layer and a first metal layer are laminated onto the upper surface. A second insulation layer and a second metal layer are laminated onto the lower surface. A second opening and a third opening respectively exposing portions of the top and the bottom surfaces are formed. At least one through via passing through the first metal layer, the first insulation layer, the substrate, the second insulation layer and the second metal layer is formed. A third metal layer covering the first and second metal layers and an inner wall of the through via is formed. | 2012-08-09 |
| 20120199956 | METHOD FOR RECYCLING A SOURCE SUBSTRATE - The present invention relates to process for recycling a source substrate that has a surface region and regions in relief on the surface region, with the regions in relief corresponding to residual regions of a layer of the source substrate that were not being separated from the rest of the source substrate during a prior removal step. The process includes selective electromagnetic irradiation of the source substrate at a wavelength such that the damaged material of the surface region absorbs the electromagnetic irradiation. The present invention also relates to a recycled source substrate and to a process for transferring a layer from a source substrate recycled for this purpose. | 2012-08-09 |
| 20120199957 | PHOTORESISTS AND METHODS FOR USE THEREOF - New photoresists are provided that comprise a multi-keto component and that are particularly useful for ion implant lithography applications. Preferred photoresists of the invention can exhibit good adhesion to underlying inorganic surfaces such as SiON, silicon oxide, silicon nitride, hafnium silicate, zirconium silicate and other inorganic surfaces. | 2012-08-09 |
| 20120199958 | METHOD OF MANUFACTURING HIGH FREQUENCY MODULE AND HIGH FREQUENCY MODULE - In a high frequency module, electronic components are mounted on a mounting surface of a collective substrate including a plurality of unit substrates that include a via conductor electrically conducted to a ground potential in a peripheral portion thereof, and the mounting surface and the electronic components are encapsulated with an encapsulation layer. The collective substrate is cut on the encapsulation layer side, thereby forming a half-cut groove penetrating through the encapsulation layer and extending halfway along the collective substrate in a thickness direction such that the via conductor is exposed only at a bottom surface of the half-cut groove. A conductive shield layer is formed to cover the encapsulation layer and is electrically conducted to the exposed via conductor. The collective substrate is then cut into individual unit substrates each including the conductive shield layer electrically conducted to the ground potential through the via conductor. | 2012-08-09 |
| 20120199959 | EXTENDED UNDER-BUMP METAL LAYER FOR BLOCKING ALPHA PARTICLES IN A SEMICONDUCTOR DEVICE - An integrated circuit (IC) has an under-bump metal (UBM) pad disposed between a solder bump and a semiconductor portion of the IC. A UBM layer is disposed between the solder bump and the semiconductor portion and includes the UBM pad and a UBM field. The UBM pad has a contact perimeter formed with the solder bump. The UBM pad extends beyond the contact perimeter a sufficient distance to block alpha particles emitted from the surface of the solder bump from causing an upset event in the semiconductor portion. The UBM field is separated from each UBM pad by a gap extending from the UBM pad to the UBM field so as to electrically isolate the UBM field from the UBM pad. | 2012-08-09 |
| 20120199960 | WIRE BONDING FOR INTERCONNECTION BETWEEN INTERPOSER AND FLIP CHIP DIE - An integrated circuit (IC) device includes an interposer having a dielectric substrate having a first side, a second side, and an inner aperture, wherein a plurality of electrically conductive traces are on the first side. An IC die includes a topside semiconductor surface having active circuitry and a bottomside surface, wherein the topside semiconductor surface includes a plurality of bond pads, and is attached over the inner aperture onto the interposer. First wirebond interconnects couple respective bond pads to respective electrically conductive traces. A workpiece includes a top workpiece surface including a plurality of contact pads thereon attached to the first side of the interposer. Second interconnects couple respective conductive traces to respective contact pads on the workpiece. | 2012-08-09 |
| 20120199961 | SEMICONDUCTOR PACKAGES HAVING LEAD FRAMES - Semiconductor packages include a semiconductor chip, a lead frame on which the semiconductor chip is mounted, and a mold layer to encapsulate the semiconductor chip and the lead frame. The lead frame is electrically connected to the semiconductor chip. The lead frame includes a first lead frame and a second lead frame. The first lead frame is electrically connected to the semiconductor chip by a plurality of bonding wires. The first lead frame has outer leads that protrude from the mold layer. The second lead frame is attached to the first lead frame by an insulating adhesion layer. The second lead frame provides a mounting surface on which the semiconductor chip is mounted. The first and second lead frames support the semiconductor chip. | 2012-08-09 |
| 20120199962 | Semiconductor Package with Cantilever Leads - A semiconductor package includes a metallic leadframe having a plurality of cantilever leads, a mounting area for mounting a die, and one or more non-conductive supports adjacent to a recessed surface of the cantilever leads to support the leads during die mount, wire bond, and encapsulation processes. Encapsulant encapsulates and supports at least a portion of the die, the leadframe. | 2012-08-09 |
| 20120199963 | Package-on-Package Using Through-Hole Via Die on Saw Streets - A semiconductor package-on-package (PoP) device includes a first die incorporating a through-hole via (THV) disposed along a peripheral surface of the first die. The first die is disposed over a substrate or leadframe structure. A first semiconductor package is electrically connected to the THV of the first die, or electrically connected to the substrate or leadframe structure. An encapsulant is formed over a portion of the first die and the first semiconductor package. | 2012-08-09 |
| 20120199964 | ELECTRONIC DEVICE HAVING STACK-TYPE SEMICONDUCTOR PACKAGE AND METHOD OF FORMING THE SAME - An electronic device includes a lower electronic part including a lower substrate, a lower chip structure disposed on the lower substrate, and a lower molding layer covering the lower chip structure and having a recessed region in an upper surface of the lower molding layer, and an upper electronic part including an upper substrate disposed on the lower electronic part, and an upper chip structure projecting from the upper substrate, wherein the recessed region of the lower molding layer receives the upper chip structure. | 2012-08-09 |
| 20120199965 | Semiconductor Device and Method of Forming Sacrificial Protective Layer to Protect Semiconductor Die Edge During Singulation - A semiconductor wafer contains a plurality of semiconductor die separated by a saw street. An insulating layer is formed over the semiconductor wafer. A protective layer is formed over the insulating layer including an edge of the semiconductor die along the saw street. The protective layer covers an entire surface of the semiconductor wafer. Alternatively, an opening is formed in the protective layer over the saw street. The insulating layer has a non-planar surface and the protective layer has a planar surface. The semiconductor wafer is singulated through the protective layer and saw street to separate the semiconductor die while protecting the edge of the semiconductor die. Leading with the protective layer, the semiconductor die is mounted to a carrier. An encapsulant is deposited over the semiconductor die and carrier. The carrier and protective layer are removed. A build-up interconnect structure is formed over the semiconductor die and encapsulant. | 2012-08-09 |
| 20120199966 | Elongated Bump Structure for Semiconductor Devices - An elongated bump structure for semiconductor devices is provided. An uppermost protective layer has an opening formed therethrough. A pillar is formed within the opening and extending over at least a portion of the uppermost protective layer. The portion extending over the uppermost protective layer exhibits a generally elongated shape. In an embodiment, the position of the opening relative to the portion of the bump structure extending over the uppermost protective layer is such that a ratio of a distance from an edge of the opening to an edge of the bump is greater than or equal to about 0.2. In another embodiment, the position of the opening is offset relative to center of the bump. | 2012-08-09 |
| 20120199967 | Interconnection Structure - An electrical interconnect for connecting an IC chip to a PCB, the electrical interconnect comprising a plurality of connection elements for connection to the PCB attached to a first surface of the electrical interconnect, wherein the amount of thermal and/or mechanical stress that each solder element connection can take before failing is improved. | 2012-08-09 |
| 20120199968 | SEMICONDUCTOR PACKAGE - A semiconductor package and method of manufacturing thereof are provided. The package includes: a substrate; a first metal wire on a top surface of the substrate; a first semiconductor chip disposed on the substrate; a first insulation layer which covers the first semiconductor chip and at least a part of the substrate; a second metal wire formed on a top surface of the first insulation layer; a first via formed in the first insulation layer, wherein the first via electrically connects the second metal wire and the first metal wire; and a second semiconductor chip disposed on the second metal wire, wherein the second semiconductor chip is electrically connected to the second metal wire. | 2012-08-09 |
| 20120199969 | SEMICONDUCTOR DEVICE - A semiconductor device has a semiconductor chip mounted on a circuit board. The semiconductor chip includes: a semiconductor substrate; a first pad formed on the semiconductor substrate; a second pad formed on the first pad via an interlayer insulating film; a via formed through the interlayer insulating film for connecting the first pad with the second pad; a protection film that is formed on the second pad and has an opening exposing a center portion of the second pad; and a barrier metal layer formed on the portion of the second pad exposed from the opening of the protection film and on a portion of the protection film surrounding the opening. The diameter of the via is smaller than the diameter of the opening of the protection film, and the center of the via corresponds with the center of the barrier metal layer. | 2012-08-09 |
| 20120199970 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - A semiconductor device includes a substrate having a via region and a circuit region, an insulation interlayer formed on a top surface of the substrate, a through electrode having a first surface and a second surface, wherein the through electrode penetrates the via region of the substrate and the second surface is substantially coplanar with a bottom surface of the substrate, a first upper wiring formed on a portion of the first surface of the through electrode, a plurality of via contacts formed on a portion of a top surface of the first upper wiring, and a second upper wiring formed on the plurality of via contacts. | 2012-08-09 |
| 20120199971 | Embedded Semiconductor Die Package and Method of Making the Same Using Metal Frame Carrier - An embedded semiconductor die package is made by mounting a frame carrier to a temporary carrier with an adhesive. The frame carrier includes die mounting sites each including a leadframe interconnect structure around a cavity. A semiconductor die is disposed in each cavity. An encapsulant is deposited in the cavity over the die. A package interconnect structure is formed over the leadframe interconnect structure and encapsulant. The package interconnect structure and leadframe interconnect structure are electrically connected to the die. The frame carrier is singulated into individual embedded die packages. The semiconductor die can be vertically stacked or placed side-by-side within the cavity. The embedded die packages can be stacked and electrically interconnected through the leadframe interconnect structure. A semiconductor device can be mounted to the embedded die package and electrically connected to the die through the leadframe interconnect structure. | 2012-08-09 |
| 20120199972 | Semiconductor Device and Method of Forming Vertical Interconnect Structure Using Stud Bumps - A semiconductor device is made by forming a conductive layer over a temporary carrier. The conductive layer includes a wettable pad. A stud bump is formed over the wettable pad. The stud bump can be a stud bump or stacked bumps. A semiconductor die is mounted to the carrier. An encapsulant is deposited over the semiconductor die and around the stud bump. A first interconnect structure is formed over a first surface of the encapsulant. The first interconnect structure includes a first IPD and is electrically connected to the stud bump. The carrier is removed. A second interconnect structure is formed over a second surface of encapsulant opposite the first interconnect structure. The second interconnect structure includes a second IPD. The first or second IPD includes a capacitor, resistor, or inductor. The semiconductor devices are stackable and electrically connected through the stud bump. | 2012-08-09 |
| 20120199973 | INTERCHANGEABLE CONNECTION ARRAYS FOR DOUBLE-SIDED DIMM PLACEMENT - A memory module has an array of connections. The array of connections is arranged in rows and columns such that there are first and second outer columns. Connections in the first and second outer columns can be interchanged to optimize double-side module placement on a substrate. Other embodiments are also disclosed and claimed. | 2012-08-09 |
| 20120199974 | Silicon-Based Thin Substrate and Packaging Schemes - A silicon-based thin package substrate is used for packaging semiconductor chips. The silicon-based thin package substrate preferably has a thickness of less than about 200 μm. A plurality of traces is formed in the silicon-based thin package substrate, connecting BGA balls and solder bumps. A semiconductor chip may be mounted on the solder bumps. The silicon-based thin package substrate may be used as a carrier of semiconductor chips. | 2012-08-09 |
| 20120199975 | ENHANCED ELECTROMIGRATION RESISTANCE IN TSV STRUCTURE AND DESIGN - The embodiments provide a method for reducing electromigration in a circuit containing a through-silicon via (TSV) and the resulting novel structure for the TSV. A TSV is formed through a semiconductor substrate. A first end of the TSV connects to a first metallization layer on a device side of the semiconductor substrate. A second end of the TSV connects to a second metallization layer on a grind side of the semiconductor substrate. A first flat edge is created on the first end of the TSV at the intersection of the first end of the TSV and the first metallization layer. A second flat edge is created on the second end of the TSV at the intersection of the second end of the TSV and the second metallization layer. On top of the first end a metal contact grid is placed, having less than eighty percent metal coverage. | 2012-08-09 |
| 20120199976 | INTERCONNECT STRUCTURE HAVING A VIA WITH A VIA GOUGING FEATURE AND DIELECTRIC LINER SIDEWALLS FOR BEOL INTEGRATION - An interconnect structure including a lower interconnect level with a first dielectric layer having a first conductive material embedded therein; a dielectric capping layer located on the first dielectric layer and some portions of the first conductive material; an upper interconnect level including a second dielectric layer having at least one via opening filled with a second conductive material and at least one overlying line opening filled with the second conductive material disposed therein, wherein the at least one via opening is in contact with the first conductive material in the lower interconnect level by a via gouging feature; a dielectric liner on sidewalls of the at least one via opening; and a first diffusion barrier layer on sidewalls and a bottom of both the at least one via opening and the at least one overlying line opening. A method of forming the interconnect structure is also provided. | 2012-08-09 |
| 20120199977 | SEMICONDUCTOR DEVICE - To prevent generation of cracks in an insulating film provided under a bonding pad, a semiconductor device includes a three-layered bonding pad, and the three-layered bonding pad includes a first metal film, a second metal film, and a third metal film, in which the second metal film has a Young's modulus higher than a Young's modulus of the first metal film and a Young's modulus of the third metal film. | 2012-08-09 |
| 20120199978 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR WAFER - In a method for manufacturing a semiconductor device, a process of providing a semiconductor wafer having a wiring layer having conductive patterns and a plurality of insulation films containing a first insulation film surrounding side surfaces of the conductive patterns are provided. After the process of providing the semiconductor wafer, a process of removing some regions of the plurality of insulation films to form openings is provided. Herein, the first insulation film is disposed to a position closer to the circumference of the semiconductor wafer than a position closest to the outermost circumference of the wafer among the arrangement positions of the conductive patterns. | 2012-08-09 |
| 20120199979 | METHOD OF PROCESSING DUMMY PATTERN BASED ON BOUNDARY LENGTH AND DENSITY OF WIRING PATTERN, SEMICONDUCTOR DESIGN APPARATUS AND SEMICONDUCTOR DEVICE - A semiconductor device, includes a first wiring pattern in a first region, a second wiring pattern in a second region, and at least one first dummy pattern formed in the first region and at least one second dummy pattern formed in the second region. A total area of the at least one first dummy pattern is the same as a total area of the at least one second dummy pattern and a total length of pattern periphery of the at least one second dummy pattern is longer than a total length of pattern periphery of the at least one first dummy pattern. The first region and the second region have same area. | 2012-08-09 |
| 20120199980 | INTEGRATED CIRCUITS HAVING INTERCONNECT STRUCTURES AND METHODS FOR FABRICATING INTEGRATED CIRCUITS HAVING INTERCONNECT STRUCTURES - Integrated circuits and methods for fabricating an integrated circuit are provided. A conductive feature is formed in a semiconductor substrate. A layer of ULK or LK dielectric material is formed overlying the conductive feature. An opening having a sidewall surface is etched through the layer of ULK or LK dielectric material. Damage on the sidewall surface resulting from the etching is removed. An ULK or LK dielectric liner is formed overlying the sidewall surface. The ULK or LK dielectric liner along the bottom of the opening is removed to expose the conductive feature. The opening is filled with a metal fill material contacting the conductive feature. | 2012-08-09 |
| 20120199981 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SEMICONDUCTOR DEVICE - A semiconductor device includes a first device including a first substrate and a first external connection terminal for connecting outside the first device; a second device stacked on the first device, the second device including a second substrate and a second external connection terminal for connecting outside the second device; an adhesive pattern disposed between the first device and second device, the adhesive pattern disposed in locations other than locations where the first external connection terminal and second external connection terminal are disposed, and the adhesive pattern causing the first device and second device, when stacked, to be spaced apart by a predetermined distance; and a plated layer disposed between and electrically and physically connecting the first external connection terminal and the second external connection terminal. | 2012-08-09 |
| 20120199982 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device according to an embodiment includes: a semiconductor substrate; a plurality of interconnect layers disposed at different heights from the semiconductor substrate, each interconnect layer including an interconnection formed therein; and a via formed in a columnar shape extending in the stack direction of the interconnect layers, the via electrically connecting the interconnections of the different interconnect layers, the interconnections including a plurality of intermediate interconnections in contact with the via in the intermediate portion thereof, the intermediate interconnections including a plurality of first type intermediate interconnections passing through the via in a direction perpendicular to the stack direction, and the first type intermediate interconnection of a first one of the interconnect layer and the first type intermediate interconnection of a second one of the interconnect layer are intersecting each other in the via. | 2012-08-09 |
| 20120199983 | ENHANCED ELECTROMIGRATION RESISTANCE IN TSV STRUCTURE AND DESIGN - The embodiments provide a method for reducing electromigration in a circuit containing a through-silicon via (TSV) and the resulting novel structure for the TSV. A TSV is formed through a semiconductor substrate. A first end of the TSV connects to a first metallization layer on a device side of the semiconductor substrate. A second end of the TSV connects to a second metallization layer on a grind side of the semiconductor substrate. A first flat edge is created on the first end of the TSV at the intersection of the first end of the TSV and the first metallization layer. A second flat edge is created on the second end of the TSV at the intersection of the second end of the TSV and the second metallization layer. On top of the first end a metal contact grid is placed, having less than eighty percent metal coverage. | 2012-08-09 |
| 20120199984 | SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING THE SAME, AND DATA PROCESSING DEVICE - A semiconductor device comprises a material layer including a first surface and a trench with an opening in the first surface. The trench is formed in the material layer. The trench comprises a tapered portion and a vertical portion. The tapered portion is in contact with the opening and comprises a scalloping-forming trench. The vertical portion has a substantially vertical sidewall. A width of the scalloping-forming trench is larger than a width of the vertical portion. | 2012-08-09 |
| 20120199985 | COMPLIANT CORE PERIPHERAL LEAD SEMICONDUCTOR TEST SOCKET - An electrical interconnect for providing a temporary interconnect between terminals on an IC device and contact pads on a printed circuit board (PCB). The electrical interconnect includes a substrate with a first surface having a plurality of openings arranged to correspond to the terminals on the IC device. A compliant material is located in the openings. A plurality of conductive traces extend along the first surface of the substrate and onto the compliant material. The compliant material provides a biasing force that resists flexure of the conductive traces into the openings. Conductive structures are electrically coupled to the conductive traces over the openings. The conductive structures are adapted to enhance electrical coupling with the terminals on the IC device. Vias electrically extending through the substrate couple the conductive traces to PCB terminals located proximate a second surface of the substrate. | 2012-08-09 |
| 20120199986 | Semiconductor Device and Manufacturing Method Thereof - A wiring line is electrically connected in parallel to an auxiliary wiring line via a plurality of contact holes. The contact holes are formed through an insulating film and arranged in vertical direction to the wiring line. Since the auxiliary wiring line is formed in the same layer as an electrode that constitutes a TFT, the electric resistance of the wiring line can be reduced effectively without increasing the number of manufacturing steps. | 2012-08-09 |
| 20120199987 | METHODS FOR FORMING THREE-DIMENSIONAL MEMORY DEVICES, AND RELATED STRUCTURES - Methods of forming semiconductor devices that include one or more arrays of memory devices in a three-dimensional arrangement, such as those that include forming a conductive contact in a dielectric material overlying a memory array, wherein a wafer bonding and cleaving process may be utilized to provide a foundation material for forming another memory array having an active region in electrical contact with the conductive contact. Additionally, the conductive contact may be formed in a donor wafer, which in turn may be bonded to a dielectric material overlying a memory array using another wafer bonding process. Novel semiconductor devices and structures including the same may be formed using such methods, for example. | 2012-08-09 |
| 20120199988 | METHOD OF MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, AND APPARATUS FOR MANUFACTURING ELECTRONIC DEVICE - Disclosed is a method of manufacturing an electronic device, that includes obtaining a stack of the first electronic component and the second electronic component, while placing a resin layer which contains a flux-active compound and a thermosetting resin, between the first terminals and the second terminals; bonding the first terminals and the second terminals with solder, by heating the stack at a temperature not lower than the melting point of solder layers on the first terminals, while pressurizing the stack using a fluid; and curing the resin layer. The duration from the point of time immediately after the start of heating of the stack, up to the point of time when the temperature of the stack reaches the melting point of the solder layers, is set to 5 seconds or longer, and 15 minutes or shorter. | 2012-08-09 |
| 20120199989 | CIRCUIT ARRANGEMENT AND MANUFACTURING METHOD THEREOF - Exemplary embodiments of the disclosure are directed to a circuit arrangement in which a power functional device and a conductor element are mounted and a method of manufacturing the same. The arrangement includes a substrate, a wiring layer provided on the substrate and electrically connected to the functional device and to the conductor element and an intermediate electric contact device. The intermediate electric contact device is mounted on the wiring layer to provide on the side opposite to the wiring layer a contact region for contacting the conductor element. The conductor element is contacting the intermediate electric contact device in the contact region which is opposite to an area, in which the electric contact device is fixed to the wiring layer. | 2012-08-09 |
| 20120199990 | Semiconductor Module Having Deflecting Conductive Layer Over a Spacer Structure - A module includes a semiconductor chip and a conductive layer arranged over the semiconductor chip. The module also includes a spacer structure arranged to deflect the conductive layer away from the semiconductor chip. | 2012-08-09 |
| 20120199991 | SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME, AND POWER SUPPLY - A semiconductor device includes: a semiconductor chip including a nitride semiconductor layered structure including a carrier transit layer and a carrier supply layer; a first resin layer on the semiconductor chip, the first resin layer including a coupling agent; a second resin layer on the first resin layer, the second resin layer including a surfactant; and a sealing resin layer to seal the semiconductor chip with the first resin layer and the second resin layer. | 2012-08-09 |
| 20120199992 | EPOXY RESIN COMPOSITION FOR ENCAPSULATING SEMICONDUCTOR, SEMICONDUCTOR DEVICE, AND MOLD RELEASING AGENT - Disclosed is an epoxy resin composition used for encapsulation of a semiconductor containing an epoxy resin (A), a curing agent (B), an inorganic filler (C) and a mold releasing agent, in which the mold releasing agent contains a compound (D) having a copolymer of an α-olefin having 28 to 60 carbon atoms and a maleic anhydride esterified with a long chain aliphatic alcohol having 10 to 25 carbon atoms. | 2012-08-09 |
| 20120199993 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - In one embodiment, an adhesive layer is formed by applying a liquid adhesive to a semiconductor wafer whose wafer shape is maintained by a surface protective film attached to a first surface. A supporting sheet having a tacky layer is attached to a second surface of the semiconductor wafer. After the surface protective film is peeled, the supporting sheet is expanded to cleave the adhesive layer including the adhesive filled into the dicing grooves. The first surface of the semiconductor wafer is cleaned while an expansion state of the supporting sheet is maintained. Tack strength of portions corresponding to the dicing grooves of the tacky layer is selectively reduced before cleaning. | 2012-08-09 |
| 20120199994 | APPARATUS AND METHOD FOR A SUB MICROSCOPIC AND OPTICALLY VARIABLE IMAGE CARRYING DEVICE - The present invention relates generally to an apparatus for embossing a flexible substrate. More specifically, the present invention relates to an apparatus for embossing a curable composition coated flexible substrate with an optically variable image transferred from an embossing foil, especially belt, or sheet of an optically transparent fluoropolymer. The optically variable image is irradiated through the embossing belt, or sheet with ultra-violet light contemporaneously with the embossing so that the transferred imprint pattern cures, hardens, and retains its shape. | 2012-08-09 |
| 20120199995 | APPARATUS AND METHOD FOR FORMATION OF AN ENERGIZED OPHTHALMIC DEVICE FOR LIGHT THERAPY - This invention discloses methods and apparatus for providing an ophthalmic lens with light source capable of providing specific bandwidths of light to an eye of a wearer. In some embodiments, an ophthalmic lens is cast molded from a silicone hydrogel and an energy source and light source encapsulated within the ophthalmic lens. | 2012-08-09 |
