| 31st week of 2010 patent applcation highlights part 17 |
| Patent application number | Title | Published |
|---|
| 20100193871 | Stacked load-less static random access memory device - In a stacked load-less static random access memory (SRAM) device in which a pair of transmission transistors is stacked on a pair of driving transistors, the stacked load-less SRAM device includes first and second transistors arranged in first and second active regions separately on a semiconductor substrate and third and fourth transistors arranged on first and second semiconductor layers over the first and second transistors. A first drain region of the first transistor, a third drain region of the third transistor, and a second gate of the second transistor are electrically connected through a first contact node. A second drain region of the second transistor, a fourth drain region of the fourth transistor, and a first gate of the first transistor are electrically connected through a second contact node. | 2010-08-05 |
| 20100193872 | WORK FUNCTION ADJUSTMENT IN A HIGH-K GATE ELECTRODE STRUCTURE AFTER TRANSISTOR FABRICATION BY USING LANTHANUM - The work function of a high-k gate electrode structure may be adjusted in a late manufacturing stage on the basis of a lanthanum species in an N-channel transistor, thereby obtaining the desired high work function in combination with a typical conductive barrier material, such as titanium nitride. For this purpose, in some illustrative embodiments, the lanthanum species may be formed directly on the previously provided metal-containing electrode material, while an efficient barrier material may be provided in the P-channel transistor, thereby avoiding undue interaction of the lanthanum species in the P-channel transistor. | 2010-08-05 |
| 20100193873 | INCREASED DEPTH OF DRAIN AND SOURCE REGIONS IN COMPLEMENTARY TRANSISTORS BY FORMING A DEEP DRAIN AND SOURCE REGION PRIOR TO A CAVITY ETCH - Deep drain and source regions of an N-channel transistor may be formed through corresponding cavities, which may be formed together with cavities of a P-channel transistor, wherein the lateral offsets of the cavities may be adjusted on the basis of an appropriate reverse spacer regime. Consequently, the dopant species in the N-channel transistor extends down to a specific depth, for instance down to the buried insulating layer of an SOI device, while at the same time providing an efficient strain-inducing mechanism for the P-channel transistor with a highly efficient overall manufacturing process flow. | 2010-08-05 |
| 20100193874 | SEMICONDUCTOR DEVICE WITH EXTENSION STRUCTURE AND METHOD FOR FABRICATING THE SAME - A semiconductor device includes a semiconductor region, a source region, a drain region, a source extension region a drain extension region, a first gate insulation film, a second gate insulation film, and a gate electrode. The source region, drain region, source extension region and drain extension region are formed in a surface portion of the semiconductor region. The first gate insulation film is formed on the semiconductor region between the source extension region and the drain extension region. The first gate insulation film is formed of a silicon oxide film or a silicon oxynitride film having a nitrogen concentration of 15 atomic % or less. The second gate insulation film is formed on the first gate insulation film and contains nitrogen at a concentration of between 20 atomic % and 57 atomic %. The gate electrode is formed on the second gate insulation film. | 2010-08-05 |
| 20100193875 | SEMICONDUCTOR DEVICE WITH DUAL GATES AND METHOD OF MANUFACTURING THE SAME - In a semiconductor device with dual gates and a method of manufacturing the same, a dielectric layer and first and second metallic conductive layers are successively formed on the semiconductor substrate having first and second regions. The second metallic conductive layer which is formed on the first metallic conductive layer of the second region is etched to form a metal pattern. The first metallic conductive layer is etched using the metal pattern as an etching mask. A polysilicon layer is formed on the dielectric layer and the metal pattern. The first gate electrode is formed by etching portions of the polysilicon layer, the metal pattern, and the first metallic conductive layer of the first region. The second gate electrode is formed by etching a portion of the polysilicon layer formed directly on the dielectric layer of the second region. | 2010-08-05 |
| 20100193876 | METHOD TO REDUCE MOL DAMAGE ON NiSi - Transistor devices are formed with nickel silicide layers formulated to prevent degradation upon removal of overlying stress liners. Embodiments include transistors with nickel silicide layers having a platinum composition gradient increasing in platinum content toward the upper surfaces thereof, i.e., increasing in platinum in a direction away from the gate electrode and source/drain regions. Embodiments include forming a first layer of nickel having a first amount of platinum and forming, on the first layer of nickel, a second layer of nickel having a second amount of platinum, the second weight percent of platinum being greater than the first weight percent. The layers of nickel are then annealed to form a nickel silicide layer having the platinum composition gradient increasing in platinum toward the upper surface. The platinum concentration gradient protects the nickel silicide layer during subsequent processing, as during etching to remove overlying stress liners, thereby avoiding a decrease in device performance. | 2010-08-05 |
| 20100193877 | Memory Array Structure With Strapping Cells - A memory array with a row of strapping cells is provided. In accordance with embodiments of the present invention, strapping cells are positioned between two rows of a memory array. The strapping cells provide a P+ strap between N+ active areas of two memory cells in a column and provide an N+ strap between P+ active areas of two memory cells in a column of the memory array. The strapping cells provide an insulating structure between the two rows of the memory array and create a more uniform operation of the memory cells regardless of the positions of the memory cells within the memory array. In an embodiment, a dummy N-well may be formed along the outer edge of the memory array in a direction perpendicular to the row of strapping cells. Furthermore, transistors may be formed in the strapping cells to provide additional insulation between the strapped memory cells. | 2010-08-05 |
| 20100193878 | HIGH SPEED, LOW POWER CONSUMPTION, ISOLATED ANALOG CMOS UNIT - A semiconductor device | 2010-08-05 |
| 20100193879 | Isolation Region Implant and Structure - A method and structure for modulating the threshold voltage of transistor is provided. An opening for an isolation region is formed within a substrate using a masking layer. The masking layer is then pulled back from the opening, and dopants are implanted into the substrate through the exposed surface of the substrate and the sidewalls of the opening. This implantation can be tailored to modulate the threshold voltage of transistors with smaller gate widths without modulating the threshold voltage of other transistors with larger gate widths. | 2010-08-05 |
| 20100193880 | Semiconductor device and method of forming the same - A semiconductor device, and a method of forming the same, includes forming a cell bit line pattern and a peripheral gate pattern on a semiconductor substrate. The cell bit line pattern may be formed on an inactive region adjacent to a cell active region of the semiconductor substrate. The peripheral gate pattern may be disposed on a peripheral active region of the semiconductor substrate. A cell contact plug may be formed between the cell bit line pattern and the cell active region. A peripheral contact plug may be formed on the peripheral active region on a side of the peripheral gate pattern. An insulating layer may be formed to expose top surfaces of the cell bit line pattern, the peripheral gate pattern, and the cell and peripheral contact plugs at substantially the same level. | 2010-08-05 |
| 20100193881 | REDUCTION OF THICKNESS VARIATIONS OF A THRESHOLD SEMICONDUCTOR ALLOY BY REDUCING PATTERNING NON-UNIFORMITIES PRIOR TO DEPOSITING THE SEMICONDUCTOR ALLOY - The growth rate in a selective epitaxial growth process for depositing a threshold adjusting semiconductor alloy, such as a silicon/germanium alloy, may be enhanced by performing a plasma-assisted etch process prior to performing the selective epitaxial growth process. For example, a mask layer may be patterned on the basis of the plasma-assisted etch process, thereby simultaneously providing superior device topography during the subsequent growth process. Hence, the threshold adjusting material may be deposited with enhanced thickness uniformity, thereby reducing overall threshold variability. | 2010-08-05 |
| 20100193882 | IN SITU FORMED DRAIN AND SOURCE REGIONS INCLUDING A STRAIN-INDUCING ALLOY AND A GRADED DOPANT PROFILE - The dopant profile of a transistor may be obtained on the basis of an in situ doped strain-inducing semiconductor alloy wherein a graded dopant concentration may be established along the height direction. Consequently, the semiconductor alloy may be positioned in close proximity to the channel region, thereby enhancing the overall strain-inducing efficiency, while not unduly compromising the finally obtained dopant profile. Furthermore, additional implant species may be incorporated prior to selectively growing the semiconductor alloy, thereby avoiding implantation-induced relaxation of the internal strain. | 2010-08-05 |
| 20100193883 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - Provided is a semiconductor device of the present invention including, a substrate; a Hf-containing insulating film (HfSiON film) provided over the semiconductor substrate; a NiSi fully-silicided electrode for blocking diffusion of at least Hf which composes the insulating film and a metal element which composes the fully-silicided gate electrode, provided over the HfSiON film; and a barrier film (SiOC film) provided between HfSiON film and the NiSi fully-silicided electrode so as to be brought into contact with the NiSi fully-silicided electrode, wherein the NiSi fully-silicided electrode contains either an N-type or a P-type impurity segregated in a portion thereof brought into contact with the SiOC film, and the SiOC film has a dielectric constant not larger than that of a silicon oxynitride film, and contains (i) silicon (Si), (ii) carbon (C), and (iii) oxygen (O) or nitrogen (N), as major constituents. | 2010-08-05 |
| 20100193884 | Method of Fabricating High Aspect Ratio Transducer Using Metal Compression Bonding - A method and apparatus are described for fabricating a high aspect ratio MEMS device by using metal thermocompression bonding to assemble a reference wafer ( | 2010-08-05 |
| 20100193885 | CONDENSER MICROPHONE - Provided is a condenser microphone that can reduce the size of a product by disposing a support member over a sound hole of a PCB and mounting a chip on the support member. The condenser microphone includes a micro electro mechanical system (MEMS) chip converting a sound into an electrical signal, a substrate including a sound hole through which the sound is introduced, the MEMS chip being mounted to the substrate, a support member over the sound hole, and a semiconductor chip processing the electrical signal converted through the MEMS chip. | 2010-08-05 |
| 20100193886 | MEMS SENSOR, AND MEMS SENSOR MANUFACTURING METHOD - MEMS sensor including substrate, lower thin film confronting one face of the substrate with a space therebetween and having lower through holes extending in the thickness direction thereof, and upper thin film arranged on the opposite side of the substrate confronting the lower thin film with a space therebetween and having upper through holes extending in the thickness direction. A MEMS sensor manufacturing method includes forming a first sacrificing layer on one face of a substrate, forming a lower thin film on the first sacrificing layer with lower through holes individually extending in the thickness direction, forming a second sacrificing layer on the lower thin film, forming an upper thin film on the second sacrificing layer with upper through holes individually extending in the thickness direction, removing the second sacrificing layer through the upper through holes by etching, and removing the first sacrificing layer through the upper and lower through holes by etching. | 2010-08-05 |
| 20100193887 | Stress-Distribution Detecting Semiconductor Package Group And Detection Method Of Stress Distribution In Semiconductor Package Using The Same - A disclosed stress-distribution detecting semiconductor package group includes multiple stress-distribution detecting semiconductor packages each formed by resin-encapsulating a stress detecting semiconductor chip of the same size using an identical resin encapsulation structure. Each stress detecting semiconductor chip includes a piezoelectric element for stress detection and at least two electrode pads electrically connected to the piezoelectric element to measure an electrical property of the piezoelectric element. The piezoelectric elements of the stress detecting semiconductor chips are respectively disposed on the corresponding stress detecting semiconductor chips to be located at different positions from one another when superimposed on a single imaginary semiconductor chip plane having the same plane size as that of the stress detecting semiconductor chips. | 2010-08-05 |
| 20100193888 | Magnetic Tunnel Junction (MTJ) Storage Element and Spin Transfer Torque Magnetoresistive Random Access Memory (STT-MRAM) Cells Having an MJT - A magnetic tunnel junction storage element for a spin transfer torque magnetoresistive random access memory (STT-MRAM) bit cell includes a bottom electrode layer, a pinned layer adjacent to the bottom electrode layer, a dielectric layer encapsulating a portion of the bottom electrode layer and the pinned layer, the dielectric layer including sidewalls that define a hole adjacent to a portion of the pinned layer, a tunneling barrier adjacent to the pinned layer, a free layer adjacent to the tunneling barrier, and a top electrode adjacent to the free layer, wherein a width of the bottom electrode layer and/or the pinned barrier in a first direction is greater than a width of a contact area between the pinned layer and the tunneling barrier in the first direction. Also a method of forming an STT-MRAM bit cell. | 2010-08-05 |
| 20100193889 | MAGNETIC RANDOM ACCESS MEMORY AND METHOD OF MANUFACTURING THE SAME - A domain wall motion type MRAM | 2010-08-05 |
| 20100193890 | MAGNETIC DOMAIN WALL RANDOM ACCESS MEMORY - A magnetic random access memory includes: a magnetic recording layer including a ferromagnetic layer and having perpendicular magnetic anisotropy; and a magnetic reading layer provided on the magnetic recording layer and used for reading information. The magnetic recording layer includes: a magnetization switching area having reversible magnetization; a first magnetization pinned area connected to a first boundary of the magnetization switching area and having magnetization whose direction is pinned in a first direction; and a second magnetization pinned area connected to a second boundary of the magnetization switching area and having magnetization whose direction is pinned in a second direction. The magnetic reading layer includes: a magnetic sensing layer whose direction of magnetization changes based on a direction of the magnetization of the magnetization switching area; a nonmagnetic barrier layer provided on the magnetic sensing layer; and a pinned layer provided on the nonmagnetic barrier layer. | 2010-08-05 |
| 20100193891 | In-Situ Formed Capping Layer in MTJ Devices - A method of forming an integrated circuit includes forming magnetic tunnel junction (MTJ) layers; etching the MTJ layers to form a MTJ cell; and forming a dielectric capping layer on sidewalls of the MTJ cell, wherein the step of forming the dielectric capping layer is in-situ performed with the step of etching the MTJ layers. | 2010-08-05 |
| 20100193892 | CMOS IMAGE SENSOR - Disclosed is a CMOS image sensor, which can minimize a reflectance of light at an interface between a photodiode and an insulating film, thereby enhancing image sensitivity. Such a CMOS image sensor includes a substrate provided with a photodiode consisting of Si, an insulating film consisting of SiO2 and formed on the substrate, a semi-reflection film interposed between the substrate and the insulating film, and metal interconnections, color filters and micro lenses constituting individual unit pixels. The semi-reflection film has a refraction index value between those of the Si photodiode and the SiO2 insulating film. | 2010-08-05 |
| 20100193893 | Photodiode With Integrated Semiconductor Circuit and Method for the Production Thereof - A semiconductor circuit in a semiconductor body and a wafer bonding method for connecting the semiconductor circuit to another substrate, in which a diode is realized in a laminar structure. The semiconductor circuit is connected to the terminals of the diode by means of that extend through the semiconductor body. | 2010-08-05 |
| 20100193894 | SEMICONDUCTOR DEVICE - A semiconductor device includes a semiconductor chip, and a guard ring made of an electrically conductive material and arranged between electrodes on the semiconductor chip and side edges of the semiconductor chip, the guard ring being divided by isolating sections on the semiconductor chip. | 2010-08-05 |
| 20100193895 | DEPLETABLE CATHODE LOW CHARGE STORAGE DIODE - An integrated circuit device comprising a diode and a method of making an integrated circuit device comprising a diode are provided. The diode can comprise an island of a first conductivity type, a first region of a second conductivity type formed in the island, and a cathode diffusion contact region doped to the second conductivity type disposed in the first region. The diode can also comprise a cathode contact electrically contacting the cathode diffusion contact region, an anode disposed in the island, an anode contact electrically contacting the anode, and a first extension region doped to the first conductivity type disposed at a surface junction between the first region and the island. | 2010-08-05 |
| 20100193896 | METHOD FOR NITRIDATION OF SHALLOW TRENCH ISOLATION STRUCTURE TO PREVENT OXYGEN ABSORPTION - A method for forming an isolation structure includes forming a trench in a semiconductor layer. At least a portion of the trench is filled with a dielectric material including oxygen. A region comprising nitrogen is formed in at least an upper portion of the dielectric material. | 2010-08-05 |
| 20100193897 | SEMICONDUCTOR MATERIAL MANUFACTURE - Electronic apparatus, systems, and methods include a semiconductor layer bonded to a bulk region of a wafer or a substrate, in which the semiconductor layer can be bonded to the bulk region using electromagnetic radiation. Additional apparatus, systems, and methods are disclosed. | 2010-08-05 |
| 20100193898 | METHOD FOR FORMING TRENCH ISOLATION USING GAS CLUSTER ION BEAM PROCESSING - A method of forming shallow trench isolation on a substrate using a gas cluster ion beam (GCIB) is described. The method comprises generating a GCIB, and irradiating the substrate with the GCIB to form a shallow trench isolation structure by depositing a dielectric layer in at least one region on the substrate. | 2010-08-05 |
| 20100193899 | PRECISE OXIDE DISSOLUTION - In a Semiconductor-on-Insulator (SeOI) wafer that includes a thin working layer made from one or more semiconductor material(s); a support layer, and a buried oxide (BOX) layer between the working layer and the support layer, a method of decreasing the thickness of the BOX layer by dissolving it at a dissolution rate that is controlled and set to be below 0.06 Å/sec in order to avoid increasing Dit. The Dit after dissolution of the BOX layer is typically below 1E12 cm-2 eV-1. | 2010-08-05 |
| 20100193900 | SOI SUBSTRATE AND SEMICONDUCTOR DEVICE USING AN SOI SUBSTRATE - A base is formed of a material, such as SiC, having mechanical characteristics higher than those of silicon for forming a semiconductor layer, and the base and the semiconductor layer are bonded through an insulating layer. After bonding, an SOI substrate is formed by mechanically separating the semiconductor layer from the base, and the separated semiconductor layer is reused for forming the subsequent SOI substrate. Thus, a large SOI substrate having a diameter of 400 mm or more, which has been difficult to obtain by conventional methods, can be obtained. | 2010-08-05 |
| 20100193901 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME - A semiconductor device includes a substrate including a trench, a buried gate filling a part of the trench, an inter-layer dielectric layer formed on the buried gate to gap-fill the rest of the trench, and a protection layer covering substantially an entire surface of the substrate including the inter-layer dielectric layer. | 2010-08-05 |
| 20100193902 | SEMICONDUCTOR DEVICE INCLUDING FUSE - Provided is a semiconductor device including a fuse, in which a insulating layer surrounding the fuse or metal wiring is prevented from being damaged due to the cut of a fuse, which can occur when a repair process is performed. The semiconductor device includes a conductive line formed on a semiconductor layer, a protective layer formed on the conductive line, one or more fuses that are electrically connected to the conductive line, and a fuse protective layer formed on the one or more fuses, and spaced apart from the protective layer. | 2010-08-05 |
| 20100193903 | THREE DIMENSIONAL SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING THE SAME AND ELECTRICAL CUTOFF METHOD FOR USING FUSE PATTERN OF THE SAME - Provided is a three-dimensional semiconductor device. The three-dimensional semiconductor device includes a body in which a plurality of semiconductor chips or packages are stacked, a protective substrate configured to protect an outer layer chip or package of the body and configured to transmit a laser beam, and a fuse pattern portion having a pattern of a fuse function formed to cut off an electrical connection of a defective chip or package by the laser beam penetrating the protective substrate when at least one of the chips or packages is defective. | 2010-08-05 |
| 20100193904 | INTEGRATED CIRCUIT INDUCTOR WITH DOPED SUBSTRATE - An integrated circuit inductor and a substrate with doped regions are provided. The substrate may be a p-type substrate and the substrate may have n-type doped regions. The n-type doped regions may include n-type wells, deep n-type wells, and n+ regions. The n-type doped regions may be formed in a pattern of strips such as a triangular comb pattern of strips or a series of L-shaped strips. The strips may be oriented perpendicular to the spiral of the inductor. A positive bias voltage may be applied to the n-type doped regions to create a depleted region in the substrate between the n-type doped regions. The depleted region may increase the effective distance between the inductor and the substrate, minimizing undesired coupling effects between the inductor and the substrate and increasing the effectiveness of the inductor. | 2010-08-05 |
| 20100193905 | Techniques for Placement of Active and Passive Devices Within a Chip - A semiconductor die includes a semiconductive substrate layer with first and second sides, a metal layer adjacent the second side of the semiconductive substrate layer, one or more active devices in an active layer on the first side of the semiconductive substrate layer; and a passive device in the metal layer in electrical communication with the active layer. The passive device can electrically couple to the active layer with through silicon vias (TSVs). | 2010-08-05 |
| 20100193906 | Integrated Circuit Package for Magnetic Capacitor - An integrated circuit package for magnetic capacitor including a substrate, an integrated circuit and a magnetic capacitor unit is disclosed. The substrate has a first surface and an opposite second surface. The integrated circuit is connected to the second surface of the substrate. The magnetic capacitor unit has a positive terminal and a negative terminal connected to the substrate. | 2010-08-05 |
| 20100193907 | CAPACITOR STRUCTURE IN A SEMICONDUCTOR DEVICE - A semiconductor device comprises an integrated circuit formed on a substrate with a signal interface and at least one isolator capacitor. The integrated circuit comprises a plurality of interleaved inter-metal dielectric layers and interlayer dielectrics formed on the substrate, a thick passivation layer formed on the plurality of the interleaved inter-metal dielectric layers and interlayer dielectrics, and a thick metal layer formed on the thick passivation layer. The thick passivation layer has a thickness selected to be greater than the isolation thickness whereby testing for defects is eliminated. The one or more isolator capacitors comprise the thick metal layer and a metal layer in the plurality of interleaved inter-metal dielectric layers and interlayer dielectrics separated by the thick passivation layer as an insulator. | 2010-08-05 |
| 20100193908 | FUSION BONDING PROCESS AND STRUCTURE FOR FABRICATING SILICON-ON-INSULATION (SOI) SEMICONDUCTOR DEVICES - A method of fabricating a semiconductor-on-insulator device including: providing a first semiconductor wafer having an about 500 angstrom thick oxide layer thereover; etching the first semiconductor wafer to raise a pattern therein; doping the raised pattern of the first semiconductor wafer through the about 500 angstrom thick oxide layer; providing a second semiconductor wafer having an oxide thereover; and, bonding the first semiconductor wafer oxide to the second semiconductor wafer oxide at an elevated temperature. | 2010-08-05 |
| 20100193909 | THERMALLY ENHANCED SEMICONDUCTOR DEVICES - Thermal communication of matched transistors formed in lower electrical resistance subregions of first and second active substrate regions is provided by thermally conductive members formed to extend over isolation regions between higher electrical resistance subregions of the first and second regions. In one form, thermal communication is done, with or without contacts, through insulating layers to metal layers formed over the substrate. In another form, thermal communication is done through a polysilicon layer formed over the substrate. | 2010-08-05 |
| 20100193910 | III NITRIDE STRUCTURE AND METHOD FOR MANUFACTURING III NITRIDE SEMICONDUCTOR FINE COLUMNAR CRYSTAL - A III nitride structure includes a film | 2010-08-05 |
| 20100193911 | IN-SITU DEFECT REDUCTION TECHNIQUES FOR NONPOLAR AND SEMIPOLAR (Al, Ga, In)N - A method for growing reduced defect density planar gallium nitride (GaN) films is disclosed. The method includes the steps of (a) growing at least one silicon nitride (SiN | 2010-08-05 |
| 20100193912 | METHODS AND APPARATUS FOR THE MANUFACTURE OF MICROSTRUCTURES - A method of manufacturing microstructures is disclosed, the method comprising a applying a mask to substrate; forming a pattern in the mask; processing the substrate according to the pattern; and mechanically removing the mask from the substrate. A polymer mask is disclosed for manufacturing micro scale structure, the polymer mask comprising a thin, preferably ultra thin flexible film. A method of manufacturing an integrated circuit is disclosed, the method comprising forming a plurality of isolated semiconductor devices on a common substrate; and connecting some of the devices. Apparatus for manufacturing microstructures is disclosed comprising: a mechanism for coating a mass substrate to create a structure; a mechanism for removing a mask from the substrate; and processing apparatus. A thin film transistor is disclosed comprising drain source and gate electrodes, the drain and source electrode being separated by a semiconductor, and the gate electrode being separated from the semiconductor by an insulator, comprising a bandgap alignment layer disposed between a semiconductor and the insulator. | 2010-08-05 |
| 20100193913 | METHOD FOR PRODUCING SEMICONDUCTOR DEVICE - A method for producing a semiconductor device includes forming an aluminum layer on a core substrate, anodizing the aluminum layer into an alumina layer having a plurality of nanoholes, forming an n-type GaN layer by growing crystals of a compound semiconductor such as an n-type GaN on the alumina layer and inside the nanoholes, and dissolving the alumina layer with an acid. As a result, gaps are formed and a structure in which the core substrate is joined to the n-type GaN layer through portions, other than the gaps, having a very small area is generated. Then a laser beam is applied to the n-type GaN layer through the core substrate to separate the n-type GaN layer from the core substrate by a laser lift-off technique. | 2010-08-05 |
| 20100193914 | Semiconductor device, method of manufacturing the same, and electronic apparatus - Disclosed is a method of manufacturing a semiconductor device including forming a transistor on a first surface of a device substrate, forming a hole in a second surface opposite to the first surface of the device substrate, and supplying hydrogen to a gate insulating film of the transistor from the second surface of the device substrate through the hole. | 2010-08-05 |
| 20100193915 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD, AND SEMICONDUCTOR DEVICE - In a chamber of a plasma processing apparatus, a cathode electrode and an anode electrode are disposed at a distance from each other. The cathode electrode is supplied with electric power from an electric power supply portion. The anode electrode is electrically grounded and a substrate is placed thereon. The anode electrode contains a heater. In an upper wall portion of the chamber, an exhaust port is provided and connected to a vacuum pump through an exhaust pipe. In a lower wall portion of a wall surface of the chamber, a gas introduction port is provided. A gas supply portion is provided outside the chamber. | 2010-08-05 |
| 20100193916 | METHODS FOR INCREASED ARRAY FEATURE DENSITY - The embodiments generally relate to methods of making semiconductor devices, and more particularly, to methods for making semiconductor pillar structures and increasing array feature pattern density using selective or directional gap fill. The technique has application to a variety of materials and can be applied to making monolithic two or three-dimensional memory arrays. | 2010-08-05 |
| 20100193917 | METHODS OF ISOLATING ARRAY FEATURES DURING PITCH DOUBLING PROCESSES AND SEMICONDUCTOR DEVICE STRUCTURES HAVING ISOLATED ARRAY FEATURES - Methods of isolating spaces formed between features in an array during a pitch reduction process and semiconductor device structures having the same. In one embodiment, ends of the features are wider than middle regions of the features. During the pitch reduction process, spacer sidewalls formed between adjacent ends of the features come into substantial contact with one another, isolating the spaces between the features. In another embodiment, the features have a single width and an additional feature is located near ends of the features. Spacer sidewalls formed between adjacent features and the additional feature come into substantial contact with one another, isolating the spaces between the features. | 2010-08-05 |
| 20100193918 | EMBEDDED SCRIBE LANE CRACK ARREST STRUCTURE FOR IMPROVED IC PACKAGE RELIABILITY OF PLASTIC FLIP CHIP DEVICES - A system, method, and apparatus for suppressing cracks in the wafer dicing process. A wafer includes a plurality of die attached to a frame and mounting tape, with the die separated by a plurality of scribe lanes. An existing die seal generally protects the boundary of the die but can still fail to fully protect the die from excessive cracks induced by dicing damage, particularly when dicing through brittle, low-k dielectrics. The system, method, and apparatus includes embedding a crack arrest structure (CAS) between adjacent scribe lanes. Upon a mechanical saw dicing the wafer, the CAS creates a moisture diffusion block, and can absorb or significantly diminish the energy of cracks propagating towards the individual die seals. Furthermore, the system, method, and apparatus can be implemented without the need to increase the width of the scribe lanes. | 2010-08-05 |
| 20100193919 | METHOD OF FORMING OPENINGS IN A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE - A method of forming openings to a layer of a semiconductor device comprises forming a dielectric layer over the layer of the semiconductor device, forming a main mask over the dielectric layer, the main mask comprising a plurality of main mask openings arranged in a regular pattern extending over the dielectric layer, using a selector mask to select some of the plurality of main mask openings and removing portions of the dielectric layer through the selected some of the plurality of main mask openings to provide openings extending through the dielectric layer to the layer. | 2010-08-05 |
| 20100193920 | SEMICONDUCTOR DEVICE, LEADFRAME AND METHOD OF ENCAPSULATING - A semiconductor device is disclosed having a leadframe comprising a first chip island and a second chip island. Each chip island of the leadframe has a first face and a second face. A first chip is attached to the first face of the first chip island and a second chip attached to the first face of the second chip island. A layer of encapsulation material forming an encapsulation material layer covers the second faces of the first and second chip islands where the thickness of the encapsulation material layer along the second face of the first chip island is different from the thickness of the encapsulation material layer along the second face of the second chip island. | 2010-08-05 |
| 20100193921 | SEMICONDUCTOR DIE PACKAGE AND METHOD FOR MAKING THE SAME - A semiconductor die package. The semiconductor die package includes a premolded clip structure assembly having a clip structure, a semiconductor die attached to the clip structure, and a first molding material covering at least a portion of the clip structure and the semiconductor die. The semiconductor die package also includes a leadframe structure having a die attach pad, where the leadframe structure is attached to premolded clip structure assembly. | 2010-08-05 |
| 20100193922 | Semiconductor chip package - A semiconductor chip package is disclosed comprising a semiconductor chip, a lead frame comprising at least one lead, and an encapsulating layer at least partially encapsulating the semiconductor chip and the lead frame. The lead comprises a first portion defining a lead frame pad at least partially exposed at an exterior surface of the package and a second portion extending from the first portion towards the semiconductor chip electrically connecting a surface portion of the semiconductor chip to the lead frame pad. The first portion has a first thickness and the second portion comprises a thinned portion, the thinned portion having a thickness smaller than the first thickness. The lead further comprises a bent portion, and wherein the thinned portion comprises at least part of the bent portion. | 2010-08-05 |
| 20100193923 | Semiconductor Device and Manufacturing Method Therefor - The reliability of a semiconductor device is prevented from being reduced. A planar shape of a sealing body is comprised of a quadrangle having a pair of first sides, and a pair of second sides crossing with the first sides. Further, it has a die pad, a controller chip (first semiconductor chip) and a sensor chip (second semiconductor chip) mounted over the die pad, and a plurality of leads arranged along the first sides of the sealing body. The controller chip and the leads are electrically coupled to each other via wires (first wires), and the sensor chip and the controller chip are electrically coupled to each other via wires (second wires). Herein, the die pad is supported by a plurality of suspending leads formed integrally with the die pad and extending from the die pad toward the first sides of the sealing body. Each of the suspending leads has an offset part. | 2010-08-05 |
| 20100193924 | SEMICONDUCTOR DEVICE - A lead frame includes an inner lead area overlapping with a chip mounting area, an outer lead portion having outer leads disposed outside the inner lead area, and an inner lead portion having inner leads disposed in the inner lead area. A semiconductor chip is mounted on the chip mounting area of the lead frame. Electrode pads of the semiconductor chip are electrically connected to inner leads via metal wires. Portions of the inner leads located on an area in the inner lead area except the chip mounting area are depressed. | 2010-08-05 |
| 20100193925 | LEADFRAME FOR SEMICONDUCTOR PACKAGES - A leadframe for semiconductor packages. The leadframe includes a die pad, a side rail, a tie bar, and a plurality of leads. The side rail is around the die pad. The tie bar connects the die pad and the side rail. The leads extend from the side rail to close proximity to the die pad. Each lead has a corresponding lead relative to a predetermined center line. A predetermined pair of corresponding leads are substantial asymmetrical with each other in appearance relative to the predetermined center line. | 2010-08-05 |
| 20100193926 | INTEGRATED CIRCUIT PACKAGE SYSTEM WITH OFFSET STACKED DIE - An integrated circuit package system provides a leadframe having a short lead finger and a long lead finger, and the long lead finger and the short lead finger reside substantially within the same horizontal plane. A first die is placed in the leadframe. A second die is offset from the first die. The offset second die is attached over the first die and the long lead finger with an adhesive. The first die is electrically connected to the short lead finger. The second die is electrically connected to at least the long lead finger or the short lead finger. At least portions of the leadframe, the first die, and the second die are encapsulated in an encapsulant. | 2010-08-05 |
| 20100193927 | MEMORY CARD AND METHOD FOR MANUFACTURING MEMORY CARD - A memory card includes a circuit board, a first semiconductor chip mounted on the circuit board with a bump sandwiched between the first semiconductor chip and the circuit board, a second semiconductor chip mounted on the circuit board with a bump sandwiched between the second semiconductor chip and the circuit board with a clearance not greater than 1 mm between the first semiconductor chip and the second semiconductor chip, a first sealing resin layer surrounding the bump and existing between the first semiconductor chip and the circuit board, and a second sealing resin layer surrounding the bump and existing between the second semiconductor chip and the circuit board, and a cover covering the first semiconductor chip, the second semiconductor chip on a principal face of the circuit board. | 2010-08-05 |
| 20100193928 | SEMICONDUCTOR DEVICE - A semiconductor device includes a semiconductor chip having a through-connection extending between a first main face of the semiconductor chip and a second main face of the semiconductor chip opposite the first main face, encapsulation material at least partially encapsulating the semiconductor chip, and a first metal layer disposed over the encapsulation material and connected with the through-connection. | 2010-08-05 |
| 20100193929 | SEMICONDUCTOR DEVICE - A semiconductor device includes a package board, first connectors, and a first multi-layered structure. The package board has first and second regions. The first connectors are in the first region. The first multi-layered structure includes a first semiconductor chip, a wiring board, and second to fifth connectors. The first semiconductor chip has first and second surfaces. The first surface covers the second region. The wiring board has third and fourth surfaces. The third surface is fixed to the second surface. The second to fourth connectors are in the center regions of the second to fourth surfaces, respectively. The fifth connectors are aligned along opposing two sides of the fourth surface. The second connectors electrically connect to the third connectors. The third connectors electrically connect to the fourth and fifth connectors. The first connectors electrically connect to the fourth and fifth connectors. | 2010-08-05 |
| 20100193930 | MULTI-CHIP SEMICONDUCTOR DEVICES HAVING CONDUCTIVE VIAS AND METHODS OF FORMING THE SAME - A multi-chip device can have a plurality of chips in a stair-step arrangement having respective chip pads thereon. A mold packaging material encapsulates the plurality of chips and at least one conductive via, that is in the mold packaging material and extends from an outer surface of the material, contacts a respective one of the chip pads. A conductive material is in the at least one conductive via. | 2010-08-05 |
| 20100193931 | Package-on-Package Using Through-Hole Via Die on Saw Streets - A semiconductor package-on-package (PoP) device includes a first die incorporating a through-hole via (THV) disposed along a peripheral surface of the first die. The first die is disposed over a substrate or leadframe structure. A first semiconductor package is electrically connected to the THV of the first die, or electrically connected to the substrate or leadframe structure. An encapsulant is formed over a portion of the first die and the first semiconductor package. | 2010-08-05 |
| 20100193932 | WAFER LEVEL PACKAGE FOR HEAT DISSIPATION AND METHOD OF MANUFACTURING THE SAME - Disclosed herein are a wafer level package for heat dissipation and a method of manufacturing the same. The wafer level package includes a heat dissipation plate including a cavity and a hole, a die including a pad disposed in the cavity of the heat dissipation plate in a face-up manner, a thermal conductive adhesive disposed between the die and an inner wall of the cavity and disposed in the hole, and a redistribution layer connected at one end to the pad and at the other end extended. The wafer level package protects the die from external environments and enables the die to be easily flush with the heat dissipation plate. | 2010-08-05 |
| 20100193933 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE - In a semiconductor device of the present invention, a second semiconductor chip is stacked on a first semiconductor chip having a plurality of bonding pads in its central region, with a bonding layer interposed therebetween. A plurality of wires respectively connected to the plurality of bonding pads of the first semiconductor chip are led out to the outside over a peripheral edge of the first semiconductor chip by passing through a space between the first and second semiconductor chips. A retaining member for retaining at least a subset of the plurality of wires is provided in a region on the first semiconductor chip including a middle point between the bonding pads and the peripheral edge of the first semiconductor chip by using a material different from the bonding layer so that the subset of the wires is positioned generally at a center of the spacing between the first semiconductor chip and the second semiconductor chip. | 2010-08-05 |
| 20100193934 | SEMICONDUCTOR DEVICE, A METHOD OF MANUFACTURING THE SAME AND AN ELECTRONIC DEVICE - A novel semiconductor device high in both heat dissipating property and connection reliability in mounting is to be provided. The semiconductor device comprises a semiconductor chip, a resin sealing member for sealing the semiconductor chip, a first conductive member connected to a first electrode formed on a first main surface of the semiconductor chip, and a second conductive member connected to a second electrode formed on a second main surface opposite to the first main surface of the semiconductor chip, the first conductive member being exposed from a first main surface of the resin sealing member, and the second conductive member being exposed from a second main surface opposite to the first main surface of the resin sealing member and also from side faces of the resin sealing member. | 2010-08-05 |
| 20100193935 | INTEGRATED ANTENNAS IN WAFER LEVEL PACKAGE - A semiconductor module comprises components in one wafer level package. The module comprises an integrated circuit (IC) chip embedded within a package molding compound. The package comprises a molding compound package layer coupled to an interface layer for integrating an antenna structure and a bonding interconnect structure to the IC chip. The bonding interconnect structure comprises three dimensional interconnects. The antenna structure and bonding interconnect structure are coupled to the IC chip and integrated within the interface layer in the same wafer fabrication process. | 2010-08-05 |
| 20100193936 | SEMICONDUCTOR DEVICE - A novel structure capable of reducing the stress in the insulating layer in the semiconductor element and thereby securing reliability is provided. When the semiconductor element and the substrate are connected with a solder, the stress generated in the insulating layer is reduced by placing a spherical core made of a material having a greater rigidity inside the solder and satisfying the following inequalities: 1 GPa<(Young's modulus of a encapsulation resin)<30 GPa, 20 ppm/k<(linear coefficient of expansion of the encapsulation resin)<200 ppm/k, and 10 MPa<(yield stress of the solder at room temperature)<30 MPa. At the time of connection, the thickness of the solder to be placed between the land on the surface of the semiconductor element and the core is adjusted to 1/10 or less of the terminal pitch. | 2010-08-05 |
| 20100193937 | SEMICONDUCTOR MODULE - A wiring layer including external connection regions is provided on a main surface of an insulating resin layer on a side opposite to that of a semiconductor device mounting face. The wiring layer is coated with a protection layer. An opening is provided to the protection layer such that each external connection region is exposed. Each external connection region has a curved surface recessed toward the insulating resin layer side. The entire area of each opening is filled with a solder ball for mounting a substrate, and the recess of each external connection region is filled with the solder ball, thereby connecting each solder ball to the intermediate layer. | 2010-08-05 |
| 20100193938 | SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR CONSTITUENT AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a semiconductor constituent having a semiconductor substrate and a plurality of electrodes for external connection provided under the semiconductor substrate. An under-layer insulating film is provided under and around the semiconductor constituent. A plurality of under-layer wires are provided under the under-layer insulating film and electrically connected to the electrodes for external connection of the semiconductor constituent. An insulating layer is provided around the semiconductor constituent and on the under-layer insulating film. A frame-like insulating substrate is embedded in an upper surface of the insulating layer and positioned around the semiconductor constituent. A plurality of upper-layer wires are provided on the insulating substrate. A base plate on which the semiconductor constituent and the insulating layer are mounted is removed. | 2010-08-05 |
| 20100193939 | WIRING SUBSTRATE, ELECTRONIC DEVICE, AND ELECTRONIC DEVICE MOUNTING STRUCTURE - A wiring substrate includes a silicon substrate, a through hole formed to penetrate the silicon substrate in a thickness direction, an insulating layer formed on both surfaces and side surfaces of the silicon substrate and an inner surface of the through hole, a penetration electrode formed in the through hole, a wiring layer formed on at least one surface of the silicon substrate and connected to the penetration electrode, and a metal wire terminal connected to the wiring layer and formed to extend from one surface of the silicon substrate to a side surface thereof. The metal wire terminal on the side surface of the electronic device is connected to the mounting substrate such that a substrate direction of the electronic device in which an electronic component is mounted on the wiring substrate intersects orthogonally with a substrate direction of the mounting substrate. | 2010-08-05 |
| 20100193940 | Wafer level package and method of manufacturing the same - The present invention relates to a wafer level package and a method of manufacturing the same. The wafer level package includes a first substrate including a first region and second regions with grooves around the first region; a semiconductor device positioned in the first region; first sealing members positioned in the grooves; a second substrate including projection units corresponding to the second regions in order to form a cavity corresponding to the first region; and second sealing members which are positioned above the projection units and laminate the first and second substrates to each other by being bonded to the first sealing members, and can prevent the sealing members from flowing to any region except for the sealing regions. | 2010-08-05 |
| 20100193941 | SEMICONDUCTOR DEVICE - A semiconductor device includes an insulating substrate having a ceramic substrate and metal coating layers on opposite surfaces of the ceramic substrate, a semiconductor chip mounted on one surface of the insulating substrate, a heat sink directly or indirectly fixed to the other surface of the insulating substrate and thermally connected to the semiconductor chip through the insulating substrate and at least one anti-warping sheet disposed on at least one surface of the heat sink. The anti-warping sheet is made of a metal sheet having a coating layer and has coefficient of thermal expansion between those of the insulating substrate and the heat sink. | 2010-08-05 |
| 20100193942 | Thermally Enhanced Semiconductor Package - Disclosed are systems and methods for improving the thermal performance of integrated circuit packages. Aspects of the present invention include improved thermal package structures and methods for producing the same through the application of one or more thermal spreaders in the package. In embodiments, a thermal spreader is incorporated in a semiconductor chip package between a semiconductor die and its die pad. By including a thermal spreader in an IC package, the package can handle higher levels of power while maintaining approximately the same temperature of the package or can reduce the temperature of the package when operating at the same power level, as compared to a package without a thermal spreader. | 2010-08-05 |
| 20100193943 | Semiconductor Device Having a Diamond Substrate Heat Spreader - In accordance with one or more embodiments, a semiconductor device comprises a semiconductor die having a heat region disposed on at least one portion of the semiconductor die, and a diamond substrate disposed proximate to the semiconductor die, wherein the diamond substrate is capable of dissipating heat from the diamond substrate via at least one or more bumps coupling the diamond substrate to the heat region of the semiconductor die. | 2010-08-05 |
| 20100193944 | Semiconductor Flip-Chip System Having Oblong Connectors and Reduced Trace Pitches - A semiconductor chip ( | 2010-08-05 |
| 20100193945 | REINFORCED STRUCTURE FOR A STACK OF LAYERS IN A SEMICONDUCTOR COMPONENT - The present application relates to a reinforcing structure ( | 2010-08-05 |
| 20100193946 | SEMICONDUCTOR MODULE AND MANUFACTURING METHOD THEREOF - A semiconductor module includes: an insulating resin layer; a wiring layer which is provided on one main surface of the insulating resin layer and which includes an external connection region; bump electrodes which are electrically connected to the wiring layer and each of which is formed such that it protrudes from the wiring layer toward the insulating resin layer; a semiconductor device which is provided on the other main surface of the insulating resin layer and which includes device electrodes connected to the bump electrode; and a wiring protection layer provided on the wiring layer and the insulating resin layer so as to expose the external connection region. In the semiconductor module, the outer edge portion of the wiring protection layer is in contact with the external edge portion of the semiconductor device such that it shields at least a part of the semiconductor resin layer at the side edge. | 2010-08-05 |
| 20100193947 | Flip Chip Interconnection Having Narrow Interconnection Sites on the Substrate - A flip chip interconnect of a die on a substrate is made by mating the interconnect bump onto a narrow interconnect pad on a lead or trace, rather than onto a capture pad. The width of the narrow interconnect pad is less than a base diameter of bumps on the die to be attached. Also, a flip chip package includes a die having solder bumps attached to interconnect pads in an active surface, and a substrate having narrow interconnect pads on electrically conductive traces in a die attach surface, in which the bumps are mated onto the narrow pads on the traces. | 2010-08-05 |
| 20100193948 | SEMICONDUCTOR DEVICE, PRINTED WIRING BOARD FOR MOUNTING THE SEMICONDUCTOR DEVICE AND CONNECTING STRUCTURE FOR THESE - The present invention relates to a connecting structure between semiconductor device | 2010-08-05 |
| 20100193949 | NOVEL STRUCTURE OF UBM AND SOLDER BUMPS AND METHODS OF FABRICATION - Methods and UBM structures having bilayer or trilayer UBM layers that include a thin TiW adhesion layer and a thick Ni-based barrier layer thereover both deposited under sputtering operating conditions that provide the resultant bilayer or trilayer UBM layers with minimal composite stresses. The Ni-based barrier layer may be pure Ni or a Ni alloy. These UBM layers may be patterned to fabricate bilayer or trilayer UBM capture pads, followed by joining a lead-free solder thereto for providing lead-free solder joints that maintain reliability after multiple reflows. Optionally, the top layer of the trilayer UBM structures may include soluble or insoluble metals for doping the lead-free solder connections. | 2010-08-05 |
| 20100193950 | WAFER LEVEL, CHIP SCALE SEMICONDUCTOR DEVICE PACKAGING COMPOSITIONS, AND METHODS RELATING THERETO - The invention relates generally to wafer level, chip scale semiconductor device packaging compositions capable of providing high density, small scale circuitry lines without the use of photolithography. The wafer level package comprises a stress buffer layer containing a polymer binder and a spinel crystal filler in both a non-activated and a laser activated form. The stress buffer layer is patterned with a laser to thereby activate the filler, and the laser ablation path can then be selectively metalized. | 2010-08-05 |
| 20100193951 | METAL PRECURSORS FOR DEPOSITION OF METAL-CONTAINING FILMS - Compositions and methods for forming a metal-containing thin film on a substrate. A reactor and at least one substrate in the reactor are provided. A metal-containing bis-β-diketiminate precursor is introduced into the reactor. The reactor is maintained at a set temperature and pressure, and the precursor is contacted with the substrate to form a metal-containing film on the substrate. | 2010-08-05 |
| 20100193952 | Integrated circuit die containing particale-filled through-silicon metal vias with reduced thermal expansion - A method, apparatus and system with an electrically conductive through hole via of a composite material with a matrix forming a continuous phase and embedded particles, with a different material property than the matrix, forming a dispersed phase, the resulting composite material having a different material property than the matrix. | 2010-08-05 |
| 20100193953 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME - A trench is formed in an insulation film formed on top of a semiconductor substrate, and a barrier metal film is formed on the surface of the trench. After a copper or copper alloy film is formed on the barrier metal film, an oxygen absorption film in which a standard energy of formation of an oxidation reaction in a range from room temperature to 400° C. is negative, and in which an absolute value of the standard energy of formation is larger than that of the barrier metal film is formed, and the assembly is heated in a temperature range of 200 to 400° C. A semiconductor device can thereby be provided that has highly reliable wiring, in which the adhesion to the barrier metal film in the copper interface is enhanced, copper diffusion in the interface is suppressed, and electromigration and stress migration are prevented. | 2010-08-05 |
| 20100193954 | Barrier Structures and Methods for Through Substrate Vias - Through substrate via barrier structures and methods are disclosed. In one embodiment, a semiconductor device includes a first substrate including an active device region disposed within isolation regions. A through substrate via is disposed adjacent to the active device region and within the first substrate. A buffer layer is disposed around at least a portion of the through substrate via, wherein the buffer layer is disposed between the isolation regions and the through substrate via. | 2010-08-05 |
| 20100193955 | PLASMA-ENHANCED ATOMIC LAYER DEPOSITION OF CONDUCTIVE MATERIAL OVER DIELECTRIC LAYERS - Methods of forming a conductive metal layer over a dielectric layer using plasma enhanced atomic layer deposition (PEALD) are provided, along with related compositions and structures. A plasma barrier layer is deposited over the dielectric layer by a non-plasma atomic layer deposition (ALD) process prior to depositing the conductive layer by PEALD. The plasma barrier layer reduces or prevents deleterious effects of the plasma reactant in the PEALD process on the dielectric layer and can enhance adhesion. The same metal reactant can be used in both the non-plasma ALD process and the PEALD process. | 2010-08-05 |
| 20100193956 | MULTI-LAYER METAL WIRING OF SEMICONDUCTOR DEVICE PREVENTING MUTUAL METAL DIFFUSION BETWEEN METAL WIRINGS AND METHOD FOR FORMING THE SAME - A multi-layer metal wiring of a semiconductor device and a method for forming the same are disclosed. The multi-layer metal wiring of the semiconductor device includes a lower Cu wiring, and an upper Al wiring formed to be contacted with the lower Cu wiring, and a diffusion barrier layer interposed between the lower Cu wiring and the upper Al wiring. The diffusion barrier layer is formed of a W-based layer. | 2010-08-05 |
| 20100193957 | SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME - Provided, is a reliable semiconductor device with a layered interconnect structure that may develop no trouble of voids and interconnect breakdowns, in which the layered interconnect structure comprises a conductor film and a neighboring film as so layered on a semiconductor substrate that the neighboring film is contacted with the conductor film. In the device, the materials for the conductor film and the neighboring film are so selected that the difference between the short side, a | 2010-08-05 |
| 20100193958 | Semiconductor Device and a Method of Manufacturing the Same - A technique is provided for improving the security of information stored in a semiconductor device. Multilayer wiring layers are formed over a semiconductor substrate. Wirings are formed on the uppermost wiring layer among those multilayer wiring layers. On the wirings, there is formed, in the following order, a silicon oxide film, a colored thin film, and a silicon oxide film, over which, a silicon nitride film serving as a surface protective film is formed. In other words, the invention is characterized by that the colored thin film is formed between the wiring constituting the uppermost wiring layer and the silicon nitride film serving as the surface protective film. The colored thin film has a function of attenuating visible light and laser light in the specific wavelength region, and is formed of, for example, a silicon oxide film containing cobalt oxide. | 2010-08-05 |
| 20100193959 | Redistribution Layer Power Grid - An integrated circuit package including a first metal layer coupled to a bonding pad, a first redistribution layer coupled to the bonding pad, and a RDL to Metal (RTM) via coupled to a first surface of the metal layer and further coupled to a first surface of the first RDL is described. The IC package may further include additional metal layers and redistribution layers. | 2010-08-05 |
| 20100193960 | Semiconductor device, method for making pattern layout, method for making mask pattern, method for making layout, method for manufacturing photo mask, photo mask, and method for manufacturing semiconductor device - A semiconductor device includes a semiconductor substrate, and a circuit pattern group comprising at least N (≧2) circuit pattern on the semiconductor substrate, at least one vicinity of end portion among the at least of N circuit patterns including a connection area to electrically connect to a circuit pattern in another circuit pattern group different from the circuit pattern group, the at least N wirings pattern including a circuit pattern N1 and at least one circuit pattern Ni (i≧2) arranged in one direction different from longitudinal direction of the circuit pattern N1, the at least one circuit patterns Ni having larger i being arranged at further position away from the circuit pattern N1, and in terms of a pattern including the connection area among the at least of Ni circuit patterns, the larger the i, the connection area being arranged at a further position in longitudinal direction. | 2010-08-05 |
| 20100193961 | ADHESIVE COMPOSITION FOR ELECTRONIC COMPONENTS, AND ADHESIVE SHEET FOR ELECTRONIC COMPONENTS USING THE SAME - In order to provide an adhesive composition for electronic components that is excellent in adhesion durability under long-term high temperature conditions, thermal cyclability, and insulation reliability, designed is an adhesive composition for electronic components containing a thermoplastic resin (a), an epoxy resin (b), a hardener (c), and an organopolysiloxane (d), wherein the glass transition temperature (Tg) after curing is −10° C. to 50° C. and the rate of change of Tg after heat-treating the composition at 175° C. for 1000 hours is 15% or less. | 2010-08-05 |
| 20100193962 | SEMICONDUCTOR DEVICE - A semiconductor device comprising a plurality of semiconductor chips and a plurality of through-line groups is disclosed. Each of the through-line groups consists of a unique number of through-lines. The numbers associated with the through-line groups are mutually coprime to each other. When one of the through-lines is selected for the each through-line group, one of the semiconductor chip is designated by a combination of the selected through-lines of the plurality of the through-line groups. | 2010-08-05 |
| 20100193963 | VOID SEALING IN A DIELECTRIC MATERIAL OF A CONTACT LEVEL OF A SEMICONDUCTOR DEVICE COMPRISING CLOSELY SPACED TRANSISTORS - In sophisticated semiconductor devices, a contact structure may be formed on the basis of a void positioned between closely spaced transistor elements wherein disadvantageous metal migration along the void may be suppressed by sealing the voids after etching a contact opening and prior to filling in the contact metal. Consequently, significant yield losses may be avoided in well-established dual stress liner approaches while, at the same time, superior device performance may be achieved. | 2010-08-05 |
| 20100193964 | METHOD OF MAKING 3D INTEGRATED CIRCUITS AND STRUCTURES FORMED THEREBY - A method and structure of connecting at least two integrated circuits in a 3D arrangement by a through silicon via which simultaneously connects a connection pad in a first integrated circuit and a connection pad in a second integrated circuit. | 2010-08-05 |
| 20100193965 | SEMICONDUCTOR DEVICE HAVING WIRINGS FORMED BY DAMASCENE - An insulating film is formed over a semiconductor substrate. A wiring trench formed in the insulating film reaches partway in a thickness direction of the insulating film. A via hole is disposed at an end of the wiring trench. A barrier metal film covers inner surfaces of the wiring trench and via hole. A bottom of the wiring trench and a sidewall of the via hole are connected via an inclined plane. A length of a portion of the inclined plane having an inclination angle range of 40° to 50° relative to a surface of the semiconductor substrate is equal to or shorter than a maximum size of a plan shape of the via hole, in a cross section which is parallel to a longitudinal direction of the wiring trench, passes a center of the via hole and perpendicular to the surface of the semiconductor surface. | 2010-08-05 |
| 20100193966 | Contact Structures and Semiconductor Devices Including the Same - Methods of forming a contact structure in a semiconductor device include providing a semiconductor substrate including active regions and word lines crossing the active regions. A first interlayer dielectric layer is formed on the semiconductor substrate. Direct contact plugs are formed extending through the first interlayer dielectric layer to contact selected ones of the active regions. Bit line structures are formed on the first interlayer dielectric layer and crossing the word lines that are coupled to the selected ones of the active regions by the direct contact plugs. A second interlayer dielectric layer is formed on the semiconductor substrate including the bit line structures. Barrier patterns are formed extending in parallel with bit line structures and into the second interlayer dielectric layer. Mask patterns are formed overlying an entirety of top surfaces of the direct contact plugs on the second interlayer dielectric layer and the bit line structures. The second and first interlayer dielectric layers are is etched using the mask patterns, the barrier patterns and the bit line structures as an etching mask to form buried contact holes and buried contact plugs are formed in the buried contact holes. | 2010-08-05 |
| 20100193967 | DICING TAPE-INTEGRATED WAFER BACK SURFACE PROTECTIVE FILM - The present invention provides a dicing tape-integrated wafer back surface protective film including: a dicing tape including a base material and a pressure-sensitive adhesive layer formed on the base material; and a wafer back surface protective film formed on the pressure-sensitive adhesive layer of the dicing tape, in which the wafer back surface protective film is colored, and the colored wafer back surface protective film has an elastic modulus (23° C.) of 3 GPa or more. It is preferable that the colored wafer back surface protective film has a laser marking ability. The dicing tape-integrated wafer back surface protective film can be suitably used for a flip chip-mounted semiconductor device. | 2010-08-05 |
| 20100193968 | DICING TAPE-INTEGRATED WAFER BACK SURFACE PROTECTIVE FILM - The present invention provides a dicing tape-integrated wafer back surface protective film including: a dicing tape including a base material and a pressure-sensitive adhesive layer formed on the base material; and a wafer back surface protective film formed on the pressure-sensitive adhesive layer of the dicing tape, in which the wafer back surface protective film is colored. It is preferable that the colored wafer back surface protective film has a laser marking ability. The dicing tape-integrated wafer back surface protective film can be suitably used for a flip chip-mounted semiconductor device. | 2010-08-05 |
| 20100193969 | DICING TAPE-INTEGRATED WAFER BACK SURFACE PROTECTIVE FILM - The present invention provides a dicing tape-integrated wafer back surface protective film including: a dicing tape including a base material and a pressure-sensitive adhesive layer formed on the base material; and a wafer back surface protective film formed on the pressure-sensitive adhesive layer of the dicing tape, in which the wafer back surface protective film is colored with a dye contained therein. It is preferable that the colored wafer back surface protective film has a laser marking ability. The dicing tape-integrated wafer back surface protective film can be suitably used for a flip chip-mounted semiconductor device. | 2010-08-05 |
| 20100193970 | MICRO PIN GRID ARRAY WITH PIN MOTION ISOLATION - A microelectronic package includes a microelectronic element having faces and contacts, a flexible substrate overlying and spaced from a first face of the microelectronic element, and a plurality of conductive terminals exposed at a surface of the flexible substrate. The conductive terminals are electrically interconnected with the microelectronic element and the flexible substrate includes a gap extending at least partially around at least one of the conductive terminals. In certain embodiments, the package includes a support layer, such as a compliant layer, disposed between the first face of the microelectronic element and the flexible substrate. In other embodiments, the support layer includes at least one opening that is at least partially aligned with one of the conductive terminals. | 2010-08-05 |
