| 27th week of 2012 patent applcation highlights part 17 |
| Patent application number | Title | Published |
|---|
| 20120168870 | SEMICONDUCTOR DEVICE FOR PREVENTING PLASMA INDUCED DAMAGE AND LAYOUT THEREOF - A semiconductor device includes a diode having a first terminal connected to a first-conductivity-type well, and a second-conductivity-type MOS transistor having a first junction and a gate connected to a second terminal of the diode, and a second junction connected to a first power supply voltage terminal. | 2012-07-05 |
| 20120168871 | SEMICONDUCTOR DEVICE HAVING A RESISTOR AND METHODS OF FORMING THE SAME - In a semiconductor device and a method of making the same, the semiconductor device comprises a substrate including a first region and a second region. At least one first gate structure is on the substrate in the first region, the at least one first gate structure including a first gate insulating layer and a first gate electrode layer on the first gate insulating layer. At least one isolating structure is in the substrate in the second region, a top surface of the isolating structure being lower in height than a top surface of the substrate. At least one resistor pattern is on the at least one isolating structure. | 2012-07-05 |
| 20120168872 | Nanomesh SRAM Cell - Nanowire-based devices are provided. In one aspect, a SRAM cell includes at least one pair of pass gates and at least one pair of inverters formed adjacent to one another on a wafer. Each pass gate includes one or more device layers each having a source region, a drain region and a plurality of nanowire channels connecting the source region and the drain region and a gate common to each of the pass gate device layers surrounding the nanowire channels. Each inverter includes a plurality of device layers each having a source region, a drain region and a plurality of nanowire channels connecting the source region and the drain region and a gate common to each of the inverter device layers surrounding the nanowire channels. | 2012-07-05 |
| 20120168873 | TRANSMISSION GATES WITH ASYMMETRIC FIELD EFFECT TRANSISTORS - Transmission gates, methods of fabricating transmission gates, and design structures for a transmission gate. The transmission gate includes an n-channel field effect transistor characterized by terminals that are asymmetrically doped and a p-channel field effect transistor characterized by terminals that are asymmetrically doped. | 2012-07-05 |
| 20120168874 | STRUCTURE AND METHOD TO IMPROVE THRESHOLD VOLTAGE OF MOSFETS INCLUDING A HIGH K DIELECTRIC - Threshold voltage controlled semiconductor structures are provided in which a conformal nitride-containing liner is located on at least exposed sidewalls of a patterned gate dielectric material having a dielectric constant of greater than silicon oxide. The conformal nitride-containing liner is a thin layer that is formed using a low temperature (less than 500° C.) nitridation process. | 2012-07-05 |
| 20120168875 | SEMICONDUCTOR DEVICE - A well potential supply region is provided in an N-type well region of a cell array. Adjacent gates disposed in both sides of the well potential supply region in the horizontal direction and adjacent gates disposed in further both sides thereof are disposed at the same pitch. In addition, an adjacent cell array includes four gates each of which is opposed to the adjacent gates in the vertical direction. In other words, regularity in the shape of the gate patterns in the periphery of the well potential supply region is maintained. | 2012-07-05 |
| 20120168876 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE HAVING PLURAL TRANSISTORS FORMED IN WELL REGION AND SEMICONDUCTOR DEVICE - A semiconductor device, includes a substrate, an element isolating film formed in the substrate, a first element formation region isolated by the element isolating film, a second element formation region positioned adjacent to the first element formation region and isolated by the element isolating film, a first well of a second conductive type formed in a whole area of the first element formation region, a first transistor of a first conductive type formed on the first element formation region, a second transistor of the first conductive type which is formed on the first element formation region and whose threshold voltage is the same as a threshold voltage of the first transistor, a second well of the second conductive type formed in a whole area of the second element formation region, and a third transistor of the first conductive type formed on the second element formation region. | 2012-07-05 |
| 20120168877 | METHOD TO REDUCE CONTACT RESISTANCE OF N-CHANNEL TRANSISTORS BY USING A III-V SEMICONDUCTOR INTERLAYER IN SOURCE AND DRAIN - A method to reduce contact resistance of n-channel transistors by using a III-V semiconductor interlayer in source and drain is generally presented. In this regard, a device is introduced comprising an n-type transistor with a source region and a drain region a first interlayer dielectric layer adjacent the transistor, a trench through the first interlayer dielectric layer to the source region, and a conductive source contact in the trench, the source contact being separated from the source region by a III-V semiconductor interlayer. Other embodiments are also disclosed and claimed. | 2012-07-05 |
| 20120168878 | FIELD EFFECT TRANSISTOR HAVING OHMIC BODY CONTACT(S), AN INTEGRATED CIRCUIT STRUCTURE INCORPORATING STACKED FIELD EFFECT TRANSISTORS WITH SUCH OHMIC BODY CONTACTS AND ASSOCIATED METHODS - Disclosed is a field effect transistor (FET), in which ohmic body contact(s) are placed relatively close to the active region. The FET includes a semiconductor layer, where the active region and body contact region(s) are defined by a trench isolation structure and where a body region is below and abuts the active region, the trench isolation structure and the body contact region(s). A gate traverses the active region. Dummy gate(s) are on the body contact region(s). A contact extends through each dummy gate to the body contact region below. Dielectric material isolates the contact(s) from the dummy gate(s). During processing, the dummy gate(s) act as blocks to ensure that the body contact regions are not implanted with source/drain dopants or source/drain extension dopants and, thereby to ensure that the body contacts, as formed, are ohmic. Also disclosed are an integrated circuit structure with stacked FETs, having such ohmic body contacts, and associated methods. | 2012-07-05 |
| 20120168879 | TRANSISTOR AND METHOD FOR FORMING THE SAME - The invention discloses a semiconductor device which comprises an NMOS transistor and a PMOS transistor formed on a substrate; and grid electrodes, source cathode doped areas, drain doped areas, and side walls formed on two sides of the grid electrodes are arranged on the NMOS transistor and the PMOS transistor respectively. The device is characterized in that the side walls on the two sides of the grid electrode of the NMOS transistor possess tensile stress, and the side walls on the two sides of the grid electrode of the PMOS transistor possess compressive stress. The stress gives the side walls a greater role in adjusting the stress applied to channels and the source/drain areas, with the carrier mobility further enhanced and the performance of the device improved. | 2012-07-05 |
| 20120168880 | Method of Fabricating Semiconductor Device - Method of fabricating thin-film transistors in which contact with connecting electrodes becomes reliable. When contact holes are formed, the bottom insulating layer is subjected to a wet etching process, thus producing undercuttings inside the contact holes. In order to remove the undercuttings, a light etching process is carried out to widen the contact holes. Thus, tapering section are obtained, and the covering of connection wiring is improved. | 2012-07-05 |
| 20120168881 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - The present invention provides a semiconductor device and a method for manufacturing the same. The method for manufacturing the semiconductor device comprises: providing a silicon substrate having a gate stack structure formed thereon and having {100} crystal indices; forming an interlayer dielectric layer coving a top surface of the silicon substrate; forming a first trench in the interlayer dielectric layer and/or in the gate stack structure, the first trench having an extension direction being along <110> crystal direction and perpendicular to that of the gate stack structure; and filling the first trench with a first dielectric layer, wherein the first dielectric layer is a tensile stress dielectric layer. The present invention introduces a tensile stress in the transverse direction of a channel region by using a simple process, which improves the response speed and performance of semiconductor devices. | 2012-07-05 |
| 20120168882 | INTEGRATED CHEMICAL SENSOR - A integrated circuit die includes a chemical sensor, a thermal sensor, and a humidity sensor formed therein. The chemical sensor, thermal sensor, and humidity sensor include electrodes formed in a passivation layer of the integrated circuit die. The integrated circuit die further includes transistors formed in a monocrystalline semiconductor layer. | 2012-07-05 |
| 20120168883 | RF MEMS SWITCH AND FABRICATING METHOD THEREOF - A RF MEMS switch includes a substrate, a first electrode, a first insulating layer, a second insulating layer, a second electrode and a movable electrode. The first electrode is disposed on the substrate. The first insulating layer covers the first electrode. The second insulating layer covers a portion of the substrate. The second electrode is disposed in the second insulating layer and is located at a plane different from a plane of the first electrode. The movable electrode is partially disposed on a surface of the second insulating layer, and extends over the first electrode and the second electrode. A portion of the movable electrode not disposed on the surface of the second insulating layer is a movable portion. The second insulating layer has a gap exposing a space between the movable portion and the first insulating layer and a space between the movable portion and the second electrode. | 2012-07-05 |
| 20120168884 | PRESSURE SENSOR AND METHOD OF PACKAGING SAME - A method of packaging a pressure sensor die includes providing a lead frame having a die pad and lead fingers that surround the die pad. A tape is attached to a first side of the lead frame. A pressure sensor die is attached to the die pad on a second side of the lead frame and bond pads of the die are connected to the lead fingers. An encapsulant is dispensed onto the second side of the lead frame and covers the lead fingers and the electrical connections thereto. A gel is dispensed onto a top surface of the die and covers the die bond pads and the electrical connections thereto. A lid is attached to the lead frame and covers the die and the gel, and sides of the lid penetrate the encapsulant. | 2012-07-05 |
| 20120168885 | METHOD AND SYSTEM FOR PROVIDING MAGNETIC LAYERS HAVING INSERTION LAYERS FOR USE IN SPIN TRANSFER TORQUE MEMORIES - A method and system for providing a magnetic junction usable in a magnetic device are described. The magnetic junction includes a pinned layer, a nonmagnetic spacer layer, and a free layer. The nonmagnetic spacer layer is between the pinned layer and the free layer. The magnetic junction is configured such that the free layer is switchable between a plurality of stable magnetic states when a write current is passed through the magnetic junction. At least one of the pinned layer and the free layer includes a magnetic substructure. The magnetic substructure includes at least two magnetic layers interleaved with at least one insertion layer. Each insertion layer includes at least one of Cr, Ta, Ti, W, Ru, V, Cu, Mg, aluminum oxide, and MgO. The magnetic layers are exchange coupled. | 2012-07-05 |
| 20120168886 | METHOD FOR FABRICATING A MICROSWITCH ACTUATABLE BY A MAGNETIC FIELD - The invention concerns a method for the fabrication, on a plane substrate, of a microswitch actuatable by a magnetic field, comprising:
| 2012-07-05 |
| 20120168887 | Magnetic Memory Devices and Methods of Forming the Same - Provided are a magnetic memory device and a method of forming the same. The method may include forming a pinning pattern on a substrate; forming a first interlayer insulating layer that exposes the pinning pattern on the substrate; forming a pinned layer, a tunneling barrier layer and a second magnetic conductive layer on the pinning pattern; and forming a pinned pattern, a tunnel barrier pattern and a second magnetic conductive pattern by performing a patterning process on the pinned layer, the tunnel barrier layer and the second magnetic conductive layer. | 2012-07-05 |
| 20120168888 | IMAGE SENSOR CIRCUIT, SYSTEM, AND METHOD - A process of forming optical sensors includes sealing an imaging portion of each of a plurality of optical sensors on a sensor wafer with a transparent material. The operation of sealing leaves a bonding portion of each of the optical sensors exposed. The process further includes cutting the wafer into a plurality of image sensor dies after sealing the optical sensors such that each image sensor die includes one of the optical sensors sealed with a corresponding portion of the transparent material. | 2012-07-05 |
| 20120168889 | MANUFACTURING METHOD OF SOLID-STATE IMAGING DEVICE AND SOLID-STATE IMAGING DEVICE - A manufacturing method of a solid-state imaging device includes: preparing a photoelectric conversion device; forming an insulating layer on a surface of the photoelectric conversion device; forming a wire-grid polarizer on a support base; bonding a forming surface of the wire-grid polarizer on the support base to the insulating layer on the surface of the photoelectric conversion device and removing the support base from the wire-grid polarizer. | 2012-07-05 |
| 20120168890 | IMAGE SENSOR STRUCTURE - An image sensor structure, which comprises: a pixel; a first metal line; a second metal line, located under the first metal line; a conductive region, located under the second metal line; and at least one dummy contact, provided between the second metal line and the conductive region, wherein the second metal line and the conductive region are not electrically connected to each other via the dummy contact | 2012-07-05 |
| 20120168891 | ATOMICALLY PRECISE SURFACE ENGINEERING FOR PRODUCING IMAGERS - High-quality surface coatings, and techniques combining the atomic precision of molecular beam epitaxy and atomic layer deposition, to fabricate such high-quality surface coatings are provided. The coatings made in accordance with the techniques set forth by the invention are shown to be capable of forming silicon CCD detectors that demonstrate world record detector quantum efficiency (>50%) in the near and far ultraviolet (155 nm-300 nm). The surface engineering approaches used demonstrate the robustness of detector performance that is obtained by achieving atomic level precision at all steps in the coating fabrication process. As proof of concept, the characterization, materials, and exemplary devices produced are presented along with a comparison to other approaches. | 2012-07-05 |
| 20120168892 | LATERAL OVERFLOW DRAIN AND CHANNEL STOP REGIONS IN IMAGE SENSORS - A lateral overflow drain and a channel stop are fabricated using a double mask process. Each lateral overflow drain is formed within a respective channel stop. Due to the use of two mask layers, one edge of each lateral overflow drain is aligned, or substantially aligned, with an edge of a respective channel stop. | 2012-07-05 |
| 20120168893 | Mesa edge shielding trench Schottky rectifier and method of manufacture thereof - A mesa edge shielding trench Schottky rectifier includes a semiconductor substrate; an epitaxial layer grown on the first surface of the semiconductor substrate; a plurality of trenches spaced from each other and extended into the epitaxial layer, wherein an epitaxial region between two adjacent trenches forms the silicon mesa; a polysilicon region, having a T-shape, is separated from an inner wall of each of the trenches and a top surface of the epitaxial layer by an oxide layer, wherein a width of the top surface of the polysilicon region is bigger than an open size of each of the trenches; an anode electrode, deposited on an entire structure, forming an ohmic contact on the top surface of the polysilicon region and a Schottky contact on an exposed surface of the epitaxial layer; and a cathode electrode, deposited on the second surface of the semiconductor substrate, forming an ohmic contact thereon. | 2012-07-05 |
| 20120168894 | HARD MASK COMPOSITION, METHOD OF FORMING A PATTERN, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERN - A hard mask composition, a method of forming a pattern, and a semiconductor integrated circuit device, the hard mask composition including a solvent; and an aromatic ring-containing compound, the aromatic ring-containing compound including at least one of a moiety represented by the following Chemical Formula 1 and a moiety represented by the following Chemical Formula 2: | 2012-07-05 |
| 20120168895 | MODIFYING GROWTH RATE OF A DEVICE LAYER - A device includes a substrate with a device region on which a transistor is formed. The device region includes active edge regions and an active center region which have different oxidation growth rates. A growth rate modifier (GRM) comprising dopants which modifies oxidation growth rate is employed to produce a gate oxide layer which has a uniform thickness. The GRM may enhance or retard the oxidation growth, depending on the type of dopants used. Fluorine dopants enhance oxidation growth rate while nitrogen dopants retard oxidation growth rate. | 2012-07-05 |
| 20120168896 | DOUBLE SIDE WAFER PROCESS, METHOD AND DEVICE - A method of manufacturing double-sided semiconductor die by performing a first plurality of processes to a first side of a wafer and performing a second plurality of processes to a second side of the wafer, thereby forming at least a first semiconductor device on the first side of the wafer and at least a second semiconductor device on the second side of the wafer. The wafer may be cut to form a plurality of die having at least one semiconductor device on each side. | 2012-07-05 |
| 20120168897 | METHODS OF FORMING SEMICONDUCTOR TRENCH AND FORMING DUAL TRENCHES, AND STRUCTURE FOR ISOLATING DEVICES - Methods of forming a semiconductor trench and forming dual trenches and a structure for isolating devices are provided. The structure for isolating devices is disposed in a substrate having a periphery area and an array area. The structure for isolating devices includes a first isolation structure and a second isolation structure. The first isolation structure has a profile with at least three steps and is disposed in the substrate in the periphery area. The second isolation structure has a profile with at least two steps and is disposed in the substrate in the array area. | 2012-07-05 |
| 20120168898 | METHODS OF FORMING SINGLE CRYSTAL SILICON STRUCTURES AND SEMICONDUCTOR DEVICE STRUCTURES INCLUDING SINGLE CRYSTAL SILICON STRUCTURES - A single crystal silicon etching method includes providing a single crystal silicon substrate having at least one trench therein. The single crystal silicon substrate is exposed to an anisotropic etchant that undercuts the single crystal silicon. By controlling the length of the etch, single crystal silicon islands or smooth vertical walls in the single crystal silicon may be created. | 2012-07-05 |
| 20120168899 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME - A semiconductor device includes a plurality of first conductive patterns separated by a damascene pattern, a second conductive pattern buried in the damascene pattern, and a spacer including an air gap between the second conductive pattern and the first conductive patterns. | 2012-07-05 |
| 20120168900 | LATCH-UP FREE VERTICAL TVS DIODE ARRAY STRUCTURE USING TRENCH ISOLATION - A method for manufacturing a transient voltage suppressing (TVS) array substantially following a manufacturing process for manufacturing a vertical semiconductor power device. The method includes a step of opening a plurality of isolation trenches in an epitaxial layer of a first conductivity type in a semiconductor substrate followed by applying a body mask for doping a body region having a second conductivity type between two of the isolation trenches. The method further includes a step of applying an source mask for implanting a plurality of doped regions of the first conductivity type constituting a plurality of diodes wherein the isolation trenches isolating and preventing parasitic PNP or NPN transistor due to a latch-up between the doped regions of different conductivity types. | 2012-07-05 |
| 20120168901 | SEMICONDUCTOR ELECTRONIC DEVICE WITH AN INTEGRATED DEVICE WITH AN INTEGRATED GALVANIC ISOLATOR ELEMENT AND RELATED ASSEMBLY PROCESS - An electronic device is provided with: a first electronic circuit, integrated in a first die; a second electronic circuit, integrated in a second die; and a galvanic isolator element, designed to insulate galvanically, and to enable transfer of signals between, the first electronic circuit and the second electronic circuit. The galvanic isolator element has: a transformer substrate, distinct from the first die and from the second die; and a galvanic-insulation transformer formed by a first inductive element, integrated in the first die, and by a second inductive element, integrated in the transformer substrate and so arranged as to be magnetically coupled to the first inductive element. | 2012-07-05 |
| 20120168902 | METHOD FOR FABRICATING A CAPACITOR AND CAPACITOR STRUCTURE THEREOF - A method for fabricating a capacitor includes providing a substrate having a first surface and a second surface, and forming a plurality of openings in the substrate, the openings are separated from each other by a shape of the substrate, each opening having sidewalls and a bottom. The method further includes submitting the substrate including the openings to an oxidation process to form an oxide layer covering the sidewalls and the bottom of the openings, and a portion of a surface of the substrate, wherein a shape of the substrate disposed between a pair of two adjacent openings is completely oxidized to form an insulation layer between the pair of two adjacent openings; and depositing a conductive material layer over the oxide layer in the openings such that the conductive material layer is electrically continuous and such that the pair of adjacent openings form a capacitor. | 2012-07-05 |
| 20120168903 | Semiconductor Constructions Containing Tubular Capacitor Storage Nodes, And Retaining Structures Along Portions Of The Tubular Capacitor Storage Nodes - The invention includes semiconductor constructions, and also includes methods of forming pluralities of capacitor devices. An exemplary method of the invention includes forming conductive storage node material within openings in an insulative material to form conductive containers. A retaining structure lattice is formed in physical contact with at least some of the containers, and subsequently the insulative material is removed to expose outer surfaces of the containers. The retaining structure can alleviate toppling or other loss of structural integrity of the container structures. The electrically conductive containers correspond to first capacitor electrodes. After the outer sidewalls of the containers are exposed, dielectric material is formed within the containers and along the exposed outer sidewalls. Subsequently, a second capacitor electrode is formed over the dielectric material. The first and second capacitor electrodes, together with the dielectric material, form a plurality of capacitor devices. | 2012-07-05 |
| 20120168904 | Semiconductor Device Including Insulating Layer of Cubic System or Tetragonal System - Provided is a semiconductor device including an insulating layer of a cubic system or a tetragonal system, having good electrical characteristics. The semiconductor device includes a semiconductor substrate including an active region, a transistor that is formed in the active region of the semiconductor substrate, an interlevel insulating layer that is formed on the semiconductor substrate and a contact plug that is formed in the interlevel insulating layer and that is electrically connected to the transistor. The semiconductor device may include a lower electrode that is formed on the interlevel insulating layer and that is electrically connected to the contact plug, an upper electrode that is formed on the lower electrode and an insulating layer of a cubic system or a tetragonal system including a metal silicate layer. The insulating layer may be formed between the lower electrode and the upper electrode. | 2012-07-05 |
| 20120168905 | CAPACITOR OF NONVOLATILE MEMORY DEVICE - The capacitor of a nonvolatile memory device includes first and second electrodes formed in the capacitor region of a semiconductor substrate to respectively have consecutive concave and convex shape of side surfaces formed along each other and a dielectric layer formed between the first and the second electrodes. | 2012-07-05 |
| 20120168906 | ESD Protection Device with Tunable Design Windows - An electrostatic discharge (ESD) device includes a high-voltage well (HVW) region of a first conductivity type; a first heavily doped region of a second conductivity type opposite the first conductivity type over the HVW region; and a doped region of the first conductivity type contacting the first heavily doped region and the HVW region. The doped region is under the first heavily doped region and over the HVW region. The doped region has a first impurity concentration higher than a second impurity concentration of the HVW region and lower than a third impurity concentration of the first heavily doped region. The ESD device further includes a second heavily doped region of the second conductivity type over the HVW region; and a third heavily doped region of the first conductivity type over and contacting the HVW region. | 2012-07-05 |
| 20120168907 | FLAT RESPONSE DEVICE STRUCTURES FOR BIPOLAR JUNCTION TRANSISTORS - Bipolar transistors with tailored response curves, as well as fabrication methods for bipolar transistors and design structures for BiCMOS integrated circuits. The bipolar transistor includes a first section of a collector region implanted with a first dopant concentration and a second section of the collector region implanted with a second dopant concentration that is higher than the first dopant concentration. A first emitter is formed in vertical alignment with the first section of the collector region. A second emitter is formed in vertical alignment with the second section of the collector region. | 2012-07-05 |
| 20120168908 | SPACER FORMATION IN THE FABRICATION OF PLANAR BIPOLAR TRANSISTORS - A bipolar transistor is fabricated having a collector ( | 2012-07-05 |
| 20120168909 | RADIATION HARDENED BIPOLAR INJUNCTION TRANSISTOR - A method for integrating a bipolar injunction transistor in a semiconductor chip includes the steps of forming an intrinsic base region of a second type of conductivity extending in the collector region from a main surface through an intrinsic base window of the sacrificial insulating layer, forming an emitter region of the first type of conductivity extending in the intrinsic base region from the main surface through an emitter window of the sacrificial insulating layer, removing the sacrificial insulating layer, forming an intermediate insulating layer on the main surface, and forming an extrinsic base region of the second type of conductivity extending in the intrinsic base region from the main surface through an extrinsic base window of the intermediate insulating layer | 2012-07-05 |
| 20120168910 | MULTI-NARY GROUP IB AND VIA BASED SEMICONDUCTOR - Methods and devices are provided for forming multi-nary semiconductor. In one embodiment, a method is provided comprising of depositing a precursor material onto a substrate, wherein the precursor material may include or may be used with an additive to minimize concentration of group IIIA material such as Ga in the back portion of the final semiconductor layer. The additive may be a non-copper Group IB additive in elemental or alloy form. Some embodiments may use both selenium and sulfur, forming a senary or higher semiconductor alloy. | 2012-07-05 |
| 20120168911 | SILICON WAFER STRENGTH ENHANCEMENT - Provided is a method of fabricating a semiconductor device. The method includes: receiving a silicon wafer that contains oxygen; forming a zone in the silicon wafer, the zone being substantially depleted of oxygen; causing a nucleation process to take place in the silicon wafer to form oxygen nuclei in a region of the silicon wafer outside the zone; and growing the oxygen nuclei into defects. Also provided is an apparatus that includes a silicon wafer. The silicon wafer includes: a first portion that is substantially free of oxygen, the first portion being disposed near a surface of the silicon wafer; and a second portion that contains oxygen; wherein the second portion is at least partially surrounded by the first portion. | 2012-07-05 |
| 20120168912 | METHOD FOR QUANTITATIVELY EVALUATING CONCENTRATION OF ATOMIC VACANCIES EXISTING IN SILICON WAFER, METHOD FOR MANUFACTURING SILICON WAFER, AND SILICON WAFER MANUFACTURED BY THE METHOD FOR MANUFACTURING SILICON WAFER - A quantitative evaluation method, a method for manufacturing a silicon wafer, and a silicon wafer manufactured by the method, enabling more efficient evaluation of the concentration of atomic vacancies existing in a silicon wafer. The quantitative evaluation method includes steps of: oscillating, in a state in which an external magnetic field is applied to a silicon wafer ( | 2012-07-05 |
| 20120168913 | FINFET - A fin type transistor includes a dielectric layer on a substrate surface which serves to isolate the gate of the transistor from the substrate. The dielectric layer includes a non-selectively etched surface to produce top portions of fin structures which have reduce height variations across the wafer. The fin type transistor may also include a counter doped region at least below the S/D regions to reduce parasitic capacitance to improve its performance. | 2012-07-05 |
| 20120168914 | EPITAXIAL STRUCTURE AND METHOD FOR MAKING THE SAME - A method for making an epitaxial structure includes: (a) providing a sacrificial layer on a temporary substrate, the sacrificial layer being made of gallium oxide; and (b) growing epitaxially an epitaxial layer unit over the sacrificial layer. | 2012-07-05 |
| 20120168915 | RELIABLE INTERCONNECT INTEGRATION SCHEME - Embodiments relate to a method for forming reliable interconnects by preparing a substrate with a dielectric layer, processing the dielectric layer to serve as an IMD layer, wherein the IMD layer comprises a hybrid IMD layer comprising a plurality of dielectric materials with different k values. | 2012-07-05 |
| 20120168916 | Semiconductor Device and Method of Forming Open Cavity in TSV Interposer to Contain Semiconductor Die in WLCSMP - A semiconductor device is made by mounting a semiconductor wafer to a temporary carrier. A plurality of TSV is formed through the wafer. A cavity is formed partially through the wafer. A first semiconductor die is mounted to a second semiconductor die. The first and second die are mounted to the wafer such that the first die is disposed over the wafer and electrically connected to the TSV and the second die is disposed within the cavity. An encapsulant is deposited over the wafer and first and second die. A portion of the encapsulant is removed to expose a first surface of the first die. A portion of the wafer is removed to expose the TSV and a surface of the second die. The remaining portion of the wafer operates as a TSV interposer for the first and second die. An interconnect structure is formed over the TSV interposer. | 2012-07-05 |
| 20120168917 | STACK TYPE SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME - A stack type semiconductor package and a method of fabricating the stack type semiconductor package. The stack type semiconductor package includes: a lower semiconductor package including a circuit board, a semiconductor chip which is disposed on an upper surface of the circuit board, via-pads which are arrayed on the upper surface of the circuit board around the semiconductor chip, and an encapsulation layer which encapsulates the upper surface of the circuit board and has via-holes through which the via-pads are exposed; and an upper semiconductor package which is stacked on the encapsulation layer, is electrically connected to the lower semiconductor package, and comprises internal connection terminals which are formed on a lower surface of the upper semiconductor package. | 2012-07-05 |
| 20120168918 | SEMICONDUCTOR PACKAGES - Provided is a semiconductor package including: a semiconductor chip mounted on a die pad; at least one lead connected electrically to the semiconductor chip; and a flexible film substrate including a metal wiring, which electrically connects the semiconductor chip and the at least one lead, wherein the semiconductor chip is electrically connected to the film substrate through a first connection member which contacts the semiconductor chip and the metal wiring; and the film substrate is electrically connected to the at least one lead through a second connection member which contacts the metal wiring and the at least one lead. | 2012-07-05 |
| 20120168919 | SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME - A semiconductor package and a method of manufacturing the same, and more particularly, to a package of a power module semiconductor and a method of manufacturing the same. The semiconductor package includes a substrate including a plurality of conductive patterns spaced apart from one another; a plurality of semiconductor chips disposed on the conductive patterns; a connecting member for electrically connecting the conductive patterns to each other, for electrically connecting the semiconductor chips to each other, or for electrically connecting the conductive pattern and the semiconductor chip; and a sealing member for covering the substrate, the semiconductor chips, and the connecting member, wherein a lower surface of the substrate and an upper surface of the connecting member are exposed to the outside by the sealing member. | 2012-07-05 |
| 20120168920 | LEADLESS SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURE - A leadless semiconductor package includes a package body on a leadframe that includes a die paddle and a plurality of bond pads, none of which extend as far as a lateral face of the body. During manufacture of the package, molding compound is deposited over a face of the leadframe on which the die paddle and bond pads are positioned. After the molding compound is cured, a back side of the leadframe is etched to isolate the die paddle and bond pads, back surfaces of which remain exposed at a back face of the body. During manufacture of the leadframe, a parent substrate is etched to define the die paddle and a plurality of bond pads on one side of the substrate and a plurality of cavities on the opposite face. | 2012-07-05 |
| 20120168921 | LEADLESS SEMICONDUCTOR PACKAGE WITH ROUTABLE LEADS, AND METHOD OF MANUFACTURE - A leadless semiconductor package includes a package body on a leadframe that includes a die paddle and a plurality of high-aspect-ratio leads, each coupled at a first end to a contact pad of the package, and at a second end to a semiconductor die mounted to the die paddle. During manufacture of the package, molding compound is deposited over a face of the leadframe on which the die paddle and leads are positioned. After the molding compound is cured, a back side of the leadframe is etched to isolate the die paddle and leads, and to thin a portion of each of the leads. Back surfaces of the leads remain exposed at a back face of the body. The thinned portions of the leads are covered with a dielectric. During manufacture of the leadframe, a parent substrate is etched to define the die paddle and a plurality of leads on one side of the substrate and a plurality of cavities on the opposite face. | 2012-07-05 |
| 20120168922 | High Power Semiconductor Package with Conductive Clip - One exemplary disclosed embodiment comprises a high power semiconductor package configured as a buck converter having a control transistor, a sync transistor, a driver integrated circuit (IC) for driving the control and sync transistors, and a conductive clip electrically coupling a sync drain of the sync transistor to a first leadframe pad of the package, wherein the first leadframe pad of the package is electrically coupled to a control source of the control transistor using a wirebond. The conductive clip provides an efficient connection between the control source and the sync drain by direct mechanical connection and large surface area conduction. A sync source is electrically and mechanically coupled to a second leadframe pad providing a high current carrying capability, and high reliability. The resulting package has significantly reduced electrical resistance, form factor, complexity, and cost when compared to conventional packaging methods using wirebonds for transistor interconnections. | 2012-07-05 |
| 20120168923 | High Power Semiconductor Package with Conductive Clip on Multiple Transistors - One exemplary disclosed embodiment comprises a high power semiconductor package configured as a buck converter having a control transistor, a sync transistor, a driver integrated circuit (IC) for driving the control and sync transistors, and a conductive clip extending from a sync drain on a top surface of the sync transistor to a control source on a top surface of the control transistor. The conductive clip may also connect to substrate pads such as a leadframe pad for current input and output. In this manner, the conductive clip provides an efficient connection between the control source and the sync drain by direct mechanical connection and large surface area conduction, thereby enabling a package with significantly reduced electrical resistance, form factor, complexity, and cost when compared to conventional packaging methods using wirebonds for transistor interconnections. | 2012-07-05 |
| 20120168924 | High Power Semiconductor Package with Multiple Conductive Clips - One exemplary disclosed embodiment comprises a high power semiconductor package configured as a buck converter having a control transistor and a sync transistor disposed on a common leadframe pad, a driver integrated circuit (IC) for driving the control and sync transistors, and conductive clips electrically coupling the top surfaces of the transistors to substrate pads such as leadframe pads. In this manner, the leadframe and the conductive clips provide efficient grounding or current conduction by direct mechanical connection and large surface area conduction, thereby enabling a package with significantly reduced electrical resistance, form factor, complexity, and cost when compared to conventional packaging methods using wirebonds for transistor interconnections. | 2012-07-05 |
| 20120168925 | High Power Semiconductor Package with Conductive Clips and Flip Chip Driver IC - One exemplary disclosed embodiment comprises a high power semiconductor package configured as a buck converter having a control transistor and a sync transistor disposed on a leadframe, a flip chip driver integrated circuit (IC) for driving the control and sync transistors, and conductive clips electrically coupling the top surfaces of the transistors to substrate pads such as leadframe pads. The source of the control transistor is electrically coupled to the drain of the sync transistor using the leadframe and one of the transistor conductive clips. In this manner, the leadframe and the conductive clips provide efficient current conduction by direct mechanical connection and large surface area conduction, thereby enabling a package with significantly reduced electrical resistance, form factor, complexity, and cost when compared to conventional packaging methods using wirebonds for transistor interconnections. | 2012-07-05 |
| 20120168926 | High Power Semiconductor Package with Conductive Clip and Flip Chip Driver IC with Integrated Control Transistor - One exemplary disclosed embodiment comprises a high power semiconductor package configured as a buck converter having a sync transistor with a top surface having a drain, a flip chip driver integrated circuit (IC) having an integrated control transistor, the flip chip driver IC driving the sync and control transistors, and a conductive clip electrically coupling the drain of the sync transistor to a common portion of the leadframe shared with a control source of the control transistor. In this manner, the leadframe and the conductive clip provide efficient current conduction by direct mechanical connection and large surface area conduction, significantly reducing package electrical resistance, form factor, complexity, and cost compared to conventional packages. Moreover, by integrating only the control transistor rather than both the control and sync transistor within the flip chip driver IC, the sync transistor may remain separate, simplifying manufacture and providing greater total surface area for thermal dissipation. | 2012-07-05 |
| 20120168927 | SEMICONDUCTOR DEVICE - A semiconductor device is configured that two or more semiconductor elements are stacked and mount on a lead frame, the aforementioned lead frame is electrically joined to the semiconductor element with a wire, and the semiconductor element, the wire and an electric junction are encapsulated with a cured product of an epoxy resin composition for encapsulating semiconductor device, and that the epoxy resin composition for encapsulating semiconductor device contains (A) an epoxy resin; (B) a curing agent; and (C) an inorganic filler, and that the (C) inorganic filler contains particles having particle diameter of equal to or smaller than two-thirds of a thinnest filled thickness at a rate of equal to or higher than 99.9% by mass. | 2012-07-05 |
| 20120168928 | CHIP ASSEMBLY WITH FREQUENCY EXTENDING DEVICE - A chip assembly includes a chip, a paddle, an interface layer, a frequency extending device, and lands. The chip has contacts. The interface layer is disposed between the chip and the paddle. The frequency extending device has at least a conductive layer and a dielectric layer. The conductive layer has conductive traces. The frequency extending device is disposed adjacent to the side of the chip and overlying the paddle. The lands are disposed adjacent to the side of the paddle. The contacts are connected to the conductive traces. The conductive traces are connected to the lands. The frequency extending device is configured to reduce impedance discontinuity such that the impedance discontinuity produced by the frequency extending device is less than an impedance discontinuity that would be produced by bond wires each having a length greater than or substantially equal to the distance between the contacts and the lands. | 2012-07-05 |
| 20120168929 | LOW COST THERMALLY ENHANCED HYBRID BGA AND METHOD OF MANUFACTURING THE SAME - A semiconductor package is formed having a substrate juxtaposed on at least two sides of a semiconductor die. Both the substrate and the semiconductor die are affixed to a conductive layer that draws heat generated during use of the semiconductor package away from the semiconductor die and the substrate. There are also electrical contacts affixed to the substrate and the semiconductor die. The electrical contacts facilitate electrical connection between the semiconductor die, the substrate, and any external devices or components making use of the semiconductor die. The substrate, semiconductor die, and at least a portion of some of the electrical contacts are enclosed by an encapsulating layer insulating the components. Portions of the electrical contacts not enclosed by the encapsulating layer are affixed to an outside device, such as a printed circuit board. | 2012-07-05 |
| 20120168930 | SEMICONDUCTOR DEVICE - A semiconductor device has high reliability which suppresses a temperature rise of a set housing within an allowable range, and avoids an effect on a wiring on a package substrate due to thermal expansion of a heat dissipating member. The semiconductor device includes a semiconductor element, a package substrate, and a heat dissipating member. A first main surface of the semiconductor element faces an element-mounting surface of the package substrate and is connected to the package substrate. A main surface part of the heat dissipating member contacts a second main surface which is a back surface of first main surface of semiconductor element. A bonding part around a periphery of the main surface part is bonded to a bonding area of the element-mounting surface of the package substrate. A wiring on the package substrate is arranged at a portion other than the element-mounting surface, in a region of the bonding area. | 2012-07-05 |
| 20120168931 | CARBON NANOTUBE STRUCTURES FOR ENHANCEMENT OF THERMAL DISSIPATION FROM SEMICONDUCTOR MODULES - Disclosed are embodiments of an improved semiconductor wafer structure having protected clusters of carbon nanotubes (CNTs) on the back surface and a method of forming the improved semiconductor wafer structure. Also disclosed are embodiments of a semiconductor module with exposed CNTs on the back surface for providing enhanced thermal dissipation in conjunction with a heat sink and a method of forming the semiconductor module using the disclosed semiconductor wafer structure. | 2012-07-05 |
| 20120168932 | SEMICONDUCTOR ASSEMBLY THAT INCLUDES A POWER SEMICONDUCTOR DIE LOCATED ON A CELL DEFINED BY FIRST AND SECOND PATTERNED POLYMER LAYERS - A semiconductor assembly includes a first subassembly comprising a heat sink and a first patterned polymer layer disposed on a surface of the heat sink to define an exposed portion of the first surface. The exposed portion of the first surface extends radially inward along the heat sink surface from the first layer. The subassembly also includes a second patterned polymer layer disposed on a radially outer portion of the first patterned polymer layer. The first and second layers define a cell for accommodating a power semiconductor die. Solder material is disposed on the exposed portion of the heat sink surface and in the cell. A power semiconductor die is located within the cell on a radially inward portion of the first layer and thermally coupled to the heat sink by the solder material. | 2012-07-05 |
| 20120168933 | WAFER LEVEL MOLDING STRUCTURE - A wafer level molding structure and a manufacturing method thereof are provided. A molding structure includes a first chip and a second chip and an adhesive layer there between. The first chip includes a first back side, a first front side and a plurality of lateral sides, in which a plurality of first front side bumps are disposed on the first front side. The second chip includes a second back side and a second front side, and a plurality of second back side bumps and second front side bumps are respectively disposed on the second back side and the second front side. A plurality of through-hole vias is disposed in the second chip, and electrically connected the second back side bumps to the second front side bumps. Adhesive materials covering the lateral sides of the first chip, and electrically connect the second back side bumps with the first front side bumps. The adhesive materials include a plurality of conductive particles and/or a plurality of non-conductive particles. | 2012-07-05 |
| 20120168934 | FLIP CHIP DEVICE HAVING SIMPLIFIED ROUTING - The present disclosure is directed to a semiconductor die having a chip outline boundary, a die seal, a row of input/output contact pads separated from the chip outline boundary by the die seal, a first row of solder bump connections positioned between the row of input/output contact pads and the die seal, and a second row of solder bump connections separated from the first row of solder bump connections by the row of input/output contact pads. | 2012-07-05 |
| 20120168935 | INTEGRATED CIRCUIT DEVICE AND METHOD FOR PREPARING THE SAME - An integrated circuit device includes a bottom wafer having a first annular dielectric block, at least one stacking wafer having a second annular dielectric block positioned on the bottom wafer, and a conductive via penetrating through the stacking wafer and into the bottom wafer in a substantially linear manner. In one embodiment of the present invention, the bottom wafer and the stacking wafer are bonded by an intervening adhesive layer, no bump pad is positioned between the bottom wafer and the stacking wafer, and the conductive via is positioned within the first annular dielectric block and the second annular dielectric block. | 2012-07-05 |
| 20120168936 | MULTI-CHIP STACK PACKAGE STRUCTURE AND FABRICATION METHOD THEREOF - A multi-chip stack package structure includes: an inner-layer heat sink having a first surface and a second surface opposing one another and having a plurality of conductive vias penetrating the first surface and the second surface; a first chip disposed on the first surface of the inner-layer heat sink; and a second chip disposed on the second surface of the inner-layer heat sink. Thereby, a heat-dissipating path is provided within inner-layers of the multi-chip stack package structure, and the rigidity of the overall structure is enhanced. | 2012-07-05 |
| 20120168937 | FLIP CHIP PACKAGE AND METHOD OF MANUFACTURING THE SAME - A flip chip package and a method of manufacturing the same are provided. The flip chip package include: a package substrate, a semiconductor chip and conductive hollow bumps. The semiconductor chip may be arranged over an upper surface of the package substrate. The conductive hollow bumps may be interposed between the semiconductor chip and the package substrate to electrically connect the semiconductor chip with the package substrate. Thus, a wide gap may be formed between the semiconductor chip and the package substrate by the thick conductive hollow bumps. As a result, a sufficient amount of the molding member may be supplied to each of the conductive hollow bumps to surround each of the conductive hollow bumps. | 2012-07-05 |
| 20120168938 | PLASMA TREATMENT ON SEMICONDUCTOR WAFERS - A semiconductor wafer has integrated circuits formed thereon and a top passivation layer applied. The passivation layer is patterned and selectively etched to expose contact pads on each semiconductor die. The wafer is exposed to ionized gas causing the upper surface of passivation layer to roughen and to slightly roughen the upper surface of the contact pads. The wafer is cut to form a plurality of semiconductor dies each with a roughened passivation layer. The plurality of semiconductor dies are placed on an adhesive layer and a reconstituted wafer formed. Redistribution layers are formed to complete the semiconductor package having electrical contacts for establishing electrical connections external to the semiconductor package, after which the wafer is singulated to separate the dice. | 2012-07-05 |
| 20120168939 | CHIP PACKAGE AND METHOD FOR FORMING THE SAME - An embodiment of the invention provides a chip package which includes: a first chip; a second chip disposed on the first chip; a hole extending from a surface of the first chip towards the second chip; a conducting layer disposed on the surface of the first chip and extending into the hole and electrically connected to a conducting region or a doped region in the first chip; and a support bulk disposed between the first chip and the second chip, wherein the support bulk substantially and/or completely covers a bottom of the hole. | 2012-07-05 |
| 20120168940 | APPARATUS AND METHOD OF APPLYING A FILM TO A SEMICONDUCTOR WAFER AND METHOD OF PROCESSING A SEMICONDUCTOR WAFER - Implementations and techniques for applying a film to a semiconductor wafer and for processing a semiconductor wafer are generally disclosed. | 2012-07-05 |
| 20120168941 | STACKABLE ELECTRONIC PACKAGE AND METHOD OF MAKING SAME - An apparatus comprises a first chip layer comprising a first component coupled to a first side of a first flex layer, the first component comprising a plurality of electrical pads. The first chip layer also comprises a first plurality of feed-thru pads coupled to the first side of the first flex layer and a first encapsulant encapsulating the first component, the first encapsulant having a portion thereof removed to form a first plurality of cavities in the first encapsulant and to expose the first plurality of feed-thru pads by way of the first plurality of cavities. | 2012-07-05 |
| 20120168942 | THROUGH HOLE VIA FILLING USING ELECTROLESS PLATING - An embedded wafer level ball grid array (eWLB) is formed by embedding a semiconductor die in a molding compound. A trench is formed in the molding compound with a laser drill. A first layer of copper is deposited on the sidewall of the trench by physical vapor deposition. A second layer of copper is then formed on the first layer of copper by an electroless process. A third layer of copper is then formed on the second layer by electroplating. | 2012-07-05 |
| 20120168943 | PLASMA TREATMENT ON SEMICONDUCTOR WAFERS - A semiconductor package and method of forming the same is described. The semiconductor package is formed from a semiconductor die cut from a semiconductor wafer that has a passivation layer. The semiconductor wafer is exposed to ionized gas causing the passivation layer to roughen. The semiconductor wafer is cut to form a plurality of semiconductor dies each with a roughened passivation layer. The plurality of semiconductor dies are placed on an adhesive layer to form a reconstituted wafer, and an encapsulation layer is formed enclosing the adhesive layer and the plurality of semiconductor dies. The passivation layer is removed and the semiconductor package formed includes electrical contacts for establishing electrical connections external to the semiconductor package. | 2012-07-05 |
| 20120168944 | THROUGH HOLE VIA FILLING USING ELECTROLESS PLATING - An embedded wafer level ball grid array (eWLB) is formed by embedding a semiconductor die in a molding compound. A trench is formed in the molding compound with a laser drill. A first layer of copper is deposited on the sidewall of the trench by physical vapor deposition. A second layer of copper is then formed on the first layer of copper by an electroless process. A third layer of copper is then formed on the second layer by electroplating. | 2012-07-05 |
| 20120168945 | CHIP PACKAGE STRUCTURE AND CHIP PACKAGING PROCESS - A chip package structure includes a silicon substrate, a sensing component, a metal circuit layer, a first insulating layer and a conductive metal layer. The silicon substrate has opposite first and second surfaces. The sensing component is disposed on the first surface. The metal circuit layer is disposed on the first surface and electrically connected to the sensing component. The first insulating layer covers the second surface and has a first through hole to expose a portion of the second surface. The conductive metal layer is disposed on the first insulating layer and includes first leads and a second lead. The first leads are electrically connected to the metal circuit layer. The second lead is filled in the first through hole to electrically connect to the silicon substrate and one of the first leads. A chip packaging process for fabricating the chip package structure is also provided. | 2012-07-05 |
| 20120168946 | SEMICONDUCTOR DEVICE AND PRODUCTION METHOD THEREFOR - A semiconductor device includes a semiconductor chip, a lead arranged on a side portion of the semiconductor chip, and a wire, whose one end and another end are bonded to the semiconductor chip and the lead respectively, having a ball portion and a stitch portion wedged in side elevational view on the semiconductor chip and the lead respectively. An angle of approach of the wire to the lead is not less than 50°, and the length of the stitch portion is not less than 33 μm. | 2012-07-05 |
| 20120168947 | Methods and Designs for Localized Wafer Thinning - Methods for localized thinning of wafers used in semiconductor devices and the structures formed from such methods are described. The methods thin localized areas of the backside of the semiconductor wafer to form recesses with a bi-directional channel design that is repeated within the wafer (or die) so that no straight channel line crosses the wafer (or die). The bi-directional pattern design keeps the channels from being aligned with the crystal orientation of the wafer. The recesses are then filled by a solder ball drop process by dropping proper size solder balls into the recesses and then annealing the wafer to reflow the solder balls and flatten them out. The reflow process begins to fill in the recesses from the bottom up, thereby avoiding void formation and the resulting air traps in the reflowed solder material. Other embodiments are also described. | 2012-07-05 |
| 20120168948 | COPPER PILLAR FULL METAL VIA ELECTRICAL CIRCUIT STRUCTURE - An electrical interconnect including a first circuitry layer with a first surface and a second surface. At least a first dielectric layer is printed on the first surface of the first circuitry layer to include a plurality of first recesses. A conductive material is deposited in a plurality of the first recesses to form a plurality of first conductive pillars electrically coupled to, and extending generally perpendicular to, the first circuitry layer. At least a second dielectric layer is printed on the first dielectric layer to include a plurality of second recesses generally aligned with a plurality of the first conductive pillars. A conductive material is deposited in a plurality of the second recesses to form a plurality of second conductive pillars electrically coupled to, and extending parallel the first conductive pillars. | 2012-07-05 |
| 20120168949 | SEMICONDUCTOR DEVICE WITH A LINE AND METHOD OF FABRICATION THEREOF - A semiconductor device includes an interlayer insulation film, an underlying line provided in the interlayer insulation film, a liner film overlying the interlayer insulation film, an interlayer insulation film overlying the liner film. The underlying line has a lower hole and the liner film and the interlayer insulation film have an upper hole communicating with the lower hole, and the lower hole is larger in diameter than the upper hole. The semiconductor device further includes a conductive film provided at an internal wall surface of the lower hole, a barrier metal provided along an internal wall surface of the upper hole, and a Cu film filling the upper and lower holes. The conductive film contains a substance identical to a substance of the barrier metal. A highly reliable semiconductor device can thus be obtained. | 2012-07-05 |
| 20120168950 | DIE STRUCTURE, MANUFACTURING METHOD AND SUBSTRATE THEREOF - A die structure, a manufacturing method and a substrate, wherein the die structure is constituted by a chip on wafer (COW) and the substrate, and the substrate is formed by stacking and then cutting a plurality of thermal and electrical conductive poles and a plurality of insulating material layers. Moreover, the fabricating of the die structure comprises a plurality of COWs carried on a carrier board is bonded on the substrate, the plurality of COWs are in contact with the plurality of thermal and electrical conductive poles on the substrate, and then the carrier board is removed. After that, a phosphor plate is adhered on the plurality of COWs so as to form a stacked structure. Thereafter, the stacked structure is cut, thus forming a plurality of die structures having at least one COW. | 2012-07-05 |
| 20120168951 | PRINTED CIRCUIT BOARD AND SEMICONDUCTOR PACKAGE COMPRISING THE SAME - Provided are a printed circuit board (PCB) and a semiconductor package including the same. The PCB includes a core layer having a stacked structure including at least a first layer made of a first material that has a first coefficient of thermal expansion (CTE) and a second layer made of a second material that has a second CTE different from the first CTE, an upper wiring layer disposed on a first surface of the core layer, and a lower wiring layer disposed on a second surface of the core layer opposite the first surface. | 2012-07-05 |
| 20120168952 | SEMICONDUCTOR DEVICE HAVING A COPPER PLUG - Disclosed is a process of making a semiconductor device wherein an insulation layer has a copper plug in contact with the last wiring layer of the device. There may also be a barrier layer separating the copper plug from the insulation layer. There may also be a cap layer over the copper plug to protect it from oxidation. There may also be a dielectric layer over the cap layer. | 2012-07-05 |
| 20120168953 | STRUCTURE WITH SELF ALIGNED RESIST LAYER ON AN INTERCONNECT SURFACE AND METHOD OF MAKING SAME - A structure is provided with a self-aligned resist layer on a surface of metal interconnects for use in forming air gaps in an insulator material and method of fabricating the same. The non-lithographic method includes applying a resist on a structure comprising at least one metal interconnect formed in an insulator material. The method further includes blanket-exposing the resist to energy and developing the resist to expose surfaces of the insulator material while protecting the metal interconnects. The method further includes forming air gaps in the insulator material by an etching process, while the metal interconnects remain protected by the resist. | 2012-07-05 |
| 20120168954 | SUBSTRATE BONDING METHOD AND SEMICONDUCTOR DEVICE - A first Sn absorption layer is formed on a principal surface of a first substrate, the first Sn absorption layer being made of metal absorbing Sn from AuSn alloy and lowering a relative proportion of Sn in the AuSn alloy. A second Sn absorption layer is formed on a principal surface of a second substrate, the second Sn absorption layer being made of metal absorbing Sn from AuSn alloy and lowering a relative proportion of Sn in the AuSn alloy. A solder layer made of AuSn alloy is formed at least on one Sn absorption layer of the first and second Sn absorption layers. The first and second substrates are bonded together by melting the solder layer in a state that the first and second substrates are in contact with each other, with the principal surfaces of the first and second substrates facing each other. | 2012-07-05 |
| 20120168955 | Integrated Circuit Pattern and Method - An integrated circuit pattern comprises a set of lines of material having X and Y direction portions. The X and Y direction portions have first and second pitches, the second pitch being larger, such as at least 3 times larger, than the first pitch. The X direction portions are parallel and the Y direction portions are parallel. The end regions of the Y direction portions comprise main line portions and offset portions. The offset portions comprise offset elements spaced apart from and electrically connected to the main line portions. The offset portions define contact areas for subsequent pattern transferring procedures. A multiple patterning method, for use during integrated circuit processing procedures, provides contact areas for subsequent pattern transferring procedures. | 2012-07-05 |
| 20120168956 | CONTROLLING DENSITY OF PARTICLES WITHIN UNDERFILL SURROUNDING SOLDER BUMP CONTACTS - A method forms an integrated circuit structure, using a manufacturing device, to have kerf regions and external contacts, and to have conductive structures in the kerf regions. The method also forms an underfill material on a surface of the integrated circuit structure, using the manufacturing device, that contacts the kerf regions and the external contacts. The underfill material comprises electrically attracted filler particles that affect the coefficient of thermal expansion and elastic modulus of the underfill material. When forming the underfill material, the method applies an electrical charge to the conductive structures and the external contacts. | 2012-07-05 |
| 20120168957 | METHOD TO REDUCE DEPTH DELTA BETWEEN DENSE AND WIDE FEATURES IN DUAL DAMASCENE STRUCTURES - A method of forming a device is disclosed. The method includes providing a substrate prepared with a dielectric layer having first and second regions. The first region comprises wide features and the second region comprises narrow features. A depth delta exists between bottoms of the wide and narrow features. A non-conformal layer is formed on the substrate and it lines the wide and narrow trenches in the first and second regions. The non-conformal layer is removed. Removing the non-conformal layer reduces the depth delta between the bottoms of the wide and narrow features in the first and second region. | 2012-07-05 |
| 20120168958 | METHOD AND SYSTEM FOR FORMING DUMMY STRUCTURES IN ACCORDANCE WITH THE GOLDEN RATIO - The present disclosure is directed to method of forming dummy structures in accordance with the golden ratio to reduce dishing and erosion during a chemical mechanical polish. The method includes determining at least one unfilled portion of a die prior to a chemical mechanical planarization and filling the at least one unfilled portion with a plurality of dummy structures, a ratio of the dummy structures to a total area of the unfilled portion being in the range of 36 percent and 39 percent. A die formed in accordance with the method may include a plurality of metal levels and a plurality of regions at each metal level, each region having a plurality of dummy structures formed as golden rectangles. | 2012-07-05 |
| 20120168959 | PACKAGE SUBSTRATE HAVING A THROUGH HOLE AND METHOD OF FABRICATING THE SAME - A package substrate includes a core board having a through hole; a circuit layer formed on the core board; a metallic ring disposed on the core board surrounding a contour of the through hole, the metallic ring having opening portions positioned opposite to each other, making the metallic ring having a disconnected manner; and an embedded component installed in the through hole. When the embedded component is deviated in the through hole to allow the electrodes to be in contact with the metallic ring, the electrodes are prevented from coming into contact with the same section of the metallic ring to thereby avoid short circuit. | 2012-07-05 |
| 20120168960 | MULTI CHIP PACKAGE - The preferred embodiment of the present invention can prevent signal distortions such as stress, or the like, occurring at the time of power delivery due to the difference in the lengths of the metal wires for electrically connecting each of the plurality of semiconductor chips formed on the dual die package substrate. | 2012-07-05 |
| 20120168961 | SEMICONDUCTOR DEVICE - An externally connecting electrode is formed above a semiconductor substrate with interlayer insulation films and disposed in the externally connecting electrode. The externally connecting electrode has a pad metal layer whose upper surface is exposed, a first metal layer formed between the pad metal layer and the semiconductor substrate, and at least two first vias which penetrate the interlayer insulation film and electrically connect the pad metal layer to the first metal layer and are formed in the interlayer insulation film. The maximum interval b between the first vias is larger than the width a of the pad metal layer. | 2012-07-05 |
| 20120168962 | THIN WAFER PROTECTION DEVICE - A thin wafer protection device includes a wafer having a plurality of semiconductor chips. The wafer has a first side and an opposite second side. A plurality of dies is over the first side of the wafer, and at least one of the plurality of dies is bonded to at least one of the plurality of semiconductor chips. A wafer carrier is over the second side of the wafer. An encapsulating layer is over the first side of the wafer and the plurality of dies, and the encapsulating layer has a planar top surface. An adhesive tape is over the planar top surface of the encapsulating layer. | 2012-07-05 |
| 20120168963 | Semiconductor Device and Method of Forming Three-Dimensional Vertically Oriented Integrated Capacitors - A semiconductor device includes conductive pillars disposed vertically over a seed layer, a conformal insulating layer formed over the conductive pillars, and a conformal conductive layer formed over the conformal insulating layer. A first conductive pillar, the conformal insulating layer, and the conformal conductive layer constitute a vertically oriented integrated capacitor. The semiconductor device further includes a semiconductor die or component mounted over the seed layer, an encapsulant deposited over the semiconductor die or component and around the conformal conductive layer, and a first interconnect structure formed over a first side of the encapsulant. The first interconnect structure is electrically connected to a second conductive pillar, and includes an integrated passive device. The semiconductor device further includes a second interconnect structure formed over a second side of the encapsulant opposite the first side of the encapsulant. | 2012-07-05 |
| 20120168964 | Probe Card and Method of Testing a Semiconductor Device - A probe card includes a main circuit board electrically connected to a tester in order to test a plurality of unpackaged sets of chips, a frame provided on the main circuit board and including a plurality of sockets for respectively receiving the unpackaged sets of chips, probe blocks respectively provided in the sockets and including a plurality of probes electrically connected to input/output terminals of the unpackaged sets of chips, and a cover plate positioned over the frame and including a plurality of pressure members for pressurizing the unpackaged sets of chips in the sockets. | 2012-07-05 |
| 20120168965 | SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME - A semiconductor device featuring a substrate having a first surface defined by a first edge and an opposing second edge, electrode pads formed on the first surface, a first semiconductor chip mounted over the first surface between the first edge and the electrode pads and including first pads each electrically connected to a corresponding electrode pad, a second semiconductor chip stacked over the first semiconductor chip and including second pads each electrically connected to a corresponding electrode pad, a third semiconductor chip mounted over the first surface of the substrate between the second edge and the electrode pads and including third pads each electrically connected to a corresponding electrode pad, in which one electrode pad is electrically connected to one first pad, one second pad and one third pad and another electrode pad is electrically connected to a first pad and a second pad corresponding thereto, via separate bonding wires. | 2012-07-05 |
| 20120168966 | STACKED-CHIP DEVICE - A stacked-chip device includes a first inductive chip having a first function, a second inductive chip having a second function different from the first function, which is stacked on the first inductive chip, and a third inductive chip having the second function, which is stacked on the second inductive chip. Each of the first, second and third inductive chips has transmitting inductors which transmit data and receiving inductors which receive data. The transmitting inductors and the receiving inductors are disposed in line symmetry to an axis of symmetry. The axes of symmetry of the first, second and third inductive chips are overlapped. Each of the second and third inductive chips is disposed in upside-down or back to front to the first inductive chip. | 2012-07-05 |
| 20120168967 | THREE DIMENSIONAL STACKED CHIP PACKAGE STRUCTURE - This disclosure related to a stacked chip package structure having a sloped dam structure located on the substrate and beside the chip stack. The dam structure can facilitate the dispensing process of the underfill. | 2012-07-05 |
| 20120168968 | EPOXY RESIN COMPOSITION FOR ENCAPSULATING A SEMICONDUCTOR DEVICE, METHOD OF ENCAPSULATING A SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE - An epoxy resin composition for encapsulating a semiconductor device, a method of encapsulating a semiconductor device, and a semiconductor device, the composition including an epoxy resin; a curing agent; a curing accelerator; an inorganic filler; and a flame retardant; wherein the flame retardant includes boehmite, and is present in an amount of about 0.1 to 20% by weight (wt %), based on a total weight of the epoxy resin composition. | 2012-07-05 |
| 20120168969 | EPOXY RESIN COMPOSITION FOR ENCAPSULATING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE ENCAPSULATED WITH AN ENCAPSULANT PREPARED FROM THE COMPOSITION - An epoxy resin composition for encapsulating a semiconductor device and a semiconductor device, the composition including an epoxy resin, a curing agent, a curing accelerator, an inorganic filler, and an additive, wherein the epoxy resin includes an epoxy resin represented by Formula 1: | 2012-07-05 |
