12th week of 2016 patent applcation highlights part 57 |
Patent application number | Title | Published |
20160086865 | Automatically Adjusting Baking Process for Low-k Dielectric Material - A method includes etching a low-k dielectric layer on a wafer to form an opening in the low-k dielectric layer. An amount of a detrimental substance in the wafer is measured to obtain a measurement result. Process conditions for baking the wafer are determined in response to the measurement result. The wafer is baked using the determined process conditions. | 2016-03-24 |
20160086866 | ELECTRONIC DEVICE MODULE AND METHOD OF MANUFACTURING THE SAME - The electronic device module includes a sealing part sealing an electronic component therein, and an external connection terminal disposed on one surface of the sealing part. The electronic device module also includes a dummy bonding part configured on a surface of the sealing part and spaced apart from the external connection terminal. | 2016-03-24 |
20160086867 | Integrated Circuit Packages and Methods for Forming the Same - A method includes forming an electrical connector over a substrate of a wafer, and molding a polymer layer, with at least a portion of the electrical connector molded in the polymer layer. A first sawing step is performed to form a trench in the polymer layer. After the first sawing step, a second sawing step is performed to saw the wafer into a plurality of dies. | 2016-03-24 |
20160086868 | PASSIVATION STRUCTURE AND METHOD OF MAKING THE SAME - A passivation structure includes a bottom dielectric layer. The passivation structure further includes a doped dielectric layer over the bottom dielectric layer. The doped dielectric layer includes a first doped layer and a second doped layer. The passivation structure further includes a top dielectric layer over the doped dielectric layer. | 2016-03-24 |
20160086869 | SEMICONDUCTOR DEVICE HAVING IMPROVED HEAT-DISSIPATION CHARACTERISTICS - A semiconductor device having improved heat-dissipation characteristics is capable effectively discharging heat that is generated inside the semiconductor device of a three-dimensional laminated structure, to the outside of the semiconductor device by utilizing an internal connector used during bonding. | 2016-03-24 |
20160086870 | SEMICONDUCTOR DEVICE - A semiconductor device with improved heat radiation characteristics. It includes: a wiring board having a chip mounting surface and a plurality of electrode pads formed over the chip mounting surface; a semiconductor chip located over the chip mounting surface of the wiring board, having a plurality of bonding pads; a plurality of wires for coupling the electrode pads and the bonding pads; a heat slug located over the semiconductor chip; and a sealing member covering the chip mounting surface of the wiring board, the semiconductor chip, the wires, and the heat slug. A spacer lies between the chip mounting surface of the wiring board and the semiconductor chip and the sealing member lies between the semiconductor chip and the heat slug. | 2016-03-24 |
20160086871 | INTEGRATED HEAT SPREADER FOR MULTI-CHIP PACKAGES - An integrated heat spreader comprising a heat spreader frame that has a plurality of openings formed therethrough and a plurality of thermally conductive structures secured within the heat spreader frame openings. The thermally conductive structures can be formed to have various thicknesses which compensate for varying heights between at least two microelectronic devices in a multi-chip package. The thermally conductive structures can be secured in the heat spreader frame by sizing the openings and the thermally conductive structures such that the thermally conductive structures can be secured within the openings without requiring welding or adhesives. | 2016-03-24 |
20160086872 | HEAT DISSIPATION STRUCTURE, FABRICATING METHOD, AND ELECTRONIC APPARATUS - Disclosed is a heat dissipation structure that includes a plurality of linear structures made of carbon, each of the linear structures having at least one of a first end and a second end being bent, and a coating layer formed on a surface of each of the linear structures, the coating layer having a part covering the other one of the first ends and the second ends of the linear structures, a thickness of the part allowing the corresponding linear structures to be plastically deformable. | 2016-03-24 |
20160086873 | ELECTRIC POWER CONVERTER - An electric power converter includes a semiconductor module, a cooling pipe, a pressing member and a supporting member. A pair of supporting wall portions is disposed so as to sandwich the semiconductor module, the cooling pipe, and the pressing member in an overlapping direction. A semiconductor element includes a small-sized semiconductor element, and a large-sized semiconductor element of which an outer shape is larger than that of the small-sized semiconductor element when projected onto a plane parallel to the overlapping direction. Within the semiconductor module, the large-sized semiconductor element is disposed closer to a connecting end portion side where a connecting portion of the pair of supporting wall portions are disposed than the small-sized semiconductor elements is. | 2016-03-24 |
20160086874 | SEMICONDUCTOR DEVICES INCLUDING THROUGH-SILICON-VIAS AND METHODS OF MANUFACTURING THE SAME AND SEMICONDUCTOR PACKAGES INCLUDING THE SEMICONDUCTOR DEVICES - A semiconductor device can include a substrate that has a surface. A via structure can extend through the substrate toward the surface of the substrate, where the via structure includes an upper surface. A pad structure can be on the surface of the substrate, where the pad structure can include a lower surface having at least one protrusion that is configured to protrude toward the upper surface of the via structure. | 2016-03-24 |
20160086875 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A method of manufacturing a semiconductor device includes preparing a lead frame provided with a die pad having an upper surface and a plurality of leads being arranged so as to be aligned on a side of the die pad and each including a wire joint part at a distal end on the side of the die pad, after the preparing the lead frame, mounting a semiconductor chip having a main surface and a plurality of electrode pads formed on the main surface, on the upper surface of the die pad, and after the mounting the semiconductor chip, electrically connecting a first electrode pad among the plurality of electrode pads of the semiconductor chip and a first lead among the plurality of leads to each other via a first wire. | 2016-03-24 |
20160086876 | Electronic Component - In an embodiment, an electronic component includes a dielectric layer, a semiconductor device embedded in the dielectric layer, an electrically conductive substrate, a redistribution layer having a first surface and a second surface providing at least one outer contact, and a first electrically conductive member. The semiconductor device has a first surface including at least one first contact pad and a second surface including at least one second contact pad. The second contact pad is mounted on the electrically conductive substrate. The first electrically conductive member includes at least one stud bump and extends between the electrically conductive substrate and the first surface of the redistribution layer. | 2016-03-24 |
20160086877 | SEMICONDUCTOR DEVICE - The semiconductor device includes a semiconductor element, a main lead and a resin package. The semiconductor element includes an obverse surface and a reverse surface spaced apart from each other in a thickness direction. The main lead supports the semiconductor element via the reverse surface of the semiconductor element. The resin package covers the entirety of the semiconductor element. The resin package covers the main lead in such a manner that a part of the main lead is exposed from the resin package. The semiconductor element includes a part that does not overlap the main lead as viewed in the thickness direction. | 2016-03-24 |
20160086878 | Electronic Component - In an embodiment, an electronic component includes a high-voltage depletion mode transistor including a current path coupled in series with a current path of a low-voltage enhancement mode transistor, a diode including an anode and a cathode, and a die pad. A rear surface of the high-voltage depletion mode transistor is mounted on and electrically coupled to the die pad. A first current electrode of the low-voltage enhancement mode transistor is mounted on and electrically coupled to the die pad. The anode of the diode is coupled to a control electrode of the high-voltage depletion mode transistor, and the cathode of the diode is mounted on the die pad. | 2016-03-24 |
20160086879 | PACKAGE SUBSTRATE AND METHOD OF FABRICATING THE SAME - A package substrate includes a substrate body having a first surface and a second surface opposite to the first surface; a first circuit layer formed on the first surface and having first conductive pads; a first dielectric layer formed on the first surface and the first circuit; a second circuit layer formed on the first dielectric layer and having second conductive pads; a third circuit layer formed on the second surface and having third conductive pads; a second dielectric layer formed on the second surface and the third circuit layer; a fourth circuit layer formed on the second dielectric layer and having fourth conductive pads; through holes penetrating through the first and second surfaces, and the first and second dielectric layers; and conductive vias penetrating through the through holes and electrically connected to the first, second, third and fourth conductive pads. | 2016-03-24 |
20160086880 | COPPER WIRE THROUGH SILICON VIA CONNECTION - A semiconductor device includes a semiconductor substrate having opposing first and second main surfaces, a via (TSV) extending from the first main surface of the substrate to the second main surface of the substrate, first electrical connectors formed near the first main surface and second electrical connectors formed near the second main surface. There are insulated bond wires, each extending through the via and having a first end bonded to a respective one of the first electrical connectors and a second end bonded to a respective one of the second electrical connectors. The via may be filled with an encapsulating material. | 2016-03-24 |
20160086881 | Electronic Component - In an embodiment, an electronic component includes a dielectric core layer having a first major surface, a semiconductor die embedded in the dielectric core layer, and a first conductive layer. The semiconductor die includes a first major surface and at least two conductive fingers arranged on the first major surface which are coupled to a common potential. The first conductive layer is arranged on, and electrically coupled to, the at least two conductive fingers and extends from the at least two conductive fingers over the first major surface of the dielectric core layer. | 2016-03-24 |
20160086882 | SEMICONDUCTOR MEMORY DEVICE - A semiconductor memory device includes a device isolation in a trench that defines first to third active patterns that are spaced apart from each other and having a long axis parallel to a first direction, first and second word lines extending in a second direction perpendicular to the first direction, a bit line, and a source line. The first and second active patterns are arranged in the second direction to constitute a column. The third active pattern is at a side of the column. The first word line intersects the first and second active patterns. The second word line intersects the third active pattern. When viewed from a plan view, the bit line extends in the first direction between the first and third active patterns, and the source line extends in the first direction between the second and third active patterns. | 2016-03-24 |
20160086883 | METHOD FOR MAKING A PHOTOLITHOGRAPHY MASK INTENDED FOR THE FORMATION OF CONTACTS, MASK AND INTEGRATED CIRCUIT CORRESPONDING THERETO - A method for making a photolithography mask for formation of electrically conducting contact pads between tracks of a metallization level and electrically active zones of integrated circuits formed on a semiconductor wafer includes forming a first mask region including first opening zones intended for the formation of the contact pads. The first opening zone has a first degree of opening that is below a threshold. A second mask region including additional opening zones is formed, with the overall degree of opening of the mask being greater than or equal to the threshold. | 2016-03-24 |
20160086884 | MITIGATING ELECTROMIGRATION EFFECTS USING PARALLEL PILLARS - Systems, methods, and other embodiments associated with an integrated circuit that includes a plurality of parallel pillar structures is described. In one embodiment, an integrated circuit includes a series of layers. The series of layers include a plurality of pillar metals in each of the series of layers. Pillars within each of the series of layers are oriented to be parallel. Pillars in adjacent layers are aligned to be perpendicular. Each of the plurality of pillar metals is a rectangular segment of metal. The plurality of pillar metals form a reconvergent mesh grid. The series of layers includes a plurality of vias connecting the plurality of parallel pillar metals between the series of layers. Vias of the plurality of vias are located at intersections in the reconvergent mesh grid. | 2016-03-24 |
20160086885 | PACKAGE SUBSTRATE - A package substrate includes resin insulating interlayers, and four or more conductive layers including dedicated wiring layers such that the dedicated wiring layers are two dedicated wiring layers which transmit data between a first electronic component and a second electronic component connected by the two dedicated wiring layers. | 2016-03-24 |
20160086886 | NANOWIRE COMPATIBLE E-FUSE - An e-fuse is provided in one area of a semiconductor substrate. The E-fuse includes a vertical stack of from, bottom to top, base metal semiconductor alloy portion, a first metal semiconductor alloy portion, a second metal semiconductor portion, a third metal semiconductor alloy portion and a fourth metal semiconductor alloy portion, wherein the first metal semiconductor alloy portion and the third metal semiconductor portion have outer edges that are vertically offset and do not extend beyond vertical edges of the second metal semiconductor alloy portion and the fourth metal semiconductor alloy portion. | 2016-03-24 |
20160086887 | Method of Fine Line Space Resolution Lithography for Integrated Circuit Features Using Double Patterning Technology - A method includes forming a hard mask over a base material, and forming an I-shaped first opening in the hard mask. The first opening includes two parallel portions and a connecting portion interconnecting the two parallel portions. Spacers are formed on sidewalls of the first opening. The spacers fill an entirety of the connecting portion, wherein a center portion of each of the two parallel portions is unfilled by the spacers. The hard mask is etched to remove a portion of the hard mask and to form a second opening, wherein the second opening is between the two parallel portions of the first opening. The second opening is spaced apart from the two parallel portions of the first opening by the spacers. The first opening and the second opening are then extended down into the base material. | 2016-03-24 |
20160086888 | SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME - A semiconductor device includes an active region tilted at an angle with respect to a buried bit line. The buried bit line includes a metal silicide pattern and a metal pattern. The metal silicide pattern has a plurality of metal silicide films each disposed at a lower portion of the active region and corresponding to a bit line contact region. The metal pattern has a plurality of metal films. The metal silicide films and the metal films are alternately arranged and electrically coupled to each other. | 2016-03-24 |
20160086889 | CARBON NANOTUBE INTERCONNECT STRUCTURE, AND METHOD OF MANUFACTURING THE SAME - A carbon nanotube interconnect structure of an embodiment has a first interconnect layer, a first interlayer insulating film on the first interconnect layer, a second interlayer insulating film on the first interlayer insulating film, a contact hole penetrating through the first interlayer insulating film and the second interlayer insulating film, a catalyst metal film on a portion of the first interconnect layer located at a lower end of the contact hole, a second interconnect layer on the second interlayer insulating film, and carbon nanotubes on the catalyst metal film located in the contact hole. The carbon nanotubes electrically connecting the first interconnect layer and the second interconnect layer. | 2016-03-24 |
20160086890 | WIRING AND METHOD FOR MANUFACTURING THE SAME - Wiring comprises a multilayer graphene including graphene sheets, an interlayer substance disposed between layers of the multilayer graphene, and an organic compound layer connected to a side surface of the multilayer graphene. The organic compound layer contains a photoisomerizable organic group connected to the multilayer graphene. | 2016-03-24 |
20160086891 | GRAPHENE WIRING AND METHOD FOR MANUFACTURING THE SAME - Graphene wiring of an embodiment has a graphene intercalation compound including a multilayer graphene having graphene sheets stacked therein and an interlayer substance disposed between layers of the multilayer graphene, and an interlayer cross-linked layer connected to a side surface of the multilayer graphene. The interlayer cross-linked layer has a cross-linked molecular structure including multiple bonded molecules cross-linking the graphene sheets included in the multilayer graphene. | 2016-03-24 |
20160086892 | THIN-FILM TRANSISTOR SUBSTRATE, DISPLAY APPARATUS, METHOD OF MANUFACTURING THIN-FILM TRANSISTOR SUBSTRATE, AND METHOD OF MANUFACTURING DISPLAY APPARATUS - Disclosed is a thin-film transistor substrate including: a substrate; a thin-film transistor formed on the substrate and including an active layer, a gate electrode, a source electrode, and a drain electrode; an identification (ID) mark formed on the substrate; and a metal layer contacting an upper surface of the ID mark. | 2016-03-24 |
20160086893 | SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURING THE SAME - A semiconductor structure and a method for forming the same are provided. The semiconductor structure includes: a substrate comprising a recess portion filled with a conductive material; a conductive trace overlying and contacting the conductive material; a conductive pillar disposed on the conductive trace and over the recess portion of the substrate; and a semiconductor chip disposed on the conductive pillar, wherein the elastic modulus of the substrate is of about 3 to about 10 GPa at about 20 to about 30° C. and of about 1 to about 5 GPa at about 250 to about 270° C. | 2016-03-24 |
20160086894 | CONTROL OF WARPAGE USING ABF GC CAVITY FOR EMBEDDED DIE PACKAGE - Embodiments include semiconductor device packages and methods of forming such packages. In an embodiment, the package may include a die-side reinforcement layer with a cavity formed through the die-side reinforcement layer. A die having a first side and an opposite second side comprising a device side may be positioned in the cavity with the first side of the die being substantially coplanar with a first side of the die-side reinforcement layer. In an embodiment, a build-up structure may be coupled to a second side of the die. Embodiments include a build-up structure that includes a plurality of alternating layers of patterned conductive material and insulating material. | 2016-03-24 |
20160086895 | Method for Manufacturing Semiconductor Device and Semiconductor Device - A method for manufacturing a semiconductor device includes: a fixing step in which semiconductor chips are mounted on and fixed to predetermined positions on an upper surface of a single starting substrate to form individual substrates; a connection step in which electrodes of the semiconductor chips and of the starting substrate are connected by wires; a sealing step in which on the upper surface of the starting substrate, the resin is potted among the semiconductor chips to seal an entire lateral circumference of each of the semiconductor chip; a bonding step in which a single starting protective cover to form individual protective covers is bonded to a surface of the resin so as to extend the semiconductor chips; and a cutting step in which an assembly of the semiconductor devices formed by bonding the starting protective cover to the starting substrate via the resin is cut to the semiconductor devices. | 2016-03-24 |
20160086896 | CHIP PACKAGE AND METHOD FOR FORMING THE SAME - An embodiment of the invention provides a chip package including a semiconductor substrate having a first surface and a second surface opposite thereto. A conducting pad is located on the first surface. A side recess is on at least a first side of the semiconductor substrate, wherein the side recess extends from the first surface toward the second surface and across the entire length of the first side. A conducting layer is located on the first surface and electrically connected to the conducting pad, wherein the conducting layer extends to the side recess. | 2016-03-24 |
20160086897 | Electronic Component - In an embodiment, a semiconductor device includes a lateral transistor device having an upper metallization layer. The upper metallization layer includes n elongated pad regions. Adjacent ones of the n elongated pad regions are coupled to different current electrodes of the lateral transistor device. The n elongated pad regions bound n-1 active regions of the lateral transistor where n≧3. | 2016-03-24 |
20160086898 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME - A semiconductor package includes a wiring substrate including a plurality of solder pads; a chip including a plurality of chip pads connected to the solder pads through a plurality of solders; a sealing layer configured to seal the chip and the solders, at least one void being between the solders; and a solder extrusion prevention layer on one sidewall of the solder exposed by the at least one void. | 2016-03-24 |
20160086899 | ROOM TEMPERATURE METAL DIRECT BONDING - A bonded device structure including a first substrate having a first set of metallic bonding pads, preferably connected to a device or circuit, and having a first non-metallic region adjacent to the metallic bonding pads on the first substrate, a second substrate having a second set of metallic bonding pads aligned with the first set of metallic bonding pads, preferably connected to a device or circuit, and having a second non-metallic region adjacent to the metallic bonding pads on the second substrate, and a contact-bonded interface between the first and second set of metallic bonding pads formed by contact bonding of the first non-metallic region to the second non-metallic region. At least one of the first and second substrates may be elastically deformed. | 2016-03-24 |
20160086900 | Semiconductor Devices and Methods of Manufacture Thereof - Semiconductor devices and methods of manufacture thereof are disclosed. In some embodiments, a semiconductor device includes a substrate, and a plurality of contact pads disposed over the substrate. The contact pads may be arranged in a ball grid array (BGA), and the may include a plurality of corners. A metal dam is disposed around each of the plurality of corners, such as corners of the BGA. | 2016-03-24 |
20160086901 | Bump-on-Trace Structures with High Assembly Yield - A package includes first package component, which further includes a first metal trace at a surface of the first package component, with the first metal trace having a trace width measured in a direction perpendicular to a lengthwise direction of the first metal trace. The first package component further includes a second metal trace at the surface of the first package component. The first metal trace and the second metal trace are parallel to each other. A second package component is overlying the first package component, wherein the second package component includes a metal bump. A solder region bonds the metal bump to the first metal trace, wherein the solder region contacts a top surface and sidewalls of the first portion of the first metal trace. A ratio of a volume of the solder region to the trace width is between about 1,100 μm | 2016-03-24 |
20160086902 | SEMICONDUCTOR PACKAGE STRUCTURE AND MANUFACTURING METHOD THEREOF - A semiconductor package structure includes a semiconductor substrate including a plurality of through substrate vias (TSV) extending from a first surface to a second surface of the semiconductor substrate, wherein the second surface is opposite to the first surface; a plurality of conductive bumps on the second surface and connected to a corresponding TSV; a polymeric layer on the second surface and surrounding a lower portion of a corresponding conductive bump. The polymeric layer includes a first portion configured as a blanket covering a periphery region of the semiconductor substrate; and a second portion in a core region of the semiconductor substrate and configured as a plurality of isolated belts, wherein each of the isolated belts surrounds a corresponding conductive bump. | 2016-03-24 |
20160086903 | SEMICONDUCTOR STRUCTURE AND METHOD OF FABRICATING THE SAME - The present invention provides a semiconductor structure and a method of fabricating the same. The semiconductor structure includes a carrier, a semiconductor chip and an encapsulant. The semiconductor chip is disposed on the carrier, and has opposing non-active and active surfaces. The non-active surface is coupled to the carrier, and the active surface has a plurality of metallic pillars formed thereon. A under bump metallogy layer is formed between the metallic pillars and the active surface and on side surfaces of the metal pillars. The surface of the encapsulant is flush with end surfaces of the metallic pillars. Therefore, the product yield is increased significantly. | 2016-03-24 |
20160086904 | Method and a System for Producing a Semi-Conductor Module - In a method for producing a semi-conductor module ( | 2016-03-24 |
20160086905 | SHAPED AND ORIENTED SOLDER JOINTS - The present description relates to the field of fabricating microelectronic assemblies, wherein a microelectronic device may be attached to a microelectronic substrate with a plurality of shaped and oriented solder joints. The shaped and oriented solder joints may be substantially oval, wherein the major axis of the substantially oval solder joints may be substantially oriented toward a neutral point or center of the microelectronic device. Embodiments of the shaped and oriented solder joint may reduce the potential of solder joint failure due to stresses, such as from thermal expansion stresses between the microelectronic device and the microelectronic substrate. | 2016-03-24 |
20160086906 | Chip Bonding Method and Driving Chip of Display - A chip bonding method for bonding a chip on a display panel is provided. The chip includes a joint face, a rear face, input bumps and output bumps. The joint face having a first symmetry axis line is opposite to the rear face. The input bumps and the output bumps are respectively located on two sides of the symmetry axis line and disposed on the joint face. | 2016-03-24 |
20160086907 | Chip Mounting - A device comprising a chip including a substrate defining one or more electronic devices and a printed circuit board electrically connected to the chip via one or more solder elements sandwiched between the chip and the printed circuit board, and the solder elements, and buffer layers having a Young's Modulus of 2.5 GPa or less. | 2016-03-24 |
20160086908 | ADHESIVE AGENT COMPOSITION, ADHESIVE SHEET, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - An adhesive composition includes an acrylic polymer (A), a heat curable resin (B) having a reactive double bond group, and a filler (C) having a reactive double bond group on a surface thereof. The acrylic polymer (A) has a weight average molecular weight of 500,000 or more, and the heat curable resin (B) comprises an epoxy resin and a heat curing agent, in which at least one of the epoxy resin and the heat curing agent has the reactive double bond group. | 2016-03-24 |
20160086909 | METHODS AND APPARATUSES FOR SHAPING AND LOOPING BONDING WIRES THAT SERVE AS STRETCHABLE AND BENDABLE INTERCONNECTS - A capillary tool for use in feeding, bending, and attaching a bonding wire between a pair of bond pads includes a body and a heating element. The body has an internal tube that extends from a first surface of the capillary tool to a second surface of the capillary tool. In some implementations, the internal tube has a portion with a generally helical shape that includes at least a portion of one complete revolution about a central axis of the body. The heating element is coupled to the body to provide a heat affected zone along a portion of the internal tube that heats the bonding wire as the bonding wire is fed through the internal tube. | 2016-03-24 |
20160086910 | PACKAGED MICROELECTRONIC DEVICES AND METHODS FOR MANUFACTURING PACKAGED MICROELECTRONIC DEVICES - Microelectronic devices and method of forming a plurality of microelectronic devices on a semiconductor workpiece are disclosed herein. One such method includes placing a plurality of first interconnect elements on a side of a semiconductor workpiece, forming a layer on the side of the workpiece, reshaping the first interconnect elements by heating the first interconnect elements, and coupling a first portion of a plurality of individual second interconnect elements to corresponding first interconnect elements with a second portion of the individual second interconnect elements exposed. | 2016-03-24 |
20160086911 | SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME - A technique which improves the reliability in coupling between a bump electrode of a semiconductor chip and wiring of a mounting substrate, more particularly a technique which guarantees the flatness of a bump electrode even when wiring lies in a top wiring layer under the bump electrode, thereby improving the reliability in coupling between the bump electrode and the wiring formed on a glass substrate. Wiring, comprised of a power line or signal line, and a dummy pattern are formed in a top wiring layer beneath a non-overlap region of a bump electrode. The dummy pattern is located to fill the space between wirings to reduce irregularities caused by the wirings and space in the top wiring layer. A surface protection film formed to cover the top wiring layer is flattened by CMP. | 2016-03-24 |
20160086912 | METHODS FOR SEMICONDUCTOR PACKAGE - A method for manufacturing a semiconductor package includes providing a first semiconductor chip having a first surface and a second surface opposing each other, the first semiconductor chip including through-electrodes extending between the first surface and the second surface, forming an adhesive layer on the first surface, providing the first semiconductor chip on a package substrate so that the adhesive layer contacts the package substrate, thermo-compressing the first semiconductor chip so that the adhesive layer protrudes from between the first semiconductor chip and the package substrate towards the outside of the first semiconductor chip to form a support part that covers sides of the first semiconductor chip, and providing a second semiconductor chip on the first semiconductor chip, the second semiconductor chip having a third surface and a fourth surface opposing each other, the second semiconductor chip including connection terminals formed on the third surface. | 2016-03-24 |
20160086913 | METHOD FOR LOW TEMPERATURE BONDING AND BONDED STRUCTURE - A method for bonding at low or room temperature includes steps of surface cleaning and activation by cleaning or etching. The method may also include removing by-products of interface polymerization to prevent a reverse polymerization reaction to allow room temperature chemical bonding of materials such as silicon, silicon nitride and SiO | 2016-03-24 |
20160086914 | METAL TO METAL BONDING FOR STACKED (3D) INTEGRATED CIRCUITS - The present invention provides a stabilized fine textured metal microstructure that constitutes a durable activated surface usable for bonding a 3D stacked chip. A fine-grain layer that resists self anneal enables metal to metal bonding at moderate time and temperature and wider process flexibility. | 2016-03-24 |
20160086915 | METAL TO METAL BONDING FOR STACKED (3D) INTEGRATED CIRCUITS - The present invention provides a stabilized fine textured metal microstructure that constitutes a durable activated surface usable for bonding a 3D stacked chip. A fine-grain layer that resists self anneal enables metal to metal bonding at moderate time and temperature and wider process flexibility. | 2016-03-24 |
20160086916 | METAL TO METAL BONDING FOR STACKED (3D) INTEGRATED CIRCUITS - The present invention provides a stabilized fine textured metal microstructure that constitutes a durable activated surface usable for bonding a 3D stacked chip. A fine-grain layer that resists self anneal enables metal to metal bonding at moderate time and temperature and wider process flexibility. | 2016-03-24 |
20160086917 | Multi-Stacked Structures of Semiconductor Packages - A multi-stacked structure of semiconductor packages includes a plurality of substrates stacked in a vertical direction, semiconductor packages mounted on each substrate of the plurality of the substrates, a heat release column extending commonly through the plurality of the substrates and overlapping at least one semiconductor package serving as a heat generation source among the semiconductor packages in the vertical direction, and a heat dissipation part thermally connected to one end of the heat release column. | 2016-03-24 |
20160086918 | NOVEL THREE DIMENSIONAL INTEGRATED CIRCUITS STACKING APPROACH - A semiconductor package and a method of forming a semiconductor package with one or more dies over an interposer are provided. In some embodiments, the method is performed by placing an interposer with one or more through-substrate-vias (TSVs) on a first adhesive layer overlying a first carrier substrate. Connection structures are arranged along a first surface of the interposer facing the first adhesive layer. A first molding compound is formed over the first adhesive layer and surrounding the interposer. The first molding compound is arranged to expose the TSVs along a second surface of the interposer. A first redistribution structure is formed over the second surface of the interposer and the first molding compound, and conductive bump structures are formed over the first redistribution structure. A first packaged die is bonded to the conductive bump structures. | 2016-03-24 |
20160086919 | MULTI-CHIP PACKAGE - A multi-chip package includes first and second semiconductor chips that are sequentially stacked, each of the first and second semiconductor chips including an operation block for an internal operation, third and fourth semiconductor chips that are sequentially stacked over the second semiconductor chip and rotated 180 degrees in a horizontal direction with respect to the first and second semiconductor chips, each of the third and fourth semiconductor chips including an operation block, and through chip vias for transmitting predetermined signals between the operation blocks of the first to fourth semiconductor chips. | 2016-03-24 |
20160086920 | SEMICONDUCTOR DEVICES AND SEMICONDUCTOR SYSTEMS INCLUDING THE SAME - A semiconductor device may include a first input/output (I/O) unit and a second I/O unit. The first I/O unit may include a first input path that receives a signal through a first pad and a first output path and a first I/O controller that output a signal to the first pad. The second I/O unit may include a second input path that receives a signal through a second pad and a second output path and a second I/O controller that output a signal to the second pad. | 2016-03-24 |
20160086921 | SEMICONDUCTOR PACKAGE HAVING CASCADED CHIP STACK - A semiconductor package that includes a package substrate, a lower semiconductor chip mounted on the package substrate, and an upper semiconductor chip stacked on the lower semiconductor chip in a cascade shape is provided. An active surface of the lower semiconductor chip is facing an active surface of the upper semiconductor chip. | 2016-03-24 |
20160086922 | STACKABLE MOLDED MICROELECTRONIC PACKAGES WITH AREA ARRAY UNIT CONNECTORS - A microelectronic package having a substrate, a microelectronic element, e.g., a chip, and terminals can have conductive elements electrically connected with element contacts of the chip and contacts of the substrate. Conductive elements can be electrically insulated from one another for simultaneously carrying different electric potentials. An encapsulant can overlie the first surface of the substrate and at least a portion of a face of the microelectronic element remote from the substrate, and may have a major surface above the microelectronic element. A plurality of package contacts can overlie a face of the microelectronic element remote from the substrate. The package contacts, e.g., conductive masses, substantially rigid posts, can be electrically interconnected with terminals of the substrate, such as through the conductive elements. The package contacts can have top surfaces at least partially exposed at the major surface of the encapsulant. | 2016-03-24 |
20160086923 | Stacked Semiconductor Device Assembly - The semiconductor device system includes multiple stacked substantially identical semiconductor devices each including a first side and an opposing second side. First and second pads are disposed at the first side of the semiconductor device, while third and fourth pads are disposed at the second side of the semiconductor device. First interface circuit is electrically coupled to the first pad and the third pad, while second interface circuit is electrically coupled to the second pad and the fourth pad. The second interface circuit is separate and distinct from the first interface circuit. At least one first semiconductor device of the multiple semiconductor devices is offset from other of the multiple semiconductor devices such that the fourth pad on the first semiconductor device is aligned with, and electrically connected to, the first pad on an adjacent one of the multiple semiconductor devices. In some embodiments, the first pad is associated with a first capacitance, while the second pad is associated with a second capacitance that is smaller than the first capacitance. | 2016-03-24 |
20160086924 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR PACKAGE - Embodiments of the inventive concept include a semiconductor package having a plurality of stacked semiconductor chips. A multi-layered substrate includes a central insulation layer, an upper wiring layer disposed on an upper surface of the central insulation layer, and a first lower wiring layer disposed on a lower surface of the central insulation layer. The stacked semiconductor chips are connected to the multi-layered substrate and/or each other using various means. The semiconductor package is capable of high performance operation, like a semiconductor package based on flip-ship bonding, and also meets the need for large capacity by overcoming a limitation caused by a single semiconductor chip. Embodiments of the inventive concept also include methods of manufacturing the semiconductor package. | 2016-03-24 |
20160086925 | METAL TO METAL BONDING FOR STACKED (3D) INTEGRATED CIRCUITS - The present invention provides a stabilized fine textured metal microstructure that constitutes a durable activated surface usable for bonding a 3D stacked chip. A fine-grain layer that resists self anneal enables metal to metal bonding at moderate time and temperature and wider process flexibility. | 2016-03-24 |
20160086926 | PASS-THROUGH INTERCONNECT STRUCTURE FOR MICROELECTRONIC DIES AND ASSOCIATED SYSTEMS AND METHODS - Pass-through interconnect structures for microelectronic dies and associated systems and methods are disclosed herein. In one embodiment, a microelectronic die assembly includes a support substrate, a first microelectronic die positioned at least partially over the support substrate, and a second microelectronic die positioned at least partially over the first die. The first die includes a semiconductor substrate, a conductive trace extending over a portion of the semiconductor substrate, a substrate pad between the trace and the portion of the semiconductor substrate, and a through-silicon via (TSV) extending through the trace, the substrate pad, and the portion of the semiconductor substrate. The second die is electrically coupled to the support substrate via a conductive path that includes the TSV. | 2016-03-24 |
20160086927 | LIGHT EMITTING DEVICE - A light emitting device includes a base, a first light emitting element, a second light emitting element, and a sealing member. The first light emitting element has an active layer of a nitride semiconductor and has a first emission peak wavelength in a blue region. The second light emitting element has an active layer of a nitride semiconductor and has a second emission peak wavelength longer than the first emission peak wavelength of the first light emitting element. The sealing member includes a first region and a second region. The first region contains a phosphor to be excited by light from the first light emitting element. The first region is provided on an element mounting surface. A first upper surface of the first light emitting element is located in the first region. The second region does not substantially contain the phosphor and is provided on the first region. | 2016-03-24 |
20160086928 | LIGHT-EMITTING DEVICE HAVING A PLURALITY OF CONCENTRIC LIGHT TRANSMITTING AREAS - The light-emitting device of the present invention includes LED chips provided on a ceramic substrate and a sealing material in which the LED chips are embedded. The sealing material contains a fluorescent substance and divided into a first fluorescent-substance-containing resin layer and a second fluorescent-substance-containing resin layer by a first resin ring and a second resin ring. | 2016-03-24 |
20160086929 | LIGHT EMITTING UNIT - A method for manufacturing a light emitting unit is provided. A semiconductor structure including a plurality of light emitting dice separated from each other is provided. A molding compound is formed to encapsulate the light emitting dice. Each of the light emitting dice includes a light emitting element, a first electrode and a second electrode. A patterned metal layer is formed on the first electrodes and the second electrodes of the light emitting dice. A substrate is provided, where the molding compound is located between the substrate and the light emitting elements of the light emitting dice. A cutting process is performed to cut the semiconductor structure, the patterned metal layer, the molding compound and the substrate so as to define a light emitting unit with a series connection loop, a parallel connection loop or a series-parallel connection loop. | 2016-03-24 |
20160086930 | FAN-OUT WAFER LEVEL PACKAGE CONTAINING BACK-TO-BACK EMBEDDED MICROELECTRONIC COMPONENTS AND ASSEMBLY METHOD THEREFOR - Fan-Out Wafer Level Packages (FO-WLPs) include double-sided molded package bodies in which first and second layers of components are embedded in a back-to-back relationship. In one embodiment, the FO-WLP fabrication method includes positioning a first microelectronic component carried by a first temporary substrate in a back-to-back relationship with a second microelectronic component carried by a second temporary substrate. The first and second components are overmolded while positioned in the back-to-back relationship to produce a double-sided molded package body. The first temporary substrate is then removed to expose a first principal surface of the package body at which the first component is exposed, and the second temporary substrate is likewise removed to expose a second, opposing principal surface of the package body at which the second component is exposed. | 2016-03-24 |
20160086931 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR PACKAGE - Embodiments of the inventive concept include a semiconductor package having a plurality of stacked semiconductor chips. A multi-layered substrate includes a central insulation layer, an upper wiring layer disposed on an upper surface of the central insulation layer, and a first lower wiring layer disposed on a lower surface of the central insulation layer. The stacked semiconductor chips are connected to the multi-layered substrate and/or each other using various means. The semiconductor package is capable of high performance operation, like a semiconductor package based on flip-ship bonding, and also meets the need for large capacity by overcoming a limitation caused by a single semiconductor chip. Embodiments of the inventive concept also include methods of manufacturing the semiconductor package. | 2016-03-24 |
20160086932 | INTEGRATED CIRCUIT LAYOUT STRUCTURE - An integrated circuit layout structure having dual-height standard cells includes at least a first standard cell including a first cell height and at least a second standard cell including a second cell height. The second cell height is one half of the first cell height. The first standard cell includes at least one or more first doped region formed in a middle of the first standard cell and a plurality of second doped regions formed at a top side and a bottom side of the first standard cell. The first doped region includes a first conductivity type and the second doped regions include a second conductivity type complementary to the first conductivity type. | 2016-03-24 |
20160086933 | ELECTROSTATIC DISCHARGE PROTECTOR - The present invention provides electrostatic discharge protectors. One aspect of the present invention provides an electrostatic discharge protector includes a substrate, an electrostatic discharge protection circuit disposed on the substrate, and a pickup ring surrounding the electrostatic discharge protection circuit. The pickup ring has a plurality of low resistance zones where a doping layer, a contact and a metal layer are connected in sequence, and the low resistance zones are distributed within the pickup ring separately and unequally. | 2016-03-24 |
20160086934 | LIL ENHANCED ESD-PNP IN A BCD - Disclosed is a PNP ESD integrated circuit, including a substrate, an active region formed within the substrate, the active region including at least one base region of a second conductivity type, a plurality of collector regions of a first conductivity type formed within the active region, a plurality of emitter regions of the first conductivity type formed within the active region, and a local interconnect layer (LIL) contacting the plurality of emitter regions and the plurality of collector regions, the LIL including cooling fin contacts formed on the collector regions to enhance the current handling capacity of the collector regions. | 2016-03-24 |
20160086935 | SEMICONDUCTOR DEVICE - According to one embodiment, a semiconductor device includes a first IO cell and a second IO cell arranged on a periphery of the core circuit. Each of the first IO cell and the second IO cell comprises: a power supply terminal to which a power supply voltage is applied; a ground terminal connected to ground; an RC delay circuit including a resistor having one terminal connected to one of the power supply terminal and the ground terminal and a capacitor having one terminal connected to the other terminal of the resistor and the other terminal connected to the other of the power supply terminal and the ground terminal; a P-type transistor; and an N-type transistor. | 2016-03-24 |
20160086936 | MUTUAL BALLASTING MULTI-FINGER BIDIRECTIONAL ESD DEVICE - An integrated circuit includes a bidirectional ESD device which has a plurality of parallel switch legs. Each switch leg includes a first current switch and a second current switch in a back-to-back configuration. A first current supply node of each first current switch is coupled to a first terminal of the ESD device. A second current supply node of each second current switch is coupled to a second terminal of the ESD device. A first current collection node of each first current switch is coupled to a second current collection node of the corresponding second current switch. The first current collection nodes in each first current switch is not coupled to any other first current collection node, and similarly, the second current collection node in each instance second current switch is not coupled to any other second current collection node. | 2016-03-24 |
20160086937 | Integrated Switch Devices - Various aspects of the technology include an integrated circuit device comprising a compound semiconductor layer and a plurality of input, switch, and ground ohmic metal fingers fabricated on the compound semiconductor layer in a repeating sequence. A control gate may be disposed between each input finger and adjacent switch finger, and a sync gate may be disposed between each ground finger and adjacent switch finger. A sync gate and a control gate may be disposed adjacent each switch finger. The device further includes a plurality of control gate pads, each control gate pad at an end of two control gates, and a control gate pad at opposite ends of each control gate, and a plurality of sync gate pads, each sync gate pad at an end of two sync gates, and a sync gate pad at opposite ends of each sync gate. | 2016-03-24 |
20160086938 | GaN STRUCTURES - A semiconductor device is disclosed. The device includes a substrate including GaN, a two dimensional electron gas (2DEG) inducing layer on the substrate, and a lateral transistor on the 2DEG inducing layer. The lateral transistor includes source and drain contacts to the 2DEG inducing layer, a gate stack between the source and drain contacts, and a field plate between the gate and the drain contact. The device also includes one or more insulation layers on the 2DEG inducing layer, where the field plate is spaced apart from the 2DEG inducing layer by the insulation layers, and a conductor on the insulation layers, where a first portion of the conductor is spaced apart from the 2DEG inducing layer by the insulation layers by a distance less than 200 nm. | 2016-03-24 |
20160086939 | SEMICONDUCTOR DEVICE - A first contact, a second impurity region, and a second low-concentration impurity region form a Schottky barrier diode. The second impurity region has the same impurity concentration as those of first impurity regions, and thus can be formed in the same process as forming the first impurity regions. In addition, the second low-concentration impurity region has the same impurity concentration as those of first low-concentration impurity regions, and thus can be formed in the same process as forming the first low-concentration impurity regions. | 2016-03-24 |
20160086940 | STACK MOM CAPACITOR STRUCTURE FOR CIS - A semiconductor device includes a semiconductor substrate, an interlayer dielectric layer on the semiconductor substrate, a capacitor on the interlayer dielectric layer, and a PN-junction diode in the semiconductor substrate and below the capacitor. The PN-junction diode includes a p-type ion implanted region and an n-well located below the p-type ion implanted region and completely surrounding the p-type ion implanted region. The PN-junction diode in the semiconductor substrate may prevent noise from entering the capacitor to improve the noise immunity of the semiconductor device. | 2016-03-24 |
20160086941 | SEMICONDUCTOR DEVICE - A semiconductor device includes: an FET structure that is formed next to a looped trench on a semiconductor substrate and that has an n | 2016-03-24 |
20160086942 | SINGLE DIE OUTPUT POWER STAGE USING TRENCH-GATE LOW-SIDE AND LDMOS HIGH-SIDE MOSFETS, STRUCTURE AND METHOD - A voltage converter includes an output circuit having a high-side device and a low-side device which can be formed on a single die (a “PowerDie”). The high-side device can include a lateral diffused metal oxide semiconductor (LDMOS) while the low-side device can include a trench-gate vertical diffused metal oxide semiconductor (VDMOS). The voltage converter can further include a controller circuit on a different die which can be electrically coupled to, and co-packaged with the output circuit. | 2016-03-24 |
20160086943 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A semiconductor device includes a substrate, an isolation layer on the substrate, and at least one active fin on the substrate. The isolation layer includes a first surface opposite a second surface. The first surface is contiguous with the substrate. The at least one active fin protrudes from the substrate and includes a first region having a side wall above the second surface of the isolation layer and a second region on the first region. The second region has an upper surface. The first region has a first width contiguous with the second surface of the isolation layer and a second width contiguous with the second region. The second width is 60% or greater than the first width (e.g., 60% to 100%). | 2016-03-24 |
20160086944 | REPLACEMENT METAL GATE - A semiconductor structure which includes: a fin on a semiconductor substrate; and a gate structure wrapped around the fin. The gate structure includes: spaced apart spacers to form an opening, the spacers being perpendicular to the fin, the spacers having a height with respect to the fin; a high-k dielectric material in the opening and over the fin, the high-k dielectric material in contact with the spacers and a bottom of the opening; a work function metal in contact with the high-k dielectric material that is over the fin, the spacers and the bottom of the opening, the work function metal that is in contact with the high-k dielectric material having a height in the opening that is less than the height of the spacers, the high-k dielectric material and the work function metal only partially filling the opening; and a metal completely filling the opening. | 2016-03-24 |
20160086945 | SEMICONDUCTOR DEVICE STRUCTURE WITH GATE SPACER HAVING PROTRUDING BOTTOM PORTION AND METHOD FOR FORMING THE SAME - A semiconductor device structure and method for forming the same are provided. The semiconductor device structure includes a substrate and a gate stack structure formed on the substrate. The semiconductor device structure also includes gate spacers formed on the sidewall of the gate stack structure, and the gate spacers include a top portion and a bottom portion adjoined to the top portion, and the bottom portion slopes to a top surface of the substrate. The semiconductor device structure further includes an epitaxial structure formed adjacent to the gate spacers, and the epitaxial structure is formed below the gate spacers. | 2016-03-24 |
20160086946 | CMOS DEVICE AND METHOD FOR MANUFACTURING THE SAME - An CMOS device comprises a plurality of NMOS transistors and a plurality of PMOS transistors, each of which comprises a gate stack constituted of a gate insulating layer and a gate metal layer on a substrate, a source/drain region in the substrate on both sides of the gate stack and a channel region below the gate stack, wherein the gate metal layer of each NMOS transistor comprising a first barrier layer, an NMOS work function adjusting layer, a second barrier layer, and a filling layer, and wherein the gate metal layer of each PMOS transistor comprising a first barrier layer, a PMOS work function adjusting layer, an NMOS work function adjusting layer, a second barrier layer, and a filling layer, and wherein the first barrier layer in the gate metal layer of the NMOS transistor and the first barrier layer in the gate metal layer of the PMOS transistor contain a doping ion to finely adjust the work function. The semiconductor device and the method for manufacturing the same according to the present disclosure utilize the sacrificial layer to diffuse impurity to the barrier layer so that the adjusting accuracy of the threshold voltage may be effectively improved, thereby facilitating in improving the whole performance of the device. | 2016-03-24 |
20160086947 | SEMICONDUCTOR DEVICES AND METHODS FOR MANUFACTURING THE SAME - According to example embodiments, a semiconductor device and a method for manufacturing the same are provided, the semiconductor device includes a substrate including a PMOSFET region and an NMOSFET region, a first gate electrode and a second gate electrode on the PMOSFET region, a third gate electrode and a fourth gate electrode on the NMOSFET region, and a first contact and a second contact connected to the first gate electrode and the fourth gate electrode, respectively. The first to fourth gate cut electrodes define a gate cut region that passes between the first and third gate electrodes and between the second and fourth gate electrodes. A portion of each of the first and second contacts overlaps with the gate cut region when viewed from a plan view. | 2016-03-24 |
20160086948 | HVMOS Reliability Evaluation using Bulk Resistances as Indices - A method of determining the reliability of a high-voltage PMOS (HVPMOS) device includes determining a bulk resistance of the HVPMOS device, and evaluating the reliability of the HVPMOS device based on the bulk resistance. | 2016-03-24 |
20160086949 | Dummy Metal Gate Structures to Reduce Dishing During Chemical-Mechanical Polishing - The described embodiments of mechanisms for placing dummy gate structures next to and/or near a number of wide gate structures reduce dishing effect for gate structures during chemical-mechanical polishing of gate layers. The arrangements of dummy gate structures and the ranges of metal pattern density have been described. Wide gate structures, such as analog devices, can greatly benefit from the reduction of dishing effect. | 2016-03-24 |
20160086950 | SEMICONDUCTOR DEVICE HAVING CONTACT PLUG AND METHOD OF FORMING THE SAME - A semiconductor device includes an N-type fin and a P-type fin on a substrate, a first gate electrode configured to cross the N-type fin and cover a side surface of the N-type fin, a second gate electrode configured to cross the P-type fin and cover a side surface of the P-type fin, a first source/drain on the N-type fin adjacent to the first gate electrode, a second source/drain on the P-type fin adjacent to the second gate electrode, a buffer layer on a surface of the second source/drain and including a material different from the second source/drain, an interlayer insulating layer on the buffer layer and the first source/drain, a first plug connected to the first source/drain and passing through the interlayer insulating layer, and a second plug connected to the second source/drain and passing through the interlayer insulating layer and the buffer layer. | 2016-03-24 |
20160086951 | CMOS NANOWIRE STRUCTURE - Complimentary metal-oxide-semiconductor nanowire structures are described. For example, a semiconductor structure includes a first semiconductor device. The first semiconductor device includes a first nanowire disposed above a substrate. The first nanowire has a mid-point a first distance above the substrate and includes a discrete channel region and source and drain regions on either side of the discrete channel region. A first gate electrode stack completely surrounds the discrete channel region of the first nanowire. The semiconductor structure also includes a second semiconductor device. The second semiconductor device includes a second nanowire disposed above the substrate. The second nanowire has a mid-point a second distance above the substrate and includes a discrete channel region and source and drain regions on either side of the discrete channel region. The first distance is different from the second distance. A second gate electrode stack completely surrounds the discrete channel region of the second nanowire. | 2016-03-24 |
20160086952 | PREVENTING EPI DAMAGE FOR CAP NITRIDE STRIP SCHEME IN A FIN-SHAPED FIELD EFFECT TRANSISTOR (FINFET) DEVICE - Approaches for forming an oxide cap to protect a semiconductor device (e.g., a fin field effect transistor device (FinFET)) are provided. Specifically, approaches are provided for forming an oxide cap over a subset (e.g., SiP regions) of raised source drain (RSD) structures on the set of fins of the FinFET device to mitigate damage during subsequent processing. The oxide spacer is deposited before the removal of a nitride capping layer from the FinFET device (e.g., by a hot phosphorus wash). The oxide cap on top of the RSD structures will be preserved throughout the removal of the nitride capping layer to provide hardmask protection during this process. | 2016-03-24 |
20160086953 | METHOD FOR FABRICATING MEMORY DEVICE - Provided is a method for fabricating a memory device including forming a stack layer on a substrate, and embedding a plurality of gate pillar structures and a plurality of dielectric pillars in the stack layer. The plurality of gate pillar structures and the plurality of dielectric pillars extend along a same direction and are alternately arranged, so that the stack layer is divided into a plurality of stack structures. | 2016-03-24 |
20160086954 | Memory Device Having Electrically Floating Body Transistor - A semiconductor memory cell includes a floating body region configured to be charged to a level indicative of a state of the memory cell selected from at least first and second states. A first region of the memory cell is in electrical contact with the floating body region. A second region of the memory cell is spaced apart from the first region and is also in electrical contact with the floating body region. A gate is positioned between the first and second regions. A back-bias region is configured to generate impact ionization when the memory cell is in one of the first and second states, and the back-bias region is configured so as not to generate impact ionization when the memory cell is in the other of the first and second states. | 2016-03-24 |
20160086955 | Semiconductor Device Having a Memory Cell and Method of Forming the Same - There is provided an apparatus includes a substrate having a main surface, a wordline buried in the substrate and a bitline buried in a shallower area than the wordline in the substrate. | 2016-03-24 |
20160086956 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - One semiconductor device has a groove formed on one surface of a semiconductor substrate, a gate electrode formed on the lower part of the groove with a gate insulation film interposed there between, a side wall insulation film made of a nitride film formed on the inner wall of the groove above the gate electrode, and an embedded insulation film formed in the groove enclosed by the side wall insulation film above the gate electrode. The side wall insulation film is shaped so that the width increases closer the bottom part of the groove. | 2016-03-24 |
20160086957 | SEMICONDUCTOR DEVICE WITH BURIED BIT LINE AND METHOD FOR FABRICATING THE SAME - A method for fabricating a semiconductor device includes etching semiconductor substrate to form bulb-type trenches that define a plurality of active regions in the semiconductor substrate; forming a supporter in each of the bulb-type trenches; dividing each active region, of the plurality of active regions, into a pair of body lines by forming a trench through each active region; and forming a bit line in each body line of the pair of body lines. | 2016-03-24 |
20160086958 | SEMICONDUCTOR DEVICE, ELECTRONIC COMPONENT, AND ELECTRONIC DEVICE - A semiconductor device has a function of storing data and includes an output terminal, a first terminal, a second terminal, a first circuit, and second circuits. The first circuit has a function of keeping the potential of the output terminal to be a high-level or low-level potential. The second circuits each include a first pass transistor and a second pass transistor which are electrically connected in series, a first memory circuit, and a second memory circuit. The first and second memory circuits each have a function of making a potential retention node in an electrically floating state. The potential retention nodes of the first and second memory circuits are electrically connected to gates of the first and second pass transistors, respectively. A transistor including an oxide semiconductor layer may be provided in the first and second memory circuits. | 2016-03-24 |
20160086959 | STRUCTURE AND METHOD FOR MANUFACTURE OF MEMORY DEVICE WITH THIN SILICON BODY - Described herein is a structure and method of manufacturing for a memory device with a thin silicon body. The memory device may be a semiconductor comprising: a first dielectric of a first width; a second dielectric of a second width, the second width less than the first width; and a thin film polycrystalline silicon (poly-Si) on sidewalls of the second dielectric. | 2016-03-24 |
20160086960 | Low-Temperature Passivation of Ferroelectric Integrated Circuits for Enhanced Polarization Performance - Curing of a passivation layer applied to the surface of a ferroelectric integrated circuit so as to enhance the polarization characteristics of the ferroelectric structures. A passivation layer, such as a polyimide, is applied to the surface of the ferroelectric integrated circuit after fabrication of the active devices. The passivation layer is cured by exposure to a high temperature, below the Curie temperature of the ferroelectric material, for a short duration such as on the order of ten minutes. Variable frequency microwave energy may be used to effect such curing. The cured passivation layer attains a tensile stress state, and as a result imparts a compressive stress upon the underlying ferroelectric material. Polarization may be further enhanced by polarizing the ferroelectric material prior to the cure process. | 2016-03-24 |
20160086961 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - An improvement is achieved in the performance of a semiconductor device. Over a first insulating film formed over a main surface of a semiconductor substrate located in a memory formation region and having an internal charge storage portion and over a second insulating film formed over the main surface of the semiconductor substrate located in a main circuit formation region, a conductive film is formed. Then, in the memory formation region, the conductive film and the first insulating film are patterned to form a first gate electrode and a first gate insulating film while, in the main circuit formation region, the conductive film and the second insulating film are left. Then, in the main circuit formation region, the conductive film and the second insulating film are patterned to form a second gate electrode and a second gate insulating film. | 2016-03-24 |
20160086962 | Method Of Making Embedded Memory Device With Silicon-On-Insulator Substrate - A method of forming a semiconductor device starts with a substrate of silicon, a first insulation layer on the silicon, and a silicon layer on the first insulation layer. The silicon layer and the insulation layer are removed just from a second substrate area. A second insulation layer is formed over the silicon layer in the substrate first area and over the silicon in the second substrate area. A first plurality of trenches is formed in the first substrate area that each extends through all the layers and into the silicon. A second plurality of trenches is formed in the second substrate area that each extends through the second insulation layer and into the silicon. An insulation material is formed in the first and second trenches. Logic devices are formed in the first substrate area, and memory cells are formed in the second substrate area. | 2016-03-24 |
20160086963 | PROCESS FOR 3D NAND MEMORY WITH SOCKETED FLOATING GATE CELLS - A 3D NAND memory has vertical NAND strings across multiple memory planes above a substrate, with each memory cell of a NAND string residing in a different memory layer. Word lines in each memory plane each has a series of socket components aligned to embed respective floating gates of a group memory cells. In this way, the word line to floating gate capacitive coupling is enhanced thereby allowing a 4 to 8 times reduction in cell dimension as well as reducing floating-gate perturbations between neighboring cells. In one embodiment, each NAND string has source and drain switches that each employs an elongated polysilicon gate with metal strapping to enhance switching. The memory is fabricated by an open-trench process on a multi-layer slab that creates lateral grottoes for forming the socket components. | 2016-03-24 |
20160086964 | HIGH STACK 3D MEMORY AND METHOD OF MAKING - A method of making a monolithic three dimensional NAND device includes forming a stack of alternating layers of a first material and a second material different from the first material over a substrate, forming a mask layer over the stack and patterning the mask layer to form at least on opening in the mask layer to expose a top layer of the stack. The method also includes forming a metal block in the at least one opening in the mask layer, etching the stack by metal induced localized etch using the metal block in the at least one opening in the mask layer to form at least one opening in the stack and forming at least one layer of the NAND device in the at least one opening. | 2016-03-24 |