01st week of 2019 patent applcation highlights part 63 |
Patent application number | Title | Published |
20190006224 | SUBSTRATE PROCESSING METHOD - There is provided a processing method for a package substrate having a plurality of division lines formed on the front side. The processing method includes the steps of holding the back side of the package substrate by using a holding tape and fully cutting the package substrate along the division lines to such a depth corresponding to the middle of the thickness of the holding tape by using a profile grinding tool, thereby dividing the package substrate into individual semiconductor packages. The profile grinding tool has a plurality of projections for cutting the package substrate respectively along the plural division lines. Each projection has an inclined side surface. | 2019-01-03 |
20190006225 | ELECTROSTATIC CHUCK DESIGN FOR COOLING-GAS LIGHT-UP PREVENTION - A wafer support structure for use in a chamber used for semiconductor fabrication of wafers is provided. The wafer support structure includes a dielectric block. A first electrode is embedded in a top half of the dielectric block. The first electrode is configured for connection to a direct current (DC) power source. A second electrode is embedded in a bottom half of the dielectric block. A vertical connection is embedded in the dielectric block for electrically coupling the second electrode to the first electrode. | 2019-01-03 |
20190006226 | TUNGSTEN NITRIDE BARRIER LAYER DEPOSITION - Provided herein are methods of tungsten nitride (WN) deposition. Also provided are stacks for tungsten (W) contacts to silicon germanium (SiGe) layers and methods for forming them. The stacks include SiGe/tungsten silicide (WSi | 2019-01-03 |
20190006227 | HIGH ASPECT RATIO GAP FILL - The present disclosure describes a method of forming a dielectric layer or a dielectric stack on a photoresist layer while minimizing or avoiding damage to the photoresist. In addition, the dielectric layer or dielectric stack can till high-aspect ratio openings and can be removed with etching. The dielectric layer or dielectric stack can be deposited with a conformal, low-temperature chemical vapor deposition process or a conformal, low-temperature atomic layer deposition process that utilizes a number of precursors and plasmas or reactant gases. | 2019-01-03 |
20190006228 | FORMATION AND IN-SITU TREATMENT PROCESSES FOR GAP FILL LAYERS - The present disclosure relates to a semiconductor device and a manufacturing method, and more particularly to a semiconductor device having an enhanced gap fill layer in trenches. The present disclosure provides a novel gap fill layer formed using a multi-step deposition and in-situ treatment process. The deposition process can be a flowable chemical vapor deposition (FCVD) utilizing one or more assist gases and molecules of low reactive sticking coefficient (RSC). The treatment process can be an in-situ process after the deposition process and includes exposing the deposited gap fill layer to plasma activated assist gas. The assist gas can be formed of ammonia. The low RSC molecule can be formed of trisilylamin (TSA) or perhydropolysilazane (PHPS). | 2019-01-03 |
20190006229 | PRODUCTION OF SEMICONDUCTOR REGIONS IN AN ELECTRONIC CHIP - A method can be used for fabricating first and second semiconductor regions separated by isolating trenches. A semiconductor substrate is covered with a first silicon nitride layer. The first region is covered with a protection layer that can be etched selectively with respect to the silicon nitride. The structure is covered with a second silicon nitride layer. The trenches are etched through the second and first silicon nitride layers and filled with a filling silicon oxide to a level situated above the protection layer. The second silicon nitride layer and the part of the first silicon nitride layer situated on the second region are selectively removed and the protection layer is removed. The filling oxide is selectively etched by wet etching, thus resulting in pits on the surface of the filling oxide around the second region. | 2019-01-03 |
20190006230 | INTERCONNECT STRUCTURE WITHOUT BARRIER LAYER ON BOTTOM SURFACE OF VIA - Embodiments and methods of an interconnect structure are provided. The interconnect structure includes a via, a trench that has an overlapping area with a top of the via, and a first layer of conducting material that has an overlapping area with a bottom of the via. The interconnect also includes a second layer of conducting material formed in the via, and a third layer of conducting material formed in the trench. The second layer of conducting material is in contact with the first layer of conducting material without a barrier in between the two conducting materials. The absence of the barrier at the bottom of the via can reduce the contact resistance of the interconnect structure. | 2019-01-03 |
20190006231 | Interconnect Structure and Methods of Forming - An interconnect structure and a method of forming are provided. The method includes forming an opening in a dielectric layer and an etch stop layer, wherein the opening extends only partially through the etch stop layer. The method also includes creating a vacuum environment around the device. After creating the vacuum environment around the device, the method includes etching through the etch stop layer to extend the opening and expose a first conductive feature. The method also includes forming a second conductive feature in the opening. | 2019-01-03 |
20190006232 | METALLIZATION LINES ON INTEGRATED CIRCUIT PRODUCTS - An integrated circuit product includes a first layer of insulating material including a first insulating material. The first layer of insulating material is positioned above a device layer of a semiconductor substrate. The device layer includes transistors. A metallization blocking structure is positioned in an opening in the first layer of insulating material. The metallization blocking structure includes a second insulating material that is different from the first insulating material. A metallization trench is defined in the first layer of insulating material on opposite sides of the metallization blocking structure. A conductive metallization line includes first and second portions positioned in the metallization trench on opposite sides of the metallization blocking structure. The conductive metallization line has a long axis extending along the first and second portions. | 2019-01-03 |
20190006233 | Method of Forming Trenches - A method of forming a semiconductor device includes forming a material layer over a substrate and forming a first trench in the material layer, forming a conformal capping layer along sidewalls of the first trench, forming a second trench in the material layer while the capping layer is disposed along sidewalls of the first trench and forming a conductive feature within the first trench and the second trench. | 2019-01-03 |
20190006234 | INTERCONNECTS WITH HYBRID METALLIZATION - Structures for interconnects and methods for forming interconnects. A dual-damascene opening is formed in a dielectric layer and a first liner is formed on the dielectric layer at one or more sidewalls of the dual-damascene opening. A first conductor layer is formed in a portion of the dual-damascene opening. The first liner is removed from the one or more sidewalls of the dual-damascene opening vertically between the first conductor layer and a top surface of the dielectric layer. After the first liner is removed, a second liner is formed on the dielectric layer at the one or more sidewalls of the dual-damascene opening between the first conductor layer and the top surface of the dielectric layer. A second conductor layer is formed in the dual-damascene opening between the first conductor layer and the top surface of the dielectric layer. The first and second liner materials differ in composition. | 2019-01-03 |
20190006235 | SEMICONDUCTOR DEVICE HAVING A LINER LAYER WITH A CONFIGURED PROFILE AND METHOD OF FABRICATING THEREOF - Devices and methods that include for configuring a profile of a liner layer before filling an opening disposed over a semiconductor substrate. The liner layer has a first thickness at the bottom of the opening and a second thickness a top of the opening, the second thickness being smaller that the first thickness. In an embodiment, the filled opening provides a contact structure. | 2019-01-03 |
20190006236 | Self-Aligned Spacers and Method Forming Same - A method includes forming a bottom source/drain contact plug in a bottom inter-layer dielectric. The bottom source/drain contact plug is electrically coupled to a source/drain region of a transistor. The method further includes forming an inter-layer dielectric overlying the bottom source/drain contact plug. A source/drain contact opening is formed in the inter-layer dielectric, with the bottom source/drain contact plug exposed through the source/drain contact opening. A dielectric spacer layer is formed to have a first portion extending into the source/drain contact opening and a second portion over the inter-layer dielectric. An anisotropic etching is performed on the dielectric spacer layer, and a remaining vertical portion of the dielectric spacer layer forms a source/drain contact spacer. The remaining portion of the source/drain contact opening is filled to form an upper source/drain contact plug. | 2019-01-03 |
20190006237 | PROTECTED CHIP-SCALE PACKAGE (CSP) PAD STRUCTURE - A method for forming an integrated circuit (IC) package is provided. In some embodiments, a semiconductor workpiece comprising a scribe line, a first IC die, a second IC die, and a passivation layer is formed. The scribe line separates the first and second IC dies, and the passivation layer covers the first and second IC dies. The first IC die comprises a circuit and a pad structure electrically coupled to the circuit. The pad structure comprises a first pad, a second pad, and a bridge. The bridge is within the scribe line and connects the first pad to the second pad. The passivation layer is patterned to expose the first pad, but not the second pad, and testing is performed on the circuit through the first pad. The semiconductor workpiece is cut along the scribe line to individualize the first and second IC dies, and to remove the bridge. | 2019-01-03 |
20190006238 | MANUFACTURING PROCESS OF ELEMENT CHIP AND SUBSTRATE HEATING APPARATUS - Provided is a manufacturing process of an element chip, which comprises a preparing step for preparing a substrate containing element regions and dicing regions, a holding step for holding the substrate and a frame with a holding sheet, an applicating step for applying a resin material solution containing a resin constituent and a solvent on the substrate to form a coated layer containing the resin constituent and the solvent thereon, a heating step for heating the substrate held on the holding sheet through a heat shielding member shielding the frame and the holding sheet to substantially remove the solvent from the coated layer, thereby to form a resin layer, a patterning step for patterning the resin layer to expose the substrate in the dicing regions, and a dicing step for dicing the substrate into element chips by plasma-etching the substrate. | 2019-01-03 |
20190006239 | INTEGRATED CIRCUIT PACKAGE HAVING PIN-UP INTERCONNECT - An integrated circuit package and manufacturing method thereof are described. The integrated circuit package includes pin up conductive plating to form an interconnect, where an opening on a patterned fifth layer photo-resist material located at bottom portion of a base developed for etching selectively the base to form at least an internal opening and at least a positioning opening, wherein the internal opening corresponds with an inside area of a first patterned conductive layer, and the positioning opening corresponds with an outside area of the first patterned conductive layer. | 2019-01-03 |
20190006240 | 3D SEMICONDUCTOR DEVICE AND SYSTEM - A 3D semiconductor device, the device including: a first single crystal layer including a plurality of first transistors; at least one first metal layer interconnecting the plurality of first transistors, where the interconnecting includes forming memory peripheral circuits; a plurality of second transistors underlying the first single crystal layer; a second metal layer overlaying the plurality of second transistors; a first memory cell underlying the memory peripheral circuits; a second memory cell underlying the first memory cell, and a non-volatile NAND memory, where the first memory cell includes at least one of the second transistors, where at least one of the second transistors includes a source, channel and drain, where the source, the channel and the drain have the same dopant type, here the non-volatile NAND memory includes the first memory cell, and where at least one of the second transistors includes a polysilicon channel. | 2019-01-03 |
20190006241 | METHOD FOR DIRECT FORMING STRESSOR, SEMICONDUCTOR DEVICE HAVING STRESSOR, AND METHOD FOR FORMING THE SAME - A semiconductor device includes a semiconductor fin protruding from a substrate, a gate electrode over the semiconductor fin, a gate insulating layer between the semiconductor fin and the gate electrode, source and drain regions disposed on opposite sides of the semiconductor fin, a first stressor formed in a region between the source and drain regions. The first stressor is a grading strained stressor including multiple graded portions formed at graded depths. The first stressor is configured to create one of a graded compressive stress or a graded tensile stress. | 2019-01-03 |
20190006242 | METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE - A method for fabricating a semiconductor device includes forming a fin extending along a first direction on a semiconductor substrate and forming a sacrificial gate electrode structure extending along a second direction substantially perpendicular to the first direction over the fin. The sacrificial gate electrode structure comprises a sacrificial gate dielectric layer and a sacrificial gate electrode layer disposed over the sacrificial gate dielectric layer. Opposing gate sidewall spacers are formed extending along the second direction, on opposing sides of the sacrificial gate electrode layer. The sacrificial gate electrode layer is removed to form a gate space. Fluorine is implanted into the gate sidewall spacers after removing the gate electrode layer by performing a first fluorine implantation. The sacrificial gate dielectric layer is removed and a high-k gate dielectric layer is formed in the gate space. Fluorine is implanted into the gate sidewall spacers and the fin after forming the high-k gate dielectric layer by performing a second fluorine implantation. | 2019-01-03 |
20190006243 | Structure and Formation Method of Semiconductor Device Structure - Structures and formation methods of a semiconductor device structure are provided. The semiconductor device structure includes a fin structure over a semiconductor substrate and a gate stack covering a portion of the fin structure. The gate stack includes a gate dielectric layer, a work function layer, and a conductive filling over the work function layer. The semiconductor device structure also includes a dielectric layer covering the fin structure. The dielectric layer is in direct contact with the conductive filling. | 2019-01-03 |
20190006244 | SEMICONDUCTOR DEVICES, FINFET DEVICES, AND MANUFACTURING METHODS THEREOF - Semiconductor devices, fin field effect transistor (FinFET) devices, and methods of manufacturing semiconductor devices are disclosed. In some embodiments, a semiconductor device includes a substrate comprising a first fin and a second fin. A first epitaxial fin is disposed over the first fin, and a second epitaxial fin is disposed over the second fin. The second fin is proximate the first fin. The first epitaxial fin and the second epitaxial fin have an upper portion with a substantially pillar shape. | 2019-01-03 |
20190006245 | SEMICONDUCTOR DEVICE AND A METHOD FOR FABRICATING THE SAME - In a method of manufacturing a semiconductor device, an isolation region is formed in a substrate, such that the isolation region surrounds an active region of the substrate in plan view. A first dielectric layer is formed over the active region. A mask layer is formed on a gate region of the first dielectric layer. The gate region includes a region where a gate electrode is to be formed. The mask layer covers the gate region, but does not entirely cover the first dielectric layer. The first dielectric layer not covered by the mask layer is removed such that a source-drain region of the active region is exposed. After that, the mask layer is removed. A second dielectric layer is formed so that a gate dielectric layer is formed. The gate electrode is formed over the gate dielectric layer. | 2019-01-03 |
20190006246 | SEMICONDUCTOR DEVICE - This semiconductor device comprises: an n-type semiconductor substrate which is connected to an output terminal; a first p-type well which is formed in the n-type semiconductor substrate; a first n-type semiconductor region which is formed in the first p-type well and is connected to a control terminal; and a potential separation part which is connected between the first p-type well and a ground terminal. The potential separation part sets the first p-type well and the ground terminal to a same potential when the output terminal is held at a higher potential than the ground terminal, and sets the first p-type well and the output terminal to a same potential when the output terminal is held at a lower potential than the ground terminal. | 2019-01-03 |
20190006247 | METHOD OF FORMING PROTECTION LAYER IN FINFET DEVICE - A method for forming a fin-based transistor includes forming a fin on a substrate; overlaying at least an upper portion of the fin by an oxide layer and a protection layer, wherein the protection layer is formed above the oxide layer; and doping at least the upper portion of the fin by using an ion implantation process, wherein the protection layer protects against damage to at least the upper portion of the fin and the oxide layer during the ion implantation process. | 2019-01-03 |
20190006248 | METALIZATION REPAIR IN SEMICONDUCTOR WAFERS - Embodiments are directed to a method for repairing features of a host semiconductor wafer. The method includes forming a feature of the host semiconductor wafer, wherein the feature includes a first conductive material and a surface having a planar region and non-planar regions. The method further includes forming a metal conductive liner over the non-planar regions. The method further includes applying a second conductive material metal layer over said the conductive liner. The method further includes recessing the second conductive material to be substantially planar with the planar region. | 2019-01-03 |
20190006249 | OFFSET TEST PADS FOR WLCSP FINAL TEST - A device configured for WLCSP, can include: a first pad; a test pad offset from the first pad; a first RDL path that connects the first pad to the test pad; and a second RDL path that connects the test pad to a solder ball. In another case, a device configured for WLCSP can include: a first pad; a test pad offset from the first pad; a first RDL path that connects the first pad to a solder ball; and a second RDL path that connects the test pad to the solder ball. A wafer having devices configured for WLCSP, can include: a first device having a first pad; a second device having a test pad; a first RDL path that connects the first pad to a solder ball; and a second RDL path that connects the test pad to the solder ball. | 2019-01-03 |
20190006250 | FABRICATION OF A SACRIFICIAL INTERPOSER TEST STRUCTURE - A sacrificial interposer test structure including a release layer, a dummy layer on the release layer, one or more conductive pads embedded in the dummy layer, wherein each of the one or more conductive pads has an exposed surface, and a tie layer on the dummy layer and on each exposed surface of the one or more conductive pads. | 2019-01-03 |
20190006251 | Package for a semiconductor die, method for making a die packaging bare die tape and method for semiconductor die packaging - A carrier medium for a semiconductor die includes a carrier tape with at least one pocket for the die to sit in and a selectively applied non-activated adhesive on the carrier tape. | 2019-01-03 |
20190006252 | Semiconductor Package with Cavity - An embodiment includes a method comprising: coupling a sacrificial material to a substrate; forming a first dielectric material adjacent the sacrificial material such that a horizontal axis intersects the first dielectric material and the sacrificial material; forming a first layer, on the first dielectric material and the sacrificial material, which includes a first metal interconnect and a third dielectric material; decoupling the substrate from the first dielectric material and the sacrificial material; removing the sacrificial material to form an empty cavity with sidewalls comprising the first dielectric material; after removing the sacrificial material to form the empty cavity, inserting a first die into the empty cavity; and forming a second dielectric material between the first dielectric material and the first die such that the horizontal axis intersects the first and second dielectric materials and the first die. Other embodiments are described herein. | 2019-01-03 |
20190006253 | SEMICONDUCTOR CHIP PACKAGE STRUCTURE AND PACKAGING METHOD THEREFOR - A semiconductor chip package and a semiconductor chip packaging method are provided. The package includes: a semiconductor chip having a functional region, a protective substrate located on one side of the semiconductor chip and covering the functional region, and a support unit located between the protective substrate and the semiconductor chip and enclosing the functional region. The support unit includes an outer support member and an inner support member located inside the outer support member. A receiving cavity is formed between the inner support member, the semiconductor chip and the protective substrate. A hollow cavity is formed between the inner support member, the outer support member, the semiconductor chip and the protective substrate. The inner support member is provided with at least one first ventilating structure, through which the receiving cavity is in communication with the hollow cavity. | 2019-01-03 |
20190006254 | MICROELECTRONIC PACKAGE CONSTRUCTION ENABLED THROUGH CERAMIC INSULATOR STRENGTHENING AND DESIGN - A semiconductor packaging structure is disclosed. The semiconductor packaging structure includes a heat spreader, a set of at least two leads, and a ceramic insulator. The heat spreader has a thermal conductivity greater than 300 W/m*K. The ceramic insulator has a mean flexural strength that is greater than 500 MPa and so better able to withstand the thermal expansion mismatch between it and the heat spreader. The heat spreader, the set of at least two leads, and the ceramic insulator may also be part of a semiconductor package along with at least one semiconductor device, a wire bond, and a ceramic lid. | 2019-01-03 |
20190006255 | POWER SEMICONDUCTOR DEVICE - At the time of clamping, excessive stress is applied to bonding parts between substrates and input/output terminals, which may cause the bonding parts to be detached and cause the substrates to be cracked. | 2019-01-03 |
20190006256 | Semiconductor Device and Method of Manufacture - In order to prevent cracks from occurring at the corners of semiconductor dies after the semiconductor dies have been bonded to other substrates, an opening is formed adjacent to the corners of the semiconductor dies, and the openings are filled and overfilled with a buffer material that has physical properties that are between the physical properties of the semiconductor die and an underfill material that is placed adjacent to the buffer material. | 2019-01-03 |
20190006257 | SEMICONDUCTOR PACKAGE AND METHOD MANUFACTURING THE SAME - A semiconductor package including at least one integrated circuit component, a glue material, an insulating encapsulation, and a redistribution circuit structure is provided. The glue material encapsulates the at least one integrated circuit component and has a first surface and a second surface opposite to the first surface, wherein the at least one integrated circuit component is exposed by the first surface of the glue material, and an area of the first surface is smaller than an area of the second surface. The insulating encapsulation encapsulates the glue material, wherein an interface is between the glue material and the insulating encapsulation. The redistribution circuit structure is disposed on the at last one integrated circuit component, the glue material and the insulating encapsulation, wherein the redistribution circuit structure is electrically connected to the at least one integrated circuit component. | 2019-01-03 |
20190006258 | METHOD OF MANUFACTURING SEMICONDUCTOR MODULE AND SEMICONDUCTOR MODULE - Reliability of a semiconductor module is improved. In a resin mold step of assembly of a semiconductor module, an IGBT chip, a diode chip, a control chip, a part of each of chip mounting portions are resin molded so that a back surface of each of the chip mounting portions is exposed from a back surface of a sealing body. After the resin molding, an insulating layer is bonded to the back surface of the sealing body so as to cover each back surface (exposed portion) of the chip mounting portions, and then, a TIM layer is bonded to an insulating layer. Here, a region of the TIM layer in a plan view is included in a region of the insulating layer. | 2019-01-03 |
20190006259 | COOLING SOLUTION DESIGNS FOR MICROELECTRONIC PACKAGES - Methods of forming microelectronic package structures/modules, and structures formed thereby, are described. Structures formed herein may include a first die disposed on a substrate and a second die disposed adjacent the first die on the substrate. A cooling solution is attached to the substrate, wherein a rib extends from a central region of the cooling solution and is attached to the substrate. The rib is disposed between the first die and the second die. | 2019-01-03 |
20190006260 | Molded package with chip carrier comprising brazed electrically conductive layers - A method of manufacturing a package, wherein the method comprises a forming a chip carrier by covering a thermally conductive and electrically insulating core on both opposing main surfaces thereof at least partially by a respective electrically conductive layer by brazing the respective electrically conductive layer on a respective one of the main surfaces; a mounting at least one electronic chip on the chip carrier; an electrically coupling an electrically conductive contact structure with the at least one electronic chip; and an encapsulating part of the electrically conductive contact structure, and at least part of the chip carrier and of the at least one electronic chip by a mold-type encapsulant. | 2019-01-03 |
20190006261 | SILICON NITRIDE CIRCUIT BOARD AND ELECTRONIC COMPONENT MODULE USING THE SAME - The present invention provides a silicon nitride circuit board in which metal plates are attached on front and rear sides of a silicon nitride substrate having a three-point flexural strength of 500 MPa or higher, wherein assuming that a thickness of the metal plate on the front side is denoted by t1, and a thickness of the metal plate on the rear side is denoted by t2, a numerical relation: |t1−t2|≥0.30 mm is satisfied, and a warp is formed in the silicon nitride substrate so that the silicon nitride substrate is convex toward the metal plate on one of the front side or the rear side; and warp amounts of the silicon nitride substrate in a long-side direction and a short-side direction both fall within a range from 0.01 to 1.0 mm. It is preferable that a longitudinal width (L1) of the silicon nitride substrate falls within a range from 10 to 200 mm, and a transverse width (L2) of the silicon nitride substrate falls within a range from 10 to 200 mm. Due to above structure, even if the silicon nitride circuit board has a large difference in thickness between the metal plates attached on front and rear sides of the silicon nitride substrate, TCT properties can be greatly improved. | 2019-01-03 |
20190006262 | DISSIPATING HEAT FROM AN ELECTRONIC DEVICE IN A PROTECTIVE HOUSING - An enclosed digital power amplifier has features for accommodating thermal cycling. The digital power amplifier includes an amplifier board and a controller board, both of which are in a protective housing. The amplifier board includes electronic components mounted on a copper circuit layer that is disposed on a dielectric layer that is disposed on an aluminum substrate layer. The housing includes slotted mounting projections that extend from sidewalls to isolate fasteners from the aluminum substrate layer, and thereby accommodate expansion of the aluminum substrate layer while the digital power amplifier is secured to a surface by the fasteners. Bottom edges of the sidewalls contact a top outer edge of the amplifier board. The mounting projections contact side outer edges of the first circuit board. At least a portion of the aluminum substrate layer extends beyond the bottom edges of the sidewalls of the housing, forming an end wall, such that the housing does not inhibit thermally coupling the aluminum substrate layer to another surface such as a heat exchanger. | 2019-01-03 |
20190006263 | Heat Spreading Device and Method - In an embodiment, a device includes: an integrated circuit die having a first side and a second side opposite the first side; a die stack on the first side of the integrated circuit die; a dummy semiconductor feature on the first side of the integrated circuit die, the dummy semiconductor feature laterally surrounding the die stack, the dummy semiconductor feature electrically isolated from the die stack and the integrated circuit die; a first adhesive disposed between the die stack and the dummy semiconductor feature; and a plurality of conductive connectors on the second side of the integrated circuit die. | 2019-01-03 |
20190006264 | EMBEDDED BRIDGE WITH THROUGH-SILICON VIAS - An apparatus comprising: a substrate having a first side opposing a second side, and comprises a first conductive layer disposed on the first side of the package substrate, and a second conductive layer disposed between the first side and the second side of the package substrate, the substrate having dielectric material disposed between the first conductive layer and the second conductive layer; and at least one at least one bridge die disposed within the substrate, the at least one bridge die having a first side opposing a second side, and comprising a plurality of vias extending from the first side to the second side of the at least one bridge die, wherein the second conductive layer disposed between the first and second sides of the substrate is coupled to the plurality of vias extending from the first side of the at least one bridge die to the second side of the at least one bridge die. | 2019-01-03 |
20190006265 | POWER SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING POWER SEMICONDUCTOR DEVICE - This power semiconductor device is provided with: a substrate; and a semiconductor element which is bonded onto the substrate using a sinterable metal bonding material. The semiconductor element comprises: a base; a first conductive layer that is provided on a first surface of the base, said first surface being on the substrate side; and a second conductive layer that is provided on a second surface of the base, said second surface being on the reverse side of the first surface. The thickness of the first conductive layer is from 0.5 times to 2.0 times (inclusive) the thickness of the second conductive layer. | 2019-01-03 |
20190006266 | PROTECTION FROM ESD DURING THE MANUFACTURING PROCESS OF SEMICONDUCTOR CHIPS - According to principles of the disclosure as explained herein, selected leads are electrically connected through metal strips to the lead frame until the end of the manufacturing process. The lead frame is grounded through the manufacturing process to prevent any ESD event from causing damage to the protected leads. In the final singulation step, the leads are electrically isolated from each other and from the lead frame, thus maintaining protection from a potential ESD event up until the final package singulation step. | 2019-01-03 |
20190006267 | SOLID TOP TERMINAL FOR DISCRETE POWER DEVICES - A solid top terminal for discrete power devices. In one embodiment, an apparatus is formed that includes a first die comprising a transistor, which in turn includes a first electrode such as an emitter. The apparatus also includes a first conductor sintered to an electroplated second conductor such as a solid top terminal. Importantly, the first conductor is electrically coupled to the first electrode. | 2019-01-03 |
20190006268 | MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE - A die bonding process for assembling a semiconductor device includes the steps of applying a sintered-silver-use paste to each of a plurality of first regions on an upper surface of a chip mounting part, drying the sintered-silver-use paste and applying a silver paste to a second region located between/among the respective first regions. Further, the process includes the step of mounting a semiconductor chip onto the chip mounting part in such a manner that a rear surface of the semiconductor chip faces an upper surface of the chip mounting part with the sintered-silver-use paste and the silver paste being interposed. After mounting the chip, part of each of first, second, third and fourth corners of a principal surface of the semiconductor chip is located in each of the first regions. | 2019-01-03 |
20190006269 | Enhanced Thermal Transfer in a Semiconductor Structure - A semiconductor device having enhanced thermal transfer includes at least one die, including a device layer in which one or more functional circuit elements are formed and a substrate supporting the device layer, and a support structure. The die is disposed on the support structure using at least one connection structure coupled between the device layer and the support structure. A back surface of the substrate is textured so as to increase a surface area of the back surface to thereby enhance thermal transfer between the substrate and an external environment. | 2019-01-03 |
20190006270 | MOLDED INTELLIGENT POWER MODULE FOR MOTORS - An intelligent power module (IPM) has a first, second, third and fourth die supporting elements, a first, second, third, fourth, fifth and sixth transistors, a connection member, a low voltage IC, a high voltage IC, a plurality of leads and a molding encapsulation. The first transistor is attached to the first die supporting element. The second transistor is attached to the second die supporting element. The third transistor is attached to the third die supporting element. The fourth, fifth and sixth transistor s are attached to the fourth die supporting element. The low and high voltage ICs are attached to the connection member. The molding encapsulation encloses the first, second, third and fourth die supporting elements, the first, second, third, fourth, fifth and sixth transistors, the connection member and the low and high voltage ICs. The IPM has a reduced thermal resistance of junction-to-case (R | 2019-01-03 |
20190006271 | MECHANICALLY FLEXIBLE INTERCONNECTS, METHODS OF MAKING THE SAME, AND METHODS OF USE - Disclosed are various embodiments that involve mechanically flexible interconnects, methods of making mechanically flexible interconnects, methods of using mechanically flexible interconnects, and the like. | 2019-01-03 |
20190006272 | SEMICONDUCTOR DEVICE - In a semiconductor device, protective films are formed on facing side surfaces of a plurality of circuit patterns and a plating process or the like is not performed on parts aside from the side surfaces where the protective films are formed. This means that when semiconductor elements and contact elements are directly bonded via solder onto the plurality of circuit patterns, a drop-in wettability of the plurality of circuit patterns for the solder is avoided. | 2019-01-03 |
20190006273 | TRANSISTOR PACKAGES - In accordance with another aspect, a power switch assembly includes a transistor package including a die case, a source bus tab extending from a first side of the die case, a drain bus tab extending from a second side of the die case, a first power bus rail operatively connected to the source bus tab of the transistor package and a second power bus rail operatively connected to the drain bus tab of the transistor package. | 2019-01-03 |
20190006274 | TRANSISTOR ASSEMBLIES - A transistor module assembly includes a longitudinally extending load bus bar, a longitudinally extending feed bus bar parallel to the load bus bar, and at least one transistor package operatively connected to the load and feed bus bars. The transistor package includes a drain surface and a source lead. The drain surface is operatively connected to the feed bus bar for receiving current therefrom. The source lead is operatively connected to the load bus bar for dissipating current from the transistor package to the load bus bar. | 2019-01-03 |
20190006275 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME - According to one embodiment, a stacked body includes a plurality of conductive layers stacked with an insulator interposed. The stacked body includes a first stacked portion and a second stacked portion. The second stacked portion includes a plurality of terrace portions arranged in a staircase configuration with level differences in a first direction and a second direction. The second stacked portion includes a conductive portion and a spacer portion. The conductive portion is connected to the conductive layer and is provided in same layer as the conductive layer. The spacer portion is provided in same layer as the conductive layer and the conductive portion. The spacer portion is of a material different from the conductive portion. | 2019-01-03 |
20190006276 | STRUCTURE AND METHOD FOR IMPROVING HIGH VOLTAGE BREAKDOWN RELIABILITY OF A MICROELECTRONIC DEVICE - A method and structure suitable for, e.g., improving high voltage breakdown reliability of a microelectronic device such as a capacitor usable for galvanic isolation of two circuits. A metal plate having a top surface and a side surface is located over a first dielectric layer. A second dielectric layer of a second different material is located over the first metal plate. A dielectric structure of the first material is located over the side surface of the metal plate and over the surface of the first dielectric layer. | 2019-01-03 |
20190006277 | PACKAGED DIE STACKS WITH STACKED CAPACITORS AND METHODS OF ASSEMBLING SAME - A stacked-die and stacked-capacitor package vertically arranged capacitors to mirror a semiconductive-device stack. The stacked capacitor can be electrically coupled to one or more semiconductive devices in the stacked architecture. | 2019-01-03 |
20190006278 | SEMICONDUCTOR DEVICE - Object is to provide a semiconductor device with fewer malfunctions. The semiconductor device has a semiconductor chip having a first-signal-output circuit operating at a first-power-supply voltage, a second-signal-output circuit operating at a second power supply voltage, and a plurality of bump electrodes; and a wiring board including a first main surface facing the main surface of the semiconductor chip, a second main surface opposite to the first main surface with a wiring layer therebetween, first external terminals on the first main surface, and second ones on the second main surface; the former being mounted on the latter to couple the bump electrodes to the first external terminals. When viewed from the second main surface, second external terminals to be supplied with the first signal and the second signal are arranged closer to the semiconductor chip than second external terminals to be supplied with the first power supply voltage and the second power supply voltage. | 2019-01-03 |
20190006279 | COMPOUND LATERAL RESISTOR STRUCTURES FOR INTEGRATED CIRCUITRY - IC device structures including a lateral compound resistor disposed over a surface of a substrate, and fabrication techniques to form such a resistor in conjunction with fabrication of a transistor. Rather than being stacked vertically, a compound resistive trace may include a plurality of resistive materials arranged laterally over a substrate. Along a resistive trace length, a first resistive material is in contact with a sidewall of a second resistive material. A portion of a first resistive material along a centerline of the resistive trace may be replaced with a second resistive material so that the second resistive material is embedded within the first resistive material. | 2019-01-03 |
20190006280 | INTEGRATED CIRCUIT STRUCTURE HAVING GATE CONTACT AND METHOD OF FORMING SAME - One aspect of the disclosure relates to an integrated circuit structure. The integrated circuit structure may include: a gate stack having a gate conductor therein over a substrate, the gate stack being within a dielectric layer; a source/drain contact to a source/drain region over the substrate and adjacent to the gate stack within the dielectric layer; an upper conductor extending above, without contacting, the source/drain contact, wherein the upper conductor extends within the dielectric layer to contact the gate conductor within the gate stack. | 2019-01-03 |
20190006281 | CROSS-CONNECTED MULTI-CHIP MODULES COUPLED BY SILICON BENT-BRIDGE INTERCONNECTS AND METHODS OF ASSEMBLING SAME - A multi-chip module includes two silicon bridge interconnects and three components that are tied together by the bridges with one of the components in the center. At least one of the silicon bridge interconnects is bent to create a non-planar chip-module form factor. Cross-connected multi-chip silicon bent-bridge interconnect modules include the two silicon bridges contacting the center component at right angles to each other, plus a fourth component and a third silicon bridge interconnect contacting the fourth component and any one of the original three components. | 2019-01-03 |
20190006282 | MICROELECTRONIC DEVICES DESIGNED WITH MODULAR SUBSTRATES HAVING INTEGRATED FUSES - Embodiments of the invention include a microelectronic device that includes a plurality of organic dielectric layers, a cavity formed in at least one organic dielectric layer of the plurality of organic dielectric layers and a modular structure having first and second ports and a conductive member that is formed within the cavity. The conductive member provides modularity by being capable of connecting the first and second ports and also disconnecting the first and second ports. | 2019-01-03 |
20190006283 | Semiconductor Package and Method - In an embodiment, a device includes: a molding compound; an integrated circuit die encapsulated in the molding compound; a through via adjacent the integrated circuit die; and a redistribution structure over the integrated circuit die, the molding compound, and the through via, the redistribution structure electrically connected to the integrated circuit die and the through via, the redistribution structure including: a first dielectric layer disposed over the molding compound; a first conductive via extending through the first dielectric layer; a second dielectric layer disposed over the first dielectric layer and the first conductive via; and a second conductive via extending through the second dielectric layer and into a portion of the first conductive via, an interface between the first conductive via and the second conductive via being non-planar. | 2019-01-03 |
20190006284 | QUBIT NETWORK NON-VOLATILE IDENTIFICATION - A technique relates to a superconducting chip. Resonant units have resonant frequencies, and the resonant units are configured as superconducting resonators. Josephson junctions are in the resonant units, and one or more of the Josephson junctions have a shorted tunnel barrier. | 2019-01-03 |
20190006285 | METHOD FOR PRECISELY ALIGNING BACKSIDE PATTERN TO FRONTSIDE PATTERN OF A SEMICONDUCTOR WAFER - A method comprises the steps of providing a semiconductor device wafer; forming a first plurality of alignment marks on a first side of the semiconductor device wafer; forming a first pattern of a first conductivity type; forming a second plurality of alignment marks on a second side of the semiconductor device wafer; forming a bonded wafer by bonding a carrier wafer to the semiconductor device wafer; forming a third plurality of alignment marks on a free side of the carrier wafer; applying a grinding process; forming a plurality of device structure members; removing the carrier wafer; applying an implanting process and an annealing process; applying a metallization process and applying a singulation process. | 2019-01-03 |
20190006286 | GUARD BOND WIRES IN AN INTEGRATED CIRCUIT PACKAGE - An integrated circuit package is provided. The integrated circuit package comprises a first and second guard bond wire. The first guard bond wire has a first and second end coupled to ground. The second guard bond wire has a first and second end coupled to ground. The integrated circuit package further comprises a die. The die is mounted between the first and second guard bond wires such that the first and second guard bond wires distort a magnetic field between at least an input terminal and an output terminal of the die. | 2019-01-03 |
20190006287 | MATCHED CERAMIC CAPACITOR STRUCTURES - Capacitor devices having multiple capacitors with similar nominal capacitances are described. The capacitors may be multilayer ceramic capacitors (MLCCs) and may be fabricated employing class 2 materials. The arrangement of the electrodes in the device may reduce relative variations between the capacitors of the device. The capacitor devices may be allow high performance and compact electrical circuits that may employ matched capacitors. | 2019-01-03 |
20190006288 | SEMICONDUCTOR DEVICE WITH SHIELD FOR ELECTROMAGNETIC INTERFERENCE - A semiconductor device includes a first die embedded in a molding material, where contact pads of the first die are proximate a first side of the molding material. The semiconductor device further includes a redistribution structure over the first side of the molding material, a first metal coating along sidewalls of the first die and between the first die and the molding material, and a second metal coating along sidewalls of the molding material and on a second side of the molding material opposing the first side. | 2019-01-03 |
20190006289 | Semiconductor Device with Shielding Structure for Cross-Talk Reduction - A method includes embedding a die in a molding material; forming a first dielectric layer over the molding material and the die; forming a conductive line over an upper surface of the first dielectric layer facing away from the die; and forming a second dielectric layer over the first dielectric layer and the conductive line. The method further includes forming a first trench opening extending through the first dielectric layer or the second dielectric layer, where a longitudinal axis of the first trench is parallel with a longitudinal axis of the conductive line, and where no electrically conductive feature is exposed at a bottom of the first trench opening; and filling the first trench opening with an electrically conductive material to form a first ground trench. | 2019-01-03 |
20190006290 | SEMICONDUCTOR PACKAGE AND SEMICONDUCTOR PACKAGE MANUFACTURING METHOD - Disclosed herein is a semiconductor package including a redistribution layer and a semiconductor chip connected to the redistribution layer, the semiconductor chip being sealed with a resin layer, the redistribution layer including a ground line exposed to the side surface of the redistribution layer. The semiconductor package includes a contact metal formed on the side surface of the redistribution layer so as to cover the ground line and a shield layer formed on the upper surface and the side surface of the semiconductor package so as to cover the contact metal. The shield layer is connected through the contact metal to the ground line exposed to the side surface of the redistribution layer. | 2019-01-03 |
20190006291 | METHODS OF FORMING MULTI-CHIP PACKAGE STRUCTURES - Methods of forming microelectronic package structures/modules, and structures formed thereby, are described. Structures formed herein may include a first die disposed on a substrate, a second die disposed on the substrate, a molding compound disposed between the first die and the second die, wherein the molding compound is disposed on a top surface of the substrate. An epoxy material is disposed between a top portion of a sidewall of the first die and the molding compound, and a thermal interface material (TIM) is disposed on top surfaces of the first and second die, wherein the TIM extends over the entire length of the substrate. | 2019-01-03 |
20190006292 | Semiconductor Device and Method for Manufacturing the Semiconductor Device - A semiconductor device and a method for manufacturing the semiconductor device. The semiconductor device includes a silicon carbide substrate and a protective film covering at least partly a main surface of the silicon carbide substrate and one or more side surfaces of the silicon carbide substrate. Therefore, contact of the side surface of the silicon carbide substrate with the moisture gathering material may be avoided, and the breakdown behavior and the long-term reliability of the semiconductor device may be further improved. | 2019-01-03 |
20190006293 | Semiconductor Package, and a Method for Forming a Semiconductor Package - A semiconductor package includes a semiconductor die arranged on a substrate. The semiconductor package includes a stiffener structure arranged on the substrate. The stiffener structure is spaced at a distance from the semiconductor die. The stiffener structure includes a molding compound material. | 2019-01-03 |
20190006294 | STIFFENER FOR A PACKAGE SUBSTRATE - Stiffener technology for electronic device packages is disclosed. A stiffener for a package substrate can include a top portion configured to be affixed to a top surface of a package substrate. The stiffener for a package substrate can also include a lateral portion extending from the top portion and configured to be disposed about a lateral side of the package substrate. An electronic device package and associated systems and methods are also disclosed. | 2019-01-03 |
20190006295 | PROTECTIVE FILM MATERIAL FOR LASER PROCESSING AND WAFER PROCESSING METHOD USING THE PROTECTIVE FILM MATERIAL - A protective film material for laser processing comprises a solution of a water-soluble adhesive and a water-soluble laser beam absorbent added to adjust absorbance at a wavelength of 355 nm (absorbance as calculated as a 200-times diluted solution) to 0.3 to 3. The protective film effectively absorbs an irradiated laser beam, reduces generation of debris during laser beam irradiation, and can be removed by washing with water after completion of the laser processing treatment, thereby providing reliable processing. The water-soluble adhesive is preferably a blend of polyvinyl alcohol and poly-N-vinyl acetamide, which are preferably blended at a ratio of 100 to 200:1 in terms of amounts of respective components. | 2019-01-03 |
20190006296 | METAL ON BOTH SIDES OF THE TRANSISTOR INTEGRATED WITH MAGNETIC INDUCTORS - An apparatus and a system including an apparatus including a circuit structure including a device stratum including a plurality of transistor devices each including a first side and an opposite second side; an inductor disposed on the second side of the structure; and a contact coupled to the inductor and routed through the device stratum and coupled to at least one of the plurality of transistor devices on the first side. A method including forming a plurality of transistor devices on a substrate, the plurality of transistor devices defining a device stratum including a first side and an opposite second side, wherein the second side is coupled to the substrate; removing a portion of the substrate; forming at least one inductor on the second side of the device stratum; and coupling the at least one inductor to at least one of the plurality of transistor devices. | 2019-01-03 |
20190006297 | HIGH-POWER AMPLIFIER PACKAGE - Package assemblies for improving heat dissipation of high-power components in microwave circuits are described. A laminate that includes microwave circuitry may have cut-outs that allow high-power components to be mounted directly on a heat slug below the laminate. Electrical connections to circuitry on the laminate may be made with wire bonds. The packaging allows more flexible design and tuning of packaged microwave circuitry. | 2019-01-03 |
20190006298 | PLATFORM WITH THERMALLY STABLE WIRELESS INTERCONNECTS - Embodiments of the invention may include a packaged device that includes thermally stable radio frequency integrated circuits (RFICs). In one embodiment the packaged device may include an integrated circuit chip mounted to a package substrate. According to an embodiment, the package substrate may have conductive lines that communicatively couple the integrated circuit chip to one or more external components. One of the external components may be an RFIC module. The RFIC module may comprise an RFIC and an antenna. Additional embodiments may also include a packaged device that includes a plurality of cooling spots formed into the package substrate. In an embodiment the cooling spots may be formed proximate to interconnect lines the communicatively couple the integrated circuit chip to the RFIC. | 2019-01-03 |
20190006299 | METHOD TO IMPROVE CMP SCRATCH RESISTANCE FOR NON PLANAR SURFACES - An electronic device is formed by providing a substrate having a recess at a top surface. A layer of an organic protective material is formed over the substrate, with the organic protective material extending into the recess. A polishing process is performed on the layer of protective material. The polishing process may remove a portion of an underlying metal layer over the top surface while protecting the underlying metal layer within the recess. | 2019-01-03 |
20190006300 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device and a method for manufacturing the semiconductor device which ensure improved reliability, permit further miniaturization, and suppress the increase in manufacturing cost. The semiconductor device includes: a pad electrode formed in the uppermost wiring layer of a multilayer wiring layer formed over a semiconductor substrate; a surface protective film formed in a manner to cover the pad electrode; an opening made in the surface protective film in a manner to expose the pad electrode partially; and a conductive layer formed over the pad electrode exposed at the bottom of the opening. The thickness of the conductive layer formed over the pad electrode is smaller than the thickness of the surface protective film formed over the pad electrode. | 2019-01-03 |
20190006301 | 3D Packaging Method for Semiconductor Components - The present disclosure relates to a method for bonding semiconductor components. A semiconductor component comprising microbumps on a planar bonding surface is prepared for bonding by applying a photosensitive polymer layer on the bonding surface. The average thickness of the initial polymer layer in between the microbumps is similar to the average height of the microbumps. In a lithography process, the polymer is removed from the upper surface of the microbumps and from areas around the microbumps. The polymer is heated to a temperature at which the polymer flows, resulting in a polymer layer that closely adjoins the microbumps, without exceeding the microbump height. The closely adjoining polymer layer may have a degree of planarity substantially similar to a planarized layer. | 2019-01-03 |
20190006302 | PROCESS FOR FABRICATING A CIRCUIT SUBSTRATE - A process for fabricating a circuit substrate is provided. A dielectric layer is formed to cover a surface of a circuit stack and a patterned conductive layer, and has bonding openings exposing bonding segments of traces of the patterned conductive layer, and has plating openings exposing plating segments of the traces. A plating seed layer is formed to cover the surface of the circuit stack, the bonding segments, the plating segments, and the dielectric layer. A mask is formed to cover the plating layer and has mask openings exposing portions of the plating seed layer on the bonding segments. Portions of the plating seed layer on the bonding segments are removed with use of the mask as an etching mask. A thickening conductive layer is plated on each of the bonding segments with use of the mask as a plating mask. The mask and the plating seed layer are removed. | 2019-01-03 |
20190006303 | SEMICONDUCTOR DEVICE AND BUMP FORMATION PROCESS - A semiconductor device includes a semiconductor substrate. A pad region is disposed on the semiconductor substrate. A micro bump is disposed on the pad region. The micro bump has a first portion on the pad region and a second portion on the first portion. The first portion and the second portion have different widths. The first portion has a first width and the second portion has a second width. The first width is larger or smaller than the second width. The micro bump includes nickel and gold. The semiconductor device also includes a passivation layer overlying a portion of the pad region. | 2019-01-03 |
20190006304 | METAL PAD MODIFICATION - The present invention provides a structure. In an exemplary embodiment, the structure includes a base material, at least one metal pad, where a first surface of the metal pad is in contact with the base material, and a metal pedestal, where the metal pedestal is in contact with the metal pad, where a radial alignment of the metal pad is shifted by an offset distance, with respect to the metal pedestal, such that the metal pad is shifted towards a center axis of the base material, where a first dimension of the metal pad is smaller than a second dimension of the metal pad, where the second dimension is orthogonal to a line running from a center of the metal pad to the center axis of the base material, where the first dimension is parallel to the line. | 2019-01-03 |
20190006305 | SEMICONDUCTOR PACKAGE STRUCTURE AND MANUFACTURING METHOD THEREOF - A manufacturing method of a semiconductor package structure is provided. The method includes the following steps. A first redistribution layer is formed on a first surface of a semiconductor substrate. A plurality of through holes and an opening are formed on the semiconductor substrate. A chip is disposed in the opening of the semiconductor substrate. A conductive through via is formed in the through holes to electrically connect the first redistribution layer. A second redistribution layer is formed on a second surface of the semiconductor substrate opposite to the first surface to electrically connect the chip. The second redistribution layer is electrically connected to the first redistribution layer by the conductive through via. A plurality of conductive structures are formed on the second redistribution layer. A semiconductor package structure is also provided. | 2019-01-03 |
20190006306 | SEMICONDUCTOR CHIP - A semiconductor chip includes a semiconductor substrate having a main surface, first and second electrodes, a first insulating layer, and first and second bumps. The first and second electrodes are formed above the main surface of the semiconductor substrate. The first insulating layer is formed above a first portion of the first electrode. The first bump is formed above a second portion of the first electrode and above the first insulating layer and is electrically connected to the first electrode. The second bump is formed above the second electrode. The area of the second bump is larger than that of the first bump in a plan view of the main surface of the semiconductor substrate. The first insulating layer adjusts the distance from the main surface of the semiconductor substrate to the top surface of the first bump in a direction normal to the main surface. | 2019-01-03 |
20190006307 | PACKAGE METHOD AND PACKAGE STRUCTURE OF FAN-OUT CHIP - A packaging method and a package structure of a fan-out chip are disclosed. The package structure comprises a first chip with bumps and a second chip without bumps, a first dielectric layer formed on a surface of the second chip and through-holes fabricated in the first dielectric layer; a plastic package material; a second dielectric layer; a metal redistribution layer for interconnecting within and between the first chip and the second chip; under bump metallization layers and micro-bumps. By fabricating the dielectric layers with the through-holes on the surfaces of the first chip and the second chip, exposing the bumps of the first chip and metal pads of the second chip and subsequently fabricating the metal redistribution layer, the interconnections within and between the first chip and the second chip are achieved and thereby the integrated package of the first chip and the second chip is achieved. | 2019-01-03 |
20190006308 | SEMICONDUCTOR PACKAGE AND METHOD FOR MANUFACTURING A SEMICONDUCTOR PACKAGE - A semiconductor package includes at least one semiconductor element, an encapsulant, a first circuitry, a second circuitry and at least one first stud bump. The encapsulant covers at least a portion of the semiconductor element. The encapsulant has a first surface and a second surface opposite to the first surface. The first circuitry is disposed adjacent to the first surface of the encapsulant. The second circuitry is disposed adjacent to the second surface of the encapsulant. The first stud bump is disposed in the encapsulant, and electrically connects the first circuitry and the second circuitry. The first stud bump contacts the second circuitry directly. | 2019-01-03 |
20190006309 | CHIP PACKAGE STRUCTURE AND METHOD FOR FORMING THE SAME - A method for forming a chip package structure is provided. The method includes forming a first dielectric layer over a carrier substrate. The first dielectric layer is a continuous dielectric layer and has openings. The method includes forming a first wiring layer over the first dielectric layer and in the openings. The first dielectric layer and the first wiring layer together form a redistribution structure, and the redistribution structure has a first surface and a second surface. The method includes disposing a first chip and a first conductive bump over the first surface. The method includes forming a first molding layer over the first surface. The method includes removing the carrier substrate. The method includes disposing a second chip and a second conductive bump over the second surface. The method includes forming a second molding layer over the second surface. | 2019-01-03 |
20190006310 | MOUNTING COMPONENT, SEMICONDUCTOR DEVICE USING SAME, AND MANUFACTURING METHOD THEREOF - A mounting component includes a main body and a metal layer. The main body has a first main surface and a second main surface. The metal layer is arranged on the first main sur face of the main body. The metal layer includes at least one concave recognition mark having an inclined surface that is inclined with respect to a main surface of the metal layer. | 2019-01-03 |
20190006311 | Method for Producing Electronic Device With Multi-Layer Contact - A method for producing an electric device with a multi-layer contact is disclosed. In an embodiment, a method includes providing a carrier, the carrier having a metallic layer disposed on its surface, providing a semiconductor substrate, forming a layer stack on the semiconductor substrate and attaching the layer stack of the semiconductor substrate to the metallic layer of the carrier so that an intermetallic phase is formed between the metallic layer and the solder layer. | 2019-01-03 |
20190006312 | LEAD-FREE SOLDER JOINING OF ELECTRONIC STRUCTURES - A method and structure for joining a semiconductor device and a laminate substrate or two laminate substrates where the joint is formed with lead free solders and lead free compositions. The various lead free solders and lead free compositions are chosen so that there is a sufficient difference in liquidus temperatures such that some components may be joined to, or removed from, the laminate substrate without disturbing other components on the laminate substrate. | 2019-01-03 |
20190006313 | METHOD FOR PERMANENT BONDING OF WAFERS - A method for bonding of a first contact surface of a first substrate to a second contact surface of a second substrate according to the following steps: forming a reservoir in a surface layer on the first contact surface, at least partially filling the reservoir with a first educt or a first group of educts, contacting the first contact surface with the second contact surface for formation of a prebond connection, and forming a permanent bond between the first and second contact surface, at least partially strengthened by the reaction of the first educt with a second educt contained in a reaction layer of the second substrate. | 2019-01-03 |
20190006314 | FAN-OUT PACKAGE STRUCTURE AND METHOD FOR FORMING THE SAME - Package structures and methods for forming the same are provided. A package structure includes a semiconductor die. The semiconductor die includes a passivation layer over a semiconductor substrate. The semiconductor die also includes a conductive pad in the passivation layer. The passivation layer partially exposes a top surface of the conductive pad. The package structure also includes an encapsulation layer surrounding the semiconductor die. The package structure further includes a dielectric layer covering the semiconductor die and the encapsulation layer. In addition, the package structure includes a redistribution layer covering the dielectric layer. The redistribution layer extends in the dielectric layer to be physically connected to the top surface of the conductive pad. | 2019-01-03 |
20190006315 | SEMICONDUCTOR PACKAGE AND METHOD MANUFACTURING THE SAME - A semiconductor package including an insulating encapsulation, an integrated circuit component, and conductive elements is provided. The integrated circuit component is encapsulated in the insulating encapsulation, wherein the integrated circuit component has at least one through silicon via protruding from the integrated circuit component. The conductive elements are located on the insulating encapsulation, wherein one of the conductive elements is connected to the at least one through silicon via, and the integrated circuit component is electrically connected to the one of the conductive elements through the at least one through silicon via. | 2019-01-03 |
20190006316 | Fan-Out Stacked System in Package (SIP) and the Methods of Making the Same - An embodiment package includes a first fan-out tier having a first device die, a molding compound extending along sidewalls of the first device die, and a through intervia (TIV) extending through the molding compound. One or more first fan-out redistribution layers (RDLs) are disposed over the first fan-out tier and bonded to the first device die. A second fan-out tier having a second device die is disposed over the one or more first fan-out RDLs. The one or more first fan-out RDLs electrically connects the first and second device dies. The TIV electrically connects the one or more first fan-out RDLs to one or more second fan-out RDLs. The package further includes a plurality of external connectors at least partially disposed in the one or more second fan-out RDLs. The plurality of external connectors are further disposed on conductive features in the one or more second fan-out RDLs. | 2019-01-03 |
20190006317 | Package Structures and Methods of Forming - Methods of forming and structures of packages are discussed herein. In an embodiment, a method includes forming a back side redistribution structure, and after forming the back side redistribution structure, adhering a first integrated circuit die to the back side redistribution structure. The method further includes encapsulating the first integrated circuit die on the back side redistribution structure with an encapsulant, forming a front side redistribution structure on the encapsulant, and electrically coupling a second integrated circuit die to the first integrated circuit die. The second integrated circuit die is electrically coupled to the first integrated circuit die through first external electrical connectors mechanically attached to the front side redistribution structure. | 2019-01-03 |
20190006318 | MONOLITHIC SILICON BRIDGE STACK INCLUDING A HYBRID BASEBAND DIE SUPPORTING PROCESSORS AND MEMORY - A semiconductive device stack, includes a baseband processor die with an active surface and a backside surface, and a recess in the backside surface. A recess-seated device is disposed in the recess, and a through-silicon via in the baseband processor die couples the baseband processor die at the active surface to the recess-seated die at the recess. A processor die is disposed on the baseband processor die backside surface, and a memory die is disposed on the processor die. The several dice are coupled by through-silicon via groups. | 2019-01-03 |
20190006319 | PACKAGE ON PACKAGE THERMAL TRANSFER SYSTEMS AND METHODS - Systems and methods for improving heat distribution and heat removal efficiency in PoP semiconductor packages are provided. A PoP semiconductor package includes a first semiconductor package that is physically, communicably, and conductively coupled to a stacked second semiconductor package. A gap forms between the upper surface of the first semiconductor package and the lower surface of the second semiconductor package. Additionally, interstitial gaps form between each of the PoP semiconductor packages disposed on an organic substrate. A curable fluid material, such as a molding compound, may be flowed both in the interstitial spaces between the PoP semiconductor packages and into the gap between the upper surface of the first semiconductor package and the lower surface of the second semiconductor package. | 2019-01-03 |
20190006320 | SEMICONDUCTOR DEVICE INCLUDING CONTROL SWITCHES TO REDUCE PIN CAPACITANCE - A semiconductor device including control switches enabling a semiconductor die in a stack of semiconductor die to send or receive a signal, while electrically isolating the remaining die in the die stack. Parasitic pin cap is reduced or avoided by electrically isolating the non-enabled semiconductor die in the die stack. | 2019-01-03 |
20190006321 | SEMICONDUCTOR DIE ASSEMBLIES HAVING MOLDED UNDERFILL STRUCTURES AND RELATED TECHNOLOGY - A semiconductor die assembly in accordance with an embodiment of the present technology includes first and second semiconductor dies and a package substrate carrying the first and second semiconductor dies. The second semiconductor die includes a first peripheral portion extending laterally outward beyond a first edge surface of the first semiconductor die. Similarly, the package substrate includes a second peripheral portion extending laterally outward beyond a second edge surface of the second semiconductor die. The semiconductor die assembly further includes a first volume of molded underfill material between the first and second semiconductor dies, a second volume of molded underfill material between the package substrate and the second semiconductor die, a first molded peripheral structure laterally adjacent to the first edge surface of the first semiconductor die, and a second molded peripheral structure laterally adjacent to the second edge surface of the second semiconductor die. | 2019-01-03 |
20190006322 | METHOD AND DEVICE FOR CONTROLLING OPERATION USING TEMPERATURE DEVIATION IN MULTI-CHIP PACKAGE - A multi-chip package includes a first die having temperature sensors and a second die. The first die generates temperature deviation information of m (m2019-01-03 | |
20190006323 | THERMAL PADS BETWEEN STACKED SEMICONDUCTOR DIES AND ASSOCIATED SYSTEMS AND METHODS - Systems and methods are described for improved heat dissipation of the stacked semiconductor dies by including metallic thermal pads between the dies in the stack. In one embodiment, the thermal pads may be in direct contact with the semiconductor dies. Heat dissipation of the semiconductor die stack can be improved by a relatively high thermal conductivity of the thermal pads that directly contact the adjacent silicon dies in the stack without the intervening layers of the low thermal conductivity materials (e.g., passivation materials). In some embodiments, the manufacturing yield of the stack can be improved by having generally coplanar top surfaces of the thermal pads and under-bump metallization (UBM) structures. | 2019-01-03 |