| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 549264000 | Spiro | 6 |
| 20120046476 | METHOD FOR PRODUCING TETRAHYDROPYRAN COMPOUND AND INTERMEDIATE THEREOF - Disclosed is a method for producing a tetrahydropyran compound represented by general formula (5) shown in the scheme. Accordingly, a tetrahydropyran derivative is obtained in high yield and with high selectivity without using a highly toxic reagent, and an industrially useful method for producing a tetrahydropyran derivative and an intermediate thereof can be provided. In formulae (1) to (5), R | 02-23-2012 |
| 20130345442 | INSECTICIDAL FERMENTATION BROTH FROM ACTINOMYCETES CONTAINING ENHANCED RATIO OF ACTIVE TO INACTIVE DUNAIMYCINS - Methods and compositions are provided for the preparation of insecticidal compositions. | 12-26-2013 |
| 20150344404 | PDK4 INHIBITOR AND USE THEREOF - The present invention to provide a novel pyruvate dehydrogenase kinase inhibitors. A pyruvate dehydrogenase kinase inhibitor comprising a compound represented by the general formula (I) as an active ingredient (wherein, ring A represents a 6-membered aromatic hydrocarbon ring optionally substituted with 2-4 substituents,
| 12-03-2015 |
| 549265000 | The spiro includes the lactone ring | 3 |
| 20110098487 | NOVEL COLOR-FORMING COMPOUNDS AND USE THEREOF IN IMAGING MEMBERS AND METHODS - There are described novel rhodamine color-forming compounds. The rhodamine color-forming compounds exhibit a first color when in a crystalline form and a second color, different from the first color, when in an amorphous form. Thermal imaging members containing these color-formers are also described. | 04-28-2011 |
| 20140039202 | METHOD FOR SEPARATING AND PURIFYING GINKGOLIDE C FROM ROOT BARK OF GINKGO - Disclosed is a method for separating and purifying Ginkgolide C from root bark of ginkgo. The method comprises: ( | 02-06-2014 |
| 20150322027 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS - A monomer (1) is prepared by reacting a compound (9) with a base or metal to form a metal enolate reagent, and reacting the metal enolate reagent with an acyloxyketone compound (8). A polymer derived from the monomer is used as base resin to formulate a resist composition, which is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness in forming positive pattern via alkaline development and in forming negative pattern via organic solvent development. | 11-12-2015 |
