| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 526270000 | 5-membered heterocyclic ring compound contains at least one oxygen atom | 46 |
| 20090023878 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it - There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: | 01-22-2009 |
| 20090088545 | Polymerziable liquid crystal compound, polymerziable liquid crystal composition comprising the same, and polymer produced using them - This invention provides a polymerizable liquid crystal compound having an α-methylene-γ-butyrolactone site (for example, a polymerizable liquid crystal compound represented by formula (Z2)) useful as a material for optically anisotropic films such as optical compensation films and multidomain films, for example, in polarizing plates and phase difference plates for use in display devices such as liquid crystal display devices, and a polymerizable liquid crystal composition using the same, and their polymer and film. | 04-02-2009 |
| 20090143553 | TULIPALIN COPOLYMERS - Copolymers are disclosed comprising structural units derived from α-methylene-γ-butyrolactone, styrene, methyl methacrylate and acrylonitrile. The copolymers may be used as protective layers in multilayer articles that include UV sensitive substrate materials. The multilayer articles may also include a silicone hardcoat. | 06-04-2009 |
| 20090240015 | DIOL (METH) ACRYLATE COMPOUND HAVING URETHANE BOND, METHOD FOR PRODUCING THE SAME, AND POLYMER THEREOF - The present invention provides compounds having in their molecule a structure contributing to high hydrophilicity, and having high photopolymerizability, as well as polymers of such compounds, and a method for producing the compound. The compounds are diol (meth)acrylate having a urethane bond represented by the formula (1), and cyclic ketal (meth)acrylate having a urethane bond represented by the formula (2): | 09-24-2009 |
| 20090253881 | POLYMERIZABLE COMPOUND FOR PHOTORESIST, POLYMER THEREOF, AND PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER - The present invention provides a polymerizable compound having an alicyclic structure and a polymerizable group and represented by the general formula (1) or (19). The polymerizable compound exhibits high adhesion to substrates, reduced swelling during development, a reduced amount of water absorption during exposure in water, and high dry-etching resistance. Also provided are a polymer of such a polymerizable compound, a process for producing the same and a photoresist composition containing the polymer. | 10-08-2009 |
| 20100081778 | POLYCYCLIC ESTER CONTAINING CYANO GROUP AND LACTONE SKELETON - Disclosed is a polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): | 04-01-2010 |
| 20100081779 | DIOL (METH) ACRYLATE COMPOUND HAVING URETHANE BOND, METHOD FOR PRODUCING THE SAME, AND POLYMER THEREOF - The present invention provides compounds having in their molecule a structure contributing to high hydrophilicity, and having high photopolymerizability, as well as polymers of such compounds, and a method for producing the compound. The compounds are diol (meth)acrylate having a urethane bond represented by the formula (1), and cyclic ketal (meth)acrylate having a urethane bond represented by the formula (2): | 04-01-2010 |
| 20100099836 | PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS - Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low. | 04-22-2010 |
| 20100130713 | FURANONE COPOLYMERS - The present disclosure provides copolymers including a first monomer including at least one phospholipid possessing at least one vinyl group and a second monomer including a furanone possessing vinyl and/or acrylate groups. Compositions, medical devices, and coatings including such copolymers are also provided. | 05-27-2010 |
| 20100152401 | POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY USING THE SAME - Provided is a polymerizable compound represented by the following general formula (ca-1) or (cb-1): | 06-17-2010 |
| 20100210801 | COPOLYMER - Disclosed is a copolymer which includes at least monomer units corresponding to a vinyl monomer A containing a blocked isocyanate group and represented by following Formula (1); and monomer units corresponding to a vinyl monomer B containing a cyclic ether group having 3 to 5 members. The copolymer may further include monomer units corresponding to (meth)acrylic alkyl esters, aromatic vinyl compounds, hydroxyl-containing monomers, and/or carboxyl-containing monomers. In the formula, R | 08-19-2010 |
| 20100324245 | COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY AND PRODUCING METHOD THEREOF, AND COMPOSITION - In order to improve a resist pattern shape in a semiconductor lithography process, which is a factor largely affecting on a processing precision, an integration degree and yield, a copolymer for semiconductor lithography where a composition of a hydroxyl group-containing repeating unit in a low molecular weight region is controlled, and a method of producing the same are provided. | 12-23-2010 |
| 20110009586 | POLYMER, CURABLE RESIN COMPOSITION, CURED PRODUCT, AND ARTICLE - A polymer which has a radical polymerizable unsaturated group in a side chain and can be made a molecular design suitable for the purpose; a curable resin composition containing the polymer, which provides a cured product having high surface hardness after curing and hardly suffering from scratch; the cured product; and an article obtained by laminating the cured product are provided. | 01-13-2011 |
| 20110028667 | Copolymer and Ophthalmological Composition - The invention relates to a copolymer, which includes 20 to 95 percent by weight, based on the total weight of the copolymer, of structural units derived from at least one hydrophilic monomer, and 5 to 80 percent by weight, based on the total weight of the copolymer, of structural units derived from at least one monomer according to the general formula I | 02-03-2011 |
| 20110054133 | RESIST POLYMER, PREPARING METHOD, RESIST COMPOSITION AND PATTERNING PROCESS - A polymer for resist use is prepared by previously charging a reactor with a solution containing a chain transfer agent and holding at a polymerization temperature, and continuously or discontinuously adding dropwise a solution containing monomers and a polymerization initiator to the reactor for radical polymerization. The polymer has a minimized content of a substantially insoluble component. A resist composition using the polymer as a base resin produces a minimized number of defects when processed by photolithography and is useful in forming microscopic patterns. | 03-03-2011 |
| 20120172560 | POLYMERIZABLE LIQUID CRYSTAL COMPOUND, POLYMERIZABLE LIQUID CRYSTAL COMPOSITION, AND ORIENTED FILM - Since a polymerizable liquid crystal compound represented by the general formula (1) produces polymers exhibiting high optical anisotropy and high chemical resistance, and the optical anisotropy thereof exhibits low wavelength dependence, polymers obtained from a polymerizable liquid crystal composition comprising said polymerizable liquid crystal compound are useable as an optically anisotropic film for polarizers, wave plates, and the like, and are particularly best used in pattern formation that uses photolithography in air. | 07-05-2012 |
| 20120220742 | Furan-Based Curable Compound Derived from Biomass, Solvent-Free Curable Composition, and Method for Preparing Same - The present invention relates to a furan-based curable compound derived from carbohydrate-based biomass, to a solvent-free curable composition, and to a method for preparing thereof, wherein the furan-based curable compound derived from biomass according to the present invention includes two epoxide functional groups bonded to at least one furan-based compound. The present invention may provide an environmentally friendly next-generation curable compound comprising a novel furan-based compound derived from biomass, which may be substituted for curable materials derived from oil resources, as a basic backbone, as well as a composition containing the same. According to the present invention, a curable material, which has a low contraction ratio during curing as compared to conventional radical-type curing materials, may be obtained, and a compound applied to the novel curing material may be prepared with a combination of excellent efficiency and cost-effectiveness. | 08-30-2012 |
| 20120309918 | POLYPEPTIDES HAVING OXIDOREDUCTASE ACTIVITY AND THEIR USES - The invention relates to a polypeptide having oxidoreductase activity which comprises the amino acid sequence set out in SEQ ID NO: 3 or an amino acid sequence encoded by the nucleotide sequence of SEQ ID NO: 4, or a variant polypeptide thereof having 45% or more sequence identity with the sequence of SEQ ID NO: 3. The invention also relates to a process for the production of 2,5-furan-dicarboxylic acid (FDCA) or production of 5-hydroxymethyl-2-furancarboxylic acid (HMF acid). | 12-06-2012 |
| 20120316307 | FORMALDEHYDE FREE BINDERS - New polyols; oligomers, and polymers made from the polyols; and binders made from the new polyols, oligomers, or polymers that can be used in binders, where the binders typically include one or more polyols, and a polyfunctional acid or a polyfunctional nitrile. | 12-13-2012 |
| 20130109822 | FURAN BASED RESIN, PROCESS FOR THE PREPARATION THEREOF, AND USE OF THE COMPOUND | 05-02-2013 |
| 20130225778 | RADIOPAQUE SHAPE MEMORY POLYMERS FOR MEDICAL DEVICES - Radiopaque polymer compositions and methods for making the compositions are provided. These radiopaque polymer compositions include shape memory polymer compositions comprising a crosslinked polymer network, the network comprising a first repeating unit derived from a monofunctional iodinated monomer and a second repeating unit derived from a multifunctional non-iodinated monomer wherein neither of the two monomers is fluorinated. Devices formed from radiopaque polymer compositions are also provided. | 08-29-2013 |
| 20130253157 | IONOMERS AND IONICALLY CONDUCTIVE COMPOSITIONS FOR USE AS ONE OR MORE ELECTRODE OF A FUEL CELL - This invention relates to solid polymer electrolyte materials for use in one or more electrode of a fuel cell. The solid polymer electrolyte materials comprise one or more ionomer which comprises polymerized units of monomers A and monomers B, wherein monomers A are perfluoro dioxole or perfluoro dioxolane monomers, and the monomers B are functionalized perfluoro olefins having fluoroalkyl sulfonyl, fluoroalkyl sulfonate or fluoroalkyl sulfonic acid pendant groups, | 09-26-2013 |
| 20130317191 | PROCESSES FOR PREPARING DIACIDS, DIALDEHYDES AND POLYMERS - Alcohols are catalytically oxidized to aldehydes, in particular to benzaldehyde and diformylfuran, which are useful as intermediates for a multiplicity of purposes. The invention also relates to the polymerization of the dialdehyde and to the decarbonylation of the dialdehyde to furan. | 11-28-2013 |
| 20130317192 | PROCESSES FOR PREPARING DIACIDS, DIALDEHYDES AND POLYMERS - Alcohols are catalytically oxidized to aldehydes, in particular to benzaldehyde and diformylfuran, which are useful as intermediates for a multiplicity of purposes. The invention also relates to the polymerization of the dialdehyde and to the decarbonylation of the dialdehyde to furan. | 11-28-2013 |
| 20130331533 | POLYMER FOR LITHOGRAPHY - A copolymer obtained by polymerizing two or more types of monomers, wherein among fractions obtained by dividing an eluate showing peaks relative to the copolymer, in an elution curve obtained by gel permeation chromatography (GPC), into eight fractions in order of fractionation, such that each fraction has the same volume, a difference between a monomer composition ratio of a copolymer contained in a first eluted fraction and a monomer composition ratio of all copolymers is −3 mol % to +3 mol % in any of the constitutional units derived from the respective monomers. | 12-12-2013 |
| 20140024793 | POLYESTER PRODUCTION PROCESS AND APPARATUS - Provided is a polyester production process which provides the polyester with a suitable molecular weight capable of enduring various mold processings and which can inhibit the polymer from being colored due to side reactions in synthesis. | 01-23-2014 |
| 20140142267 | TONER FOR ELECTROSTATIC IMAGE DEVELOPMENT - A toner for electrostatic image development having sufficient low-temperature fixing properties, and excellent heat resistant storage stability and crush resistance is provided. In toner particles containing at least a binder resin, the binder resin contains a polymer having a structural unit represented by a general formula (1), wherein R | 05-22-2014 |
| 20140371412 | RESIST COPOLYMER AND RESIST COMPOSITION - Provided is a resist copolymer which has favorable sensitivity, enables a resist pattern to be formed to have a favorable shape, has favorable dry etching resistance when a dry etching is carried out using the resist pattern as a mask, and suppresses the surface roughness of a pattern formed by carrying out a dry etching process to a substrate. | 12-18-2014 |
| 20140371413 | CHEMICAL SEALING FILM - The present invention provides a chemical sealing film which has high chemical resistance and high breaking strength and which does not contain chlorine. | 12-18-2014 |
| 20150148507 | MONOMERS, POLYMERS AND ARTICLES CONTAINING THE SAME FROM SUGAR DERIVED COMPOUNDS - Disclosed herein are monomers formed by reacting a sugar derived compound(s) comprising a lactone and two hydroxyls with a compound(s) comprising an isocyanate and an acrylate or methacrylate. Polymers formed from such monomers, and articles formed from the polymers are also disclosed. | 05-28-2015 |
| 20160060374 | MONOMER HAVING N-ACYL CARBAMOYL GROUP AND LACTONE SKELETON, AND POLYMERIC COMPOUND - Disclosed is a monomer containing an N-acylcarbamoyl group and a lactone skeleton. The monomer is exemplified by Formula (1): | 03-03-2016 |
| 526271000 | Acid anhydride | 15 |
| 20080214764 | Modified Polyvinyl Alcohol and Process for Producing the Same - The present invention provides modified PVA having unsaturated double bonds derived from a specific monomer in the main chain of the molecule. | 09-04-2008 |
| 20080300374 | DINADIC PHENYL AMINE REACTIVE ENDCAPS - Dinadic phenyl amine reactive endcap monomers for application in high-temperature polymeric composites are described. The amine group of the endcap is directly reacted with a desired chemical backbone to provide the preferred rigidity and chemical resistance. The ability of the amine group to react with a wide variety of chemical backbones allows the tailoring of formulations for various application temperatures, mechanical properties, processes and resistances while retaining the high degree of crosslinking that yields excellent temperature stability, ease of processing and the necessary toughness. Polyimide oligomers comprising the reaction product of at least one dinadic phenyl amine endcap monomer and a chemical backbone, preferably with a molecular weight not exceeding about 1000-3000, suitable for high-temperature composites are described. The dinadic phenyl amine endcaps may be reacted with an acid anhydride capped precursor to form polyimide resins suitable for high-temperature composites. | 12-04-2008 |
| 20090005527 | PHOSPHONIC COMPOUNDS AND METHODS OF USE THEREOF - Described herein are methods for producing phosphonic compounds and compounds thereof. Stable compositions of unsaturated phosphonic acid monomers are also described. Additionally, the synthesis and use of new polymers produced from phosphonic acid monomers are presented. | 01-01-2009 |
| 20090176955 | Devolatilization of anhydride polymers - The present invention relates to the formation of low volatile anhydride-containing aromatic vinyl polymers by polymerizing the half ester of the anhydride with a vinyl aromatic monomer followed by devolatilizing the half-ester and reforming the anhydride at elevated temperatures and reduced pressures. | 07-09-2009 |
| 20100113728 | POLYOLEFIN POLYMER HAVING POLAR GROUP, METHOD FOR PRODUCTION THEREOF, AND WATER DISPERSION MATERIAL AND MOLD RELEASE AGENT COMPOSITION - To provide a polyolefin polymer having a polar group represented by Formula (i) produced by modifying, with a high modification ratio, a double bond in a polymer having the double bond at one terminal, both terminals, or at the inside of a polymer chain thereof that is obtained by a known method; a method for producing the polyolefin polymer; and a water dispersion material and a mold release agent composition each containing the polyolefin polymer, | 05-06-2010 |
| 20100168361 | PHOSPHONIC POLYMERS HAVING A PHOSPHINATE BACKBONE AND METHODS OF MAKING AND USING THEREOF - Described herein are new phosphonic polymers and methods of making and using the same. The polymers are prepared by the polymerization of phosphonic acid monomers with hypophosphorous acid, an alkali metal hypophosphite, an alkyl substituted hypophosphite, or any combination thereof. The resultant polymers have pendant phosphonate groups attached to the polymer backbone as well as phosphinate groups incorporated within the polymer backbone. Additional monomers can be used to produce copolymers, terpolymers, and the like. The polymers described herein have numerous applications with respect to inhibiting scale formation and corrosion in a number of systems. | 07-01-2010 |
| 20100210802 | Process for making improved aliphatic dicarboxylic acid copolymers - The present invention relates to the production of aqueous solutions or dispersions of high molecular weight, high solids copolymers of aliphatic dicarboxylic acids, especially maleic acid, with α,β-ethylenically unsaturated monomers having carboxyl or sulfonic acid groups, such as (meth)acrylic acid or 2-acrylamido-2-methyl propane sulfonic acid (AMPS), respectively, which solutions or dispersions have a very low residual content of unpolymerized dicarboxylic acid monomer. | 08-19-2010 |
| 20140256897 | LOW VISCOSITY SUSPENDING VINYL COPOLYMERS - A rheology modifier copolymer of formula (I), wherein A is a macromonomer; B is an acrylic or methacrylic acid or salt thereof; C is a polyacidic vinyl monomer selected from maleic, fumaric, itaconic, citraconic and acids combinations thereof and anhydrides and salts thereof; and D optionally when present is a crosslinking monomer. | 09-11-2014 |
| 20150094438 | PROCESS FOR THE PRODUCTION OF METHACRYLIC ACID AND ITS DERIVATIVES AND POLYMERS PRODUCED THEREFROM - A process for the production of methacrylic acid by the base catalysed decarboxylation of at least one dicarboxylic acid selected from itaconic, citraconic or mesaconic acid or mixtures thereof is described. The decarboxylation is carried out at a temperature in the range from 100 to 199° C. A method of preparing polymers or copolymers of methacrylic acid or methacrylic acid esters is also described. | 04-02-2015 |
| 20150329513 | LARGE MOLECULE AND POLYMER FLAME RETARDANTS - Disclosed herein are flame retardant compounds and polymer compositions containing these flame retardant compounds. The flame retardant compounds can be derived from biological sources and can include coordinated metal ions. | 11-19-2015 |
| 526272000 | Interpolymerized with hydrocarbon monomer | 5 |
| 20090036625 | Amphiphilic Polymer, Method for Forming the Same and Application thereof - The present invention discloses an amphiphilic polymer, comprising a polymer backbone, at least one hydrophobic side chain, and at least one hydrophilic side chain wherein one end of the hydrophobic side chain is bound to the polymer backbone and one end of the hydrophilic side chain is bound to the polymer backbone. The polymer backbone is derived from a homopolymer or copolymer of an anhydride. In addition, the present invention discloses a water-soluble polymer micell having the above described amphiphilic polymer and forming method and applications thereof. | 02-05-2009 |
| 20110021729 | Methods of Purifying Poly(Styrene-co-Maleic Anhydride/Acid) - The present invention relates in part to poly(styrene-co-maleic anhydride/acid) copolymers having high purity, for example, having low amounts of maleic acid, maleic anhydride, and/or styrene. The present invention also relates in parts to methods of purifying poly(styrene-co-maleic anhydride/acid) copolymers to remove the residual monomers and low molecular weight fragments. | 01-27-2011 |
| 20110130535 | Thermoplastic Acrylic Resin, and Molded Product Thereof - The present invention provides a thermoplastic acrylic resin of a copolymer comprising 10 to 70% by weight of a repeating unit derived from the particular methacrylate monomer, 5 to 40% by weight of a repeating unit derived from the particular vinyl aromatic monomer, and 20 to 50% by weight of a repeating unit of the particular cyclic acid anhydride, characterized in that a molar ratio (B/A) is within the range of more than 1 to not more than 10, wherein (A) is a content of the repeating unit of the vinyl aromatic monomer and (B) is a content of the repeating unit of the cyclic acid anhydride, and the total amount of remaining monomers to 100 parts by weight of the copolymer is not more than 0.5 part by weight. | 06-02-2011 |
| 20110184140 | COPOLYMER COMPRISING ALKENE, ACRYLATE AND UNSATURATED ORGANIC ACID, AND METHOD FOR PREPARING THE SAME - The present invention provides a copolymer that includes at least one alkene monomer, at least one acrylate monomer and at least one the unsaturated organic acid monomer having one or more double bonds, and a method of manufacturing the same. | 07-28-2011 |
| 20160152748 | Cationic Polymerization Process For The Synthesis Of Nano-Structured Polymers Containing Graphene | 06-02-2016 |
