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Two or more compounds containing -OH groups, or with water NRM

Subclass of:

524 - Synthetic resins or natural rubbers -- part of the class 520 series

524000000 - SYNTHETIC RESINS (CLASS 520, SUBCLASS 1)

524000000 - PROCESSES OF PREPARING A DESIRED OR INTENTIONAL COMPOSITION OF AT LEAST ONE NONREACTANT MATERIAL AND AT LEAST ONE SOLID POLYMER OR SPECIFIED INTERMEDIATE CONDENSATION PRODUCT, OR PRODUCT THEREOF (Class 523, subclass 1)

524001000 - Adding a NRM to a preformed solid polymer or preformed specified intermediate condensation product, composition thereof; or process of treating or composition thereof

524080000 - DNRM which is other than silicon dioxide, glass, titanium dioxide, water, halohydrocarbon, hydrocarbon, or elemental carbon

524081000 - Organic DNRM

524379000 - Carbon atom single bonded to an oxygen atom and wherein the carbon atom is not double bonded to a chalcogen atom DNRM, e.g., alcohols, etc.

Patent class list (only not empty are listed)

Deeper subclasses:

Class / Patent application numberDescriptionNumber of patent applications / Date published
524389000 Two or more compounds containing -OH groups, or with water NRM 7
20110301271TWO-LIQUID TYPE URETHANE PAINT COMPOSITION - Disclosed is a two-liquid type urethane paint composition having a main agent which includes a hydroxyl group-containing resin (A), a hydrolyzable ester compound (B) and an alcohol-based solvent (C); and a curing agent which includes a polyisocyanate compound (D). The composition is made by mixing together the main agent and the curing agent, wherein the (B) component and the (C) component are included in the main agent in amounts from 2 to 35 parts by mass as effective component of the hydrolyzable ester compound (B) and from 2 to 10 parts by mass of the alcohol-based solvent (C) per 100 parts by mass of solid fraction of the hydroxyl group-containing resin (A), and the hydroxyl groups of the hydroxyl group-containing resin (A) and the functional groups of the polyisocyanate compound (D) are mixed in proportions of from 0.5 to 1.5 as the mol ratio of NCO/OH.12-08-2011
20130289185ALCOHOL-BASED PRINTING INK COMPOSITION - An alcohol-based printing ink composition comprising: a polyurethane urea resin (D) that is obtained by a reaction of polyol (A), diisocyanate (B), and a chain extender (C); a coloring agent (E); and a medium comprising an alcohol (F) and water, wherein the polyol (A) contains polyether polyol (A1) and polyester polyol (A2), and the medium comprises 75% by weight or more of alcohol (F).10-31-2013
20130324655DISPERSANT FOR SUSPENSION POLYMERIZATION, VINYL CHLORIDE RESIN AND METHOD FOR PRODUCING SAME - Provided are a dispersant for suspension polymerization that is superior in basic properties as primary dispersant: i.e., of giving a vinyl chloride resin with lower fish eye-forming tendency and higher bulk specific density, gives low aqueous solution viscosity and is superior in processability during solubilization, a vinyl chloride resin prepared by using the same and a production method for the resin.12-05-2013
20130338288GLASS FIBER STRUCTURE DESIGNED TO REINFORCE BONDED ABRASIVE ARTICLES - The invention relates to a structure based on glass fiber coated with a resin composition designed to reinforce bonded abrasive articles, the resin composition including the following constituents in the proportions indicated, expressed in percentage by weight of solid matter: 12-19-2013
20140114002DIELECTRIC COMPOSITION FOR THIN-FILM TRANSISTORS - An electronic device, such as a thin-film transistor, includes a substrate and a dielectric layer formed from a dielectric composition. The dielectric composition includes a dielectric material, a crosslinking agent, and a thermal acid generator. In particular embodiments, the dielectric material comprises a lower-k dielectric material and a higher-k dielectric material. When deposited, the lower-k dielectric material and the higher-k dielectric material form separate phases. The thermal acid generator allows the dielectric layer to be cured at relatively lower temperatures and/or shorter time periods, permitting the selection of lower-cost substrate materials that would otherwise be deformed by the curing of the dielectric layer.04-24-2014
20140221542CROSSLINKABLE COMPOSITION CROSS-LINKABLE BY REAL MICHAEL ADDITION REACTION AND RESINS FOR USE IN SAID COMPOSITION - An RMA crosslinkable composition having at least one crosslinkable component including reactive components A and B each including at least 2 reactive groups, the at least 2 reactive groups of component A being acidic protons (C—H) in activated methylene or methine groups and the at least 2 reactive groups of component B are activated unsaturated groups (C═C) and a base catalyst (C) which reactive components A and B crosslink by Real Michael Addition (RMA) reaction under action of the base catalyst, characterised in that the at least one crosslinkable component including reactive components A and B in the composition have a total hydroxy number of less than 60, preferably less than 40 and more preferably less than 20 mg KOH/g solids. Further, specific resins A and B having a low hydroxy number for use in RMA cross-linkable compositions and a process for the manufacture thereof.08-07-2014
20160002485INORGANIC FILM AND MULTILAYER STRUCTURE - Disclosed is an inorganic film comprising an inorganic laminar compound and a resin, characterized in that when an image observed with a transmission electron microscope of a cross section of the inorganic film including the thickness direction of the film is subjected to image processing to classify into 256 levels of shade on the gray scale, and subsequently, at each of arbitrary five or more points of the image-processed observed image, a straight line is drawn parallel with the thickness direction of the inorganic film from one surface of the inorganic film to the other surface, and then linear analysis is performed along each of the straight lines, the average value of standard deviations of degrees relative to the degree of each shade determined from the results of the linear analysis is 15 or less.01-07-2016
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