| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 522040000 | Containing C-CO-CHOH, e.g., benzoin, etc. | 10 |
| 20090030102 | METHOD OF FORMING A CROSSLINKED POLYMER GEL - The present invention relates to a method of forming a crosslinked polymer gel, to a polymer gel produced by such method and to uses of such polymer gel. | 01-29-2009 |
| 20090069459 | DUAL CURE COMPOSITION - A liquid radiation and thermally curing composition characterized in, that said composition comprises at least one ester between at least one tri or polyalcohol and acrylic and/or methacrylic acid, which ester has at least two hydroxyl groups, at least one acrylic or methacrylic double bond, a hydroxyl value of 50-500 mg KOH/g and a double bond concentration of 1-10 mmoles/g, at least one crosslinking agent for hydroxyl functional compounds, which crosslinking agent optionally has at least one olefinic double bond, and an additive package comprising at least one photoinitiator, radical scavenger, light stabilizer, wetting agent and/or leveling agent, and optionally at least one monomeric or oligomeric reactive diluent. | 03-12-2009 |
| 20090163614 | COATING COMPOSITIONS AND CURING METHOD THEREOF - The invention provides a coating composition comprising a thermal plastic resin selected from the group consisting of a polycycloolefin resin, polyester resin, polyacrylate resin, and a mixture thereof; and a radiation curable resin comprising a radiation polymer containing at least one mono- or multi-functional acrylic acid based monomer as a polymerization unit, an oligomer containing an ethylenically unsaturated functional group, and a photoinitiator, wherein the radiation curable resin is used in an amount of 220-1000% by weight on the basis of the weight of the thermal plastic resin. The invention improves the hardness of the coating composition, prevent the coated substrate from being scratched or impaired, and impart the substrate with high transparency without causing warping problem. | 06-25-2009 |
| 20090215919 | MATERIAL COMPRISING POLYROTAXANE AND POLYMER AND PROCESS FOR PRODUCING THE SAME - A material which comprises a polyrotaxane and a polymer and is crosslinked by irradiation with light. In the material, which comprises a first polyrotaxane and a polymer, the first polyrotaxane comprises a first cyclic molecules, a first linear molecule with which the first cyclic molecules are clathrated in a splitted state, and first blocking groups disposed respectively at both ends of the first linear molecule so as to prevent the first cyclic molecules from being released from the first linear molecule. The first polyrotaxane combines with at least part of the polymer through the first cyclic molecules by photocrosslinking reaction. | 08-27-2009 |
| 20100222448 | AQUEOUS POLYURETHANE DISPERSION - Disclosed is an aqueous polyurethane dispersion obtained by dispersing in water a reaction product obtained by reacting a reaction mixture comprising at least one organic, aliphatic, cycloaliphatic or aromatic di, tri or poryisocyanate, at least one isocyanate reactive polycarbonate diol, triol or polyol, at least one compound comprising at least one isocyanate reactive group and at least one free radically polymerisable unsaturated group, and at least one compound comprising at least one isocyanate reactive group and at least one at least dispersing active group, and optionally at least one compound comprising at least two isocyanate reactive groups and having a molecular weight of less than 1000 g/mol. | 09-02-2010 |
| 20100280143 | SEALANT COMPOSITION - A sealant composition is provided. The sealant composition includes (a) an oligomer including an unsaturated mono-carboxylic acid modified bisphenol A epoxy resin and an unsaturated mono-carboxylic acid modified bisphenol F epoxy resin, wherein an equivalence ratio of the bisphenol A epoxy resin to the bisphenol F epoxy resin is 0.05:0.95 to 0.3:0.7, the bisphenol A epoxy resin has a melting point higher than 40° C. and the bisphenol F epoxy resin has a melting point lower than 40° C.; (b) an epoxy resin having at least two or more than two epoxy groups; and (c) a photoinitiator. | 11-04-2010 |
| 20110130483 | COATING AGENT FOR POLY(METHYL METHACRYLATE) PANEL NANO IMPRINTING AND METHODS OF USE - Disclosed is a coating agent for poly(methyl methacrylate) (PMMA) panel nano imprinting, more particularly, a coating agent for PMMA panel nano imprinting comprising a UV curable resin, a photoinitiator, an additive for surface modification and a weather-resistant stabilizer. | 06-02-2011 |
| 20110251299 | PHOTO-ENFORCED STRATIFICATION OF POLYMERIC MATERIALS - The invention provides a process for manufacturing a polymeric material having a compositional gradient, comprising: forming a mixture comprising a first photopolymerizable polymer precursor and a second photopolymerizable precursor, and subjecting said mixture to an intensity gradient of electromagnetic radiation, wherein said first precursor has a greater reactivity ratio than said second precursor, and/or said first precursor is mono-functional and said second precursor is di-functional, and/or said first precursor is less inhibited by oxygen than said second precursor. | 10-13-2011 |
| 20120232182 | NANOIMPRINT RESIST - A nanoimprint resist includes a hyperbranched polyurethane oligomer, a perfluoropolyether, a methylmethacrylate, a diluent solvent, and a photo initiator. The hyperbranched polyurethane oligomer can be polymerized by a copolymerization of trimellitic anhydride, ethylene mercaptan, and epoxy acrylic acid. The hyperbranched polyurethane oligomer can also be polymerized by a ring-opening copolymerization epoxy acrylic acid and ethylene glycol. | 09-13-2012 |
| 20150025170 | Hydrogel Adhesion to Molded Polymers - Methods for adhering a hydrogel matrix to a molded polymer substrate and its use as a biosensor, e.g., a continuous or episodic glucose monitor, are disclosed. The presently disclosed subject matter provides a method for adhering a hydrogel matrix to a molded polymer substrate, the method comprising: (a) molding a polymer comprising one or more polymer chains with an oxidizer to form a molded polymer substrate; (b) providing a hydrogel matrix comprising a hydrogel, a component comprising one or more acrylate groups or another functional group that can form one or more radicals upon polymerization in the molded polymer substrate, and a photo initiator; (c) combining the molded polymer substrate and the hydrogel matrix; and (d) curing the combined molded polymer substrate and hydrogel matrix for a period of time. | 01-22-2015 |
