Class / Patent application number | Description | Number of patent applications / Date published |
451529000 | Sectional | 25 |
20080207100 | Customized polishing pads for CMP and methods of fabrication and use thereof - The present application relates to polishing pads for chemical mechanical planarization (CMP) of substrates, and methods of fabrication and use thereof. The pads described in this invention are customized to polishing specifications where specifications include (but not limited to) to the material being polished, chip design and architecture, chip density and pattern density, equipment platform and type of slurry used. These pads can be designed with a specialized polymeric nano-structure with a long or short range order which allows for molecular level tuning achieving superior thermo-mechanical characteristics. More particularly, the pads can be designed and fabricated so that there is both uniform and nonuniform spatial distribution of chemical and physical properties within the pads. In addition, these pads can be designed to tune the coefficient of friction by surface engineering, through the addition of solid lubricants, and creating low shear integral pads having multiple layers of polymeric material which form an interface parallel to the polishing surface. The pads can also have controlled porosity, embedded abrasive, novel grooves on the polishing surface, for slurry transport, which are produced in situ, and a transparent region for endpoint detection. | 08-28-2008 |
20130005229 | METHOD AND APPARATUS FOR POLISHING WITH ABRASIVE CHARGED POLYMER SUBSTRATES - An abrasive article for polishing a surface of a workpiece. The abrasive article includes a plurality of polishing islands arranged to interact with a workpiece to maintain a substantially constant contact area. Abrasive features are associated with at least some of the plurality of polishing islands. The abrasive features apply cutting forces to the work piece during motion of the abrasive article relative to the workpiece. | 01-03-2013 |
20130244554 | Universal Abrasive Sheet - A universal abrasive sheet is provided for a sanding or polishing machine and includes segments defined by weakened regions that allow portions of the universal abrasive sheet to be removed in order to adapt the abrasive sheet to alternative platent configurations. Each of the different configurations of the universal abrasive sheet can be provided with an individualized tip portion which can be separated from a body portion and either repositioned or replaced in order to change the working point of the tip portion when it becomes worn out. | 09-19-2013 |
20130303062 | FLOOR TREATMENT DEVICE AND METHOD FOR MANUFACTURING SAME - A floor treatment device includes a pad ( | 11-14-2013 |
20130324020 | POLISHING PAD WITH POLISHING SURFACE LAYER HAVING AN APERTURE OR OPENING ABOVE A TRANSPARENT FOUNDATION LAYER - Polishing pads with a polishing surface layer having an aperture or opening above a transparent foundation layer are described. In an example, a polishing pad for polishing a substrate includes a foundation layer having a global top surface and a transparent region. A polishing surface layer is attached to the global top surface of the foundation layer. The polishing surface layer has a polishing surface and a back surface. An aperture is disposed in the polishing pad from the back surface through to the polishing surface of the polishing surface layer, and aligned with the transparent region of the foundation layer. The foundation layer provides an impermeable seal for the aperture at the back surface of the polishing surface layer. Methods of fabricating such polishing pads are also described. | 12-05-2013 |
20130324021 | DIAMOND IMPREGNATED POLISHING PAD WITH DIAMOND PUCKS - An abrasive pad for use on hard surfaces is described. The pad includes a fibrous, non-woven body with an abrasive coating containing diamond particles applied to a first side thereof. A plurality of diamond-impregnated abrasive elements is affixed to the first side. One or more of the abrasive elements are located near an outer edge of the first side of the pad. A resilient reinforcing material is applied to the outer edge of the pad to resist compression of the pad and to maintain adjacent abrasive elements parallel to a surface being worked on. The abrasive elements at least partially recess into the pad body and enable simultaneous contact of the abrasive elements and the pad with the surface being worked on. Thereby, multiple surface-preparation steps, e.g. polishing and burnishing, are completed simultaneously reducing surface-preparation time and eliminating separate surface-preparation steps. | 12-05-2013 |
20130344785 | SURFACE TREATING DEVICE - A surface treating device includes an open lofty non-woven layer ( | 12-26-2013 |
20130344786 | COATED ABRASIVE ARTICLE HAVING ROTATIONALLY ALIGNED FORMED CERAMIC ABRASIVE PARTICLES AND METHOD OF MAKING - A coated abrasive article having a plurality of formed ceramic abrasive particles each having a surface feature. The plurality of formed ceramic abrasive particles attached to a flexible backing by a make coat comprising a resinous adhesive forming an abrasive layer. The surface feature having a specified z-direction rotational orientation, and the specified z-direction rotational orientation occurs more frequently in the abrasive layer than would occur by a random z-direction rotational orientation of the surface feature. | 12-26-2013 |
20140017984 | Abrasive Article and Method Of Forming - An abrasive article including a substrate having an elongated body, a tacking layer overlying the substrate, a first type of abrasive particle overlying the tacking layer, a second type of abrasive particle different than the first type of abrasive particles overlying the tacking layer, and a bonding layer overlying at least a portion of one of the first type of abrasive particle and the second type of abrasive particle and the tacking layer. | 01-16-2014 |
20140038502 | NONWOVEN FABRIC POLISHING ROLL AND METHOD OF MANUFACTURING SAME - To provide a nonwoven fabric polishing roll that can reduce the occurrence of polishing defects and carry out uniform polishing. A nonwoven fabric polishing roll having a through hole in to which a rotation shaft of a polishing machine is inserted, and the internal surface of the through hole engages with the rotation shaft so that the torque of the rotation shaft is transmitted, the nonwoven fabric polishing roll comprising: a plurality of circular nonwoven fabrics having an aperture in the center thereof that forms the through hole; and a plurality of circular plates having an aperture in the center thereof that forms the through hole, and having an outer diameter that is smaller than the outer diameter of the circular nonwoven fabric, wherein the plurality of circular nonwoven fabric and the plurality of the circular plates are stacked so that one or two or more of the circular nonwoven fabrics are sandwiched on their aperture side by the circular plates, and bonded together with adhesive while compressed in the stacking direction, and the compression deformation ratio of the circular plates with respect to pressure forces from a direction normal to the stacking direction is smaller than that of the circular nonwoven fabric. | 02-06-2014 |
20140045414 | SURFACE MACHINING TOOL - A tool for the roughing and/or polishing of hard surfaces such as stone, marble or the like, is described. The tool is usable in association with hand-operated machines, such as an angle grinder or the like, for manual treatment of surfaces by an operator. In particular, the tool provides a roughing and/or polishing tool whose flexibility and safety level is extremely high. | 02-13-2014 |
20140113534 | Multi Grit Anti Chatter Sand Paper - A sanding paper for use with a floor sander having one direction sanding comprising a paper sleeve or belt having a length and a width and a first surface and a second surface joined together and running parallel along the length of the sand paper wherein the first surface is disposed on the sander to apply to the floor first and the second to follow immediately thereafter and wherein the first surface has a grit which is more coarse than the second surface. The sanding paper first grit is a grit between 24-60 and the second grit is between 80 and 120 grit. In place of a middle grit, The intermediate surface between the first surface and second surface and wherein the first surface is between 24 and 40 grit, the intermediate surface between 41 and 80 grit and the third surface between 80 and 120 grit. | 04-24-2014 |
20140141704 | POLISHING PAD - A polishing pad includes at least a polishing layer including a groove, on a polishing surface, having side surfaces, wherein at least one of the side surfaces includes a first side surface that extends continuously to the polishing surface and forms an angle α with the polishing surface, and a second side surface that extends continuously to the first side surface and forms an angle β with a plane parallel to the polishing surface, the angle α is larger than 95 degrees, the angle β is larger than 95 degrees, and the angle β is smaller than the angle α, and a bending point depth from the polishing surface to a bending point between the first side surface and the second side surface is more than 0.2 mm and not more than 3.0 mm. | 05-22-2014 |
20140206268 | POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS - Polishing pads having a polishing surface with continuous protrusions are described. Methods of fabricating polishing pads having a polishing surface with continuous protrusions are also described. | 07-24-2014 |
20140273777 | POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS HAVING TAPERED SIDEWALLS - Polishing pads having a polishing surface with continuous protrusions having tapered sidewalls are described. Methods of fabricating polishing pads having a polishing surface with continuous protrusions having tapered sidewalls are also described. | 09-18-2014 |
20140308884 | COATED ABRASIVE ARTICLE AND METHOD OF MAKING THE SAME - Provided are abrasive articles in which the make layer, abrasive particle layer, and size layer are coated onto a backing according to a coating pattern characterized by a plurality of discrete islands. The coating pattern has features in which all three components are generally in registration with each other, while providing a pervasive uncoated area extending across the backing. Advantageously, this configuration provides a coated abrasive that displays superior curl-resistance compared with previously disclosed abrasive articles. Moreover, this configuration resists loading, resists de-lamination, has enhanced flexibility, and decreases the quantity of raw materials required to achieve the same level of performance as conventional abrasive articles. | 10-16-2014 |
20150038066 | LOW DENSITY POLISHING PAD - Low density polishing pads and methods of fabricating low density polishing pads are described. In an example, a polishing pad for polishing a substrate includes a polishing body having a density of less than 0.5 g/cc and composed of a thermoset polyurethane material. A plurality of closed cell pores is dispersed in the thermoset polyurethane material. | 02-05-2015 |
20150065020 | CUSTOMIZED POLISHING PADS FOR CMP AND METHODS OF FABRICATION AND USE THEREOF - The present application relates to polishing pads for chemical mechanical planarization (CMP) of substrates, and methods of fabrication and use thereof. The pads described in this invention are customized to polishing specifications where specifications include (but not limited to) to the material being polished, chip design and architecture, chip density and pattern density, equipment platform and type of slurry used. These pads can be designed with a specialized polymeric nano-structure with a long or short range order which allows for molecular level tuning achieving superior themo-mechanical characteristics. More particularly, the pads can be designed and fabricated so that there is both uniform and nonuniform spatial distribution of chemical and physical properties within the pads. In addition, these pads can be designed to tune the coefficient of friction by surface engineering, through the addition of solid lubricants, and creating low shear integral pads having multiple layers of polymeric material which form an interface parallel to the polishing surface. The pads can also have controlled porosity, embedded abrasive, novel grooves on the polishing surface, for slurry transport, which are produced in situ, and a transparent region for endpoint detection. | 03-05-2015 |
20150126098 | COATED ABRASIVE ARTICLE - Provided are abrasive articles in which the make layer, abrasive particle layer, and size layer are coated onto a backing according to a coating pattern characterized by a pattern of discrete islands, or features, having an areal density ranging from about 30 features to about 300 features per square centimeter and an average feature diameter ranging from about 0.1 millimeters to about 1.5 millimeters. Optionally, the provided abrasive particles have an average abrasive particle size ranging from about 20 micrometers to about 250 micrometers and the average make layer thickness ranging from 33 percent to 100 percent of the average abrasive particle size. This coating pattern provides that all three components are generally in registration with each other, while also providing a pervasive uncoated area extending across the backing, thereby providing improved cut and finish performance while displaying a resistance to curl in wet environments. | 05-07-2015 |
20150126099 | PRINTED CHEMICAL MECHANICAL POLISHING PAD HAVING ABRASIVES THEREIN - A method of fabricating a polishing layer of a polishing pad includes determining a desired distribution of particles to be embedded within a polymer matrix of the polishing layer. A plurality of layers of the polymer matrix is successively deposited with a 3D printer, each layer of the plurality of layers of polymer matrix being deposited by ejecting a polymer matrix precursor from a nozzle. A plurality of layers of the particles is successively deposited according to the desired distribution with the 3D printer. The polymer matrix precursor is solidified into a polymer matrix having the particles embedded in the desired distribution. | 05-07-2015 |
20150126100 | Polishing Pad with Secondary Window Seal - A polishing article has a polishing surface and an aperture, the aperture including a first section and a second section. The polishing article includes a projection extending inwardly into the aperture. The polishing article includes a lower portion on a side of the first surface farther from the polishing surface. A window has a first portion positioned in the first section of the aperture and a second portion extending into the second section of the aperture. The window has a second surface substantially parallel to the polishing surface. A first adhesive adheres the first surface of the projection to the second surface of the window to secure the window to the projection and a second adhesive of different material composition than the first adhesive. The second adhesive is positioned laterally between the second portion of the window and the lower portion of the polishing article. | 05-07-2015 |
20150290774 | MULTI-PURPOSE SANDPAPER DESIGN AND USES THEREOF - Multi-purpose sandpaper sheets and rolls are disclosed that include: at least four corners, wherein at least one of the at least four corners has a rounded or non-squared configuration, a plurality of abrasive materials, a backing material, wherein the plurality of abrasive materials are affixed to the backing material; and at least one perforation, score or combination thereof, wherein the at least one perforation, score or combination thereof allows the sheet to be folded on a straight line along the at least one perforation, score or combination thereof. Sandpaper rolls and dispensers are also disclosed herein. In addition, multi-purpose sandpaper sheets and rolls are disclosed that include: at least four corners, a plurality of abrasive materials, a backing material, wherein the plurality of abrasive materials are affixed to the backing material; and at least one perforation, score or combination thereof, wherein the at least one perforation, score or combination thereof allows the sheet to be folded on a straight line along the at least one perforation, score or combination thereof. | 10-15-2015 |
20150343605 | FLEXIBLE GRINDING PRODUCT WITH FLATTENED SURFACE AND METHOD FOR MANUFACTURING THE SAME - A method of manufacturing a flexible grinding product comprises the steps: a) preparing an open cloth of knitted or woven fabric; b) applying a coating to one surface of the cloth, wherein the coated surface of the cloth has one or more flat portions; c) applying a grinding agent to the coated surface of the cloth. Further, a flexible grinding product has an open cloth, wherein a surface of the cloth is provided with a coating such that the coated surface has one or more flat areas which are at least partially provided with a grinding agent. | 12-03-2015 |
20160059388 | SANDING CLOTHS - A sanding cloth is provided. The sanding cloth comprises a sheet of pliable material having a first side and a second side. An amount of first is adhesive applied to the first side of the sheet. A first grit material is applied to the first adhesive wherein the sheet is easily pliable and conformable to tight fine spaces that are sanded when preparing trim moldings, furniture refinishing and similar finish applications. | 03-03-2016 |
20160107288 | PRINTED CHEMICAL MECHANICAL POLISHING PAD - A method of fabricating a polishing layer of a polishing pad includes successively depositing a plurality of layers with a 3D printer, each layer of the plurality of polishing layers deposited by ejecting a base material from a first nozzle and an additive material from a second nozzle and solidifying the base and additive material to form a solidified pad material. | 04-21-2016 |