| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 432253000 | ACCESSORY MEANS FOR HOLDING, SHIELDING OR SUPPORTING WORK WITHIN FURNACE | 41 |
| 20100028822 | SEAL HARDENING FURNACE OF LIQUID CRYSTAL DISPLAY DEVICE HAVING RACK BAR - A seal hardening furnace is presented in which seal lines in a liquid crystal display panel are hardened. The seal hardening furnace includes a cassette having a rack bar structure. The rack bar structure has rack bars for supporting the substrate along one direction and rack bar supports at ends of the rack bars that support the rack bars. The rack bars have air discharge openings therein. An air injecting passage is connected to the rack bar supports. An air supply unit supplies air through the air injecting passage and through the discharge openings to support the substrate thereon. | 02-04-2010 |
| 20100129761 | WAFER SUPPORT JIG, VERTICAL HEAT TREATMENT BOAT INCLUDING WAFER SUPPORT JIG, AND METHOD FOR MANUFACTURING WAFER SUPPORT JIG - The present invention provides a wafer support jig having at least a support surface on which a treatment target wafer is mounted and supported when performing a heat treatment, wherein skewness R | 05-27-2010 |
| 20110117514 | Silicon Firnaceware for Stressed Film - A method of fabricating the semiconductor wafer processing fixtures for having longer longevity on high stressed film applications such as LPCVD-SiN, silicon carbide and other ceramics than that of non-processed parts. One aspect of the invention includes nitriding, oxidizing, or carbiding a surface layer of a polysilicon part, such as furnaceware, for converting silicon to a silicon compound and its converted surface covers and masks the underlying polycrystalline structure. A plasma immersion ion implantation of a heavy noble gas or carbon, silicon or nitrogen is followed by to form high-energy states creating gettering states adjacent the surface and the ion implanted region serves to anchor production layers such as LPCVD-SiN forming on the polysilicon part. As a result of gettering effect, tightly bonded high stressed film onto a polysilicon part allows the CVD deposition of much thicker films without peeling or cracking as long as the gettering effect remains. | 05-19-2011 |
| 20110294087 | HEATING PLATE FOR HEATING A SHEET - The heating plate for heating a sheet in a thermoforming machine prior to forming comprises a highly heat-conductive support plate having a working surface, a heating means connected to the support plate, and a wear layer formed as a replaceable wear plate, which is held magnetically to the working surface of the support plate. | 12-01-2011 |
| 20120077138 | Low Thermal Mass Semiconductor Wafer Boat - A wafer boat for a semiconductor wafer includes vertical rods, fingers supported by the vertical rods, and plates supported by the fingers. The plate has a support surface for supporting the wafer and a recessed surface spaced from the support surface and spaced from the wafer. A plurality of holes extends from the recessed surface, and the support surface is free of holes to inhibit contamination of the wafer. | 03-29-2012 |
| 20120088203 | Heat Treatment Apparatus and Heat Treatment Method - Disclosed is a heat treatment apparatus which includes a plurality of first disposing support members having an extendable elastic member to provide a first gap distance between a substrate disposing surface of a heat treatment plate and the rear surface of the substrate; a plurality of second disposing support members providing a second gap distance, which is smaller than the first gap distance, between the substrate disposing surface and the rear surface of the substrate; and a plurality of suction holes disposed at the substrate disposing surface of the heat treatment plate and sucking a space of the gap between the substrate disposing surface and the rear surface of the substrate, in which the substrate supported on the first disposing support member is sucked by the suction holes, such that the first disposing support member is contracted and the substrate is supported on the second disposing support member. | 04-12-2012 |
| 20120178040 | Apparatus and method for use in firing cores - Apparatus and method for use in firing a ceramic casting core includes a saggar and a core setter insert disposed in the saggar. The core setter insert can be disposed on a refractory particulate grog bed and/or refractory supports inside the saggar on a bottom wall of the saggar. The core setter insert has a core-receiving surface, which can have an airfoil shape to receive an airfoil-shaped ceramic casting core used in casting hollow airfoil castings. | 07-12-2012 |
| 20130224675 | ELECTROSTATIC CHUCK DEVICE AND CONTROL METHOD THEREOF - An electrostatic chuck device includes a surface to support a substrate, an electrode to generate electrostatic force for the substrate, and a plurality of heaters to heat different regions of the surface. The plurality of heaters include a first heater to heat a first region to a first temperature, a second heater to heat a second region to a second temperature, and a third heater to heat a third region to a third temperature between the first and second temperatures. The second region is closer to a peripheral area of the surface than the first region, and the third region between the first and second regions. | 08-29-2013 |
| 20130252191 | TOOLING FOR SUPPORTING METAL PARTS DURING HEAT TREATMENT - A support tooling for supporting at least one metal part that is to be subjected to heat treatment or shaped while hot, the tooling including: a stationary support structure presenting a determined shape that corresponds to the general shape of each metal part that is to be supported; first holder elements arranged on one side of each part; second holder elements arranged on the other side of each part; and at least one spring type resilient element placed between the support structure and each first or second holder element so as to hold the part throughout the duration of heat treatment. The support structure, the first and second holder elements and the resilient element(s) are made of thermostructural composite material. | 09-26-2013 |
| 20130280666 | APPARATUS FOR PREPARING SELF-CONTAINED HEATED TREATMENT RECEPTACLE FOR USE BY A SUBJECT - A self-contained heated wax treatment apparatus includes an outer shell and a rack disposed inside the outer shell. The rack includes a receptacle holder and at least one heater holder. At least a first receptacle is mounted to the receptacle holder of the rack. The first receptacle contains a heat activated substance. A heater is mounted to the heater holder of the rack in thermal conductive contact with the first receptacle. Activation of the heater causes heat to flow to the first receptacle and activate the heat activated substance inside the receptacle. | 10-24-2013 |
| 20130295513 | Susceptor For Directional Solidification Furnace - A susceptor supports a crucible in a furnace and includes a first wall having a vertical edge and a second wall having a vertical edge. A first interlocking member is on the vertical edge of the first wall and a second interlocking member is on the vertical edge of the second wall. The first interlocking member is interlocked with the second interlocking member when the first wall and second wall are in an assembled configuration. Openings are disposed through the first interlocking member and the second interlocking member. Each of the openings through the first interlocking member is coaxial with each of the openings through the second interlocking member. | 11-07-2013 |
| 20130309623 | SINTERING CHAMBER STRUCTURE - A sintering chamber structure adapted to store multiple articles to be sintered in a sintering furnace, includes a first wall, a second wall, two side walls interconnecting the first and second walls, at least two supporting walls, and holding boards for holding the multiple articles. The two side walls and the first and second walls together define a storage space communicating outside. The two supporting walls correspondingly form a plurality of guiding grooves, wherein the first and second walls correspondingly form a pair of positioning slots communicating with the storage space, the at least two supporting walls are detachably inserted in the pairs of positioning slots, respectively, and the holding boards are inserted in corresponding guiding grooves. In this manner, the at least two supporting walls can adjust the inner space according to the sizes of the articles, whereby achieving the best yield of sintering. | 11-21-2013 |
| 20140147800 | QUARTZ BOAT METHOD AND APPARATUS FOR THIN FILM THERMAL TREATMENT - A method of supporting a plurality of planar substrates in a tube shaped furnace for conducting a thermal treatment process is disclosed. The method uses a boat fixture having a base frame including two length portions and a first width portion, a second width portion, and one or more middle members connected between the two length portions. Additionally, the method includes mounting a removable first grooved rod respectively on the first width portion, the second width portion, and each of the one or more middle members, each first grooved rod having a first plurality of grooves characterized by a first spatial configuration. The method further includes inserting one or two substrates of a plurality of planar substrates into each groove in the boat fixture separated by a distance. | 05-29-2014 |
| 20140205959 | MEDIUM HEATING DEVICE - A medium heating device includes a heater that heats a medium, and a medium support member that supports a target heating portion, which is a portion that is heated by the heater in the medium, in which the medium support member has a first component portion that is formed so that a space is provided between the medium and the first component portion when the medium is supported, and a second component portion that is in contact with the medium when the medium is supported. | 07-24-2014 |
| 20140329191 | Enhanced Bead Rack - An enhanced bead rack has a pair of supports. Each support has a front face, a back face, a top edge and a base. The front faces and back faces have a plurality of ports extending therethrough, and each port can receive therein one end of a wire. Beads, pendants, and other works can be threaded onto one or more wires and the wires can then be placed so that each end of each wire is supported by a port in each support. The plurality of ports can be arranged in various patterns or randomly and the number of ports can vary. Different sizes, shapes and styles of ports can be employed including: a grid of round ports, a series of long slots with notches, a series of long shelf spaces with notches, etc. | 11-06-2014 |
| 20150093712 | RETAINING BAR FOR HEAT FURNACE RECEPTACLES, HEAT FURNACE RECEPTACLE SUPPORTING ASSEMBLY COMPRISING RETAINING BAR AND HEAT FURNACE COMPRISING SAME - A retaining bar to be used in combination with a heat furnace supporting assembly for supporting at least one receptacle. The retaining bar comprises at least one single piece elongated body having a finite length and at least one receptacle receiving cavity defined therein and extending along a section of the length of the body. Each one of the at least one receptacle receiving cavity is configured to receive therein one of a bottom section and an upper section of one of the at least one receptacle. A heat furnace receptacle supporting assembly comprising such a retaining bar and a heat furnace provided with the heat furnace receptacle supporting assembly are further provided. | 04-02-2015 |
| 432254100 | Fluid tight metallic heat transferring box, shield or hood | 1 |
| 20160061528 | METHODOLOGY FOR ANNEALING GROUP III-NITRIDE SEMICONDUCTOR DEVICE STRUCTURES USING NOVEL WEIGHTED COVER SYSTEMS - An improved methodology for annealing group III-nitride semiconductor device structures using novel weighted cover systems that protect an annealing cap during the semiconductor annealing process is disclosed. The weighted cover system is configured for preventing the escape of nitrogen from the capped semiconductor during annealing. In one particular embodiment, the weighted cover system comprises a protective cover configured to be placed on the capped semiconductor during the anneal, and one or more weights configured to be placed on the protective cover to provide sufficient downward force to the protective cover that is placed on the capped semiconductor. | 03-03-2016 |
| 432258000 | Support structure for heat treating ceramics (e.g., saggars, etc.) | 11 |
| 20080199823 | Firing tray - A firing tray for a furnace for dental ceramics having a plate for the placement on it of the firing material, wherein the plate is made as a base for the improvement of the application possibilities and the firing tray has additional wall elements which are designed for the placement on them of a further firing tray for the forming of a stack. | 08-21-2008 |
| 20090142722 | CERAMIC MULTILAYER COMPONENT, METHOD FOR THE PRODUCTION THEREOF, AND RETAINING DEVICE - A retaining device for use when sintering electrical components made of ceramic and metal electrodes inside the ceramic. The retaining device includes a structure to hold the electrical components. The structure has a surface that contains a sintering aid. The sintering aid includes a material that is able to bind to a gas contained in the structure and to release the gas. | 06-04-2009 |
| 20110039221 | KILN TOOL PLATE FOR FIRING CERAMIC MATERIAL - A kiln tool plate | 02-17-2011 |
| 20110039222 | Firing Table for a Furnace - The invention relates to a combustion table for an oven for dental ceramics made of solid, highly temperature-resistant material, having a base, a top side, and a wall, wherein the combustion table is formed of at least two parts in order to improve the temperature resistance of the combustion table. | 02-17-2011 |
| 20150099236 | REFRACTORY ARTICLE - A refractory article having a support structure including a first plurality of posts coupled by a first member; and a second plurality of posts substantially parallel with the first plurality of posts, the second plurality of posts coupled by a second member, wherein the support structure has a height, H, and wherein the first and second members are positioned between 0.3H and 0.7H. In another aspect, the support structure has a height to width ratio of at least 1.5, a stiffness factor of no greater than 100 mm, and a solid to open volume ratio of no greater than 5%. In another aspect, the support structure has a weight of no greater than 1200 kg, a stiffness factor of no greater than 100 mm, and a solid to open volume ratio of no greater than 5%. | 04-09-2015 |
| 20150111164 | CERAMIC SUBSTRATE, FIRING SETTER, AND MANUFACTURING METHOD OF CERAMIC SUBSTRATE USING THE SAME - Disclosed herein are a ceramic substrate, a firing setter, and a manufacturing method of a ceramic substrate using the same. According to the present invention, there is provided a ceramic substrate including: a first substrate concave-convex part formed on a lower surface thereof and having a first substrate roughness; and a second substrate concave-convex part formed on an upper surface thereof and having a second substrate roughness. | 04-23-2015 |
| 20150303079 | MODULAR VERTICAL FURNACE PROCESSING SYSTEM - A vertical furnace processing system for processing semiconductor substrates, comprising the following modules:—a processing module including a vertical furnace; an I/O-station module including at least one load port to which a substrate cassette is dockable; a wafer handling module configured to transfer semiconductor substrates between the processing module and a substrate cassette docked to the load port of the I/O-station module; and a gas supply module including at least one gas supply or gas supply connection for providing the vertical furnace of the processing module with process gas, wherein at least two of the said modules are mutually decouplably coupled, such that said at least two modules are decouplable from one another to facilitate servicing of the system, and in particular the vertical furnace thereof. | 10-22-2015 |
| 20160071750 | ASSEMBLY OF LINER AND FLANGE FOR VERTICAL FURNACE AS WELL AS A VERTICAL PROCESS FURNACE - An assembly of a liner and a support flange for a vertical furnace for processing wafers, wherein the support flange is configured for supporting the liner, at least two support members that are connected to the cylindrical wall, each having a downwardly directed supporting surface, wherein each downwardly directed supporting surface is positioned radially outwardly from the inner cylindrical surface, wherein the support flange and/or the liner are configured such that, when the liner is placed on the support flange, the downwardly directed supporting surfaces are in contact with an upper surface of the support flange and support the liner, and wherein at least the part of the lower end surface of the liner that bounds the inner cylindrical surface is spaced apart from the upper surface of the support flange. | 03-10-2016 |
| 20190144964 | HIGHLY MODULAR LOADING TOOLS | 05-16-2019 |
| 432259000 | Point or line contact support | 2 |
| 20140220503 | HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS - A substrate holder has two holder constituting bodies, each having a plurality of columns arranged on an imaginary circle, and substrate holding sections that hold circumferential portions of respective substrates. The holder constituting bodies hold the substrates so that either their front surfaces or their back surfaces face upward with a substrate having an upward facing front and a substrate having an upward facing rear being alternately arranged in a vertical direction. At least one of the holder constituting bodies moves in the vertical direction to change the positions of the holder constituting bodies relative to each other. A distance between a first pair of vertically adjacent substrates with their respective front surfaces facing each other is set to ensure treatment uniformity, and to be larger than a distance between a second pair of vertically adjacent substrates with their respective back surfaces facing each other. | 08-07-2014 |
| 20140302447 | WAFER BOAT HAVING DUAL PITCH - A wafer boat is provided for holding a plurality of wafers in a vertically stacked and spaced relationship. The wafer boat comprises a top member; a bottom member facing the top member; and at least three vertical members extending between the top member and the bottom member. The vertical members are provided with a plurality of protrusions, the protrusions configured to form a plurality of wafer accommodations at different vertical heights, the protrusions configured to be arranged in groups of at least two protrusions. A pitch of protrusions within a group has a first value and a pitch of two adjacent protrusions that belong to different groups has a second value larger than the first value. | 10-09-2014 |
| 432261000 | Openwork tray, basket, or grid structure for heat treating metal | 2 |
| 20130280667 | FIRING CONTAINERS - Firing containers for firing an electrode active material include one or more through openings, and protrusions protruding from an outer surface of sidewalls of each of the firing containers. The protrusions allow adjacent firing containers to be spaced apart from each other and guide the adjacent firing containers during alignment. | 10-24-2013 |
| 20140178827 | FIREPROOF CONTAINER IMPROVED IN CIRCULATION OF HEAT AND SAFETY OF USE - This invention relates to a fireproof container with improved circulation of heat and safer use. According to an embodiment of this invention, a fireproof container, to be loaded in an industrial furnace to perform a thermal treatment of a powder or a target, includes a prominent member formed on the outer walls thereof Also, according to another embodiment of this invention, a fireproof container for use in thermal treatments has a hexahedral shape with a space having a predetermined volume in which a powder or a target to be thermally treated is placed, and includes a protrusion block having a predetermined shape formed on at least one of the external front surface, rear surface, left side surface, and right side surface of the fireproof container. | 06-26-2014 |
| 432262000 | Crucible | 11 |
| 20150111165 | CRUCIBLE OF COATING MACHINE - The present invention provides a crucible of a coating machine The crucible includes a heat conduction device installed inside the crucible. The heat conduction device includes one or multiple radial metal wires or metal strips disposed along a radial direction of the crucible, and one or multiple axial metal wires or metal strips disposed along an axial direction of the crucible. By the heat conduction device formed by metal wires or metal strips, it can achieve a better heat conduction such that the heating temperature of the organic material placed in the crucible is uniform to achieve the steady state of thermal equilibrium. And the crucible can fill more material, increase evaporation rate, decrease the number of refilling the material, and improve production efficiency. | 04-23-2015 |
| 432264000 | Lined, layered or coated | 2 |
| 20110281227 | MELTING CRUCIBLE FOR USE IN A CRUCIBLE DRAWING METHOD FOR QUARTZ GLASS - In a known melting crucible for use in a crucible drawing method, it is provided that the interior face of the crucible wall facing a crucible interior space is covered at least partially with a protective layer made of a noble metal. The known melting crucible does have good corrosion resistance with respect to the quartz glass melt, but the material costs are high because of the expensive coating metals. In order to provide a melting crucible for use in a crucible drawing method for quartz glass that exhibits good corrosion resistance at low material costs, it is proposed that the protective layer ( | 11-17-2011 |
| 20150354896 | CRUCIBLE - Embodiments of the invention disclose a crucible. The crucible comprises: a crucible body; and at least one heat conductive sheet disposed on an inner side wall of the crucible body. The at least one heat conductive sheet has at least one opening. The crucible is specifically used for evaporating process, and can improve the heating uniformity of the evaporation materials and prevent the evaporation material from local spurting. | 12-10-2015 |
| 432265000 | Of particular material | 8 |
| 20110129784 | LOW THERMAL EXPANSION DOPED FUSED SILICA CRUCIBLES - The present disclosure relates to a silica-based crucible material that includes, before sintering or firing, selected amounts of a thermal expansion stabilizer component (B | 06-02-2011 |
| 20130189637 | COMBINED GRAPHITE TUBE AND GRAPHITE CRUCIBLE CONSTITUTED THEREBY - A combined graphite tube is combined by stacking a plurality of graphite short-tubes together, where each graphite short-tube includes a upper coupling portion and a lower coupling portion, the upper coupling portion is positioned on a top face of a upper side of the graphite short-tube; and the lower coupling portion is positioned on a bottom face of a lower side of the graphite short-tube, and corresponds to the upper coupling portion, allowing the upper coupling portion of each graphite short-tube to be propped against the lower coupling portion of another graphite short-tube; the graphite short-tubes are fused and coupled together by means of a sintering treatment after the graphite short-tubes are stacked together. Whereby, the combined graphite tube of the present invention may be utilized in silicon smelting, and may be coupled to an enough length of graphite tube depending on requirements or derive a graphite crucible, capable of improving silicon smelting efficiency. | 07-25-2013 |
| 20130337396 | CRUCIBLE - A graphite crucible has a cylindrical body with an upper opening for receiving a sample for analysis and a disk-shaped pedestal base. The pedestal base includes a bottom surface with a centrally formed circular indentation. An inwardly projecting concave arcuate annular indentation extends between the body and pedestal base with a smoothly curved radius of curvature. The upper and lower walls of the arcuate indentation diverge outwardly at an angle of from about 56 to about 60°. The pedestal base includes a bottom surface with a centrally formed circular indentation. | 12-19-2013 |
| 20140038119 | REINFORCED REFRACTORY CONTAINERS - A reinforced refractory container having a cast refractory container which includes a sidewall defining an interior volume, the sidewall having inner and outer surfaces, the container cast from a castable refractory composition, and a wound, continuous fiber tensile reinforcement structure integrated with the container sidewall. A method of fabricating the reinforced refractory container is also provided. | 02-06-2014 |
| 20140147801 | GRAPHITE CRUCIBLE - There is provided a graphite crucible including a bottom part, a body part, a treatment part including an input port, and a gas discharge part that is closed at a lower end side and is opened at an upper end side of the body part. Since graphite is porous, at the time when graphite is eluted into an object to be treated or is consumed, a gas in the pores of a graphite crucible is released as air bubbles continuously into the molten object to be treated. Therefore, gasification of a gas dissolved inside the object to be treated can be enhanced, and bumping of the object to be treated can be prevented. | 05-29-2014 |
| 20140242531 | REACTION CONTAINER AND VACUUM HEAT TREATMENT APPARATUS HAVING THE SAME - A method of fabricating a reaction container according to the disclosure comprises putting graphite power in a molded member; and pressing the molded member, wherein the graphite powder comprises first graphite powder and second graphite powder having different particle sizes. A vacuum heat treatment apparatus comprises a chamber, a reaction container in the chamber, and a heat member heating the reaction container in the chamber, in which the reaction container comprises graphite, and the reaction container has a concentration in the range of 1.8 to 2.0. | 08-28-2014 |
| 20140272748 | SILICON-NITRIDE-CONTAINING INTERLAYER OF GREAT HARDNESS - The invention relates to a shaped body comprising a substrate with a firmly adhering separating layer, wherein the separating layer comprises 92-98 wt. % silicon nitride (Si | 09-18-2014 |
| 20150037746 | HEAT CONDUCTION DEVICE INCLUDED CRUCIBLE - The present invention provides a heat conduction device included crucible, which includes: a crucible body and a heat conduction device arranged in the crucible body. The heat conduction device has a tree-like configuration, which includes a heat-dissipative trunk and multiple levels of heat dissipative branches mounted to the heat-dissipative trunk. Each level of the heat dissipative branches includes a plurality of branch units and the branch units are arranged to project out from an outer surface of the heat-dissipative trunk. The heat conduction device included crucible of the present invention uses the tree-like heat conduction device arranged in the crucible body to transfer heat in every direction within the crucible body so that during a vapor deposition operation, an organic material received in the crucible body can be heated uniformly thereby avoiding the phenomenon of partial decomposition of the organic material occurring in the prior art technique due to non-uniform heating of the organic material and thus effectively improving the vapor deposition efficiency and vapor deposition performance. | 02-05-2015 |
