| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 430449000 | NONRADIATION SENSITIVE IMAGE PROCESSING COMPOSITIONS OR PROCESS OF MAKING | 9 |
| 20080213707 | Graded Spin-on Organic Antireflective Coating for Photolithography - An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer. | 09-04-2008 |
| 20090246718 | METHOD OF CREATING A GRADED ANTI-REFLECTIVE COATING - A method of creating a graded anti-reflective coating (ARC) layer on a thin film is described. The method includes forming the thin film on a substrate, forming an ARC layer on the thin film, and applying a solvent to the ARC layer causing it to swell. A photo-resist layer is formed on the swollen ARC layer. A mixing layer is formed by the diffusion of components from the swollen ARC layer to the photo-resist layer and vice versa. The mixing layer has optical qualities that are distinct from those of either of the ARC layer or the photo-resist layer. The mixing layer forms the graded ARC layer. | 10-01-2009 |
| 20120115091 | DEVELOPER, PROCESS FOR TREATING DEVELOPING SOLUTION, PROCESS FOR PRODUCING PRINTING PLATE, AND FILTER APPARATUS - The present invention provides a developer that can efficiently remove photosensitive resin components dispersing in a developing solution. The present invention provides a developer comprising: a feeder | 05-10-2012 |
| 20120178029 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS - Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired. | 07-12-2012 |
| 20130078580 | THINNER COMPOSITION FOR RRC PROCESS, APPARATUS FOR SUPPLYING THE SAME, AND THINNER COMPOSITION FOR EBR PROCESS - A thinner composition for a reduced resist coating process includes an alkyl lactate, cyclohexanone, and an alkyl acetate, wherein an alkyl substituent of the alkyl acetate is a C1 to C5 non-ether based alkyl group. | 03-28-2013 |
| 20150355545 | THINNER COMPOSITION FOR IMPROVING COATING AND REMOVING PERFORMANCE OF RESIST - Provided are a thinner composition for improving coating property of a resist and for removing the same, which includes 10 to 80 wt. % of alkyl (with 1 to 5 carbon atoms) 2-hydroxyisobutyrate, 20 to 90 wt. % of propyleneglycol alkyl (with 1 to 5 carbon atoms)ether acetate, and 10 to 1000 ppm of a surfactant represented by Formula 1 to a total weight of the alkyl 2-hydroxyisobutyrate and propyleneglycol alkylether acetate, so as to achieve excellent solubility to various photoresists and bottom anti-reflective coatings (BARC) and high edge bead removing (EBR) performance, possibly be employed in a process for recycling photoresist-coated wafers, and remarkably improve coating property of the photoresist, and a method for manufacturing a semiconductor device or a thin film transistor liquid crystal display device including removal of the photoresist by using the above-described thinner composition. | 12-10-2015 |
| 430464000 | Developer | 3 |
| 430467000 | Color developer | 2 |
| 20090233246 | METHOD FOR PRODUCING MATERIAL CONTAINING SENSITIZER DISPERSED THEREIN FOR THERMAL RECORDING ARTICLE AND THERMAL RECORDING ARTICLE - The invention provides a heat-sensitive recording material, which is highly sensitive, is almost free of staining on the background, and gives a recorded image excellent in stability during storage, by using a finely divided sensitizer dispersion excellent in shelf stability produced in a short time with high volumetric efficiency. The invention relates to a method of producing a sensitizer dispersion, which comprises emulsifying and finely dividing a heat-sensitive recording sensitizer by melting under heating in an aqueous emulsifying dispersant, and then crystallizing the finely divided emulsified dispersion under rapid cooling, wherein the sensitizer is at least one member selected from the group consisting of 1,2-bis(phenoxy)ethane, 1,2-bis(3-methylphenoxy)ethane, 1,2-bis(4-methylphenoxy)ethane, p-benzylbiphenyl, di-p-methylbenzyl oxalate, and β-naphthyl benzyl ether. | 09-17-2009 |
| 20110104619 | COLOR-DEVELOPING COMPOSITION AND RECORDING MATERIAL CONTAINING THE SAME - Provided is a recording material with a superior heat resistance and having a low content of a dihydroxydiphenylsulfone derivative, and a color-developing composition for producing the recording material. With the use of this color-developing composition, a recording material with a superior heat resistance at the background part can be provided and the content of a dihydroxydiphenylsulfone derivative, such as 4,4′-dihydroxydiphenylsulfone, in the color-developing composition can be reduced to 2% by mass or less, or further to 1% by mass or less. | 05-05-2011 |
| 430486000 | Processing additive containing | 1 |
| 430493000 | Surfactant, emulsifier, or solvent | 1 |
| 20120100489 | METHOD FOR REBALANCING A MULTICOMPONENT SOLVENT SOLUTION - The invention pertains to a method for rebalancing a solvent solution useful for treating photosensitive printing elements having a photopolymerizable layer. The solvent solution becomes contaminated with unpolymerized material and other materials that release from the photosensitive printing elements during washout treating, and separation of contaminates also removes some of one or more components in the used solvent solution. The method rebalances the proportion of the components in a solvent solution having 3 or more components. The method includes measuring a reclaimant, which has been separated from the contaminates, for two or more properties, calculating a mass of the components to be added to the reclaimant based on an equation generated for each measured property, and adding the mass of the component or components to the reclaimant to adjust the proportion of the components in the reclaimant to targeted proportions. | 04-26-2012 |
