| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 427255600 | Organic coating applied by vapor, gas, or smoke | 49 |
| 20080199611 | Fabric with a moistureproof, dustproof, and antibacterial function - The present invention relates to a fabric having a three-layered structure: a fiber substrate, a parylene layer, and an antibacterial layer. The fiber substrate is the fiber part of the fabric; the parylene layer is capable of providing a moistureproof and dustproof effect as well as preventing the fiber substrate from being catalyzed by photocatalyst and decomposed thereby; the antibacterial layer, which comprises nano-photocatalyst and/or nano-silver particles, is used to kill pathogenic germs. | 08-21-2008 |
| 20080233287 | PROCESS AND APPARATUS FOR ORGANIC VAPOR JET DEPOSITION - A method of fabricating an organic film is provided. A non-reactive carrier gas is used to transport an organic vapor. The organic vapor is ejected through a nozzle block onto a cooled substrate, to form a patterned organic film. A device for carrying out the method is also provided. The device includes a source of organic vapors, a source of carrier gas and a vacuum chamber. A heated nozzle block attached to the source of organic vapors and the source of carrier gas has at least one nozzle adapted to eject carrier gas and organic vapors onto a cooled substrate disposed within the vacuum chamber. | 09-25-2008 |
| 20080268152 | Composite sol, process for producing the same, and ink-jet recording medium - A composite sol containing colloidal composite particles having a particle diameter measured by dynamic light scattering method of 20 to 500 nm, composed of colloidal silica particles having a specific surface area diameter of 3 to 100 nm and aluminum phosphate bonding the colloidal silica particles or coating and bonding the colloidal silica particles; a process for producing the composite sol; a coating composition for ink receiving layer containing the composite sol; and an ink jet recording medium having an ink receiving layer containing the composite sol. | 10-30-2008 |
| 20080299311 | Process and Apparatus for Organic Vapor Jet Deposition - A method of fabricating an organic film is provided. A non-reactive carrier gas is used to transport an organic vapor. The organic vapor is ejected through a nozzle block onto a cooled substrate, to form a patterned organic film. A device for carrying out the method is also provided. The device includes a source of organic vapors, a source of carrier gas and a vacuum chamber. A heated nozzle block attached to the source of organic vapors and the source of carrier gas has at least one nozzle adapted to eject carrier gas and organic vapors onto a cooled substrate disposed within the vacuum chamber. | 12-04-2008 |
| 20090011127 | PROCESS AND APPARATUS FOR SUPERIMPOSING A LAYER OF A SEPARATING AGENT - During the process for applying a coating of separating agent to a moving or movable substrate in a vacuum chamber, wherein the separating agent is vaporized in the interior of a vaporizing chamber that contains at least one nozzle pointing towards the substrate, liquid separating agent is injected into the interior of the vaporizing chamber to be vaporized. The necessary apparatus for applying a coating of separating agent to a moving or movable substrate in a vacuum chamber, wherein the vacuum chamber contains at least one metal vaporizing apparatus with a vaporizing chamber that contains a nozzle pointing towards the substrate, wherein the separating agent can be supplied to the interior of the vaporizing chamber via a supply pipe, includes that the supply pipe is connected to an injection apparatus, via which the liquid separating agent is or can be injected into the interior of the vaporizing chamber in order to be vaporized. | 01-08-2009 |
| 20090047429 | Apparatus and Method for Deposition For Organic Thin Films - The invention provides apparatus and methods for organic continuum vapor deposition of organic materials on large area substrates. | 02-19-2009 |
| 20090081365 | DEPOSITION APPARATUS FOR TEMPERATURE SENSITIVE MATERIALS - A system for the deposition of vaporized materials on a substrate is described, comprising at least first and second orientation-independent apparatuses for directing vaporized organic materials onto a substrate surface to form first and second films, each of the first and second orientation-independent apparatuses being arranged in a different relative orientation and comprising: a chamber containing a quantity of material; a permeable member at one end of the chamber with a heating element for vaporizing the material; and means for continuously feeding the material toward the permeable member as it is vaporized, whereby organic material vaporizes at a desired rate-dependent vaporization temperature at the one end of the chamber. A plurality of thin films may be deposited on a substrate using deposition apparatus in a variety of orientations. Such a design provides reduced costs and improved deposition rate control. | 03-26-2009 |
| 20090087562 | METHOD OF PREPARING CROSS-LINKED ORGANIC GLASSES FOR AIR-GAP SACRIFICIAL LAYERS - A method of forming a polymer film on a surface of a substrate is described. The method comprises placing a substrate on a substrate holder in a vapor deposition system, and introducing a process gas to the vapor deposition system, wherein the process gas comprises a monomer, a cross-linking monomer, and an initiator. Thereafter, the substrate is exposed to the process gas in order to form a polymer film on the substrate, wherein the polymer film thermally decomposes at a decomposition temperature. | 04-02-2009 |
| 20090214782 | ORGANIC VAPOR JET PRINTING SYSTEM - An organic vapor jet printing system includes a pump for increasing the pressure of an organic flux. | 08-27-2009 |
| 20090214783 | Organic Vapor Jet Printing System - An organic vapor jet printing system includes a pump for increasing the pressure of an organic flux. | 08-27-2009 |
| 20090258142 | ORGANIC DEPOSITION APPARATUS AND METHOD OF DEPOSITING ORGANIC SUBSTANCE USING THE SAME - An organic material deposition system and method are provided. The organic material deposition apparatus may include a chamber having a processing space formed therein, a source supply device that generates an organic source and injects and diffuses the organic source into the processing space through a shower head provided in the processing space. The substrate is supported by a stage device that moves the substrate upward and downward within the processing space to adjust a distance between the substrate and the shower head. A pumping port provided at an upper positioned at an upper portion of the processing space provides a vacuum exhaust path that directs flow through the processing space toward the stage device. This allows an organic thin film with a uniform thickness to be deposited using an apparatus with a relatively simple configuration. | 10-15-2009 |
| 20090269492 | Apparatus and Method for Deposition Organic Compounds, and Substrate Treating Facility With the Apparatus - An apparatus for depositing organic compounds is provided to deposit predetermined organic films on a substrate. The apparatus includes a deposition chamber, a support member provided inside the deposition chamber and supporting the substrate to make a deposition surface of the substrate face downwardly, a vaporizer installing portion in which an organic vaporizer is installed to vaporize organic compounds to the deposition surface of the substrate, and a vaporizer replacing portion disposed adjacent to the vaporizer installing portion to replace the organic vaporizer. According to the apparatus, organic vaporizers for vaporizing organic compounds are replaced automatically. | 10-29-2009 |
| 20090280247 | APPARATUS AND METHOD FOR DEPOSITION FOR ORGANIC THIN FILMS - The invention provides apparatus and methods for organic continuum vapor deposition of organic materials on large area substrates. | 11-12-2009 |
| 20090285987 | PERFLUOROPARACYCLOPHANE AND RELATED METHODS THEREFOR - A composition comprising perfluoro-[2,2]-paracyclophane dimer compound is disclosed. The synthesis reaction of the paracyclophane dimer from 1,4-bis(chlorodifluoromethane)-2,3,5,6-tetrafluorobenzene involves heating in the presence of a metal catalyst and a solvent. A perfluorinated paraxylylene coating formed from the perfluorinated paracyclophane dimer is also disclosed. | 11-19-2009 |
| 20090291210 | Additives to Prevent Degradation of Cyclic Alkene Derivatives - This disclosure relates to compositions that includes (a) one or more substituted or unsubstituted cyclic alkenes, and (b) an antioxidant composition including at least one compound of Formula (I): | 11-26-2009 |
| 20100034970 | APPARATUS AND METHOD FOR CHEMICAL VAPOR DEPOSITION - A chemical vapor deposition apparatus includes a charging section | 02-11-2010 |
| 20100034971 | METHOD FOR THE DEPOSITION OF A RUTHENIUM CONTAINING FILM - Organometallic compound of the formula (I): wherein: L is a non-aromatic cyclic unsaturated hydrocarbon ligand (L), having at least six cyclic carbon atoms, said cycle being unsubstituted or substituted, and X is either a non aromatic cyclic unsaturated hydrocarbon ligand identical or different from (L), having at least six cyclic carbon atoms said cycle being unsubstituted or substituted or a cyclic or acyclic conjugated alkadienyl hydrocarbon ligand having from five to ten carbons atoms, said hydrocarbon ligand being unsubstituted or substituted. | 02-11-2010 |
| 20100068382 | METHOD OF CURING METAL ALKOXIDE-CONTAINING FILMS - A method for forming an inorganic or hybrid organic/inorganic layer on a substrate, which method comprises applying a metal alkoxide to form a layer atop the substrate and exposing the metal alkoxide layer to heat from a catalytic combustion heater in the presence of water to cure the layer is provided. | 03-18-2010 |
| 20100080901 | EVAPORATOR FOR ORGANIC MATERIALS - An evaporator for vaporizing organic material is described. The evaporator includes a first chamber having a nozzle adapted to be directed to a substrate to be coated; at least one second chamber for vaporizing the organic material; at least one vapor channel for guiding vaporized organic material from the at least one second chamber to the first chamber; wherein the first chamber is adapted to provide vaporized organic material to the nozzle corresponding to a first virtual sublimation surface, and the at least one second chamber being adapted to provide during operation a second sublimation surface area, wherein the second sublimation surface area corresponds to at least 70 percent of the first virtual sublimation surface. | 04-01-2010 |
| 20100092667 | ATOMIC LAYER DEPOSITION USING METAL AMIDINATES - Metal films are deposited with uniform thickness and excellent step coverage. Copper metal films were deposited on heated substrates by the reaction of alternating doses of copper(I) NN′-diispropylacetamidinate vapor and hydrogen gas. Cobalt metal films were deposited on heated substrates b the reaction of alternating doses of cobalt(II) bis(N,N′-diispropylacetamidinate) vapor and hydrogen gas. Nitrides and oxides of these metals can be formed by replacing the hydrogen with ammonia or water vapor, respectively. The films have very uniform thickness and excellent step coverage in narrow holes. Suitable applications include electrical interconnects in microelectronics and magnetoresistant layers in magnetic information storage devices. | 04-15-2010 |
| 20100098853 | ARRANGEMENT FOR VAPORIZING MATERIALS AND METHOD FOR COATING SUBSTRATES - The invention relates to an arrangement for the vaporization of materials, and specifically of organic materials, such as are utilized for example in the production of OLEDs. A heating element and a device for transporting a carrier for a layer to be vaporized are herein provided. The carrier with the layer to be vaporized is guided over the heating element where the layer is vaporized and deposited on a substrate. | 04-22-2010 |
| 20100104753 | LOW PRESSURE VAPOR PHASE DEPOSITION OF ORGANIC THIN FILMS - Methods for preparing organic thin films on substrates, the method comprising the steps of providing a plurality of organic precursors in the vapor phase, and reacting the plurality or organic precursors at a sub-atmospheric pressure. Also included are thin films made by such a method and apparatuses used to conduct such a method. The method is well-suited to the formation of organic light emitting devices and other display-related technologies. | 04-29-2010 |
| 20100112214 | Synthesis of Higher Diamondoids - In some embodiments, the present invention is directed to methods for synthesizing higher diamondoids, wherein said methods involve augmenting existing diamondoid molecules through the bonding of carbon atoms to such existing diamondoid species with intramolecular cross-linking so as to form larger diamondoids containing face-fused diamond-crystal (adamantane) cages with carbon frameworks superimposable on the cubic-diamond crystal lattice. | 05-06-2010 |
| 20100166956 | VAPOR DEPOSITION APPARATUS - It has been found that an organic component is emitted from a member such as a crucible or a gasket constituting an apparatus for vacuum treatment and an element is contaminated with said organic component emitted, and, as a result, members of the apparatus for vacuum treatment are subjected to a treatment for reducing the emission of an organic component. For example, a crucible is made from a material having a reduced catalytic activity to a material for use in the vapor deposition in question and a gasket is used after a treatment for reducing the bleeding of an organic component or is made from a material containing a reduced amount of an organic component. | 07-01-2010 |
| 20100209609 | VAPOR EMISSION DEVICE, ORGANIC THIN FILM VAPOR DEPOSITION APPARATUS, AND METHOD FOR DEPOSITING ORGANIC THIN FILM - A technology for organic material vapor deposition is provided, which can enhance efficiency in the evaporation material, prevent time-degradation of the evaporation material, and surely prevent any mask deformation by heat during vapor deposition. An organic material evaporation source including: a shower-plate shape emission part having a plurality of emission orifices arranged within a plane thereof; a feeding pipe provided inside the emission part for feeding the vapor of introduced organic evaporation material into the emission part via the blowout orifices by emitting the vapor toward the bottom part of the emission part; and a cooling means provided at least in a position on the emission orifice side of the emission part. The cooling means is formed by, for example, covering the entire emission part, and has vapor passage holes for allowing the organic evaporation material vapor to pass in positions corresponding to the emission orifice of the emission part. | 08-19-2010 |
| 20100233367 | Controlling the Vaporization of Organic Material - A method for controlling the deposition of vaporized organic material onto a substrate surface, includes providing a manifold having at least one aperture through which vaporized organic material passes for deposition onto the substrate surface; and providing a volume of organic material and maintaining the temperature of such organic material in a first condition so that its vapor pressure is below that needed to effectively form a layer on the substrate, and in a second condition heating a volume percentage of the initial volume of such organic material so that the vapor pressure of the heated organic material is sufficient to effectively form a layer. | 09-16-2010 |
| 20100260934 | PERFLUOROPARACYCLOPHANE AND RELATED METHODS THEREFOR - A composition comprising perfluoro-[2,2]-paracyclophane dimer compound is disclosed. The synthesis reaction of the paracyclophane dimer from 1,4-bis(chlorodifluoromethane)-2,3,5,6-tetrafluorobenzene involves heating in the presence of a metal catalyst and a solvent. A perfluorinated paraxylylene coating formed from the perfluorinated paracyclophane dimer is also disclosed. | 10-14-2010 |
| 20100279011 | NOVEL BISMUTH PRECURSORS FOR CVD/ALD OF THIN FILMS - Bismuth precursors having utility for forming highly conformal bismuth-containing films by low temperature (<300° C.) vapor deposition processes such as CVD and ALD, including bismuth aminidates, bismuth guanidates, bismuth isoureates, bismuth carbamates and bismuth thiocarbamates, bismuth beta-diketonates, bismuth diketoiminates, bismuth diketiiminates, bismuth allyls, bismuth cyclopentadienyls, bismuth alkyls, bismuth alkoxides, and bismuth silyls with pendant ligands, bismuth silylamides, bismuth chelated amides, and bismuth ditelluroimidodiphosphinates. Also described are methods of making such precursors, and packaged forms of such precursors suitable for use in the manufacture of microelectronic device products. These bismuth precursors are usefully employed to form bismuth-containing films, such as films of GBT, Bi | 11-04-2010 |
| 20100291299 | STRONTIUM AND BARIUM PRECURSORS FOR USE IN CHEMICAL VAPOR DEPOSITION, ATOMIC LAYER DEPOSITION AND RAPID VAPOR DEPOSITION - Cyclopentadienyl and Indenyl barium/strontium metal precursors and Lewis base adducts thereof are described. Such precursors have utility for forming Ba- and/or Sr-containing films on substrates, in the manufacture of microelectronic devices or structures. | 11-18-2010 |
| 20110027481 | DEVICE AND METHOD FOR ORGANIC VAPOR JET DEPOSITION - A device and a method for facilitating the deposition and patterning of organic materials onto substrates utilizing the vapor transport mechanisms of organic vapor phase deposition is provided. The device includes one or more nozzles, and an apparatus integrally connected to the one or more nozzles, wherein the apparatus includes one or more source cells, a carrier gas inlet, a carrier gas outlet, and a first valve capable of controlling the flow of a carrier gas through the one or more source cells. The method includes moving a substrate relative to an apparatus, and controlling the composition of the organic material and/or the rate of the organic material ejected by the one or more nozzles while moving the substrate relative to the apparatus, such that a patterned organic layer is deposited over the substrate. | 02-03-2011 |
| 20110052808 | METHOD OF DEPOSITING A MULTILAYER COATING WITH A VARIETY OF OXIDE ADHESION LAYERS AND ORGANIC LAYERS - An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer. The improved method is used to deposit multilayered coatings where an oxide-based layer is deposited directly over a substrate and a SAM organic-based layer is directly deposited over the oxide-based layer. Typically a series of alternating layers of oxide-based layer and organic-based layer are applied. | 03-03-2011 |
| 20110097495 | ORGANIC VAPOR JET PRINTING WITH CHILLER PLATE - A device is provided. The device includes a nozzle, a source of carrier gas and a source of organic molecules in fluid communication with the nozzle. The device also includes an active cooling system disposed adjacent to the nozzle. Preferably, the device also includes a chamber, wherein the nozzle, and the active cooling system are disposed within the chamber. A substrate holder may also be disposed within the chamber, adapted to support a substrate beneath the nozzle, movable relative to the nozzle. Preferably, a substrate is held by the substrate holder, the substrate disposed at a distance of 0.1 to 10 mm from the active cooling system. Preferably, the device also includes a heating system attached to the nozzle. The points at which the heating system are attached to the nozzle preferably includes at least one point that is zero to 5 mm from the tip of the nozzle. | 04-28-2011 |
| 20110151121 | CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD FOR FORMING PARYLENE FILM - A chemical vapor deposition apparatus and a method for forming a parylene film are provided. The chemical vapor deposition apparatus includes a buffer chamber, a deposition chamber, a pyrolysis chamber and an evaporator. The buffer chamber has a first valve and a second valve. The evaporator is connected with the second valve. The pyrolysis chamber is connected with the evaporator through a first pipe, wherein the first pipe has a third valve. The deposition chamber is connected with the pyrolysis chamber. | 06-23-2011 |
| 20110171382 | SOURCE REAGENT COMPOSITIONS AND METHOD FOR FORMING METAL FILMS ON A SUBSTRATE BY CHEMICAL VAPOR DEPOSITION - A metalorganic complex composition comprising a metalorganic complex selected from the group consisting of: metalorganic complexes comprising one or more metal central atoms coordinated to one or more monodentate or multidentate organic ligands, and complexed with one or more complexing monodentate or multidentate ligands containing one or more atoms independently selected from the group consisting of atoms of the elements C, N, H, S, O and F; wherein when the number of metal atoms is one and concurrently the number of complexing monodentate or multidentate ligands is one, then the complexing monodentate or multidentate ligand of the metalorganic complex is selected from the group consisting of beta-ketoiminates, beta-diiminates, C | 07-14-2011 |
| 20110287184 | PRECURSOR COMPOSITIONS AND METHODS - Compositions including an amido-group-containing vapor deposition precursor and a stabilizing additive are provided. Such compositions have improved thermal stability and increased volatility as compared to the amido-group-containing vapor deposition precursor itself. These compositions are useful in the deposition of thin films, such as by atomic layer deposition. | 11-24-2011 |
| 20120070580 | FLUOROPOLYMER COMPOSITIONS AND TREATED SUBSTRATES - A polymer having at least one urea linkage prepared by: (i) reacting (a) at least one diisocyanate, polyisocyanate, or mixture thereof, having isocyanate groups, and (b) at least one fluorinated compound selected from the formula (I): | 03-22-2012 |
| 20120201958 | Multidentate Ketoimine Ligands For Metal Complexes - The present invention is a plurality of metal-containing complexes of a multidentate ketoiminate. | 08-09-2012 |
| 20120321789 | ORGANIC THIN FILM DEPOSITION SYSTEM AND METHOD FOR DEPOSITING ORGANIC FILM - An organic thin film deposition system is disclosed. The organic thin film deposition system includes: a plurality of crucibles each having an inlet capable of selectively being opened and closed; an organic composite material made up of two or more organic materials and having an initial composition ratio, the organic composite material for placing in the plurality of crucibles; and a transferring unit for controlling a position of the plurality of crucibles. | 12-20-2012 |
| 20130196065 | MOLYBDENUM (IV) AMIDE PRECURSORS AND USE THEREOF IN ATOMIC LAYER DEPOSITION - Molybdenum (IV) amide complexes are disclosed herein corresponding in structure to Formula (I): wherein: L is —NR | 08-01-2013 |
| 20130236641 | LOW-TEMPERATURE SYNTHESIS OF SILICA - An ambient pressure Atomic Layer Deposition (ALD) technique to grow uniform silica layers onto organic substrates at low temperatures, including room temperature, is described. For example, tetramethoxysilane vapor is used alternately with ammonia vapor as a catalyst in an ambient environment. | 09-12-2013 |
| 20130309403 | APPARATUS FOR DEPOSITING ORGANIC MATERIAL AND DEPOSITING METHOD THEREOF - An apparatus for depositing an organic material and a depositing method thereof, wherein a deposition process is performed with respect to a second substrate while transfer and alignment processes are performed with respect to a first substrate in a chamber, so that loss of an organic material wasted in the transfer and alignment processes can be reduced, thereby maximizing material efficiency and minimizing a processing tack time. The apparatus includes a chamber having an interior divided into a first substrate deposition area and a second substrate deposition area, an organic material deposition source transferred to within ones of the first and second substrate deposition areas to spray particles of an organic material onto respective ones of first and second substrates and a first transferring unit to rotate the organic material deposition source in a first direction from one of the first and second substrate deposition areas to an other of the first and second substrate deposition areas. | 11-21-2013 |
| 20130316080 | FILM FORMING METHOD - According to an embodiment of the present disclosure, a method of forming a polyimide film on a substrate is disclosed. Such method can be easily controlled and form a polyimide film applicable as an insulation film. While a wafer is heated at a temperature at which a polyimide film is formed, a cycle, in which the wafer is sequentially supplied with a first processing gas, for example, containing a PMDA-based first monomer, and a second processing gas containing a non-aromatic monomer, for example, an HMDA-based second monomer, is performed for a predetermined number of times. When the processing gases are switched, a replacement gas is supplied into a reaction tube so that the monomers are not mixed together under the atmosphere in the reaction tube. | 11-28-2013 |
| 20130337173 | Methods and Apparatus for Depositing Material Using a Dynamic Pressure - A method of depositing organic material is provided. A carrier gas carrying organic material is ejected from a nozzle at a flow velocity that is at least 10% of the thermal velocity of the carrier gas, such that the organic material is deposited onto a substrate. In some embodiments, the dynamic pressure in a region between the nozzle and the substrate surrounding the carrier gas is at least 1 Torr, and more preferably 10 Torr, during the ejection. In some embodiments, a guard flow is provided around the carrier gas. | 12-19-2013 |
| 20140037845 | APPARATUS FOR DEPOSITING A MULTILAYER COATING ON DISCRETE SHEETS - A tool for depositing multilayer coatings onto a substrate. The tool includes a housing defining a vacuum chamber connected to a vacuum source, deposition stations each configured to deposit a layer of multilayer coating on the substrate, a curing station, and a contamination reduction device. At least one of the deposition stations is configured to deposit an inorganic layer, while at least one other deposition station is configured to deposit an organic layer. In one tool configuration, the substrate may travel back and forth through the tool as many times as needed to achieve the desired number of layers of multilayer coating. In another, the tool may include numerous housings adjacently spaced such that the substrate may make a single unidirectional pass. The contamination reduction device may be configured as one or more migration control chambers about at least one of the deposition stations, and further includes cooling devices, such as chillers, to reduce the presence of vaporous layer precursors. The tool is particularly well-suited to depositing multilayer coatings onto flexible substrates, as well as to encapsulating environmentally-sensitive devices placed on the flexible substrate. | 02-06-2014 |
| 20140057051 | PROCESS AND APPARATUS FOR PRODUCING FLUORINATED ORGANOSILICON COMPOUND THIN FILM - To provide a process and apparatus whereby a fluorinated organosilicon compound thin film having high durability can be produced, and a film formation step can be carried out continuously. A process for producing a fluorinated organosilicon compound thin film, which comprises the following steps (a) to (c) sequentially in this order, and an apparatus useful for the process:
| 02-27-2014 |
| 20140178584 | CHEMICAL VAPOR DEPOSITION OF FLUOROCARBON POLYMERS - Provided is a method for forming a fluorocarbon polymer on a surface of a structure. A feedstock gas is directed through a porous heat member having a temperature sufficient to crack the feedstock gas and produce a reactive species that includes (CF | 06-26-2014 |
| 20140370192 | MOLYBDENUM ALLYL COMPLEXES AND USE THEREOF IN THIN FILM DEPOSITION - Molybdenum complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The molybdenum complexes correspond in structure to Formula (I) and Formula (II), wherein R | 12-18-2014 |
| 20150140214 | NOZZLE GEOMETRY FOR ORGANIC VAPOR JET PRINTING - A first device is provided. The device includes a print head. The print head further includes a first nozzle hermetically sealed to a first source of gas. The first nozzle has an aperture having a smallest dimension of 0.5 to 500 microns in a direction perpendicular to a flow direction of the first nozzle. At a distance from the aperture into the first nozzle that is 5 times the smallest dimension of the aperture of the first nozzle, the smallest dimension perpendicular to the flow direction is at least twice the smallest dimension of the aperture of the first nozzle. | 05-21-2015 |
| 20160076458 | SYSTEM AND METHOD FOR PROVIDING A FILM TREATMENT TO A SURFACE USING COOLING DEVICES - Disclosed herein are systems and methods for treating a surface, such as a gas turbine surface, with a filming agent using an inlet air cooling device. A filming control system includes a storage tank configured to contain a filming agent; an inlet air cooling device; and a supply conduit coupled to the storage tank on a first end and the inlet air cooling device on a second end; wherein the filming control system is configured to deliver the filming agent from the storage tank and to discharge the filming agent through the air inlet cooling device and the filming agent includes siloxane, fluorosilane, mercapto silane, amino silane, tetraethyl orthosilicate, succinic anhydride silane, or a combination including at least one of the foregoing. | 03-17-2016 |
