| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 427561000 | Pretreatment of coating supply or source outside of primary deposition zone or off site | 64 |
| 20090017226 | Use of infrared technology to install and/or repair construction membranes - An apparatus is provided for applying a construction material, the apparatus having construction and an infrared heat emitter for providing infrared heat on the construction material. The construction material can be a roll of roofing material, which can be a roll of modified asphalt/bitumen roofing membrane material. The infrared emitter can be gas powered or electric powered. A method of applying a roofing membrane is also provided, where construction material is heated using infrared heat and applied onto a rooftop or other suitable surface. | 01-15-2009 |
| 20090047444 | METHOD FOR PRODUCTION OF A LAYER HAVING NANOPARTICLES, ON A SUBSTRATE - The invention relates to a method for producing a layer ( | 02-19-2009 |
| 20090061107 | Formation of Carbon-Containing Material - A method includes forming ionic clusters of carbon-containing molecules, which molecules have carbon-carbon sp | 03-05-2009 |
| 20090162569 | RECORDING INK, INK MEDIA SET, INK CARTRIDGE, INK RECORDED MATTER, INKJET RECORDING APPARATUS, AND INKJET RECORDING METHOD - There is provided a recording ink containing: solid constituents, which contain a colorant and a resin, and stay solid in the ink having a temperature of 25° C.; liquid constituents, which have a higher boiling point than a boiling point of water, and stay liquid in the ink having a temperature of 25° C.; and water, wherein a total amount of the solid constituents in the recording ink is in the range of 2.0% by mass or more to less than 20% by mass, wherein a ratio A/B of a total amount of the liquid constituents in the recording ink A to the total amount of the solid constituents in the recording ink B is from 0.70 to 1.75, and wherein the viscosity of the recording ink at 25° C. is 10 mPa s or less. | 06-25-2009 |
| 20090324847 | Method of avoiding a parasitic plasma in a plasma source gas supply conduit - It has been discovered that a parasitic plasma problem which has existed with respect to incoming plasma source gases present in a source gas feed line to a plasma processing chamber can be avoided. The stability of a parasitic plasma is avoided by installing an RF resistor conduit in the source gas feed line and increasing the pressure in the RF resistor conduit through which the plasma source gases flow. Use of a variable surface restrictor in the RF resistor conduit or between the RF resistor conduit and the plasma processing chamber enables not only avoidance of the formation of a parasitic plasma in incoming plasma source gases, but also easier cleaning of the processing chamber plasma generation system when a remotely generated plasma is used for such cleaning. | 12-31-2009 |
| 20100272921 | METHOD AND DEVICES FOR CONTROLLING A VAPOUR FLOW IN VACUUM EVAPORATION - The invention relates to a method and a device for the coating of running substrates ( | 10-28-2010 |
| 20100323123 | PASTE PATTERNS FORMATION METHOD AND TRANSFER FILM USED THEREIN - Disclosed is a paste pattern formation method comprising the steps of: forming a transfer pattern material on a film base material to prepare a transfer film; sticking the transfer film on a substrate on which a transfer pattern is formed so that the transfer pattern material contacts the substrate; separating the film base material from the transfer pattern material; filling a paste into the transfer pattern depression; solidifying the paste; and removing the transfer pattern material. | 12-23-2010 |
| 20110104398 | METHOD AND SYSTEM FOR DEPOSITING MULTIPLE MATERIALS ON A SUBSTRATE - A system for depositing two or more materials on a substrate is provided. The system comprises one or more susceptors configured to define two or more recesses for accommodating at least a first material and a second material respectively. The first and second materials are different. The system further comprises one or more heaters for heating the first material and the second material for sublimation of the first and second materials for deposition on the substrate. A method for depositing two or more materials on a substrate is also presented. | 05-05-2011 |
| 20110159210 | Metal halide reactor deposition method - The invention utilizes a metal halide generating reactor that permits the temperature of the generation of a metal halide from a gaseous halide compound, a halogen gas, or an interhalogen compound at controlled temperatures distinctly different from controlled temperatures of a deposition furnace where metal layers are deposited by CVD processes upon substrates. The method may be further expanded to provide additional layers or reactions on the surface of the substrates with secondary reactions between reactive gases or between species of a metal halide different from the first deposition. Metal halide gases may for example be generated at successive temperatures and with successive different halogen gases or compounds. | 06-30-2011 |
| 20120141692 | METHOD FOR PRODUCING A STRUCTURE - A method for producing a structure including: colliding a photocurable adhesive composition with a light source, at least a portion of which is covered with a transparent member, thereby forming a film of the photocurable adhesive composition on the surface of the transparent member; irradiating the film of the photocurable adhesive composition with light on the surface of the transparent member; and dropping the photocurable adhesive composition irradiated with light on the structure in the region to be coated, thereby applying the photocurable adhesive composition to the region to be coated, thereby preventing an occurrence of uncured areas caused by irregular irradiation with light, and an occurrence of coloration and carbonization caused by excessive irradiation. | 06-07-2012 |
| 20120164351 | SELECTIVELY FUNCTIONIZED TRANSDUCER MICROARRAY - A system and method are provided for selectively functionalizing a transducer microarray. The method provides a microarray including a field of transducers exposed to a shared local environment. A difference in the pH associated with the transducers is created. As a result, functional molecules are selectively bound to transducers in response to the pH associated with the transducers. In one aspect, the micro-array also provides a field of transducer pH-generating electrodes, one pH-generating electrode for each transducer, and a counter electrode. The difference in pH associated with the transducers is created by selectively applying a voltage potential between pH-generating electrodes and the counter electrode, to create a difference of pH in regions adjacent to the transducers. | 06-28-2012 |
| 20130084406 | METHOD FOR PRODUCING ELECTRODE COMPOSITE MATERIAL - An object of the present invention is to simplify the process of producing an electrode composite material. Disclosed is a method for producing an electrode composite material, comprising the steps of: preparing a material comprising Li, La, Ti and O and heating the material, wherein the composition ratio between Li, La and Ti of the material is in the range of a triangle having three vertices at LiO | 04-04-2013 |
| 20140205768 | PROCESS AND HARDWARE FOR DEPOSITION OF COMPLEX THIN-FILM ALLOYS OVER LARGE AREAS - Systems and methods for depositing complex thin-film alloys on substrates are provided. In particular, systems and methods for the deposition of thin-film Cd | 07-24-2014 |
| 20150024146 | MELT IN PLACE BINDERS FOR BINDING PARTICULATE FILLERS TO SUBSTRATES - The invention relates to the use of a melt-in-place acrylic binder that is applied to a substrate in the form of a powder, followed by a fusing together of the binder powder by heat or radiation. Particulate filler is present either on the substrate, mixed with the binder powder, or admixed into the binder powder prior to fusion. The fused binder helps adhere the particulate fillers to the substrate, and may or may not cover the particulate filler. | 01-22-2015 |
| 20160096193 | PARYLENE DEPOSITION PROCESS - Embodiments of the disclosure generally related to methods of depositing parylene. The methods include introducing a first precursor into a processing chamber, and photolysing the first precursor into a second precursor using ultraviolet radiation. The second precursor is introduced into second and third regions of the processing chamber, separated by respective first and second showerheads. A substrate is exposed to the second precursor in the third region of the processing chamber to facilitate deposition of a parylene film on the substrate. | 04-07-2016 |
| 20160122866 | EVAPORATION SYSTEM AND EVAPORATION METHOD - An evaporation system and an evaporation method are disclosed, which are adapted for performing an evaporation process upon a surface of an evaporation target substrate. In an embodiment, the evaporation system comprises an evaporation material and an evaporation source plate, whereas the evaporation source plate is arranged to be heated by a heater so as to evaporate the evaporation material form its solid state into its gaseous state, and then enable the gaseous state evaporation material to travel passing through holes by the use of a shutter device so as to spread toward the surface of the evaporation target substrate for forming a film thereon. In addition, the evaporation system further comprises a transmission device, which is to be used for controlling the opening/closing of the holes of the shutter device. | 05-05-2016 |
| 427562000 | Electric discharge (e.g., corona, glow discharge, etc.) | 21 |
| 20090047445 | Method Of Making A Piezoelectric Device - A method of forming a piezoelectric device is disclosed. In one such method, a coating material is formed. The coating material has a piezoelectric precursor. The coating material is applied to a first electrode. The precursor is heated to a temperature that is above the Curie temperature of the precursor, but below the melting temperature of the precursor. While the precursor is above its Curie temperature, a voltage is applied across the precursor. While the voltage is applied across the precursor, the temperature of the precursor is reduced to below the Curie temperature. | 02-19-2009 |
| 20090148623 | METHOD FOR PRODUCING AN ANTIMICROBIAL COATING DATA TECHNICAL SURFACE - The invention relates to a method for producing a microbial substance-releasing layer on a technical surface. The inventive method comprises three steps: a) producing a solution from polyvinylacetate, a preservative agent and a solvent, b) applying the solution to the technical surface, and c) drying the solution applied to the technical surface while forming the layer. The inventive method is characterized by using benzoic acid, sorbic acid, natamycin, bacteriocines, plant extracts or mixtures thereof as the preservative agent and an ethanol/water mixture, ethyl acetate or acetone as the solvent. | 06-11-2009 |
| 20090202739 | Method For Coating A Substrate Using Plasma - A method for forming a polymeric coating on a substrate surface, by plasma treating a mixture comprising a free-radical initiated polymerisable monomer having one or more free-radical polymerisable groups in the presence of a free radical initiator, wherein said plasma treatment is a soft ionisation plasma process (a process wherein precursor molecules are not fragmented during the plasma process and as a consequence, the resulting polymeric coating has the physical properties of the precursor or bulk polymer) aid depositing the resulting polymeric coating material onto a substrate surface. | 08-13-2009 |
| 20100047471 | BARRIER METAL FILM PRODUCTION APPARATUS, BARRIER METAL FILM PRODUCTION METHOD, METAL FILM PRODUCTION METHOD, AND METAL FILM PRODUCTION APPARATUS | 02-25-2010 |
| 20110008549 | STRUCTURE FABRICATION USING NANOPARTICLES - Apparatuses and techniques for fabricating a structure from nanoparticles are provided. | 01-13-2011 |
| 20110123726 | NANOSTRUCTURE SORTING - Apparatus, methods, and systems for sorting nanostructures, such as nanodots or nanotubes, are described. Sorting the nanostructures removes remnants of the nanotube fabrication from a mixture or bundle of material. The sorting activity may include suspending the mixture in a plasma to separate nanostructures and remnant material. A motive force, such as gas flow or laser, can be applied to the suspended nanostructures and remnants to move larger material out of the plasma, leaving smaller material trapped in the plasma. Additional embodiments are disclosed. | 05-26-2011 |
| 20120177844 | METHOD AND DEVICE FOR CHEMICAL VAPOR DEPOSITION OF POLYMER FILM ONTO A SUBSTRATE - A method for chemical vapor deposition of a polymer film onto a substrate ( | 07-12-2012 |
| 20130017342 | METHOD AND APPARATUS FOR DEPOSITING NANOSTRUCTURED THIN LAYERS WITH CONTROLLED MORPHOLOGY AND NANOSTRUCTUREAANM Riccardi; ClaudiaAACI MilanoAACO ITAAGP Riccardi; Claudia Milano ITAANM Piselli; MorenoAACI MilanoAACO ITAAGP Piselli; Moreno Milano ITAANM Fumagalli; Francesco SirioAACI TianoAACO ITAAGP Fumagalli; Francesco Sirio Tiano ITAANM Di Fonzo; FabioAACI MilanoAACO ITAAGP Di Fonzo; Fabio Milano ITAANM Bottani; Carlo EnricoAACI MilanoAACO ITAAGP Bottani; Carlo Enrico Milano IT - A method for producing, by means of plasma, nanostructured thin layers particularly of the hierarchically organized type, and an apparatus for implementing the method, are described. At least a first chamber ( | 01-17-2013 |
| 20140178604 | Dual-Zone, Atmospheric-Pressure Plasma Reactor for Materials Processing - A substrate is treated with a plasma by passing a gas through a first strong electrical field to form a plasma having active species and ionized species, passing at least a portion of said active species and ionized species into a second, weaker electrical field to generate a second but weaker plasma generation zone. Active species formed in said first plasma or said second plasma impinge onto the substrate to perform the desired treatment. The process allows a greater concentration of active species to reach the substrate than can be formed by the second plasma alone, while reducing arcing, maintaining a low gas temperature and providing other benefits. | 06-26-2014 |
| 20140199499 | METHOD FOR APPLYING MATERIAL TO A SURFACE - A method for depositing a particle on a work piece is disclosed. The housing is coupled to the work piece to form a chamber and a separation distance between a surface of the work piece and a surface of the housing is controlled using a coupling device. A working gas having a particle entrained therein is directed within the chamber to deposit the particle at the work piece. The coupling between the housing and the work piece may be a slidable coupling. The coupling device may include an air-bearing surface or a gasketed coupling. | 07-17-2014 |
| 20150093517 | METHOD OF PRODUCING ELECTROCONDUCTIVE MEMBER FOR ELECTROPHOTOGRAPHY - Provided is an electroconductive member for electrophotography, having a fiber layer on the outer peripheral surface of an electroconductive substrate, the electroconductive member having good adhesion property between the electroconductive substrate and the fiber layer. Specifically, provided is a method of producing an electroconductive member for electrophotography, the electroconductive member comprising an electroconductive substrate; and a fiber layer thereon, the fiber layer comprising fibers which have an average fiber diameter of from 0.01 μm to 40 μm, and are adhered to an outer peripheral surface of the electroconductive substrate, the method comprising the steps of: producing the fibers in a space between a nozzle and the outer peripheral surface of the electroconductive substrate by ejecting a liquid containing a raw material for the fibers from the nozzle toward the electroconductive substrate; and adhering the fibers to the outer peripheral surface of the electroconductive substrate. | 04-02-2015 |
| 20160175856 | SPRAY CHARGING AND DISCHARGING SYSTEM FOR POLYMER SPRAY DEPOSITION DEVICE | 06-23-2016 |
| 427563000 | Silicon containing coating material | 6 |
| 20090317564 | METHOD AND SYSTEM FOR GROWING A THIN FILM USING A GAS CLUSTER ION BEAM - A method of forming a thin film on a substrate is described. The method comprises providing a substrate in a reduced-pressure environment, and generating a gas cluster ion beam (GCIB) in the reduced-pressure environment from a pressurized gas mixture. A beam acceleration potential and a beam dose are set to achieve a thickness of the thin film ranging up to about 300 angstroms and to achieve a surface roughness of an upper surface of the thin film that is less than about 20 angstroms. The GCIB is accelerated according to the beam acceleration potential, and the accelerated GCIB is irradiated onto at least a portion of the substrate according to the beam dose. By doing so, the thin film is grown on the at least a portion of the substrate to achieve the thickness and the surface roughness. | 12-24-2009 |
| 20100151149 | Thin film deposition via a spatially-coordinated and time-synchronized process - A deposition system and process for the formation of thin film materials. In one embodiment, the process includes forming an initial plasma from a first material stream and allowing the plasma to evolve in space and/or time to extinguish species that are detrimental to the quality of the thin film material. After the initial plasma evolves to an optimum state, a second material stream is injected into the deposition chamber to form a composite plasma that contains a distribution of species more conducive to formation of a high quality thin film material. The deposition system includes a deposition chamber having a plurality of delivery points for injecting two or more streams (source materials or carrier gases) into a plasma region. The delivery points are staggered in space to permit an upstream plasma formed from a first material stream deposition source material to evolve before combining a downstream material stream with the plasma. Injection of different material streams is also synchronized in time. The net effect of spatial coordination and time synchronization of material streams is a plasma whose distribution of species is optimized for the deposition of a thin film photovoltaic material at high deposition rates. Delivery devices include nozzles and remote plasma sources. | 06-17-2010 |
| 20100247803 | Chemical vapor deposition method - A chemical vapor deposition (CVD) method for depositing a thin film on a surface of a substrate is described. The CVD method comprises disposing a substrate on a substrate holder in a process chamber, and introducing a process gas to the process chamber, wherein the process gas comprises a chemical precursor. The process gas is exposed to a non-ionizing heat source separate from the substrate holder to cause decomposition of the chemical precursor. A thin film is deposited upon the substrate. | 09-30-2010 |
| 20120213945 | ENHANCED DEPOSITION OF LAYER ON SUBSTRATE USING RADICALS - Embodiments relate to using radicals to at different stages of deposition processes. The radicals may be generated by applying voltage across electrodes in a reactor remote from a substrate. The radicals are injected onto the substrate at different stages of molecular layer deposition (MLD), atomic layer deposition (ALD), and chemical vapor deposition (CVD) to improve characteristics of the deposited layer, enable depositing of material otherwise not feasible and/or increase the rate of deposition. Gas used for generating the radicals may include inert gas and other gases. The radicals may disassociate precursors, activate the surface of a deposited layer or cause cross-linking between deposited molecules. | 08-23-2012 |
| 20120219727 | METHOD OF SURFACE TREATING MICROFLUIDIC DEVICES - The formation of a barrier layer within individual channels or cavities of a microfluidic device is described. The barrier layer is effected through a gas phase deposition process, desirably implemented in a plasma environment using a gas plasma reactor. Judicious selection of a precursor compound used within the gas plasma reactor can provide for generation of a layer on the individual surfaces. Desirably the surface or barrier layer is generated through the chemical adsorption of a metalloid oxide such as a silicon oxide layer on the surface of the individual channels or cavities. | 08-30-2012 |
| 20120263886 | Thin Film Deposition via a Spatially-Coordinated and Time-Synchronized Process - A system and process for the formation of thin film materials. The process includes forming a plasma from a first material stream and allowing the plasma to evolve in space and/or time to extinguish species that are detrimental to the quality of the thin film material. After the plasma evolves to an optimum state, a second material stream is injected into the deposition chamber to form a composite plasma that contains a distribution of species more conducive to formation of a high quality thin film material. The system includes a deposition chamber having a plurality of delivery points for injecting two or more streams into a plasma region. The delivery points are staggered in space to permit an upstream plasma formed from a first material stream deposition source material to evolve before combining a downstream material stream with the plasma. | 10-18-2012 |
| 427564000 | Metal, metal alloy, or metal oxide containing coating material | 3 |
| 20090324848 | METAL FILM PRODUCTION APPARATUS - A source gas is supplied into a chamber through a nozzle, and electromagnetic waves are thrown from a plasma antenna into the chamber. The resulting Cl | 12-31-2009 |
| 20100062181 | METAL FILM PRODUCTION APPARATUS AND METAL FILM PRODUCTION METHOD - A metal film production method supplies a source gas containing a halogen, such as a chlorine, to the interior of a chamber such that the source gas is intermittently supplied, to form a Cu component of a precursor into a film on a substrate, while suppressing a relative increase in etching particles. Thus, the source gas is supplied in the full presence of plasma particles contributing to film formation. Moreover, the source gas is supplied in a state in which a Cu film formed is not etched with the etching particles. Consequently, the Cu film is reliably increased with respect to the film formation time to increase the film formation speed. The temperature of the substrate is less than that of the etched member. | 03-11-2010 |
| 20130236659 | METHODS FOR VAPOR DEPOSITING HIGH TEMPERATURE COATINGS ON GAS TURBINE ENGINE COMPONENTS UTILIZING PRE-ALLOYED PUCKS - Methods for vapor depositing high temperature coatings on gas turbine components are provided, as are methods for producing pre-alloyed pucks for usage in vapor deposition processes. In one embodiment, the method includes the step of producing a pre-alloyed puck including a master alloy and a high vaporization temperature refractory metal, which has a vaporization temperature greater than each of the master alloy constituents. The pre-alloyed puck is placed over an ingot and heated to a temperature greater than the melt point of the pre-alloyed puck and less than the vaporization temperature of the high vaporization temperature refractory metal to transform the puck and a portion of the ingot into a molten pool and to produce a vapor stream containing the constituents of the master alloy and the ingot. The vapor stream is exposed to a gas turbine engine component to deposit the high temperature coating over at least one surface thereof. | 09-12-2013 |
| 427565000 | Sonic or ultrasonic (e.g., vibratory energy, etc.) | 9 |
| 20080292810 | Method For Atomizing Material For Coating Processes - A method for atomizing a liquid including providing an atomizer having a liquid supply conduit having an outlet at one end, a gas supply conduit opening into a port in the liquid supply conduit upstream of the outlet, and a means for imparting vibrational energy to the atomizer. In an embodiment, the liquid supply conduit and gas supply conduit are coaxially displaced relative to one another. The method further includes flowing liquid through the liquid supply conduit to the outlet while simultaneously flowing gas through the gas supply conduit, and imparting vibrational energy to the atomizer to atomize the liquid exiting from the outlet. The introduction of gas at the port results in a spray of droplets with improved dimensional properties. | 11-27-2008 |
| 20100075064 | METHOD FOR MAKING MAGNESIUM-BASED COMPOSITE MATERIAL - A method for making a magnesium-based composite material includes mixing nanoscale reinforcements with a melted magnesium-based material to obtain a pre-mixture. The pre-mixture is agitated by an ultrasonic process to obtain a mixture. The mixture is sprayed to a substrate. | 03-25-2010 |
| 20110318504 | METHOD FOR FABRICATING COMPOSITE MATERIAL COMPRISING NANO CARBON AND METAL OR CERAMIC - Disclosed is a method for fabricating a composite material comprising nano carbon and metal or ceramic, in more detail, a method for fabricating a composite material in which metallic or ceramic particles are uniformly dispersed on a nano carbon surface, the method including (1) coating a metal layer on nano carbon, (2) fabricating composite nano powders by performing a thermal treatment for the nano carbon coated with the metal layer, and (3) sintering the composite nano powders, whereby the composite nano powders, in which metallic or ceramic nano powders are uniformly mixed on the surface of the nano carbon, can be easily fabricated, and such composite nano powders can be sintered so as to fabricate the composite material, in which the nano carbon and the metallic or ceramic powders are uniformly dispersed. Also, the use of the composite material can have a great contribution to implementation of high performance, lightweight and size reduction in electric, electronic and vehicle-related fields, in detail, the composite material can be applied to an electrode material with a high conductivity, a thermal interface with a high thermal conductivity, a structural material with a high strength-to-weight ratio, and the like. | 12-29-2011 |
| 20130022758 | Method and Resulting Device for Processing Phosphor Materials in Light Emitting Diode Applications - A method for processing phosphors for use in optical applications includes providing a luminescent material in particulate form. The luminescent material has particles within a size range. A filter process removes particulates having a size greater than two times an upper limit of the size range to separate the particles by the desired particle size range. | 01-24-2013 |
| 20130108802 | Composite electrodes for lithium ion battery and method of making | 05-02-2013 |
| 20140050863 | EVAPORATOR WITH INTERNAL RESTRICTION - An evaporator includes a vaporization chamber having a monomer inlet and a vapor outlet. There is a vapor nozzle in the vapor outlet. The evaporator also includes a collar positioned between the vaporization chamber and the vapor nozzle which increases the pressure in the evaporation chamber while the conductance through the nozzle is substantially unchanged. | 02-20-2014 |
| 20140329029 | HYDROPHILIC MEMBER AND HYDROPHILIC PRODUCT USING THE SAME - In one embodiment, a hydrophilic member includes a substrate having a surface and particles existing at least on the surface of the substrate. The particles are constituted of at least one selected from tungsten oxide particles and tungsten oxide composite particles. The substrate surface on which the particles exist has an arithmetic mean roughness Ra in the range of 1 nm to 1000 nm with a reference length of 100 μm, and exhibits hydrophilicity independently of light. | 11-06-2014 |
| 20150110971 | Composite electrodes for lithium ion battery and method of making - A method for making a composite electrode for a lithium ion battery comprises the steps of: preparing a slurry containing particles of inorganic electrode material(s) suspended in a solvent; preheating a porous metallic substrate; loading the metallic substrate with the slurry; baking the loaded substrate at a first temperature; curing the baked substrate at a second temperature sufficient to form a desired nanocrystalline material within the pores of the substrate; calendaring the cured composite to reduce internal porosity; and, annealing the calendared composite at a third temperature to produce a self-supporting multiphase electrode. Because of the calendaring step, the resulting electrode is self-supporting, has improved current collecting properties, and improved cycling lifetime. Anodes and cathodes made by the process, and batteries using them, are also disclosed. | 04-23-2015 |
| 20150110972 | GRAPHENE-CERAMIC HYBRID COATING LAYER, AND METHOD FOR PREPARING THE SAME - Disclosed are a graphene-ceramic hybrid coating layer formed from a graphene-ceramic hybrid sol solution including graphene (RGO: reduced graphene oxide) and a ceramic sol, wherein the graphene content in the graphene-ceramic hybrid coating layer is about 0.001 wt % to about 1.8 wt % based on the total weight of the graphene-ceramic hybrid coating layer, and a method for preparing the same. | 04-23-2015 |
| 427566000 | Electron irradiation (e.g., e-beam evaporation, etc.) | 13 |
| 20090176034 | Surface Treatment Technique and Surface Treatment Apparatus Associated With Ablation Technology - The invention relates to a surface-treatment technique in association with ablation, a surface-treatment apparatus and a turbine scanner. The invention also relates to a method of producing a coating, a radiation transmission line, a copying unit and a printing unit. The invention further relates to an arrangement for adjusting the radiation power of a radiation source in a radiation transmission line and a laser apparatus. | 07-09-2009 |
| 20100040801 | VAPOR DEPOSITION MATERIAL, PROCESS FOR PRODUCING OPTICAL MEMBER OR PLASTIC LENS FOR SPECTACLE WITH USE THEREOF, AND PLASTIC LENS FOR SPECTACLE - A material for vapor deposition which is obtained by mixing a specific organosilicon compound having an alkyl group substituted with fluorine, a specific silane compound and a specific modified silicone oil, a process for producing an optical member which comprises a step of solidifying the material for vapor deposition described above by heating and a step of vapor depositing the solidified material for vapor deposition on a substrate made of a plastics by heating by a heating means to form a thin film exhibiting a water-repelling property, a process for producing a plastic lens for spectacles which is the above process applied to producing the plastic lens for spectacles, and a plastic lens for spectacles which is produced in accordance with the process. The water-repelling thin film in the optical member and in the plastic lens for spectacles produced in accordance with the above processes exhibits improved slipping property in combination with improved durability and abrasion resistance from those of conventional thin films. | 02-18-2010 |
| 20100196623 | FILM FORMING METHOD AND FILM FORMING APPARATUS - The present invention provides a film forming method and a film forming apparatus each of which is capable of forming films at low cost. The film forming method of the present invention includes the steps of (i) melting a solid material | 08-05-2010 |
| 20100221450 | Method for Producing a Carbon-Containing Material by Carbon Electron-Beam Vaporisation in a Vacuum and a Subsequent Condensation Thereof on a Substrate and a Device for Carrying Out Said Method - The invention relates to a method for producing a carbon-containing material by the carbon or carbon and another component electron-beam vaporization in vacuum and by the consequent condensation thereof consisting in reflecting a carbon vapour flow with the aid of a reflector at least once on a path between a crucible and the substrate, in capturing atoms and clusters of a transition metal, in directing the pure carbon vapour flow to the substrate, wherein it meets the vapour flow of a second organic or non-organic component, and in condensing in the substrate heating and/or cooling conditions. When required, a mixture of several neutral or reaction gases is supplied to a vacuum condensation chamber/area. The invention device for producing a carbon-containing material by the carbon or carbon and another component electron-beam vaporization in a vacuum and by consequent condensation thereof comprises at least one reflector for capturing heavy atoms and clusters of the transition metal and a gas supply inlet valve unit, thereby making it possible to obtain the pure vapour flow of carbon or the carbon with the added second organic or non-organic component and to condense it on the solid or liquid surface of the substrate by heating/cooling said surface and, when, necessary, by supplying corresponding gases for obtaining especially pure carbon-containing materials and for synthesizing novel nanomaterials. | 09-02-2010 |
| 20110229655 | PROCESS FOR PRODUCTION OF ELECTRET MATERIAL - Provided is a process by which an electret material having excellent thermal resistance of charge retentivity can be obtained. The process for producing an electret material of the invention includes an irradiation step, a formation step, and a charging step. In the irradiation step, a dispersion containing fine polytetrafluoroethylene particles is irradiated with γ rays. In the formation step, the dispersion which has been irradiated with γ rays is applied to an electrode plate and then dried, and the fine polytetrafluoroethylene particles are sintered to form a polytetrafluoroethylene layer on the electrode plate. In the charging step, the surface of the polytetrafluoroethylene layer is subjected to a charging treatment. | 09-22-2011 |
| 20120128894 | Crucible for Electron Gun Evaporation - A lower crucible component | 05-24-2012 |
| 20130129937 | Vapor Deposition of Ceramic Coatings - An apparatus for applying a coating to a substrate comprises a deposition chamber. A crucible may hold a melt pool of coating material. The melt pool is rotated during deposition. | 05-23-2013 |
| 20130280441 | DEPOSITION SOURCE - A deposition source with uniform deposition characteristics includes a crucible in which a deposition material is disposed; a heat transfer member disposed on upper portions of the deposition material in the crucible; and an accommodation member for accommodating the heat transfer member and including a mesh plate. | 10-24-2013 |
| 20160060748 | Deposition Apparatus and Methods - A deposition apparatus ( | 03-03-2016 |
| 20160115584 | NANOPARTICLE FORMATION MITIGATION IN A DEPOSITION PROCESS - A system for depositing coating on a workpiece includes a deposition chamber within which is formed a vortex to at least partially surround a workpiece therein. | 04-28-2016 |
| 427567000 | Silicon or metal oxide coating (e.g., glass, etc.) | 3 |
| 20110111135 | THIN FILM MANUFACTURING METHOD AND SILICON MATERIAL THAT CAN BE USED WITH SAID METHOD - Particles coming from an evaporation source | 05-12-2011 |
| 20120100306 | THIN FILM MANUFACTURING METHOD AND SILICON MATERIAL WHICH CAN BE USED IN THE METHOD - Particles coming from an evaporation source | 04-26-2012 |
| 20160096778 | COATING FIBERS USING DIRECTED VAPOR DEPOSITION - A method of making a fiber tow coating is provided. The method includes providing a fiber tow selected from the group consisting of carbon and silicon; and applying an oxide-based fiber interface coating onto the fiber tow using directed vapor deposition or other like deposition method. | 04-07-2016 |
| 427568000 | Silicon containing coating supply or source | 5 |
| 20090053427 | Method of Producing Glass of Optical Quality - Glass is produced by depositing presintering composition on a preform set into move in front of a plasma torch which moves back and forth substantially parallel to a longitudinal direction of the preform, a first feed duct feeds the plasma with grains of the presintering composition while optionally a second feed duct feeds the plasma with a fluorine or chlorine compound, preferably a fluorine compound, mixed with a carrier gas, whereby the presintering composition consists of granules of metal oxides or metalloid oxides of a pyrogenic silicon dioxide powder with a BET surface area of 30 to 90 m | 02-26-2009 |
| 20110129616 | OXYGEN-DOPING FOR NON-CARBON RADICAL-COMPONENT CVD FILMS - Methods of forming silicon oxide layers are described. The methods include the steps of concurrently combining both a radical precursor and a radical-oxygen precursor with a carbon-free silicon-containing precursor. One of the radical precursor and the silicon-containing precursor contain nitrogen. The methods result in depositing a silicon-oxygen-and-nitrogen-containing layer on a substrate. The oxygen content of the silicon-oxygen-and-nitrogen-containing layer is then increased to form a silicon oxide layer which may contain very little nitrogen. The radical-oxygen precursor and the radical precursor may be produced in separate plasmas or the same plasma. The increase in oxygen content may be brought about by annealing the layer in the presence of an oxygen-containing atmosphere and the density of the film may be increased further by raising the temperature even higher in an inert environment. | 06-02-2011 |
| 20110287192 | DEVICE AND METHOD FOR COATING A SUBSTRATE USING CVD - The invention relates to a device for coating a substrate ( | 11-24-2011 |
| 20140356549 | METHOD TO OBTAIN SiC CLASS OF FILMS OF DESIRED COMPOSITION AND FILM PROPERTIES - Provided are methods and systems for providing silicon carbide class of films. The composition of the silicon carbide film can be controlled by the choice of the combination of precursors and the ratio of flow rates between the precursors. The silicon carbide films can be deposited on a substrate by flowing two different organo-silicon precursors to mix together in a reaction chamber. The organo-silicon precursors react with one or more radicals in a substantially low energy state to form the silicon carbide film. The one or more radicals can be formed in a remote plasma source. | 12-04-2014 |
| 20160160397 | LIQUID SILANE-BASED COMPOSITIONS AND METHODS OF FABRICATION - Described herein are synthesis schemes and methods for producing silicon based nanostructures and materials, including compositions and methods for synthesis of silicon-based nanowires and composites from four-component inks of a liquid silane, a polymer, an accelerant and a solvent, or from five-component inks of a liquid silane, a polymer, an accelerant, a solid phase and a solvent. The methods can be used for producing silicon based microfibers and nanofibers that can be used in a variety of applications including material composites, electronic devices, sensors, photodetectors, batteries, ultracapacitors, and photosensitive substrates. | 06-09-2016 |
