| Entries |
| Document | Title | Date |
|---|
| 20110117288 | SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND STORAGE MEDIUM STORING PROGRAM - There is provided a substrate processing apparatus capable of effectively suppressing non-uniformity in deposition degree on a surface of a substrate. A substrate processing method includes depositing a deposit on a sidewall of each opening of a resist pattern, which is formed on an antireflection film on an etching target film of the substrate and is provided with a plurality of openings, before etching the etching target film of the substrate. Plasma is generated in the depositing process by introducing a CHF-based gas into the processing chamber at a flow rate equal to or higher than about 1000 sccm while a pressure in the processing chamber is set to equal to or higher than about 100 mTorr. | 05-19-2011 |
| 20130071579 | METHOD FOR PRODUCING AN OPTICAL ARTICLE COATED WITH AN ANTIREFLECTION OR A REFLECTIVE COATING HAVING IMPROVED ADHESION AND ABRASION RESISTANCE PROPERTIES - The invention relates to a method for producing an optical article having antireflection or reflective properties and comprising a substrate having at least one main surface, comprising the step of depositing an sub-layer onto a substrate's main surface, the step of treating the sub-layer by ionic bombardment and the step of depositing onto said sub-layer a multilayered stack comprising at least one high refractive index layer and at least one low refractive index layer. According to a preferred embodiment, the deposition of the sub-layer is conducted in a vacuum chamber in which a gas is supplied during the deposition step. | 03-21-2013 |
| 20130089674 | METHOD FOR FORMING METAL FILM WITH TWINS - A method for forming a metal film with twins is disclosed. The method includes: (a) forming a metal film over a substrate, the metal film being made of a material having one of a face-centered cubic crystal structure and a hexagonal close-packed crystal structure; and (b) ion bombarding the metal film at a film temperature lower than −20° C. in a vacuum chamber and with an ion-bombarding energy sufficient to cause plastic deformation of the metal film to generate deformation twins in the metal film. | 04-11-2013 |
| 20130177713 | COATING METHOD USING MICROBODY ENCAPSULATED COMPONENTS - A method is provided for forming a coating layer on a surface, wherein the coating composition includes at least two reactive components. At least one of the components is encapsulated in a plurality of microspheres, which are then mixed with the second component in a single chamber of a container. The mixture is sprayed from the chamber through a single spray nozzle onto the surface. Then, the microspheres degrade to release the first component and allow the first and second components to react with one another, thereby forming the coating layer on the surface. | 07-11-2013 |
