| Entries |
| Document | Title | Date |
|---|
| 20080213420 | Stamper and method of manufacturing the same - A stamper includes a stamper body including a nickel having a patterned surface by artificial drawing method, and a surface layer of a nickel-vanadium alloy having a vanadium content of less than 3 atomic percent formed on the patterned surface. | 09-04-2008 |
| 20080241306 | Heat transfer imprinting machine with improved frame construction | 10-02-2008 |
| 20080241307 | IMPRINTING JIG AND IMPRINTING APPARATUS - The invention provides an imprinting jig for transferring a pattern onto a thermoplastic sheet. The imprinting jig is provided with: a first die having a surface with a pattern; a die holder for supporting the first die; an elastic member placed between the first die and the die holder; and a second die opposing to the first die. The thermoplastic sheet is placed on the surface with the pattern of the first die. The imprinting jig optionally includes an adhesion reducing means between the elastic member and the first die or between the elastic member and the die holder. | 10-02-2008 |
| 20080241308 | STAMPER FOR OPTICAL INFORMATION RECORDING MEDIUM, MASTER FOR MAGNETIC TRANSFER, AND MANUFACTURING METHODS THEREOF - A method of manufacturing a stamper for an optical information recording medium includes the steps of: preparing a mother stamper having a surface layer in which a grooved pattern is formed; forming a conductive layer on the mother stamper; and forming a nickel layer on the conductive layer by electroplating the mother stamper in a plating solution consisting mainly of nickel sulfamate. In this method, during the process of forming the nickel layer, a current density is varied in at least two cycles, of which each cycle includes to increase, to maintain, and to decrease the current density sequentially in this order. | 10-02-2008 |
| 20090004319 | Template Having a Silicon Nitride, Silicon Carbide or Silicon Oxynitride Film - An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith, wherein said second thickness is defined by: c | 01-01-2009 |
| 20090004320 | IMPRINTING STAMPER AND METHOD OF MANUFACTURING THE SAME - An imprinting stamper which can transfer a microscopic pattern to a medium bearing a convex area or local projection, with high accuracy. A convexo-concave pattern is formed on a surface of the imprinting stamper. It includes a pattern layer having the convexo-concave pattern; and a stamper backside layer arranged on a backside of the pattern layer. Young's modulus of the pattern layer is 500 MPa to 10 GPa; and Young's modulus of the stamper backside layer is smaller than Young's modulus of the pattern layer. | 01-01-2009 |
| 20090004321 | MOLDING APPARATUS AND MOLDING METHOD - A molding apparatus for patterning a workpiece includes a first support member for supporting the mold, a second support member arranged opposite to the first support member, and a pressing mechanism for pressing the mold and the work together using the support members to pattern the workpiece. In this structure, either the surface of the first support member for supporting the mold or the surface of the second support member for supporting the workpiece is smaller in area than both surfaces of the mold and the workpiece. | 01-01-2009 |
| 20090252825 | Antireflective member, optical element, display device, method of making stamper and method of making antireflective member using the stamper - An antireflective member according to the present invention has an uneven surface pattern, in which unit structures are arranged in x and y directions at respective periods that are both shorter than the shortest wavelength of an incoming light ray, on the surface of a substrate and satisfies the following Inequality (1): | 10-08-2009 |
| 20100062098 | STAMPER FOR MINUTE STRUCTURE TRANSFER AND A METHOD FOR MANUFACTURING THE SAME - The present invention can provide a stamper for minute structure transfer to be excellent in durability. The present invention is characterized by which a minute pattern as formed in one side of a substrate comes in contact with a material to be transferred and the minute pattern is transferred on a resin layer of a surface of the material to be transferred. At least one layer of a thin film is mounted on at least one side of both surfaces of the substrate, the substrate and the thin film are different in a coefficient of linear expansion each other, and the substrate is curved to swell up to be convex in the side of the minute pattern by an internal stress generated in the thin film. | 03-11-2010 |
| 20100112116 | Double-Sided Nano-Imprint Lithography System - A nano-imprint lithography system is described for patterning first and second substrates, the system includes a translation stage constructed to alternatively place substrate chucks in position with respect to a nano-imprint mold assembly such that the nano-imprint mold assembly may imprint a pattern on one of the substrates, while concurrently obtaining a desired spatial relationship for the remaining substrate. | 05-06-2010 |
| 20100119641 | IMPRINT LITHOGRAPHY WITH IMPROVED SUBSTRATE/MOLD SEPARATION - In imprint lithography, a mold having a pattern of projecting and recessed regions is pressed into a moldable surface on a substrate. The thus-imprinted moldable surface is permitted to at least partially harden to retain the imprint, and the substrate and mold are separated. In accordance with the invention, the substrate is separated from the mold by bending laterally distal regions (regions away from the center toward the edges) of the mold transversely away from the interface and transversely restraining the substrate. The mold can then be easily separated from the substrate by transverse displacement. The separation can be facilitated by providing a mold having a lateral dimension that on at least two sides extends beyond the corresponding lateral dimension of the substrate. Alternatively, the substrate can have a greater lateral extent than the mold, and the mold can be restrained. The distal regions of the substrate can be bent in the transverse direction. Apparatus for effecting such separation is also described. | 05-13-2010 |
| 20100166906 | INPRINT EQUIPMENT - An imprinting apparatus which includes a mold having a recess/protrusion pattern formed on a surface thereof and a pressure-applying piston that makes the mold and a transfer substrate having a transfer layer thereon come into close contact and that applies pressure to transfer shapes of the recess/protrusion pattern to the transfer layer. The imprinting apparatus comprises a mold holding unit having a mold holding surface to hold the mold; a substrate holding unit having a substrate holding surface opposed to the mold holding surface to hold the transfer substrate; and a support unit supporting the mold holding unit and the substrate holding unit in such a way as to be able to get closer to and farther from each other. The pressure-applying piston is movable along a direction intersecting with the mold holding surface and the substrate holding surface and has a pressure-applying surface that can come into contact with one of the mold holding unit and the substrate holding unit when applying pressure, and a plurality of engaging units that can engage with one of the mold holding unit and the substrate holding unit when moving back. | 07-01-2010 |
| 20100183760 | MANUFACTURING MICRO-STRUCTURED ELEMENTS - According to the invention, a micro-structured element is manufactured by replicating/shaping (molding or embossing or the like) a 3D-structure in a preliminary product using an replication tool ( | 07-22-2010 |
| 20100196527 | Imprinting device - An imprinting device has a fixed side pressing structure and a movable side pressing structure that is movable toward and away from the fixed side pressing structure. The fixed side pressing structure includes a fixed base plate, a positioning pin for positioning a fixed stamper and a recording medium substrate, and a fixed stamper support for holding the stamper in place using suction. The movable side pressing structure includes a movable base plate, a positioning pin for positioning a movable stamper, and a movable stamper support for holding the movable stamper in position using suction, electromagnetism or adhesive. | 08-05-2010 |
| 20100196528 | STAMPER AND METHOD PRODUCING THE SAME - According to one embodiment, a stamper includes patterns corresponding to recording tracks or recording bits in a data region and patterns corresponding to information in a servo region formed in protrusions and recesses on a front side of the stamper, in which an inner periphery and an outer periphery are processed and, on a back side, an inner peripheral edge, an outer peripheral edge and a main surface of the back side lie on the same plane. | 08-05-2010 |
| 20100233309 | RELEASE SURFACES, PARTICULARLY FOR USE IN NANOIMPRINT LITHOGRAPHY - The present invention relates to release surfaces, particularly release surfaces with fine features to be replicated, and to lithography which may be used to produce integrated circuits and microdevices. More specifically, the present invention relates to a process of using an improved mold or microreplication surface that creates patterns with ultra fine features in a thin film carried on a surface of a substrate. | 09-16-2010 |
| 20100272846 | ACTUATOR - An actuator is disclosed that includes a body, the body having a face, and a plurality of conduits located in the body, each conduit deformable in response to a change of pressure within the conduit, the deformation of the conduit configured to cause a deformation of the face. | 10-28-2010 |
| 20100278954 | Method of Concurrently Patterning a Substrate Having a Plurality of Fields and a Plurality of Alignment Marks - Imprint lithography templates for patterning substrates are described. The templates include a section having a mold a first pattern of alignment forming areas and template alignment marks. The additional sections are generally devoid of a mold. One or more of the additional section may include the first pattern of a second pattern of alignment forming areas and template alignment marks. The second pattern may correspond to the first pattern. | 11-04-2010 |
| 20100278955 | Imprint Alignment Method, System and Template - Imprint lithography templates for patterning substrates are described. The templates include a section having a mold, a first pattern of alignment forming areas and template alignment marks. The additional sections are generally devoid of a mold. One or more of the additional sections may include a second pattern of alignment forming areas and template alignment marks. The second pattern may correspond to the first pattern. | 11-04-2010 |
| 20100285167 | TEMPLATES FOR USE IN IMPRINT LITHOGRAPHY AND RELATED INTERMEDIATE TEMPLATE STRUCTURES - A method of forming a template for use in imprint lithography. The method comprises providing an ultraviolet (“UV”) wavelength radiation transparent layer and forming a pattern in the UV transparent layer by photolithography. The pattern may be formed by anisotropically etching the UV transparent layer and may have feature dimensions of less than approximately 100 nm, such as dimensions of less than approximately 45 nm. An additional embodiment of the method comprises providing a UV opaque layer comprising a first pattern therein, forming a first UV transparent layer in contact with the first contact pattern of the UV opaque layer, forming a second UV transparent layer in contact with the first UV transparent layer, and removing the UV opaque layer to form the template. An intermediate template structure for use in imprint lithography is also disclosed. In other embodiments, a template that is opaque to UV wavelength radiation and a method of forming the same are disclosed. | 11-11-2010 |
| 20100291257 | Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template - A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region. | 11-18-2010 |
| 20100297282 | IMPRINT LITHOGRAPHY APPARATUS - An arrangement suitable for use in an imprint lithography apparatus is disclosed. The arrangement includes a support structure arranged to support an imprint template arrangement, a first actuator configured to apply a force to the imprint template arrangement, and a second actuator attached to the support structure, and arranged in use to extend between the support structure and the imprint template arrangement, the second actuator configured to apply a force to the imprint template arrangement, a range of movement of the second actuator being greater than a range of movement of the first actuator. | 11-25-2010 |
| 20100303947 | FINE-STRUCTURE TRANSFER APPARATUS - A fine-structure transfer apparatus has a base plate, a first post and a second post erected on the upper surface of the base plate, an elongated stamper that is fixed at one end to the upper end face of the first post. The stamper is supported at the other end in a vertically movable manner by means of an ascending/descending unit provided on the second post. A transfer element holding stage is provided on the upper surface of the base plate between the first and second posts in a position that corresponds to the position of the lower surface of the elongated stamper where a fine pattern is formed. A pressure-applying unit is provided to reciprocate on the upper surface of the elongated stamper along a longitudinal direction thereof. The transfer apparatus is characterized by the ease with which the stamper can be detached from the transfer element. | 12-02-2010 |
| 20100330221 | IMPRINT STAMPER AND IMPRINT DEVICE - An imprint stamper and imprint device are provided which, at the same time as being able to swiftly separate a substrate from a stamper after imprinting utilizing an even bowing and the resilience of the stamper when imprinting, can respond to a switch to mass production by making it difficult for a defect to occur on the pattern surface of the substrate and stamper. A stamper is configured of a plate-shaped body whose Young's modulus is 50 GPa or more, 500 GPa or less, whose thickness is 200 μm or more, 1000 μm or less, and which has a bow with a curvature of 2×10 | 12-30-2010 |
| 20110008483 | IMPRINT LITHOGRAPHY APPARATUS - An imprint lithography apparatus is disclosed that includes a structure located away from a substrate holder and extending across the substrate holder, and such that an imprint template arrangement is, in use, located between the structure and the substrate holder, wherein the structure has one or more arrays of lines or one or more encoders, and the substrate or substrate holder and the imprint template have a corresponding one or more encoders that face towards one or more of the one or more arrays of lines or one or more arrays of lines that face towards one or more of the one or more encoders, and the configuration determination arrangement is configured to determine a relative configuration between the substrate or substrate holder and the structure, and/or a relative configuration between the imprint template arrangement and the structure, and/or a relative configuration between the imprint template arrangement and the substrate or substrate holder. | 01-13-2011 |
| 20110014314 | Chucking System for Nano-Manufacturing - Chucking mechanisms may include a plurality of chucking sections respectively connecting to a pressure control device to generate individual chucking forces. The individual chucking forces of the chucking sections may be varied by the pressure control device such that a magnitude of separation force is reduced for an imprint lithography system. | 01-20-2011 |
| 20110076351 | IMPRINT LITHOGRAPHY - A method of forming an imprint template using a substrate having an inorganic release layer and a layer of imprintable medium is disclosed. The method includes using a master imprint template to imprint a pattern into the imprintable medium, causing the imprintable medium to solidify, and etching the imprintable medium and the inorganic release layer to form a pattern in the inorganic release layer. | 03-31-2011 |
| 20110076352 | IMPRINT LITHOGRAPHY - A method of determining an offset between an imprint template and a substrate using an alignment grating on the imprint template and an alignment grating on the substrate is disclosed. The method includes bringing the imprint template alignment grating and the substrate alignment grating sufficiently close together such that they form a composite grating, directing an alignment radiation beam at the composite grating while modulating the relative position of the imprint template and the substrate, detecting the intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing modulation of the detected intensity. | 03-31-2011 |
| 20110076353 | PHOTO- IMPRINTING PROCESS, MOLD-DUPLICATING PROCESS, AND MOLD REPLICA - Provided are processes such as a photo-imprinting process having high productivity without causing defacement of an expensive mold. In the photo-imprinting process of the invention, a pattern is transferred to a resin layer | 03-31-2011 |
| 20110104321 | METHOD FOR REPLICATING MASTER MOLDS - The disclosure provides a method of replicating a master using a patterned silicone daughter mold, from a master mold, the daughter mold having a layer of a ductile metal on the patterned surface thereof. | 05-05-2011 |
| 20110104322 | TEMPLATES USED FOR NANOIMPRINT LITHOGRAPHY AND METHODS FOR FABRICATING THE SAME - Provided are a template used for nanoimprint lithography and a method for fabricating the same. A raised first deposition layer pattern including at least one downwardly sloped side surface is formed on a substrate. A second deposition layer pattern covering the side surface of the raised first deposition layer pattern and progressively decreasing in width downward along the side surface of the raised first deposition layer pattern is formed. A third deposition layer is formed on the entire surface of a structure on which the second deposition layer pattern. A second deposition layer nano pattern between the raised first deposition layer pattern and a planarized third deposition layer is formed by planarizing the third deposition layer to expose upper surfaces of the raised first deposition layer pattern and the second deposition layer pattern. An intaglio nano pattern defined by side surfaces sloped downward from upper surfaces of the raised first deposition layer pattern and the planarized third deposition layer to the surface of the substrate is formed by removing the second deposition layer nano pattern. | 05-05-2011 |
| 20110123665 | IMPRINT BLANK, IMPRINT TEMPLATE AND METHOD FOR MANUFACTURING THE SAME - According to one embodiment, an imprint blank includes a substrate layer and a plurality of diamond-like carbon layers. The plurality of diamond-like carbon layers are stacked on the substrate layer, and have a mixture ratio of carbon atoms forming sp | 05-26-2011 |
| 20110142979 | PATTERNING APPARATUS - A patterning apparatus includes a stage arranged under a flexible substrate, a plurality of correction units arranged closely to the stage, attached to the flexible substrate, and configured to apply a tension force to the flexible substrate, and a pattern forming unit configured to form a pattern on the flexible substrate. The patterning apparatus corrects distortion of the flexible substrate by using the correction units. | 06-16-2011 |
| 20110159134 | METHOD OF PRODUCING A MOLD FOR IMPRINT LITHOGRAPHY, AND MOLD - In order to prevent occurrence of a residual film distribution dependent upon a pattern density of a mold, in producing the mold to be used for imprint lithography, by etching using a mask, use is made of a first mask M | 06-30-2011 |
| 20110171340 | Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template - A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region. | 07-14-2011 |
| 20110183027 | Micro-Conformal Templates for Nanoimprint Lithography - A micro-conformal nanoimprint lithography template includes a backing layer and a nanopatterned layer adhered to the backing layer. The elastic modulus of the backing layer exceeds the elastic modulus of the nanopatterned layer. The micro-conformal nanoimprint lithography template can be used to form a patterned layer from an imprint resist on a substrate, the substrate having a micron-scale defect, such that an excluded distance from an exterior surface of the micron-scale defect to the patterned layer formed by the nanoimprint lithography template is less than a height of the defect. The nanoimprint lithography template can be used to form multiple imprints with no reduction in feature fidelity. | 07-28-2011 |
| 20110189328 | PRINTING MOLD FOR NANOIMPRINT LITHOGRAPHY DEVICE - A nanoimprint lithography device includes a base, a pair of opposite rotator formed on the base, and a printing mold connected to the rotators. The printing mold includes a cylindrical main body having a nanometer-scale pattern formed thereon and a pair of connecting piece detachably connected to the main body. The printing mold is connected to the rotators via the connecting pieces and is configured to be driven by the rotators to print the nanometer-scale pattern on a substrate. | 08-04-2011 |
| 20110189329 | Ultra-Compliant Nanoimprint Lithography Template - An ultra-compliant nanoimprint lithography template having a backing layer and a nanopatterned layer adhered to the backing layer. The nanopatterned layer includes nanoscale features formed by solidifying a polymerizable material in contact with a mold. The polymerizable material includes a fluoroelastomer and a photoinitiator. The backing layer has a higher elastic modulus than the nanopatterned layer. The ultra-compliant nanoimprint lithography template can be used to form multiple high fidelity imprints. | 08-04-2011 |
| 20110195141 | TEMPLATE AND METHOD OF MAKING HIGH ASPECT RATIO TEMPLATE FOR LITHOGRAPHY AND USE OF THE TEMPLATE FOR PERFORATING A SUBSTRATE AT NANOSCALE - Template and method of making high aspect ratio template, stamp, and imprinting at nanoscale using nanostructures for the purpose of lithography, and to the use of the template to create perforations on materials and products. | 08-11-2011 |
| 20110195142 | HEAT-REACTIVE RESIST MATERIAL, LAYERED PRODUCT FOR THERMAL LITHOGRAPHY USING THE MATERIAL, AND METHOD OF MANUFACTURING A MOLD USING THE MATERIAL AND LAYERED PRODUCT - A heat-reactive resist material of the invention is characterized in that the boiling point of the fluoride of the element is 200° C. or more. By this means, it is possible to achieve the heat-reactive resist material having high resistance to dry etching using fluorocarbons to form a pattern with the deep groove depth. | 08-11-2011 |
| 20110212210 | DOOR SKIN, A METHOD OF ETCHING A PLATE, AND AN ETCHED PLATE FORMED THEREFROM - The present invention relates to a door skin comprising an exterior surface having outer portions lying on a first plane, spaced grooves recessed from the plane of the outer portions, and tonal portions having a planar area and a plurality of spaced depressions recessed from the plane of said planar area. The present invention is also directed to a method of etching a plate, for use with a molded die set, for embossing a wood grain pattern in the door skin, and the etched plate formed therefrom. | 09-01-2011 |
| 20110223279 | NANO IMPRINT MASTER AND METHOD OF MANUFACTURING THE SAME - A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed. | 09-15-2011 |
| 20110250309 | STAMPER INCLUDING A MICRO PATTERN - The present invention relates to stampers having micro patterns, and more specifically, the present invention relates to a stamper which enables to emit a color or form a character or a predetermined shape on a surface of an injection molded product owing to a pattern in a case the pattern is formed on the injection molded product by the stamper. | 10-13-2011 |
| 20110262579 | IMPRINTING MOLD AND IMPRINTING MOLDING METHOD - An imprinting mold includes a mold body including a top molding surface, an air flue formed through the mold body, and a breathable member. The air flue includes a first end exposed at the top molding surface, and a second end. The breathable member is filled in the first end of the air flue. The breathable member has an exposed surface smoothingly adjoining the molding surface. An imprinting molding method using the imprinting mold is also provided. | 10-27-2011 |
| 20110262580 | STAMPER AND METHOD OF MANUFACTURING THE SAME - According to one embodiment, a stamper manufacturing method comprises electroless plating by using a master includes a substrate, a conductive underlayer formed on the substrate and having catalytic activity, projecting patterns having no catalytic activity and partially formed on a surface of the conductive underlayer having catalytic activity, and regions in which the conductive underlayer having catalytic activity is exposed between the projecting patterns to deposite selectively an amorphous conductive layer between the projecting patterns and in the regions in which the conductive underlayer is exposed, and forming stamper projections, electroplating on the stamper projections includes the projecting patterns and the amorphous conductive layer by using the amorphous conductive layer and the conductive underlayer as electrodes to form a stamper main body made of a crystalline metal, and releasing a stamper includes the stamper projections and the stamper main body from the master. | 10-27-2011 |
| 20110287124 | UNIFORM-PRESSURE SHAPING APPARATUS AND SYSTEM - In a uniform-pressure shaping apparatus and system, the system comprises a uniform-pressure shaping apparatus, a vacuum unit and a fluid circulation unit, and the apparatus comprises a first cavity and a second cavity, each including a sealed pressure chamber, a heat conduction film and a template. An object to be imprinted is put on a pattern-imprinting surface of the template. When the first and second cavities get close to each other, the vacuum unit vacuums the space between the pattern-imprinting surfaces of the two templates. Meanwhile, the fluid circulation unit drives a hot fluid to pass through the two sealed pressure chambers. With the iso-pressure characteristic of the hot fluid, the object to be imprinted is heated and pressed uniformly until a desired shape is formed, and then a cold fluid is driven to pass through the two sealed pressure chambers to cool the object to be imprinted. | 11-24-2011 |
| 20110305787 | STAMPER FOR TRANSFER OF MICROSCOPIC STRUCTURE AND TRANSFER APPARATUS OF MICROSCOPIC STRUCTURE - A stamper is used for the transfer of microscopic structures, the stamper including a base and a microscopic structure layer on a surface thereof, in which the microscopic structure layer has a surface layer including a polymer derived from a resin composition containing a polymerization initiator and a silsesquioxane derivative having two or more polymerizable functional groups, the microscopic structure layer has a modulus of elasticity of less than 2.0 GPa and has a thickness of 4 times or more the height of a microscopic structure formed on the surface of the microscopic structure layer. | 12-15-2011 |
| 20120015068 | DEVICES FOR USE WITH MOLDED MATERIALS - This invention provides methods and devices for modifying the shape and size of moldable materials including various types of natural and synthetic clays, edible materials such as cookie dough, and modeling compound in ways that preserves the features contained within a cross section of the moldable materials and is safe to use by children. | 01-19-2012 |
| 20120015069 | NANO PATTERN WRITER - A nano pattern writer includes an array of nano needles extending from a groove in a substrate. A first portion of each nano needle is located in a respective groove of the first layer and the second portion extends from the groove. The nano pattern writer includes a second layer covering the first layer such that the first portion of the nano needles is secured between the first layer and the second layer. | 01-19-2012 |
| 20120040041 | METHOD FOR MANUFACTURING NANO-IMPRINT MOLD, METHOD FOR FORMING RESIN PATTERN BY NANO-IMPRINT TECHNIQUE, AND NANO-IMPRINT MOLD - A nano-imprint mold includes a mold body having a first surface provided with a pattern having projections and recesses, a second surface opposite the first surface and a side surface between the first surface and the second surface; and a mold base having a surface for fixing the mold body thereto. In addition, the second surface of the mold body is fixed to a part of the surface of the mold base, the second surface of the mold body being disposed away from at least a part of an edge of the surface of the mold base. Furthermore, the mold body has a shape such that a width thereof in a direction orthogonal to a direction extending from the first surface toward the second surface decreases from the first surface toward the second surface. | 02-16-2012 |
| 20120058216 | Method For Forming An Anodized Layer, Method For Manufacturing A Mold, and Mold - An anodized layer formation method of at least one example embodiment of the present invention includes the steps of: (a) providing an aluminum base which has a machined surface; (b) forming, in the surface of the aluminum base, a minute uneven structure which has a smaller average neighboring distance than an average neighboring distance of a plurality of minute recessed portions that an intended porous alumina layer has; and (c) after step (b), anodizing the surface of the aluminum base, thereby forming a porous alumina layer which has the plurality of minute recessed portions. According to at least one embodiment the present invention, a porous alumina layer which has uniformly-distributed minute recessed portions can be formed over a machined surface of an aluminum base. | 03-08-2012 |
| 20120082745 | PATTERNING MOLD AND MANUFACTURING METHOD THEREOF - Disclosed herein is a patterning mold configured to form a micropattern on a substrate or glass. The disclosed patterning mold includes a transfer body with a patterning part formed at one end of the transfer body to transfer a nanoparticle material to one surface of the substrate. The patterning mold further includes a fixing member coupled to an exterior of the transfer body, to prevent or reduce deformation of the exterior of the transfer body. | 04-05-2012 |
| 20120114780 | FABRICATION OF PHOTOPOLYMER DIES - A photopolymer die for foil stamping, foil printing, embossing, debossing, or a combination thereof is disclosed. The die has a metal backing plate on which is mounted a photopolymer layer which has a number of micro-grooves therein. Preferably the micro-grooves are arranged in a swatch like pattern. Preferably images have adjacent regions each with a different pattern of micro-grooves. The spacing between adjacent micro-grooves can be resolvable by the human eye, or cannot. | 05-10-2012 |
| 20120128811 | DOUBLE-SIDED IMPRINTING DEVICE - A double-sided imprinting device includes a top-side stamper device supported by a going up and down mechanism, and a bottom-side stamper device and a transferred body detachment device firmly provided on a moving table placed on a guide rail, in which the moving table can be moved back and forth on the guide rail by a movement driving mechanism, with a position of the top-side stamper device as a center, the bottom-side stamper device and the transferred body detachment device can move alternately to a position opposing the top-side stamper device. A bottom-side stamper provided at the bottom-side stamper device has a rectangular shape and a top-side stamper provided at the top-side stamper device has a rectangular shape so that the rectangular-shaped bottom-side stamper and the rectangular-shaped top-side stamper are provided so as to oppose in a cross shape. | 05-24-2012 |
| 20120156321 | WIDE AREA STAMP FOR ANTIREFLECTIVE SURFACE - Nanoimprint molds for molding a surface of a material are provided. A nanoimprint mold includes a body with a molding surface that is formed by shaped nanopillars. The nanopillars may be formed on a substrate and shaped by performing at least a first partial oxidation of the nanopillars and then removing at least a portion of the oxidized material. Once shaped, a hard substance is deposited on the nanopillars to begin forming the molding surface of the nanoimprint mold. The deposition of a hard substance is followed by the deposition of carbon nanotube on the hard substance and then the removal of the substrate and nanopillars from the molding surface. | 06-21-2012 |
| 20120164260 | PIPE PROCESSING APPARATUS - Pipe processing apparatus comprising a stamping tool for applying peripheral embossing and/or peripheral stamping to a pipe end section of a pipe, characterised in that the pipe processing apparatus comprises a template which has a pipe sleeve which can be inserted in the pipe end section and having at least one contact surface region, wherein the contact surface region is designed and equipped to limit the insertion depth of the pipe sleeve by means of positive locking between the contact surface region and at least one part region of a pipe end of the pipe end section facing the contact surface region and to position the stamping tool in a work position on the pipe end section as a stamping tool counter-surface. | 06-28-2012 |
| 20120177769 | DIGITALLY PREPARED STAMP MASTERS AND METHODS OF MAKING THE SAME - Positive and negative stamp masters derived from UV curable ink molds comprising ultraviolet (UV) curable inks and methods for digitally preparing those stamp masters. In particular, the digitally prepared molds provide a method of printing micropatterns of fine variable features or images in a more efficient manner than the methods currently available. | 07-12-2012 |
| 20120244243 | IMPRINT LITHOGRAPHY TEMPLATE, METHOD OF FABRICATING AN IMPRINT LITHOGRAPHY TEMPLATE, AND METHOD OF FORMING A PATTERN - According to one embodiment, an imprint-lithography template comprises: a second substrate; a first photo-curable resin provided on a main surface of the first substrate and having a first concave-convex pattern; and a second photo-curable resin provided on the main surface of the first substrate, having a second concave-convex pattern different in pattern density from the first concave-convex pattern, and having optical transmittance different from that of the first photo-curable resin. | 09-27-2012 |
| 20120244244 | NANOIMPRINT LITHOGRAPHY TEMPLATES - Nanoimprint lithography templates are provided. One such template includes a template base and a plurality of pattern layers of a first material. Each pattern layer is separated from an adjacent pattern layer by a spacing layer of a second material that is different from the first material. Such a template also includes a plurality of pillars of a third material that is different from the first material. Each of the pillars separates two adjacent pattern layers, and each of the pattern layers has a respective portion which protrudes from the spacing layers and from the pillars. | 09-27-2012 |
| 20120258191 | Apparatus for Fabricating Light Guide Plate - An apparatus for fabricating a light guide plate includes: a material supply unit supplying a material; a first processing unit including a roll rotating to extrude the material supplied from the material supply unit; and a second processing unit including a roll rotating to form a pattern on one surface of the extruded material before the material extruded by the first processing unit is cooled. | 10-11-2012 |
| 20120263816 | NANOIMPRINT-MOLD RELEASE AGENT, SURFACE TREATMENT METHOD, AND NANOIMPRINT MOLD - A nanoimprint-mold release agent including an alkoxysilane compound represented by general formula (1) is provided | 10-18-2012 |
| 20120301569 | PATTERN TRANSFERRING APPARATUS AND PATTERN TRANSFERRING METHOD - Provided is a pattern transferring apparatus ( | 11-29-2012 |
| 20120308680 | Mold for nanoimprint lithography and method for forming the same - A mold for the nanoimprint lithography and a method for forming the mold are disclosed. The mold comprises a base socket, a plug chip and an adhesive. The plug chip provides a fine pattern to be transcribed in a top surface thereof. The base socket provides a pocket within which the plug chip is set such that the top surface thereof is pushed out from the top surface of the base socket. | 12-06-2012 |
| 20120315349 | TEMPLATE, TEMPLATE MANUFACTURING METHOD, AND TEMPLATE MANUFACTURING APPARATUS - According to one embodiment, a template includes: a base substrate; and a pattern portion provided on the base substrate and including a concave-convex pattern formed from a master pattern. The concave-convex pattern is provided in a distorted state with respect to the master pattern in accordance with a distortion of an underlying pattern formed on a substrate to which a shape of the concave-convex pattern is to be transferred. | 12-13-2012 |
| 20120321738 | MICRO-PATTERN TRANSFERRING STAMPER - A micro-pattern transferring stamper includes a supporting base material and a microstructure layer formed on the supporting base material, the microstructure layer is a polymer of a resin composition that mainly contains a silsesquioxane derivative containing a plurality of polymerizable functional groups, and one or plural kinds of monomer elements containing a plurality of polymerizable functional groups. | 12-20-2012 |
| 20120321739 | SOFT MOLD AND METHOD FOR FABRICATING THE SAME - A soft mold and a method for fabricating the same are disclosed. A master mold that has a pattern on a substrate is first formed. A first liquid high polymer precursor is formed on the master mold and then partially cured. A support film having high UV transmittance is attached to the partially cured high polymer. The attached support film and the partially cured high polymer are treated with a coupling agent and a second liquid high polymer precursor is formed on the partially cured high polymer and the support film. The second liquid high polymer precursor and the partially cured high polymer are then fully cured to form a mold. The fully cured mold is stripped from the master mold to form a soft mold having a predetermined shape on one surface. | 12-20-2012 |
| 20120321740 | PNEUMATIC METHOD AND APPARATUS FOR NANO IMPRINT LITHOGRAPHY HAVING A CONFORMING MASK - An apparatus for nano lithography includes a mask having a pattern formed thereon and a pneumatic pressure driving source for applying a pneumatic pressure to at least one of a surface of the mask and a surface of a workpiece, thereby to uniformly transfer the pattern from the mask to the workpiece. | 12-20-2012 |
| 20120328728 | MOLD FOR IMPRINTING AND PRODUCTION METHOD THEREOF - To provide an imprinting mold comprising: a flattening layer provided on a substrate, having a layer made of a flattening agent; and a layer having a fine pattern on the flattening layer. | 12-27-2012 |
| 20130011511 | TRANSFER DEVICE - A transfer device | 01-10-2013 |
| 20130011512 | EMBOSSING TOOL AND EMBOSSED PRODUCT - An embossing tool includes a rotary embossing roll ( | 01-10-2013 |
| 20130029002 | Double Tread - Embodiments of the invention are used to provide ways of tire tread molding and retreading with a double tread rubber body having a unitary structure that comprises two treads in order to remove the need for buffing an oxide layer typically associated with tread molding and curing. Embodiments of the double tread molding and retreading methods also remove the need for cementing the cured tread to prevent future oxidation buildup. Once the double tread is cured and cooled, it is cut along the centerline with a double tread separation apparatus to expose a soft non-oxidized inner rubber. The cutting is much less energy intensive when compared to buffing with an expendable wire brush. There is no risk of spots of oxidized rubber being missed as is the case with buffing. There is little or no dust created. | 01-31-2013 |
| 20130040011 | APPARATUS FOR MANUFACTURING LIGHT GUIDE FILM - An apparatus for manufacturing a light guide film may comprise a feed roller, a receiving roller, a separating device, a hot press printing device and a recombining device. Firstly, the separating device may separate a protective layer from a substrate layer of the light guide film. Secondly, a surface of the substrate layer to be manufactured may be impressed with light guide dots by the hot press printing device, and the recombining device recombine the peeled protective layer to the substrate layer. And lastly, the finished light guide film is recycled by the receiving roller. The apparatus may have advantages such as high output and low cost, and it may manufacture a large dimensioned product. | 02-14-2013 |
| 20130064918 | Apparatus comprising substrate and conductive layer - A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed. | 03-14-2013 |
| 20130078330 | PRECISION PRESS DEVICE AND PRESS LOAD CONTROL METHOD THEREOF - A precision press device and a press load control method is provided for downsizing a vacuum chamber in press work in the vacuum chamber, shortening a time required to reach a vacuum and performing high accuracy pressure control. A pressure sensor is set up outside the chamber | 03-28-2013 |
| 20130084351 | STAMPING APPARATUS FOR STAMPING SHADING FILM - A stamping apparatus for stamping a shading film includes a stamping head, at least one locking member and a sleeving ring. The sleeving ring defines an axial sleeving hole and includes a stamping portion formed on a distal end thereof and surrounding the axial sleeving hole. The sleeving ring is detachably sleeved on and locked to the stamping head via the at least one locking member. The stamping portion matches with the stamping head for cooperatively stamping the shading film. | 04-04-2013 |
| 20130084352 | MOLD HAVING RELEASE LAYER FOR IMPRINTING, METHOD FOR PRODUCING MOLD HAVING RELEASE LAYER FOR IMPRINTING, AND METHOD FOR PRODUCING COPY MOLD - Provided is a mold having a release layer, in which the release layer is disposed in the mold which transfers a specific uneven pattern onto a molding material to be patterned by means of an imprinting method, wherein the main chain of the molecular chains of a compound contained in the release layer contains a fluorocarbons, the molecular chains of the compound have at least two adsorption functional groups that are adsorbed or bonded to the mold, the bonding energy in the adsorption functional groups that becomes the source of adsorption or bonding of the adsorption functional groups to the mold is greater than the bonding energy between one adsorption functional group and another adsorption functional group in the molecular chains of the compound, and the surface free energy of the release layer is optimized by means of heating. | 04-04-2013 |
| 20130122135 | Stamp for Microcontact Printing - Stamp for microcontact printing. The stamp includes a bulk portion having first and second surfaces, the first surface including a pattern of features to be transferred and the second surface including a different pattern of features. The features on the second surface have a lower stiffness than the features on the first surface. The dual-face stamp design of the invention provides an alternative location for dimensional errors to be absorbed, making microcontact printing a more robust production process. | 05-16-2013 |
| 20130136817 | TEMPERATURE ADJUSTING DEVICE, AND IMPRINTING DEVICE USING SAME - A temperature adjusting device that can heat and cool an object like a mold or a molding target uniformly and quickly, and an imprinting device using the same are provided. The temperature adjusting device is for adjusting a temperature of the object like a mold | 05-30-2013 |
| 20130136818 | Resin Mold for Nanoimprinting - Disclosed is a resin mold for nanoimprinting, which has a resin layer having fine depressions and protrusions formed on the surface and is characterized in that the resin layer is formed from 1 to 49 parts by weight of a silicone-based macromonomer and/or a fluorine-based macromonomer and 99 to 51 parts by weight of at least one polymerizable monomer selected from the group consisting of a (meth)acrylic monomer, a styrene-based monomer, an epoxy-based monomer, an olefin-based monomer and a polycarbonate-based resin-forming monomer, the silicone-based macromonomer and/or the fluorine-based macromonomer has a molecular weight of 600 to 10000 and has, at an end of molecule, a reactive group copolymerizable with the polymerizable monomer, and when the reactive group is copolymerized with the polymerizable group, silicone-based units or fluorine-based units that constitute the macromonomer form side chains on a trunk polymer formed from the polymerizable monomer and the macromonomer. | 05-30-2013 |
| 20130156878 | MICROSTRUCTURE TRANSCRIPTION APPARATUS - A microstructure transcription apparatus for transcribing microscopic concave-convex patterns on a body to be transcribed includes a stamper, on a surface of which is formed microscopic concave-convex pattern; and a stamper holder portion, which holds the stamper. The stamper holder portion includes a transparent backup member, a stamper backup elastic body attached on the backup portion covering over a central portion thereof, a space, into which a negative pressure is introduced for absorbing said stamper to hold, and a member, which is formed surrounding said stamper holder portion therein and contacts on an outer peripheral portion of said stamper. The contact member is movable with respect to the backup member, and thereby a curvature of a curved surface of said stamper to be suppressed onto said stamper backup elastic body is changeable, enabling to alter a curvature of a spherical shape on the surface of the stamper when transcribing. | 06-20-2013 |
| 20130156879 | PATTERN TRANSFER APPARATUSES AND METHODS FOR CONTROLLING THE SAME - A pattern transfer apparatus including a microscope having an ocular lens provided in a first housing, an objective lens provided in a second housing and a body tube connecting the ocular lens and the objective lens to each other, and a stamp coupled to an opening of the second housing and having a pattern to be transferred to a substrate may be provided. Checking of both defect position and transfer position of the substrate and transferring of the pattern can be performed concurrently through the microscope integrated with the stamp. Accordingly, the repetitive and continuous micro pattern transfer process can be more efficiently and rapidly performed, and the pattern can be more accurately and precisely transferred to the substrate. | 06-20-2013 |
| 20130171289 | ROLLER AND METHOD OF MAKING ROLLER - A roller for producing optical films is disclosed. The roller includes a cylindrical main body and a micro-structured layer surrounding a circumferential surface of the main body. The microstructure layer includes a number of microstructures on its surface away from the main body. The microstructure layer is made from ethylene tetrafluoroethylene. | 07-04-2013 |
| 20130183397 | ENGRAVING APPARATUS - An engraving apparatus of rubbing rollers for manufacturing retarder films is provided. The engraving apparatus comprises a body and an engraving end including a plurality of micro-groove structures. The plurality of micro-groove structures of the engraving end are arranged in parallel or irregularly. The engraving apparatus rubs on the rollers using the engraving end in a predetermined direction. Then the predetermined pattern structures are rubbed on the roller. In the rubbing process, the engraving apparatus can rub different pattern structures backwards and forwards directly without to move the engraving apparatus to the starting position of engraving paths. It keeps the manufacturing speed to manufacture the retarder film for saving the process time and the manufactured retarder film with the accuracy. | 07-18-2013 |
| 20130196018 | METHOD AND APPARATUS FOR ARTIFICIALLY AGING PRE-CAST BLOCKS - A method and apparatus for modifying the surface texture of pre-cast building blocks including a pressure-applying device so positioned as to selectively engage blocks and being adapted to apply a pressure on the surface of blocks so as to modify their texture thereof prior to the curing of the blocks. Also disclosed is an apparatus for modifying the surface texture of pre-cast building blocks including mechanisms and structures adapted to provide a plurality of longitudinal movements and a plurality of rotational movements to adjust the direction of the wearing tool in respect to the alignment of the blocks when modifying the surface texture of these blacks as well as a block-stabilizing device for stabilizing blacks during surface-texture modification operations. | 08-01-2013 |
| 20130224324 | SEALANT-ATTACHED TEMPLATE, METHOD FOR STORING TEMPLATE, TEMPLATE SEALING APPARATUS, AND TEMPLATE UNSEALING APPARATUS - A sealant-attached template includes a template, a sealing substrate, and a sealing resin. The template has a major surface and a pattern including at least one of a depression and a protrusion provided on the major surface. The sealing substrate is provided opposite to the pattern of the template. The sealing resin is provided between the major surface and the sealing substrate. | 08-29-2013 |
| 20130266682 | NANO-IMPRINT LITHOGRAPHY TEMPLATES - Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a nano-imprint lithography template and substrate. The pores or channels may be formed by etch or other processes. Gaskets may be formed on an nano-imprint lithography template to restrict flow of polymerizable material during nano-imprint lithography processes. | 10-10-2013 |
| 20130280362 | MOLDING ROLLER, APPARATUS AND METHOD FOR MANUFACTURING SAME - A molding roller includes a base roller and a flexible molding film. The base roller has a rolling surface. The molding film is wound around the rolling surface. The molding film has a molding surface. The molding surface defines impression patterns. The present invention further relates to an apparatus and provides a method for manufacturing the molding roller. | 10-24-2013 |
| 20130287881 | IMPRINT MOLD FOR MANUFACTURING BIT-PATTERNED MEDIUM AND MANUFACTURING METHOD OF THE SAME - There is provided an imprint mold for manufacturing a bit-patterned medium with an imprint method, wherein dot-shaped protrusions are formed on a main surface of a substrate, so as to be a base of a magnetic material region in the bit-patterned medium, with the dot-shaped protrusions formed at a specific cycle in a specific direction on the main surface of the substrate, wherein the dot-shaped protrusions are formed by being surrounded by lattice-shaped grooves formed by shaving the main surface of the substrate and making a plurality of continuous planar view line-shaped grooves cross each other; and a width of each line-shaped groove is smaller than a width of each dot-shaped protrusion in the specific cycle. | 10-31-2013 |
| 20130302464 | COMPOSITE TIP ARRAY FOR POLYMER PEN LITHOGRAPHY - A method of preparing a tip for lithography, includes forming a mold having at least one recess; disposing a first polymer in the recess to form an apex of the tip; curing the first polymer in the recess; and disposing a second polymer in the recess to form a base of the tip. The Young's Modulus of the second polymer is lower than the Young's Modulus of the first polymer. The tip structure for lithography includes a substrate, and a layered structure including a tip having an apex of a first polymer and a base of a second polymer. The first polymer is less resiliently deformable than the second polymer. | 11-14-2013 |
| 20130323347 | DEMOLDING DEVICE - A demolding device ( | 12-05-2013 |
| 20130337102 | Embossing Press - Precision embossing press. The press includes a rigid symmetric box frame and upper and lower parallel embossing platens mounted within the box frame for movement towards one another to provide an embossing compressive force on a work piece between the platens while maintaining parallelism between the platens. A thermal system controls platen temperature to heat the work piece for embossing and to cool the work piece for de-molding. A pneumatic actuator moves the lower platen toward the upper platen to emboss the work piece. A closed loop control system employing feedback and feed forward control loops controls platen temperatures and embossing force. | 12-19-2013 |
| 20140004221 | NANOIMPRINTING MOLD | 01-02-2014 |
| 20140072668 | MOLD AND MOLD BLANK SUBSTRATE - According to one embodiment, a mold includes a base material, a pedestal portion and a pattern portion. The base material includes a first surface and a second surface. The pedestal portion protruded from the first surface of the base material and includes a side surface. The pattern portion is provided in the pedestal portion and includes an concave-convex pattern. The pedestal portion includes a first region and a second region. The first region is provided with the concave-convex pattern. The second region is provided between the first region and the side surface. The second region has maximum height equal to maximum height of the first region. The second region has a first height of the second region on the side surface side and a second height of the second region on the first region side. The first height is lower than the second height. | 03-13-2014 |
| 20140113019 | SYSTEM FOR PASSIVE ALIGNMENT OF SURFACES - Passive stamp alignment system. The system includes a stamp supported by a stamp holder resting on three balls affixed to a top platform. A bottom platform supports a substrate to be aligned with the stamp. Means are provided for moving either the top or the bottom platform and holding the other platform stationary so as to contact the substrate with the stamp whereby the stamp holder is lifted away from each of the balls in sequence resulting in alignment of the stamp and the substrate parallel to each other. | 04-24-2014 |
| 20140113020 | MOLD MANUFACTURING MASK BLANKS AND METHOD OF MANUFACTURING MOLD - A fine pattern is formed with high pattern precision, and a time required for fabricating a mold is considerably shortened. Provided are mask blanks used for manufacturing a sub-master mold by transferring the fine pattern provided on a surface of an original mold by imprint, having a hard mask layer including a chromium compound layer expressed by a chemical formula CrO | 04-24-2014 |
| 20140120198 | RECTANGULAR MOLD-FORMING SUBSTRATE - A rectangular substrate is used as a mold after it is provided with a topological pattern. The substrate has A-side and B-side opposed surfaces, the A-side surface being provided with the topological pattern. The A-side surface includes a central rectangular region of 1 to 50 mm by 1 to 50 mm having a flatness of up to 350 nm. Use of the mold-forming substrate prevents the occurrence of a pattern misalignment or pattern error between the step of forming a pattern on a mold-forming substrate and the transfer step. Transfer of a fine size and complex pattern is possible. | 05-01-2014 |
| 20140120199 | MOLD, IMPRINT METHOD, AND PROCESS FOR PRODUCING CHIP - A mold capable of a highly accurate alignment with a member to be processed in such a state that a photocurable resin material is disposed between the mold and the member to be processed, and is constituted by a substrate | 05-01-2014 |
| 20140147543 | FLUID PRESSURE IMPRINTING DEVICE PROVIDED WITH PRESSURIZATION UNIT SECURING TOOL - An imprinting device is provided which is capable of using small an opening/closing device even when a transfer area increases. The imprinting device that transfers a molding pattern of a die to a molding target includes a pressurization unit that includes a pressurization chamber to pressurize the die and the molding target by a fluid, a stage that supports the die and the molding target pressurized by the pressurization unit, a pressurization device for adjusting the pressure of the fluid inside the pressurization chamber, an opening/closing device for relatively moving the pressurization unit and the stage, and a securing tool that secures the pressurization unit and the stage so as to prevent or suppress an application of force generated by the pressurization unit to the opening/closing device. | 05-29-2014 |
| 20140193538 | Dual-imprint pattern for apparatus - Provided herein is an apparatus, including an imprint template including a dual-imprint pattern, wherein the dual-imprint pattern is characteristic of imprinting a first pattern on the template with a first template and a second pattern on the template with a second template, and wherein the first pattern and the second pattern at least partially overlap to form the dual-imprint pattern. | 07-10-2014 |
| 20140199426 | IMPRINTING APPARATUS AND IMPRINTING METHOD USING THE SAME - Disclosed is an imprinting apparatus and imprinting method using the same that prevent a process of forming a pattern on a substrate from being affected by flatness of a stage. The imprinting apparatus comprises a chamber unit in which a process of forming a pattern on a substrate is carried out; a stage for supporting the substrate on which a resin layer is formed; an installing member positioned above the stage and having a mold member attached to transform the resin layer so as to form the pattern on the substrate; and a first spraying unit for spraying fluid to separate the substrate supported by the stage from the stage, wherein the installing member moves the mold member in the direction getting near to the substrate separated from the stage so that the mold member and the resin layer are brought into contact with each other. | 07-17-2014 |
| 20140205702 | TEMPLATE, MANUFACTURING METHOD OF THE TEMPLATE, AND POSITION MEASURING METHOD IN THE TEMPLATE - According to one embodiment, provided is a template in which a transfer region on which a first pattern to be transferred to a processing target is arranged and a non-transfer region surrounding the transfer region are formed on a principal surface of a template substrate. The template includes a second pattern used to measure deviation of a pattern formed on the template substrate from a design position in at least the transfer region. The second pattern arranged on the transfer region is not transferred to the processing target when a transfer to the processing target is performed through an imprint material. | 07-24-2014 |
| 20140212534 | Fabrication of High-Throughput Nano-Imprint Lithography Templates - An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (ρ | 07-31-2014 |
| 20140234466 | IMPRINT MOLD AND METHOD FOR MAKING USING SIDEWALL SPACER LINE DOUBLING - A method for making an imprint mold uses sidewall spacer line doubling, but without the need to transfer the sidewall spacer patterns into the mold substrate. A base layer is deposited on the mold substrate, followed by deposition and patterning of a mandrel layer into stripes with tops and sidewalls. A layer of spacer material is deposited on the tops and sidewalls of the mandrel stripes and on the base layer between the mandrel stripes. The spacer material on the tops of the mandrel stripes and on the base layer between the mandrel stripes is then removed. The mandrel stripes are then etched away, leaving stripes of sidewall spacer material on the base layer. The resulting mold is a substrate with pillars of sidewall spacer material patterned as stripes and extending from the substrate, with the sidewall spacers serving as the mold features for imprinting. | 08-21-2014 |
| 20140234467 | IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE - An imprint apparatus which cures a resin dispensed on a substrate while the resin and a pattern surface of a mold are in contact with each other, comprises a supply portion configured to supply a gas, used to accelerate filling of a concave portion of the pattern surface of the mold with the resin, to a space which the pattern surface of the mold faces, and a controller configured to control the supply portion to supply the gas to the space before the resin and the pattern surface of the mold are brought into contact with each other, wherein the supply portion is configured to supply the gas to the space via a porous portion formed in at least part of the mold. | 08-21-2014 |
| 20140234468 | MOLD BLANK, MASTER MOLD, METHOD OF MANUFACTURING COPY MOLD AND MOLD BLANK - There is provided a mold blank comprising a hard mask, wherein the hard mask layer has a composition containing chromium, nitrogen, and oxygen and has a content variation structure in which content of the nitrogen is varied continuously or gradually in a layer thickness direction and content of the oxygen is varied in the layer thickness direction continuously or gradually substantially in an opposite direction to the nitrogen. | 08-21-2014 |
| 20140287083 | IMPRINT TEMPLATE WITH OPTICALLY-DETECTABLE ALIGNMENT MARKS AND METHOD FOR MAKING USING BLOCK COPOLYMERS - A method using directed self-assembly of block copolymers (BCPs) for making an imprint template has the required patterns for both the features in the template's active area and the optically-detectable alignment marks in the template's non-active area. A chemical contrast pattern defined by a lithographic technique forms patterns of lines in both the active area and non-active area, as well as patterns of featureless gap regions in the non-active area. The pattern of lines has the BCP components aligned as lamellae perpendicular to the substrate, while the pattern of featureless gap regions has the BCP components aligned as lamellae parallel to the substrate. The patterns of lines and featureless gap regions in the non-active area define the optically detectable alignment marks. One of the BCP components is removed, leaving the other BCP component as an etch mask to fabricate the imprint template. | 09-25-2014 |
| 20140302190 | MOLDING ROLLER AND METHOD OF MANUFACTURING SAME - A molding roller includes a roller body and a molding film. The roller body includes a cylindrical surface. The molding film is sprayed on the cylindrical surface and includes a molding surface facing away from the cylindrical surface. A micro-structure pattern is formed on the molding surface. The molding film is made of a polymer material including PDMS. | 10-09-2014 |
| 20140314896 | PRINTED MOLD AND TEXTURED PANELS FORMED USING THE SAME - Implementations of the present disclosure relate to systems, methods, and apparatus for finishing polymer products and producing one or more designs, textures, and/or embossment patterns on the surface thereof. At least one implementation includes a printed mold that a manufacturer can produce quickly and inexpensively by producing a three-dimensional representation of a two-dimensional image on the surface of a substrate material. The printed mold also can allow the manufacturer to customize designs, textures, and/or embossment patterns on polymer products, while reducing manufacturing costs. | 10-23-2014 |
| 20140314897 | NANO IMPRINTING WITH REUSABLE POLYMER TEMPLATE WITH METALLIC OR OXIDE COATING - Methods and systems are provided for fabricating polymer-based imprint lithography templates having thin metallic or oxide coated patterning surfaces. Such templates show enhanced fluid spreading and filling (even in absence of purging gases), good release properties, and longevity of use. Methods and systems for fabricating oxide coated versions, in particular, can be performed under atmospheric pressure conditions, allowing for lower cost processing and enhanced throughput. | 10-23-2014 |
| 20140314898 | HEAT-REACTIVE RESIST MATERIAL, MOLD MANUFACTURING METHOD, MOLD, DEVELOPMENT METHOD AND PATTERN FORMATION MATERIAL - A heat-reactive resist material contains copper oxide, and silicon or silicon oxide, and is formed so that the content of silicon or silicon oxide in the heat-reactive resist material is 4.0 mol % or more less than 10.0 mol % in terms of mole of silicon. A heat-reactive resist layer is formed using the heat-reactive resist material, is exposed, and then, is developed with a developing solution. Using the obtained heat-reactive resist layer as a mask, dry etching is performed on a substrate with a fluorocarbon to manufacture a mold having a concavo-convex shape on the substrate surface. At this point, it is possible to control a fine pattern comprised of the concavo-convex shape. | 10-23-2014 |
| 20140322380 | DIGITAL EMBOSSING DEVICE - A device for embossing a receiver is disclosed. The device includes a means for depositing an embossing pattern of embossing particles means to press the receiver of receiver between a hard nip roller and a compliant nip roller, the pressure selected so that with a large enough load so that the embossing pattern permanently deforms the receiver; wherein, the embossing pattern consists of a digitally created pattern of embossing toner particles having an embossing-pattern thickness corresponding to a fixed stack height of at least 30% of the thickness of the receiver. | 10-30-2014 |
| 20140335215 | BLANK FOR NANOIMPRINT MOLD, NANOIMPRINT MOLD, AND METHODS FOR PRODUCING SAID BLANK AND SAID NANOIMPRINT MOLD - The present invention relates to a blank for a nanoimprint mold, comprising a glass substrate and a hard mask layer formed on the glass substrate, wherein the hard mask layer contains chromium (Cr) and nitrogen (N) and has a Cr content of 45 to 95 at %, an N content of 5 to 55 at % and a total content of Cr and N of 95 at % or more and the thickness of the hard mask layer is 1.5 nm or more and less than 5 nm. | 11-13-2014 |
| 20140342029 | ROLLER DIE AND A METHOD FOR MANUFACTURING THE ROLLER DIE - Manufacture of a roller die configured for molding microstructures onto an optical film, includes an uncoated roller and a number of micro-structures formed on an outer surface of the roller, and a layer of diamond-like carbon film being formed on the surfaces of the micro-structures. | 11-20-2014 |
| 20140342030 | MOLD FOR IMPRINT AND METHOD FOR MANUFACTURING THE SAME - Provided is a mold for imprint having a leveling agent layer in which a desired uneven pattern is formed on an outermost surface by embedding unevenness on a main surface of a base body by coting this portion with a leveling agent. | 11-20-2014 |
| 20150017275 | FINE CONCAVO-CONVEX STRUCTURE PRODUCT, HEAT-REACTIVE RESIST MATERIAL FOR DRY ETCHING, MOLD MANUFACTURING METHOD AND MOLD - A fine concavo-convex structure product ( | 01-15-2015 |
| 20150044321 | SYSTEM, METHOD AND APPARATUS FOR MANUFACTURING MAGNETIC RECORDING MEDIA - A system, method and apparatus for manufacturing high density magnetic media is disclosed. A flexible mold having a very low modulus of less than about 4 GPa is made on a rigid support. The mold nano-imprints a resist material on disks for hard disk drives. The flexible mold may comprise a perfluoropolyether with urethane acrylate end groups with a low surface adhesion from which the cured resist is easily released. | 02-12-2015 |
| 20150072039 | PRODUCTION METHOD AND PRODUCTION DEVICE OF FILM HAVING FINE IRREGULAR PATTERN ON SURFACE - A method for producing a film having a fine irregular pattern intermittently includes feeding a film to be processed intermittently from upstream side to the vicinity of the surface of a die having a fine irregular pattern, transferring the pattern to the surface of the film by pressing the film against the surface of a die, stripping the processed film on which a pattern is formed from the surface of a die, and then feeding a new film to be processed to the die, wherein the processed film is stripped from the surface of a die by gripping and moving the processed film to the upstream side, and then the processed film is fed by a length of intermittent feed to the surface of a die while preventing the processed film from creasing. | 03-12-2015 |
| 20150099028 | Tools and Methods for Forming Semi-Transparent Patterning Masks - Means, apparatus, systems, and/or methods are described for forming improved rigid or flexible semi-transparent imprinting templates. These templates can be used to produce patterning masks having improved resolution that do not require plasma etching for residue removal. The methods and apparatus are compatible with roll-to-roll manufacturing processes and enable roll-to-roll formation of a wide range of metal patterned films. | 04-09-2015 |
| 20150118344 | APPARATUS AND METHOD OF FABRICATING FLAT PLATE DISPLAY - A fabricating apparatus and a method of a flat plate display are disclosed. A fabricating apparatus of a flat plate display includes a stage on which a substrate having liquid resin formed thereon is seated, a imprinting mold bonded with the liquid resin of the substrate to form a thin film pattern on the substrate, the imprinting mold comprises projections and grooves, and a planarization layer formed between the stage and the substrate to planarize a surface of the stage. | 04-30-2015 |
| 20150140156 | NON-DEFORMABLE PATTERNED TEMPLATE - A non-deformable patterned template includes a stable mesh, wherein the stable mesh is resistant to deformation; a polymer sheet with the stable mesh embedded therein, wherein the polymer sheet is formed using a liquid polymer adapted to receive the stable mesh, and wherein the liquid polymer is cured after the stable mesh has been placed within the liquid polymer; and a surface pattern on at least one face of the polymer sheet. | 05-21-2015 |
| 20150306812 | NANOIMPRINTING MASTER TEMPLATE - A nanoimprinting master template is an ultraviolet-transparent substrate, like fused quartz, with a metallic layer having silicon dioxide pillars extending from the metallic layer and an optional silicon dioxide film on the pillars and on regions of the metallic layer between the pillars. The pillars have a generally rectangular shape and are arranged as a pattern of radial spokes and concentric rings. | 10-29-2015 |
| 20160018738 | METHOD FOR ETCHING PROTECTIVE FILM, METHOD FOR PRODUCING TEMPLATE, AND TEMPLATE PRODUCED THEREBY - A substrate having a protective film formed on a front surface and a recess in a back surface opposite the front surface is prepared. A resist pattern is formed on the protective film. The protective film is etched using plasma while applying a bias voltage, using the resist pattern as a mask. The bias voltage is increased according to the manner of decrease in the dielectric constant of a region of the substrate corresponding to a covered region of the front surface at which the protective film is present. | 01-21-2016 |
| 20160059617 | EMBOSSING TOOL AND METHODS OF PREPARATION - The present invention is directed to an embossing tool having a microstructure on its surface wherein the surface of the embossing tool has a thin layer of gold or an alloy thereof. Such an embossing tool not only can reduce adhesion between the surface of the embossing tool and a cured material, but also does not cause any significant change to the profile of the microstructure. | 03-03-2016 |
| 20160076147 | MOULD WITH A MOULD PATTERN, AND DEVICE AND METHOD FOR PRODUCING SAME - A method for the production of a structural die that has die structures for applying microstructures and/or nanostructures on substrates or soft dies, whereby the die structures are coated at least partially with a coating. In addition, the invention relates to a corresponding structural die as well as a device for the production of a structural die that has die structures for applying microstructures and/or nanostructures on substrates or soft dies, whereby the device has coating means for coating the die structures. | 03-17-2016 |
