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Silica

Subclass of:

423 - Chemistry of inorganic compounds

423324000 - SILICON OR COMPOUND THEREOF

423325000 - Oxygen containing

Patent class list (only not empty are listed)

Deeper subclasses:

Class / Patent application numberDescriptionNumber of patent applications / Date published
423339000 By precipitating 27
423338000 By gelling 14
423336000 By hydrolyzing vapor phase silicon compound 4
20090053123PROCESS FOR RECYCLING HIGH-BOILING COMPOUNDS WITHIN AN INTEGRATED CHLOROSILANE SYSTEM - Highly pure pyrogenic silica is produced in an integrated polycrystalline silicon production plant by separating offgas from polycrystalline silicon production into a high boiler fraction, vaporizing this fraction into a pyrogenic silica burner and reacting with air and/or oxygen and hydrogen to form pyrogenic silica.02-26-2009
20090280048PRODUCTION OF PYROGENIC METAL OXIDES IN TEMPERATURE-CONTROLLED REACTION CHAMBERS - Pyrogenic metal oxides having consistent quality and consistency between batches are prepared by flame hydrolysis in a reactor whose walls are cooled to below 500° C.11-12-2009
20140314654POLYCRYSTALLINE SILICON ROD AND METHOD FOR PRODUCING POLYSILICON - Polycrystalline silicon rods produced by the Siemens process produce a higher yield of CZ crystals when the process parameters are modified in a second stage of deposition such that an outer layer of larger crystallites having a mean swize>20 μm is produced. Harvesting of these polycrystalline rods and conventional rods by enclosing them in a plastic bag or sheath prior to removal from the reactor also surprisingly increase the yield of CZ crystals grown from a melt containing the sheathed rods.10-23-2014
20160107895METHOD FOR PRODUCING SILICIC ACID WITH VARIABLE THICKENING - Process for production of silica having variable thickening wherein 04-21-2016
423337000 By oxidizing volatile silicon compound (e.g., combustion, etc.) 4
20080267852Process for Preparing Pulverulent Solids - Process for preparing pulverulent solids, in which one or more oxidizable and/or hydrolysable metal compounds are reacted in a high-temperature zone in the presence of oxygen and/or steam, the reaction mixture is cooled after the reaction, and the pulverulent solid is removed from gaseous substances, wherein at least one metal compound is introduced into the high-temperature zone in solid form and the evaporation temperature of the metal compound is below the temperature of the high-temperature zone.10-30-2008
20090123357METHOD FOR MAKING SILICA NANOPARTICLES BY FLAME SPRAY PYROLYSIS ADOPTING TWO-FLUID NOZZLE - The invention relates to a method for making silica nanoparticles using a flame reactor, which includes a droplet spray having a two-fluid nozzle and a burner of a quintuple tube structure. In this method, droplets of silicon alkoxide as liquid Si compound are sprayed through the droplet spray of the flame reactor. A flame is generated by the flow of inert gas, oxygen, hydrogen and air simultaneously into the burner of the flame reactor. The liquid Si compound is delivered through the flame of the burner to produce silica nanoparticles having a mean particle size ranging from 9 nm to 68 nm. Resultant nanoparticles are collected and recovered in a particle collector. The droplets sprayed under high pressure from a silicon alkoxide solution are directly oxidized in the flame, thereby producing spherical silica nanoparticles.05-14-2009
20140023578REACTOR SYSTEM AND METHOD OF POLYCRYSTALLINE SILICON PRODUCTION THEREWITH - A method and system for reduction or mitigation of metal contamination of polycrystalline silicon are disclosed. Metal contamination of granulate polycrystalline silicon, from contact with a metal surface of components of the supporting transportation and auxiliary infrastructure of a fluidized bed reactor unit, is mitigated by use of a protective coating comprising a microcellular elastomeric polyurethane.01-23-2014
20140356273APPARATUS FOR MIXING VAPORIZED PRECURSOR AND GAS AND METHOD THEREFOR - An apparatus for mixing a vaporized precursor with a gas for producing silica particles is provided. The apparatus includes a mixer housing, a precursor delivery chamber having an output in communication with the mixer housing for delivering a vaporized precursor in the mixer housing, and an oxidizing gas delivery chamber having an output in communication with the mixer housing for delivering an oxidizing gas to be mixed with the vaporized precursor. The apparatus further includes a flashback member disposed within the mixer housing and between the output of the precursor delivery chamber and the output of the oxidizing gas delivery chamber. The flashback member is located at a minimum distance from the output of the oxidizing gas delivery chamber defined by L12-04-2014
423340000 By purifying sand 2
20110176985PRODUCTION OF PRECIPITATED SILICA - Precipitated silica is produced by a process that includes a step for filtering and washing an aqueous suspension (S), comprising the following steps: 07-21-2011
20120269711SYNTHETIC SILICA GLASS, ESPECIALLY FOR THE CLADDING OF AN OPTICAL FIBER AND A MANUFACTURING METHOD FOR THE SYNTHETIC SILICA GLASS - It is an object of the invention to provide a synthetic silica glass for a cladding of a core from a fiber laser. The refractive index should be low and there should be no foaming foreign substances. This object is achieved by a synthetic silica glass for an optical element, which contains paramagnetic E′ defect centers in an amount that is sufficient to set the absorption coefficient at 215 nm is in the range between 0.001 cm10-25-2012
Entries
DocumentTitleDate
20080206122Manufacture of silica aerogel via vapor phase reaction - A kinetically controlled vapor reaction process for synthesizing silica areogel in a reaction container by injection of a precursor reagent vapor, a catalyst reagent vapor, super saturated steam as a component of the catalyst solution, and a hydrophobic reagent vapor amd continuously mixing vapor droplets of the precursor, catalyst and water reagents in a super saturated state to continuously nucleate in a hydrolysis/poly-condensation reaction and deposit as silica aerogel.08-28-2008
20080241044Process for the Production of Monodisperse Sio2 Particles - The present invention relates to processes for the production of monodisperse SiO10-02-2008
20080286187MESOPOROUS SILICA PARTICLES AND PREPARATION METHOD THEREOF - Disclosed are mesoporous silica particles and a preparation method thereof, particularly, a method of preparing mesoporous silica particles, including mixing a silica precursor, an alkylamine-based surfactant, and a phosphoric acid-based cosurfactant, thus preparing a mixture solution (a mother liquor); adding or not adding the mixture solution with an acid solution, and conducting stirring, thus providing mesoporous silica particles; and thermally treating the mesoporous silica particles. These mesoporous silica particles are prepared using a phosphoric acid-based cosurfactant for stabilizing the surface of the particles to prevent the aggregation thereof, thereby uniformly distributing the particles. Through a hydrothermal reaction, the mesoporous silica particles have various pore sizes, a large surface area, and a high pore volume, and thus are widely used in catalysts, adsorbents, low dielectrics, and separation and purification processes, and are useful as templates for the preparation of novel porous materials, including porous carbon.11-20-2008
20090004088Method for producing an optical component of synthetic quartz glass with enhanced radiation resistance, and blank for producing the component - To optimize an optical component of synthetic quartz glass, in the case of which a quartz glass blank is subjected to a multistage annealing treatment, with respect to compaction and central birefringence, the present invention suggests a method comprising the following steps: 01-01-2009
20090041650Method for removing metal impurity from quartz component part used in heat processing apparatus of batch type - A method for removing a metal impurity from a quartz component part in a heat processing apparatus of a batch type includes placing a plurality of dummy substrates for allowing the metal impurity to be deposited thereon inside a process container with no product target substrates placed therein; then, supplying a chlorine-containing gas and water vapor into the process container and heating the quartz inner surface of the process container at a process temperature, thereby applying a baking process onto the quartz inner surface to discharge the metal impurity from the quartz inner surface and deposit the metal impurity onto the dummy substrates; and then, unloading the dummy substrates with the metal impurity deposited thereon from the reaction container.02-12-2009
20090104103ARTIFICIAL QUARTZ MEMBER, PROCESS FOR PRODUCING THE SAME, AND OPTICAL ELEMENT COMPRISING THE SAME - An object of the present invention is to provide an artificial quartz member inhibited from suffering the decrease in transmittance in a laser light wavelength region which is caused by long-term irradiation with a laser light having a wavelength of 200 nm or shorter; and a process for producing the artificial quartz member. The invention provides an artificial quartz member for use as an optical element to be irradiated with a laser light having a wavelength of 200 nm or shorter, having an aluminum content of 200 ppb or lower.04-23-2009
20090169455INK-JET RECORDING MATERIAL - An ink-jet recording material having a support and at least one ink-receiving layer, the ink-receiving layer comprising at least one binder and a cationized fumed silica prepared by copolymerizing at least one cationic monomer and at least one non-cationic monomer monomer in the presence of a fumed silica. A cationized fumed silica prepared by polymerizing the monomers in the presence of a fumed silica and a method of preparing an ink-jet recording material are also disclosed.07-02-2009
20090232721SINTERED SILICON OXIDE FOR FILM VAPOR DEPOSITION, ITS PRODUCTION METHOD, AND METHOD FOR PRODUCING SILICON OXIDE VAPOR DEPOSITION FILM - A sintered silicon oxide for film vapor deposition having a density of 1.0 to 2.0 g/cm09-17-2009
20090238747PRODUCTION OF OXIDIC NANOPARTICLES - The invention relates to a method for producing (semi)metal oxides and hydroxides, such as Si02, Ti02, Zr02, Zn0 and other (semi)metal salts such as BaSO4, which can be produced by emulsion precipitation in the form of nanoparticles from an aqueous solution. The invention also relates to the use of the same.09-24-2009
20090257939METHOD FOR PURIFICATION OF SILICA PARTICLES, PURIFIER, AND PURIFIED SILICA PARTICLES - [Problems] To provide a treatment method having excellent purification effect, in which impurities having high ionicity in a silica powder can be removed in a short time, a apparatus thereof, and a purified silica powder.10-15-2009
20090311159FUMED SILICA FOR USE AS AUXILIARY IN PHARMACEUTICAL AND COSMETIC COMPOSITIONS - Fumed silica for use as auxiliary substance in pharmaceutical and cosmetic compositions, which has—a BET surface area of 90 to 400 m12-17-2009
20100003181Method For Forming Amorphous Silica-Based Coating Film With Low Dielectric Constant And Thus Obtained Amorphous Silica-Based Coating Film - A method of forming on a substrate an amorphous silica-based coating film having a low dielectric constant of 3.0 or below and a film strength (Young's modulus) of 3.0 GPa or more, which comprises, as a typical one, the steps of; (a) coating on the substrate a liquid composition containing hydrolysate of an organic silicon compound or compounds hydrolyzed in the presence of tetraalkylammonium hydroxide (TAAOH); (b) setting the substrate in a chamber and then drying a coating film formed on the substrate at a temperature in the range from 25 to 340° C.; (c) heating the coating film at a temperature in the range from 105 to 450° C. with introduction of a superheated steam having such a temperature into the chamber, and (d) curing the coating film at a temperature in the range from 350 to 450° C. with introduction of a nitrogen gas into the chamber.01-07-2010
20100028238PLASMA SOURCE AND METHODS FOR DEPOSITING THIN FILM COATINGS USING PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION - The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.02-04-2010
20100028239CONTINUOUS REACTOR SYSTEM FOR ANOXIC PURIFICATION - A continuous process and related system for producing high purity silica are disclosed. The process and system utilize a unique high temperature rotary reactor which excludes oxygen. The use of one or more anoxic gases is described, that upon administration into the system promote the exclusion of oxygen.02-04-2010
20100061910AMORPHOUS SILICA AND ITS MANUFACTURING METHOD - A production method of amorphous silica comprises a step of preparing organic waste containing silicon oxide as a starting material, a step of immersing the organic waste in a carboxylic acid aqueous solution having a hydroxyl group, a step of washing the organic waste in water, and a step of heating the organic waste in the air atmosphere.03-11-2010
20100092365PROCESS FOR RECOVERING USEFUL PRODUCTS AND ENERGY FROM SILICEOUS PLANT MATTER - In the process disclosed herein, siliceous plant matter is steeped in water, soaked in an aqueous solution containing a solute which solubilizes inorganic oxides, soaked in an aqueous solution containing an oxidizing solute, rinsed, dried and thermally pyrolyzed to produce amorphous silica with of low carbon content, low water content, low inorganic impurity content and is of high porosity. Practice of the invention yields usable energy, does not produce carbonization of the atmosphere and is of lower nitrogen oxide and sulphur emission than currently used processes. By varying steps of the process herein disclosed, the carbon content, inorganic impurities and porosity of the resulting amorphous silica may be selectively controlled.04-15-2010
20100158782Magnesiothermic Methods Of Producing High-Purity Silicon - Magnesiothermic methods of producing solid silicon are provided. In a first embodiment, solid silica and magnesium gas are reacted at a temperature from 400° C. to 1000° C. to produce solid silicon and solid magnesium oxide, the silicon having a purity from 98.0 to 99.9999%. The silicon is separated from the magnesium oxide using an electrostatic technology. In a second embodiment, the solid silicon is reacted with magnesium gas to produce solid magnesium silicide. The magnesium silicide is contacted with hydrogen chloride gas or hydrochloric acid to produce silane gas. The silane gas is thermally decomposed to produce solid silicon and hydrogen gas, the silicon having a purity of at least 99.9999%. The solid silicon and hydrogen gas are separated into two processing streams. The hydrogen gas is recycled for reaction with chlorine gas to produce hydrogen chloride gas.06-24-2010
20100183495PROCESS FOR PREPARING HIGH-PURITY SILICON DIOXIDE GRANULE - Process for preparing a silicon dioxide granule having a specific surface area of less than 1 m07-22-2010
20100196243SURFACE-MODIFIED, PYROGENICALLY PREPARED SILICAS - Surface-modified, pyrogenically prepared silica is prepared by subjecting the pyrogenically prepared silica, which is in the form of aggregates of primary particles and possesses a BET surface area of 200±25 m08-05-2010
20100233059SURFACE-MODIFIED, PYROGENICALLY PREPARED SILICAS - Surface-modified, pyrogenically prepared silica is prepared by subjecting the pyrogenically prepared silica, which is in the form of aggregates of primary particles and possesses a BET surface area of 150±15 m09-16-2010
20100233060METHOD FOR THE PRODUCTION OF A NANO-SCALE SILICON DIOXIDE - The object of the invention is a method for the production of a nano-scale silicon dioxide, said method comprising the following steps: a) provision of an aqueous suspension of a colloidal silicon dioxide with an average particle size of 1 to 500 nm; b) allowing said suspension to react with an organosilane or organosiloxane in an aprotic cyclic ether and silanization of the colloidal silicon dioxide; c) separation of the aqueous phase of the reaction mixture from the organic phase; d) allowing the organic phase to react again with an organosilane or organosiloxane in an aprotic cyclic ether and silanization of the colloidal silicon dioxide; e) separation of the aqueous phase of the reaction mixture from the organic phase.09-16-2010
20100254876FLAKES HYDROPHOBIC THROUGH-AND-THROUGH AND COMPRISING PYROGENICALLY PREPARED SILICON DIOXIDE - Hydrophobic flakes comprising pyrogenically prepared silicon dioxide prepared by optionally mixing pyrogenically prepared silicon dioxide with water or another reaction auxiliary and a water repellent, compacting and, optionally after ripening, annealing. The hydrophobic flakes thus produced can be used as a filler in natural rubber and synthetic rubber.10-07-2010
20100284884METHOD FOR MAKING COLLOIDAL SILICA PARTICLES - Methods of making colloidal metal oxide particles and compositions containing colloidal metal oxide particles are disclosed.11-11-2010
20100310444Closed-Cell Foam Silica - A closed-cell foam glass structure comprising a multitude of micron-sized voids enclosed by interconnected glass membranes with sub-micron thickness wherein the voids are from about 30% to about 70% of the volume.12-09-2010
20110150738FORMATION OF SILICA COMPOSITIONS USING LOW SURFACTANT CONCENTRATIONS - A silica composition and a method for forming the silica composition using low surfactant concentrations are disclosed. A metal silicate precursor including a silica source and a hydroxide MOH is prepared, where M is a cation with a valence of 1. In addition, a surfactant solution including a cationic surfactant and an anionic co-surfactant is prepared. Next, the metal silicate precursor and the surfactant solution are mixed to form a mixture. Then the mixture is crystallized to form the silica composition and the silica composition is isolated. The cationic surfactant can have 10 or more carbon atoms, the anionic co-surfactant can have 4 or more carbon atoms, the molar ratio of the cationic surfactant to the silica source can be less than or equal to 0.1:1, the molar ratio of the anionic co-surfactant to the silica source can be less than or equal to 0.1:1, and the molar ratio of the anionic co-surfactant to the silica source can be less than the molar ratio of the cationic surfactant to the silica source.06-23-2011
20110165054METHOD FOR PURIFICATION OF SILICA PARTICLES, PURIFIER, AND PURIFIED SILICA PARTICLES - [Problems] To provide a treatment method having excellent purification effect, in which impurities having high ionicity in a silica powder can be removed in a short time, a apparatus thereof, and a purified silica powder.07-07-2011
20110176984METHOD FOR MAKING SILICON FOR SOLAR CELLS AND OTHER APPLICATIONS - A method for preparation of high purity silicon suitable for photovoltaic cells using reduction of silica, which is pre-purified in an aqueous solution, in presence of a reducing agent, preferably carbonaceous agent, where the pre-purified silica has a low amount of boron suitable for photovoltaic cells is described.07-21-2011
20110189071MESOPOROUS NANOSTRUCTURES - The invention provides a process for making a particulate mesoporous material. A solution comprising a surfactant and a base is combined with a hydrolysable precursor without agitating said solution. The resulting mixture is then allowed to stand without externally applied agitation for sufficient time for hydrolysis of the precursor to form the particulate mesoporous material.08-04-2011
20110195011METHOD FOR MAKING HIGH PURITY METAL OXIDE PARTICLES AND MATERIALS MADE THEREOF - The present invention is directed to a method of making metal oxide and mixed metal oxide particles. The method includes treating a mixture formed from a metal source, such as metal alkoxide, a surfactant, and a first alcohol in an aqueous media at a very high metal oxide yield. The mixture is reacted using a catalyst to form metal oxide particles having a desired particle size in said mixture. The method is particularly suitable for forming silica particles. The metal oxide particles can then be heat treated to form synthetic fused metal oxides such as, for example, synthetic fused silica.08-11-2011
20110206590SILICON OXIDE FILM, METHOD FOR FORMING SILICON OXIDE FILM, AND PLASMA CVD APPARATUS - To form a dense high-quality silicon oxide film (SiO08-25-2011
20110236288METHOD FOR PRODUCING HIGH-PURITY SIO2 FROM SILICATE SOLUTIONS - The invention relates to a novel method for producing high-purity SiO09-29-2011
20110300047METHOD FOR RECYCLING SILICON - A method for recycling silicon, comprises a filtrating step, providing a siliceous mortar containing silicon carbide, silicon and a buffer, and further filtering out the buffer form the siliceous mortar to obtain a siliceous slurry; a removing step, heating the siliceous slurry till the buffer has evaporated to obtain a mixture of silicon and silicon carbide; a stirring step, placing the mixture of silicon and silicon carbide in a liquid-substrate followed by stirring and incubating for a while to obtain a sedimentation of the mixture of silicon and silicon carbide and a suspension containing the liquid-substrate and silicon; and a purifying step, filter off the liquid-substrate in the suspension, and silicon powders are obtained.12-08-2011
20120121494PROCESS FOR REACTIVATING SILICA SURFACES FOR THE ISOLATION OF NUCLEIC ACIDS - The present invention relates to a process for increasing the binding capacity, in particular reactivation, of silica surfaces, in particular silica matrices, by treatment with water or an aqueous solution and also the use of water for reactivating silica membranes.05-17-2012
20120148470METHOD FOR PRODUCING SILICA PARTICLES - A method for producing silica particles, includes preparing a silica particle dispersion containing silica particles, and a solvent containing an alcohol and water, and bringing supercritical carbon dioxide into contact with the silica particle dispersion to remove the solvent.06-14-2012
20120156121FOULING RESISTANT SYSTEM - A coating for spark plugs and engine parts is resistant to fouling. The coating may be applied to the spark plug or engine part by dipping the part in a sol gel solution, ensuring it wets the part, and extracting it at a slow, controlled rate. As the part is allowed to dry, the sol gel reacts with moisture in the air to form a thin oxide film. Unlike conventional sol gel applications, which apply the oxide directly to the part, the present invention may form an oxide coating, in situ, while drying in place on the part.06-21-2012
20120164052SPHERICAL ORGANIC POLYMER-SILICON COMPOUND COMPOSITE PARTICLES, HOLLOW PARTICLES AND THEIR PRODUCTION METHODS - The present invention is to provide hollow particles with a low degree of agglomeration and having a high roundness, and a process for producing them. Hollow particles comprising a silicon compound, having an average particle size of from 5 to 65 nm and an average roundness of at least 0.90, and having a shell comprising the silicon compound and having a thickness of from 1 to 20 nm. Further, a method for producing hollow particles, which comprises adding sulfuric acid to a liquid containing spherical organic polymer-silicon compound composite particles having a core comprising an organic polymer and a shell comprising a silicon compound in a medium containing at least 95 mass % of water, followed by heating to carbonize the organic polymer thereby to convert it to a carbide, and subjecting the carbide to decomposition using a liquid oxidizing agent other than sulfuric acid.06-28-2012
20120213685OPTICAL MEMBER FOR DEEP ULTRAVIOLET AND PROCESS FOR PRODUCING SAME - The present invention relates to an optical member for deep ultraviolet having a wavelength of 250 nm or shorter, containing a synthetic silica glass which does not substantially contain a halogen element, has a maximum OH group content of less than 10 ppm by weight, has contents of ODC (oxygen deficient centers) and E-prime center of each less than 1×1008-23-2012
20120269710Thermal oxidation system and method for preventing water from accumulation - The invention proposes a thermal oxidation system, which comprises: a reaction furnace for preparing silicon oxide by wet oxidation; a vapor generating chamber, feed gases reacting in the vapor generating chamber to generate water vapor and the generated water vapor entering the reaction furnace through the delivery of a pipeline; a feed gas inlet pipeline for providing the feed gases to the vapor generating chamber; a carrier gas inlet pipeline for providing the carrier gas to the reaction furnace; and a heater coupled to the feed gas inlet pipeline for heating the feed gases to promote their reaction to generate water vapor; characterized in that, the thermal oxidation system further comprises a heating device coupled to the carrier gas inlet pipeline. In the thermal oxidation system and method according to the invention, since the carrier gas is heated, liquid water is avoided to remain in the gas inlet pipeline, which controls the quality in growth of the film, and improves the reliability of the semiconductor device.10-25-2012
20120328502Preparation of Metal Oxide Nanotubes - The present invention relates to a preparation process for metal oxide nanotubes, the SiO12-27-2012
20130011319APPARATUS FOR MIXING VAPORIZED PRECURSOR AND GAS AND METHOD THEREFOR - An apparatus for mixing a vaporized precursor with a gas for producing silica particles is provided. The apparatus includes a mixer housing, a precursor delivery chamber having an output in communication with the mixer housing for delivering a vaporized precursor in the mixer housing, and an oxidizing gas delivery chamber having an output in communication with the mixer housing for delivering an oxidizing gas to be mixed with the vaporized precursor. The apparatus further includes a flashback member disposed within the mixer housing and between the output of the precursor delivery chamber and the output of the oxidizing gas delivery chamber. The flashback member is located at a minimum distance from the output of the oxidizing gas delivery chamber defined by L01-10-2013
20130095025GRANULAR MESOPOROUS SILICA AND PREPARATION METHOD THEREOF - Disclosed are granular mesoporous silica and a preparation method thereof. The preparation method includes preparing powdered silica containing a structure derivative to form mesopores; preparing a molded precursor including the powdered silica and an inorganic binder or an organic binder; preparing a granular molded article having a predetermined shape by extruding or injection-molding the molded precursor; and removing the structure derivative by calcinating the granular molded article. The granular mesoporous silica represents superior pore characteristics and is used as an adsorbent capable of effectively removing pollutants in water treatment and air pollution treatment.04-18-2013
20130129597SURFACE-TREATED METAL OXIDE PARTICLES - The invention provides metal oxide particles surface-treated with at least one alkoxysilane compound, methods of making such, and toners comprising same.05-23-2013
20140017154METHOD OF PREPARING MESOPOROUS SILICA PARTICLES USING SPRAY PYROLYSIS - Disclosed is a method of preparing mesoporous silica particles. The method includes (a) preparing an aqueous silicic acid, (b) spraying the aqueous silicic acid in a droplet state by activating the aqueous silicic acid, and (c) pyrolyzing the sprayed droplet through a reactor, which is previously heated, by allowing the sprayed droplet to pass through the reactor together with a carrier gas. The aqueous silicic acid includes 0.4 M to 0.8 M of silicic acid.01-16-2014
20140030180MANUFACTURE OF CRYSTALLITE PARTICLES - A method for the manufacture of crystallite particles, said method comprising the steps of: a) reacting a reaction solution comprising a silicate, a micelle forming agent, an alkane, a salt under stirring at pH 2 or lower, wherein the reaction solution comprises HCI in a concentration of at least 1.5 M, wherein the stirring is performed not more than 10 minutes, and b) treating the obtained material to remove the micelle forming agent with one method selected from i) heat treating the material above 300° C., ii) treating the material with at least one selected from H01-30-2014
20140037528METHOD FOR PRODUCING POROUS GRANULES FROM INORGANIC MATERIAL AND THE USE THEREOF - Build-up granulation and compaction granulation methods are generally known for producing granules from porous inorganic material. In order to allow a cost-efficient yet also reproducible production of porous granules having a more pronounced hierarchical pore structure, the invention relates to a method comprising the following steps: (a) supplying a feedstock flow to a reaction zone in which the feedstock is converted to material particles by means of pyrolysis or hydrolysis, (b) depositing the material particles on a deposition surface (02-06-2014
20140099250DEVICE FOR RECOVERING SICL4 SLURRY AND METHOD FOR THE SAME - A device for recovering SiCl04-10-2014
20140127113PROCESS FOR PRODUCING SCALY SILICA PARTICLES - To produce scaly silica particles in which formation of irregular particles is prevented.05-08-2014
20140127114POROUS SILICA, OPTICAL-PURPOSE LAYERED PRODUCT AND COMPOSITION, AND METHOD FOR PRODUCING POROUS SILICA - A porous silica having a low refractive index and being stable when exposed to water, and which is configured to have a refractive index of 1.3 or lower and to have a difference of the refractive index at a wavelength 550 nm between before the immersion into water and after the immersion into water for 24 hours of 0.15 or lower.05-08-2014
20140322120METHOD FOR PREPARATION OF AMORPHOUS SILICA FROM BIOMASS - A method for preparation of amorphous silica from biomass. The method includes pyrolyzing the biomass under anaerobic conditions to yield a pyrolysis gas and solid residues, collecting the pyrolysis gas, and calcining the solid residues under aerobic conditions to yield amorphous silica.10-30-2014
20140356272VOLUME PRODUCTION METHOD FOR UNIFORMLY SIZED SILICA NANOPARTICLES - The present invention relates to a method for large-scale production of uniform-sized silica nanoparticles, using a basic buffer solution. In particular, the present invention is directed to a method for producing uniform-sized silica nanoparticles, comprising: (i) adding a solution of a silica precursor and an organic solvent to a basic buffer solution, followed by heating; and (ii) separating silica nanoparticles produced in the step (i).12-04-2014
20150064093MESOPOROUS SILICA AND ORGANOSILICA MATERIALS AND PROCESS FOR THEIR PREPARATION - In this invention, we disclose a method as well as silica and/or organosilica mesoporous materials obtained by templating using nanocrystalline cellulose and removal of the latter using acidic conditions. The resultant mesoporous silica materials are characterized by having high surface area with tunable iridescence resulting from the long-range chiral nematic organization. This invention is an improvement over the formation of composite materials formed with nanocrystalline cellulose (NCC) and silica, where the calcination of the materials led to removal of the cellulose and formation of a mesoporous silica material. Characteristically, the removal of the NCC template using acidic conditions differentiates the silica materials thus obtained in two ways: (1) It does not lead to as significant contraction of the materials as from calcination thereby giving access to materials with larger mesopores; and (2) it allows the formation of mesoporous chiral nematic compositions that include heat-sensitive components. This approach may be used to prepare the first example of a mesoporous organosilica material with a chiral nematic pore structure. Examples of possible applications of this material include optical filters, adsorbents, chiral stationary phases for chromatography, sensors, composite materials, membranes, and templates for creating other chiral materials.03-05-2015
20150086462METHOD FOR PRODUCING SiO2 GRANULATE - The invention relates to a process for producing SiO03-26-2015
20150125375DEPOSITION OF SILICON DIOXIDE - According to the invention there is a method of depositing SiO05-07-2015
20150132208SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLISHING METHOD, AND SUBSTRATE - A polishing liquid comprising an abrasive grain, an additive, and water, wherein the abrasive grain includes a hydroxide of a tetravalent metal element, produces absorbance of 1.00 or more for light having a wavelength of 400 nm in an aqueous dispersion having a content of the abrasive grain adjusted to 1.0 mass %, and produces light transmittance of 50%/cm or more for light having a wavelength of 500 nm in an aqueous dispersion having a content of the abrasive grain adjusted to 1.0 mass %, and a difference between a NO05-14-2015
20150139885SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLISHING METHOD, AND SUBSTRATE - A polishing liquid comprising an abrasive grain, an additive, and water, wherein the abrasive grain includes a hydroxide of a tetravalent metal element, and produces absorbance of 1.00 or more and less than 1.50 for light having a wavelength of 400 nm in an aqueous dispersion having a content of the abrasive grain adjusted to 1.0 mass %.05-21-2015
20150298980METHOD FOR FORMING OF SILICEOUS FILM AND SILICEOUS FILM FORMED USING SAME - A siliceous film having high purity and a low etching rate is formed by (a) a step for forming a siliceous film on a substrate by coating a solution composed of a polysilazane, e.g., perhydropolysilazane on a substrate and then hardening (curing) the solution in an oxidizing atmosphere, or by coating a silica solution formed by a sol-gel method on a substrate, and (b) a step for heating the siliceous film in an inert gas environment containing a nitrogen-containing compound such as an alkylamine having a base dissociation constant (pKb) no greater than 4.5, or a halogen-containing compound in which the bond energy of a halogen atom such as F10-22-2015
20150376018COLLOIDAL SILICA PARTICLES, PROCESS FOR PRODUCING THE SAME, AND ORGANIC SOLVENT-DISPERSED SILICA SOL, POLYMERIZABLE COMPOUND-DISPERSED SILICA SOL, AND DICARBOXYLIC ANHYDRIDE-DISPERSED SILICA SOL EACH OBTAINED FROM THE SAME - There is provided colloidal silica particles comprising at least one polyvalent metal element M selected from a group consisting of iron, aluminum, zinc, zirconium, titanium, tin, and lead in an average content of 0.001 to 0.02 in terms of an M/Si molar ratio, and having an average primary particle diameter of 5 to 40 nm, wherein the content of the polyvalent metal element M present in an outermost layer of the colloidal particles is 0 to 0.003 atom per square nanometer (nm12-31-2015
20150376019SILICA SUPPORT STRUCTURE FOR A ZEOLITE MEMBRANE - A process for making a mechanically strong, high permeance, and relatively inexpensive support structure for zeolite membranes is described. In an example implementation, a process includes forming a silica powder from silica fibers, mixing the silica powder and a polymer solution to form a mixture, forming the mixture into a shaped mixture, and sintering the shaped mixture to form a silica support.12-31-2015
20160002054DIATOMACEOUS ENERGY STORAGE DEVICES - A printed energy storage device includes a first electrode, a second electrode, and a separator between the first and the second electrode. At least one of the first electrode, the second electrode, and the separator includes frustules, for example of diatoms. The frustules may have a uniform or substantially uniform property or attribute such as shape, dimension, and/or porosity. A property or attribute of the frustules can also be modified by applying or forming a surface modifying structure and/or material to a surface of the frustules. A membrane for an energy storage device includes frustules. An ink for a printed film includes frustules.01-07-2016
20160039682SILICA PARTICLES AND METHOD OF PREPARING THE SAME - Provided are methods of preparing silica particles having two maximum values in number particle size distribution, wherein in the two maximum values, a particle size ratio (a maximum value of a small-size side/a maximum value of a large-size side) between a maximum value of a large-size side and a maximum value of a small-size side is from 0.02 to 0.3, and a number ratio (a number of silica particles having a maximum value of the small-size side/number of silica particles having a maximum value of the large-size side) is from 1 to 100, and particles within a range of 10% from the large-size side of the silica particles have an average circularity of from 0.65 to 0.90 and an average shrinkage ratio of from 10 to 50.02-11-2016
20160083263PREPARATION METHOD FOR METALLIC OXIDE SPHERICAL CASCADE STRUCTURE - A preparation method for a metallic oxide micro-nano spherical cascade structure, belonging to the field of nanometer/micrometer microstructure material and a preparation thereof is provided. The metallic oxide spherical cascade structure of the present invention refers to a micron-sized spherical particle structure composed of metallic oxide powder having a particle size of tens of nanometers. The preparation method is as follows: uniformly mixing the metallic oxide powder and polyethylene glycol by ball-milling to obtain mixed powder of the metallic oxide and the polyethylene glycol; preparing slurry from the resulting powder, stirring uniformly, and then drying the slurry to obtain a film or bulk on a substrate; and removing by calcining organic compounds to obtain a film or bulk of the metallic oxide spherical cascade structure.03-24-2016
20160090319METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS OF SIO2 GRANULATE AND SIO2 GRANULATE SUITED THEREFOR - A method for producing synthetic quartz glass by fusion of SiO03-31-2016
20160099146Precursors Suitable For High Temperature Atomic Layer Deposition Of Silicon-Containing Films - Provided are methods of depositing silicon-containing films utilizing certain precursors at temperatures of 400° C. or higher. Certain methods comprise exposing a substrate surface to a silicon precursor and another precursor to achieve various films. Examples of silicon-containing films which can be deposited include SiN, SiC, SiO04-07-2016
20160145715TREATMENT PROCESS FOR RECOVERY AND SEPARATION OF ELEMENTS FROM LIQUORS - This invention provides a hydrometallurgical process for extracting one or more saleable products from a sulphate or chloride pregnant leach solution (PLS), or both. The products may be any one or more of the products selected from the group consisting of: precious metals including platinum group metals (PGMs), gold and silver, base metals, and rare metal elements, and metal cathodes, powders, salts or precipitates thereof; sulphur; hydrochloric acid (HCl); calcium; and silica.05-26-2016
20160159654Method for Producing Disintegrated Silica Particles - Silica particles calcined in a calcination step are supplied in a swirling flow generated by a gas introduced in a disintegration container and disintegrated therein, whereby the silica particles can be easily disintegrated and there can be obtained disintegrated silica particles having both low hygroscopicity and high dispersibility in resin. In addition, the introduction of dehumidified air (gas) during the disintegration reduces hygroscopicity and greatly improves dispersibility in resin. Furthermore, performing heating treatment (calcination) again after the disintegration causes the surface modification of the disintegrated silica particles, greatly improving hygroscopicity and dispersibility in resin. The resin composition obtained in this manner including silica particles provides good injectability and filterability when used for an underfill material for semiconductors and an in-plane spacer or sealing spacer of liquid crystal displays.06-09-2016
20160172188RINSE SOLUTION FOR SILICA THIN FILM, METHOD OF PRODUCING SILICA THIN FILM, AND SILICA THIN FILM06-16-2016
20160176718COMPOSITION FOR FORMING A SILICA BASED LAYER, SILICA BASED LAYER, AND ELECTRONIC DEVICE06-23-2016
20160185607APPARATUS OF MANUFACTURING MESOPOROUS SILICA AND METHOD OF MANUFACTURING MESOPOROUS SILICA USING THE SAME - An apparatus and a method of manufacturing mesoporous silica are provided. The apparatus includes a mount, a reactor rotatably coupled to the mount, in which mixed solution of surfactant, water and acid is to be poured, an impeller installed to the reactor and rotating to stir the mixed solution, and a heating unit installed to cover an outer surface of the reactor thereby heating the reactor.06-30-2016

Patent applications in class Silica

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