| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 422186050 | Treating surface of solid substrate | 8 |
| 20090010818 | Atmospheric Pressure Plasma Generating Apparatus by Induction Electrode - The present invention relates to an atmospheric pressure plasma generating apparatus using an induction electrode. In particular, one or more upper metal electrodes are disposed on the upper side and an induction electrode and an induction electrode antenna are disposed opposite to the upper electrodes, so that a high-density plasma is generated at low applied voltage. Further, base electrodes are used to preclude interference between the upper electrodes. Thus, lots of the upper electrodes can be constructed at a narrow space, the uniformity of intensity of a generated plasma can be secured, the source of a plasma can be provided by the upper electrodes, and the intensity of a plasma can be increased. In addition, a lower electrode is disposed on the lower side in order to extend the length of a generated plasma. | 01-08-2009 |
| 20090232715 | SURFACE WAVE EXCITATION PLASMA PROCESSING SYSTEM - To sustain uniform generation of plasma constantly over a large area. In the surface wave excitation plasma processing device, a plasma source includes: a microwave generator, a microwave waveguide and a dielectric block; and a plasma source also includes: a microwave generator, a microwave waveguide and a dielectric block. The lid of a chamber is fixed onto the microwave waveguides in parallel, and the dielectric blocks disposed in the chamber. A reflecting plate is disposed between the dielectric blocks so that electromagnetic waves propagating through the dielectric blocks are prevented from advancing into the counterpart dielectric blocks as reflected waves. Consequently, the plasma sources are controlled independently. Furthermore, a side reflector is disposed at outer circumference of each of the dielectric blocks so that a standing waves of the electromagnetic waves propagating through the dielectric blocks is formed thus forming a large area standing wave mode of surface waves uniformly. | 09-17-2009 |
| 20090280040 | PLASMA REACTOR - A plasma chemical reactor is provided. The reactor includes a chamber, a cathode assembly, and a baffle plate. The chamber forms a plasma reaction space. The cathode assembly includes a cathode support shaft and a substrate support. The cathode support shaft is coupled at one side to a wall surface of the chamber. The substrate support is coupled to the other side of the cathode support shaft and supports the substrate. The baffle plate is out inserted and coupled to the substrate support, and has a plurality of vents arranged to be spaced apart and through formed such that reaction gas can pass through, and the vents asymmetrically arranged and formed to get a vent area smaller at an opposite side than a top side of the cathode support shaft. | 11-12-2009 |
| 20100221155 | Sterilization/Aseptization Apparatus - An aseptization apparatus | 09-02-2010 |
| 20100303680 | CAPACITIVELY COUPLED PLASMA REACTOR HAVING VERY AGILE WAFER TEMPERATURE CONTROL - A plasma reactor for processing a workpiece includes a reactor chamber, an electrostatic chuck within the chamber having a top surface for supporting a workpiece and having indentations in the top surface that form enclosed gas flow channels whenever covered by a workpiece resting on the top surface. The reactor further includes thermal control apparatus thermally coupled to the electrostatic chuck, an RF plasma bias power generator coupled to apply RF power to the electrostatic chuck, a pressurized gas supply of a thermally conductive gas, a controllable gas valve coupling the pressurized gas supply to the indentations to facilitate filling the channels with the thermally conductive gas for heat transfer between a backside of a workpiece and the electrostatic chuck at a heat transfer rate that is a function of the pressure against the backside of the workpiece of the thermally conductive gas. The reactor further includes an agile workpiece temperature control loop including (a) a temperature probe in the electrostatic chuck, and (b) a backside gas pressure controller coupled to an output of the temperature probe and responsive to a specified desired temperature, the controller governing the gas valve in response to a difference between the output of the temperature probe and the desired temperature. | 12-02-2010 |
| 20140341786 | COLD PLASMA SETRILIZATION DEVICE - A cold plasma device for large area decontamination that can function as a scrub brush to sterilize surfaces and areas that are otherwise difficult, time consuming and/or may cause exposure hazards under convention sterilization methods. | 11-20-2014 |
| 20160374261 | APPARATUS FOR IMPINGING BULK MATERIAL WITH ACCELERATED ELECTRONS - An apparatus includes at least one electron beam generator for generating accelerated electrons with which bulk material particles are impingeable during free fall. The electron beam generator has an annular design in which the electrons are emitted and accelerated by an annular cathode. The electrons exit from an electron outlet window in the direction of the ring axis. The annular electron beam generator is arranged in such a way that the ring axis of the electron beam generator is oriented perpendicular to, or at an angle of up to 45° from the horizontal. The apparatus may further include a device for separating bulk material particles arranged above the annular electron beam generator, the bottom wall of said device having at least one opening out of which the bulk material particles fall and, from there, fall through the ring which is formed by the electron beam generator. | 12-29-2016 |
| 422186060 | Surface is metal | 1 |
| 20100284867 | Cold plasma decontamination device - A cold plasma device for large area decontamination that can function as a scrub brush to sterilize surfaces and areas that are otherwise difficult, time-consuming and/or may cause exposure hazards under convention sterilization methods. | 11-11-2010 |
