| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 396564000 | FLUID-TREATING APPARATUS | 29 |
| 20100209098 | DEVELOPER WASTE REUSE - An apparatus for reusing developer liquid in a plate processor device includes: a new developer liquid container ( | 08-19-2010 |
| 396566000 | Having program card, tape, or disk | 1 |
| 20110229120 | RINSING METHOD AND DEVELOPING METHOD - A rinsing method for performing a rinsing process on a substrate, after a developing process is performed on a light-exposed pattern disposed thereon, includes a step (STEP | 09-22-2011 |
| 396570000 | Photocell controlled | 1 |
| 20100086297 | Concentration Detection Apparatus and Image Formation Apparatus - A concentration detection apparatus includes: a light-emitting element that emits light; a light-emitting-element holding unit that holds the light-emitting element; a light-receiving element that receives light emitted from the light-emitting element; a light-receiving-element holding unit that holds the light-receiving element and is provided opposite to the light-emitting-element holding unit with a gap therebetween; a moving unit that can move through or at the gap between the light-emitting-element holding unit and the light-receiving-element holding unit; and a gap adjusting unit that adjusts a value of the gap as a distance between the light-emitting-element holding unit and the light-receiving-element holding unit. | 04-08-2010 |
| 396571000 | Heating, cooling, or temperature detecting | 2 |
| 20090010639 | Photo Processing Device, Cartridge, and Control Method for Photo Processing Device - RFID tag to which predetermined information is written in advance is added to a replenisher cartridge, and the information is read from the RFID tag when the replenisher cartridge is loaded in a photo processing device. Whether or not a loaded replenisher cartridge is a genuine product is judged based on whether or not the predetermined information is written in the tag. When it is judged, based on whether or not the predetermined information is in the tag, that the loaded replenisher cartridge is not the genuine product, a processing speed (carrying speed of photographic paper) is reduced from normal level and at the same time a supply quantity of the replenisher to a processing solution tank is increased from a normal level. This avoids significant reduction in the photo processing performance and enables non-genuine replenisher cartridges to be also used. | 01-08-2009 |
| 396577000 | Plural stations | 1 |
| 20110200321 | COATING AND DEVELOPING APPARATUS, DEVELOPING METHOD AND NON-TRANSITORY MEDIUM - There is provided a coating and developing apparatus that develops a substrate of which surface is coated with resist and exposed to lights. The coating and developing apparatus includes a developing module; a cleaning module; and a transfer mechanism configured to transfer a substrate developed by the developing module to the cleaning module. The developing module includes an airtightly sealed processing vessel configured to form a processing atmosphere; a temperature control plate provided in the processing vessel and mounts thereon the substrate and cools the substrate; and an atmosphere gas supply unit configured to supply an atmosphere gas including mist of a developing solution to a surface of the substrate within the processing vessel. The cleaning module includes a mounting table configured to mount thereon the substrate; and a cleaning solution supply unit configured to supply a cleaning solution to the substrate mounted on the mounting table. | 08-18-2011 |
| 396580000 | Treating superimposed or laminar sheets | 1 |
| 20150023657 | Instant photography with ordinary shell film - An improved light sensitive film and processing packet permits the production of rapidly processed, high quality negative films and a positive proof print using a simplified set of components. The reduced components afford more economical manufacture of a sheet type instant film article, with the further advantage that less residual waste material is produced. Integrated functions of negative, processing pod, and receiver sheet provide fast, simplified, yet highly detailed black and white and color photographs to be produced on conventional equipment. | 01-22-2015 |
| 396604000 | Fluid application to one side only of photographic medium | 15 |
| 20100054730 | PHOTO DEVELOPMENT APPARATUS AND METHOD FOR FABRICATING A COLOR FILTER SUBSTRATE USING THE SAME - A photo development apparatus for use in fabricating a color filter substrate for a display panel is disclosed. The disclosed photo apparatus includes a development solution supplier to supply a negative development solution. The photo apparatus also includes a first photo apparatus to form a positive photo-resist pattern to be used in forming a black matrix, wherein the positive photo-resist pattern is formed by patterning a light shielding layer formed on a substrate using the negative development solution and a positive photo-resist. | 03-04-2010 |
| 396611000 | Plate or wafer-type photographic medium | 14 |
| 20080267619 | DEVELOPING APPARATUS, DEVELOPING METHOD, COATING AND DEVELOPING SYSTEM AND STORAGE MEDIUM - A developing apparatus includes two rotating members 41 and 42 respectively having parallel horizontal axes of rotation and disposed longitudinally opposite to each other, a carrying passage forming mechanism 4 extended between the rotating members 41 and 42 to form a carrying passage, and capable of moving along an orbital path to carry a wafer W supported thereon along the carrying passage, a sending-in transfer unit 31 disposed at the upstream end of the carrying passage, a sending-out transfer unit 32 disposed at the downstream end of the carrying passage, a developer pouring nozzle 71 for pouring a developer onto the wafer W, a cleaning nozzle 72 for pouring a cleaning liquid onto the wafer W, and a gas nozzle 74 for blowing a gas against the wafer W. The developer pouring nozzle 71, the cleaning nozzle 72 and the gas nozzle 74 are arranged in that order in a direction in which the wafer W is carried along the carrying passage between the upstream and the downstream end of the carrying passage. | 10-30-2008 |
| 20090074402 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - After a substrate is cleaned, a liquid layer of a rinse liquid is formed so as to cover one surface of the substrate. Then, a liquid supply nozzle moves outward from above the center of the substrate. The liquid supply nozzle is stopped once at the time point where it moves by a predetermined distance from above the center of the substrate. In this time period, the liquid layer is divided within a thin layer region by a centrifugal force, so that a drying core is formed at the center of the liquid layer. Thereafter, the liquid supply nozzle moves outward again, so that a drying region where no rinse liquid exists expands on the substrate with the drying core as its starting point. | 03-19-2009 |
| 20100061718 | COATING AND DEVELOPING APPARATUS, COATING AND DEVELOPING METHOD, AND STORAGE MEDIUM - Disclosed herein is a coating and developing apparatus | 03-11-2010 |
| 20100232781 | Coating and developing apparatus, coating and developing method, and storage medium - A coating and developing apparatus has: a treatment block-including a water repellent module performing water repellent treatment on a substrate, a coating module, and a developing module; a substrate side-surface portion water repellent module for performing water repellent treatment on a side surface of a substrate; and a control unit controlling operations of the modules to execute steps of performing water repellent treatment at least on a side surface portion of a substrate and performing a first resist coating on an entire surface of the substrate; performing a first development after a first liquid-immersion exposure is performed; performing a second resist coating on the entire surface, and performing a second development after a second liquid-immersion exposure is performed, and further to execute a step of performing water repellent treatment on the side surface portion of the substrate after the first development and before the second exposure is performed. | 09-16-2010 |
| 20110170855 | DEVELOPING APPARATUS AND DEVELOPING METHOD - A joint nozzle that delivers a developer, a rinsing liquid and nitrogen gas is disposed adjacent the spin center of a substrate in plan view. A controller operates electromagnetic switch valves to continue supply of the developer, while spinning the substrate, in a developing process, and to start supply of the rinsing liquid in a rinsing process, immediately after the supply of the developer ends, thereby achieving a shortened period of the developing process. A switching is made to a drying process by starting supply of the nitrogen gas immediately after completion of the rinsing process. Thus, even if the substrate has a large angle of contact, formation of droplets of the rinsing liquid is inhibited to prevent post-develop defects. | 07-14-2011 |
| 20110211825 | COATING AND DEVELOPING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM - A coating and developing apparatus is provided which requires a smaller occupation space even when it incorporates a substrate inspection unit, while eliminating a disadvantageous layout. A coating film forming part B | 09-01-2011 |
| 20110236011 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate subjected to back surface cleaning by a back surface cleaning processing unit is held by a hand of an interface transport mechanism and transported to a cooling unit. The substrate whose temperature has been adjusted by the cooling unit is held by a hand of the interface transport mechanism and transported to an exposure device. The substrate subjected to exposure processing by the exposure device is held by a hand of the interface transport mechanism and transported from the exposure device to a substrate platform. | 09-29-2011 |
| 20110286738 | WET-PROCESSING APPARATUS - A wet-processing apparatus, which spouts a coating liquid onto a surface of a substrate of a substrate, includes: nozzles provided with passages for the coating liquid; a light source which illuminates an area between a plane containing the tips of the nozzles and the surface of the substrate; a camera for forming an image of the area; a control unit which provides a spout signal requesting spouting the liquid from the nozzle toward the substrate, and an imaging signal requesting the camera to start an imaging operation; and a decision unit which decides whether or not the liquid was spouted from the nozzle and whether or not changes occurred in the condition of the liquid spouted from the nozzle toward the substrate on the basis of an image formed by the camera and expressing the brightness of the liquid spouted toward the substrate and illuminated by light emitted by the light source. | 11-24-2011 |
| 20120008936 | COATING AND DEVELOPING APPARATUS - A coating and developing apparatus includes a processing block having at least one coating film-forming unit block stack and a vertically stacked developing unit block stack. Each unit block stack includes vertically stacked unit blocks, and each unit block includes processing modules containing liquid processing modules and heating modules. Each unit block includes a transport mechanism moveable along a transport passage from a carrier block side to an interface block side, to transport a substrate between the processing modules belonging to the unit block. Transfer units are provided on the carrier block sides of the coating film-forming unit blocks and the developing unit blocks respectively, for transferring a substrate to and from the transport mechanism of the associated coating film-forming or developing unit blocks. A first transfer mechanism transfers a substrate removed from a carrier to one of the transfer units associated with the coating film-forming unit blocks. | 01-12-2012 |
| 20120014689 | SUBSTRATE CLEANING APPARATUS, COATING AND DEVELOPING APPARATUS HAVING THE SAME AND SUBSTRATE CLEANING METHOD - A substrate cleaning apparatus includes a substrate holding and rotating unit for holding a center of a rear surface of a substrate and rotating the substrate; a cleaning unit including a first cleaning member, a second cleaning member provided around the first cleaning member and a base to which the first and second cleaning members are secured; an elevating unit for moving the substrate holding and rotating unit and the cleaning unit relative to each other so as to allow the first and second cleaning members to come into contact with the rear surface of the substrate held by the substrate holding and rotating unit; and a driving unit for driving the substrate and the cleaning unit relative to each other in a direction along the rear surface of the substrate so as to allow part of the second cleaning member to be exposed to the outside of the substrate. | 01-19-2012 |
| 20120057861 | COATING AND DEVELOPING APPARATUS AND METHOD, AND STORAGE MEDIUM - In one embodiment, a coating and developing apparatus is provided with a processing block including a liquid processing block disposed on the carrier block side and a heating processing block disposed on the interface block side. The liquid processing block includes a first unit block, a second unit block, and one or more of developing unit blocks overlying or underlying a stack of the first unit block and the second unit block. The first unit block includes antireflection film-forming modules and resist film-forming modules disposed on both sides of the transport passage thereof. The second unit block includes upper film-forming modules and hardening modules disposed on both sides of the transport passage thereof. | 03-08-2012 |
| 20120057862 | COATING AND DEVELOPING APPARATUS, COATING AND DEVELOPING METHOD AND NON-TRANSITORY TANGIBLE MEDIUM - A process block is formed by arranging a heating-process related block on the side of a carrier block, a group of liquid-process related unit blocks, and a heating block on the side of an interface block, in this order from the side of the carrier block to the side of the interface block. The group of liquid-process related unit blocks is composed of: a group of unit blocks for coating films that is formed by stacking upward a unit block for an antireflection film, a unit block for a resist film, and a unit bock for an upper layer film, in this order; and unit blocks for developing that are stacked on one another in the up and down direction with respect to the group of unit blocks for coating films. Liquid process modules of each of the liquid-process related unit blocks are arranged on the right and left sides of a transfer path for a substrate. | 03-08-2012 |
| 20120063765 | COATING AND DEVELOPING APPARATUS, COATING AND DEVELOPING METHOD AND NON-TRANSITORY TANGIBLE MEDIUM - A process block including a group of liquid-process related unit blocks, a first heating-process related block arranged on a carrier block side of the group of unit blocks, and a second heating-process related block arranged on an interface block side of the group of unit blocks. The group of liquid-process unit blocks includes doubled unit blocks for preprocessing for forming an antireflection film and a resist film, doubled unit blocks for post-processing for forming an upper layer film and performing a cleaning operation before exposure, and a unit block for developing. The first heating-process related block heats a substrate coated with a resist liquid and a substrate that has been developed. The second heating-process related block heats a substrate that has been exposed but is not yet developed, a substrate on which an antireflection film has been formed and a substrate on which an upper layer film has been formed. | 03-15-2012 |
| 20140044429 | Color Film Developing Apparatus - The present invention provides a color film developing apparatus, which is used to uniformly develop photoresist on the surface of a substrate as manufacturing a liquid crystal panel, comprising a developing chamber. The developing chamber comprises a first developing chamber and a second developing chamber respectively set inclined to a horizontal plane; the inclined directions of the first developing chamber and the second developing chamber inclined to the horizontal plane are contrary to each other. The color film developing apparatus according to the present invention can avoid the secondary development of the photoresist on the inclined substrate caused by the developer flowing from top to bottom when the substrate passes the developing chamber and proceeds to develop; enhance the uniformity of the development of the substrate; improve the uniformity of the in-plane process; narrow the differences; improve the quality of the product. | 02-13-2014 |
| 396612000 | Having photographic medium feed | 1 |
| 396617000 | And photographic medium immersed and removed | 1 |
| 20110091200 | PLATE DEVELOPER WITH A CONFIGURABLE TRANSPORT PATH - A development device ( | 04-21-2011 |
| 396626000 | Having fluid-circulating means | 5 |
| 20080232793 | DIPPING-TYPE AUTOMATIC DEVELOPING APPARATUS AND METHOD FOR LITHOGRAPHIC PRINTING PLATES - A dipping-type automatic developing apparatus for a lithographic printing plate, includes a first tank containing a developer, in which a lithographic printing plate precursor having an imagewise-exposed image-recording layer is dipped and a non-image area of the imagewise-exposed image-recording layer is removed; and a second tank containing a developer, wherein the developer in the first tank and the developer in the second tank are circulated into each other to keep constant a liquid level of the developer in the first tank. | 09-25-2008 |
| 20090080879 | APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE - A substrate processing apparatus discharges a hydrofluoric acid solution from discharge nozzles toward grooves formed in side walls of an inner bath. The hydrofluoric acid solution discharged from the discharge nozzles impinges upon the grooves to diffuse, thereby moving toward a top portion of the inner bath in the form of low-speed uniform liquid flows. Thus, a metal component and foreign substances generated in the inner bath float up toward the top portion of the inner bath without being agitated within the inner bath, and are rapidly drained to an outer bath together with the hydrofluoric acid solution. | 03-26-2009 |
| 396627000 | And fluid spraying means | 1 |
| 20090060493 | METHOD OF DEVELOPING A SUBSTRATE AND APPARATUS FOR PERFORMING THE SAME - In an apparatus for performing a substrate developing process, a first washing tank and a second washing tank are disposed on both sides of a substrate support section for supporting the substrate opposite to each other to wash a developing nozzle. The developing nozzle moves in a horizontal direction from the first washing tank toward the second washing tank and supplies a developing solution onto the substrate in the meantime. After supplying the developing solution, the developing nozzle is received in the second washing tank, and the developing solution adhered to the developing nozzle is removed by a washing solution in the second washing tank. | 03-05-2009 |
| 20090060493 | METHOD OF DEVELOPING A SUBSTRATE AND APPARATUS FOR PERFORMING THE SAME - In an apparatus for performing a substrate developing process, a first washing tank and a second washing tank are disposed on both sides of a substrate support section for supporting the substrate opposite to each other to wash a developing nozzle. The developing nozzle moves in a horizontal direction from the first washing tank toward the second washing tank and supplies a developing solution onto the substrate in the meantime. After supplying the developing solution, the developing nozzle is received in the second washing tank, and the developing solution adhered to the developing nozzle is removed by a washing solution in the second washing tank. | 03-05-2009 |
| 396630000 | Plural stations | 1 |
| 20110097074 | High speed motion picture film processor - A high speed motion picture film processor has a developer tank having a positive pressure relative to an ambient air pressure outside of the tank. A gas make-up system adds nitrogen inside of the developer tank while a system of seals minimizes leakage. Two seals are used along a periphery of the developer tank; one is below a sprocket level while the other is above the sprocket level. These two barriers can utilize a liquid reservoir that is filled by operation of the processor with excess liquid returning to the developer tank and they are constructed so as to allow movement. A film entrance sealing device and a film exit sealing device, each with its own housing, are also used with the developer tank; these units use a pair of rollers and a pair of flexible barriers to separate a tank gas chamber from an air chamber which is at a lower pressure and which contains a partial pressure of nitrogen fed into the entrance sealing device. The level of developer fluid is maintained at approximately the centerline of a first roller shaft but below that of a second roller shaft. The sprocket shaft has two smaller shafts mounted in metal bearings and a center tube on which the sprockets are mounted. Oxygen sensors with throttling exhaust devices outside the developer tank sound an alarm when oxygen level is too high in the developer tank. Reservoir fluid seals may also be used on secondary tanks. | 04-28-2011 |
| 396627000 | And fluid-spraying means | 1 |
| 20090060493 | METHOD OF DEVELOPING A SUBSTRATE AND APPARATUS FOR PERFORMING THE SAME - In an apparatus for performing a substrate developing process, a first washing tank and a second washing tank are disposed on both sides of a substrate support section for supporting the substrate opposite to each other to wash a developing nozzle. The developing nozzle moves in a horizontal direction from the first washing tank toward the second washing tank and supplies a developing solution onto the substrate in the meantime. After supplying the developing solution, the developing nozzle is received in the second washing tank, and the developing solution adhered to the developing nozzle is removed by a washing solution in the second washing tank. | 03-05-2009 |
| 20090060493 | METHOD OF DEVELOPING A SUBSTRATE AND APPARATUS FOR PERFORMING THE SAME - In an apparatus for performing a substrate developing process, a first washing tank and a second washing tank are disposed on both sides of a substrate support section for supporting the substrate opposite to each other to wash a developing nozzle. The developing nozzle moves in a horizontal direction from the first washing tank toward the second washing tank and supplies a developing solution onto the substrate in the meantime. After supplying the developing solution, the developing nozzle is received in the second washing tank, and the developing solution adhered to the developing nozzle is removed by a washing solution in the second washing tank. | 03-05-2009 |
| 396647000 | Photographic medium holding device | 2 |
| 20080292309 | PHOTOSENSITIVE MATERIAL TURNING MEMBER AND DEVELOPING APPARATUS - An in-liquid turn bar disposed in a developing tank includes a first cylindrical member disposed outside and a second cylindrical member disposed inside. In the first cylindrical member, plural slit-shaped discharge openings for discharging the developer along a longitudinal direction are formed. In the second cylindrical member, plural nozzle holes for ejecting the developer are formed. A pipe-shaped introduction portion for introducing the developer is provided at one end of the second cylindrical member, and the plural nozzle holes are formed gradually larger as they go from the other longitudinal end to the one end. Regulating plates for regulating the amount of the developer discharged from both transverse ends of the photosensitive web are provided at both transverse ends of the first cylindrical member. | 11-27-2008 |
| 20090003825 | SUBSTRATE PROCESSING SYSTEM - A cassette waiting block is connected to a transfer in/out block of a coating and developing treatment system, and in the cassette waiting block, a cassette transfer in/out unit, a cassette waiting unit, a cassette delivery unit, and a substrate processing unit are provided. In the cassette waiting block, a cassette transfer unit for transferring the cassette between the cassette transfer in/out unit, the cassette waiting unit, and the cassette deliver unit, and a transfer unit for transferring the substrate between the cassette in the cassette waiting unit and the substrate processing unit are provided. Each cassette waiting unit has an opening mechanism for opening a port of the cassette. | 01-01-2009 |
