| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 359351000 | Having folded optical path | 24 |
| 20080225387 | COLLECTOR FOR ILLUMINATION SYSTEMS WITH A WAVELENGTH LESS THAN OR EQUAL TO 193 nm - Collectors are disclosed. The collectors can be for illumination systems with a wavelength ≦193 nm, including ≦126 nm, and the EUV range. The collectors can serve to receive the light rays emitted from a light source and to illuminate an area in a plane. The collectors can include at least a first mirror shell or a first shell segment as well as a second mirror shell or a second shell segment receiving the light and providing a first illumination and a second illumination in a plane which is located in the light path downstream of the collector. An illumination systems are also disclosed. The illumination systems can be equipped with a collector. Projection exposure apparatuses are also disclosed. The projection exposure apparatuses can include an illumination system. Methods for the manufacture of microstructures by photographic exposure are also disclosed. | 09-18-2008 |
| 20080266650 | Efficient EUV collector designs - A collector that includes a laser produced plasma (LPP) extreme ultra violet (EUV) light source and a first optical path from the source to a mirror. The mirror is the first mirror that light emitted from the source and traveling along the first optical path impinges upon. The collector also includes a second optical path from the source to another mirror. The other mirror is the first mirror that light emitted from the source and raveling along the second path impinges upon. The mirror and the other mirror are oriented relative to the source such that light from the source traveling along the first optical path travels in a direction opposite to light traveling from the source along the second optical path. A collector having a discharge extreme ultra violet (EUV) light source. | 10-30-2008 |
| 20080291531 | Compact Objective Lens Assembly - A high-performance image-forming optical objective lens made compact and thin, particularly in the object side direction, by twice folding the optical path by means of two prism lenses longitudinally separated and arranged in an angular relationship to one another. The prisms have entrance and exit faces each of which is constructed of a curved surface having optical power, as well as having a rotationally symmetric polynomial aspheric attribute. The image-forming optical objective is particularly suited to helmet-mounted applications wherein the angular means for folding the optical path provides for an optical objective configuration that closely conforms to the exterior surface contour of the helmet, while providing a minimal forward projection in object space from the helmet. | 11-27-2008 |
| 20080297884 | PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY - Projection objective, projection exposure apparatuses and related systems and components are disclosed. | 12-04-2008 |
| 20090091821 | OPTICAL SIGHTING DEVICE WITH SELECTIVE LASER WAVELENGTH REMOVAL - An optical sighting device such as a spotting scope, riflescope or binocular having optics that direct the desired visible wavelength light to the eye or other sensor/detector while removing certain undesirable wavelengths such as infrared (IR) or ultraviolet (UV). In one configuration for a spotting scope having two front surface mirrors that fold the optical path to offer greater magnification and performance in a compact housing, the optics are modified by replacing one or both of the mirror surfaces with a band pass mirror, known as a cold mirror, the band pass mirror having particular optical transmission/reflection properties to reflect visible light and pass the undesirable wavelengths. Alternately, in a system employing a prism, one or more of the internal reflection surfaces may be formed with a desired coating for removing the IR wavelength light. | 04-09-2009 |
| 20100214652 | Folded Optical System and a Lens for Use in the Optical System - An optical system having an optical axis, the optical system comprising: (I) a light source; (II) a reflector; (III) a lens component situated between the light source and the reflector; (IV) a receiver, wherein the light source and the receiver are situated substantially symmetrically and are decentered with respect to the optical axis, and are separated by a distance d from one another; wherein: (a) the lens component is positioned to provide a collimated beam when intercepting light from the light source, and (b) the reflector is situated to intercept the collimated beam and to reflect the collimated beam to the receiver through the lens; and such that the collimated beam is at an angle Θ′ to the optical axis; and (c) the lens component is structured to provide on the receiver an image of the light source, the image characterized by (i) astigmatism of more than 0.05 waves RMS, and less than 0.1 waves RMS, when the lens component is not misaligned with respect to the average emission angle of the light source; and (ii) astigmatism of less than 0.05 for tilt angles of 2 to 5 degrees, when the lens component is tilted by of 2 to 5 degrees with respect to the average emission angle of the light source. | 08-26-2010 |
| 20100271691 | IMAGING OPTICAL SYSTEM AND RANGE FINDER - An imaging optical system includes three reflecting mirrors having first to third reflection surfaces and is configured, such that in an XYZ orthogonal coordinate system using an optical axis at the center of the field of view as Z-axis, the optical axis at the center of the field of view and an optical axis of an image plane are in parallel to each other by changing orientation of the optical axis in a YZ section while maintaining the orientation of the optical axis in an XZ section. At least one of the three reflection surfaces is rotationally asymmetric. Assuming that along the path of the beam traveling along the optical axis at the center of the field of view a distance between the second reflection surface and the third reflection surface is L | 10-28-2010 |
| 20110007387 | CHROMATICALLY CORRECTED CATADIOPTRIC OBJECTIVE AND PROJECTION EXPOSURE APPARATUS INCLUDING THE SAME - A catadioptric objective includes a plurality of optical elements arranged along an optical axis to image a pattern from an object field in an object surface of the objective to an image field in an image surface region of the objective at an image-side numerical aperture NA with electromagnetic radiation from a wavelength band around a central wavelength λ<300 nm. The optical elements include a concave mirror and a plurality of lenses. The projection objective forms an image of the pattern in a respective Petzval surface for each wavelength λ of a wavelength band, the Petzval surfaces deviating from each other for different wavelengths. The plurality of lenses include lenses made from different materials having substantially different Abbe numbers. A longitudinal departure p of the Petzval surface at a given wavelength from a planar reference surface at an edge field point of the image field (at maximum image height y′) measured parallel to the optical axis in the image surface region, varies with the wavelength λ according to: dp/dλ<(15λ/NA | 01-13-2011 |
| 20110090559 | PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC EUV PROJECTION EXPOSURE APPARATUS - A projection objective for a microlithographic EUV projection exposure apparatus includes a first mirror and a second mirror. The first mirror includes a mirror substrate and a reflective coating carried by the mirror substrate. The second mirror includes a mirror substrate and a reflective coating carried by the mirror substrate. The first and second mirrors are configured so that, with otherwise equal irradiation by EUV light, the mirror substrate of the first mirror compacts less than the mirror substrate of the second mirror under the effect of the EUV light. | 04-21-2011 |
| 20110211250 | SYSTEM IN SPACE FOR REINFORCING PHOTOSYNTHESIS AND METHOD - The present disclosure relates to a system in space for reinforcing photosynthesis on earth, comprising a satellite with at least one first optical assembly intended for collecting sunlight, the position of which is stationary; a second optical assembly, smaller in size and with less inertia than the first optical element, intended for retransmitting the collected light with higher density of the retransmitted flux density than the collected flux density, and with an adjustable orientation; a remotely controllable means capable of adjusting the orientation of the second optical assembly; and a light-transmitting means which transmits the collected light from the first optical assembly to the second optical assembly. The second optical assembly retransmits light only in specified frequency hands around 450 nm and 660 nm. | 09-01-2011 |
| 20120092756 | OPTICAL BODY, OPTICAL BODY MANUFACTURING METHOD, WINDOW MEMBER, AND OPTICAL BODY ATTACHING METHOD - An optical body including an optical layer having a belt-like or rectangular shape and having an incident surface on which light is incident, and a reflective layer formed in the optical layer and having a corner cube shape, wherein the reflective layer directionally reflects the light incident on the incident surface at an incident angle (θ, φ), and a direction of a ridge of the corner cube shape is substantially parallel to a lengthwise direction of the belt-shaped or rectangular optical layer. θ is an angle formed by a perpendicular line with respect to the incident surface and the incident light incident on the incident surface or reflected light emerging from the incident surface, and φ is an angle formed by the ridge of the corner cube shape and a component resulting from projecting the incident light or the reflected light to the incident surface). | 04-19-2012 |
| 20120162750 | DUAL BAND INFRARED CONTINUOUS ZOOM LENS - A continuous zoom lens arrangement can image MWIR and LWIR spectral bands to a common image plane. Such an exemplary optical system comprises eight infrared imaging lenses that all transmit over the wavelengths 3.5-11.0 microns and form a collocated image plane for the MWIR and LWIR spectral bands. The lens has six stationary lenses, and two lenses that move in arm axial fashion. A cold stop inside the dewar can act as the aperture stop of the system and control the stray light from reaching the FPA. The pupil is reimaged from the cold stop to near the first lens of the system to minimize the size of the lens. The optic is designed to operate at an f/number of 3.0 and provides a focal length range from 38 mm to 130 mm for a 640×480 element focal plane array with 20 micron square pixels. This has an equivalent image plane diameter of 16 mm. Such an optical system can work with a cold shield height of about 29.46 mm. The range in focal length result in an overall zoom change of 3.42×. | 06-28-2012 |
| 20120293860 | INTERNAL REFLECTION ELEMENTS HAVING INCREASED ENERGY THROUGHPUT FOR ATTENUATED TOTAL REFLECTANCE SPECTROSCOPY - Disclosed are internal reflection elements (IREs) for attenuated total reflectance spectroscopy with an IR beam. The IREs include a lens element having opposed first and second surfaces converging at the edges of the lens element and a layer of a reflective material coated over the first surface. The layer defines an entrance aperture through which an IR beam enters into the lens element and an exit aperture through which the IR beam exits the lens element. The entrance aperture is configured to block a fraction of the IR beam from entering the lens element. The IREs are capable of exhibiting high energy throughputs and providing better quality IR spectra. | 11-22-2012 |
| 20130010352 | PROJECTION OBJECTIVE HAVING MIRROR ELEMENTS WITH REFLECTIVE COATINGS - An optical system is disclosed that includes a plurality of elements arranged to image radiation at a wavelength λ from an object field in an object surface to an image field in an image surface. The elements include mirror elements have a reflective surface formed by a reflective coating positioned at a path of radiation. At least one of the mirror elements has a rotationally asymmetrical reflective surface deviating from a best-fit rotationally symmetric reflective surface by about λ or more at one or more locations. The elements include an apodization correction element effective to correct a spatial intensity distribution in an exit pupil of the optical system relative to the optical system without the apodization correcting element. The apodization correction element can be effective to increase symmetry of the spatial intensity distribution in the exit pupil relative to the optical system without the apodization correcting element. | 01-10-2013 |
| 20130148195 | COMPACT, LIGHT-TRANSFER SYSTEM FOR USE IN IMAGE RELAY DEVICES, HYPERSPECTRAL IMAGERS AND SPECTOGRAPHS - The invention provides a light-transfer imager that can be incorporated into a hyperspectral line-scanner, a spectrograph or a non-diffractive image relay device, and more particularly, to a design having a simpler optical design that is easier to fabricate, and has superior imaging quality than most previous designs. The invention includes a generic first optical assembly to deliver incoming light onto a slit or pinhole, a second optical assembly operating as a refractive corrector that directs incoming light onto a curved reflective diffraction grating or curved mirror such that the spectrally dispersed or reflected light (dependent upon the particular embodiment) passes back through the same second optical assembly which focuses that light onto a focal plane array (FPA) in approximately the same plane as the slit. The slit and the FPA are preferably displaced symmetrically on opposite sides of the optical axis of the refractive corrector. | 06-13-2013 |
| 20130188246 | Imaging Optical System for Microlithography - An imaging optical system, in particular a projection objective, for microlithography, includes optical elements to guide electromagnetic radiation with a wavelength in a path to image an object field into an image plane. The imaging optical system includes a pupil, having coordinates (p, q), which, together with the image field, having coordinates (x, y) of the optical system, spans an extended 4-dimensional pupil space, having coordinates (x, y, p, q), as a function of which a wavefront W(x, y, p, q) of the radiation passing through the optical system is defined. The wavefront W can therefore be defined in the pupil plane as a function of an extended 4-dimensional pupil space spanned by the image field (x, y) and the pupil (p, q) as W(x, y, p, q)=W(t), with t=(x, y, p, q). | 07-25-2013 |
| 20140002894 | ELECTROMAGNETIC WAVE RESONATOR WITH EFFECTIVE REFRACTIVE INDEX GRADIENT | 01-02-2014 |
| 20140240820 | AFOCAL TELESCOPE FOR BACK-SCANNED IMAGERY - An afocal telescope configured for back-scanned imagery including a three mirror anastigmat and an optical element positioned proximate an intermediate image plane of the three mirror anastigmat and configured to adjust distortion characteristics of the afocal telescope to control image wander on a focal plane array. The optical element may be a field correcting lens or mirror, for example. | 08-28-2014 |
| 20140293406 | DEVICE AND METHOD FOR EXPANDING A LASER BEAM - The invention relates to a device for expanding a laser beam, in particular a UV laser beam, comprising: a telescope arrangement having two spherical folding mirrors for expanding the incident collimated laser beam and a lens which is arranged in the divergent beam path downstream of the telescope arrangement and which has a spherical lens face for collimating the expanded laser beam, the first folding mirror in the beam path being a convex-curved spherical folding mirror and the second folding mirror in the beam path being a concave-curved spherical folding mirror. The invention also relates to an associated method for expanding a laser beam. | 10-02-2014 |
| 20140347721 | Projection Lens for EUV Microlithography, Film Element and Method for Producing a Projection Lens Comprising a Film Element - A film element of an EUV-transmitting wavefront correction device is arranged in a beam path and includes a first layer of first layer material having a first complex refractive index n | 11-27-2014 |
| 20150055212 | CATADIOPTRIC PROJECTION OBJECTIVE - Catadioptric projection objective ( | 02-26-2015 |
| 20150370056 | MAGNIFYING ASSEMBLY FOR AN INFRARED MICROSCOPE - An infrared microscope is disclosed. The infrared microscope includes a sample stage configured to support a sample; an objective configured to focus radiation emanated from the sample to an intermediate image plane between an objective and an infrared detector; and a magnifying assembly comprising a first set of reflective elements provided in a fixed position and a second set of reflective elements. | 12-24-2015 |
| 20160077346 | HIGH-EFFICIENCY MULTIWAVELENGTH BEAM EXPANDER EMPLOYING DIELECTRIC-ENHANCED MIRRORS - A high-efficiency, multiwavelength beam-expander optical system that employs dielectric-enhanced mirrors is disclosed. Each mirror includes a reflective multilayer coating formed from alternating layers of HfO | 03-17-2016 |
| 20160152511 | HIGH INFRARED TRANSMISSION GLASS SHEET | 06-02-2016 |
