| Entries |
| Document | Title | Date |
|---|
| 20080225280 | SURFACE FLATNESS TESTING DEVICE AND METHOD THEREOF - An exemplary surface flatness testing device ( | 09-18-2008 |
| 20080225281 | Visual inspection apparatus - The present invention is related to a visual inspection apparatus which can inspect a peripheral edge of a wafer with high efficiency. The visual inspection apparatus can make an inspection of any area on the peripheral edge of the wafer by displaying an inspection area specifying screen on a monitor. The inspection area specifying screen includes a display portion for displaying an observation range and an input portion for setting the observation area. The input portion allows one of step, continuity, and point to be selected as an observation type. A recipe is registered depending on a condition set in the above and thus is used to make an inspection. | 09-18-2008 |
| 20080239301 | Visual inspection apparatus - A visual inspection apparatus includes an upper illuminator, a lower illuminator, a side illuminator, and a pair of inclined illuminators, which illuminate the peripheral edge of a wafer, and illuminates the peripheral edge of the wafer brightly. A gap is formed in the upper illuminator and illumination light of an epi-illumination portion is injected through the gap. The illumination light of the epi-illumination portion is refracted and reflected by a first mirror to illuminate the peripheral edge of the wafer. The illumination position is changed by moving second mirrors together as needed. An image of the peripheral edge is acquired in an imaging portion disposed at the same axis as the epi-illumination portion. | 10-02-2008 |
| 20080259323 | RETICLE DEFECT INSPECTION APPARATUS AND RETICLE DEFECT INSPECTION METHOD - A reticle defect inspection apparatus that controls damage of a reticle by irradiation with an inspection light when the reticle is caused to be at rest is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. The reticle defect inspection apparatus has a dose monitoring part for measuring a dose of the light to the reticle, a comparing part for comparing, after calculating accumulated irradiation from the dose measured by the dose monitoring part, the accumulated irradiation with a preset threshold, and a stop mechanism for stopping irradiation of the reticle with the light when, as a result of the comparison, the accumulated irradiation exceeds the threshold. | 10-23-2008 |
| 20080259324 | Process of using an inspection dye for detecting cracks and flaws in metallic surfaces - The present invention relates to the process of using a unique inspection dye to detect cracks and flaws in metallic surfaces to which the inspection dye has been applied. | 10-23-2008 |
| 20080278716 | IN-PROCESS VISION DETECTION OF FLAWS AND FOD BY BACK FIELD ILLUMINATION - A flaw and foreign object debris (FOD) detection system ( | 11-13-2008 |
| 20080285020 | DEVICE HAVING A FIELD MIRROR FOR OPTICALLY TESTING A SURFACE - The invention generally relates to a compact, inexpensive-to-manufacture device consisting of few components for optically testing a surface. The zone on the surface that is to be investigated is illuminated by a semitransparent mirror and an aspheric field mirror, employing a telecentric optical train, and at least part of the light reflected or scattered by the surface is imaged onto the entrance pupil of the lens of an electronic camera by the field mirror, via the semitransparent mirror. Images recorded by the camera are analyzed using known image-processing methods. | 11-20-2008 |
| 20080291436 | Defect inspection system - A defect inspection system can suppress an effect of light from a sample rough surface or a regular circuit pattern and increasing a gain of light from a defect such as a foreign material to detect the defect on the sample surface with high sensitivity. When a lens with a large NA value is used, the outer diameter of the lens is | 11-27-2008 |
| 20080297779 | INSPECTION DEVICE AND INSPECTION METHOD - An inspection device for inspecting defects of an inspection object including a light source for irradiating a luminous flux to the inspection object; an optical system for guiding reflected light from the inspection object; a photoelectric image sensor having a plurality of photoelectric cells arranged, for converting the light guided to detection signals; a detection signal transfer unit having channels each constituted by a signal correction unit, a converter and an image formation unit, and corresponding to each of a plurality of regions formed by dividing the photoelectric image sensor, respectively; and an image synthesis unit for forming an image of the surface of the object by synthesizing partial images outputted; the inspection device inspecting defects of the object by processing the synthesized image; whereby it becomes possible to correct a detection signal from said photoelectric cell close to a predetermined reference target value. | 12-04-2008 |
| 20080297780 | Method and Configuration for Detecting Material Defects in Workpieces - A method and a configuration for automatically or visually detecting material defects, in particular cracks, in a workpiece, includes applying a test agent to the workpiece. The test agent contains color pigments which can be excited by using shortwave light. The workpiece is then irradiated with shortwave light from a light source, light emitted by the workpiece is detected by an observer's eye or by a detector, and the signals from the detector are evaluated by an electronic evaluation device in order to determine the material defects. The light source is associated with a first optical interference filter which selects the light emitted by the light source, as a bandpass filter, before the light impinges on the workpiece. | 12-04-2008 |
| 20080309928 | Automatic Optical Inspection Device, Chip Sorting Apparatus and Method - An automatic optical inspection device for inspecting the surface defects of integrated circuits is disclosed in this invention. The automatic optical inspection device includes a tray transporting device which transports a tray carrying at least one integrated circuit and having at least one clip area, a press mechanism for fixing the tray to the tray transporting device by clamping the clip area of the tray, and an image capture device for capturing an image of one surface of the integrated circuit. The surface defects of the integrated circuit can be found by analyzing the image. Chip sorting apparatus and method are also disclosed in this invention. The chip sorting apparatus includes a pick-and-place head which picks a chip on a wafer and places the chip on a tray; and an image capture device which is disposed for examining the chip surface of the chip so as to find the surface defects of the chip. The method includes transferring a chip on a wafer to a tray by a pick-and-place head; and examining the chip surface of the chip by an image capture device. | 12-18-2008 |
| 20080316473 | Device and Method for Scanning Pieces of Solid Wood - A device for scanning pieces of solid wood has a pusher movable across a length of a piece of solid wood and at least one scanning unit mounted on the pusher. At least one side of the piece of solid wood is scanned by the at least one scanning unit as the at least one scanning unit moves together with the pusher. The at least one scanning unit has at least one camera with which the piece of solid wood is scanned. The at least one camera is adjustably mounted on the pusher. | 12-25-2008 |
| 20090002694 | Optical Inspection of Surfaces Open to Different Directions in a Piece of Material - The invention relates to a device for optical inspection of the open surfaces ( | 01-01-2009 |
| 20090015823 | INSPECTION APPARATUS AND METHOD - An inspection apparatus includes a captured image acquiring unit configured to acquire a captured image that is acquired by shooting an inspection target, an acquiring unit configured to acquire from the captured image a first image region and a second image region whose intensity distributions of reflected light with respect to an incident angle of illumination light emitted to the inspection target are different, and an image processing unit configured to perform image processing for performing different surface inspections on the first image region and the second image region respectively. | 01-15-2009 |
| 20090033924 | Defects Inspecting Apparatus And Defects Inspecting Method - An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units. | 02-05-2009 |
| 20090040511 | SYSTEMS, CIRCUITS AND METHODS FOR EXTENDING THE DETECTION RANGE OF AN INSPECTION SYSTEM BY AVOIDING DETECTOR SATURATION - Inspection systems, circuits and methods are provided to enhance defect detection by addressing anode saturation as a limiting factor of the measurement detection range of a photomultiplier tube (PMT) detector. In accordance with one embodiment of the invention, a method for inspecting a specimen includes directing light to the specimen and detecting light scattered from the specimen. The step of detecting may include monitoring an anode current of the PMT detector, and detecting features, defects or light scattering properties of the specimen using the anode current until the anode current reaches a predetermined threshold. Thereafter, the method may use a dynode current of the PMT for detecting the features, defects or light scattering properties of the specimen. | 02-12-2009 |
| 20090051908 | Surface Particle Counter - A surface particle-counting device where the scanner element and the particle counting element have been combined so to reduce the number of lost particles and increase the overall efficiency of the particle-counting device. By removing the conventional tube that connects the scanner element and the particle counting element accuracy is increased. | 02-26-2009 |
| 20090059215 | Systems and Method for Simultaneously Inspecting a Specimen with Two Distinct Channels - A system is provided herein for inspecting a specimen. In one embodiment, the system may include a dual-channel microscope, two illuminators, each coupled for illuminating a different channel of the dual-channel microscope and two detectors, each coupled to a different channel of the dual-channel microscope for acquiring images of the specimen. Means are provided for separating the channels of the dual-channel microscope, so that the two detectors can acquire the images of the specimen at substantially the same time. In one embodiment, the channels of the dual-channel microscope may be spectrally separated by configuring the two illuminators, so that they produce light in two substantially non-overlapping spectral ranges. In another embodiment, the channels of the dual-channel microscope may be spatially separated by positioning the two detectors, so that the illumination light do not overlap and the fields of view of the two detectors do not overlap within a field of view of an objective lens included within the system. | 03-05-2009 |
| 20090073429 | ILLUMINATOR FOR DARKFIELD INSPECTION - Light from a single source is divided among several illumination arms, each of which directs light via a multimode fiber bundle from the source to the wafer location. The arms are arranged circumferentially around a common illumination region, so that the region is illuminated from several directions. For each arm, light exiting the fiber bundle enters a turning prism, reflects off the hypotenuse of the prism, and is diverged in one dimension by a negative cylindrical surface on the exiting face of the prism. The beam then reflects off an anamorphic mirror and propagates to the illumination region on the wafer. The beam has an asymmetric footprint, so that it illuminates a nearly circular region of the wafer when viewed at normal incidence. The fiber bundle is at the front focal plane in the meridional dimension. The illumination region is at the rear focal plane in both dimensions. | 03-19-2009 |
| 20090079971 | METHOD FOR DETERMINING THE SURFACE QUALITY OF A SUBSTRATE AND ASSOCIATED MACHINE FOR CONVERTING THE SUBSTRATE - A method for determining the surface quality of a substrate passing from an initial state into a converted state during a conversion process including the steps of acquiring first information relating to surface defects detected on the initial substrate, acquiring second information relating to surface defects detected on the converted substrate, of processing the first information and the second information, and of classifying the converted substrate as a function of the first acquired information relating to the surface defects detected on the initial substrate and as a function of the second acquired information relating to the surface defects detected on the converted substrate. | 03-26-2009 |
| 20090079972 | Method and device for the detection of surface defects of a component - A method serves the detection of surface defects of a component. The surface of the component ( | 03-26-2009 |
| 20090079973 | METHOD AND APPARATUS FOR INSPECTING FOREIGN PARTICLE DEFECTS - The invention relates to a device production process for forming a circuit pattern on a substrate such as semiconductor device. To enable a stable inspection of a minute foreign particle and a pattern defect occurring in manufacture of a device at a high speed and with a high sensitivity, an object to be inspected on which a transparent film is formed, is irradiated with a beam which is emitted from an illuminator whose illumination direction and illumination angle are selected from a plurality of choices to be optimum, so that scattered reflected light from a minute foreign particle defect on the object or the transparent film is effectively detected by eliminating a noise from the pattern formed on the object, and a detection optical system is optimized by evaluating and adjusting, with an image forming performance checker, an image forming performance of the detection optical system included in an inspecting apparatus. | 03-26-2009 |
| 20090086196 | Edge inspection apparatus - An edge inspection apparatus includes: an illumination means | 04-02-2009 |
| 20090091747 | Edge flaw detection device - An edge flaw detection device includes an elliptical mirror having an inner mirror surface, with a cut-out formed in the vertex portion to enable insertion of an object; a light-emitting portion which radiates coherent light toward an edge of the object, the edge of the object being positioned in the vicinity of a first focal position of the elliptical mirror; an optical detector positioned at a second focal position of the elliptical mirror; and a light-blocking member which blocks lower-order diffracted light which is regularly reflected. The light-emitting portion is capable of radiating coherent light at different wavelengths. | 04-09-2009 |
| 20090091748 | Edge flaw detection device - An edge flaw detection device includes an elliptical mirror having a mirror surface on the inside thereof and having a cutout that allows an object to be inserted therethrough formed at the apex thereof, a light-emitting unit that radiates coherent light toward an edge of the object arranged in the vicinity of a first focal position of the elliptical mirror, a photo detector that is arranged in a second focal position of the elliptical mirror, and a light-shielding member that shields low-order diffracted light that is reflected regularly. The light-emitting unit is moved in the thickness direction of the object by a moving member so that the light-emitting unit can radiate the coherent light in a different radiation range in the thickness direction at the edge of the object. | 04-09-2009 |
| 20090091749 | Multi mode inspection method and apparatus - An inspection system for inspecting an object, the system comprising an illuminator including at least one pulsed light source, a detector assembly, and a relative motion provider operative to provide motion of the object relative to the detector assembly, along an axis of motion, the detector assembly comprising a plurality of 2-dimensional detector units whose active areas are arranged at intervals. | 04-09-2009 |
| 20090097017 | OPTICAL INSPECTION METHODS - Inspection methods. A method includes adhering an optical blocking layer directly onto and in direct mechanical contact with a semiconductor process wafer, the blocking layer being substantially opaque to a range of wavelengths of light; applying at least one layer over the blocking layer; and inspecting optically at least one wavelength at least one inspection area, the blocking layer extending substantially throughout the inspection area. An inspection method including adhering an optical absorbing layer to a semiconductor process wafer, where the absorbing layer is configured to substantially absorb a range of wavelengths of light; applying at least one layer over the absorbing layer; and inspecting optically at least one wavelength at least one inspection area of the process wafer. A manufacturing method including ascertaining if a defect is present within a photoresist layer, and changing a semiconductor manufacturing process to prevent the defect, if the defect is present. | 04-16-2009 |
| 20090097018 | Surface inspection apparatus - A surface inspection apparatus for observing an edge portion of an object to be inspected includes an illumination device that irradiates an illumination light to the edge portion; and an observation device that forms an image of an observation region of the edge portion illuminated with the illumination light. The illumination device emits a first irradiation beam and a second irradiation beam as the illumination light. The first irradiation beam is incident at approximately right angles to the edge portion for compensating brightness of the image and the second irradiation beam is obliquely incident laterally to the observation region of the edge portion for generating a shadow depending on a surface state of the observation region. | 04-16-2009 |
| 20090103078 | SURFACE INSPECTION APPARATUS AND METHOD THEREOF - An apparatus for detecting defects, including: a table unit which mounts a specimen to be inspected having a linearly moving stage and a rotationally moving stage; a first illumination optical unit which illuminates an inspection region of a surface of the specimen from a normal direction or in the vicinity of the normal direction while the specimen is rotating by the rotationally moving stage and moving in one direction by the linearly moving stage; a second illumination optical unit which illuminates the inspection region from a first elevation angle toward the inspection region while the specimen is rotating and moving; a first detection optical unit which detects light reflected from the inspection region by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors arranged in plural portions of a second elevation angle toward the inspection region; a second detection optical unit which detects light reflected from the inspection region by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors arranged in plural portions of a third elevation angle toward the inspection region; and a signal processor which processes signals outputted from the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit, wherein the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit are photomultipliers, and the signal processor processes the signals which are selected from the signals outputted from the plural detectors arranged in plural portions of the second elevation angle and the plural detectors arranged in plural portions of the third elevation angle. | 04-23-2009 |
| 20090109430 | Device for Inspecting a Surface - A device that is usable to inspect the surface of a material uses an inspection system which includes an optical unit. That optical unit can register the light which is reflected by the surface to be inspected. An illumination system, that uses at least two light sources, provides the light. The optical unit and the illumination system are connected to a control unit. The at least two light sources are arranged spaced at a distance from each other and both emit light directed to a recording region of the optical unit. The optical unit is oriented toward the surface to be inspected and at least one of the illumination light sources can be subdivided into several individual light sources. The control unit controls at least two of the illumination system light sources that are arranged at a distance from each other or the respective individual light sources of at least one of the illumination sources both selectively and independently of each other. The recording region of the optical unit lies on a displacement plane of the surface to be inspected with that surface being displaced through the recording region in relation to the inspection system. The distance between the light sources of the illumination system extends in the displacement direction of the surface to be inspected. The individual light sources of at least one of the sources are arranged transversely to the displacement direction of the surface to be inspected. | 04-30-2009 |
| 20090122303 | Apparatus And Method For Inspecting Defects - A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate. | 05-14-2009 |
| 20090135412 | Superconducting Wire Inspection Apparatus and Method - An apparatus inspecting a superconducting wire includes: a blue LED emitting light in a direction normal to a front surface of a superconducting wire to illuminate the front surface; a red LED emitting light in a direction forming an angle with the direction normal to the front surface of the superconducting wire to illuminate the front surface; a color line sensor mainly receiving light reflected by the superconducting wire, and mainly receiving light diffused by the superconducting wire; and a computer accumulating and outputting a quantity of light received by the color line sensor. The apparatus can inspect with high sensitivity whether the superconducting wire has a defect or not. | 05-28-2009 |
| 20090135413 | SURFACE INSPECTION METHOD AND SURFACE INSPECTION APPARATUS - When detecting light scattered by an object to be inspected by using a pulse laser as a light source, noise increases unless a sampling repletion period of an A/D converter is determined so as to be related to a pulse oscillation repetition period of the light source. (1) The sampling repletion period of the A/D converter is set equal to the pulse oscillation repetition period of the light source or an integer times thereof, and the sampling is synchronized with oscillation of the light source. Or (2) the sampling repletion period of the A/D converter is set equal to a half-integer times the pulse oscillation repetition period of the light source. Even if a ripple component resulting from emission pulses of the light source remains in the scattered light signal supplied to the A/D converter remains, therefore, its influence can be eliminated or reduced. | 05-28-2009 |
| 20090141269 | Defect Inspection Method And System - An inspection system includes: a facility that uses wide-band illumination light having different wavelengths and single-wavelength light to perform dark-field illumination on an object of inspection, which has the surface thereof coated with a transparent film, in a plurality of illuminating directions at a plurality of illuminating angles; a facility that detects light reflected or scattered from repetitive patterns and light reflected or scattered from non-repetitive patterns with the wavelengths thereof separated from each other; a facility that efficiently detects light reflected or scattered from a foreign matter or defect in the repetitive patterns or non-repetitive patterns or a foreign matter or defect on the surface of the transparent film; and a facility that removes light, which is diffracted by the repetitive patterns, from a diffracted light image of actual patterns or design data representing patterns. Consequently, a more microscopic defect can be detected stably. | 06-04-2009 |
| 20090147246 | OPTICAL DEFECT INSPECTION APPARATUS - A laser beam oscillated from a laser source is folded in its path by first and second plane mirrors and enters a beam expander. The surface of each plane mirror is deteriorated with illumination by the laser beam and the reflectance is reduced. To avoid a light quantity of the laser beam entering the beam expander from being reduced below a reference value, when the laser beam is illuminated over a certain time, a position on each of the first and second plane mirrors at which the laser beam is illuminated is changed by a structure for rotating and/or translating a reflecting surface of each plane mirror on a plane, which includes the plane mirror, while an optical axis is kept same. Thus the useful life of each plane mirror can be prolonged without displacing the optical axis. | 06-11-2009 |
| 20090147247 | Defect detecting apparatus and defect detecting method - A defect inspecting apparatus inspects defects of a sample having a pattern formed on the surface. The defect inspecting apparatus is provided with a stage which has a sample placed thereon and linearly moves and turns; a light source; an illuminating optical system, which selects a discretionary wavelength region from the light source and epi-illuminates the sample surface through a polarizer and an objective lens; a detecting optical system, which obtains a pupil image, by passing through reflection light applied by the illuminating optical system from the surface of the sample through the objective lens and an analyzer which satisfies the cross-nichols conditions with the polarizer; and a detecting section which detects defects of the sample by comparing the obtained pupil image with a previously stored pupil image. Conformity of the pattern on a substrate to be inspected can be judged in a short time. | 06-11-2009 |
| 20090147248 | MACRO INSPECTION APPARATUS AND MICROSCOPIC INSPECTION METHOD - The invention provides a macro inspection apparatus including: a stage on which an inspection object is placed; a light source that irradiates light on an upper surface of the inspection object from an angular direction arbitrarily selected relative to the upper surface of the inspection object; and a line sensor which is placed in an angular direction selected relative to the upper surface of the inspection object so that an optical axis thereof corresponds with an edge of the upper surface area irradiated by the light source and which receives reflected light from the edge of the upper surface area of the inspection object. | 06-11-2009 |
| 20090147249 | BELT INSPECTING APPARATUS - A belt inspecting apparatus applies illuminating light beams (R G. B) through light guides to a flat inner portion, a flat outer portion, flat side portions, and curved portions of a metal belt. The illuminating light beams, which are reflected by the metal belt, are guided through the light guides to color cameras, which detect the illuminating light beams as image information. A surface state decision unit compares the detected image information with normal image information in order to determine whether the metal belt contains flaws therein or not. | 06-11-2009 |
| 20090153848 | APPARATUS OF INSPECTING DEFECT IN SEMICONDUCTOR AND METHOD OF THE SAME - When size of a defect on an increasingly miniaturized pattern is obtained by defect inspection apparatus in the related art, a value is inconveniently given, which is different from a measured value of the same defect by SEM. Thus, a dimension value of a defect detected by defect inspection apparatus needs to be accurately calculated to be approximated to a value measured by SEM. To this end, size of the defect detected by the defect inspection apparatus is corrected depending on feature quantity or type of the defect, thereby defect size can be accurately calculated. | 06-18-2009 |
| 20090161094 | WAFER BEVEL INSPECTION MECHANISM - An imaging sensor for capturing images of the beveled surface of a wafer edge is herein disclosed. The imaging sensor is aligned with the edge of a wafer to maximize the area of the bevel that is encompassed by the depth of view of the imaging sensor. One or more sensors may be used to capture images of the wafer edge. | 06-25-2009 |
| 20090161095 | DEFECT INSPECTION SYSTEM - In a defect inspection system using a plurality of detectors such as an upright detector and an oblique detector, if illumination light and wafer height are adjusted to the detection field of view of one detector, a defocused image is detected by other remaining detectors, resulting in degradation of the detection sensitivity. The present invention solves this problem. | 06-25-2009 |
| 20090161096 | Simultaneous Multi-Spot Inspection And Imaging - A compact and versatile multi-spot inspection imaging system employs an objective for focusing an array of radiation beams to a surface and a second reflective or refractive objective having a large numerical aperture for collecting scattered radiation from the array of illuminated spots. The scattered radiation from each illuminated spot is focused to a corresponding optical fiber channel so that information about a scattering may be conveyed to a corresponding detector in a remote detector array for processing. For patterned surface inspection, a cross-shaped filter is rotated along with the surface to reduce the effects of diffraction by Manhattan geometry. A spatial filter in the shape of an annular aperture may also be employed to reduce scattering from patterns such as arrays on the surface. In another embodiment, different portions of the same objective may be used for focusing the illumination beams onto the surface and for collecting the scattered radiation from the illuminated spots simultaneously. In another embodiment, a one-dimensional array of illumination beams are directed at an oblique angle to the surface to illuminate a line of illuminated spots at an angle to the plane of incidence. Radiation scattered from the spots are collected along directions perpendicular to the line of spots or in a double dark field configuration. | 06-25-2009 |
| 20090185176 | Diffractive method for control of piston error in coherent phased arrays - A high-power laser system includes a laser master oscillator, a plurality of fiber laser amplifiers producing intermediate output beamlets, a combiner for combining the intermediate beamlets into a combined output beam, and a piston error controller for minimizing errors related to beam combination that may degrade the quality of the combined output beam. A piston error controller processes a sample of the combined output beam using a Diffractive Optical Element to isolate a signal representing the total piston error of the combined beam. The controller uses amplitude modulation based on Hadamard code words to tag each non-reference intermediate beamlet with a unique code sequence orthogonal to those used for the other beamlets. For each intermediate beamlet, the associated piston error contribution is recovered using a Hadamard decoder. A very small phase dither is also introduced to allow the sign or direction of the piston error to be recovered. The decoded piston error contribution is processed by a cascaded product detector unit to derive a piston error control signal, which is provided to a phase modulator to thereby adjust the phase of a beamlet and minimize the piston error contributed thereby. | 07-23-2009 |
| 20090185177 | Apparatus and method for the inspection of the surface of a component - An apparatus for inspection of a surface of a component includes a probing device ( | 07-23-2009 |
| 20090190123 | METHOD AND APPARATUS FOR DETECTING DEFECTS ON A DISK SURFACE - The present invention relates to an apparatus for detecting defects on a disk surface which projects light on the disk surface by a light transmitting system, receives specula reflection light and scattered light by a light receiving system, exposes defects by performing a two-dimensional frequency filter process on a signal, and performs a defect determination process to extract a linear-shaped isolative defect candidate. Next, the present invention performs a periodicity determination process to classify and detect the periodically generated linear and circular arc defects and the isolatively generated linear and circular arc defects. | 07-30-2009 |
| 20090195775 | Defect Inspection Method - A method for inspecting a defect of a surface of a sample includes irradiating a laser beam on the sample surface a plurality of times so that at least part of an illumination field of the laser beam on the sample surface illuminates a first area of the sample surface each of the plurality of times, detecting a plurality of scattered light rays from the first area caused by the plurality of times of irradiations, correcting errors of detection timings for the plurality of detected scattered light rays, correcting at least one of adding and averaging the plurality of scattered light rays, determining a defect on the sample surface based on a calculation result in accordance with the at least one of the adding and averaging. | 08-06-2009 |
| 20090207404 | System and Method for Surface Inspection of Micro- and Nanomechanical Structures - The system for surface inspection is arranged to detect relative displacement and/or vibration features of a plurality of points of a plurality of elements ( | 08-20-2009 |
| 20090207405 | DEFECT INSPECTING APPARATUS - A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due to environmental change and the detection sensitivity of a defect becomes unstable. This apparatus comprises an XY stage, which carries a substrate to be inspected and scans in a predetermined direction, and a mechanism having a system of irradiating a defect on the inspected substrate at a slant and detecting the defect by a detection optical system disposed on the upper side, which corrects a height of imaging in real time for change in temperature and barometric pressure in order to keep the imaging in a best condition. | 08-20-2009 |
| 20090225307 | WAFER INSPECTION USING SHORT-PULSED CONTINUOUS BROADBAND ILLUMINATION - An inspection system may be configured to inspect objects, such as semiconductor wafers, using narrow-pulse broadband illumination. The illumination may be obtained in some embodiments using a laser configured to emit light into a material having a spectral broadening effect. The inspection system can include various filters which may be selectively placed in the illumination and/or imaging path in order to tune the spectrum of light impinging on the wafer and the light that is detected. The filters may include selectable filters, fixed filters, and filters whose characteristics can be adjusted in-place. In some embodiments, filters may be used to match the illumination/detection spectra of different tools. Additionally, the broadband illumination may be tuned between inspections and/or during inspections for best results. The system may support Fourier filtering whereby light, related to repetitive features of the object and in one or more wavelength sub-bands of the illumination, may be filtered. | 09-10-2009 |
| 20090237653 | DEVICE FOR RECORDING A NUMBER OF IMAGES OF DISK-SHAPED OBJECTS - A device for recording a number of images of disk-shaped objects ( | 09-24-2009 |
| 20090244527 | SYSTEM FOR INSPECTING DEFECTS OF PANEL DEVICE - System for inspecting defects of panel device includes a to-be-inspected device, a platform for holding the to-be-inspected device, a power unit, and a light source apparatus. The light source apparatus is controlled by the power unit to provide an inspection light to the to-be-inspected device for inspecting whether or not having defects. The light source apparatus includes a cathode structure, an anode structure, a fluorescent layer, and a low-pressure gas layer. The fluorescent layer is located between the cathode structure and the anode structure. The low-pressure gas layer is filled between the cathode structure and the anode structure, for inducing the cathode to emit electrons uniformly. The low-pressure gas layer has an electron mean free path, allowing at least enough electrons to directly hit the fluorescent layer under an operating voltage. | 10-01-2009 |
| 20090244528 | BLADE BREAKAGE AND ABRASION DETECTING DEVICE - The present invention provides a blade breakage and abrasion detecting device comprising: a detecting unit including a light-emitting unit which is provided close to a side of a blade to emit a round shape light toward the blade, and a light receiving unit which is provided opposed to the light-emitting unit as sandwiching the blade to receive the round shape light from the light-emitting unit with a round shape light receiving area; a moving device which moves the detecting unit toward a rotation center of the blade; and a control unit which detects a breakage of the blade based on a change of an amount of light received by the light receiving unit of the detecting unit, and calculates an abrasion amount of the blade by accumulating a moving amount obtained by controlling the moving device to moves the detecting unit toward the rotation center of the blade. | 10-01-2009 |
| 20090244529 | Appearance Inspection Apparatus - An appearance inspection apparatus analyzes a difference in detection characteristics of detection signals obtained by detectors to flexibly meet various inspection purposes without changing a circuit or software. The apparatus includes a signal synthesizing section that synthesizes detection signals from the detectors in accordance with a set condition. An input operating section sets a synthesizing condition of the detection signal by the signal synthesizing section, and an information display section displays a synthesizing map structured based on a synthesized signal which is synthesized by the signal synthesizing section in accordance with a condition set by the input operating section. | 10-01-2009 |
| 20090257052 | Device for inspecting the quality of a surface - This device for inspecting surfaces by deflectometry comprises:
| 10-15-2009 |
| 20090284736 | Apparatus and Methods for Packaging Electronic Devices for Optical Testing - Apparatus and methods are provided for packaging IC (integrated circuit) chips to enable both optical access to the back side of an IC chip and electrical access to the front side of the IC chip. | 11-19-2009 |
| 20090296080 | METHOD AND APPARATUS FOR MEASURING DEFORMATION OF LAMINATED BODY - There is provided a method of measuring deformation of a laminated body, the method including: laminating and pressurizing a plurality of green sheets each having a plurality of inner electrodes arranged therein to form a laminated body having a plurality of unit chips arranged therein; marking location information of each of the unit chips on an XY plane of the laminated body on a surface of the unit chip; cutting the laminated body into the plurality of unit chips; measuring a deformation level of each of the cut unit chips; and storing the deformation level measured from the each of the cut unit chips to correspond to the location information of the unit chip. | 12-03-2009 |
| 20090296081 | Metrology Tool, System Comprising a Lithographic Apparatus and a Metrology Tool, and a Method for Determining a Parameter of a Substrate - A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table, a sensor, a displacement system, a balance mass, and a bearing. The substrate table is constructed and arranged to hold the substrate. The sensor is constructed and arranged to measure a parameter of the substrate. The displacement system is configured to displace the substrate table or the sensor with respect to the other in a first direction. The bearing is configured to movably support the first balance mass so as to be substantially free to translate in a direction opposite of the first direction in order to counteract a displacement of the substrate table or sensor in the first direction. | 12-03-2009 |
| 20090303468 | Undulation Inspection Device, Undulation Inspecting Method, Control Program for Undulation Inspection Device, and Recording Medium - An undulation inspection device of the present invention includes: illumination means (line light source | 12-10-2009 |
| 20090303469 | CRACK MEASURING METHOD AND APPARATUS - Disclosed are a crack measuring method that may automatically measure crack growth in a surface of a structure rapidly and exactly without influencing the structure using image processing scheme, and an apparatus thereof. The crack measuring method includes: irradiating light to a surface of a structure; converting reflected light, wherein the irradiated light is reflected from the surface of a structure, into an image signal and capturing images of the surface of a structure corresponding to the image signal at predetermined scan intervals through a camera; performing continuously a line scan on the crack parts in the captured images at predetermined scan intervals; and inspecting crack growth in the surface of a structure by identifying pixels with relatively higher or lower light intensity in the scan lines. | 12-10-2009 |
| 20090303470 | FOREIGN MATTER INSPECTION APPARATUS AND FOREIGN MATTER INSPECTION METHOD - A foreign-matter inspection apparatus is implemented which allows the stable detection sensitivity to be maintained. A laser beam emitted from a laser apparatus is applied to a beam irradiation sample via an irradiation unit and a mirror. Then, the laser beam is captured into a beam-capturing camera via an image-forming lens and a beam-direction switching mirror. Based on the captured beam image, an image computational processing unit judges inclination of the laser beam, then adjusting the irradiation unit thereby to correct the inclination of the laser beam. Also, the beam is captured into the beam-capturing camera in specified number-of-times while focus of the laser beam is being changed by an arbitrary amount by the irradiation unit. Based on the captured beam, the focus of the laser beam is corrected by adjusting the irradiation unit. | 12-10-2009 |
| 20100002227 | INSPECTION METHOD AND INSPECTION APPARATUS - The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image. | 01-07-2010 |
| 20100026996 | SURFACE INSPECTION METHOD AND SURFACE INSPECTION APPARATUS - When measuring an edge region, a photo detector with an angle not influenced by the diffracted light, the diffracted light causing noise, is selected to thereby allow for inspection that minimizes the sensitivity reduction. This allows for the management of foreign matters in the outer peripheral portion, which conventionally could not be measured, and this also eliminates the oversight of critical defects on the wafer, thus leading to reduction of failures of IC. | 02-04-2010 |
| 20100033715 | Method and Apparatus for the Examination of An Object - The invention relates to a method and an apparatus for examining an object, particularly in terms of the surface morphology thereof. Said apparatus comprises a transportable housing which can be placed, especially by hand, above the surface segment of the object that is to be examined, and at least three light sources, the optical beam axes of which extend at a slanted angle of incidence relative to the surface segment that is to be examined. The light sources are disposed inside the housing and can illuminate the surface segment that is to be examined through an illumination aperture in the housing. The apparatus further comprises at least one light sensor for detecting the light reflected on the surface segment that is to be examined and a control and evaluation unit which is connected to the light sources and the light sensor. The light sources are arranged such that the optical beam axes thereof extend on different, non-parallel reference planes. | 02-11-2010 |
| 20100073670 | ABNORMAL MEASUREMENT DETECTION DEVICE AND METHOD FOR INFRARED RADIATION THERMOMETER - A technique for an infrared radiation thermometer used for thermography detects measurement abnormality of the infrared radiation thermometer and estimates the causes of the measurement abnormality such as contamination of an objective lens and a malfunction in a mechanism section of the infrared radiation thermometer. The measurement abnormality detector has a dummy lens | 03-25-2010 |
| 20100091272 | SURFACE INSPECTION APPARATUS - A surface inspection apparatus includes an irradiating unit that has a plurality of light sources that respectively emit a plurality of illumination light beams having different wavelength ranges, and irradiates an inspection surface as a surface of a body to be inspected with the illumination light beams, in a condition where the light sources are located adjacent to each other and arranged in a given order along the inspection surface, an imaging unit that images reflected light when the illumination light beams are reflected by the inspection surface, so as to obtain a plurality of items of image data corresponding to the respective wavelength ranges, and a control unit that detects a detection object on the inspection surface, based on the items of image data corresponding to the respective wavelength ranges which are obtained by the imaging unit. | 04-15-2010 |
| 20100110419 | Front Quartersphere Scattered Light Analysis - A surface inspection system, as well as related components and methods, are provided. The surface inspection system includes a beam source subsystem, a beam scanning subsystem, a workpiece movement subsystem, an optical collection and detection subsystem, and a processing subsystem. The optical collection and detection system features, in the front quartersphere, a light channel assembly for collecting light reflected from the surface of the workpiece, and a front collector and wing collectors for collecting light scattered from the surface, to greatly improve the measurement capabilities of the system. The light channel assembly has a switchable edge exclusion mask and a reflected light detection system for improved detection of the reflected light. | 05-06-2010 |
| 20100110420 | Inspecting a Workpiece Using Polarization of Scattered Light - A surface inspection system, as well as related components and methods, are provided. The surface inspection system includes a beam source subsystem, a beam scanning subsystem, a workpiece movement subsystem, an optical collection and detection subsystem, and a processing subsystem. The system features a variable polarization a polarizing relay assembly arranged to selectively permit the scattered light having a selected polarization orientation to pass along a detector optical axis to a light detection unit in the detection subsystem. They system also features a collector output width varying subsystem for varying the width of an output slit in response to changes in the location of the location scanned on the workpiece. | 05-06-2010 |
| 20100141936 | OPTICAL DEFECT INSPECTION APPARATUS - A laser beam oscillated from a laser source is folded in its path by first and second plane mirrors and enters a beam expander. The surface of each plane mirror is deteriorated with illumination by the laser beam and the reflectance is reduced. To avoid a light quantity of the laser beam entering the beam expander from being reduced below a reference value, when the laser beam is illuminated over a certain time, a position on each of the first and second plane mirrors at which the laser beam is illuminated is changed by a structure for rotating and/or translating a reflecting surface of each plane mirror on a plane, which includes the plane mirror, while an optical axis is kept same. Thus, the useful life of each plane mirror can be prolonged without displacing the optical axis. | 06-10-2010 |
| 20100149527 | System and Method for Controlling a Beam Source in a Workpiece Surface Inspection System - A surface inspection system, as well as related components and methods, are provided. The surface inspection system includes a beam source subsystem, a beam scanning subsystem, a workpiece movement subsystem, an optical collection and detection subsystem, and a processing subsystem. The system features a variable scan speed beam scanning subsystem, preferably using an acousto-optic deflector, with beam compensation, so that variable scanning speeds can be achieved. Also included are methods and systems for improving the signal to noise ratio by use of scatter reducing complements, and a system and method for selectively and repeatedly scanning a region of interest on the surface in order to provide additional observations of the region of interest. | 06-17-2010 |
| 20100149528 | Defect Inspection Method - A method for inspecting a defect of a surface of a sample, includes irradiating a laser beam on the sample surface a plurality of times so that at least part of an illumination field of the laser beam on the sample surface illuminates a first area of the sample surface each of the plurality of times, detecting a plurality of scattered light rays from the first area caused by the plurality of times of irradiation, correcting errors of detection timings for the plurality of scattered light rays detected in the detection step, and determining a defect on the sample surface based on the plurality of scattered light rays in accordance with the correcting errors of detection timings. | 06-17-2010 |
| 20100188655 | TDI Sensor Modules With Localized Driving And Signal Processing Circuitry For High Speed Inspection - An inspection system for inspecting a surface of a wafer/mask/reticle can include a modular array. The modular array can include a plurality of time delay integration (TDI) sensor modules, each TDI sensor module having a TDI sensor and a plurality of localized circuits for driving and processing the TDI sensor. At least one of the localized circuits can control a clock associated with the TDI sensor. At least one light pipe can be used to distribute a source illumination to the plurality of TDI sensor modules. The plurality of TDI sensor modules can be positioned capture a same inspection region or different inspection regions. The plurality of TDI sensor modules can be identical or provide for different integration stages. Spacing of the modules can be arranged to provide 100% coverage of the inspection region in one pass or for fractional coverage requiring two or more passes for complete coverage. | 07-29-2010 |
| 20100201973 | APPARATUS FOR CHARACTERIZING A SURFACE STRUCTURE - An apparatus for optically characterising a surface structure of a board or sheet, includes a light source arranged at a first side of a said board and adapted to illuminate a first area of a surface of said board or sheet by emitting towards said surface a collimated light beam at a first, oblique angle of incidence relative to said surface of said board or sheet. A light receiver arranged at a second side of a said board or sheet, said second side being substantially opposite to said first side in respect of said board or sheet, is adapted to receive at least a part of said collimated light beam being reflected off said first area of said surface of said board or sheet, and includes a spatial detector adapted to receive by different parts of said detector light of said collimated light beam being reflected off respective, different parts of said first area. | 08-12-2010 |
| 20100201974 | SURFACE MEASUREMENT APPARATUS AND SURFACE MEASUREMENT METHOD - There are provided a surface measurement apparatus and a surface measurement method. A surface measurement apparatus according to an aspect of the invention may include: a stage receiving a target object and causing linear and rotational movements of the target object; a light source irradiating a beam onto the target object and rotating relative to the stage; and a reflected-beam detection unit detecting a beam reflected from the target object. | 08-12-2010 |
| 20100201975 | DISK SURFACE INSPECTION APPARATUS, INSPECTION SYSTEM THEREOF, AND INSPECTION METHOD THEREOF - The invention has a function of preparing a data base for a relation between a defect shape and an arrangement for the optical system capable of detecting the shape at high sensitivity and automatically adjusting the arrangement for the optical system. As the method of preparing the data base, a method of using optical simulation or an experimental method of using a sample having an optical shape is applied. A pinhole position and a beam size are adjusted automatically so as to attain the optimal arrangement for the optical system to an inputted defect shape based on the data base. | 08-12-2010 |
| 20100208249 | Apparatus For Inspecting Defects - A defect inspection apparatus and method includes a darkfield illumination optical system which conducts darkfield illumination upon the surface of a sample with irradiation light having at least one of wavelength band, a darkfield detection optical system which includes a reflecting objective lens for converging the light scattered from the surface of the sample that has been darkfield-illuminated with the irradiation light having the at least one wavelength band, and imaging optics for imaging onto a light-receiving surface of an image sensor the scattered light that the reflecting objective lens has converged, and an image processor which, in accordance with an image signal obtained from the image sensor of the darkfield detection optical system, discriminates defects or defect candidates present on the surface of the sample. | 08-19-2010 |
| 20100225903 | PATTERN DEFECT INSPECTION APPARATUS AND METHOD - A pattern defect inspection apparatus capable of detecting minute defects on a sample with high sensitivity without generating speckle noise in signals is realized. Substantially the same region on a surface of a wafer is detected by using two detectors at mutually different timings. Output signals from the two detectors are summed and averaged to eliminate noise. Since a large number of rays of illumination light are not simultaneously irradiated to the same region on the wafer, a pattern defect inspection apparatus capable of suppressing noise resulting from interference of a large number of rays, eliminating noise owing to other causes and detecting with high sensitivity minute defects on the sample without the occurrence of speckle noise in the signal can be accomplished. | 09-09-2010 |
| 20100231901 | INSPECTION SYSTEM EMPLOYING ILLUMINATION THAT IS SLECTABLE OVER A CONTINUOUS RANGE ANGLES - An illumination device and method for inspecting objects having microscopic features is provided. The device includes an illuminator which provides a solid angle of angularly specific illumination defining an illumination angle, selected by a user from among a continuous range of possible illumination angles. The device further includes an object inspector which inspects the object illuminated by the illuminator. The illuminator may include an illumination source, a light concentrator, an illumination angle selector, disposed along a light path between the illumination source and the object inspector. The illumination angle selector may have a first position in which directly -reflected light propagates toward the object plane and a second position in which no light both selected by the illumination angle selector and directly reflected from the object plane enters the collecting lens. Rather, in the second position, only scattered light from the object plane enters the collecting lens. | 09-16-2010 |
| 20100231902 | OPTICAL INSPECTION SYSTEM AND METHOD - A wafer inspection system has a bright field imaging beam path and a dark field imaging beam path to obtain bright field images and dark field images of a full 300 mm wafer. The optical system provides for telecentric imaging and has low optical aberrations. The bright field and dark field beam paths are folded such that the system can be integrated to occupy a low volume with a small foot print. | 09-16-2010 |
| 20100238433 | METHODS AND SYSTEMS FOR INSPECTION OF A SPECIMEN USING DIFFERENT INSPECTION PARAMETERS - Methods and systems for inspection of a specimen using different parameters are provided. One computer-implemented method includes determining optimal parameters for inspection based on selected defects. This method also includes setting parameters of an inspection system at the optimal parameters prior to inspection. Another method for inspecting a specimen includes illuminating the specimen with light having a wavelength below about 350 nm and with light having a wavelength above about 350 nm. The method also includes processing signals representative of light collected from the specimen to detect defects or process variations on the specimen. One system configured to inspect a specimen includes a first optical subsystem coupled to a broadband light source and a second optical subsystem coupled to a laser. The system also includes a third optical subsystem configured to couple light from the first and second optical subsystems to an objective, which focuses the light onto the specimen. | 09-23-2010 |
| 20100245810 | INSPECTION METHOD BASED ON CAPTURED IMAGE AND INSPECTION DEVICE - A method of inspection and inspection apparatus able to use a captured image to more precisely inspect the state of film, defect parts, etc. at a surface of an object under inspection are provided. | 09-30-2010 |
| 20100245811 | Inspecting apparatus and inspecting method - An inspecting apparatus ( | 09-30-2010 |
| 20100309461 | METHOD FOR JUDGING WHETHER SEMICONDUCTOR WAFER IS NON-DEFECTIVE WAFER BY USING LASER SCATTERING METHOD - A semiconductor wafer whose number of LPDs per wafer is equal to or smaller than a predetermined number is sorted out, and a judgment as to whether a semiconductor wafer is a non-defective wafer is made visually based on a haze map of the semiconductor wafer subjected to the sorting. Moreover, a semiconductor wafer whose number of LPDs per wafer is equal to or smaller than a predetermined number is sorted out. Then, from the semiconductor wafers subjected to the sorting, a semiconductor wafer whose in-plane standard deviation and in-plane average value of the haze signals in a wafer plane have a specific relationship is sorted out, and this semiconductor wafer is judged to be a non-defective wafer. In this way, a method for judging whether a semiconductor wafer is a non-defective wafer or a defective wafer, the method that can make a judgment more uniform and accurate without dependence on the difference in the S/N ratio between inspection apparatuses using a laser scattering method, is provided. | 12-09-2010 |
| 20100315625 | METHODS FOR DEPTH PROFILING IN SEMICONDUCTORS USING MODULATED OPTICAL REFLECTANCE TECHNOLOGY - Methods of obtaining dopant and damage depth profile information are disclosed using modulated optical reflectivity (MOR) measurements. In one aspect, the depth profile is constructed using information obtained from various measurements such as the junction depth, junction abruptness and dopant concentration. In another aspect, a full theoretical model is developed. Actual measurements are fed to the model. Using an iterative approach, the actual measurements are compared to theoretical measurements calculated from the model to determine the actual depth profile. | 12-16-2010 |
| 20100315626 | OPTICAL APPARATUS FOR DEFECT INSPECTION - An optical apparatus for defect inspection having an illuminating optical system for irradiating illumination light beams on the surface of a specimen to form a beam spot and a detection optical system for detecting a reflection light ray originating from the beam spot comprises a storage unit in which the position and size of a standard particle of known size on a specimen for correction are stored in advance, a correction processing section which, when the correction specimen is used as an inspection target, correlates a detected scattering light quantity from the standard particle with the known size of standard particle stored at a corresponding position in the storage unit to prepare a correlation between the scattering light quantity and a true value, and a signal processing section which, when an inspection wafer is used as an inspection target, converts a detected scattering light quantity into a defect dimension. | 12-16-2010 |
| 20100321677 | SURFACE INSPECTING APPARATUS AND SURFACE INSPECTING METHOD - There is provided a surface inspecting apparatus capable of performing inspection at higher speed and with higher accuracy. A surface inspecting apparatus ( | 12-23-2010 |
| 20100328654 | MICROELECTRONIC SENSOR DEVICE FOR OPTICAL EXAMINATIONS ON A WETTED SURFACE - The application relates to a method and a microelectronic sensor device for making optical examinations in an investigation region ( | 12-30-2010 |
| 20110001962 | METHOD FOR DEFECT DETERMINATION IN FINE CONCAVE-CONVEX PATTERN AND METHOD FOR DEFECT DETERMINATION ON PATTERNED MEDIUM - In the inspection of a defect in a fine concave-convex pattern, a spectral waveform of a detection area of an inspection object is detected, area determination as to which area section determined by a pattern type of the inspection object the detection area belongs to is performed, a feature calculation equation and a determination index value which correspond to a determined area section and vary according to defect type is selected, feature calculation on the spectral waveform data in accordance with the selected feature calculation equation is performed, and a calculated feature value and the selected determination index value are compared to perform determination processing according to defect type. | 01-06-2011 |
| 20110043795 | Inspection method and apparatus - In an aspect, an inspection method for detecting the presence or absence of a defect on an object, the object comprising a recess having a physical depth, is disclosed. The method includes directing radiation at the object, the radiation having a wavelength that is substantially equal to twice an optical depth of the recess, detecting radiation that is re-directed by the object or a defect on the object, and determining the presence or absence of a defect from the re-directed radiation. | 02-24-2011 |
| 20110043796 | OPTICAL INPSECTION SYSTEM AND METHOD - An inspection system includes imaging optics for imaging an object plane into an image plane. The imaging optics include an objective lens having positive optical power, a first lens group having negative optical power, and a second lens group having positive optical power. The optical elements are arranged along a common optical axis with a pupil plane of the imaging optics located between the first lens group and the second lens group. | 02-24-2011 |
| 20110051129 | Inspection Apparatus, Lithographic Apparatus and Method of Measuring a Property of a Substrate - Scatterometers making use of a Glan-laser polarizer are described. The use of Glan-laser polarizers as described generally results in an improved extinction ratio and use over a greater range of wavelengths when compared with dielectric polarizers. | 03-03-2011 |
| 20110058160 | DEFECT INSPECTION APPARATUS AND DEFECT INSPECTION METHOD - Disclosed herein is a defect inspection apparatus including: a light source for emitting laser light; a mirror group for splitting the wave surface of incident laser light emitted by the light source into a plurality of component wave surfaces, arranging the component wave surfaces to form an array oriented in one direction and aligning the component wave surfaces to form a single wave surface after propagating the laser light through a moving object of measurement; an interferometer for splitting the single wave surface into two partial wave surfaces to create an interference stripe; an imaging section for taking an image of the interference stripe created by the interferometer; and an analysis section for detecting a defect existing on the surface of the moving object of measurement on the basis of changes of the image, which has been taken as the image of the interference stripe, with the lapse of time. | 03-10-2011 |
| 20110069305 | INSPECTION DEVICE AND INSPECTING METHOD FOR SPATIAL LIGHT MODULATOR, ILLUMINATION OPTICAL SYSTEM, METHOD FOR ADJUSTING THE ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - There is disclosed an inspection device for inspecting a spatial light modulator having a plurality of optical elements arrayed two-dimensionally and controlled individually, said inspection device comprising, a conjugate optical system which is arranged optically downstream the spatial light modulator and which forms a conjugate plane optically conjugate with an array plane where the plurality of optical elements are arrayed, a photodetector having a detection surface arranged on or near the conjugate plane, and an inspection unit which inspects optical characteristics of the plurality of optical elements, based on a result of detection by the photodetector. | 03-24-2011 |
| 20110075133 | METHOD AND DEVICE FOR INSPECTING DEFECTS ON BOTH SURFACES OF MAGNETIC DISK - A device that is capable of simultaneously inspecting both sides of surfaces of a magnetic disk to detect defects thereon includes a front-side defect detecting section and a back-side defect detecting section each of which optically detect a scratch and a defect that are present on the front and back surfaces of the magnetic disk, to improve a throughput for inspection. The back-side defect detecting section has an optical path changing section that reflects a laser beam emitted by a laser light source to change an optical path thereof and thereby to direct the laser beam toward the back surface of the magnetic disk and that reflects scattered light that has been collected by a Fresnel lens to change an optical path thereof and thereby to direct the scattered light toward a first photoelectric converter. | 03-31-2011 |
| 20110075134 | Defect Inspection Method and System - An apparatus for inspecting a specimen includes a first illumination unit having a laser light source and a first optical component for illuminating a specimen on which patterns are formed with a laser from a first elevation angle direction, a second illuminating unit having a light source and a second optical component for illuminating the specimen from a second elevation angle direction which is greater than the first elevation angle, a first detection optical unit which detects light from the specimen illuminated by the first illumination unit, a second detection optical unit which detects light from the specimen illuminated by the second illumination unit, and a signal processing unit which processes signals output from the first detector to detect defects in a first area on the specimen and processes signals output from the second detector to detect defects in a second area on the specimen. | 03-31-2011 |
| 20110080578 | Method and Its Apparatus For Inspecting Defects - A defect inspection apparatus is capable of inspecting an extremely small defect present on the top and edge surfaces of a sample such as a semiconductor substrate or a thin film substrate with high sensitivity and at high speed. The defect inspection apparatus has an illumination optical system, a plurality of detection optical units and a signal processor. One or more of the detection optical units receives either light diffracted from an edge portion of the sample or light diffracted from an edge grip holding the sample. The one or more of the detection optical units shields the diffracted light received by the detection optical unit based on a signal obtained by monitoring an intensity of the diffracted light received by the detection optical unit in order to inspect a sample portion located near the edge portion and a sample portion located near the edge grip. | 04-07-2011 |
| 20110090490 | Inspection apparatus using a chip - An inspection apparatus using a chip includes a rotor that holds a chip; a measurement room in which the rotor is provided and a through hole is formed; a light source that emits light for measurement to the chip through the through hole; a light measurement unit that detects the light from the chip, a rotation drive mechanism that rotates the rotor; and a cover member capable of covering or uncovering an opening portion. | 04-21-2011 |
| 20110102781 | OPTICAL DEFECT INSPECTION APPARATUS - A laser beam oscillated from a laser source is folded in its path by first and second plane mirrors and enters a beam expander. The surface of each plane mirror is deteriorated with illumination by the laser beam and the reflectance is reduced. To avoid a light quantity of the laser beam entering the beam expander from being reduced below a reference value, when the laser beam is illuminated over a certain time, a position on each of the first and second plane mirrors at which the laser beam is illuminated is changed by a structure for rotating and/or translating a reflecting surface of each plane mirror on a plane, which includes the plane mirror, while an optical axis is kept same. Thus, the useful life of each plane mirror can be prolonged without displacing the optical axis. | 05-05-2011 |
| 20110122404 | EFFICIENT TELECENTRIC OPTICAL SYSTEM (ETOS) - A new architecture for machine vision system that uses area sensor (or line sensor), with telecentric imaging optics compound with telecentric illumination module is described. The illumination module may include a bright field illumination source and/or a dark field illumination source. The telecentric imaging optics includes an upper imaging module having an aperture stop and a lower imaging module positioned between the upper imaging module and object, such that the light source and the aperture stop are located in the back focal plane of the lower imaging module. The lower imaging module images the illumination source into a plane of an aperture stop of the upper imaging module. The optical axis of the upper imaging module is offset with respect to the lower imaging module. The optical axis of the telecentric illumination module is offset with respect to the axis of the lower imaging module in the opposite direction. | 05-26-2011 |
| 20110128533 | SURFACE-CHECK EQUIPMENT - A surface-check equipment has a frame, at least one lamp fastened to the frame and at least one dark box fastened to the frame. The dark box has a case with a working side and a dark chamber. The working side has a slot defined through the working side and allowing light to enter the dark box via the slot. The dark chamber communicates with the slot and has an incident reflector, at least one transmitting reflector, a refractor assembly, at least one terminal reflector, and a sensor corresponding to each other and allowing light from the object via the slot to be reflected and refracted and received by the sensor. Therefore, the dark box has simple and inexpensive elements, so the surface-check equipment is easily and quickly assembled and has decreased cost and size. | 06-02-2011 |
| 20110128534 | Defect Inspection Method - A method and apparatus for inspecting a defect of a surface of a sample in which a laser beam is irradiated on a sample surface so that at least a part of an illumination field of the laser beam illuminates a first area of the sample surface, a plurality of scattered light rays from the first area caused by the irradiation in the irradiating is detected, errors of inclination of an illumination apparatus and a sensor for the plurality of scattered light rays detected are corrected, the plurality of scattered light rays corrected is at least one of added and averaged, a defect on the sample surface based on the plurality of scattered light rays in accordance with the correcting of errors of inclination of the illumination apparatus and the sensor is determined. | 06-02-2011 |
| 20110134418 | LIGHT SOURCE DEVICE, SURFACE INSPECTING APPARATUS USING THE DEVICE, AND METHOD FOR CALIBRATING SURFACE INSPECTING APPARATUS USING THE DEVICE - A surface inspecting apparatus can inspect a smaller defect by using a PSL of a smaller particle size. However, the particle size of the PSL is restricted. In the conventional surface inspecting apparatus, therefore, no consideration has been taken as to how to inspect the defect of such a small particle size as is not set in the PSL which will be needed in the near future in an inspection of a semiconductor manufacturing step. The invention has a light source device for generating light which simulated at least one of a wavelength, a light intensity, a time-dependent change of the light intensity, and a polarization of light which was scattered, diffracted, or reflected by an inspection object, and the light is inputted to a photodetector of the surface inspecting apparatus. The smaller defect can be inspected. | 06-09-2011 |
| 20110141461 | Surface Inspection Method and Surface Inspection Apparatus - Light from a light source becomes two illumination beams by a beam splitter. The beams are irradiated onto a semiconductor wafer from two mutually substantially orthogonal azimuthal angles having substantially equal elevation angles to form illumination spots. When the sum of scattered, diffracted, and reflected lights due to the illumination beams is detected, influence of the anisotropy which a contaminant particle and a defect existing in the wafer itself or thereon have with respect to an illumination direction, can be eliminated. | 06-16-2011 |
| 20110149275 | DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD - A defect inspection device, which inspects defects such as foreign materials existing on a specimen on which a circuit pattern of wiring or the like is formed, is provided with an illumination optical system which illuminates a plurality of different areas the specimen with a plurality of linear shaped beams and an image forming optical system that forms images of the plurality of the illuminated areas on a plurality of detectors, and the detectors are configured to receive a plurality of polarization components substantially at the same time and individually, wherein the polarization components are different from each other and are contained in each of the plurality of the optical images formed by the image forming optical system, thereby detecting a plurality of signals corresponding to the polarization components and carrying out the inspection at high speed under a plurality of optical conditions. | 06-23-2011 |
| 20110170090 | ILLUMINATION SYSTEM FOR OPTICAL INSPECTION - Apparatus for generating optical radiation includes a laser, which is configured to operate in multiple transverse modes simultaneously so as to generate an input beam, which is characterized by a first speckle contrast. The transverse modes of the input beam are optically mixed so as to generate an output beam have a second speckle contrast, which is substantially less than the first speckle contrast. | 07-14-2011 |
| 20110181873 | SURFACE SCANNING DEVICE - A surface scanning device for inspecting a product surface includes an illumination module and an image acquisition device. The illumination module is designed to illuminate the product surface with illumination of substantially uniform illuminance. The illumination module is also designed to configure a configurable range of angles of incidence of the illumination on the product surface. The image acquisition device images the illuminated area. | 07-28-2011 |
| 20110188032 | Far-field superlensing - An apparatus for creating a sub-wavelength image in the farfield. In an example embodiment, the apparatus includes a far-field superlens that is adapted to generate a sub-wavelength image or a sub-diffraction-limited image at a far field distance from a negative-index material included in the superlens. The example far-field superlens includes a positive-index material and an adjacent positive-index material. The negative-index material has an output aperture at a first surface. A second surface or interface is positioned at a far field distance from the negative-index material such that a cavity or gap is formed between the second surface and the first surface, wherein the second surface represents an imaging surface. The gap may be filled with a dielectric material or may include a vacuum or air. In a more specific embodiment, the superlens further includes a first mechanism for producing one or more sub-diffraction-limited beam features at a far field distance from the negative-index layer via the cavity in which propagating electromagnetic energy from the incident electromagnetic energy propagates. | 08-04-2011 |
| 20110205534 | Defect Inspection Apparatus and Its Method - A defect inspection apparatus for inspecting defects on an inspecting object includes an illuminator which irradiates a beam of light on the inspecting object, a photo-detector which detects rays of light from the inspecting object due to the irradiation of the light beam by the illuminator, a defect detector which detects a defect by processing a signal obtained through detection by the photo-detector, a characteristic quantity calculator which calculates a characteristic quantity related to a size of the defect, and a defect size calculator which uses a relation between size and characteristic quantity which is calculated by an optical simulation and calculates a size of the detected defect. | 08-25-2011 |
| 20110211191 | Method And Its Apparatus For Inspecting Defects - A defect inspection apparatus is capable of inspecting an extremely small defect present on the top and edge surfaces of a sample such as a semiconductor substrate or a thin film substrate with high sensitivity and at high speed. The defect inspection apparatus has an illumination optical system, a plurality of detection optical units and a signal processor. One or more of the detection optical units receives either light diffracted from an edge portion of the sample or light diffracted from an edge grip holding the sample. The one or more of the detection optical units shields the diffracted light received by the detection optical unit based on a signal obtained by monitoring an intensity of the diffracted light received by the detection optical unit in order to inspect a sample portion located near the edge portion and a sample portion located near the edge grip. | 09-01-2011 |
| 20110228262 | APPARATUS OF INSPECTING DEFECT IN SEMICONDUCTOR AND METHOD OF THE SAME - When size of a defect on an increasingly miniaturized pattern is obtained by defect inspection apparatus in the related art, a value is inconveniently given, which is different from a measured value of the same defect by SEM. Thus, a dimension value of a defect detected by defect inspection apparatus needs to be accurately calculated to be approximated to a value measured by SEM. To this end, size of the defect detected by the defect inspection apparatus is corrected depending on feature quantity or type of the defect, thereby defect size can be accurately calculated. | 09-22-2011 |
| 20110235029 | PATTERN MEASURING METHOD AND PATTERN MEASURING APPARATUS - According to one embodiment, a pattern measuring method includes: irradiating, from a plurality of different incident directions, electromagnetic waves on a periodical structure pattern in which a plurality of patterns are periodically arrayed and partially overlap one another; detecting the electromagnetic waves scattered by the periodical structure pattern and detecting scattering profiles of the electromagnetic waves; and measuring, based on the detected scattering profiles, a pattern shape of the periodical structure pattern. Each of the different incident directions is an incident direction in which the patterns included in the periodical structure pattern do not partially overlap each other. | 09-29-2011 |
| 20110242528 | OPTICAL IMAGING SYSTEM WITH CATOPTRIC OBJECTIVE; BROADBAND OBJECTIVE WITH MIRROR; AND REFRACTIVE LENSES AND BROADBAND OPTICAL IMAGING SYSTEM HAVING TWO OR MORE IMAGING PATHS - An optical system may include an objective having at least four mirrors including an outermost mirror with aspect ratio <20:1 and focusing optics including a refractive optical element. The objective provides imaging at numerical aperture >0.7, central obscuration <35% in pupil. An objective may have two or more mirrors, one with a refractive module that seals off an outermost mirror's central opening. A broad band imaging system may include one objective and two or more imaging paths that provide imaging at numerical aperture >0.7 and field of view >0.8 mm. An optical imaging system may comprise an objective and two or more imaging paths. The imaging paths may provide two or more simultaneous broadband images of a sample in two or more modes. The modes may have different illumination and/or collection pupil apertures or different pixel sizes at the sample. | 10-06-2011 |
| 20110242529 | METHODS FOR VISUALLY INSPECTING INTERFEROMETRIC MODULATORS FOR DEFECTS - A method is provided for visual inspection of an array of interferometric modulators in various driven states. This method may include driving multiple columns or rows of interferometric modulators via a single test pad or test lead, such as test pad, and then observing the array for discrepancies between the expected optical output and the actual optical output of the array. This method may particularly include, for example, driving a set of non-adjacent rows or columns to a state different from the intervening rows or columns and then observing the optical output of the array. | 10-06-2011 |
| 20110255081 | APPARATUS AND METHODS FOR SETTING UP OPTICAL INSPECTION PARAMETERS - Provided are novel methods and systems for setting up ranges of optical inspection parameters. These ranges may be later used for inspection of photovoltaic cells for discoloration, for example. A set of values corresponding to an inspection parameter, such as hue, saturation, and intensity, is obtained from a set-up image. The image includes multiple set-up areas, e.g., a defined group of pixels, wherein each set-up area is assigned a corresponding value in the set. A test image is then constructed from multiple test areas that are also associated with the values in the set. Each test area is assigned a color from a set of user defined colors based on the corresponding value and user defined ranges. A user interface includes both a range diagram and test image, which are used to adjust the ranges in the diagram that result in modification of the test image. Adjusting is repeated until the test image meets predetermined criteria. | 10-20-2011 |
| 20110279816 | PHOTOMASK MOUNTING/HOUSING DEVICE AND RESIST INSPECTION METHOD AND RESIST INSPECTION APPARATUS USING SAME - A resist inspection apparatus is provided which has a configuration in which a reticle is separated from a pellicle. A reticle cassette is made up of two pieces of plate members. A hollowed portion with a shape allowing the reticle to be inserted into the plate member. Another hollowed portion having a shape being slightly larger than that of the resist of the reticle is formed on the plate member. In the circumference of the hollowed portion is placed a pellicle frame on which a protective film is formed in a stretched manner. In the concave portion is housed in the reticle with a resist on the reticle directed toward the hollowed portion. The reticle is put in sealed space. | 11-17-2011 |
| 20110285987 | Installation for the quality control of a surface of an object - This installation includes a support for the object, a panel having a fringe pattern alternating pale and dark lines, the pattern having a first series of parallel fringes extending in a first direction and at a first pitch, and a second series of parallel fringes extending in a second direction perpendicular to the first direction and at a second pitch, illuminating means arranged to illuminate the fringe pattern, at least one imaging capturing means to capture an image of the pattern reflected or transmitted by the surface of the object, and where at least one of the support, the panel and the capturing means is mobile between a plurality of positions, the movement between two successive positions of each chosen element being designed so as to produce a predetermined phase shift between two images of the pattern reflected or transmitted by said surface. | 11-24-2011 |
| 20110299069 | METHOD OF INSPECTING WAFER - Wafer inspection method to perform wafer inspection based on photo map information. The wafer inspection method may include: detecting a sample center location on a wafer; compensating the detected sample center location to a compensated center location based on photo map information; and detecting defective dies included in the wafer based on the compensated center location. | 12-08-2011 |
| 20110304848 | EXAMINING APPARATUS AND EXAMINING METHOD - When examination at a scan speed equal to or higher than the line rate of the sensor such as a TDI sensor is carried out, the line rate of the TDI sensor is asynchronous with the scan speed, and the image is blurred. Therefore, a TDI sensor cannot be used at a scan speed equal to or higher than the line rate of the TDI sensor. This problem has not been considered. To solve the problem, high-speed examination irrespective of the line rate of the TDI sensor is enabled. To control the line rate of the TDI sensor and stage scan speed asynchronously and to solve the problem of the image addition variation due to the charge accumulation of the TDI sensor, the object to be examined is irradiated with thin-line illumination, and only a given pixel line of the TDI sensor is made to receive light scattered by the object to be examined. The aspect ratio of the detection pixel size can be controlled by the speed ratio between the line rate of the TDI sensor and the stage scan speed. | 12-15-2011 |
| 20110310382 | DEFECTS INSPECTING APPARATUS AND DEFECTS INSPECTING METHOD - An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units. | 12-22-2011 |
| 20110317156 | INSPECTION DEVICE FOR DEFECT INSPECTION - The present invention comprises an inspection method for transparent or reflective inspection objects, by using a retro-reflective plate as a convex lens or concave mirror in such a way that defects can be detected in a stable fashion even if the inspection object is curved or if vibration occurs during movement of the inspection object; in which displacement of parallel light passing through or reflected in a measurement field is captured by using changes which occur in an inspection field, namely changes in the density gradient in the case of transmission inspection or in the reflection angle in the case of reflection inspection. The present invention also comprises an inspection device for defect inspection, in which a knife edge is provided, horizontally to the optical axis, on the front surface of a camera lens for collecting the transmitted light or reflected light, in such a way that three-dimensional defect images can be obtained since any light which diverges from the parallel light is blocked with consequent changes in the contrast of the light due to the density gradient in the inspection field at the camera. | 12-29-2011 |
| 20120013898 | Inspecting a Workpiece Using Polarization of Scattered Light - A surface inspection system, as well as related components and methods, are provided. The surface inspection system includes a beam source subsystem, a beam scanning subsystem, a workpiece movement subsystem, an optical collection and detection subsystem, and a processing subsystem. The system features a variable polarization a polarizing relay assembly arranged to selectively permit the scattered light having a selected polarization orientation to pass along a detector optical axis to a light detection unit in the detection subsystem. The system also features a collector output width varying subsystem for varying the width of an output slit in response to changes in the location of the location scanned on the workpiece. | 01-19-2012 |
| 20120026489 | Multi-Spot Illumination for Wafer Inspection - Illumination subsystems for multi-spot wafer inspection are provided. | 02-02-2012 |
| 20120038910 | Inspection Apparatus and Method - Ghost reflections in a catadioptric scatterometer objective are excluded from an angle-resolved spectrum measurement by using a partial pupil for illumination and for the measurement excluding the area of the pupil plane that has been illuminated. Ghost reflections are reflected back into same point in the pupil plane. The ghost reflections do not interfere with the signal in the non-illuminated area of the pupil plane. An illumination system provides a beam of electromagnetic radiation to illuminate a first area in an illumination pupil plane of the objective. The objective is arranged as to illuminate the substrate with the beam of electromagnetic radiation. The illumination pupil plane is the back projected image of the pupil plane of the objective and is also imaged into the measurement pupil plane at the back focal plane of the objective, via auxiliary optics. A detector is configured to measure an angle resolved spectrum arising from the illumination of the substrate, in a measurement area of the measurement pupil plane of the objective excluding an area corresponding to the first area. | 02-16-2012 |
| 20120057154 | OPTICAL MEASURING SYSTEM WITH MATCHED COLLECTION LENS AND DETECTOR LIGHT GUIDE - An optical surface inspection system provides dark-field detection avoiding ghost images and without capturing, stray, reflected or re-scattered light. The system includes an illumination system that generates an illumination spot on a surface under inspection collecting lens that collects substantially all light scattered from the surface under inspection from the illumination spot. The system also includes a light guide with a first end having a numerical aperture matched to an exit aperture of the collecting lens and a field of view matched to the illumination spot, and a second end coupled to a detector. | 03-08-2012 |
| 20120069329 | SURFACE INSPECTION APPARATUS AND METHOD THEREOF - A defect inspection apparatus including: a first illumination optical system which is configured to illuminate the inspection area on a sample surface from a normal line direction or a direction near thereof with respect to said sample surface; a second illumination optical system which is configured to illuminate said inspection area from a slant direction with respect to said sample surface; a detection optical system having a plurality of first detectors which are located, in front of, on the sides of, and behind said inspection area, respectively, with respect to the illumination direction of said second illumination optical system, and where the regular reflected light component, from said sample surface, by illumination light of said second illumination optical system, is not converged; and a signal processing system which is configured to inspect a defect, upon basis of signals obtained from said plurality of first detectors. | 03-22-2012 |
| 20120075624 | METHOD AND APPARATUS FOR INSPECTING MAGNETIC DISK - In magnetic disk inspection, it is made possible to perform the total operation in which magnetic disks taken out from a cassette are inspected on both surfaces thereof, classified by the grades according to the inspection results and returned again to corresponding cassettes, while maintaining high throughput. To achieve such inspection, a plurality of uninspected boards are put on a plurality of corresponding rotation-drive portions at a plurality of corresponding board taking-out and supply positions in a magnetic disk inspection apparatus and are transferred to a plurality of corresponding inspection positions. The boards are optically inspected while rotating. The optically inspected boards are transferred to the plurality of corresponding board taking-out and supply positions and the plurality of transferred boards are taken out. The taken-out boards are sorted according to the optical inspection results and stored in the corresponding cassettes into which inspected boards are stored. | 03-29-2012 |
| 20120081701 | METHOD AND APPARATUS FOR INSPECTING A SURFACE OF A SUBSTRATE - The present invention provides a method and apparatus for inspecting a surface of a substrate. The apparatus includes: a rotatable stage on which a substrate to be inspected is placed; an inspection optical system having an illumination light source for emitting light to a substrate placed on the stage and a detector for detecting light from the substrate which is irradiated with the light from the illumination light source; an A/D converter for amplifying and A/D converting signals output from the detector in the inspection optical system; and a defect detector for detecting defects in a surface of the substrate by processing signals output from the detector and converted by the A/D converter and classifying the defected defects. The defect detector extracts micro defects in the surface of the substrate by processing the signals output from the detector, and detects linear defects existing discretely in a linear region. | 04-05-2012 |
| 20120086937 | INSPECTION SYSTEM AND METHOD FOR FAST CHANGES OF FOCUS - An inspection system includes a first focusing unit configured to perform fast focus changes to a first focusing function applied to an incident light beam. A traveling lens acousto-optic device is arranged to receive the light beam focused by the first focusing function and produce focused spots using a plurality of traveling lenses generated in response to radio frequency signals. The traveling lenses apply a second focusing function and the traveling lens acousto-optic device is arranged to alter the second focusing function at a fast rate. The inspection system also includes optics arranged to direct the focused spots onto an inspected object and to direct radiation from the inspected object to a sensor. | 04-12-2012 |
| 20120092655 | INSPECTION SYSTEM UTILIZING SOLID IMMERSION LENSES - An inspection system including a lens. In one instance, the lens is a solid immersion lens. The inspection system includes a component or components for providing a self aligning solid immersion lens arrangement in order to allow at most a small distance between the solid immersion lens and a device under test and components or components for constraining a force exerted on the device under test. The inspection system may include a “purge” port, or a thermal isolation configuration or an anti-contamination component. The inspection system may include software and hardware to prevent crashing of the lens. The inspection system may also include a method for ensuring that various objective lenses can be replaced while maintaining the intended spacing between lenses. | 04-19-2012 |
| 20120127461 | METHOD OF INSPECTING A SUBSTRATE - A method of inspecting a substrate is disclosed. The method of inspecting a substrate, comprises: obtaining phase data per projecting part with regard to a substrate, by projecting pattern beam onto the substrate having a target object formed thereon through a plurality of projecting parts in sequence; obtaining height data per projecting part with regard to the substrate by using the phase data per the projecting part; setting up a projecting part with highest reliability in the a plurality of projecting parts to be a reference projecting part; modifying height data of remaining projecting part, referenced by height data of the reference projecting part; and obtaining integrated height data by using the modified height data. | 05-24-2012 |
| 20120127462 | SURFACE INSPECTION DEVICE FOR CYLINDRICAL BODY - The present, invention relates to a surface inspection device for a cylindrical body provided with an illumination light source ( | 05-24-2012 |
| 20120133926 | Defect Inspection Method - A method and apparatus of inspecting a defect of a surface of a sample in which a laser beam is irradiated on a sample surface so that at least a part of an illumination field of the laser beam illuminates a first area of the sample surface, a plurality of scattered light rays from the first area caused by the irradiation is detected with a plurality of detectors, detection errors of inclination of an illumination apparatus and a sensor for the plurality of scattered light rays detected by the plurality of detectors are corrected, at least one of adding and averaging the corrected plurality of scattered light rays, and a defect on the sample surface is determined based on the plurality of scattered light rays in accordance with the correction of errors of inclination of the illumination apparatus and the sensor. | 05-31-2012 |
| 20120133927 | DEFECT INSPECTION APPARATUS AND ITS METHOD - A defect inspection apparatus for inspecting defects on an inspecting object includes an illuminator which irradiates a beam of light on the inspecting object, a photo-detector which detects rays of light from the inspecting object due to the irradiation of the light beam by the illuminator, a defect detector which detects a defect by processing a signal obtained through detection by the photo-detector, a characteristic quantity calculator which calculates a characteristic quantity related to a size of the defect, and a defect size calculator which uses a relation between size and characteristic quantity which is calculated by an optical simulation and calculates a size of the detected defect. | 05-31-2012 |
| 20120133928 | DEFECT INSPECTION DEVICE AND INSPECTION METHOD - A defect inspection method wherein illumination light having a substantially uniform illumination intensity distribution in a certain direction on the surface of a specimen is radiated onto the surface of the specimen; wherein multiple components of those scattered light beams from the surface of the specimen which are emitted mutually different directions are detected, thereby obtaining corresponding multiple scattered light beam detection signals; wherein the multiple scattered light beam detection signals is subjected to processing, thereby determining the presence of defects; wherein the corresponding multiple scattered light detecting signals is processed with respect to all of the spots determined to be defective by the processing, thereby determining the sizes of defects; and wherein the defect locations on the specimen and the defect sizes are displayed with respect to all of the spots determined to be defective by the processing. | 05-31-2012 |
| 20120140211 | Inspection Apparatus - An inspection apparatus and method for detecting defects and haze on a surface of a sample includes illumination optics which emit light to illuminate an inspection region on the surface of the sample from an oblique direction relative to the inspection region, first detection optics which detect first scattered light from the inspection region and having a beam analyzer through an optical path, second detection optics which detect second scattered light from the inspection region, the second scattered light being scattered from a direction different than a direction of the first scattered light, and a signal-processing unit which treats different processings for a first signal of the detected first scattered light and for a second signal of the detected second scattered light and detecting defects and haze on the surface of the sample on the basis of at least one of the first signal and the second signal. | 06-07-2012 |
| 20120147363 | SURFACE-DEFECT INSPECTION DEVICE - There is provided a surface-defect inspection device that forms artificial defects on a standard sample. Defects are judged by a foreign material/defect decision mechanism and data about the defects is supplied to a data processing and controlling portion. The data processing and controlling portion calculates the amounts of coordinate deviations between the artificial defects on the standard sample and the detected defects, checks the sensitivity (instrumental sensitivity (luminance, brightness, or the like)), and proceeds to execution of hardware corrections. If the coordinate deviation is less than a certain value, software corrections are carried out. In the case of the software corrections, coordinate corrections are made for the whole standard sample. The amounts of coordinate deviations are computed and checked. If the amounts of coordinate deviations are outside a tolerance, coordinate corrections are made for each region obtained by dividing the standard sample. | 06-14-2012 |
| 20120147364 | CONTAMINATION INSPECTION METHOD AND CONTAMINATION INSPECTION DEVICE - Provided are a contamination inspection method and a contamination inspection device for highly accurately detecting a defect in a wafer, a liquid crystal substrate and media or the like including patterns, for example, a semiconductor device or the like. The first aspect of the present invention is a contamination inspection device comprising: an irradiation optical system for irradiating lights on the inspection target substrate; and a spatial filter for shading diffracted lights form the inspection target substrate. Herein, the spatial filter comprises: a plurality of light shading materials; a control member for changing at least one of parameters selected from a shape, an angle and an interval with respect to the light shading material, and a control unit for controlling the control members. | 06-14-2012 |
| 20120154796 | MATCHING IMAGING DATA TO FLEXOGRAPHIC PLATE SURFACE - An imaging apparatus for forming an image on a flexible media includes a carriage which moves relative to the flexible media. An optical displacement sensor (ODS) is mounted on the carriage for scanning a surface of the flexible media to form scanned data wherein the scanned data represents the surface of the flexible media. A digital front end is adapted to analyze the scanned data to detect and locate defects on the flexible media. An imaging head mounted on the carriage for writing an image on the flexible media wherein the location of imaging on the flexible media is adjusted to avoid the location of the defects detected on the flexible media. | 06-21-2012 |
| 20120176611 | SURFACE INSPECTION METHOD AND SURFACE INSPECTION APPARATUS - A surface inspection apparatus capable of acquiring scattered light intensity distribution information for each scattering azimuth angle, and detecting foreign matters and defects with high sensitivity. A concave mirror for condensation and another concave mirror for image formation are used to cope with a broad cubic angle. Since mirrors for condensation and image formation are used, a support for clamping the periphery of a lens is unnecessary, and an effective aperture area does not decrease. A plurality of azimuth-wise detection optical systems is disposed and reflected light at all azimuths can be detected by burying the entire periphery without calling for specific lens polishing. A light signal unification unit sums digital data from a particular system corresponding to a scattering azimuth designated in advance in the systems for improving an S/N ratio. | 07-12-2012 |
| 20120194806 | APPARATUS FOR OPTICAL INSPECTION - An apparatus for optical inspection comprises a platform extending in a first direction, a transmitting unit for transporting at least one carrier in the first direction from an input port to an output port thereof, each of the at least one carrier to support one of at least one object to be inspected, a first detector disposed above the platform and extending in a second direction orthogonal to the first direction for inspecting the at least one object on the at least one carrier, the first detector including a first scanner extending in the second direction between the input port and the output port, and a first roller set between the first scanner and the input port to apply force onto a surface of each of the at least one object. | 08-02-2012 |
| 20120194807 | FLAW INSPECTING METHOD AND DEVICE THEREFOR - In order to maximize the effect of signal addition during inspection of foreign substances in wafers, a device structure including line sensors arranged in plural directions is effective. Low-angle detection optical systems that detect light beams in plural azimuth directions, the light beams being scattered in low angle directions among those scattered from a linear area on a sample illuminated by illuminating means, each include a combination of a first imaging lens group ( | 08-02-2012 |
| 20120194808 | Appearance Inspection Apparatus - An appearance inspection apparatus analyzes a difference in detection characteristics of detection signals obtained by detectors to flexibly meet various inspection purposes without changing a circuit or software. The apparatus includes a signal synthesizing section that synthesizes detection signals from the detectors in accordance with a set condition. An input operating section sets a synthesizing condition of the detection signal by the signal synthesizing section, and an information display section displays a synthesizing map structured based on a synthesized signal which is synthesized by the signal synthesizing section in accordance with a condition set by the input operating section. | 08-02-2012 |
| 20120218545 | OBLIQUE ILLUMINATOR FOR INSPECTING MANUFACTURED SUBSTRATES - One embodiment relates to an oblique illuminator. The oblique illuminator includes a light source emitting a light beam, a first reflective surface, and a second reflective surface. The first reflective surface has a convex cylindrical shape with a projected parabolic profile along the non-powered direction which is configured to reflect the light beam from the light source and which defines a focal line. The second reflective surface has a concave cylindrical shape with a projected elliptical profile which is configured to reflect the light beam from the first reflective surface and which defines first and second focal lines. The focal line of the first reflective surface is coincident with the first focal line of the second reflective surface. The first and second focal lines of the second reflective surface may be a same line in which case the elliptical curvature is a projected spherical profile. Other embodiments, aspects and features are also disclosed. | 08-30-2012 |
| 20120236296 | METHOD AND APPARATUS FOR INSPECTING DEFECTS - To provide a defect inspection apparatus for inspecting defects of a specimen without lowering resolution of a lens, without depending on a polarization characteristic of a defect scattered light, and with high detection sensitivity that is realized by the following. A detection optical path is branched by at least one of spectral splitting and polarization splitting, a spatial filter in the form of a two-dimensional array is disposed after the branch, and only diffracted light is shielded by the spatial filter in the form of a two-dimensional array. | 09-20-2012 |
| 20120262708 | UNMANNED AERIAL VEHICLE - There is herein described an unmanned aerial vehicle capable of inspecting, identifying, and/or categorising defects on objects to be inspected using visible and/or non-visible wavelengths from infra-red to ultraviolet. More particularly, there is herein described a remotely controlled or autonomous unmanned aerial vehicle capable of inspecting, identifying, and/or categorising defects on objects to be inspected using visible and/or non-visible wavelengths from infra-red to ultraviolet and displaying information relating to said defects. | 10-18-2012 |
| 20120262709 | DEFECTS INSPECTING APPARATUS AND DEFECTS INSPECTING METHOD - An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units. | 10-18-2012 |
| 20120293793 | METHOD OF EVALUATING SILICON WAFER AND METHOD OF MANUFACTURING SILICON WAFER - A method of evaluating a silicon wafer includes obtaining first surface distribution information indicating an surface distribution of photoluminescence intensity on a surface of a silicon wafer; after obtaining the first surface distribution information, subjecting the silicon wafer to a thermal oxidation treatment, and then obtaining second surface distribution information indicating an surface distribution of photoluminescence intensity on the surface of the silicon wafer; obtaining difference information for the first surface distribution information and third surface distribution information, with the third surface distribution information having been obtained by correcting the second surface distribution information with a correction coefficient of less than 1; and based on the difference information obtained, evaluating an evaluation item selected from the group consisting of absence or presence of oxygen precipitates and surface distribution of oxygen precipitates in the silicon wafer being evaluated. | 11-22-2012 |
| 20120314211 | INSPECTING APPARATUS AND INSPECTING METHOD - Provided is a method wherein a multi-anode detector is used for the purpose of detecting scattered light from a wafer, data obtained from the detector (multi-anode) for detecting defects is used, the shape of a beam radiated to the wafer, a rotational shift between the radius direction and the beam long side, and the like are calculated, and the optical axis of the irradiation beam is adjusted. Furthermore, the method is provided with a technique which feeds back the correction quantities for rotation and amplitude to inspection signal data, on the basis of the correction data, and corrects inspection data. Since fine correction with the adjustment of an optics system and signal processing is made possible, positional accuracy of defect inspection and accuracy of defect level (defect size) are improved. | 12-13-2012 |
| 20120320372 | Autonomous Non-Destructive Evaluation System for Aircraft Structures - An apparatus comprises an inspection vehicle, a sensor system, a positioning system, a controller, and a support system. The inspection vehicle is configured to move on a surface of an object. The sensor system is associated with the inspection vehicle and is configured to generate information about the object when the inspection vehicle is on the surface of the object. The positioning system is configured to determine a location of the inspection vehicle on the object. The controller is configured to control movement of the inspection vehicle using the positioning system and control operation of the sensor system. The support system is connected to the inspection vehicle and is configured to support the inspection vehicle in response to an undesired release of the inspection vehicle from the surface of the object. | 12-20-2012 |
| 20120320373 | Inspection Apparatus - An inspection method and apparatus for detecting defects or haze of a sample, includes illuminating light to the sample from an oblique direction relative to a surface of the sample with an illuminator, detecting first scattered light at a forward position relative to an illuminating direction from the sample with a first detector, detecting sec and scattered light at a sideward or backward position relative to the illuminating direction from the sample with a second detection, and processing a first signal of the first scattered light and a second signal of the second scattered light with different weighting for the first signal and for the second signal with a processor. | 12-20-2012 |
| 20120327402 | INSPECTION DEVICE - The invention relates to a device for inspecting contact-sensitive planar materials or workpieces, e.g. wafers for the semiconductor industry, solar cells, glasses, FPD substrates, or biologically active substrates for biosensors, as well as materials having contact-sensitive curved surfaces. Said inspection device comprises a support element ( | 12-27-2012 |
| 20120327403 | SURFACE INSPECTION APPARATUS AND SURFACE INSPECTION METHOD - A surface inspection apparatus includes a blocking unit included in a subsequent processing unit that groups data items into having an arbitrary number of data items. The subsequent processing unit acquires a data item from each of the blocks. The blocking unit changes, in accordance with an instruction transmitted from a state monitoring unit, the number of data items to be blocked. A threshold processing unit acquires data items from the blocking unit that have values larger than a threshold, and transmits the data items to a memory. The state monitoring unit monitors an available capacity of the memory. When the state monitoring unit detects a reduction in the available capacity of the memory, it causes the blocking unit to increase the number of data items to be blocked into each of the blocks so that data does not overflow from the memory. | 12-27-2012 |
| 20130010289 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM HAVING PROGRAM FOR EXECUTING THE SUBSTRATE PROCESSING METHOD STORED THEREIN - Provided is a substrate processing apparatus including a placement table on which a substrate is disposed; a light source configured to irradiate light on the surface of the substrate on the placement unit; a detector configured to detect the light amount reflected from the substrate; and a control unit configured to perform a determination process of determining whether a detection value of the light amount is smaller than a predetermined value at a plurality of positions, and to determine that a holding state of the substrate is abnormal when the total number of times of determination in which it is determined that the detection value is smaller than the predetermined value reaches a predetermined number of times. | 01-10-2013 |
| 20130021600 | IMAGING AN IMPRINTED SUBSTRATE ON A PRINTING PRESS - Systems and methods for imaging an imprinted substrate on a printing press is provided. One method comprises sensing light reflected by the substrate using a contact image sensor to produce data representative of the imprinted substrate. The substrate has been imprinted with different colors at a plurality of printing units of the printing press. Each printing unit comprises a plate cylinder. The data representative of the imprinted substrate is output by the contact image sensor as analog voltage signals. The method further comprises receiving the analog voltage signals from the contact image sensor at a sensor interface circuit and converting the analog voltage signals to digital signals using an analog-to-digital converter of the sensor interface circuit. The method further comprises processing the digital signals using the sensor interface circuit to produce corrected digital signals and storing data based on the corrected digital signals in a memory. | 01-24-2013 |
| 20130021601 | ABNORMAL MEASUREMENT DETECTION DEVICE AND METHOD FOR INFRARED RADIATION THERMOMETER - A technique for an infrared radiation thermometer used for theiniography that detects measurement abnormality of an infrared radiation thermometer and estimates the causes of the measurement abnormality such as contamination of an objective lens and a malfunction in a mechanism section of the infrared radiation thermometer. | 01-24-2013 |
| 20130027693 | SURFACE DEFECT INSPECTION METHOD AND APPARATUS - The present invention provides an apparatus and method which enable detecting a microscopic defect sensitively by efficiently collecting and detecting scattering light from a defect in a wider region without enlarging the apparatus. In the apparatus for inspecting a defect on a surface of a sample, including illumination means which irradiates a surface of a sample with laser, reflected light detection means which detects reflected light from the sample, and signal processing means which processes a detected signal and detecting a defect on the sample, the reflected light detection means is configured to include a scattering light detection unit which collects scattering light components of the reflected light from the sample by excluding specularly reflected light components by using an aspheric flannel lens and detecting the scattering light components. | 01-31-2013 |
| 20130027694 | SURFACE DEFECT INSPECTION METHOD AND APPARATUS - The present invention provides an apparatus and method which enable detecting a microscopic defect sensitively by efficiently collecting and detecting scattering light from a defect in a wider region without enlarging the apparatus. In the apparatus for inspecting a defect on a surface of a sample, including illumination means which irradiates a surface of a sample with laser, reflected light detection means which detects reflected light from the sample, and signal processing means which processes a detected signal and detecting a defect on the sample, the reflected light detection means is configured to include a scattering light detection unit which collects scattering light components of the reflected light from the sample by excluding specularly reflected light components by using an aspheric flannel lens and detecting the scattering light components. | 01-31-2013 |
| 20130044316 | DEVICE AND METHOD FOR INSPECTING MOVING SEMICONDUTOR WAFERS - Device for inspecting defects in semiconductor wafers, comprising a member for detecting surface defects using variations in the slope of a surface of the wafer, a member for detecting surface defects using variations in the light intensity reflected by a surface of the wafer, at a plurality of points, a member for detecting light intensity scattered by the surface of the wafer, a light source, and a detecting and classifying mechanism connected upstream of said detecting members. | 02-21-2013 |
| 20130141715 | FAULT INSPECTION DEVICE AND FAULT INSPECTION METHOD - Proposed is a defect inspection method whereby: illuminating light having a substantially uniform illumination intensity distribution in one direction of a sample surface irradiated on the sample surface; multiple scattered light components, which are output in multiple independent directions, are detected among the scattered light from the sample surface and multiple corresponding scattered light detection signals are obtained; at least one of the multiple scattered light detection signals is processed and the presence of defects is determined; at least one of the multiple scattered light detection signals that correspond to each of the points determined by the processing as a defect is processed and the dimensions of the defect are determined; and the position and dimensions of the defect on the sample surface, at each of the points determined as a defect, are displayed. | 06-06-2013 |
| 20130148113 | INSPECTION APPARATUS AND INSPECTION METHOD - The light scattered from the sample surface and foreign matter is imaged on an image intensifier and detected by a lens-coupled multi-pixel sensor such as a TDI sensor or a CCD sensor. The light scattered by surface roughness is spatially eliminated to detect the light scattered from foreign matter with increased sensitivity. A mechanism for shifting the image intensifier is incorporated to prevent a signal intensity decrease, which may be caused by a decrease in the sensitivity of the image intensifier. | 06-13-2013 |
| 20130155399 | OPTICAL IMAGING SYSTEM WITH CATOPTRIC OBJECTIVE; BROADBAND OBJECTIVE WITH MIRROR; AND REFRACTIVE LENSES AND BROADBAND OPTICAL IMAGING SYSTEM HAVING TWO OR MORE IMAGING PATHS - An optical system may include an objective having at least four mirrors including an outermost mirror with aspect ratio <20:1 and focusing optics including a refractive optical element. The objective provides imaging at numerical aperture >0.7, central obscuration <35% in pupil. An objective may have two or more mirrors, one with a refractive module that seals off an outermost mirror's central opening. A broad band imaging system may include one objective and two or more imaging paths that provide imaging at numerical aperture >0.7 and field of view >0.8 mm. An optical imaging system may comprise an objective and two or more imaging paths. The imaging paths may provide two or more simultaneous broadband images of a sample in two or more modes. The modes may have different illumination and/or collection pupil apertures or different pixel sizes at the sample. | 06-20-2013 |
| 20130155400 | METHOD AND DEVICE FOR INSPECTING FOR DEFECTS - A defect inspecting method is provided which comprises a pre-scan defect inspecting process including a pre-scan irradiating step for casting irradiation light onto the surface of a sample, a pre-scan detecting step for detecting the scattered lights, and a pre-scan defect information collecting step for obtaining information on preselected defects present on the sample surface on the basis of the scattered lights; a near-field defect inspecting process including a near-field irradiating step in which the distance between the sample surface and a near-field head is adjusted so that the sample surface is irradiated, a near-field detecting step for detecting near-field light response, and a near-field defect information collecting step for obtaining information on the preselected defects on the basis of the near-field light response; and a merging process for inspecting defects present on the sample surface by merging the pieces of information on the preselected defects. | 06-20-2013 |
| 20130215419 | OPTICAL INSPECTION DEVICE - An optical inspection device comprises a first set of rollers, wherein each roller comprises a wheel, and the wheels of the first set of rollers are spaced apart by a first distance in a first direction; a second set of rollers, wherein each roller comprises a wheel, and the wheels of the second set of rollers are spaced apart by the first distance in the first direction; a scanning unit disposed between the first set of rollers and the second set of rollers; and a first image sensor configured to capture optical lights in a first region, wherein the first region is on a side of the first set of rollers opposite the scanning unit. | 08-22-2013 |
| 20130235371 | HIGH-SPEED, 3-D METHOD AND SYSTEM FOR OPTICALLY INSPECTING PARTS - A high-speed, 3-D method and system for optically inspecting parts are provided. The system includes a part transfer subsystem including a transfer mechanism adapted to support a part at a loading station and transfer the supported part from the loading station to an inspection station at which the part has a predetermined position and orientation for inspection. The system also includes an illumination assembly to simultaneously illuminate an end surface of the part and a peripheral surface of the part. The system further includes a lens and detector assembly to form an optical image of the illuminated end surface and an optical image of the illuminated peripheral surface of the part and to detect the optical images. The system still further includes a processor to process the detected optical images to obtain an end view of the part and a 3-D panoramic view of the peripheral surface of the part. | 09-12-2013 |
| 20130235372 | MEASURING DEVICE AND METHOD FOR DETERMINING A MEASURED VARIABLE AT ONE END OF A ROD-SHAPED PRODUCT - A measuring device for determining a measured variable at one end of a rod-shaped product includes an optical displacement sensor which includes a light source producing light that is scanned across an entire end face of the rod-shaped product to be examined and a light detector for detecting light that is reflected at the end face of the rod-shaped product to generate a measuring signal. A processing device is coupled to receive the measuring signal to determine a quantitative profile of the entire end face of the rod-shaped product. | 09-12-2013 |
| 20130242292 | INSPECTION SYSTEM FOR COATED PAPER - An inspection system for coated paper includes a traveling web of paper, a coating device for forming bands on the web by applying a coating liquid in the width direction of the web such that the bands are spaced from each other in the longitudinal direction of the web at regular intervals, a drying device for drying the web having the bands, a detection unit which is arranged downstream of the coating device for detecting at least either defect in the bands or defect in the web that is caused due to application of the coating liquid. A control device is inputted with the detection result from the detection unit and includes a determination section for determining the type of defect from the detection result. A quality control unit is inputted with the determination result from the determination section and configured to manage the determination result. | 09-19-2013 |
| 20130258324 | SURFACE DEFECT DETECTING APPARATUS AND METHOD OF CONTROLLING THE SAME - Disclosed herein is a surface defect detecting apparatus including a stage unit having an upper surface on which a subject is disposed; at least one light source unit that is moved according to an examination condition and irradiates examination light onto a surface of the subject; an imaging unit that receives light emitted from the surface of the subject and captures an image of the surface of the subject; a controller that is connected to the at least one light source unit and the imaging unit, sets the examination condition, controls an overall operation, and detects a surface defect of the subject by using the image captured by the imaging unit; and a display unit displaying image information on the surface defect detected by the controller. | 10-03-2013 |
| 20130258325 | METHOD AND APPARATUS FOR OPTICALLY INSPECTING A MAGNETIC DISK - In a method and apparatus for optically inspecting a magnetic disk, irradiating the surface of the sample with a light by rotating and moving the sample in the direction orthogonal to the center axis of the rotation, detecting the regular reflection light from the surface of the sample, detecting the scattered light in the vicinity of the regular reflection light from the surface of the sample by separating the scattered light from the regular reflection light, detecting the scattered light scattered in the direction at a higher angle with respect to the normal direction of the surface of the sample, and detecting the defects by processing the detection signal of the regular reflection light, the detection signal of the scattered light in the vicinity of the regular reflection light, and the detection signal of the scattered light in the high angle direction. | 10-03-2013 |
| 20130258326 | METHOD AND APPARATUS FOR INSPECTING SURFACE OF A DISK - A disk surface inspection method for detecting a circle scratch defect, separately from sporadically existing scratch defects. In the method, the sample is irradiated with light, regular reflection light reflected from the sample is detected, scattered light in the vicinity of the regular reflection light is detected separately from the regular reflection light, scattered light, scattered in a high angle direction greater than the direction of the regular reflection light is detected, and the defects on the surface of the sample are detected by processing a regular reflection light detection signal, a low-angle scattered light detection signal and a high-angle scattered light detection signal to extract defect candidates, and regarding the extracted defect candidates, a circumferential defect is extracted based on the ratio of defect candidates in a circumferential direction within a predetermined width in a radial direction from the center of the sample. | 10-03-2013 |
| 20130258327 | METHOD AND APPARATUS FOR INSPECTING SURFACE OF A SAMPLE - In order to feed back information on the detected defect to a production process in a short period of time, there is provided a method for inspecting the surface of a sample by illuminating illumination light to the sample, detecting scattered light generated from the sample by the illumination light and processing a detection signal representing the detected scattered light in order to detect a defect on the sample. In the step of processing the detected scattered signal includes the sub-steps of making use of detection signals representing the scattered light scattered in the first elevation-angle direction and the scattered light scattered in the third elevation-angle direction in order to detect a defect on the sample, identifying the type of the detected defect, generating spectroscopic data by dispersing the scattered light scattered in the second elevation-angle direction and summing up the spectroscopic data for every defect type. | 10-03-2013 |
| 20130258328 | DISK SURFACE INSPECTION METHOD AND DISK SURFACE INSPECTION DEVICE - Provided is a disk surface inspection device that makes it possible to extract defects repeatedly occurring at a particular position on the disk surface. The disk surface inspection device comprises conveyance means which extracts a disk from a cassette and conveys the disk, table means including a spindle which rotates the disk mounted thereon while moving the disk in a direction and a rotation angle detecting unit which detects the rotation angle of the spindle, optical detection means which irradiates the disk with light and detects reflected light from the disk, signal processing means which detects defects by processing a detection signal from the optical detection means, and output means. The signal processing means stores positional information of defects detected on the disk by use of rotation angle information on the spindle and positional information on a particular part of the disk stored in the cassette. | 10-03-2013 |
| 20130271754 | INSPECTION APPARATUS - This invention implements reduction in the amount of background-scattered light from a semiconductor wafer surface and highly sensitive inspection, without increasing the number of detectors. A surface inspection apparatus that detects defects on the surface of an object (semiconductor wafer surface) to be inspected, by irradiating the surface of the object with a beam of light such as laser light and detecting the light reflected or scattered from the surface; wherein a widely apertured lens with an optical Fourier transform function is disposed between the object to be inspected and a detector, a filter variable in position as well in aperture diameter is provided on a Fourier transform plane, and background-scattered light from the semiconductor wafer surface is effectively blocked, whereby only a signal from a defect such as a foreign substance is detected. | 10-17-2013 |
| 20130286385 | INSPECTION APPARATUS - To increase the speed of inspection, an inspection apparatus may conduct an inspection by irradiating a wafer surface with a thin light beam and acquiring an image of an irradiated region with a photodetector. However, it is not easy to have the photodetector properly form the image of the irradiated region. This problem is not solved by prior art technologies. | 10-31-2013 |
| 20130301040 | SURFACE FEATURES MAPPING - Provided herein is an apparatus, including a photon emitting means for emitting photons onto a surface of an article, a photon detecting means for detecting photons scattered from features in the surface of the article; and a mapping means for mapping the features in the surface of the article, wherein the apparatus is configured to process more than one article every | 11-14-2013 |
| 20130308124 | Substrate Inspection - Various embodiments for substrate inspection are provided. | 11-21-2013 |
| 20130321796 | INSPECTION DEVICE - The invention relates to a device for inspecting contact-sensitive planar materials or workpieces, e.g. wafers for the semiconductor industry, solar cells, glasses, FPD substrates, or biologically active substrates for biosensors, as well as materials having contact-sensitive curved surfaces. Said inspection device comprises a support element ( | 12-05-2013 |
| 20130335733 | System With Multiple Scattered Light Collectors - A method for inspecting a surface of a workpiece for asymmetric defects, by scanning an incident beam on the surface of the workpiece to impinge thereon to create reflected light extending along a light channel axis in a front quartersphere and scattered light, the incident beam and the light channel axis defining an incident plane, collecting the scattered light at a plurality of collectors disposed above the surface at defined locations such that scatter from asymmetric defects is collectable by at least one collector, detecting collector output and generating signals in response, and processing the signals associated with each collector individually to obtain information about asymmetric defects. | 12-19-2013 |
| 20130342833 | System With Polarized Scattered Light - An optical collection and detection system for use in a surface inspection system for inspecting a surface of a workpiece. The surface inspection system has an incident beam projected through a back quartersphere and toward a desired location on the surface, which is a scanned spot having a known scanned spot size. The incident beam impinges on the surface to create scattered light that is collected by a collector module. The collector module includes collection optics for collecting and focusing the scattered light to form focused scattered light. A collector output slit is positioned at an output of the collector module, through which the collection optics focus the scattered light. The scattered light that is associated with the scanned spot forms an imaged spot at the collector output slit. The collector output slit has a width that is selected to be proportional to the scanned spot size, so as to allow passage of the focused scattered light associated with the scanned spot, and exclude the focused scattered light associated with the workpiece regions other than the desired spot. A collector output varying subsystem varies the collector output slit so as to at least one of minimize passage of Rayleigh light scatter through the collector output slit or optimize a signal to air-scatter-noise ratio. | 12-26-2013 |
| 20140036260 | METHOD AND SYSTEM FOR OPTICALLY INSPECTING PARTS - A method and system for optically inspecting parts are provided wherein the system includes a part transfer subsystem including a transfer mechanism adapted to receive and support a part at a loading station and to transfer the supported part so that the part travels along a first path which extends from the loading station to an inspection station at which the part has a predetermined position and orientation for inspection. An illumination assembly simultaneously illuminates a plurality of exterior side surfaces of the part with a plurality of separate beams of radiation. A telecentric lens and detector assembly forms an optical image of at least a portion of each of the illuminated side surfaces of the part and detects the optical images. A processor processes the detected optical images to obtain a plurality of views of the part which are angularly spaced about the axis of the part. | 02-06-2014 |
| 20140071442 | OPTICAL SURFACE DEFECT INSPECTION APPARATUS AND OPTICAL SURFACE DEFECT INSPECTION METHOD - Arrangements classifying or inspecting finely classified defects. When irradiating a subject with light; focusing a scattered light from a subject surface onto plural optical receivers; and inspecting for a defect based on outputs from the optical receivers. Performed are: creating a reference matrix recipe with respect to each defect, the recipe provided with plural feature items indicative of features of the defect on one axis of the matrix and optical items including a range of detected value levels of plural detecting optical systems with respect to the feature items on the other axis, and the recipe having information defining the defect at a plurality of points in the matrix; and determining a type of the defect by creating a work matrix recipe corresponding to the reference matrix recipe based on the output from the plurality of detectors and comparing the work matrix recipe with the reference matrix recipe. | 03-13-2014 |
| 20140071443 | REFLECTION TYPE OPTICAL SENSOR AND IMAGE GENERATION APPARATUS - A reflection type optical sensor that detect a surface condition of a moving body and that is used for an image generation apparatus which forms images on a recording media includes a light-emitting device which has a plurality of light emitter systems including at least two light-emitting members and a light-emitting optical system having a plurality of light-emitting lenses corresponding to a plurality of the light emitter systems and guiding light emitted from the light emitter systems to the moving body and a light-receiving device which has a light receiver system including at least two light-receiving members and a light-receiving optical system having light-receiving lenses corresponding to the at least two light-receiving members and guiding light reflected by the moving body to the light receiver system. The image generation apparatus has further a surface condition judging device in addition to the reflection type optical sensor. | 03-13-2014 |
| 20140098364 | CLASSIFICATION OF SURFACE FEATURES USING FLUORESENCE - Provided herein is an apparatus, including a photon emitter configured to emit photons onto a surface of an article, a photon detector array configured to receive photons from surface features of the article; and a processing means configured for processing photon-detector-array signals corresponding to photons scattered from the surface features and photons fluoresced from the surface features, wherein the processing means is further configured for classifying the surface features of the article. | 04-10-2014 |
| 20140104603 | FEATURE DETECTION WITH LIGHT TRANSMITTING MEDIUM - An apparatus for detecting surface features is disclosed. The apparatus may include a plurality of strands configured to contain light and further configured to transmit light from a light source to a surface of an article. The apparatus may also include a detector configured to receive light reflected from the surface of the article via the plurality of strands, wherein the detector is further configured to detect features associated with the article. | 04-17-2014 |
| 20140111798 | APPARATUS FOR FOCUS BEAM ANALYSIS OF HIGH POWER LASERS - An in-line laser beam waist analyzer system includes an optical prism that picks off a portion of a second surface reflection from either a laser processing focus lens or a protective debris shield for the processing lens and directs that focused light to a pixelated detector. This provides real time monitoring of the focused laser beam while it is processing material by welding, cutting, drilling, scribing or marking, without disrupting the process. | 04-24-2014 |
| 20140139827 | APPARATUS AND METHOD FOR INSPECTING ARTICLES - An apparatus for inspecting an article includes a laser assembly which is operable to direct a laser beam against a series of locations disposed along a line which extends across discontinuities in a surface of the article. The position of at least of one location against which the laser beam is directed is detected. The at least one location is spaced from discontinuities in the surface of the article. | 05-22-2014 |
| 20140185039 | HEAT LAMP TEST FOR IDENTIFICATION OF OIL SPOTS - A system for differentiating between oil spots and non-oil spots in a wrapped article comprising a web and a wrapped material. The system includes a heat source that applies heat to a wrapped article for a predetermined amount of time when the wrapped article is placed in a sample area on a surface that is arranged at a predetermined distance away from a heating element of the heat source; and a light source that provides backlighting to the web of the wrapped article when the web has been separated from the wrapped material and placed on a viewing surface of the light source. A method for differentiating between oil spots and non-oil spots in wrapped articles and a field test kit are also provided. | 07-03-2014 |
| 20140218723 | SURFACE INSPECTION APPARATUS AND METHOD THEREOF - A defect inspection apparatus including: a first illumination optical system which is configured to illuminate the inspection area on a sample surface from a normal line direction or a direction near thereof with respect to said sample surface; a second illumination optical system which is configured to illuminate said inspection area from a slant direction with respect to said sample surface; a detection optical system having a plurality of first detectors which are located, in front of, on the sides of, and behind said inspection area, respectively, with respect to the illumination direction of said second illumination optical system, and where the regular reflected light component, from said sample surface, by illumination light of said second illumination optical system, is not converged; and a signal processing system which is configured to inspect a defect, upon basis of signals obtained from said plurality of first detectors. | 08-07-2014 |
| 20140320853 | METHOD AND APPARATUS FOR MEASURING DAMAGE TO AN ORGANIC LAYER OF A THIN FILM ENCAPSULATION - A method of measuring damage of an organic layer of a thin film encapsulation includes: preparing a thin film encapsulation structure in which an inorganic layer is stacked on an organic layer, in which a light-emitting material is mixed; irradiating light to the thin film encapsulation structure so that light is emitted from the light-emitting material, the intensity of light emitted from the light emitting material decreasing over time; detecting a light emission lifetime of the light emitted from the light emitting material; and determining a degree of damage to the organic layer based on the light emission lifetime. Accordingly, a degree of the damage to the organic layer due to plasma may be easily detected, and the damage to the organic layer may be minimized based on the detected degree of the damage by improving plasma process conditions for an operation of forming an inorganic layer. | 10-30-2014 |
| 20140347656 | DEVICE FOR INSPECTING CERAMIC SPHERE - Provided are a sintered ceramic and a ceramic sphere which are inhibited from suffering surface peeling due to fatigue resulting from repetitions of loading and can attain an improvement in dimensional accuracy when subjected to surface processing and which have excellent wear resistance and durability. A ceramic-sphere inspection device is also provided with which a ceramic sphere is inspected for a flaw present in the surface layer and for snow flakes without destroying the ceramic sphere. The device is a ceramic-sphere inspection device ( | 11-27-2014 |
| 20140354980 | ARTICLE EDGE INSPECTION - Provided herein is an apparatus, including a photon emitting means for emitting photons onto surface edges of an article, a photon detecting means for detecting photons scattered from particles on the surface edges of the article, and a mapping means for mapping a particle or a defect of the surface of the article. | 12-04-2014 |
| 20140354981 | SURFACE FEATURE MANAGER - Provided herein is an apparatus, including a mapping means for generating a map of locations of surface features of an article based on photon-detector signals corresponding to photons scattered from the surface features of the article, and a surface feature manager. The surface manager is configured to locate a predetermined surface feature of the surface features of the article based, at least in part, on the map of the surface features locations, irradiate photons of a first power onto the location of the predetermined surface feature to analyze the predetermined surface feature, and irradiate photons of a second power onto the location of the predetermined surface feature to remove the predetermined surface feature. | 12-04-2014 |
| 20140362371 | SENSOR FOR MEASURING SURFACE NON-UNIFORMITY - A method includes forming a two-dimensional interrogating beam on a selected sample region of a surface; collecting light transmitted through or reflected from the sample region with an array of lenses to form a sample array of focus spots; imaging the sample array of focus spots through an imaging lens on a sensor; and comparing an image of the sample array of focus spots to a reference array of focus spots to determine a level of non-uniformity in the sample region. | 12-11-2014 |
| 20140362372 | Simultaneous Multi-Spot Inspection and Imaging - A compact and versatile multi-spot inspection imaging system employs an objective for focusing an array of radiation beams to a surface and a second reflective or refractive objective having a large numerical aperture for collecting scattered radiation from the array of illuminated spots. The scattered radiation from each illuminated spot is focused to a corresponding optical fiber channel so that information about a scattering may be conveyed to a corresponding detector in a remote detector array for processing. For patterned surface inspection, a cross-shaped filter is rotated along with the surface to reduce the effects of diffraction by Manhattan geometry. A spatial filter in the shape of an annular aperture may also be employed to reduce scattering from patterns such as arrays on the surface. In another embodiment, different portions of the same objective may be used for focusing the illumination beams onto the surface and for collecting the scattered radiation from the illuminated spots simultaneously. In another embodiment, a one-dimensional array of illumination beams is directed at an oblique angle to the surface to illuminate a line of illuminated spots at an angle to the plane of incidence. Radiation scattered from the spots are collected along directions perpendicular to the line of spots or in a double dark field configuration. | 12-11-2014 |
| 20140375986 | Test Glass Changing - A test glass changer for optically measuring layer properties in a vacuum coating system including a movable substrate holder for guiding a substrate through a stream of coating material; a mount connected to a rotary spindle and rotatable relative to the substrate holder about the rotary spindle; and a control device directing a test glass element into a ray path of an optical measuring device and into a stream of the coating material. The mount has at least two recesses offset eccentrically with respect to the spindle for one test glass element in each case. The control device can induce a rotational movement of the mount about the spindle. The centering device can exert a torque and holding moment on the mount to bring a test glass element arranged in one of the recesses into a measuring position of the measuring device. Related methods are also provided. | 12-25-2014 |
| 20150015875 | Measuring Device for Measuring an Illumination Property - A measuring device ( | 01-15-2015 |
| 20150036127 | BLADE INSPECTION APPARATUS - A blade inspection apparatus inspects a plurality of blades periodically disposed on a periphery of a rotating shaft of a rotor of an engine and rotated on the rotating shaft. The blade inspection apparatus has a borescope having an insertion portion in which an observation optical system is provided, fixtures attached to one of a plurality of external access ports provided on the engine and fixing the borescope, and dedicated for each of the external access ports, and an identification information output portion for outputting identification information for identifying the external access port to which the fixtures are attached. | 02-05-2015 |
| 20150042987 | Front Quartersphere Scattered Light Analysis - A surface inspection system, as well as related components and methods, are provided. The surface inspection system includes a beam source subsystem, a beam scanning subsystem, a workpiece movement subsystem, an optical collection and detection subsystem, and a processing subsystem. The optical collection and detection system features, in the front quartersphere, a light channel assembly for collecting light reflected from the surface of the workpiece, and a front collector and wing collectors for collecting light scattered from the surface, to greatly improve the measurement capabilities of the system. The light channel assembly has a switchable edge exclusion mask and a reflected light detection system for improved detection of the reflected light. | 02-12-2015 |
| 20150070690 | Method of Detecting a Defect of a Substrate and Apparatus for Performing the Same - In a method of detecting a defect of a substrate, a first light having a first intensity may be irradiated to a first region of the substrate through a first aperture. A defect in the first region may be detected using a first reflected light from the first region. A second light having a second intensity may be irradiated to a second region of the substrate through a second aperture. A defect in the second region may be detected using a second reflected light from the second region. Thus, the defects by the regions of the substrate may be accurately detected. | 03-12-2015 |
| 20150070691 | Whisker Manufacturing, Detection, Response, and Compound Manufacturing Apparatus and Method - An invention for making productive uses of normally undesirable whiskers is provided. Embodiments of the invention include a variety of apparatuses and methods associated with forming and using whiskers as well as forming whisker compounds is disclosed. For example, whisker detection modules can be created which provide a whisker surveillance capability. The whisker detection modules can further be coupled with a whisker response system such as an alarm or insulating material dispersing system. Another aspect of the invention is providing a variety of environments or microenvironments with regard to a whisker forming structure to affect whisker creation such as maximizing whisker formation. Another example includes provision of a variety of embodiments for manufacturing compounds of whiskers of various metal and metal alloys, including structures and methods is provided. Whisker compounds produced using various embodiments of the invention can be used for various applications. | 03-12-2015 |
| 20150146198 | DEVICE FOR SPRAYING A DYE PENETRATION INSPECTION LIQUID INTO A WORKPIECE - A device for spraying a liquid for use in dye penetration inspection into an inner cavity of a workpiece for making a turbine engine part, the device including a workpiece support, a manifold for spraying the inspection liquid into the inner cavity, a manifold for sucking up and discharging the sprayed inspection liquid, and a mechanism for tilting at least a portion of the support from a substantially horizontal position to an inclined position in which the workpiece is inclined so that the inspection liquid sprayed into the cavity flows under gravity to a zone from which it is sucked up. | 05-28-2015 |
| 20150293030 | Sensor Array for Verifying the Condition of an Electronic Device - A system and method for evaluating the cosmetic condition of a used electronic device, comprising directing one or more beams of light at the surface of the device and evaluating the amount of reflected light and the amount of scattered light off the surface of the device. The system and method can be used to evaluate the condition of the device or to confirm a user's manually entered evaluation of the device's condition. | 10-15-2015 |
| 20150293034 | INSPECTION DEVICE AND INSPECTION METHOD - To provide a technique for improving a detection precision of the inspection device. The inspection device | 10-15-2015 |
| 20150314927 | TAMPER-RESISTANT ASSEMBLY FOR SECURING VALUABLE MATERIAL - The invention provides a tamper resistant assembly that that securely contains a valuable material. The assembly has a container for holding the valuable material, an optional carrier that contains the container, one or more cover components that enclose the valuable material in the container, and one or more labels having a plurality of devices that reveal tampering by distortion of at least one of the plurality of devices. The label(s) are positioned so that dislodging a cover component causes a detectable distortion in at least one of the plurality of devices, thereby revealing tampering with the assembly. In one embodiment the label can be affixed partially to a surface of a cover component and partially to a surface of the container or the optional carrier. Also disclosed are methods of detecting tampering and method of manufacturing a temper-resistant assembly. Because the assembly allows a remote validator to validate the assembly prior to providing essential instructions or authorization for conducting procedures on valuable material contained by the assembly, the manufacturer is assured that its procedures are being provided only to authorized persons. | 11-05-2015 |
| 20150316488 | Inspection System and Inspection Illumination Device - In order to provide an inspection illumination device that makes it possible to greatly change a light amount within an observation solid angle of an imaging device even in a case where a change in reflection or scattering taking place at a feature point is subtle, and thus detect such a minute feature point, the inspection illumination device includes: a surface light source that emits inspection light; a lens that is arranged between the surface light source and an inspection object, and provides an image of the surface light source near the inspection object; and a first light shielding mask that is arranged between the surface light source and the inspection object, and forms a dark domain within an illumination solid angle of the inspection light applied to each point on the inspection object. | 11-05-2015 |
| 20150330891 | INSPECTION DEVICE AND INSPECTION SYSTEM FOR DISPLAY SUBSTRATE - The present disclosure relates to a technical field of display substrate inspection. The present disclosure discloses an inspection device and an inspection system for display substrate. The inspection device includes a support member, a turning table and a first drive device. The turning table includes: a carrier pivotally mounted on a pivot shaft, the carrier having an observation aperture through its thickness direction; and positioning clamps which are mounted on the carrier and are used to retain the display substrate in the range of the observation aperture. The first drive device is in transmission connection with the pivot shaft of the carrier in order to drive the turning table to rotate around the pivot shaft. When inspecting the appearance of the display substrate by the above mentioned inspection device, omnidirectional inspection of the display substrate can be achieved by turning the turning table. Moreover, the contact between the inspector and the display substrate can be avoided, the risk of damaging the display substrate during appearance inspection can be decreased, and therefore defects of the display substrate caused by appearance inspection can be reduced. | 11-19-2015 |
| 20150330908 | PUMP AND PROBE TYPE SECOND HARMONIC GENERATION METROLOGY - Various approaches to can be used to interrogate a surface such as a surface of a layered semiconductor structure on a semiconductor wafer. Certain approaches employ Second Harmonic Generation and in some cases may utilize pump and probe radiation. Other approaches involve determining current flow from a sample illuminated with radiation. | 11-19-2015 |
| 20150330909 | WAFER METROLOGY TECHONOLOGIES - Various approaches can be used to interrogate a surface such as a surface of a layered semiconductor structure on a semiconductor wafer. Certain approaches employ Second Harmonic Generation and in some cases may utilize pump and probe radiation. Other approaches involve determining current flow from a sample illuminated with radiation. Decay constants can be measured to provide information regarding the sample. Additionally, electric and/or magnetic field biases can be applied to the sample to provide additional information. | 11-19-2015 |
| 20150330910 | Cosmetic Evaluation Box for Used Electronics - A cosmetic testing device for electronic devices that uses the electronic device's own camera to take photographs of the electronic device in order to determine its cosmetic condition. | 11-19-2015 |
| 20150330912 | Defect Sampling for Electron Beam Review Based on Defect Attributes from Optical Inspection and Optical Review - Various embodiments for generating a defect sample for electron beam review are provided. One method includes combining, on a defect-by-defect basis, one or more first attributes for defects determined by optical inspection of a wafer on which the defects were detected with one or more second attributes for the defects determined by optical review of the wafer thereby generating combined attributes for the defects. The method also includes separating the defects into bins based on the combined attributes for the defects. The bins correspond to different defect classifications. In addition, the method includes sampling one or more of the defects for the electron beam review based on the bins into which the defects have been separated thereby generating a defect review sample for the electron beam review. | 11-19-2015 |
| 20150338352 | INFRARED DETECTOR DEVICE INSPECTION SYSTEM - Methods and apparatuses for identifying carrier lifetimes are disclosed herein. In a general embodiment, a beam of light is sent to a group of locations on a material for an optical device. Photons emitted from the material are detected at each of the group of locations. A carrier lifetime is identified for each of the group of locations based on the photons detected from each of the group of locations. | 11-26-2015 |
| 20150346112 | Inspection Apparatus and Adjusting Method - An inspection apparatus which can be accurately calibrated regardless of a use environment or an amount of use time is implemented. A reference substrate | 12-03-2015 |
| 20150355099 | SCRATCH VERIFICATION APPARATUS AND METHOD - A scratch verification method and apparatus for detecting and analyzing defects in a surface, the apparatus include a detection device with a plurality of emission sources and a plurality of sensors. A processor is connected to the detection device and is configured to apply one or more sets of criteria to one or more corresponding target areas of a surface. The processor is further configured to differentiate between data from the one or more target areas. | 12-10-2015 |
| 20150355100 | INSPECTION DEVICE - An inspection device is provided including a light emitting element configured to emit light, a light receiving element arranged so as to face the light emitting element and configured to receive the light, where one of the light emitting element and the light receiving element is used as a to-be-inspected element, and the other one of the light emitting element and the light receiving element is used as an inspection element that inspects the to-be-inspected element, a housing configured to accommodate the inspection element, and a lid configured to be detachable from the housing. In the inspection device, one of the housing and the lid is provided with an arrangement unit to which the to-be-inspected element is set in a detachable manner, and the lid includes a contact unit that electrically contacts the to-be-inspected element by touching and detaching from the to-be-inspected element. | 12-10-2015 |
| 20150355104 | Inspection Apparatus, Inspection Method, And Program - To facilitate adjusting of a distance from an inspection target to an illumination section by providing a movable illumination section that is movable independently of the imaging section. An illumination apparatus has a plurality of LEDs arranged in a substantially annular form, a light diffusion member for diffusing light emitted from the plurality of LEDs, and a lighting control part for lighting the plurality of light sources in accordance with a predetermined lighting pattern when designated to start lighting. In particular, the illumination apparatus moves independently of a camera to adjust a distance to a workpiece. | 12-10-2015 |
| 20150369752 | DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD - In an defect inspection method and device, in order to detect a minute defect present on a surface of a sample with a high degree of sensitivity, a defect inspection method includes imaging the same region of a sample in a plurality of image acquisition conditions and acquiring a plurality of images, processing the plurality of acquired images and extracting a defect candidate, clipping a partial image including the extracted defect candidate and a neighboring image of the defect candidate from the acquired images based on position information of the extracted defect candidate, obtaining feature quantities of the defect candidates in the plurality of clipped partial images, associating the defect candidates that have the same coordinates on the sample and are detected in different image acquisition condition, extracting a defect from among the associated defect candidates in a multi-dimensional feature quantity space, and outputting information of the extracted defect. | 12-24-2015 |
| 20160003751 | CONTACTLESS EXAMINATION OF A BUTT WELD - A device for the contactless examination of a butt weld of plastic pipes and fittings is provided. The device includes a carrier device, an illumination unit, and at least one sensor for monitoring the pipe ends or fitting ends to be welded and the weld seam, wherein the sensor is an electronic light-sensitive sensor. | 01-07-2016 |
| 20160018340 | METHOD FOR REVIEWING A DEFECT AND APPARATUS - detect a fine defect in reviewing To review a fine defect detected by another inspection apparatus, there is disclosed a method for reviewing a defect including a light capturing step that illuminates a sample with light under plural optical conditions, while varying only at least one of illumination conditions, sample conditions, or detection conditions, and detects plural lights scattering from the sample; a signal obtaining step that obtains plural signals based on the lights detected; and a processing step that discriminates a defect from noise according to a waveform characteristic quantity, an image characteristic quantity, or a value characteristic quantity created using the signals and derives the coordinates of defect. | 01-21-2016 |
| 20160025645 | System and Method for Simultaneous Dark Field and Phase Contrast Inspection - An inspection apparatus for simultaneous dark field (DF) and differential interference contrast (DIC) inspection includes an illumination source and a sample stage configured to secure a sample. The inspection apparatus includes a first sensor, a second sensor and an optical sub-system. The optical sub-system includes an objective, one or more optical elements arranged to direct, through the objective, illumination from the one or more illumination sources to a surface of the sample. The objective is configured to collect a signal from the surface of the sample, wherein the collected signal includes a scattering-based signal and/or a phase-based signal from the sample. The inspection apparatus includes one or more separation optical elements arranged to spatially separate the collected signal into a DF signal and a DIC signal by directing the DF signal and the DIC signal along a DF path and DIC path respectively. | 01-28-2016 |
| 20160025647 | METHOD FOR DETECTING AND/OR PREVENTING GRIND BURN - The present disclosure provides a method of detecting and preventing grind burn from developing on a gear. The method includes performing acoustic emission testing while the gear is being ground during a grinding operation. The grinding wheel is evaluated during an eddy current test to detect material buildup on the grinding wheel which could cause grind burn. In addition, the method includes collecting swarf from the gear during the grinding operation and inspecting the swarf for an indication of grind burn. | 01-28-2016 |
| 20160027605 | High Resolution High Quantum Efficiency Electron Bombarded CCD Or CMOS Imaging Sensor - An electron-bombarded detector for detecting low light signals includes a vacuum tube structure defining a cylindrical vacuum tube chamber, a photocathode disposed at a first end of the vacuum tube chamber, a sensor disposed at a second end of the vacuum tube chamber, ring electrodes disposed in the vacuum tube chamber for generating an electric field that accelerates emitted photoelectrons toward the sensor, and a magnetic field generator configured to generate a symmetric magnetic field that applies a focusing lens effect on the photoelectrons. The ring electrodes and magnetic field generator are operating using one of a reduced distance focusing approach and an acceleration/deceleration approach such that the photoelectrons have a landing energy below 2 keV. The use of reflective mode photocathodes is enabled using either multi-pole deflector coils, or ring electrodes formed by segmented circular electrode structures. Large angle deflections are achieved using magnetic or electrostatic deflectors. | 01-28-2016 |
| 20160045985 | WELDING PORTION INSPECTION DEVICE AND INSPECTION METHOD THEREFOR - Welding laser beam is irradiated along welding trajectories set in works, or inspection laser beam is irradiated along scanning trajectories set in a molten pool in the works which has been melted by the welding laser beam. Return light including reflected light from the molten pool in the work, evaporation luminescence generated by melting/evaporating of the work and thermal radiation light radiated from the molten pool in the work is received. A fundamental frequency is detected by conducting Fourier transform on the intensity of the received return light and a welding condition of the welding portion in the work is inspected based on an amplitude under the fundamental frequency and an amplitude under a frequency that is twice as high as the fundamental frequency. | 02-18-2016 |
| 20160054232 | System and Method for Apodization in a Semiconductor Device Inspection System - An inspection system with selectable apodization includes a selectably configurable apodization device disposed along an optical pathway of an optical system. The apodization device includes one or more apodization elements operatively coupled to one or more actuation stages. The one or more actuation stages are configured to selectably actuate the one or more apodization elements along one or more directions. The inspection system includes a control system communicatively coupled to the one or more actuation stages. The control system is configured to selectably control an actuation state of at the one or more apodization elements so as to apply a selected apodization profile formed with the one or more apodization elements. | 02-25-2016 |
| 20160061744 | Dent Mirror - The present invention comprises a surface to maximize the viewing of an impression in a vehicle body. This may comprise a fabric which has at least one dark colored stripe parallel to at least one light colored stripe; a compressible frame across which the said fabric is affixed, where when the frame is uncompressed the fabric is stretched taut across the frame and where the frame is compressed the fabric is slack across the frame; and a handle on the frame where a user can hold the frame and not interfere with the fabric affixed to said frame. When a user is holding the handle of the frame at an angle between 0° and 180°, the user can reflect radiant energy through said fabric onto the vehicle body and create a whorl reflection pattern on the impression to maximize viewing of said impression by the user. | 03-03-2016 |
| 20160077016 | EVALUATION SYSTEM AND A METHOD FOR EVALUATING A SUBSTRATE - There may be provided an evaluation system that may include spatial sensors that include atomic force microscopes (AFMs) and a solid immersion lens. The AFMs are arranged to generate spatial relationship information that is indicative of a spatial relationship between the solid immersion lens and a substrate. The controller is arranged to receive the spatial relationship information and to send correction signals to the at least one location correction element for introducing a desired spatial relationship between the solid immersion lens and the substrate. | 03-17-2016 |
| 20160077018 | SURFACE FEATURES CHARACTERIZATION - Provided herein is an apparatus, including two photon emitters and a photon detector array. The two photon emitters are configured to emit photons onto an entire surface of an article. The photon detector array includes a number of photon detectors configured to detect photons scattered from features in the entire surface of the article, wherein the features are less than 500 nm in their largest dimension. | 03-17-2016 |
| 20160084773 | METHOD AND SYSTEM FOR IMPROVING OPTICAL MEASUREMENTS ON SMALL TARGETS - A control system and method are provided for use in managing optical measurements on target structures. The control system comprises: data input utility for receiving input data indicative of a size of a target structure to be measured and input data indicative of illumination and collection channels of an optical measurement system; data processing utility for analyzing the input data, and an interplay of Point Spread Functions (PSFs) of the illumination and collection channels, and determining data indicative of optimal tailoring of apertures to be used in the optical measurement system for optimizing ensquared energy for measurements on the given target structure, the optimal tailoring comprising at least one of the following: an optimal ratio between numerical apertures of the illumination and collection channels; and an optimal orientation offset of physical apertures in the illumination and collection channels. | 03-24-2016 |
| 20160097725 | LED-BASED INSPECTION OF A PAINTED SURFACE FINISH - A method of inspecting a painted finish of a component such as a vehicle body or panel includes positioning the component with respect to an array of LED lighting fixtures each having LED tubes and generating light via the array with a predetermined set of lighting characteristics. The set of lighting characteristics includes a striped pattern, a beam angle of at least 120 degrees, and a CRI of at least 85 or at least 90. The method includes inspecting the painted surface for defects while illuminating the component with the light from the array. A control action is executed with respect to the component when the component contains a threshold number and/or a threshold size of the defects. Each array may have two LED tubes and four angled reflectors, and illuminating includes reflecting light from the LED tubes off of the angled reflectors toward the painted surface. | 04-07-2016 |
| 20160097728 | SYSTEM AND METHOD FOR INSPECTING A COMPOSITE PART DURING MANUFACTURE - A method, system and computer-readable storage medium are provided to facilitate inspection of a composite part during manufacture. In the context of a system, a system for inspecting a composite part during manufacture is provided that includes an inspection system configured to detect an in-process anomaly with respect to a ply of the composite part during placement of the ply. The system also includes a computing system configured to determine part location coordinates of the in-process anomaly detected by the inspection system with respect to the ply of the composite part. The computing system is also configured to map the in-process anomaly to a digital part model based upon the part location coordinates. The system additionally includes a display, responsive to the computing system, configured to present a representation of the digital part model including an indication of the in-process anomaly relative thereto. | 04-07-2016 |
| 20160099540 | 183NM Laser And Inspection System - A laser assembly for generating laser output light at an output wavelength of approximately 183 nm includes a fundamental laser, an optical parametric system (OPS), a fifth harmonic generator, and a frequency mixing module. The fundamental laser generates fundamental light at a fundamental frequency. The OPS generates a down-converted signal at a down-converted frequency. The fifth harmonic generator generates a fifth harmonic of the fundamental light. The frequency mixing module mixes the down-converted signal and the fifth harmonic to produce the laser output light at a frequency equal to a sum of the fifth harmonic frequency and the down-converted frequency. The OPS generates the down-converted signal by generating a down-converted seed signal at the down-converted frequency, and then mixing the down-converted seed signal with a portion of the fundamental light. At least one of the frequency mixing, frequency conversion or harmonic generation utilizes an annealed, deuterium-treated or hydrogen-treated CLBO crystal. | 04-07-2016 |
| 20160103079 | METHOD FOR THE SURFACE INSPECTION OF LONG PRODUCTS AND APPARATUS SUITABLE FOR CARRYING OUT SUCH A METHOD - Disclosed are a method and apparatus for the surface inspection and detection of defects of long products by means of a combination of images of the same region of the long product. The images are taken under different lighting condition in order to reconstruct the shape of the surface and thus obtain information on the presence of defects. | 04-14-2016 |
| 20160109383 | METHOD AND SYSTEM FOR OPTICALLY INSPECTING THE ENDS OF A MANUFACTURED PART AT A SINGLE INSPECTION STATION HAVING A MEASUREMENT AXIS - A method and system for optically inspecting the ends of a manufactured part at a single inspection station having a measurement axis are provided. The system includes a fixture assembly having a rotatable first fixturing component and a rotatable second fixturing component mating with and removably connected to the first fixturing component to transmit torque from the first fixturing component to the second fixturing component. The second fixturing component has a device for holding the part in a generally horizontal orientation and permit rotation of the horizontally held part between first and second angular positions about the measurement axis. The system also includes an actuator assembly, an illumination device, a lens and detector assembly and at least one processor to process electrical signals generated by the lens and detector assembly to determine at least one geometric dimension or any visual defects at the ends of the part. | 04-21-2016 |
| 20160123892 | ILLUMINATION SYSTEM, INSPECTION TOOL WITH ILLUMINATION SYSTEM, AND METHOD OF OPERATING AN ILLUMINATION SYSTEM - An illumination system, an inspection tool and a method for inspecting an object are disclosed. A configurable area light source is arranged in an illumination optical axis of an illumination beam path, wherein the configurable area light source is configured such that different beam diameters are settable. At least one illumination lens is positioned in the illumination beam path for directing a collimated beam at least onto a field of view on a surface of the object, wherein a value of an angle of incidence of the illumination optical axis of the illumination beam path equals a value of an angle of reflectance of the imaging optical axis of the imaging beam path. The invention allows the combination of the functionality of a wide angle coaxial illumination and a collimated coaxial illumination in one illumination system. | 05-05-2016 |
| 20160123893 | Portable three-dimensional metrology with data displayed on the measured surface - A portable instrument for 3D surface metrology projects augmented-reality feedback directly on the measured target surface. The instrument generates structured-light measuring-patterns and projects them successively on a target surface. Features, contours, and textures of the target surface distort each projected measuring-pattern image (MPI) from the original measuring-pattern. The instrument photographs each MPI, extracts measurement data from the detected distortions, and derives a result-image from selected aspects of the measurement data. The instrument warps the result-image to compensate for distortions from the projector or surface and projects the result-image on the measured surface, optionally with other information such as summaries, instrument status, menus, and instructions. The instrument is lightweight and rugged. Accurate measurements with hand-held embodiments are made possible by high measurement speed and an optional built-in inertial measurement unit to correct for pose and motion effects. | 05-05-2016 |
| 20160131597 | An Optical Device for Detecting Quality of Welding Gun Electrodes - An optical device for detecting quality of welding gun electrodes An optical sensor device comprises a housing ( | 05-12-2016 |
| 20160139056 | AUTOMATED LOW COST METHOD FOR ILLUMINATING, EVALUATING, AND QUALIFYING SURFACES AND SURFACE COATINGS - Systems and methods for inspecting a surface are disclosed. A source, detector, a base, a controller, and a processing device are used to collect image data related to the surface and information relating to the location of the image data on the surface. The image data and information relating to location are correlated and stored in a processing device to create a map of surface condition. | 05-19-2016 |
| 20160139060 | Surface Feature Manager - Provided herein is an apparatus, including a mapping means for generating a map of locations of surface features of an article based on photon-detector signals corresponding to photons scattered from the surface features of the article, and a surface feature manager. The surface manager is configured to locate a predetermined surface feature of the surface features of the article based, at least in part, on the map of the surface features locations, irradiate photons of a first power onto the location of the predetermined surface feature to analyze the predetermined surface feature, and irradiate photons of a second power onto the location of the predetermined surface feature to remove the predetermined surface feature. | 05-19-2016 |
| 20160169802 | CLASSIFICATION OF SURFACE FEATURES USING FLUORESENCE | 06-16-2016 |
| 20160169815 | Passivation of Nonlinear Optical Crystals | 06-16-2016 |
| 20160187261 | Methods for Enhanced Grading of Mint Quality Coins - Grade enhancement of mint grade and proof-like coins is disclosed based on a determination of an indication that the coin was a “first strike” coin. First strike is defined by the first 10% or less of coins struck by the same die and may be determined by the location of a physical attribute of the coin present in at most 10% of similar coins struck by the same die. First strike in proof-like coins may be determined by frosted white cameo. | 06-30-2016 |
| 20160195477 | MAINTENANCE DEVICE, MAINTENANCE SYSTEM, AND METHODS FOR EXAMINING AN INSPECTION TARGET | 07-07-2016 |
| 20160377555 | SYSTEMS AND METHODS FOR AUTOMATICALLY INSPECTING WIRE SEGMENTS - A wire inspection system is provided. The wire inspection system includes a mirror assembly including an odd number of sides arranged to form a pyramid structure configured to surround a wire segment, wherein a plurality of the sides include a mirror, a light source configured to illuminate the wire segment, and at least one camera configured to acquire a plurality of images of the wire segment that are reflected by the plurality of mirrors, wherein each image of the plurality of images shows a different side of the wire segment. | 12-29-2016 |
| 20160377556 | METHOD AND APPARATUS FOR CONTROLLING TYRES IN A TYRE PRODUCTION LINE - A method, and related apparatus, for controlling tyres in a production line, includes: predisposing a tyre to be controlled; elastically deforming a lateral wall portion of the tyre by imparting a compression force on an outer contact surface of the lateral wall portion, the compression force having axial direction and sense directed toward the middle line plane; illuminating an inner and/or outer surface of the lateral wall portion and detecting an image of the illuminated surface; generating a control signal representative of the detected image; and analysing the control signal in order to detect the possible presence of flaws on the lateral wall portion. | 12-29-2016 |
| 20190145903 | ASSEMBLY JOINT INSPECTION SYSTEMS AND METHODS | 05-16-2019 |
| 20220136977 | Electronic Device Valuation System - An electronic device valuation system is disclosed. One embodiment comprises: a display; a main body on which an electronic device is placed; a camera for capturing the electronic device by using lighting; and a controller displaying, on the display, the value of the electronic device determined on the basis of visual inspection results of the electronic device and performance inspection results of the electronic device. The visual inspection results are on the basis of an image of the electronic device captured by the camera. In addition, the lighting outputs light, but a portion of the lighting outputs light of different wavelengths so as not to offset the diffuse reflection of visual defects of the electronic device. | 05-05-2022 |
