| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 356616000 | Having scale or grid | 41 |
| 20080285058 | OPTICAL POSITION-MEASURING DEVICE - An optical position-measuring device is arranged for recording the relative position of a scanning unit and a scale movable to it in at least one measuring direction. The scale is configured as a combined unit which includes at least one reflector element as well as a measuring graduation. A light source and one or more detector elements are assigned to the scanning unit. The scanning unit includes splitting device(s) which split the beam of rays, emitted by the light source, into at least two partial beams of rays in the measuring direction, which after being split, propagate in the direction of the scale. | 11-20-2008 |
| 20080291470 | SYSTEM ARCHITECTURE FOR SENSING AN ABSOLUTE POSITION USING A TARGET PATTERN - A location system and a location system on a chip (LCoS) and method are described. | 11-27-2008 |
| 20080309950 | Calibrating A Lithographic Apparatus - The X, Y and Rz positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be coplanar with the pattern on the mask itself. Measurements of the table position in the other degrees of freedom can be measured with capacitive or optical height sensors. | 12-18-2008 |
| 20090033948 | Method of Measuring Shot Shape and Mask - A method of measuring shot shape includes sequentially exposing a substrate with main scale marks ( | 02-05-2009 |
| 20090051935 | Automatic Geometric Calibration Using Laser Scanning Reflectometry - Systems and methods for calibrating a solid-imaging system ( | 02-26-2009 |
| 20090097041 | Method for determining the centrality of masks - A method for determining the centrality of masks is disclosed. The mask is positioned in a coordinate measuring device on a measurement table displaceable in a direction perpendicular to the optical axis of an imaging measurement system in an interferometrically measurable way. The position of a mask coordinate system with respect to the measuring device coordinate system is determined based on at lest two structures on the mask. The relative distance from one of the at least first and second outer edges to the at least two structures is determined. The coordinate measuring machine determines the actual coordinates of the at least two structures with respect to the respective outer edges, which must not exceed a predetermined deviation from a desired value. | 04-16-2009 |
| 20090122323 | Scanning unit of an optical position measuring arrangement and position measuring arrangement having this scanning unit - A scanning unit, by which a scale, which is movable in relation to the scanning unit in a measuring direction, can be optically scanned. The scanning unit including a detector arrangement and a transparent support having a first surface and a second surface, wherein the detector arrangement is arranged on the second surface. The scanning unit further including a transparent cover plate, which is fastened on the first surface of the transparent support and includes a shielding device for shielding the detector arrangement against electromagnetic fields. | 05-14-2009 |
| 20090135435 | REFERENCE SIGNAL GENERATING CONFIGURATION FOR AN INTERFEROMETRIC MINIATURE GRATING ENCODER READHEAD USING FIBER OPTIC RECEIVER CHANNELS - A reference mark configuration for an interferometric miniature grating encoder readhead using fiber optic receiver channels is provided. The readhead includes “primary” fibers that provide reference mark primary signals processed to generate a reference signal with accuracy of approximately 0.2 microns. The readhead may include “secondary” fibers used to generate reference mark secondary signals processed to generate a reference signal with accuracy of approximately 20 nanometers. Spatial filter masks configured for the secondary fiber optic receiver channels provide two spatially periodic secondary signals arising from interference fringes outside of the receiving area of the primary fiber optic receiver channels. The secondary signals are out of phase with one another and their spatial frequency is higher than that of the primary signals. A signal crossing of the reference mark secondary signals is identified that is spatially adjacent to a signal crossing of the reference mark primary reference signals. | 05-28-2009 |
| 20090135436 | Optical position measuring arrangement - A position measuring arrangement including a scale connected with a first object, wherein the scale includes a reference marking and a plurality of graduated areas, which are arranged a periodically in the measuring direction and have different optical properties. Respective additional structures are arranged in the measuring direction adjacent to the reference marking, which extend in the measuring direction and minimize secondary maxima in the reference pulse signal, wherein the additional structures includes at least two tracks having a first optical property, between which a graduated area having a second optical property and extending in the measuring direction is arranged. The position measuring arrangement further includes a scanning unit movable in relation to the scale in the measuring direction and is connected with a second object, the scanning unit includes individual detector elements, whose geometric arrangement is matched to the reference marking for generating the reference pulse signal. | 05-28-2009 |
| 20090201513 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - An x linear encoder, which is configured of a pickup placed on a measurement mount and facing an x scale fixed on the lower surface of a barrel that houses a projection optical system, measures the displacement of the barrel with the measurement mount serving as a reference. With the configuration of the x linear encoder, a path of a measurement light that propagates back and forth between the pickup and the scale is significantly shortened, compared with the case of using an interferometer. | 08-13-2009 |
| 20100039656 | METHOD FOR DETERMINING AN INFLUENCING VARIABLE ACTING ON THE ECCENTRICITY IN A GONIOMETER - The invention relates to a method for determining at least one influencing variable acting on the eccentricity in a goniometer, using a detector arrangement consisting of four optical detector elements, and a rotational body comprising a plurality of pattern elements arranged around a pattern center, the rotational body being rotatably arranged about an axis. According to said method, at least some of the pattern elements are reproduced on the detector arrangement, the positions of the pattern elements reproduced on the detector arrangement are resolved, and the eccentricity of the pattern center in relation to a detector center of the detector arrangement is determined. A plurality of such eccentricity measurements for different rotational positions enables different influencing variables acting on the current eccentricity to be separated, especially by forming units. | 02-18-2010 |
| 20100188668 | TOTAL INTERNAL REFLECTION DISPLACEMENT SCALE - Methods and systems for determining the displacement of a substrate using a scale comprising TIR scale features are described. A scale that includes a number of total internal reflection (TIR) prisms as scale elements is disposed on the substrate. Light directed towards the scale is modulated by the TIR prisms. A signal indicating a displacement of the substrate is generated based on the modulated light. The signal | 07-29-2010 |
| 20100188669 | LASER BEAM CENTERING AND POINTING SYSTEM - An optical instrument aligns an optical beam without the need for physical intervention of the instrument within the apparatus or platforms from which the trajectory of the beam to be ascertained. The alignment apparatus and method enable the desired function to be realized without the placement of physical apertures or sensors directly in the path of the beam through the system whose spatial position and slope is to be sought. An image plane provides the observer with a pair of well-defined images that are indicative of the beam centering and pointing alignment parameters. The optical alignment can be realized without the need for referencing to an external or fixed set of coordinates or fiducials. The instrument can therefore service situations where adverse environments would otherwise prohibit the use of such instruments, including regions of high radiation, high temperature, vacuum and/or cryogenic atmospheres. | 07-29-2010 |
| 20100195118 | SCALE, DISPLACEMENT DETECTION APPARATUS PROVIDED WITH THE SAME, AND IMAGING APPARATUS PROVIDED WITH THE SAME - A scale for a displacement detection apparatus includes a base, and reflection layers formed on the base in a lattice structure, wherein the scale is used as a member displaceable relative to a light-emitting element whose emission wavelength is approximately 1000 nm or less and a light-receiving element receiving the light that is emitted from the light-emitting element and is reflected by the reflection layers, and wherein the base is made of silicon. | 08-05-2010 |
| 20100225930 | BEAM IRRADIATION DEVICE AND POSITION DETECTING DEVICE - In a beam irradiation device, laser light emitted from a laser light source is entered into a mirror. An actuator pivotally moves the mirror into which laser light is entered, whereby a targeted area is scanned with the laser light. Servo light emitted from a semiconductor laser is entered into a hologram element. The hologram element is pivotally moved with the pivotal movement of the mirror. A diffraction pattern is formed on an exit surface of the hologram element. A photodetector receives servo light transmitted through the hologram element to output a signal depending on a light receiving position of the servo light. The scan width of servo light on the photodetector is increased by a diffraction function of the hologram element. | 09-09-2010 |
| 20100328681 | DISPLACEMENT ENCODER INCLUDING PHOSPHOR ILLUMINATION SOURCE - A position sensing optical encoder includes an illumination source that operates by providing primary radiation having a first level of intensity uniformity to saturate at least a portion of a relatively broad phosphor area including uniformly distributed phosphor. The phosphor area absorbs the primary radiation and emits phosphor radiation to illuminate the encoder scale pattern. The scale pattern spatially modulates the phosphor light, and the spatially modulated pattern of phosphor light is sensed by a photodetector arrangement. Due at least partially to saturation of the phosphor, the phosphor light has a second level of phosphor light intensity uniformity that is more uniform than the first level of primary light intensity uniformity, which enhances the encoder accuracy. The uniform phosphor illumination intensity is economically provided over a broad area with few components and minimized optical path length, particularly for path length perpendicular to the scale. | 12-30-2010 |
| 20110273725 | OPTICAL ENCODER HAVING CONTAMINATION AND DEFECT RESISTANT SIGNAL PROCESSING - An encoder configuration comprises an illumination portion, a scale comprising a scale track, and a signal processing electronics. The signal processing electronics may include a detector comprising a first set of three detector sub-portions that provide a first set of signals comprising three respective sub-portion signal subsets that have nominally the same signal characteristics when the scale track is not contaminated or defective. The processing electronics analyze the first set of signals and identify a least-similar sub-portion signal subset that has a corresponding signal characteristic value that is least similar to comparable signal characteristic values associated with more-similar sub-portion signal subsets of the first set of signals. Position measurements are based on valid signals including a plurality of the more-similar sub-portion signal subsets and not including the least-similar sub-portion signal subset if it is significantly different. Accurate measurement may be provided despite significant scale contamination or defects. | 11-10-2011 |
| 20120008150 | Autofocus system and method - New and useful concepts for an autofocus system and method are provided. A basic concept uses fringe projection in an autofocus system and method. A further aspect provides spatial filtering concepts for the fringe projection concept. In yet another aspect, the fringe projection autofocus system and method is provided with temporal phase shifting using no moving parts. In a still further aspect, the fringe projection autofocus system and method is provided with unambiguous height measurement concepts. | 01-12-2012 |
| 20120019837 | POSITION DETECTING DEVICE, LIQUID EJECTING APPARATUS AND METHOD OF DETECTING SMEAR OF SCALE - A position detecting device for detecting a position of an object, includes a light emitting portion that emits light, a light receiving portion that receives the light from the light emitting portion, and a scale that is arranged between the light emitting portion and the light receiving portion, and includes a position detecting pattern and a smear detecting pattern. The position detecting pattern has a first light transmitting portion for transmitting the light from the light emitting portion and a first light interception portion for intercepting the light from the light emitting portion which are alternately arranged in a detection range of the object. The smear detecting pattern for detecting smear of the scale has a second light transmitting portion for transmitting the light from the light emitting portion and a second light interception portion for intercepting the light from the light emitting portion which are alternately arranged. | 01-26-2012 |
| 20120038936 | Measurement System Using Alignment Unit And Position Measuring Method - In one example embodiment, position of the alignment unit is acquired using a fiducial mark formed on a moving table, and the moving table is moved such that an alignment mark formed on the workpiece is located within a field of view of the alignment unit to measure the position of the alignment mark. Subsequently, the position and posture of the workpiece are accurately measured based on the position of the alignment unit and the position of the alignment mark measured by the alignment unit. | 02-16-2012 |
| 20120140246 | MEASUREMENT DEVICE AND METHOD - A measurement device for determining an installation position for a fire sprinkler head is provided. The measurement device includes a body adapted for positioning across and proximate to the center of a tile grid cell. The measurement device also includes a light source mounted to the body. The light source is adapted to project a beam of light onto a surface positioned above the tile grid cell. When the measurement device is positioned across the tile grid cell, the light source is proximate to the center of the tile grid cell. | 06-07-2012 |
| 20120176629 | REMOTE DISPLACEMENT SENSOR, INCLUDING AN OPTICAL STRAIN GAUGE, AN ASSEMBLY AND SYSTEM THEREWITH - The disclosure relates to a remote displacement sensor, such as an optical strain gauge, which uses an optical amplifier implemented by patterns, such as, but not limited to, moiré patterns, to calculate changes in position or gauge length. In the embodiment implemented as a strain gauge with moiré patterns, two foil layers are provided, a lower foil layer with a reference or static moiré pattern generated by the overlaying of a first pattern with parallel lines at a first fundamental frequency and a second pattern with parallel lines at a second fundamental frequency. The lower foil layer further includes a first section with a first pattern with parallel lines at the first fundamental frequency while the upper layer provides a second section with a second pattern with parallel lines at the second fundamental frequency. The overlaying of the foils causes an overlying of the first and second sections thereby causing a moiré pattern of the same wavelength as the reference pattern. However, relative movement of the two foils perpendicular to the parallel lines, in response to a movement in the gauge length in response to strain on the specimen, causes a phase change in the overlaid pattern which is greater than the relative movement. The image of the optical strain gauge is captured by a camera or other optical device and the resulting image is processed by a Fast Fourier Transform or similar algorithm to determine the phase change, thereby calculating the change in gauge length and therefore the resulting strain. | 07-12-2012 |
| 20120262731 | ENCODER - An encoder includes a scale, a detector array that includes a plurality of detectors, and a signal processor configured to process and convert into positional information, an output signal from the detector array. The signal processor includes a first phase acquirer, a second phase acquirer, and a positional information acquirer configured to acquire Sv as a position signal that represents a position of the scale. Sv satisfies Sv=A·Φ | 10-18-2012 |
| 20120274948 | ABSOLUTE POSITION ENCODER - In an absolute position encoder, a multi-spectral light source illuminates a position on a topographic surface at an angle of incidence determined from a vector normal to the surface. A target on, and positionally-registered to, the topographic surface comprises a variable grating that diffracts the incident light to form a multi-spectral diffraction pattern in which the angular dispersion of the diffraction pattern varies with the absolute position of the incident light along the grating. A chromatically responsive sensor detects a narrow band of the diffraction pattern through an entrance aperture positioned at an angle of detection determined from the vector normal to the topographic surface and outputs a signal responsive to the change in the angular dispersion of the detected narrow band of the diffraction pattern. The source/sensor unit maintains (within an acceptable noise tolerance) its geometric relationship to the vector normal to the topographic surface at the position of illumination. A processing element uses a system transfer function to map the detected signal to an absolute-position on the topographic surface. | 11-01-2012 |
| 20130016363 | POSITION DETECTING SENSOR AND POSITION DETECTORAANM Iwamoto; NaohisaAACI SaitamaAACO JPAAGP Iwamoto; Naohisa Saitama JP - A position detecting sensor includes a grid structure composed of plural electrodes extending in a first direction and plural electrodes extending in a second direction perpendicular to the first direction. The electrodes have light permeability. In a rectangular area defined by four cross-points, where two adjacent electrodes extending in the first direction and two adjacent electrodes extending in the second direction cross each other, a dummy pattern is disposed so as to provide uniform optical characteristics for the sensor. At least some of the electrodes extending in the first direction are shaped to include inclinations relative to the first direction, so as to minimize the Moire effect that may develop between the electrodes and an array of pixels in an overlaid display device. Also, at least some of the electrodes extending in the first direction are shaped to be line-symmetric about a straight line extending in the first direction. | 01-17-2013 |
| 20130155419 | LOCATING AND RELOCATING DEVICE - A relocating device for locating and relocating a first object relative to a second object is for use in association with a means for defining a location point on the second object. The relocating device includes at least one light source, a power source. The at least one light source is producing at least two beams of light wherein each beam of light is capable of defining a beam location point on the second object. The at least one light source is operably connected to the first object. The power is source operably connected to the at least one light source. The means for defining a location point on the second object defines each beam location point on the second object. | 06-20-2013 |
| 20130208287 | System Having a Plurality of Scanning Units of a Position Measuring Device - In a system for detecting the position of an object in relation to a reference system, the object is arranged so as to be movable in relation to the reference system along at least two orthogonal first and second main movement axes. To record the position of the object in relation to the reference system, a position measuring device includes at least two two-dimensional measuring standards situated along the first main movement axis, and four scanning units for an optical scanning of these measuring standards. In addition, at least four additional supplementary scanning units are provided, which are situated between the four scanning units along the first main movement axis. | 08-15-2013 |
| 20130258353 | METHOD AND DEVICE FOR CALIBRATING AN OPTICAL SYSTEM, DISTANCE DETERMINING DEVICE, AND OPTICAL SYSTEM - A method and device for calibrating a distance determining device for determining a distance between an optical system and an object. The method includes providing a detecting system having marking elements and a measuring camera. Using the distance determining device, a light structure is projected onto a carrier that provides a calibration pattern. The measuring camera detects the marking elements or the calibration pattern to determine the spatial position of the optical system. Coordinates of a calibration pattern in a coordinate system associated with the measuring camera are determined. An image of the calibration pattern and the light structure is created using a camera of the optical system. Coordinates of an image of a calibration pattern and the light structure in a coordinate system associated with the camera image plane are determined. The distance determining device is calibrated using the determined coordinates and the determined spatial position of the optical system. | 10-03-2013 |
| 20130278941 | AUTOMATIC CALIBRATION OF A MICROSCOPE SCANNING SYSTEM - The invention provides a method for automatic calibration of slides and a method for automatic calibration of slide frames and a slide for performing the method. To this end, slide frames ( | 10-24-2013 |
| 20130293900 | METHODS AND DEVICES FOR REDUCING ERRORS IN GOOS-HANCHEN CORRECTIONS OF DISPLACEMENT DATA - An exemplary method involves, in a system comprising a tool that performs a task on a workpiece, a method for determining displacement of the workpiece relative to the tool. Respective displacements of loci of at least a region of the workpiece are mapped using a Goos-Hänchen-insensitive (GH-insensitive) displacement sensor to produce a first set of physical displacement data for the region. Also mapped are respective displacements, from the tool, of the loci using a GH sensitive sensor to produce a second set of optical displacement data for the region. Goodness of fit (GOF) is determined of the second set of data with the first set. According to the GOF, respective GH-correction (GHC) coefficients are determined for at least one locus of the region. When measuring displacement of the at least one locus in the region relative to the tool, the respective GHC coefficient is applied to the measured displacement to reduce an error that otherwise would be present in the measured displacement due to a GH effect. | 11-07-2013 |
| 20140022562 | METHOD AND DEVICE FOR DETECTING THE POSITION OF A CONVEYOR - A method for detecting the position of a conveyor, comprising the steps of: providing on the conveyor belt an irregular marking, constituted by marks and the like that are detectable optically; by means of a vision device, detecting portions of the marking at preset time intervals; comparing a detection performed by the vision device with a previously performed detection, in order to determine the extent and direction of the movement. | 01-23-2014 |
| 20140132964 | OPTICAL POSITION MEASURING INSTRUMENT - An optical position measuring instrument including a first scale having a first graduation, wherein the first scale is disposed movable in a first measuring direction, and at a first defined position in the first measuring direction, the first scale includes a spatially limited first marking that differs from the first graduation. The optical position measuring instrument further including a second scale having a second graduation, wherein the second scale is disposed movable in a second measuring direction, and at a second defined position, the second scale includes a second reference marking that is usable for generating at least one reference signal at a reference position of the second scale only if the first scale is located in the first defined position. | 05-15-2014 |
| 20140146326 | OPTICAL POSITION-MEASURING DEVICE - An optical position-measuring device includes a measuring standard having a first grating in a form of a periodic incremental graduation and an absolute mark. A scanning unit is displaceable relative to the measuring standard in a measuring direction. The scanning unit has at least one second grating disposed at a scanning distance from the first grating. A first detector array is configured to obtain a first scanning signal for purposes of position determination in which the gratings are illuminated with light of a first wavelength. A second detector array is configured to obtain a second scanning signal for purposes of position determination in which the absolute mark is illuminated with light of a second wavelength. The first wavelength is shorter than the second wavelength. | 05-29-2014 |
| 20150098094 | MEASURING GRADUATION AND PHOTOELECTRIC POSITION MEASURING DEVICE HAVING THE SAME - A measuring graduation includes a phase grating for a photoelectric position measuring device for measuring positions in a first direction and in a second direction extending orthogonally to the first direction. The phase grating has a periodic array of grating elements in the first direction and in the second direction. The grating elements each have an outer contour that is formed by a continuous line which includes two mutually opposing first straight edges, two mutually opposing second straight edges extending perpendicularly to the first straight edges, and connecting lines extending between the first straight edges and the second straight edges. The connecting lines form an obtuse angle with the first straight edges and with the second straight edges. | 04-09-2015 |
| 356617000 | Coded scale | 6 |
| 20090027692 | REFERENCE SIGNAL GENERATING CONFIGURATION FOR AN INTERFEROMETRIC MINIATURE GRATING ENCODER READHEAD USING FIBER OPTIC RECEIVER CHANNELS - A fiber optic readhead and scale arrangement for measuring displacement provides a reference position indication. The scale includes a scale track comprising a first type of track portion providing first level of zero order reflectance, such as a grating, and a reference mark providing a second level of zero order reflectance, such as a mirror. The reference mark is configured with certain length or boundary spacing dimensions determined based on certain fiber optic receiver channel aperture dimensions in the readhead. | 01-29-2009 |
| 20090079996 | Position measuring arrangement - A method for absolute position measuring that includes scanning a code having code elements arranged one behind the other in a measuring direction, wherein the code elements include sequential first and second code elements which define a code word containing absolute position information. The method including generating scanning signals within the first code elements and the second code elements. The method further including forming information regarding the sequential first and second code elements from the scanning signals via a reference value and determining the reference value as a function of at least one of the scanning signals within the first code elements and the scanning signals within the second code elements. | 03-26-2009 |
| 20090161121 | POSITION-MEASURING DEVICE AND METHOD FOR DETERMINING ABSOLUTE POSITION - A position-measuring device includes a code and a scanning unit. The code includes a sequence of code elements arranged one after the other in a measuring direction, at least two successive code elements in each case forming one code word having position information. The scanning unit includes a lighting unit for emitting directed light in the direction of the code for imaging at least the code elements forming code word onto a detector unit, the detector unit having in measuring direction at least two detector elements per code element forming code word, as well as an evaluation unit in which the code word having the instantaneous position information is ascertainable from the detector signals of the detector elements. The scanning unit and the code are arranged in a manner allowing movement relative to each other in measuring direction. The detector signals to be evaluated for forming the code word are selectable in the evaluation unit as a function of the imaging of the code elements forming code word onto the detector unit. | 06-25-2009 |
| 20110242548 | OPTOELECTRONIC POSITION MEASUREMENT DEVICE AND POSITION MEASUREMENT METHOD - Optoelectronic position measurement device comprises a code carrier, a radiation source and a detection unit. The code carrier can be moved relative to said sensor unit by one degree of freedom. A refractive optical element having a focusing segment and at least one neighboring segment are arranged between the code carrier and the first sensor unit. Optical radiation shining in on the focusing segment parallel or at an angle of incidence below a threshold angle α to the optical axis of the focusing segment can be guided by the focusing segment on the receiving region of the first sensor unit within the optical axis, and radiation that is shining into a deflection angle region above the threshold angle α to the optical axis of the focusing segment can be deflected by the focusing segment and the neighboring segment to a point outside of the optical axis of the focusing segment. | 10-06-2011 |
| 20130155420 | POSITION MEASURING DEVICE - A position measuring apparatus with
| 06-20-2013 |
| 20170233096 | POSITION SENSOR SYSTEM FOR A LANDING GEAR ASSEMBLY AND METHOD OF MONITORING | 08-17-2017 |
| 356618000 | Moire | 1 |
| 20110141489 | MARK POSITION DETECTOR, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD - A detector for detecting a position of a mark comprises: an image sensing device; an optical system which projects the mark onto an image sensing surface of the image sensing device; a pattern located in a position between the image sensing surface and an optical element located closest to a plane on which the mark is to be located, among optical elements forming the optical system, the position being optically conjugated with the plane; and a processor which calculates a position of the mark with respect to one of a position of the pattern and a position already known from the position of the pattern, based on a moire pattern formed on the image sensing surface by the mark and the pattern. | 06-16-2011 |
