| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 355018000 |
PROJECTION PRINTING AND COPYING CAMERAS
| 4083 |
| 355002000 |
HOLOGRAM, SEISMOGRAM, GRAPH OR SCALE COPYING
| 10 |
| 355078000 |
CONTACT PRINTING | 3 |
| 20090059200 | METHODS AND APPARATUS FOR MANUFACTURING DISPLAY MEDIUM, AND DISPLAY MEDIUM - A manufacturing apparatus for manufacturing a display medium, the manufacturing apparatus including an image data storing unit that stores image data for text or image to be displayed on the display medium; an electrode pattern generating unit that generates an electrode pattern based on the image data stored in the image data storing unit so that when the text or image is configured of a plurality of independent regions, the electrode pattern has a plurality of integrally and electrically connected electrodes corresponding to a plurality of regions; an electrode forming unit that forms the first electrode on either an electrophoretic medium integrally configured of the second substrate, the second electrode, and the electrophoretic layer or the first substrate based on the electrode pattern generated by the electrode pattern generating unit; and a bonding unit that bonds the electrophoretic medium to the first substrate after the electrode forming unit has formed the first electrode. | 03-05-2009 |
| 20120162629 | LARGE AREA NANOPATTERNING METHOD AND APPARATUS - Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cylinder. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the substrate is in contact or close proximity with the substrate. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cylinder surface comprises metal nano holes or nanoparticles. | 06-28-2012 |
| 20130314687 | TRANSVERSE ELECTRIC-FIELD TYPE LIQUID CRYSTAL DISPLAY DEVICE, PROCESS OF MANUFACTURING THE SAME, AND SCAN-EXPOSING DEVICE - A process of manufacturing a liquid crystal display device of transverse electric-field type, wherein a halftone photomask which is used to form a photoresist pattern has a fully light-shielding area preventing UV irradiation of a portion of an active matrix substrate in which a thin-film transistor element is to be formed, so that the photoresist pattern includes a positive resist portion which has a first thickness and which is formed on the above-indicated portion of the substrate. The halftone mask further has a fully light-transmitting area which permits fully UV transmission therethrough to provide the photoresist pattern with a resist-free area which corresponds to a portion of the substrate in which a contact hole serving as a third connection portion connecting an external scanning-line driver circuit and a scanning-line terminal portion through a junction electrode is to be formed. The photoresist pattern also has a positive resist portion which is formed in the other portion of the substrate and which has a second thickness smaller than the first thickness. Also disclosed in a scan-exposing device used in the process is also disclosed. | 11-28-2013 |
| 355001000 |
INCLUDING FIBER OPTICS | 1 |
| 20090207387 | FIBER OPTIC IMAGING APPARATUS - A fiber optic imaging apparatus includes a light source ( | 08-20-2009 |
