| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 355070000 | Plural lamps | 23 |
| 20080218724 | ILLUMINATION UNIT, IMAGE READ APPARATUS, IMAGE FORMATION APPARATUS - An illumination unit for use in an image read apparatus is provided which illuminates a surface of an original document with illumination light, reads an image of the original document by a light receiving element, and adjusts an amount of specular light reflection from the surface of the original document on a light receiving plane of the light receiving element by adjusting at least one of an incident angle of the illumination light and a divergence thereof. It includes a plurality of light source units emitting the illumination light and arranged in a direction so that a direction in which intensity of light emitted from at least one of the light source units closest to a center of the arrangement thereof is to be highest makes a non-perpendicular angle with the direction of arrangement. | 09-11-2008 |
| 20080239272 | Reduced lens heating methods, apparatus, and systems - In one embodiment, a system is disclosed that includes an illuminator having a source that produces light waves having a first wavelength, and a mask. The mask includes at least one partly opaque area and at least one opening within the opaque area includes a slanted, sub-resolution feature that redistributes a portion of the light passing through the open area to an off-axis location. A method of forming a device by way of photolithography might include forming unresolvable features on a mask and projecting light through the mask. Other systems, methods, and apparatus are disclosed. | 10-02-2008 |
| 20080309906 | Illumination of a Patterning Device Based on Interference for Use in a Maskless Lithography System - A lithographic apparatus in which beams of radiation are projected onto an array of individually controllable elements, such that the beams interfere. Radiation that is further modulated by the array of individually controllable elements is projected onto a substrate. | 12-18-2008 |
| 20090021718 | Method, Computer Program, Apparatus and System Providing Printing for an Illumination Mask for Three-Dimensional Images - A method able to provide illumination source parameters for illumination of a lithographic mask in order to project a three-dimensional image into a resist system. Source intensities of incident beams are determined using a near linear program and responsive to an allowed range of variation. Computer program, apparatus and system are detailed and variations are described. | 01-22-2009 |
| 20090219501 | OPTICAL UNIT USING OPTICAL ATTENUATOR AND PRINTING APPARATUS PROVIDED THEREWITH - An optical unit for a printing apparatus, and a printing apparatus that uses the optical unit. The optical unit includes a plurality of light emitting elements, a lens that collects light from the plurality of light emitting elements, and a light filter that is positioned in light paths from the plurality of light emitting elements. The light filter compensates an intensity of the lights which pass through the lens. | 09-03-2009 |
| 20090244510 | PROCESS AND APPARATUS FOR THE PRODUCTION OF COLLIMATED UV RAYS FOR PHOTOLITHOGRAPHIC TRANSFER - The present invention provides an improved process and an apparatus for producing collimated UV radiation for exposing printed circuit boards. The process consists in shortening the optical length of the downstream optics by dividing the UV radiation over many radiation sources, and in distributing the UV radiation uniformly on the substrate by using a scanning slide. | 10-01-2009 |
| 20090257038 | EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE - An exposure apparatus ( | 10-15-2009 |
| 20090257039 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus which exposes a substrate coated with a photoresist to form a latent image to the photoresist, comprises an original holding unit configured to hold an original including a phase-modulation diffraction grating so that an interference pattern is formed on a surface of the substrate by a light beam diffracted by the original, a substrate holding unit configured to hold the substrate, and a light beam dividing optical system configured to divide a light beam to form a plurality of light beams which enter the original, wherein a latent image is formed on the substrate by superposition of a plurality of interference patterns formed on the surface of the substrate, the plurality of interference patterns respectively corresponding to the plurality of light beams which enter the original. | 10-15-2009 |
| 20090257040 | OPTICAL ELEMENT WITH MULTIPLE PRIMARY LIGHT SOURCES - The disclosure relates to an illumination system, such as an illumination system for use in microlithography. The illumination system can include an optical element with multiple primary light sources. The illumination system can illuminate a field in a field plane having a field contour. The illumination system can be configured so that each primary light source illuminates an area in the field plane that is smaller than a size of an area encircled by the field contour. | 10-15-2009 |
| 20090268186 | PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE APPARATUS - A belt-like work ( | 10-29-2009 |
| 20090310113 | SUB-SEGMENTED ALIGNMENT MARK ARRANGEMENT - An alignment mark on a substrate includes a periodic structure of a plurality of first elements and a plurality of second elements. The elements are arranged in an alternating repetitive sequence in a first direction. An overall pitch of the periodic structure is equal to a sum of a width of the first element and a width of the second element in the first direction. Each first element has a first periodic sub-structure with a first sub-pitch and each second element has a second periodic sub-structure with second sub-pitch. An optical property of the first element for interaction with a beam of radiation having a wavelength λ is different from the optical property of the second element. The overall pitch is larger than the wavelength λ, and each of the first and the second sub-pitch is smaller than the wavelength. | 12-17-2009 |
| 20090316131 | EXPOSURE APPARATUS THAT UTILIZES MULTIPLE MASKS - An exposure apparatus ( | 12-24-2009 |
| 20100039634 | EXPOSURE APPARATUS FOR DISPLAY AND EXPOSING METHOD USING THE SAME - Provided is an exposure apparatus, including a plurality of exposure lamps and a luminance changing mechanism disposed between the exposure lamps and an exposure target. The luminance changing mechanism changes the location at which the exposure light generated from the exposure lamps reaches the exposure target by changing the direction in which the exposure light travels. | 02-18-2010 |
| 20100045955 | Particle Detection on an Object Surface - Systems and methods are provided for inspecting an object surface. An illumination source illuminates the object surface. An optic intercepts scattered light from the illuminated object surface and projects a real image of an area of the object surface. A sensor receives the projected real image. A computer system, coupled to the sensor, stores and analyzes the real image. The real image is processed to detect particles located on the object surface. This arrangement is particularly useful for detecting contaminants or defects on a reticle of a lithography device. | 02-25-2010 |
| 20100073660 | SPECTRALLY CONTROLLED HIGH ENERGY DENSITY LIGHT SOURCE PHOTOPOLYMER EXPOSURE SYSTEM - A system for forming printing features ( | 03-25-2010 |
| 20100103397 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DISPLAY PANEL SUBSTRATE - A position of a chuck | 04-29-2010 |
| 20100220306 | SOLID-STATE ARRAY FOR LITHOGRAPHY ILLUMINATION - A method for providing an actinic illumination energizes solid-state light sources in an array, wherein each solid-state light source emits actinic light of a predetermined wavelength, directs the emitted actinic light from the solid state light sources through one or more compound parabolic concentrators, and forms a field conjugate to an objective lens by directing the concentrated actinic light from each compound parabolic concentrator through one or more lens elements in a lens array. Emission of one or more of the solid state light sources is adjusted to obtain a predetermined illumination pupil envelope function. | 09-02-2010 |
| 20100321663 | APPARATUS AND PROCESS FOR EXPOSING A PRINTING FORM HAVING A CYLINDRICAL SUPPORT - The invention pertains to a method and apparatus for exposing a cylindrical print sleeve. The method and apparatus can accommodate exposing various cylindrical print sleeves having different sleeve lengths and/or diameters. The apparatus includes a sleeve support for supporting the cylindrical print sleeve at one end, a plurality of light tubes supported in a longitudinal orientation, and a means for positioning the light tubes along one of a plurality of concentric rails to form a substantially circular wall of light tubes about the print sleeve. | 12-23-2010 |
| 20110090480 | DYNAMIC MASKING METHOD FOR MICRO-TRUSS FOAM FABRICATION - A system for fabricating a radiation-cured structure is provided. The system includes a radiation-sensitive material configured to at least one of initiate, polymerize, crosslink and dissociate with exposure to radiation. At least one radiation source is configured to project a radiation beam toward the radiation-sensitive material. A smart glass device is disposed between the radiation-sensitive material and the at least one radiation source. The smart glass device includes at least one switchable layer selectively operable from an active state to an inactive state. The smart glass device is configured to expose the radiation-sensitive material to a desired exposure pattern when in one of the active state and the inactive state. A method for fabricating the radiation-cured structure is also provided. | 04-21-2011 |
| 20120170014 | Photolithography system using a solid state light source - A photolithography system based on a solid-state light source having LEDs is provided. Solid-state photolithography using the solid state light source can achieve high quality patterns over a wide range of length scales at a fraction of the cost of contact mask aligners. 2D nanoscale and 1D microscale patterns can easily be created over a 60 cm | 07-05-2012 |
| 20120212724 | ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - An illumination optical system comprises plural rod integrators, a combining optical system and a light transmission unit. The rod integrators uniformize light intensity distributions of the light beams. The combining optical system combines the light beams emitted from the rod integrators, so that the light beams are adjacent to each other in cross-sections thereof. The light transmission unit has an entrance plane and an exit plane, divides the light beam combined by the combining optical system into plural light beams on the entrance plane, joins the divided light beams so that a cross-sectional shape of a joined pattern of the light beams on the exit plane is different from a cross-sectional shape of a joined pattern of the light beams on the entrance plane, and transfers each of the light beams from the entrance plane to the exit plane using plural optically coupled light pipes. | 08-23-2012 |
| 20120281195 | Multi-Method and Device with an Advanced Acousto-Optic Deflector (AOD) and a Dense Brush of Flying Spots - The technology disclosed relates to improved acousto-optic deflectors (AODs). In particular, it relates to compensation for subtle effects not previously addressed by AOD designers. A shifting center of gravity is described and addressed using advanced power equalisation strategies. Denser writing brushes are provided by using a two-dimensional array of beams with corrections for factors such as angle of incidence at the AOD interface. | 11-08-2012 |
| 20140333916 | METHOD AND APPARATUS FOR THE FORMATION OF CONDUCTIVE FILMS ON A SUBSTRATE - Provided herein are a method and apparatus for the formation of conductive films on a substrate using precise sintering of a conductive film and thermal management of the substrate during sintering. In particular, a method may include depositing a conductive metal-based ink on a translucent or transparent substrate, positioning a mask between the deposited conductive metal-based ink and a light source, exposing the mask and the underlying deposited conductive metal-based ink to the light source, sintering the conductive metal-based ink exposed to the light source, and cleaning the non-sintered conductive metal-based ink from the translucent or transparent substrate. The mask may be configured to shield at least a portion of the conductive metal-based ink from the light source. The portion of the conductive metal-based ink shielded from the light source may remain non-sintered in response to the sintering of the conductive metal-based ink exposed to the light source. | 11-13-2014 |
