| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 355069000 | Electricity to lamp controlled | 11 |
| 20080218723 | LIGHT AMOUNT CONTROL, OPTICAL WRITING, AND IMAGE FORMING APPARATUSES - A light-amount control apparatus for controlling an output light amount of light sources used for optical writing is disclosed. The apparatus includes one or more drive units for supplying a drive current to the light source; one or more drive-current setting units for determining an amount of the drive current provided to the light source from the drive unit; a light-amount detecting unit for detecting an output light from the light source; and outputting a voltage according to the detected light amount; and a processing unit for setting the drive current amount based on the detected value detected with the light-amount detecting unit. | 09-11-2008 |
| 20080316458 | Light Quantity Adjustment Method, Image Recording Method, and Device - According to test data supplied from a test data memory ( | 12-25-2008 |
| 20090027647 | EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD - The present invention provides an exposure apparatus comprising an illumination optical system configured to illuminate a reticle including a pellicle with light from a light source, a projection optical system configured to project a pattern of the reticle onto a substrate, an obtaining unit configured to obtain information on a thickness of the pellicle, an adjusting unit configured to adjust an illuminance on the substrate, and a control unit configured to control the adjusting unit based on the information on the thickness of the pellicle obtained by the obtaining unit. | 01-29-2009 |
| 20090174876 | OPTICAL APPARATUS AND METHOD FOR MODIFYING THE IMAGING BEHAVIOR OF SUCH APPARATUS - The disclosure relates to an optical apparatus including a light source that emits light in the form of light pulses having a pulse frequency, and including at least one optical element. The disclosure also relates to a projection exposure machine including a pulsed light source and a projection objective, and to a method for modifying the imaging behavior of such an apparatus, such as in a projection exposure machine. | 07-09-2009 |
| 20090251675 | EXPOSURE DEVICE - In an exposure device having tiny light emitting elements aligned, a space required for drive circuits and wires is secured without affecting the size or alignment of the light emitting elements for arrangement and wiring of the drive circuits. In this exposure device, the drive circuits are separately arranged outside the column formed by the multiple organic EL elements, and, the length of the region occupied by the circuit exceeds one pitch in the alignment of the organic EL elements, and, the multiple drive circuits are arranged along the column. | 10-08-2009 |
| 20090284726 | Stray Light Feedback for Dose Control in Semiconductor Lithography Systems - A lithography system with a stray light feedback system is disclosed. The stray light feedback helps control critical dimension (CD) within a stray light specification limit. A stray light dose control factor is calculated as a function of the stray light measured in the exposure tool and the sensitivity of the resist. The stray light dose control factor is used to adjust the exposure dose to achieve the desired CD. The stray light may be monitored, and if a threshold level of stray light is reached or exceeded, the use of the exposure tool may be discontinued for a particular type of semiconductor product, resist, or mask level, until the lens system is cleaned. | 11-19-2009 |
| 20100073659 | EXPOSURE APPARATUS AND IMAGE FORMING APPARATUS - An exposure apparatus has a first board on which a light-emitting element is mounted and a second board on which is mounted a driving IC for causing the light-emitting element to emit light. A second current path is extended from the driving IC, which is mounted on the second board, to the first board. The second current path is arranged so as to be adjacent to a first current path. | 03-25-2010 |
| 20100118287 | DISCHARGE LAMP, CONNECTING CABLE, LIGHT SOURCE APPARATUS, AND EXPOSURE APPARATUS - A light source device having a large cooling action on the base member of a discharge lamp. A connector on the sides of the power supply and the air blower and the base-side connector of a discharge lamp are connected to each other through a connection cable having a power cable in which an air blow pipe is contained. An electric power is supplied from the power supply to a base part through the power cable of the connection cable, the base-side connector and a flow passage bending member. The cool air from the air blower is supplied to the groove part of the base part through the air blow pipe of the connection cable, the base-side connector and an air blow passage in the flow passage-bending member. | 05-13-2010 |
| 20100134776 | HIGH REPETITION PULSE POWER SOURCE AND EXPOSURE DEVICE WITH HIGH REPETITION POWER SOURCE - A pulse power source which can perform high repetition of pulse signals by enhancing the throughput of a pulse source is provided. The pulse power source includes: a charger; an initial-stage capacitor section which is provided with a capacitor charged by the charger; and a magnetic pulse compression circuit which performs magnetic pulse compression of a pulse current generated by discharging a charge from the capacitor at the initial-stage capacitor section and, thereafter, outputs the pulse current. An exposure device which includes the pulse power source is also provided. The pulse power source includes, between the initial-stage capacitor section and the magnetic pulse compression circuit, a transistor which controls timing of discharging a charge from the initial-stage capacitor section, an inductor which constitutes a resonance circuit together with the capacitor at the initial stage capacitor section, and a diode which rectifies the pulse current. The pulse power source further includes a means for preventing the generation of an electric current in the reverse direction in the pulse current. | 06-03-2010 |
| 20100290022 | Enhancing Alignment in Lithographic Apparatus Device Manufacture - In a lithographic apparatus, a scanning mechanism is coarse compared with precise patterns to be exposed onto a substrate. In order to ensure that the image and the substrate are aligned at some point in time, an oscillation is imparted to either the substrate table, or to a device that aligns the image, such as a mask table. The oscillation frequency is chosen to compliment a maximum alignment error. The frequency of a radiation pulse is arranged to coincide with the image and the substrate being most accurately aligned. The radiation pulse of the image may be timed to coincide with the alignment without the use of the imparted oscillation. | 11-18-2010 |
| 20140168624 | EXPOSURE APPARATUS, METHOD OF CONTROLLING THE SAME, AND ALIGNMENT METHOD FOR EXPOSURE - An exposure apparatus capable of preventing a reduction in its accuracy due to, for example, the influence of aging or the influence of heat is disclosed. Also disclosed is a method of controlling the same, and an alignment method for exposure. In one aspect, the exposure apparatus includes a main stage for adjusting a position of a substrate, a beam irradiation unit for irradiating a beam onto a mask, and a beam monitoring unit having a position fixed with respect to the main stage, and for recognizing the beam emitted from the beam irradiation unit and passed through one pattern of the mask. | 06-19-2014 |
