| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 355068000 | Including photocell or phototube | 28 |
| 20080212059 | MICROLITHOGRAPHY ILLUMINATION SYSTEMS, COMPONENTS AND METHODS - The disclosure relates to microlithography systems, such as EUV microlithography illumination systems, as well as related components, systems and methods. | 09-04-2008 |
| 20080212060 | Method for Determining Intensity Distribution in the Image Plane of a Projection Exposure Arrangement - A method for determining intensity distribution in the focal plane of a projection exposure arrangement, in which a large aperture imaging system is emulated and a light from a sample is represented on a local resolution detector by an emulation imaging system. A device for carrying out the method and emulated devices are also described. The invention makes it possible to improve a reproduction quality since the system apodisation is taken into consideration. The inventive method consists in includes determining the integrated amplitude distribution in an output pupil, combining the integrated amplitude distribution with a predetermined apodization correction and calculating a corrected apodization image according to the modified amplitude distribution. | 09-04-2008 |
| 20080252872 | METHOD OF EVALUATING OPTICAL BEAM SOURCE OF EXPOSURE DEVICE, METHOD OF DESIGNING ILLUMINATION SHAPE OF EXPOSURE DEVICE, AND SOFTWARE FOR OPTIMIZING ILLUMINATION SHAPE OF EXPOSURE DEVICE - A method of evaluating an exposure optical beam source of an exposure device used in an exposure process in manufacturing a semiconductor device is disclosed, in which the method includes dividing an exposure optical beam source into a plurality of unit optical beam sources in a unit size determined by an exposure device, acquiring a difference between an evaluation amount of a target pattern on a semiconductor substrate when a unit optical beam source is turned on and an evaluation amount of the target pattern on the semiconductor substrate when the unit optical beam source is turned off, and evaluating the exposure optical beam source by using the acquired difference as an index. | 10-16-2008 |
| 20080273188 | Device arranged to measure a quantity relating to radiation and lithographic apparatus - A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation emitted by the source, past the screen, to the sensor. | 11-06-2008 |
| 20080291420 | METHOD AND DEVICE FOR IMAGE MEASUREMENT, EXPOSURE APPARATUS, SUBSTRATE FOR IMAGE MEASUREMENT, AND DEVICE MANUFACTURING METHOD - An image measurement method is provided for measuring an image of a pattern of a mask projected with a projection optical system. The method includes the steps of detecting light transmitted through an aperture while a substrate is arranged at an image plane of the projection optical system, the substrate having a slit and the aperture having a width larger than a width of the slit; adjusting an alignment angle of the slit on the basis of a signal related to the light detected in the detecting; and measuring the image by detecting light transmitted through the slit while moving the slit, the alignment angle of which has been adjusted in the adjusting, in the image plane of the projection optical system. | 11-27-2008 |
| 20080291421 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE FABRICATION METHOD - The present invention provides an exposure apparatus which exposes a substrate via a liquid, comprising a measurement substrate includes a transmission part configured to transmit a light beam having passed through a projection optical system, a light-receiving unit including a light-receiving surface configured to receive the light beam transmitted through the liquid and the transmission part, and a calculator configured to arithmetically convert a light intensity distribution, on the light-receiving surface, of the light beam received by the light-receiving surface into a light intensity distribution on a pupil plane of the projection optical system, based on information indicating a correlation between a position coordinate on the light-receiving surface and a position coordinate on the pupil of the projection optical system. | 11-27-2008 |
| 20080316457 | METHOD AND APPARATUS FOR QUANTIFICATION OF ILLUMINATION NON-UNIFORMITY IN THE MASK PLANE OF A LITHOGRAPHIC EXPOSURE SYSTEM - This disclosure relates to lithography using pulsed laser illumination. In particular it relates to lithography for producing electronic devices on wafers using multi-mode excimer and molecular lasers, e.g. KrF, ArF, and F2 lasers. It may also apply to illumination systems where several single-mode sources are mixed or one single-mode laser beam is split and recombined with time delays, thereby creating an equivalent multimode source and to EUV lithography. Particular aspects of the present invention are described in the claims, specification and drawings. | 12-25-2008 |
| 20090015813 | EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD - The present invention provides an exposure apparatus comprising a projection optical system configured to project a pattern of a reticle onto a substrate, and a position detection apparatus configured to detect at least one of a position of the reticle and a position of the substrate. | 01-15-2009 |
| 20090015814 | DETECTOR FOR REGISTERING A LIGHT INTENSITY, AND ILLUMINATION SYSTEM EQUIPPED WITH THE DETECTOR - The invention concerns a device for the detection of radiation with a wavelength λ<100 nm, preferably EUV radiation in a range of wavelengths 5 nm<λ | 01-15-2009 |
| 20090015815 | EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD - The present invention provides an exposure apparatus comprising a projection optical system configured to project a pattern of a reticle onto a substrate, a stage configured to move the substrate; and a sensor unit which is arranged on the stage and configured to receive light having passed through the projection optical system, the sensor unit including an aperture plate which is configured to be used in measuring different optical performances, and on which a plurality of aperture patterns with different shapes or different sizes are formed, and a photoelectric conversion device configured to photoelectrically convert the light beams from the plurality of aperture patterns. | 01-15-2009 |
| 20090021717 | Radiation Detector, Method of Manufacturing a Radiation Detector, and Lithographic Apparatus Comprising a Radiation Detector - A radiation detector, a method of manufacturing a radiation detector, and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation sensitive surface. The radiation sensitive surface is sensitive to radiation wavelengths between 10-200 nm and charged particles. The radiation detector has a silicon substrate, a dopant layer, a first electrode, and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the silicon substrate. | 01-22-2009 |
| 20090051891 | Lithographic Apparatus and Device Manufacturing Method - A system and method use a substrate with a pattern of individual, indiscrete alignment marks, i.e., the marks are separate and distinct from each other, and each mark is not divided into component parts. The pattern of marks is distributed over an area of the substrate, and the method also comprises the steps of providing a beam of radiation using an illumination system and an array of individually controllable elements to impart the beam with a pattern in its cross-section, providing a projection system to project the patterned beam onto the substrate, and providing a movement system to effect relative movement between the substrate and the projection system. A detection system, able to detect the alignment marks individually, is also provided, and the method includes using the detection system to detect the marks to determine a relative position of the substrate to the projection system, using the movement system to position the substrate relative to the projection system, and using the projection system to project the patterned beam of radiation onto a target portion of the substrate. The pattern comprises one or more rows of simple alignment marks, such as spots and short linear marks. | 02-26-2009 |
| 20090153830 | Device for Transmission Image Detection for Use in a Lithographic Projection Apparatus and a Method for Determining Third Order Distortions of a Patterning Device and/or a Projection System of Such a Lithographic Apparatus - Embodiments of the invention relate to a device for transmission image detection for use in a lithographic projection apparatus. In an embodiment, the device includes an array of gratings and an array of radiation sensitive sensors, each of which is arranged to receive radiation coming through one of the gratings. The array of radiation sensitive sensors may be a 1-dimensional diode array. | 06-18-2009 |
| 20090153831 | METHOD AND SYSTEM FOR CORRECTING IMAGE CHANGES - The disclosure relates to a method for compensating image errors, generated by intensity distributions in optical systems, such as in projection lens arrays of microlithography systems, and to respective optical systems, such as projection lens arrays of microlithography systems. | 06-18-2009 |
| 20090185154 | OPTICAL UNIT, ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARTUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - An optical unit comprises a first optical path in which a spatial light modulator with a plurality of optical elements arranged two-dimensionally and controlled individually can be arranged; a second optical path including a mechanism for insertion of an angle distribution providing element including a predetermined fixed pattern on a surface thereof; and a third optical path being an optical path of light having traveled through both of the first optical path and the second optical path. When the angle distribution providing element is inserted in the second optical path, an angle distribution is provided to light exited based on light incident to the angle distribution providing element. | 07-23-2009 |
| 20090262323 | MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A measurement apparatus which measures a surface position of an object comprises a first measurement device configured to make measurement light from the object and reference light from a reference mirror interfere with each other on a light receiving surface of a photo-electric conversion device to form an interference pattern, and photo-electrically convert the interference pattern by the photo-electric conversion device to output an interference signal, a second measurement device configured to measure the surface position of the object, and an arithmetic processing unit configured to detect the surface position of the object based on a peak, of the interference signal, which is ensured to be a peak of a central fringe according to the measurement result obtained using the second measurement device. | 10-22-2009 |
| 20090262324 | ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY AND RELATED METHODS - A microlithographic projection exposure apparatus ( | 10-22-2009 |
| 20090268185 | POSITION CONTROL SYSTEM, A LITHOGRAPHIC APPARATUS AND A METHOD FOR CONTROLLING A POSITION OF A MOVABLE OBJECT - A position control system configured to control the position of a movable object, includes: a position measurement system configured to determine a position of a sensor or sensor target on the movable object, a comparator configured to provide an error signal by comparing a set-point position and a position feed-back signal based on the measured position, a controller to provide a control signal based on the error signal, a feed-forward device to provide a feed-forward signal on the basis of a first signal related to the desired position, and one or more actuators configured to act on the movable object based on the control signal and the feed-forward signal, wherein the position control system further includes a compliance compensation device providing a compliance compensation signal, wherein the compliance compensation signal is subtracted from a measured position of the position measurement system to obtain the feed-back position signal. | 10-29-2009 |
| 20090279065 | MEASUREMENT APPARATUS AND EXPOSURE APPARATUS - A measurement apparatus which measures spatial coherence in an illuminated plane illuminated by an illumination system, comprises a measurement mask which has at least three pinholes and is arranged on the illuminated plane, a detector configured to detect an interference pattern formed by lights from the at least three pinholes, and a calculator configured to calculate the spatial coherence in the illuminated plane based on a Fourier spectrum obtained by Fourier-transforming the interference pattern detected by the detector. | 11-12-2009 |
| 20100002219 | Illuminant distribution evaluation method, optical member manufacturing method, illumination optical device, exposure apparatus, and exposure method - There is disclosed an evaluation method for evaluating a one-dimensional illumination distribution using polynomials, the method comprising steps of: setting up, as the polynomials, one-dimensional power polynomials which are orthogonal in a closed interval; and approximating the one-dimensional illumination distribution with the power polynomials to obtain the coefficients of respective terms of the power polynomials. | 01-07-2010 |
| 20100020302 | PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY WITH A MEASURING APPARATUS AND METHOD FOR MEASURING AN IRRADIATION STRENGTH DISTRIBUTION - A projection exposure tool ( | 01-28-2010 |
| 20100177294 | METHOD FOR IN-SITU ABERRATION MEASUREMENT OF OPTICAL IMAGING SYSTEM IN LITHOGRAPHIC TOOLS - The present invention has disclosed a method for in-situ aberration measurement in an optical imaging system of lithographic tools, which comprises the steps of: imaging the reticle pattern by the beams transmitting through the reticle via the optical imaging system; using particular tools to measure plural groups of linewidths by modifying the intensity distribution at the exit pupil plane of the optical imaging system; calculating the asymmetry and ununiformity of the linewidths and calculating the aberrations of the optical imaging system. The present method for aberration measurement can simplify the process of measurement; increase the measurement accuracy of the parameters of image quality; and reduce the time of measurement. | 07-15-2010 |
| 20110122389 | RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a source module that include a collector and a radiation source. The collector is configured to collect radiation from the radiation source. An illuminator is configured to condition the radiation, collected by the collector and to provide a radiation beam. A detector is disposed in a fixed positional relationship with respect to the illuminator. The detector is configured to determine a position of the radiation source relative to the collector and a position of the source module relative to the illuminator. | 05-26-2011 |
| 20110188018 | Alignment of Collector Device in Lithographic Apparatus - A lithographic apparatus ( | 08-04-2011 |
| 20110255067 | MICROLITHOGRAPHY ILLUMINATION SYSTEMS, COMPONENTS AND METHODS - The disclosure relates to microlithography systems, such as EUV micro-lithography illumination systems, as well as related components, systems and methods. | 10-20-2011 |
| 20110304838 | EXPOSURE SYSTEM AND ADJUSTMENT METHOD THEREOF - An exposure system including a first laser light source, a second laser light source, a focusing module, an astigmatism generating element, and a photo detector, and an adjustment method thereof are provided. The first laser light source emits a first laser beam. The second laser light source emits a second laser beam. The focusing module includes a light converging unit disposed on transmission paths of the first laser beam and the second laser beam for projecting the first laser beam and the second laser beam onto a material. The material reflects at least a part of the first laser beam into a first reflective beam. The light converging unit and the astigmatism generating element are disposed on the transmission path of the first reflective beam. The photo detector is disposed on the transmission path of the first reflective beam from the astigmatism generating element. | 12-15-2011 |
| 20130314682 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus includes a control unit configured to calculate a target exposure amount distribution in a scanning direction within the target shot region using a target exposure amount at a position in the target shot region and a target exposure amount at a position in an adjacent shot region adjacent to the target shot region in the scanning direction and configured to perform a scan exposure for the target shot region while controlling an exposure amount according to scanning of the substrate so as to obtain the calculated target exposure amount distribution as an exposure amount distribution in a scanning direction within the target shot region. | 11-28-2013 |
| 20140022526 | LITHOGRAPHIC APPARATUS, AND PATTERNING DEVICE FOR USE IN A LITHOGRAPHIC PROCESS - The invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and an encoder-type measurement system configured to at least during projection of the patterned radiation beam onto a target portion of the substrate continuously determine a position quantity of a patterning device supported on the patterning device support using a grid or grating provided on the patterning device. | 01-23-2014 |
