| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 355050000 | Original moves continuously | 7 |
| 20090086176 | METHOD OF OPERATION FOR SLM-BASED OPTICAL LITHOGRAPHY TOOL - An optical lithography system comprises a light source, a spatial light modulator, imaging optics and means for continuously moving a photosensitive substrate relative to the spatial light modulator. The spatial light modulator comprises at least one array of individually switchable elements. The spatial light modulator is continuously illuminated and an image of the spatial light modulator is continuously projected on the substrate; consequently, the image is constantly moving across the surface of the substrate. While the image is moving across the surface, elements of the spatial light modulator are switched such that a pixel on the surface of the substrate receives, in serial, doses of energy from multiple elements of the spatial light modulator, thus forming a latent image on the substrate surface. The imaging optics is configured to project a blurred image of the spatial light modulator on the substrate, enabling sub-pixel resolution feature edge placement. | 04-02-2009 |
| 20090268177 | Exposing method, exposure apparatus, and device fabricating method - An exposing method that forms a pattern of a reticle on a wafer is provided. In the method, part of the pattern of the reticle in an illumination area, which is illuminated by illumination light from an illumination optical system, is illuminated, and while scanning the illumination area with respect to the reticle in the +Y direction (or the −Y direction) by pivoting a deflection mirror, the reticle is moved in the corresponding −Y direction (or the +Y direction) and the wafer is moved in a direction that corresponds to the movement direction of the reticle. | 10-29-2009 |
| 20090303452 | Image Enhancement Technique - The present invention relates to a method to improve at least one feature edge steepness in an image to be exposed onto a moving workpiece, comprising the actions of: moving the image in essentially the same direction relative to the direction of movement of the workpiece, synchronizing said moving of the image with a pulse length of an exposure radiation source. The invention also relates to a pattern generator for creating patterns on a workpiece | 12-10-2009 |
| 20090310105 | Optical member, interferometer system, stage apparatus, exposure apparatus, and device manufacturing method - An optical member is irradiated with light in order to measure position information in a first direction. The optical member has a first reflecting surface, onto which light propagating in a second direction intersecting the first direction is incident, and a second reflecting surface, onto which light propagating in the second direction is incident. The first reflecting surface and second reflecting surface are optically connected, and light reflected by one among the first reflecting surface and second reflecting surface is incident on the other reflecting surface. | 12-17-2009 |
| 355051000 | Reflector between original and photo-sensitive paper | 3 |
| 20090059193 | Image production apparatus - Disclosed herein is an image production apparatus, including a light source; an optical modulation apparatus of the one-dimensional type; and a projection optical system including a scanning optical system; the scanning optical system including a main scanning optical system, and a sub scanning optical system for carrying out scanning in a direction perpendicular to an optical axis, and a scanning direction by the main scanning optical system, the sub scanning by the sub scanning optical system is carried out between frames of the main scanning by the main scanning optical system, a frame rate and an average of substantial numbers of times of movement until the sub scanning optical system returns from a sub scanning origin to the sub scanning origin satisfy a relationship of Rf/Ns>15 where Rf is the frame rate and Ns is the average of substantial numbers of times of movement. | 03-05-2009 |
| 20100123883 | PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - An object is to provide a projection optical system, for example, capable of improving the throughput of scanning exposure in application to scanning exposure apparatus. A projection optical system for forming an image of a first surface and an image of a second surface on a third surface comprises a first imaging optical system, a second imaging optical system, a third imaging optical system, a fourth imaging optical system, a fifth imaging optical system, a sixth imaging optical system, a seventh imaging optical system, a first folding member disposed between the third imaging optical system and the seventh imaging optical system, and a second folding member disposed between the sixth imaging optical system and the seventh imaging optical system. | 05-20-2010 |
| 20110116062 | REFLECTIVE IMAGING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE - An imaging optical system of the far pupil type, which is applicable to an exposure apparatus, is provided with six reflecting mirrors and forms an image of a first plane on a second plane. An incident pupil of the imaging optical system is positioned on a side opposite to the imaging optical system with the first plane intervening therebetween. A condition of −14.3<(PD/TT)/R<−8.3 is fulfilled by a distance PD which is provided along an optical axis between the incident pupil and the first plane, a distance TT which is provided along the optical axis between the first plane and the second plane, and an angle of incidence R (rad) of a main light beam which comes into the first plane. | 05-19-2011 |
