| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 355040000 | Identifying, composing, or selecting | 10 |
| 20080204681 | IMAGE FORMING APPARATUS - An image forming apparatus according to an embodiment of the invention includes: an image generating unit configured to generate an image to be printed on a recording paper; a paper type designating unit configured for a user to directly designate a type of the recording paper or to designate automatic identification of a type of the recording paper; a paper type identification device configured to identify the type of the recording paper presented by the user when automatic identification of the type of the recording paper is designated by the paper type designating unit; and a printing unit configured to print the image generated by the image generating unit onto the recording paper in accordance with the type of the recording paper identified by the paper type identification device. | 08-28-2008 |
| 20080252867 | OVERLAY MARK, AND FABRICATION AND APPLICATION OF THE SAME - An overlay mark is described, including a portion of a lower layer having two x-directional and two y-directional bar-like patterns therein, and two x-directional and two y-directional photoresist bars defined by the lithography process for defining an upper layer and surrounded by the bar-like patterns. At least one of the patterning process for defining the lower layer and the above lithography process includes two exposure steps respectively for defining a first device area and a second device area. When the patterning process includes two exposure steps, one x-directional and one y-directional bar-like patterns are defined simultaneously and the other x-directional and the other y-directional bar-like patterns are defined simultaneously. When the lithography process includes two exposure steps, one x-directional and one y-directional photoresist bars are defined simultaneously and the other x-directional and the other y-directional photoresist bars are defined simultaneously. | 10-16-2008 |
| 20090303451 | LIGHT SOURCE DEVICE, OPTICAL SCANNING DEVICE, AND IMAGE FORMING APPARATUS - A light source device includes a light source that includes a vertical cavity surface emitting laser; a drive circuit that drives the light source; and a circuit board that includes at least one mounting surface on which the light source and the drive circuit are mounted. The light source is mounted on a first area of the mounting surface, the drive circuit is mounted on a second area of the mounting surface, and a highest end of the first area is at a same height or lower than a lowest end of the second area with respect to a gravity direction. | 12-10-2009 |
| 20110096309 | Method and System for Wafer Inspection - A method and system for evaluating a lithographic pattern obtained using multiple-patterning lithographic processing are presented. In one aspect, the method includes aligning a target design with a lithographic pattern. The target design may comprise a first design and a second design. The method further comprises identifying in the lithographic pattern a stitching region based on a region of overlap between the first design and the second design. The method further comprises determining for the identified stitching region whether a predetermined criterion is fulfilled. In some embodiments, determining whether a predetermined criterion is fulfilled may comprise determining a line or trench minimum width. Alternately or additionally, determining whether a predetermined criterion is fulfilled may comprise determining a stitching metric for the identified stitching region, and evaluating whether or not the stitching metric fulfills the predetermined criterion. | 04-28-2011 |
| 20110096310 | METHOD AND APPARATUS FOR MEASUREMENT AND CONTROL OF PHOTOMASK TO SUBSTRATE ALIGNMENT - A method, structure, system of aligning a substrate to a photomask. The method includes: directing incident light through a pattern of clear regions transparent to the incident light in an opaque-to-the-incident-light region of a photomask, through a lens and onto a photodiode formed in a substrate, the photodiodes electrically connected to a light emitting diode formed in the substrate, the light emitting diode emitting light of different wavelength than a wavelength of the incident lights; measuring an intensity of emitted light from light emitting diode; and adjusting alignment of the photomask to the substrate based on the measured intensity of emitted light. | 04-28-2011 |
| 20110170081 | Maskless exposure apparatuses and frame data processing methods thereof - Example embodiments are directed to a maskless exposure apparatus to efficiently process frame data of a Digital Micro-mirror Device (DMD) and a frame data processing method thereof. The frame data includes data obtained when a reference pixel of a virtual mask of the DMD and subsequent pixels of the virtual mask of the DMD, each of said subsequent pixels having an exposure time succeeding an exposure time of the reference pixel, are located on the same line. The generated frame data is selectively time-delayed and is changed to exposure frame data, and a pattern is exposed on a substrate using the exposure frame data. | 07-14-2011 |
| 20140160451 | SUBSTRATE REFERENCE IMAGE CREATION METHOD, SUBSTRATE DEFECT INSPECTION METHOD, SUBSTRATE REFERENCE IMAGE CREATION APPARATUS, SUBSTRATE DEFECT INSPECTION UNIT AND NON-TRANSITORY COMPUTER STORAGE MEDIUM - In the present invention, a planar distribution of pixel values in a picked-up substrate image is decomposed into a plurality of pixel value distribution components through use of a Zernike polynomial for each of substrate images; Zernike coefficients of the pixel value distribution components decomposed through use of the Zernike polynomial are calculated; a median value and values deviated from the median value by a predetermined value or more are extracted for every Zernike coefficients having a same couple of degrees from the calculated Zernike coefficients; substrate images having the extracted values are specified; and a substrate image being a defect inspection reference is created by combining the specified substrate images. | 06-12-2014 |
| 355041000 | Including photocell | 3 |
| 20080266535 | Printing system and order-sheet-based batch printing method - A printing system includes an optical sensor that reads a plurality of order sheets at least selecting images to be printed and printing sheet types, a printing specifying unit that specifies the images and printing sheet types selected by the order sheets on the basis of an output from the optical sensor, a reader that reads image data of the images selected by the order sheets from a recording medium, and a printer that prints the read image data on types of printing paper which correspond to the printing sheet types selected by the order sheets, wherein after the optical sensor reads the order sheets, the printer performs batch printing based on the images and printing sheet types selected by all the order sheets. | 10-30-2008 |
| 20090002656 | Device and method for transmission image detection, lithographic apparatus and mask for use in a lithographic apparatus - A device is provided for transmission image detection of an aerial image formed in a lithographic projection apparatus. The device has a structure provided with an object mark, an projection system and a detector. The object mark is arranged to form a object mark pattern upon illumination by radiation with a predetermined wavelength. The projection system is arranged to form an object mark aerial image of the object mark pattern at an image side of the projection system, where the image side has a numerical aperture larger than 1. The detector has a slit pattern and a photo-sensitive device. The slit pattern is positioned in a plane proximate to image plane of the projection system. The device can be configured to satisfy the following condition: | 01-01-2009 |
| 20110205508 | Digital Exposure Method and Digital Exposure Device for Performing the Method - A digital exposure method and a digital exposure device for performing the method are disclosed. In the method, a graphic data system file is produced in correspondence with each of a plurality of patterns formed on a substrate. Then, a digital micromirror device on/off data is generated from the graphic data system file. Then, the substrate is exposed in response to the digital micromirror device on/off data. Thus, at least a first exposure for forming a first pattern of a display panel, and a second exposure for forming identification numbers of a substrate and each display panel and removing an edge portion of the substrate may be simultaneously performed, to simplify the exposure process decrease costs. | 08-25-2011 |
