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Electron or ion source

Subclass of:

315 - Electric lamp and discharge devices: systems

315111010 - DISCHARGE DEVICE LOAD WITH FLUENT MATERIAL SUPPLY TO THE DISCHARGE SPACE

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Class / Patent application numberDescriptionNumber of patent applications / Date published
315111810 Electron or ion source 53
20080238325Advanced Multipurpose Pseudospark Switch - The present invention provides a pseudospark switch that overcomes the aforementioned limitations of existing pseudospark switches and proved e-beams for applications such as FELs, pulsed lasers, X-ray machines, and radar. The improvement in e-beam quality is obtained by inductively ionizing gas inside the hollow cathode chamber (HCC), prior to main gap breadkown using a HCC that incorporates a spiral induction coil. The gas in the hollow cathode chamber is ionized by the discharge of an auxiliary capacitor bank through the spiral coil that forms the back surface of the HCC.10-02-2008
20090134804Axial hall accelerator with solenoid field - The present patent letters discloses a Hall Current accelerator with a solenoid Hall field, a collimated gas source, an anode, intermediate Hall effect ionization magnetic field structures and intermediate acceleration electrodes. The Hall field in this case is the end cusp field(s) of a common solenoid magnetic field.05-28-2009
20090243490Unbalanced ion source - A dual unbalanced indirectly heated cathode (IHC) ion chamber is disclosed. The cathodes have different surface areas, thereby affecting the amount of heat radiated by each. In the preferred embodiment, one cathode is of the size and dimension typically used for IHC ionization, as traditionally used for hot mode operation. The second cathode, preferably located on the opposite wall of the chamber, is of a smaller size. This smaller cathode is still indirectly heated by a filament, but due to its smaller size, radiates less heat into the source chamber, allowing the ion source to operate in cold mode, thereby preserving the molecular structure of the target molecules. In both modes, the unused cathode is preferably biased so as to be at the same potential as the IHC, thus allowing it to act as a repeller.10-01-2009
20100066252SPIRAL RF-INDUCTION ANTENNA BASED ION SOURCE FOR NEUTRON GENERATORS - An ion source for the generation of hydrogen or deuterium ions is disclosed, said source suitable for the generation of D-D and D-T neutrons, wherein the body of the ion source is cylindrical, and disposed at one end of the ion source opposite the extraction plate, is a single, spiraled RF coil antenna, in which the spiraled coils are flat.03-18-2010
20100188000CLOSED ELECTRON DRIFT THRUSTER - In a closed electron drift thruster, a magnetic circuit for creating a magnetic field in a main annular channel comprises at least one axial magnetic core surrounded by a first coil and an inner upstream pole piece forming a body of revolution, together with a plurality of outer magnetic cores surrounded by outer coils. The magnetic circuit further comprises an essentially radial outer first pole piece defining a concave inner peripheral surface and an essentially radial second pole piece defining a convex outer peripheral surface. The concave inner peripheral surface and the convex outer peripheral surface present respective adjusted profiles that are distinct from circular cylindrical surfaces so as to form between them a gap of varying width presenting zones of maximum value in register with the outer coils and zones of minimum value in between the outer coils so as to create a uniform radial magnetic field.07-29-2010
20100207529CLOSED DRIFT ION SOURCE - A closed drift ion source is provided, having an anode that serves as both the center magnetic pole and as the electrical anode. The anode has an insulating material cap that produces a closed drift region to further increase the electrical impedance of the source. The ion source can be configured as a round, conventional ion source for space thruster applications or as a long, linear ion source for uniformly treating large area substrates. A particularly useful implementation uses the present invention as an anode for a magnetron sputter process.08-19-2010
20100289409PARTICLE BEAM SOURCE APPARATUS, SYSTEM AND METHOD - An ion source is disclosed including: a chamber disposed about a longitudinal axis and containing a gas, a magnetic confinement system configured to produce a magnetic field in a confinement region within the chamber, an electron cyclotron resonance driver which produces a time varying electric field which drives the cyclotron motion of electrons located within the confinement region, the driven electrons interacting with the gas to form a confined plasma. During operation, the magnetic confinement system confines the plasma in the confinement region such that a portion of atoms in the plasma experience multiple ionizing interactions with the driven electrons to form multiply ionized ions having a selected final ionization state.11-18-2010
20110057565DEVICE AND METHOD OF SUPPLYING POWER TO AN ELECTRON SOURCE, AND ION-BOMBARDMENT-INDUCED SECONDARY-EMISSION ELECTRON SOURCE - The power supply device (03-10-2011
20110057566PULSED ELECTRON SOURCE, POWER SUPPLY METHOD FOR PULSED ELECTRON SOURCE AND METHOD FOR CONTROLLING A PULSED ELECTRON SOURCE - The invention relates to a pumped electron source (03-10-2011
20110080095FILAMENT ELECTRICAL DISCHARGE ION SOURCE - Filament electric discharge ion source (04-07-2011
20110084611MITIGATING SPARKS IN AN ION WIND FAN - Ion wind fans are susceptible to sparks occurring across an emitter electrode and a collector electrode of an ion wind fan. According to one embodiment, the present invention includes mitigating a spark event by providing a resistor in series between an ion wind fan power supply and an ion wind fan. In one embodiment, the resistance of the resistor is at least one order of magnitude lower than the resistance across the ion wind fan during normal operation.04-14-2011
20110089836HIGH-VOLTAGE INSULATOR ARRANGEMENT AND ION ACCELERATOR ARRANGEMENT HAVING SUCH A HIGH-VOLTAGE INSULATOR ARRANGEMENT - The invention relates to an ion accelerator arrangement comprising an electrostatic acceleration field between a cathode to which a frame potential is applied and an anode to which a high-voltage potential is applied. The ion accelerator arrangement further comprises a gas supply system into which a gas-permeable, open porous insulator member is introduced. Also described is a high-voltage insulator arrangement that comprises such an insulator member and is suitable, inter alia, for such an ion accelerator arrangement and for the corona-resistant insulation of other components to which a high voltage is applied.04-21-2011
20110210668ELECTRON CYCLOTRON RESONANCE ION GENERATOR - An electron cyclotron resonance ion generator includes a vacuum-tight chamber configured to contain a plasma, a magnetic field generator configured to generate a magnetic field in the chamber, a waveguide configured to propagate a high-frequency wave inside the chamber, a first ionisation stage located at one end of the chamber, the first stage including an ionisation zone in which ions are generated, the magnetic field being approximately parallel to a longitudinal axis in the ionisation zone, a second magnetic confinement stage for the ions generated in the ionisation zone, the second stage using a first high-frequency wave being propagated in the chamber from the waveguide, the magnetic field being approximately parallel to the longitudinal axis between the ionisation zone and the second confinement stage, such that the ions generated in the ionisation zone migrate towards the second confinement stage and the first and second stages contain the same continuous plasma.09-01-2011
20110254449FLUORESCENT EXCIMER LAMPS - Excimers are formed in a high pressure gas by applying a potential between a first electrode (10-20-2011
20110266957ION BEAM EXTRACTION BY DISCRETE ION FOCUSING - An apparatus and methods are disclosed for ion beam extraction. In an implementation, the apparatus includes a plasma source (or plasma) and an ion extractor. The plasma source is adapted to generate ions and the ion extractor is immersed in the plasma source to extract a fraction of the generated ions. The ion extractor is surrounded by a space charge formed at least in part by the extracted ions. The ion extractor includes a biased electrode forming an interface with an insulator. The interface is customized to form a strongly curved potential distribution in the space-charge surrounding the ion extractor. The strongly curved potential distribution focuses the extracted ions towards an opening on a surface of the biased electrode thereby resulting in anion beam.11-03-2011
20120043891Electrostatic Fluid Accelerator for Controlling a Fluid Flow - An electrostatic fluid accelerator includes an electrode array comprising a corona discharge electrode and an array of accelerating electrodes for moving a fluid. A control circuit supplies power to the electrode array including control of a corona discharge voltage and a heating current to cause the corona discharge electrode to vibrate. The control circuit also controls heating of heating elements and can operate the electrostatic fluid accelerator in response to an detection of a constituent of the fluid.02-23-2012
20120056541ION GENERATING DEVICE FOR DUCT - Provided is an ion generating device for an air-conditioner duct, which can be easily attached to the inside of an existing air conditioner duct and can ensure a desired ion generation quantity. The ion generating elements of the sub-units (03-08-2012
20120062118DISCHARGE APPARATUS - A discharge apparatus (03-15-2012
20130015767STABILIZED ELECTRON MULTIPLIER ANODEAANM Steiner; UrsAACI BranfordAAST CTAACO USAAGP Steiner; Urs Branford CT USAANM Moeller; Roy P.AACI San LeandroAAST CAAACO USAAGP Moeller; Roy P. San Leandro CA USAANM Deford; DavidAACI PleasontonAAST CAAACO USAAGP Deford; David Pleasonton CA US - Methods and systems to compensate for distortions created by dynamic voltage applied to an electron multiplier used in mass spectrometry. An electron multiplier has a cathode end accepting ion flow, an opposite emitter end and an interior surface. The electron multiplier produces an electron output from ions colliding with the interior surface. A variable power supply has a voltage output coupled to the cathode end and the emitter end of the electron multiplier. The voltage output changes dynamically to adjust the electron output from the electron multiplier. An anode is located in proximity to the electron multiplier. An electrometer is coupled to the anode in proximity to the electron multiplier to measure the current generated by the electron output. A low pass filter circuit is coupled to the emitter end to the ground of the electrometer to attenuate emitter voltage changes. A bias circuit is coupled to the emitter end to stabilize emitter to anode voltage difference.01-17-2013
20130020940CURRENT LIMITER FOR HIGH VOLTAGE POWER SUPPLY USED WITH ION IMPLANTATION SYSTEM - Disclosed is a surge protection system for use with an ion source assembly. The system comprises a high voltage power source coupled in series with a thermionic diode and an ion source assembly. The high voltage power supply is enclosed in the pressure tank and drives the ion source assembly. The thermionic diode is comprised of an insulating tube disposed between the ion source assembly enclosure and the output of the high voltage power supply and makes use of existing ion source assembly components to limit damage to the power supply during arc failures of the ion source assembly.01-24-2013
20130026921APPARATUS AND METHOD FOR REMOVAL OF SURFACE OXIDES VIA FLUXLESS TECHNIQUE INVOLVING ELECTRON ATTACHMENT - Described herein is a method and apparatus for removing metal oxides on a surface of a component via electron attachment. In one embodiment, there is provided a field emission apparatus, wherein the electrons attach to at least a portion of the reducing gas to form a negatively charged atomic ions which removes metal oxides comprising: a cathode comprising an electrically conductive and comprising at least one or more protrusions having a high surface curvature, wherein the cathode is surrounded by a dielectric material which is then surrounded by an electrically conductive anode wherein the cathode and anode are each connected to an electrical voltage source, and the dielectric material between the cathode and anode is polarized to provide an electric field at one or more protrusions and thereby electrons from the cathode.01-31-2013
20130088150ION SOURCE APPARATUS AND METHODS OF USING THE SAME - An ion beam source that emits an ion beam in a direction of a substrate is provided. A cathode with a discharge opening defined therein is included. An anode is also included and spaced apart from the cathode. Ions are set to be emitted in an area proximate to the discharge opening in a direction similar to the direction from the anode to the discharge opening. First and second ceramic walls at least partially define a discharge channel between the anode and the cathode. At least one magnet generates a magnetic field in an area proximate to the discharge opening.04-11-2013
20130140987ION IMPLANTATION WITH CHARGE AND DIRECTION CONTROL - The present disclosure provides for various advantageous methods and apparatus of controlling electron emission. One of the broader forms of the present disclosure involves an electron emission element, comprising an electron emitter including an electron emission region disposed between a gate electrode and a cathode electrode. An anode is disposed above the electron emission region, and a voltage set is disposed above the anode. A first voltage applied between the gate electrode and the cathode electrode controls a quantity of electrons generated from the electron emission region. A second voltage applied to the anode extracts generated electrons. A third voltage applied to the voltage set controls a direction of electrons extracted through the anode.06-06-2013
20130169157SYSTEMS AND METHODS FOR GENERATING COHERENT MATTERWAVE BEAMS - Systems and methods for generating a coherent matterwave beam are provided. In some aspects, a system includes a plurality of beam generating units. Each of the plurality of beam generating units is configured to generate a stream of charged particles. The system also includes a magnetic field generator configured to expose the plurality of streams to a magnetic field such that (i) the charged particles of the plurality of streams undergo phase synchronization with one another in response to a vector potential associated with the magnetic field and (ii) the plurality of streams is directed along one or more channels to combine with one another and produce a coherent matterwave beam.07-04-2013
20130187547Apparatus and Method for Removal of Surface Oxides Via Fluxless Technique Involving Electron Attachment - Described herein is a method and apparatus for removing metal oxides on a surface of a component via electron attachment. In one embodiment, there is provided a field emission apparatus, wherein the electrons attach to at least a portion of the reducing gas to form a negatively charged atomic ions which removes metal oxides comprising: a cathode comprising an electrically conductive and comprising at least one or more protrusions having an angled edge or high curvature surface, wherein the cathode is surrounded by a dielectric material which is then surrounded by an electrically conductive anode wherein the cathode and anode are each connected to an electrical voltage source, and the dielectric material between the cathode and anode is polarized, intensifying the electrical field strength and accumulating electrons at the apex of the cathode to promote field emission of electrons from the cathode.07-25-2013
20130249400ION SOURCE DEVICE AND ION BEAM GENERATING METHOD - An ion source device has a configuration in which a cathode is provided in an arc chamber having a space for plasma formation, and a repeller is disposed to face a thermal electron discharge face of the cathode by interposing the space for plasma formation therebetween. An external magnetic field that is induced by a source magnetic field unit is applied to the space for plasma formation in a direction parallel to an axis that connects the cathode and the repeller. An opening is provided in a place corresponding to a portion in the repeller with the highest density of plasma that is formed in the space for plasma formation, and an ion beam is extracted from the opening.09-26-2013
20140077701ION GENERATION APPARATUS AND ELECTRIC EQUIPMENT USING THE SAME - In this ion generation apparatus, an induction electrode is formed on a surface of a first printed substrate, a hole is opened on the inside of the induction electrode, a needle electrode is mounted on a second printed substrate, and a tip end portion of the needle electrode is inserted in the hole. Therefore, even if the ion generation apparatus is placed in a high-humidity environment with dust accumulating on the first and the second printed substrates, the ion generation apparatus can prevent a current from leaking between the needle electrode and the induction electrode.03-20-2014
20140097752Inductively Coupled Plasma ION Source Chamber with Dopant Material Shield - A plasma ion source including a plasma chamber, gas inlets, an RF antenna, an RF window, an extraction plate, a window shield, and a chamber liner. The RF window may be positioned intermediate the RF antenna and the plasma chamber. The window shield may be disposed intermediate the RF widow and the interior of the plasma chamber and the chamber liner may cover the interior surface of the plasma chamber. During operation of the ion source, the window shield sustains ionic bombardment that would otherwise be sustained by the RF window. Fewer impurity ions are therefore released into the plasma chamber. Simultaneously, additional dopant atoms are released from the window shield into the plasma chamber. Ionic bombardment is also sustained by the chamber liner, which also contributes a quantity of dopant atoms to the plasma chamber. Dopant ion production within the plasma chamber is thereby increased while impurities are minimized.04-10-2014
20140197734SPIN ROTATION DEVICE - A spin device includes: a first condenser lens which focuses a spin polarized electron beam discharged from an electron gun or reflected on a sample; a spin rotator which includes a multipole having a point to which the electron beam is focused by the first condenser lens at a lens center or in the vicinity of the lens center and being capable of generating an electric field and a magnetic field; a Wien condition generating means which applies a voltage and a current which satisfy the Wien condition for rotating spin of the electron beam by a designated angle and making the electron beam advance straightly to the multipole which constitutes the spin rotator; and a second condenser lens which focuses the electron beam whose spin is rotated by the spin rotator.07-17-2014
20140203707ELECTRON EMISSION DEVICE - Provided herein are electron emission devices and device components for optical, electronic and optoelectronic devices, including cantilever-based MEMS and NEMS instrumentation. Devices of certain aspects of the invention integrate a dielectric, pyroelectric, piezoelectric or ferroelectric film on the receiving surface of a substrate having an integrated actuator, such as a temperature controller or mechanical actuator, optionally in the form of a cantilever device having an integrated heater-thermometer. Also provided are methods of making and using electron emission devices for a range of applications including sensing and imaging technology.07-24-2014
20140306608ION GENERATING ELEMENT AND ION GENERATING APPARATUS PROVIDED THEREWITH - An ion generating element (10-16-2014
20140375208ION GENERATOR MOUNTING DEVICE - The present invention provides methods and systems for an ion generator mounting device for application of bipolar ionization to airflow within a conduit, the device includes a housing for mounting to the conduit having an internal panel within the enclosure, and an arm extending from the housing for extension into the conduit and containing at least one opening. At least one coupling for mounting an ion generator to the arm oriented with an axis extending between a pair of electrodes of the ion generator being generally perpendicular to a flow direction of the airflow within the conduit.12-25-2014
20150061496System for Generating High Speed Flow of an Ionized Gas - The invention relates to a system for generating an ion stream which may be useful for various applications. In one application, the ion stream may be used to excite nano-spheres. In another application, the ion stream may be used for sterilization and therapy in accordance with the teachings of the invention.03-05-2015
20150069913ION Implantation with Charge and Direction Control - The present disclosure provides for various advantageous methods and apparatus of controlling electron emission. One of the broader forms of the present disclosure involves an electron emission element, comprising an electron emitter including an electron emission region disposed between a gate electrode and a cathode electrode. An anode is disposed above the electron emission region, and a voltage set is disposed above the anode. A first voltage applied between the gate electrode and the cathode electrode controls a quantity of electrons generated from the electron emission region. A second voltage applied to the anode extracts generated electrons. A third voltage applied to the voltage set controls a direction of electrons extracted through the anode.03-12-2015
20150294837Continuously Moving Target for an Atmospheric Pressure Ion Source - An ion source includes a nebuliser and a target, with the nebuliser being arranged and adapted to emit, in use, a stream of analyte droplets which are caused to impact upon the target and to ionise analyte to form a plurality of analyte ions. The target comprises a pin or rod which is mounted off-set from a rotating shaft. The target is rotated or translated in use and follows an eccentric path such that the relative position between the nebuliser and target varies as the target is rotated or translated.10-15-2015
20160013013ION GENERATOR MOUNTING DEVICE01-14-2016
20160067363Sanitizer - A sanitizer for sanitizing various surfaces including hands, hardware, fixtures, appliances, countertops, equipment, utensils and more and more specifically to a chemical-free sanitizer, more specifically to an ozone-free sanitizer and yet more specifically to an electronic sanitizer and yet more specifically to an ion source sanitizer.03-10-2016
20160071715ION MANIPULATION METHOD AND DEVICE - An ion manipulation method and device is disclosed. The device includes a pair of substantially parallel surfaces. An array of inner electrodes is contained within, and extends substantially along the length of, each parallel surface. The device includes a first outer array of electrodes and a second outer array of electrodes. Each outer array of electrodes is positioned on either side of the inner electrodes, and is contained within and extends substantially along the length of each parallel surface. A DC voltage is applied to the first and second outer array of electrodes. A RF voltage, with a superimposed electric field, is applied to the inner electrodes by applying the DC voltages to each electrode. Ions either move between the parallel surfaces within an ion confinement area or along paths in the direction of the electric field, or can be trapped in the ion confinement area.03-10-2016
20160163495HIGH RELIABILITY, LONG LIFETIME, NEGATIVE ION SOURCE - A negative ion source includes a plasma chamber, a microwave source, a negative ion converter, a magnetic filter and a beam formation mechanism. The plasma chamber contains gas to be ionized. The microwave source transmits microwaves to the plasma chamber to ionize the gas into atomic species including hyperthermal neutral atoms. The negative ion converter converts the hyperthermal neutral atoms to negative ions. The magnetic filter reduces a temperature of electrons provided between the plasma chamber and the negative ion converter. The beam formation mechanism extracts the negative ions.06-09-2016
315111910 Gas ionization type (e.g., ion pump or gauge source) 14
20080238326ION ACCELERATION COLUMN CONNECTION MECHANISM WITH INTEGRATED SHIELDING ELECTRODE AND RELATED METHODS - Ion accelerating devices including connection mechanisms with integrated shielding electrode and related methods are disclosed. According to an embodiment, an ion accelerating device of an ion implantation system comprises: a first element; a first connection system within the first element, the first connection system including a first connector and a first encapsulated shielding electrode around the first connector; and a second connection system within a second element other than the first element, the second connection system being coupled to the first connector; wherein the first encapsulated shielding electrode includes a first shielding portion adjacent to a first interface surface of the first element where the second connection system interfaces with the first element, in a cross-sectional view, the first shielding portion being substantially U-shaped.10-02-2008
20090058305COMPACT HIGH CURRENT RARE-EARTH EMITTER HOLLOW CATHODE FOR HALL EFFECT THRUSTERS - An apparatus and method for achieving an efficient central cathode in a Hall effect thruster is disclosed. A hollow insert disposed inside the end of a hollow conductive cathode comprises a rare-earth element and energized to emit electrons from an inner surface. The cathode employs an end opening having an area at least as large as the internal cross sectional area of the rare earth insert to enhance throughput from the cathode end. In addition, the cathode employs a high aspect ratio geometry based on the cathode length to width which mitigates heat transfer from the end. A gas flow through the cathode and insert may be impinged by the emitted electrons to yield a plasma. One or more optional auxiliary gas feeds may also be employed between the cathode and keeper wall and external to the keeper near the outlet.03-05-2009
20100052540ELECTROHYDRODYNAMIC FLUID ACCELERATOR DEVICE WITH COLLECTOR ELECTRODE EXHIBITING CURVED LEADING EDGE PROFILE - Performance of an electrohydrodynamic fluid accelerator device may be improved and adverse events such as sparking or arcing may be reduced based, amongst other things, on electrode geometries and/or positional interrelationships of the electrodes. For example, in a class of EHD devices that employ a longitudinally elongated corona discharge electrode (often, but not necessarily, a wire), a plurality of generally planar, collector electrodes may be positioned so as to present respective leading surfaces toward the corona discharge electrode. The generally planar collector electrodes may be oriented so that their major surfaces are generally orthogonal to the longitudinal extent of the corona discharge electrode. In such EHD devices, a high intensity electric field can be established in the “gap” between the corona discharge electrode and leading surfaces of the collector electrodes.03-04-2010
20100264825ION SOURCE FOR GENERATING A PARTICLE BEAM - An ion source for generating a particle beam includes a plasma chamber and an electrode, which extends up to the plasma chamber. A gas that is to be ionized is introduced into the ion source via a gas line, which extends over the entire length of the electrode in parallel with the electrode such that the gas flows out of the gas line in immediate proximity to an entry to the plasma chamber.10-21-2010
20120025710Hall-current ion source with improved ion beam energy distribution - A Hall-current ion source with a narrow ion beam energy distribution is presented. A narrow ion beam energy distribution is provided by a utilization of a multi-chamber anode through which a working gas is applied and delivers a uniform working gas distribution in a discharge channel. Introduction of a working gas through a lower part of anode makes applied electric potential in a narrow area and leading to enhanced conditions for a working gas ionization, high ion beam current, high translation of a discharge voltage into a “monochromatic” ion beam mean energy distribution. A multi-chamber anode with a slit exit for introduction of a working gas into area under anode is utilized to prevent a backflow of insulating and dielectric depositions on anode parts, and under anode area makes a nominal operation with reactive gases without a phenomenon called as “anode poisoning” during long operating hours. The ion source with a shielded Hot Filament design shows very effective ion beam neutralization properties; it produces less heating of the substrate than a traditional one; it has a cleaner ion beam because its beam is not contaminated by the Hot Filament material particles. In the design with two Hot Filaments the ion source operation is extended for tens of hours.02-02-2012
20130285552ION GENERATION IN MASS SPECTROMETERS BY CLUSTER BOMBARDMENT - The invention relates to devices and methods in mass spectrometers for the generation of ions of heavy molecules, especially biomolecules, by bombarding them with uncharged clusters of molecules. The analyte ions which are generated or released by cluster bombardment of analyte substances on the surface of sample support plates show a broad distribution of their kinetic energies, which prevents good ion-optical focusing. In the invention, the kinetic energies are homogenized in a higher-density collision gas. The collision gas is preferably located in an RF ion guide, more preferably an RF ion funnel, which can transfer the ions to the mass analyzer. The collision gas may be introduced with temporal pulsing, coordinated or synchronized with the pulsed supersonic gas jet. The collision gas may be pumped off again before the next supersonic gas pulse. In an advantageous embodiment, the collision gas can originate from the supersonic gas jet itself.10-31-2013
20140070701ADVANCED PENNING ION SOURCE - This disclosure provides systems, methods, and apparatus for ion generation. In one aspect, an apparatus includes an anode, a first cathode, a second cathode, and a plurality of cusp magnets. The anode has a first open end and a second open end. The first cathode is associated with the first open end of the anode. The second cathode is associated with the second open end of the anode. The anode, the first cathode, and the second cathode define a chamber. The second cathode has an open region configured for the passage of ions from the chamber. Each cusp magnet of the plurality of cusp magnets is disposed along a length of the anode.03-13-2014
20140167614ARC CHAMBER WITH MULTIPLE CATHODES FOR AN ION SOURCE - An apparatus for extending the useful life of an ion source, comprising an arc chamber containing a plurality of cathodes to be used sequentially and a plurality of repellers to protect cathodes when not in use. The arc chamber includes an arc chamber housing defining a reaction cavity, gas injection openings, a plurality of cathodes, and at least one repeller element. A method for extending the useful life of an ion source includes providing power to a first cathode of an arc chamber in an ion source, operating the first cathode, detecting a failure or degradation in performance of the first cathode, energizing a second cathode, and continuing operation of the arc chamber with the second cathode.06-19-2014
20140184074ION SOURCE USING FIELD EMITTER ARRAY CATHODE AND ELECTROMAGNETIC CONFINEMENT - An ion source for use in a radiation generator tube includes a back passive cathode electrode, a passive anode electrode downstream of the back passive cathode electrode, a magnet adjacent the anode, and a front passive cathode electrode downstream of the passive anode electrode. The front passive cathode electrode and the back passive cathode electrode define an ionization region therebetween. At least one field emitter array (FEA) cathode is configured to electrostatically discharge due to an electric field in the ion source. The back passive cathode electrode and the passive anode electrode, and the front passive cathode electrode and the passive anode electrode, have respective voltage differences therebetween, and the magnet generating a magnetic field, such that a Penning-type trap is produced to confine electrons from the electrostatic discharge to the ionization region. At least some of the electrons in the ionization region interact with an ionizable gas to create ions.07-03-2014
20140265858Ion Source Having Negatively Biased Extractor - An ion source for use in a radiation generator includes an active cathode configured to emit electrons on a trajectory away from the active cathode, at least some of the electrons as they travel interacting with an ionizable gas to produce ions. In addition, there is at least one extractor downstream of the active cathode having a potential such that the ions are attracted toward the at least one extractor.09-18-2014
20140375209AXIAL MAGNETIC ION SOURCE AND RELATED IONIZATION METHODS - An ion source is configured for electron ionization and produces coaxial electron and ion beams. The ion source includes an ionization chamber along an axis, a magnet assembly configured for generating an axial magnetic field in the ionization chamber, an electron source, and a lens assembly configured for directing the ion beam out from the ionization chamber along the axis, reflecting the electron beam back toward the electron source, and transmitting higher energy ions out from the ion source while reflecting lower energy ions toward a lens element for neutralization.12-25-2014
20160089470Purifier - Described is an ion air purifier. The ion air purifier includes a collector module (03-31-2016
20160093461Air Ionization Module - The invention relates to air ionization modules with ionization tubes removably arranged in mounts and to a support comprising the mounts. The air ionization modules are characterized in particular in that as little condensation as possible occurs while enriching an air flow with ions. For this purpose, the support has two mutually spaced plates, a first plate being an assembly plate and a second plate being a circuit board comprising the mounts. Furthermore, a body made of a heat-insulating material is located between the plates such that the second plate is arranged so as to be heat-insulated relative to the first plate. The air ionization module is used to generate ions in an air flow for at least one inner room of a building. Ionized air leads to a separation of multiple odor-causing molecules, an eradication of microorganisms, a degradation of volatile gaseous hydrocarbons, and a reduction of the oxide potential of the air, for example. In this manner, a comfortable, near-natural air is produced in the room supplied with the air.03-31-2016
20160133426LINEAR DUOPLASMATRON - A duoplasmatron is provided having a cathode, an anode with linear slit, and an intermediate electrode (IE) between the cathode and the anode where the IE has an opening that is aligned with the anode slit. A magnet forms a magnetic field that passes through the anode slit. A discharge passes from the cathode to the anode through the IE opening and the anode slit. The discharge is constricted through the IE opening and the magnetic field in the anode slit. An extractor external to the anode accelerates ions through an ion emitting slit aligned with the anode slit. A process of generating an accelerated ion beam is provided that includes flowing a gas into the IE and then energizing at least one power supply to induce electron flow to the anode. Ionizing the gas in the gap between the IE and anode. The ions are accelerated from the anode through the extractor ion emitting slit forming a linear ion beam.05-12-2016

Patent applications in class Electron or ion source

Patent applications in all subclasses Electron or ion source

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