| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 315039000 | Discharge device load with distributed parameter-type transmission line (e.g., wave-guide, coaxial cable) | 77 |
| 20080258627 | Frequency tunable resonant cavity for use with an electrodeless plasma lamp - A plasma lamp is described with resonant frequency tuning capability and associated methods for tuning. One tuning method allows plasma lamp manufacturer to set the frequency of lamps to several discrete predetermined values. For example, most lamps that are near the center of a frequency distribution can be tuned to a nominal value such as 918.7 MHz. Other frequencies can also be tuned to increase manufacturing yield and improve lamp performance. | 10-23-2008 |
| 20080265778 | Unsplit Bipolar Pulse Forming Line - A bipolar pulse forming transmission line module and system for linear induction accelerators having first, second, third, and fourth planar conductors which form a sequentially arranged interleaved stack having opposing first and second ends, with dielectric layers between the conductors. The first and second planar conductors are connected to each other at the first end, and the first and fourth planar conductors are connected to each other at the second end via a shorting plate. The third planar conductor is electrically connectable to a high voltage source, and an internal switch functions to short at the first end a high voltage from the third planar conductor to the fourth planar conductor to produce a bipolar pulse at the acceleration axis with a zero net time integral. Improved access to the switch is enabled by an aperture through the shorting plate and the proximity of the aperture to the switch. | 10-30-2008 |
| 20090009087 | HIGH BRIGHTNESS PLASMA LAMP - A plasma lamp for an electrodeless plasma lamp having a waveguide body. The non-radiative thermal losses from the bulb are controlled to prevent the bulb from melting while providing a high level of radiation from the bulb. The thermal conductivity of the waveguide, configuration of the heat sink and size and placement of the bulb may be selected to provide a brightness of more than 80 lumens per watt and a total brightness of more than 12,000 lumens at a power level of 150 watts. | 01-08-2009 |
| 20090079347 | Microwave Generator - A microwave generator includes a resonator which has two mutually opposite resonator electrodes formed with a spark gap device that breaks down when an ignition voltage is applied. In order to provide the microwave generator with increased power, in which the resonator can be operated at relatively high ignition voltages or field strengths, the spark gap device has at least two spark gaps connected in series. | 03-26-2009 |
| 20090167183 | PLASMA LAMP WITH DIELECTRIC WAVEGUIDE - A dielectric waveguide integrated plasma lamp is disclosed for powering a small and bright bulb with a diameter of a few millimeters. The lamp is contained within a high dielectric constant material which guides the microwaves to the bulb, provides heat isolation to the drive circuit, contains the microwaves, provides structural stability and ease of manufacturing and allows efficient energy coupling to the bulb when used as a dielectric resonant oscillator. | 07-02-2009 |
| 20090195160 | LIGHTING METHOD OF MICROWAVE EXCITATION DISCHARGE LAMP - To prevent the continuation of the abnormal state occurring immediately after the lighting start of the electrodeless discharge lamp excited by a DC driven magnetron and to recover promptly from the abnormal state at the steady state period. Lighting start of an electrodeless discharge lamp is performed in soft start mode. Increasing the power supply to the magnetron gradually, the lamp is turned into a lighting state for longer time than the time for the luminescence medium to evaporate fully absorbing microwave. At that period, the output of DC power supply is periodically cut off momentarily, resetting the abnormal state. Then, stable DC power is supplied. At the steady state period, the anode current of the magnetron is controlled to be constant. When rise of the operation voltage of the magnetron is detected, the output of DC power supply is cut off momentary to recover to the steady state. | 08-06-2009 |
| 20090243488 | MICROWAVE ENERGIZED PLASMA LAMP WITH DIELECTRIC WAVEGUIDE - A plasma lamp including a waveguide body comprising at least one dielectric material. The body is coupled to a microwave power source which causes the body to resonate in at least one resonant mode. A lamp chamber integrated with the body contains a bulb with a fill forming a light-emitting plasma when the chamber receives power from the resonating body. A bulb either is self-enclosed or an envelope sealed by a window or lens covering the chamber aperture. Embodiments disclosed include lamps having a drive probe and a feedback probe, and lamps having a drive probe, feedback probe and start probe, which minimize power reflected from the body back to the source. | 10-01-2009 |
| 20090315461 | Lamp - A bandpass filter comprises an air filled aluminum chamber having a lid and a cuboid resonant cavity having a central iris. At opposite end nodes of the cavity, perfect electric conductors (PECs) are provided. Threaded tuning projections opposite the PECs and in the iris are provided, whereby the pass band and the transmission characteristics of the filter in the pass band can be tuned to match the input impedance of the band pass filter and the wave guide to the output impedance of a microwave drive circuit. It is mounted on one end of the filter chamber, with an electrodeless bulb in a central cavity directed axially away from the chamber and the radiator in a further cavity set to one side of the central cavity. When the filter is driven, the wave guide resonates driving the bulb. | 12-24-2009 |
| 20100001644 | Microwave Generator - A microwave generator has a resonator with two mutually spaced resonator electrodes. The resonator electrodes provide a spark gap device which breaks down upon the application of a firing voltage between them. The spark gap device has at least two parallel-connected spark gaps. | 01-07-2010 |
| 20100060167 | Lamp - A lamp with a quartz electrodeless bulb has a ceramic wave guide with a central void, in which the bulb is accommodated. The wave guide is rectangular. The central void is centered on a central longitudinal plane of the wave guide, normal to front and back faces of the wave guide and equally spaced from end faces. Parallel with the central void and also on the central plane are two further voids for respective antennae. The central void is open through the front face for egress of light, but the antenna voids are not open in this face. The latter is metalised to inhibit egress of microwave energy from the wave guide. | 03-11-2010 |
| 20100134008 | ELECTRODELESS LAMPS WITH GROUNDED COUPLING ELEMENTS AND IMPROVED BULB ASSEMBLIES - An electrode-less plasma lamp, comprising generally of a bulb containing a gas-fill and light emitter(s) that is excited to produce light using radio-frequency (RF) energy. The present lamp includes compact air resonators/waveguides that use grounded coupling-elements with integrated bulb assemblies to reduce the size of the resonator and improve the performance of the lamp as well as reduce cost and simplify manufacturability. | 06-03-2010 |
| 20100156295 | ELECTRODELESS BULB, AND ELECTRODELESS LIGHTING SYSTEM HAVING THE SAME - Disclosed are an electrodeless bulb ( | 06-24-2010 |
| 20100164381 | LONG LINEAR-TYPE MICROWAVE PLASMA SOURCE USING VARIABLY-REDUCED-HEIGHT RECTANGULAR WAVEGUIDE AS PLASMA REACTOR - A long linear-type microwave plasma source using a variably-reduced-height rectangular waveguide as the plasma reactor has been developed. Microwave power is fed from the both sides of the waveguide and is coupled into plasma through a long slot cut on the broad side of the waveguide. The reduced height of the waveguide is variable in order to control the coupling between microwave and plasma so that the plasma uniformity can remain a high quality when extending the length of the linear-type plasma source. | 07-01-2010 |
| 20100201268 | DISCHARGE LAMP, LIGHT SOURCE DEVICE, AND PROJECTOR - A discharge lamp includes an arc tube made of quartz glass and enclosing a light emitting substance, and an electrode mainly made of tungsten and arranged in the arc tube, the electrode including at least one getter material that binds with oxygen. | 08-12-2010 |
| 20100283389 | COAXIAL WAVEGUIDE ELECTRODELESS LAMP - The present invention relates to a coaxial waveguide electrodeless lamp. The lamp is formed in analogy to coaxial waveguide cables, with an outer conductor, a central conductor, and a gas-fill vessel made of dielectric material between the outer conductor and the inner conductor. The gas-fill vessel is substantially hollow and filled with substances that form a plasma and emit light when RF radiation carried by the central conductor and ground conductor interacts with the substances in the gas-fill vessel. The present invention also relates to a leaky waveguide electrodeless lamp. The lamp is formed in analogy to leaky waveguides, with a conductor, a ground conductor, and a gas-fill vessel made of dielectric material butted against the conductor and encompassed by the ground conductor. The leaky waveguide electrodeless lamp emits light from a plasma similar to light-emission action of the coaxial waveguide electrodeless lamp described above. | 11-11-2010 |
| 20100315000 | PLASMA LAMP WITH FIELD-CONCENTRATING ANTENNA - An electrodeless plasma lamp is described comprising a lamp body including a solid dielectric material. The lamp includes a bulb received at least partially within an opening in the solid dielectric material and a radio frequency (RF) feed configured to provide power to the solid dielectric material. A conductive material is provided adjacent to the bulb to concentrate the power proximate the bulb. The conductive material may be located below an upper surface of the solid dielectric material. The conductive material may modify at least a portion of an electric field proximate the bulb so that the portion of the electric field is oriented substantially parallel to an upper surface of the lamp body. | 12-16-2010 |
| 20100320905 | PLASMA LAMP USING A SHAPED WAVEGUIDE BODY - A plasma lamp for an electrodeless plasma lamp having a shaped dielectric waveguide body. The shaped body may have a relatively thin region containing a bulb, and a second region thicker than the first region. Microwave probes may be positioned in the second region to provide power to the waveguide body. The body may be shaped to intensify the electric field in the first region adjacent to the bulb to allow operation at a lower frequency than a solid cylindrical or rectangular waveguide body having the same volume and dielectric constant. | 12-23-2010 |
| 20100320906 | Electrodeless Lamps with Grounded Coupling Elements - An electrodeless plasma lamp includes a bulb containing a gas-fill and light emitter(s) excited to produce light using radio-frequency (RF) energy. Input and output coupling elements separated from each other by a gap couple RF energy from an RF source to the bulb. One end of the input coupling element is electrically connected to an RF source while the other end is connected to ground. One end of the output coupling element is connected to ground while the other end is connected to the bulb. | 12-23-2010 |
| 20100320907 | LIGHT SOURCE DEVICE AND PROJECTOR INCLUDING LIGHT SOURCE DEVICE - An optical source device includes a solid high frequency oscillating unit that outputs a high frequency signal, a waveguide that receives the high frequency signal output from the solid high frequency oscillating unit and radiates the received high frequency signal as a microwave, and a light emitting unit that emits light by the microwave radiated from the waveguide unit. A container of the waveguide unit has a space surrounded by reflective surfaces that reflect the microwave radiated from the antenna unit so as to collect the microwave. A projector includes this optical source device, an optical modulating unit that modulates a light beam emitted from the light emitting unit of the optical source device according to image information to form an optical image, and a projecting unit that projects the optical image formed by the optical modulating unit. | 12-23-2010 |
| 20110006681 | LAMP - A discharge tube of glass, filled with a halogen/noble-gas mix, which passes through a ½ lambda wave guide of alumina at an aperture ¼ lambda from one end. The wave guide is silver plated to establish resonance between its opposed ends. An antenna/probe is provided in another aperture, driven via a matching circuit from an amplifier. The discharge tube has a length greater than twice the thickness of the wave guide, extending from the wave guide on at least one side thereof. | 01-13-2011 |
| 20110006682 | ELECTRODELESS LIGHTING SYSTEM - An electrodeless lighting system is disclosed. A rectangular wave guide is bent substantially at a right angle, and a magnetron and a resonator are disposed at one side based on a wave guide space of the wave guide, thus reducing the space between the magnetron and the resonator and removing an unnecessary space within a casing to reduce the size of the electrodeless lighting system. Accordingly, the amount of space required for installation of the electrodeless lighting system can be reduced and the installation process can be simplified. | 01-13-2011 |
| 20110006683 | ELECTRODELESS LIGHTING SYSTEM AND CONTROL METHOD THEREOF - An electrodeless lighting system and its control method are disclosed. When the electrodeless lighting system starts, a larger amount of filament current of a magnetron is applied to stably drive the magnetron, and when the electrodeless lighting system operates normally, a smaller amount of filament current is applied, thus avoiding interference with a wireless LAN, lengthening a life span of the magnetron, reducing noise, and improving an operational efficiency of the electrodeless lighting system. | 01-13-2011 |
| 20110012508 | MODULAR MAGNETRON - A modular magnetron for use in UV curing lamp assembly is disclosed. The modular magnetron includes a vacuum tube having a vacuum tube body, a top assembly, and a bottom assembly. The top assembly is configured to substantially overlay the vacuum tube. The bottom assembly is configured to substantially extend about the vacuum tube, the vacuum tube being positioned to partially protrude from the bottom assembly, the bottom assembly including a cooling assembly configured to employ a flexible clamp-type fitting about the vacuum tube body for substantially maintaining thermal and electrical conductivity. The top assembly is configured to be releasably fastened to the bottom assembly about the vacuum tube with removable fasteners. | 01-20-2011 |
| 20110057562 | Stable surface wave plasma source - A surface wave plasma (SWP) source is described. The SWP source comprises an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent the plasma. The EM wave launcher comprises a slot antenna having a plurality of slots. The SWP source further comprises a first recess configuration formed in the plasma surface, wherein the first recess configuration is substantially aligned with a first arrangement of slots in the plurality of slots, and a second recess configuration formed in the plasma surface, wherein the second recess configuration is either partly aligned with a second arrangement of slots in the plurality of slots or not aligned with the second arrangement of slots in the plurality of slots. A power coupling system is coupled to the EM wave launcher and configured to provide the EM energy to the EM wave launcher for forming the plasma. | 03-10-2011 |
| 20110181184 | PLASMA LAMP WITH FIELD-CONCENTRATING ANTENNA - An electrodeless plasma lamp is described comprising a lamp body including a solid dielectric material. The lamp includes a bulb received at least partially within an opening in the solid dielectric material and a radio frequency (RF) feed configured to provide power to the solid dielectric material. A conductive material is provided adjacent to the bulb to concentrate the power proximate the bulb. The conductive material may be located below an upper surface of the solid dielectric material. The conductive material may modify at least a portion of an electric field proximate the bulb so that the portion of the electric field is oriented substantially parallel to an upper surface of the lamp body. | 07-28-2011 |
| 20110204781 | Plasma Lamp with Dielectric Waveguide Having a Dielectric Constant of Less Than Two - An electrodeless plasma lamp apparatus includes a waveguide body having at least a first material and a second material. At least one of the materials has a dielectric constant of less than two. In a specific embodiment, the apparatus also includes an RF power source coupled to the waveguide body to provide RF power to the waveguide body at least one frequency that resonates within the waveguide body. A bulb containing a fill which forms a plasma to cause emission of light when the RF power is provided to the waveguide body. | 08-25-2011 |
| 20110204782 | Plasma Lamp with Dielectric Waveguide Body Having a Width Greater Than a Length - A plasma lamp includes a waveguide body which has at least one solid dielectric material. The body has a diameter and a length transverse to the diameter, with the diameter of the body being less than the length of the body. The lamp also has a power source configured to provide power to the body at a resonant frequency. The waveguide body has an effective length of at least portions of the diameter and the length. | 08-25-2011 |
| 20110204783 | More Efficient Electrodeless Plasma Lamp with Increased Overall Capacitance Through the Use of Multiple Dielectric and Insulating Materials - An RF electrodeless plasma lamp with improved efficiency in higher lumens per watt includes a waveguide body, in which an RF signal drives the entire structure at the resonant frequency of the structure. The resonant frequency of the structure is lowered by increasing the overall capacitance of the waveguide body by adding at least two layers of dielectric material between the input feed and the bulb of the lamp. The layered structure can include an air cavity disposed between a dielectric layer and the input feed. In lowering the resonant frequency of the lamp, the device is capable of using RF amplifiers that have higher efficiency, and thus has a higher lumens per watt ratio. | 08-25-2011 |
| 20110204784 | Plasma Lamp with Dielectric Waveguide Body Having Shaped Configuration - A plasma lamp apparatus that includes an improved bulb support assembly to increase the lumens per watt output of the apparatus. The bulb support assembly includes a support structure that forms a cavity for receiving the bulb. The bulb is supported within the cavity though a protrusion that extends out from the support structure in a curved manner. By created a curved protrusion, the electric field within the resonating structure of the lamp apparatus is lowered. Lowering the electric field leads to lower resonating frequencies of the resonating structure. In lowering the resonating frequency, the resonating structure is driven to resonate at lower power levels, thereby increasing the lumens per watt output of the lamp apparatus. | 08-25-2011 |
| 20110204785 | CROSSED FIELD DEVICE - A crossed field device, such as a magnetron or crossed field amplifier, that includes a cathode, an anode, one or more magnetic elements, and one or more extraction elements. In one embodiment, the crossed field device includes an annular cathode and anode that are axially spaced from one another such that the device produces an axial electric (E) field and a radial magnetic (B) field. In another embodiment, the crossed field device includes an oval-shaped cathode and anode that are radially spaced from one another such that the device produces a radial electric (E) field and an axial magnetic (B) field. The crossed field device may produce electromagnetic (EM) emissions having a frequency ranging from megahertz (MHz) to terahertz (THz), and may be used in one of a number of different applications. | 08-25-2011 |
| 20110221340 | PLASMA LAMP WITH CONDUCTIVE MATERIAL POSITIONED RELATIVE TO RF FEED - In an example embodiment, an electrodeless plasma lamp is provided which comprises a lamp body comprising a dielectric material having a relative permittivity greater than 2, and a bulb adjacent to the lamp body, the bulb containing a fill that forms a plasma when RF power is coupled to the fill from the lamp body. An RF feed is coupled to the lamp body and a radio frequency (RF) power source for coupling power into the lamp body through the RF feed is provided. A shortest distance between an end of the bulb and a point on the RF feed traverses at least one electrically conductive material of the lamp body. | 09-15-2011 |
| 20110221341 | PLASMA LAMP WITH DIELECTRIC WAVEGUIDE - A dielectric waveguide integrated plasma lamp is disclosed for powering a small and bright bulb with a diameter of a few millimeters. The lamp is contained within a high dielectric constant material which guides the microwaves to the bulb, provides heat isolation to the drive circuit, contains the microwaves, provides structural stability and ease of manufacturing and allows efficient energy coupling to the bulb when used as a dielectric resonant oscillator. | 09-15-2011 |
| 20110221342 | PLASMA LAMP WITH DIELECTRIC WAVEGUIDE INTEGRATED WITH TRANSPARENT BULB - A dielectric waveguide integrated plasma lamp (DWIPL) with a body comprising at least one dielectric material having a dielectric constant greater than approximately 2, and having a shape and dimensions such that the body resonates in at least one resonant mode when microwave energy of an appropriate frequency is coupled into the body. A dielectric bulb within a lamp chamber in the body contains a fill which when receiving energy from the resonating body forms a light-emitting plasma. The bulb is transparent to visible light and infrared radiation emitted by the plasma. Radiative energy lost from the plasma is recycled by reflecting the radiation from thin-film, multi-layer coatings on bulb exterior surfaces and/or lamp chamber surfaces back into the bulb. The lamp further includes two- or three-microwave probe configurations minimizing power reflected from the body back to the microwave source when the source operates: (a) at a frequency such that the body resonates in a single mode; or (b) at one frequency such that the body resonates in a relatively higher mode before a plasma is formed, and at another frequency such that the body resonates in a relatively lower order mode after the plasma reaches steady state. | 09-15-2011 |
| 20110316419 | Dielectric-Loaded Field Applicator for EHID Lamps and EHID Lamp Assembly Containing Same - A dielectric-loaded field applicator and an EHID lamp assembly are provided wherein the applicator comprises a helical resonator having a cylindrical dielectric core and a helical conductor, the dielectric core having a helical groove extending along its surface substantially from end to end; the helical conductor being contained in the helical groove and connectable at one end to a power source, the dielectric core being comprised of a dielectric material having a relative permittivity greater than about 3, preferably polycrystalline alumina. The EHID lamp assembly includes two opposed dielectric-loaded applicators with a discharge vessel supported between them. | 12-29-2011 |
| 20120119648 | LIGHT SOURCE - An electrodeless, microwave lamp has a magnetron as a microwave source and an excitable material lucent crucible in whose excitable material a plasma is established. For coupling microwaves from the magnetron into the crucible, an air wave guide coupling circuit is provided, with an output of the magnetron as an input at one quarter lambda from one end and an output at one quarter from the other end as an input to a connection to the crucible. | 05-17-2012 |
| 20120161629 | PLASMA LIGHTING SYSTEM - A plasma lighting system is disclosed. Interference with an electronic device using the same band as that of the plasma lighting system can be avoided by changing the shape of vanes constituting a magnetron, and a filament current of the magnetron at an initial starting stage and that in a normal state are adjusted to be different, thus avoiding interference with a wireless LAN and attenuating noise, and a resonator has a mash form to increase efficiency. Because a rectangular waveguide is bent substantially at a right angle, and the magnetron and the resonator are disposed at one side on the basis of a waveguide space of the waveguide, thus reducing the size and an installation space of the plasma lighting system. | 06-28-2012 |
| 20120286658 | MODULAR MAGNETRON - A modular magnetron for use in UV curing lamp assembly is disclosed. The modular magnetron includes a vacuum tube having a vacuum tube body, a top assembly, and a bottom assembly. The top assembly is configured to substantially overlay the vacuum tube. The bottom assembly is configured to substantially extend about the vacuum tube, the vacuum tube being positioned to partially protrude from the bottom assembly, the bottom assembly including a cooling assembly configured to employ a flexible clamp-type fitting about the vacuum tube body for substantially maintaining thermal and electrical conductivity. The top assembly is configured to be releasably fastened to the bottom assembly about the vacuum tube with removable fasteners. | 11-15-2012 |
| 20130093321 | DIELECTRIC WINDOW FOR PLASMA PROCESSING APPARATUS, PLASMA PROCESSING APPARATUS AND METHOD FOR MOUNTING DIELECTRIC WINDOW FOR PLASMA PROCESSING APPARATUS - In a dielectric window | 04-18-2013 |
| 20130099663 | MICROWAVE DRIVEN PLASMA LIGHT SOURCE - A lucent crucible of a Lucent Waveguide Microwave Plasma Light Source (LWMPLS) comprising a Light Emitting Resonator (LER) in form of a crucible ( | 04-25-2013 |
| 20130113374 | ELECTRODELESS LAMPS WITH GROUNDED COUPLING ELEMENTS - An electrodeless plasma lamp includes a bulb containing a gas-fill and light emitter(s) excited to produce light using radio-frequency (RF) energy. Input and output coupling elements separated from each other by a gap couple RF energy from an RF source to the bulb. One end of the input coupling element is electrically connected to an RF source while the other end is connected to ground. One end of the output coupling element is connected to ground while the other end is connected to the bulb. | 05-09-2013 |
| 20130140984 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - A plasma processing apparatus can excite uniform plasma on a large substrate. The plasma processing apparatus | 06-06-2013 |
| 20130175921 | ELECTRODELESS LAMPS WITH EXTERNALLY-GROUNDED PROBES AND IMPROVED BULB ASSEMBLIES - An electrode-less plasma lamps, comprising generally of a bulb containing a gas-fill that is excited to produce light using radio-frequency (RF) energy. In specific embodiments, the use of grounded coupling-elements with integrated bulb assemblies simplifies manufacturability, improves resonant frequency control, and enables the use of solid, partially filled, and hollow lamp bodies. | 07-11-2013 |
| 20130264938 | STABLE SURFACE WAVE PLASMA SOURCE - A surface wave plasma (SWP) source is described. The SWP source comprises an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent the plasma. The EM wave launcher comprises a slot antenna having at least one slot. The SWP source further comprises a first recess configuration and a second recess configuration formed in the plasma surface, wherein at least one first recess of the first recess configuration differs in size and/or shape from at least one second recess of the second recess configurations. A power coupling system is coupled to the EM wave launcher and configured to provide the EM energy to the EM wave launcher for forming the plasma. | 10-10-2013 |
| 20140062298 | MULTIPLE PULSE WIDTH MODULATION WAVEFORMS FOR PLASMA LAMP - This disclosure is directed to devices and methods for generating light with electrode-less plasma lamps. More particularly, the present invention provides plasma lamps driven by a radio-frequency source without the use of electrodes inside the bulb, and a pulse-width modulation device that provides RF power regulation, and related methods. The bulb comprises gaseous material with metal halides and/or light emitters that, when powered, substantially stays in an arc shape state. The switching pulse-width modulation device is operable at specific modulation frequencies, duty cycles, and durations to stabilize or control the arc state/mode, which enables consistent and high efficiencies. | 03-06-2014 |
| 20140062299 | ELECTROMAGNETIC WAVEGUIDE AND PLASMA SOURCE - A method comprises: aligning a plasma torch within an iris cavity of an iris along a first axis between first and second iris slots having heights less than 70% of the diameter of the torch; and generating an electromagnetic field having field lines along a second axis. The field comprises a component that is substantially transverse to the first direction. An apparatus is also described. | 03-06-2014 |
| 20140062300 | PLASMA MICROWAVE RESONANT CAVITY - A plasma microwave resonant cavity used for a plasma chemical vapor deposition (PCVD) apparatus comprises a resonant cavity housing and a waveguide device connected with the cavity housing. Two ends of the cavity housing are provided with coaxial through-holes along the axial direction of the cavity. A glass inner liner is arranged through the through-holes at the two ends, and runs through a cavity body and the through holes at the two ends. The glass inner liner comprises a glass cylinder and glass stop rings arranged at the two ends of the glass cylinder. One or two ends of the glass cylinder are provided with external threads. The glass stop rings are connected with the ends of the glass cylinder ( | 03-06-2014 |
| 20140132153 | LIGHTING APPARATUS - A lighting apparatus is provided that includes a magnetron configured to generate microwaves having a predetermined frequency, a waveguide including a first wave guide space configured to introduce and guide the microwaves and a second wave guide space expanded from the first wave guide space, a resonator to which the microwaves are transmitted from the waveguide and a bulb located in the resonator, the bulb encapsulating a light emitting material and being configured to emit light in response to the transmitted microwaves. The second wave guide space is located in a transmission path of the microwaves transmitted from the magnetron to the resonator. | 05-15-2014 |
| 20140159571 | Microplasma Generating Array - A microplasma generator includes first and second conductive resonators disposed on a first surface of a dielectric substrate. The first and second conductive resonators are arranged in line with one another with a gap defined between a first end of each resonator. A ground plane is disposed on a second surface of the dielectric substrate and a second end of each of the first and second resonators is coupled to the ground plane. A power input connector is coupled to the first resonator at a first predetermined distance from the second end chosen as a function of the impedance of the first conductive resonator. A microplasma generating array includes a number of resonators in a dielectric material substrate with one end of each resonator coupled to ground. A micro-plasma is generated at the non-grounded end of each resonator. The substrate includes a ground electrode and the microplasmas are generated between the non-grounded end of the resonator and the ground electrode. The coupling of each resonator to ground may be made through controlled switches in order to turn each resonator off or on and therefore control where and when a microplasma will be created in the array. | 06-12-2014 |
| 20140167607 | ELECTRODELESS LIGHTING DEVICE AND METHOD FOR MANUFACTURING THE SAME - An electrodeless lighting device and methods for manufacturing the same are provided. The method includes inserting a dose into the bulb and at least one of heating a vacuum line for applying a vacuum to the bulb at first predetermined temperature and heating the bulb containing the dose at a second predetermined temperature for a predetermined time. | 06-19-2014 |
| 20140197729 | PLASMA LIGHT SOURCE - A lucent waveguide plasma light source has a quartz waveguide body with a central through bore. The bore has orifices at its opposite ends, opening centrally of flat, end faces of the body. Between these the body has a circular cylindrical periphery. A drawn quartz tube is inserted into the body. The tube has its one end closed and a collar which locates the tube in the bore and is fused to the faces at the orifices of the bore. The tube is evacuated and charged with excitable material and closed as a sealed void. A Faraday cage and an antenna in a bore in the body are provided for feeding microwave energy to the light source. When powered with microwaves, resonance is established in the wave guide and a plasma is established in the void, wherein Light radiates and leaves the waveguide and Faraday cage radially of the periphery. | 07-17-2014 |
| 20140265833 | Chamber Matching Using Voltage Control Mode - Systems and methods for compensating for harmonics produced during plasma processing in a plasma chamber are described. One of the methods includes retrieving a measurement of a combined waveform. The combined waveform includes a fundamental waveform and a harmonic waveform. The combined waveform defines a voltage proximate to a surface of a chuck, which is coupled to a radio frequency (RF) transmission line. The RF transmission line is coupled to an impedance matching circuit. The impedance matching circuit is coupled to an RF generator. The method further includes extracting the fundamental waveform from the combined waveform, determining a difference between a magnitude of the combined waveform and a magnitude of the fundamental waveform, and controlling the RF generator to compensate for the difference. | 09-18-2014 |
| 20140292195 | PLASMA WAVGUIDE USING STEP PART AND BLOCK PART - In a magnetron and a plasma waveguide through which a microwave oscillated from the magnetron moves, there is provided a plasma waveguide including a plurality of step parts formed at any one side on an inner side surface of the waveguide, and a block part of a predetermined height formed at any other side on the inner side surface of the waveguide, wherein the block part is formed at a side opposite to a boundary part between the plurality of step parts. | 10-02-2014 |
| 20140312767 | DIELECTRIC WINDOW FOR PLASMA TREATMENT DEVICE, AND PLASMA TREATMENT DEVICE - A dielectric window for a plasma treatment device for a plasma treatment device that uses microwaves as a plasma source. The dielectric window is circular-plate-shaped and allows microwaves to propagate. The dielectric window has a recess that has an opening on the lower-surface side and that indents in the plate thickness direction of the dielectric window, and is provided to the lower surface at which plasma is generated when the dielectric window is provided to the plasma treatment device. The recess has a bottom surface extending in the direction perpendicular to the plate thickness direction, and a side surface extending in the plate thickness direction from the circumferential edge of the bottom surface toward the opening of the recess. In addition, an inclined surface extends at an incline relative to the plate thickness direction from the opening-side circumferential edge of the side surface toward the opening of the recess. | 10-23-2014 |
| 20140327357 | COMPACT ELECTROMAGNETIC PLASMA IGNITION DEVICE - A quarter wave coaxial cavity resonator for producing corona discharge plasma from is presented. The quarter wave coaxial cavity resonator has a folded cavity made of opposing concentric cavity members that are nested together to form a continuous cavity ending in a aperture. A center conductor with a tip is positioned in the cavity. The folded cavity advantageously permits the coaxial cavity resonator to resonate at a lower operating frequency than an unfolded quarter wave coaxial cavity resonator of the same length. Embodiments of the quarter wave coaxial cavity resonator use narrower apertures to reduce radiative losses, and include center conductors that are reactive load elements, such as helical coils. When a radio frequency (RF) oscillation is produced in the quarter wave coaxial cavity resonator, corona discharge plasma is formed at the tip of the center conductor. The corona discharge plasma can be used to ignite combustible materials in combustion chambers of combustion engines. | 11-06-2014 |
| 20140346949 | HF Resonator and Particle Accelerator with HF Resonator - The invention relates to an HF resonator comprising a cylindrical cavity made of a dielectric material. An inner face of the cavity has an electrically conductive coating which is divided into a first inner coating and a second inner coating by an electrically insulating gap that encircles a lateral face of the cavity in an annular manner. An outer face of the cavity has an electrically conductive first outer coating and an electrically conductive second outer coating. The first outer coating and the second outer coating are electrically insulated from each other. The HF resonator comprises a device that is provided for applying a high-frequency electric voltage between the first outer coating and the second outer coating. | 11-27-2014 |
| 20140368110 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - There is provided a plasma processing apparatus which can improve density uniformity of plasma excited by a high frequency wave as in the VHF frequency band for a substrate having a large size. The plasma processing apparatus includes a waveguide member defining a waveguide, a coaxial tube supplying electromagnetic energy from a predetermined power supply position in the longitudinal direction of the waveguide into the waveguide, first and second electrodes for electric field formation disposed so as to face a plasma formation space, and a coil member disposed in the waveguide so as to generate a voltage by electromagnetic induction due to a magnetic field and also electrically connected to the first and second electrodes. | 12-18-2014 |
| 20150015140 | PLASMA GENERATION DEVICE WITH MICROSTRIP RESONATOR - A plasma generation device, a system comprising a plasma generation device, and a method of generating plasma and vacuum UV (VUV) photons are described. In a representative embodiment, plasma generation device, comprises: a substrate having a first surface and a second surface; a resonant ring-shaped structure disposed aver the first surface of the substrate, the resonant ring-shaped structure having dimensions selected to support at least one standing wave having more than one electric field maximum along a length of the resonant ring-shaped structure; a ground plane disposed on the second surface of the substrate; and an apparatus configured to provide a gas at locations of the electric field maxima, | 01-15-2015 |
| 20150022082 | Dielectric barrier discharge lamps and methods - Electric lamps wherein material inside a bulb is excited using capacitive coupling through the bulb wall to external electrodes, forming plasma which emits light. Methods described include use of light-emitting material including sulfur and/or selenium, and a circuit for driving the external electrodes. | 01-22-2015 |
| 20150097481 | Lucent Waveguide Electromagnetic Wave - A Lucent Waveguide Electromagnetic Wave Plasma Light Source has a fabrication ( | 04-09-2015 |
| 20150318148 | MICROWAVE PLASMA APPLICATOR WITH IMPROVED POWER UNIFORMITY - An apparatus for generating plasma includes a plasma discharge tube and a conductive coil helically wound around an outer surface of the plasma discharge tube. A waveguide is coupled to a microwave cavity surrounding the plasma discharge tube to guide the microwave energy into the plasma discharge tube such that the plasma is generated in the plasma discharge tube. The waveguide is positioned such that an electric field of the microwave energy is oriented at a predetermined angle with respect to the longitudinal axis of the plasma discharge tube. A resulting induced electric current in the conductive coil affects power absorption in the plasma discharge tube, the predetermined angle being selectable such that power absorption in the plasma discharge tube is according to a predetermined profile with respect to the longitudinal axis of the plasma discharge tube. | 11-05-2015 |
| 20150340204 | Transmission Line RF Applicator for Plasma Chamber - A transmission line RF applicator apparatus and method for coupling RF power to a plasma in a plasma chamber. The apparatus comprises two conductors, one of which has a plurality of apertures. In one aspect, apertures in different portions of the conductor have different sizes, spacing or orientations. In another aspect, adjacent apertures at successive longitudinal positions are offset along the transverse dimension. In another aspect, the apparatus comprises an inner conductor and one or two outer conductors. The main portion of each of the one or two outer conductors includes a plurality of apertures that extend between an inner surface and an outer surface of the outer conductor. | 11-26-2015 |
| 20150348736 | MICROWAVE GENERATOR WITH VIRTUAL CATHODE OSCILLATOR AND OPEN REFLECTORS - A device for generating microwaves with an oscillating virtual cathode includes a cathode, and a thin anode positioned at an inlet of a cylindrical waveguide. The waveguide includes at least one first open reflector and one last open reflector that are transparent to electrons and capable of reflecting a microwave created by at least one virtual cathode generated in the waveguide. A plurality of open reflectors are between the first and last open reflector, such that a designated reflector of the plurality of open reflectors has a radius R(i+1) less than or equal to a radius Ri of an immediately preceding reflector and the last open reflector has a radius RN less than a radius R1 of the first open reflector. | 12-03-2015 |
| 20150348757 | WORKPIECE PROCESSING CHAMBER HAVING A THERMAL CONTROLLED MICROWAVE WINDOW - A plasma reactor has a microwave source including a microwave window with a channel extending through the window and a coolant source for flowing a coolant through the channel. The coolant is a liquid that does not absorb microwave power. | 12-03-2015 |
| 20150349497 | CO-AXIAL COMMUTATION SPARK GAP - Disclosed is a commutation spark gap ( | 12-03-2015 |
| 20150349499 | DEVICE AND METHOD FOR CONNECTING AN RF GENERATOR TO A COAXIAL CONDUCTOR - The present disclosure presents a device and method for connecting an RF generator to a coaxial conductor. The device includes a substrate, a radio frequency generator on the substrate, and a coaxial conductor coupled to a first surface of the substrate. The coaxial conductor includes a conductive core and a conductive shield around the conductive core and is configured to transmit the radio frequency signal to a radiation device. The device includes a cap coupled to the substrate and extending from a second surface of the substrate opposite the first surface. The cap includes an outer wall and a center post. The outer wall is electrically connected to the conductive shield of the coaxial conductor and the center post is electrically connected to the conductive core of the coaxial conductor. An output pad of the radio frequency generator is electrically connected to the conductive core. | 12-03-2015 |
| 20160014876 | Distributed Coupling and Multi-Frequency Microwave Accelerators | 01-14-2016 |
| 20160045628 | Microwave Disinfection and Sterilization - A method and apparatus comprising microwave radiation pulses to reduce a microorganism population in an object. | 02-18-2016 |
| 20160099127 | ELECTRON DEVICE AND METHOD FOR MANUFACTURING AN ELECTRON DEVICE - According to embodiments of the present invention, an electron device is provided. The electron device includes a support substrate, a conductive planar slow-wave structure on the support substrate, the conductive planar slow-wave structure being adapted to receive an electromagnetic wave signal for interaction with an electron beam, and a dielectric layer arrangement in between the conductive planar slow-wave structure and the support substrate, the dielectric layer arrangement being arranged on the support substrate at only one or more support substrate portions overlapping with the conductive planar slow-wave structure. According to further embodiments of the present invention, a method for manufacturing an electron device is also provided. | 04-07-2016 |
| 20160126051 | Metamaterial high-power microwave source - A metamaterial high-power microwave source relates to the fields of vacuum electronic technology, particle physics, and accelerators, including: a cathode, a metamaterial slow-wave structure (SWS), a waveguide and coaxial line coupler located at one end of the metamaterial SWS and a collector component located at the other end of the metamaterial SWS. The metamaterial SWS provided by the present invention is greatly smaller than a rectangular waveguide having the same frequency, so as to realize a miniaturization of devices and facilitate integration with semiconductor devices. The waveguide and coaxial line coupler has a good transmission characteristic and a low reflection in a relatively wide frequency band, which guarantees a high-efficient coupling output of a signal. Moreover, the metamaterial high-power microwave source has a high-power output and a pulsed output power reaching a megawatt level. | 05-05-2016 |
| 20160172181 | ILLUMINANT AND OPERATING METHOD THEREFOR | 06-16-2016 |
| 315390300 | Traveling wave type with delay-type transmission line | 7 |
| 20120176034 | HIGH FREQUENCY HELICAL AMPLIFIER AND OSCILLATOR - Disclosed herein is a class of mm and sub mm wavelength amplifiers and oscillators operating with miniature helical slow wave circuits manufactured using micro fabrication technology. The helices are supported by diamond dielectric support rods. Diamond is the best possible thermal conductor, and it can be bonded to the helix. The electron beam is transmitted, not through the center of the helix, but around the outside. In some configurations the RF power produced may be radiated directly from the slow wave circuit. The method of fabrication, which is applicable above 60 GHz, is compatible with mass production. | 07-12-2012 |
| 20120181930 | HIGH FREQUENCY HELICAL AMPLIFIER AND OSCILLATOR - Disclosed herein is a class of mm and sub mm wavelength amplifiers and oscillators operating with miniature helical slow wave circuits manufactured using micro fabrication technology. The helices are supported by diamond dielectric support rods. Diamond is the best possible thermal conductor, and it can be bonded to the helix. The electron beam is transmitted, not through the center of the helix, but around the outside. In some configurations the RF power produced may be radiated directly from the slow wave circuit. The method of fabrication, which is applicable above 60 GHz, is compatible with mass production. | 07-19-2012 |
| 20120187832 | HIGH FREQUENCY HELICAL AMPLIFIER AND OSCILLATOR - Disclosed herein is a class of mm and sub mm wavelength amplifiers and oscillators operating with miniature helical slow wave circuits manufactured using micro fabrication technology. The helices are supported by diamond dielectric support rods. Diamond is the best possible thermal conductor, and it can be bonded to the helix. The electron beam is transmitted, not through the center of the helix, but around the outside. In some configurations the RF power produced may be radiated directly from the slow wave circuit. The method of fabrication, which is applicable above 60 GHz, is compatible with mass production. | 07-26-2012 |
| 20120242224 | CROSSED-FIELD AMPLIFIERS WITH REDUCED SPURIOUS EMISSIONS - Various crossed-field amplifiers (CFAs) are disclosed herein. In one embodiment, the geometry of the cathode and/or the anode reduces the velocity of the electrons as they travel near the anode drift block to increase the distribution of the electrons in the drift gap. In another embodiment, an abrupt geometric change to the cathode at the beginning or the end of the anode drift block can disperse the electrons, thereby increasing the rate of mixing and diffusion. By increasing the distribution of the electrons, the peak amplitude of spurious emissions produced by a CFA can be reduced. | 09-27-2012 |
| 20120248979 | HIGH FREQUENCY HELICAL AMPLIFIER AND OSCILLATOR - Disclosed herein is a class of mm and sub mm wavelength amplifiers and oscillators operating with miniature helical slow wave circuits manufactured using micro fabrication technology. The helices are supported by diamond dielectric support rods. Diamond is the best possible thermal conductor, and it can be bonded to the helix. The electron beam is transmitted, not through the center of the helix, but around the outside. In some configurations the RF power produced may be radiated directly from the slow wave circuit. The method of fabrication, which is applicable above 60 GHz, is compatible with mass production. | 10-04-2012 |
| 20130200789 | ELECTROMAGNETIC WAVE OSCILLATOR HAVING MULTI-TUNNEL AND ELECTROMAGNETIC WAVE GENERATING APPARATUS INCLUDING THE ELECTROMAGNETIC WAVE OSCILLATOR - Electromagnetic wave oscillators each having a multi-tunnel and electromagnetic wave generating apparatuses including the electromagnetic wave oscillators are provided. The electromagnetic wave oscillator includes: a first waveguide which has a folded structure such that a path traveled by an electromagnetic wave through the first waveguide crosses an axial direction a plurality of times; an electron beam tunnel through which an electron beam passes, wherein the electron beam tunnel extends along the axial direction and crosses the first waveguide a plurality of times; and at least one auxiliary tunnel which extends parallel to the electron beam tunnel and which crosses the first waveguide a plurality of times. | 08-08-2013 |
| 20160056005 | RAPID 3D PROTOTYPING AND FABRICATING OF SLOW-WAVE STRUCTURES, INCLUDING ELECTROMAGNETIC META-MATERIAL STRUCTURES, FOR MILLIMETER-WAVELENGTH AND TERAHERTZ-FREQUENCY HIGH-POWER VACUUM ELECTRONIC DEVICES - A method for fabricating slow-wave structures, including electromagnetic meta-material structures, for high-power slow-wave vacuum electronic devices operating in millimeter-wavelength (30 GHz-300 GHz) and terahertz-frequency (300 GHz and beyond) bands of electromagnetic spectrum. The method includes: loading a digital three dimensional model of a slow-wave structure in a memory of a 3D printer, the loaded digital three dimensional model having data therein representative of the slow-wave structure to be fabricated by the 3D printer; loading metal powder material into the 3D printer; and operating the 3D printer to melt the metal powder material in accordance with the loaded three dimensional model of the slow-wave structure and then to solidify the melted layer of the metal powder material to fabricate the slow-wave structure layer by layer. | 02-25-2016 |
